CN112051013A - 包括分析排出气体的使用气相反应器系统的方法 - Google Patents
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Abstract
本发明公开了用于进行气相反应器系统的泄漏检查的方法和系统。示例性系统包括:第一排气系统,所述第一排气系统经由第一排气管线联接到反应腔室;旁路管线,所述旁路管线联接到气体供应单元且联接到第一排气系统;气体检测器,所述气体检测器经由连接管线联接到旁路管线;连接管线阀,所述连接管线阀联接到连接管线;以及第二排气系统,所述第二排气系统联接到连接管线。方法包括使用第二排气系统来使连接管线排气,从而去除原本可能会影响气体检测器的准确度的连接管线中的残余气体。
Description
技术领域
本公开大体上涉及气相方法及系统。更具体地说,本发明涉及包括泄漏检测设备的气相系统以及检测系统内泄漏的方法。
背景技术
气相反应器,如化学气相沉积(CVD)、等离子体增强CVD(PECVD)、原子层沉积(ALD)等,可以用于各种应用,包括在衬底表面上清洁、沉积和蚀刻材料。例如,气相反应器可用于在衬底上清洁、沉积并且/或者蚀刻各层,以形成半导体装置、平板显示装置、光伏装置、微电子机械系统(MEMS)等。
典型的气相反应器系统包括反应器,该反应器包括反应腔室、流体联接到反应腔室的一个或多个前体和/或反应物气体源、流体联接到反应腔室的一个或多个运载气体源和/或吹扫气体源、用于递送气体(例如,前体气体和/或反应物气体和/或运载气体或吹扫气体)到衬底表面的气体分配系统,以及流体联接到反应腔室的排气源。
许多气相反应器包含供应所需气体到反应腔室的气体供应单元。气体供应单元可包括在标准室温和压力下可为固体、液体或气体的一个或多个源(或与源的连接)、包括关闭阀和/或控制阀的阀、管线、加热器、冷却器等。气体供应单元还可包括围绕一个或多个源、管线、阀、加热器和/或冷却器的壳体。
出于各种原因,包括安全性,可能期望检测气体供应单元内的气体泄漏。例如,在气相反应器系统的操作期间,阀失效或气体供应块的失效例如可能导致气体泄漏,这又可能使得难以控制气体流速,并且可能导致过程和/或反应器系统失效。因此,大体期望尽可能快地检测气体供应单元内的气体泄漏。
图1示出了气相反应器系统100,其包括气体供应单元102、反应器104、排气系统106、气体检测器108和控制器110。系统100还包括气体入口112、阀114-122和排气路径124。
在所示实例中,气体供应单元102和反应器104经由气体入口112连接。工艺气体通过气体入口阀114和气体入口112供应到反应器104。气体入口阀114可以是气体供应单元102的一部分,并且气体入口112可以包括气体供应设备,如喷头等。来自反应器104的气体经由排气路径124排放到排气系统106。排气系统106可包括例如干燥泵、洗涤器等。排气路径124可包括排气阀116。排气阀116可以用来通过配备压力控制装置(例如蝶翼板)来控制反应器104中的压力,并且其可以由排气阀控制单元(未示出)控制,所述排气阀控制单元与安装在反应器104处的压力计(未示出)通信。
系统100还包括分流路径或旁路路径126。分流路径126连接到气体供应单元102和排气路径124,且绕过气体入口112、反应器104和阀116。分流路径126尤其可用于ALD型工艺中,以促进在过程期间保持反应器104中的工艺压力,因为分流路径126可用于通过调整阀移动而将气体流动方向从反应器104切换到分流路径126,而不增大或降低气体流速。通过保持工艺压力恒定,气体供应管线和反应器104中的压力波动可以最小化,并且过程可以更稳定。
在所示的实例中,分流路径126包括第一分流阀120、第二分流阀122和第三分流阀118。当气体供应到反应器104时,第一分流阀120和第三分流阀118关闭。当气体供应到分流路径126时,第一分流阀120和第三分流阀122打开。
气体检测器108流体地联接到分流路径126以检查气体供应单元102内的气体泄漏。例如,当气体供应单元的一体化气体供应系统块的阀或一部分失效并且外部气体通过一体化气体供应系统块的失效部分泄漏进入气体供应单元102时,气体检测器108可以检测泄漏气体并将信号发送至控制器110,并且控制器110可以引起系统100的一部分(图1的虚线区域)的操作停止。
