JP3191392B2 - クリーンルーム用密閉式コンテナ - Google Patents
クリーンルーム用密閉式コンテナInfo
- Publication number
- JP3191392B2 JP3191392B2 JP8441192A JP8441192A JP3191392B2 JP 3191392 B2 JP3191392 B2 JP 3191392B2 JP 8441192 A JP8441192 A JP 8441192A JP 8441192 A JP8441192 A JP 8441192A JP 3191392 B2 JP3191392 B2 JP 3191392B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- container
- inert gas
- internal pressure
- passage hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
- H01L21/67393—Closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrierl
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S414/00—Material or article handling
- Y10S414/135—Associated with semiconductor wafer handling
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Packages (AREA)
- Packaging Frangible Articles (AREA)
Description
示板、レチクルおよびディスク類を製造するシステムに
おいて用いられる密閉式のコンテナに関する。
例を示したもので、1は半導体ウエハの表面処理を行な
う表面処理炉を内蔵した表面処理装置であり、後述する
ポートを2つ並列に備えている。2はウエハ検査装置、
3は自走式の移載ロボット、4はウエハ保管庫、4Aは
ウエハ保管庫4のエプロン、5はウエハ洗浄装置、6は
リニアモータ式の搬送装置である。
示したものである。この図において、10は密閉式のコ
ンテナ(ポッド)であって、その開口11