图2示出了气相反应器系统(如气相反应器系统100)的泄漏检查方法200。方法200包括以下步骤:反应器内装载衬底(步骤202)、气体供应单元的泄漏检查(步骤204)、确定泄漏速率是否大于预定值(步骤206)、开始衬底处理(步骤208)、停止系统操作(步骤210)以及结束处理和卸载衬底(步骤212)。
在步骤202期间,将衬底装载到反应器(例如,反应器104)。衬底可安装在例如基座或加热块上。
在步骤204和206期间,执行气体供应单元102的泄漏检查。在步骤204期间,气体供应单元102的所有阀打开,且气体供应单元102的气体入口阀114和最前方阀(未示出)关闭,诸如前体、反应物和其它工艺气体的气体通过气体入口阀和最前方的阀从气体贮存器或容器(未示出)流入气体供应单元102。取而代之,第一分流阀120、第二分流阀122和第三分流阀118打开。在这种情况下,气体供应单元102的所有部分与分流路径126和气体检测器108流体连通,而不与气体入口112和反应器104以及气体供应单元102外部的气体贮存器或容器开放流体连通。在步骤204期间,气体检测器108检测从气体供应单元102排出而流动到分流路径126的任何残余气体。在步骤206中,如果残余气体含有源自大气的外部气体,如N2或O2,并因此气体的泄漏速率超过设定值,则气体检测器108可以向控制器110发送信号。如果检测到泄漏,那么控制器110可配置成引起操作系统100的停止(步骤210)。步骤204和206可以在衬底的预处理步骤(如预热步骤)期间执行。
基于在步骤206期间的检测结果,可以执行过程(步骤208)。该过程可以是或包括膜沉积、蚀刻、灰化、清洁等。如果检测结果超过设定值,则衬底处理系统可以停止操作(步骤210)。在其它实施例中,检测结果可与互锁系统同步。在此情况下,如果检测结果超过设定值,那么互锁系统停止操作。
在步骤212处,当过程完成时,从反应器卸载衬底,并且装载下一个衬底,并且重复步骤202-212。换句话说,在将衬底装载在反应腔室内并且在从反应腔室处理衬底之前反复地执行气体供应单元102的泄漏检测。
使用系统100和方法200的气体供应单元102的泄漏检测可能由于区域128中的捕获气体在检测外部气体时表现出低精确性。区域128可以是连接分流路径126和气体检测器108的气体管。完成步骤204和步骤206之后,区域128期望地在其中包括最小残余气体或捕获气体,以用于气体供应单元102的准确泄漏检测。但是,由于在泄漏检测步骤204和206之后的后续衬底处理步骤208,第二分流阀122关闭,以保护气体检测器108免受流入分流路径126中的工艺气体的影响,从而在区域128中捕获气体。在处理下一个衬底之前,区域128中的捕获气体可能妨碍步骤204和步骤206期间的准确和精确泄漏检测。在另一种情况下,来自气体供应单元的气体可以在步骤204和206期间积聚在区域128中,并且累积的气体可以使得难以准确地检测外部气体。因此,期望用于检测气相反应器系统中的泄漏的改进的系统和方法。
本段中提出的问题和解决方案的任何论述已经仅出于提供本公开的背景的目的而包括于本公开中,并且不应视为承认所述论述中的任一项或全部在制作本发明时都是已知的。
发明内容
本公开的各种实施例涉及气相反应器系统和方法。尽管下面将更详细地讨论本公开的各种实施例解决现有方法和系统的缺点的方式,但是总体上,本公开的示例性实施例提供了用于检测气相反应器系统内的气体泄漏的改进的系统和方法。
根据本公开的至少一个实施例,一种气相反应器系统包括:反应器,其包括反应腔室;气体供应单元,其经由气体供应管线连接到反应腔室;第一排气系统,其经由第一排气管线联接到反应腔室;旁路管线,其联接到气体供应单元且联接到所述第一排气系统;经由连接管线联接到旁路管线的气体检测器;联接到连接管线的连接管线阀;以及联接到连接管线的第二排气系统。根据这些实施例的示范性方面,旁路管线联接到气体供应管线。旁路管线还可联接到第一排气管线。根据另外的方面,气相反应器系统包括联接到连接管线的第二排气管线。第二排气管线阀可以在连接管线和第二排气系统之间。此外,第二排气系统可联接到腔室,例如平台腔室或外腔室。气体检测器可检测气体的流速和/或成分(例如,氮含量和/或氧含量)。气相反应器系统还可包括控制器,其配置成:在衬底装载入反应腔室之后并在衬底从反应腔室移除之前引起气相反应器系统执行泄漏测试,在将衬底加热至期望的工艺温度的同时引起气相反应器系统执行泄漏测试,在过程循环期间执行泄漏测试,在气体检测器检测到高于预定值的气体流速时停止气体流至反应腔室,在气体检测器检测到高于预定值的气体流速时停止气相反应器系统的操作,在反应腔室内处理衬底期间使连接管线排气,和/或通过关闭连接管线阀并打开第二排气管线阀来使连接管线排气。
根据本公开的至少一个其它实施例,一种使用气相反应器系统的方法包括以下步骤:提供气相反应器系统,如提供本文所述的气相反应器系统,使连接管线排气,并且使用气体检测器分析从气相反应器系统排出的气体。气体可从气体供应单元排出。该方法还可以包括以下步骤:在连接管线排气的步骤之后并且在分析气体的步骤之前,关闭在气体检测器和第二排气系统之间的第二排气管线阀。附加地或备选地,该方法可包括在分析步骤期间使旁路管线排气的步骤。示范性方法可包含在反应腔室内装载衬底的步骤,其中分析步骤在装载步骤之后且在从反应腔室内卸载衬底的步骤之前进行。备选地,该方法可包含在反应腔室内装载衬底的步骤,其中所述分析步骤在装载步骤之前执行。在分析步骤期间,气体可排放到第二排气系统。气体检测器可用于检测气体的成分和/或流速。例如,气体检测器可以用于确定气体流速是否高于预定水平。在这种情况下,所述方法可包括如果气体流速高于预定水平,则停止气体流到反应腔室;如果气体流速高于预定水平,则停止气相反应器系统的操作;和/或如果气体流速高于预定水平,则接合互锁系统。分析步骤可在将衬底加热到期望的工艺温度的同时、在过程循环期间和/或在衬底已装载到反应腔室中之后并在衬底从反应腔室移除之前执行。
对于所属领域的技术人员来说,这些和其它实施例将从参考附图的某些实施例的以下详细描述变得显而易见;本发明不限于所公开的任何特定实施例。
附图说明
在结合以下说明性图式考虑时,可以通过参考详细说明和权利要求书来更完整地理解本公开的例示性实施例。
图1示出了现有技术的气相反应器系统。
图2示出了现有技术的泄漏检测方法。
图3-7和10示出了根据本公开的至少一个实施例的气相反应器系统。
图8示出了使用本领域已知的系统的泄漏检查结果。
图9示出了使用根据本公开的至少一个实施例的系统或方法的泄漏检查结果。
应了解,图中的元件仅为简单和清晰起见而示出,而未必按比例绘制。举例来说,图中的一些元件的尺寸可能相对于其它元件放大,以有助于改进对本公开的所说明的实施例的理解。
具体实施方式
尽管下文公开了某些实施例和实例,但所属领域的技术人员应理解,本发明延伸超出了本发明具体公开的实施例和/或用途和显而易见的修改以及其等效物。因此,希望本发明所公开的范围不应受限于下文所描述的特定公开实施例。
本公开大体上涉及能够确定泄漏的气相反应器系统及方法。如下文更详细地阐述,本文中描述的示范性系统和方法可用于更准确地确定从气相反应器系统的一个或多个区域或区段泄漏的气体的成分、流速和/或量。此外,与传统方法和系统相比,本文中描述的系统和方法可以更有效地处理衬底和执行泄漏检查。
在本公开中,“气体”可以包括在室温和压力下为气体、气化的固体和/或气化的液体的材料,并且取决于上下文,可以由单一气体或气体混合物构成。除了工艺气体以外的气体,即不经过气体分配组件(如喷头)、其它气体分配装置等而引入的气体,可以用于例如密封反应空间,该反应空间包括:密封气体,如稀有气体。气体可以是参与反应腔室内的反应的反应物或前体,和/或包含环境气体(如空气)。
在本公开中,“管线”可指气体流动通过的导管,例如管。管线可包括一个或多个阀、分支等。如本文中所描述的示范性管线可由不锈钢形成。
在本公开中,由于可工作范围可基于常规工作而确定,因此变量的任何两个数字可构成变量的可工作范围,且所指示的任何范围可包括或排除端点。另外,所指示的变量的任何值(不论其是否用“约”指示)可指精确值或近似值并且包含等同物,并且在一些实施例中,可指平均值、中值、代表值、大部分值等。此外,在本公开中,在一些实施例中,术语“由……构成”和“具有”独立地指“典型地或广泛地包含”、“包含”、“基本上由……组成”或“由……组成”。在本公开中,在一些实施例中,任何所定义的含义未必排除普通和惯用含义。
在本公开中,在一些实施例中,“连续”可指以下一个或多个:不失去真空,不中断为时间线,无任何材料插入步骤,不改变处理条件,其后立即,作为下一步骤,或除两个结构外的两个结构之间不插入离散物理或化学结构。
现在再转到附图,图3示出了根据本公开的示例性实施例的气相反应器系统300。气相反应器系统300包括包含反应腔室304的反应器302、气体供应单元306、第一排气系统308、联接到气体供应单元306且连接到第一排气系统308的旁路管线310、气体检测器312和第二排气系统314。气相反应器系统300还可包括控制器316以控制气相反应器系统300的各种部分或装置。
反应器302可包括任何合适的气相反应器。举例来说,反应器302可以配置为化学气相沉积反应器、原子层沉积反应器、蚀刻反应器、清洁反应器、外延反应器等。在一些情况下,反应器302可以包括直接等离子体配置,和/或气相反应器系统300可以包括联接到反应器302的远程等离子单元。反应器302包括用以从气体供应单元306接收气体的气体入口318。
气体供应单元306通过气体入口318将一种或多种工艺气体(如一种或多种前体和/或一种或多种反应物)供应到反应腔室304。气体供应单元306还可通过气体入口318向反应腔室提供运载气体和/或惰性气体。气体供应单元306可包括一体化气体供应块。与常规的管道型气体供应系统相比,一体化气体块系统是模块化或Lego型气体供应系统,以便使从最前阀到最后阀的整个气体供应路径简单、紧凑和短小,并且减少气体供应路径与阀之间的盲点。因此,与在常规管道系统中相比,在一体化气体块系统中,气体供应或气体之间的切换可以更快。
第一排气系统308和第二排气系统314可以包括任何合适的装置,以使管线和/或反应腔室排气。举例来说,第一排气系统308和/或第二排气系统314可以是或包括干式泵、涤气器、涡轮分子泵等。如图3所示,第二排气系统314可以联接到另一个腔室320,如用于在反应器与冷却器或负载锁之间传递衬底的平台腔室,或者具有围绕多反应器室中的多个反应器的旋转臂的外腔室。
管线338可将反应器302连接到第一排气系统308。如图所示,管线338可以包括阀340,阀可以联接到控制器316并由所述控制器控制。
旁路管线310联接到气体供应单元306且联接到第一排气系统308。旁路管线310包括气体供应单元306与第一排气系统308之间的第一旁路管线阀322。旁路管线310可附加地或备选地包括第二旁路管线阀324。第一旁路管线阀322和第二旁路管线阀324可以包括任何合适类型的阀,如气动阀。第一旁路管线阀322和/或第二旁路管线阀324可以联接到控制器316并由所述控制器控制。
气体检测器312可检测或测量气体的流速和/或成分。举例来说,气体检测器312可以是或包括例如SPOES(自等离子体光学发射光谱仪),其分解气体,分析和检测气体类型。例如,由于氮占据大气中的约70%,气体检测器312可以配置成检测气体中的氮。在一些情况下,如果通过气体检测器312检测到氮气,且检测到的氮气超过设定值,那么可确定外部气体(例如,来自气体供应单元306周围的环境)已泄漏到气体供应单元306和/或气相反应器系统300内的其它地方。附加地或备选地,气体检测器312可以包括流量计和/或质量流量计,以确定泄漏的量或流速。
连接管线330可将旁路管线310连接到气体检测器312。连接管线330可包括连接管线阀332,其可以是气动阀并且可以联接到控制器316。
控制器316可以是可引起执行如本文中所描述的各种步骤或功能的任何适合的控制器。根据本公开的各种实例,控制器316从气体检测器312接收可指示气体的成分、流速和/或量的信号。如下文更详细所述,控制器316可以配置成引起以下的一种或多种:在衬底装载入反应腔室之后并在衬底从反应腔室移除之前引起气相反应器系统执行泄漏测试,在将衬底加热至期望的工艺温度的同时引起气相反应器系统执行泄漏测试,在过程循环期间执行泄漏测试,在气体检测器检测到高于预定值的气体流速时停止气体流至反应腔室,在气体检测器检测到高于预定值的气体流速时停止气相反应器系统的操作,在反应腔室内处理衬底期间使连接管线排气,以及通过基于从气体检测器312接收到的一个或多个信号关闭连接管线阀332并打开第二排气管线阀336来使连接管线排气。
气体供应单元306和反应器302经由气体入口318连接。可以在气体入口管线328中通过气体入口阀326将工艺气体供应到反应器302。尽管单独示出,但气体入口阀326可以是气体供应单元306的一部分。气体入口318可包括气体供应设备,如喷头等。
如图所示,气相反应器系统300可包括联接到连接管线330的第二排气管线334。第二排气管线334也可以联接到第二排气系统314。第二排气管线334可以包括第二排气管线阀336,第二排气管线阀可以是气动阀或者与止回阀相同或相似(气体通过止回阀向前流动而不回流),并且可以联接到控制器316并由所述控制器控制。
如下文更详细地阐述,气相反应器系统300的使用具有优于使用常规气相反应器系统的若干优点。例如,在使用气相反应器系统300处理衬底时,在衬底处理(例如,沉积、蚀刻或清洁步骤)期间,连接管线阀332(例如,使用控制器316)和第二排气管线阀336可以打开(例如,使用控制器316打开),使得区域(即,盲点)342中捕获或积聚的残余气体可以通过第二排气管线334排放到第二排气系统314。换句话说,通过采用该系统,可以减轻否则将在连接管线330中捕获的任何气体,从而提高使用气体检测器312执行的测量的准确度。另外,工艺气体可包括通过反应腔室304与第一排气系统308之间的区域中的工艺气体之间的反应产生的化合物;这些化合物可以沉积并粘住第一排气系统308。这可能使在联接到气体供应单元306且联接到第一排气系统308的旁路管线310与联接到反应腔室304和第一排气系统308之间的管线338之间切换气体排到第一排气系统308不顺畅。然而,使用系统300、第二排气管线334和第二排气系统314可以用于减轻到第一排气系统308的突然过渡,并且由此提供例如泄漏到气体供应单元306中的外部气体和气相反应器系统300内的其它气体泄漏的更准确的分析和检测。此外,来自沉积于管线338的内壁上的化合物的除气效果可妨碍从旁路管线310的顺畅排气。这种效果在生成许多副产品(如粉末)的过程中尤其严重,例如,使用DCS(二氯硅烷)和NH的NH3作为工艺气体的SiN过程,且由于旁路管线310中的残余气体而降低了泄漏气体到气体供应单元306中的分析的准确性。因此,必须去除旁路管线310中的残余气体以准确地分析进入气体供应单元306中的泄漏气体。
图4-7和10示出了根据本公开的附加实施例的在处理期间的气相反应器系统300。图4和5示出了在反应腔室(例如反应腔室304)内装载衬底之后且在处理衬底之前(例如,在将反应气体引入反应腔室304之前)进行泄漏检查的同时的气相反应器系统300。图6和7示出了在装载衬底之后并且在处理衬底之前执行泄漏检查步骤的同时的气相反应器系统300的另一实例。并且,图10示出了在执行泄漏检查步骤时气相反应器系统300的又一实例。
如图4所示,在将衬底装载到反应腔室304内之后,第一旁路管线阀322、第二旁路管线阀324和第二排气管线阀336最初打开,或可使用控制器316打开。气体入口阀326最初关闭或可以使用控制器316关闭。连接管线阀332例如使用控制器316在某一时间段(例如,小于10秒)内关闭,以便去除连接管线阀332与气体检测器312之间的任何潜在残余气体区域342。
接下来,如图5所示,第一旁路管线阀322、连接管线阀332和第二旁路管线阀324打开(例如,通过使用控制器316打开)。气体入口阀326关闭(例如,使用控制器316)。第二排气管线阀336例如使用控制器316关闭某一时间段,例如小于5秒。接下来,气体检测器312开始检测和分析从气体供应单元306和/或气相反应器系统300中的其它地方排出的气体。
如图6所示,根据本发明的另一实施例,在将衬底装载在反应腔室304内之后,第一旁路管线阀322、第二旁路管线阀324和第二排气管线阀336打开,或可使用例如控制器316打开。气体入口阀326关闭,或者可以使用例如控制器316关闭。连接管线阀332例如使用控制器316在某一时间段(例如,小于10或5秒)内关闭,以便去除来自连接管线阀332与气体检测器312之间的区域342的任何潜在残余气体。
接下来,如图7所示,第一旁路管线阀322、连接管线阀332和第二排气管线阀336打开或者例如使用控制器316打开。气体入口阀326例如使用控制器316关闭。第二旁路管线阀324例如使用控制器316关闭某一时间段,例如,小于10或5秒。气体检测器312然后开始检测和分析从气体供应单元306排出的气体。在此实施例中,从气体供应单元306排出的气体排出到第二排气系统314,使得可以避免来自第一排气系统308和/或第一排气路径(例如,管线338)的任何阻断效果。此程序可特别适用于能够产生许多副产品(如粉末)的过程,例如,使用DCS和NH3作为工艺气体的氮化硅沉积过程。
根据示范性实例,在处理衬底期间,连接管线阀332关闭并且第二排气管线阀336打开(例如,使用控制器316),以防止或减轻在处理衬底期间检测到的任何残余气体。
图10示出了旁路管线阀322、连接管线阀332、第二旁路管线阀324和第二排气管线阀336在泄漏检查步骤中打开的另一实例。在这种情况下,如上所述,可以通过使用例如控制器316关闭连接管线阀332某一时间段(例如小于10或5秒)来从管线342排空气体,以便去除来自连接管线阀332与气体检测器312之间的区域342的任何潜在残余气体。然后,旁路管线阀322、连接管线阀332、第二旁路管线阀324和第二排气管线阀336在泄漏检查期间例如使用控制器316打开或可以打开,使得气体在泄漏检查期间排放到第一排气系统308和第二排气系统314两者。阀340可在此步骤期间打开。此实例可在处理衬底之前或之后执行。
图8示出了使用图1所示气相反应器系统的泄漏检查结果。图8示出了整合曲线图,其示出当多个衬底(例示性实例中的四个)连续处理时气体供应单元102的每个泄漏速率测试的氮强度。在图8中,Y轴是在每次泄漏速率测试下由气体检测器(例如,气体检测器108)检测到的氮的强度。X轴是包括泄漏检测步骤的衬底处理时间。对于每个待处理的衬底,需要约150秒。
如图8所示,泄漏速率增加越大,氮强度越大。但是,氮强度并不均匀且随着多个衬底被连续处理而逐渐增加。另外,在整个衬底处理时间期间检测氮强度,并且泄漏检测步骤与衬底处理步骤不同。这是因为气体检测器(例如,气体检测器108)在衬底处理步骤期间即使阀122闭合,也不断检测图1中的盲点区域128中的残余气体。捕获的残余气体在盲点区域中可积聚,且可影响以下衬底的检测结果。例如,第二衬底的氮强度中的一些可来自在第一衬底的衬底处理期间捕获在盲点区域中的残余气体。因此,气体供应单元的泄漏检测和分析不准确,且不可靠。
相比之下,图9示出了根据本发明的实例使用气相反应器系统300的泄漏检查结果。与图8所示结果相反,图9示出了泄漏检测步骤明显不同于衬底处理步骤。无论处理的衬底数量如何,氮强度都是均匀的。这被认为是因为盲点区域342中的残余气体在泄漏检测步骤开始之前通过第二分流路径排到第二排气系统314。
因此,根据本公开的实例,可以产生一组(例如,强度、流速等)值。如果测量值(例如,强度、流速等)超过设定值,那么可使用互锁系统停止系统300的操作。如上所述,在衬底处理步骤处处理衬底期间,连接管线阀332关闭,并且第二排气管线阀336打开以防止在处理衬底期间检测到任何残余气体。
如本文中所述,引入第二排气管线334去除捕获在第二分流阀与气体检测器之间的残余气体,且提供气体供应单元的更准确、更可靠的泄漏检测和分析结果。另外,在处理衬底之前提供对气体供应单元的泄漏检查的本文所述的方法可通过与互锁系统同步而防止对衬底的潜在损坏。此外,可以在衬底的预加热步骤期间执行检测,因此检测不影响生产量。
上文所描述的本公开的示例性实施例不限制本发明的范围,因为这些实施例仅仅是本发明实施例的实例。任何等效实施例都希望在本发明的范围内。实际上,所属领域的技术人员根据说明书可以清楚除本文中所展示和描述的内容外的对本公开的各种修改,如所述要素的备选适用组合。此类修改和实施例也希望在所附权利要求书的范围内。
Claims (16)
1.一种使用气相反应器系统的方法,所述方法包括以下步骤:
提供气相反应器系统,所述气相反应器系统包括:
反应腔室;
气体供应单元,所述气体供应单元经由气体供应管线联接到所述反应腔室;
第一排气系统,所述第一排气系统经由第一排气管线联接到所述反应腔室;
旁路管线,所述旁路管线联接到所述气体供应单元和所述第一排气系统;
气体检测器,所述气体检测器经由连接管线联接到所述旁路管线;
连接管线阀,所述连接管线阀联接到所述连接管线;以及
第二排气系统,所述第二排气系统联接到所述连接管线;
使所述连接管线排气;以及
使用所述气体检测器,分析从所述气相反应器系统排出的气体。
2.根据权利要求1所述的方法,其中气体从所述气体供应单元排出。
3.根据权利要求1所述的方法,还包括以下步骤:在使所述连接管线排气的步骤之后并且在分析气体的步骤之前,关闭在所述气体检测器和所述第二排气系统之间的第二排气管线阀。
4.根据权利要求1所述的方法,还包括在所述分析步骤期间使所述旁路管线排气的步骤。
5.根据权利要求1所述的方法,还包括在所述反应腔室内装载衬底的步骤,其中所述分析步骤在所述装载步骤之后并且在从所述反应腔室内卸载所述衬底的步骤之前进行。
6.根据权利要求1所述的方法,还包括在所述反应腔室内装载衬底的步骤,其中所述分析步骤在所述装载步骤之前进行。
7.根据权利要求1所述的方法,其中在所述分析步骤期间,气体排放到所述第二排气系统。
8.根据权利要求7所述的方法,其中在所述分析步骤期间,所述气体未排放到所述第一排气系统。
9.根据权利要求1所述的方法,还包括在所述分析气体的步骤期间,使用所述气体检测器确定气体流速是否高于预定水平。
10.根据权利要求9所述的方法,还包括如果所述气体流速高于所述预定水平,则停止气体流动到所述反应腔室。
11.根据权利要求9所述的方法,还包括如果所述气体流速高于所述预定水平,则停止所述气相反应器系统的操作。
12.根据权利要求9所述的方法,还包括如果所述气体流速高于所述预定水平,则接合互锁系统。
13.根据权利要求1所述的方法,其中执行所述分析步骤,同时将衬底加热到期望的工艺温度。
14.根据权利要求1所述的方法,其中所述分析步骤在过程循环期间执行。
15.根据权利要求1所述的方法,其中在衬底已装载到所述反应腔室中之后并且在将所述衬底从所述反应腔室中移除之前,执行所述分析步骤。
16.根据权利要求1所述的方法,其中在所述分析步骤期间,气体排放到所述第一排气系统和所述第二排气系统。
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CN112051012B (zh) | 2024-04-09 |
KR20200141003A (ko) | 2020-12-17 |
US20220403522A1 (en) | 2022-12-22 |
TW202113151A (zh) | 2021-04-01 |
TWI825319B (zh) | 2023-12-11 |
KR20200141002A (ko) | 2020-12-17 |
CN117405320A (zh) | 2024-01-16 |
TW202113152A (zh) | 2021-04-01 |
CN112051012A (zh) | 2020-12-08 |
US20200385868A1 (en) | 2020-12-10 |
CN112051013B (zh) | 2023-09-26 |
US11453946B2 (en) | 2022-09-27 |
TW202409342A (zh) | 2024-03-01 |
US11345999B2 (en) | 2022-05-31 |
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US20200385867A1 (en) | 2020-12-10 |
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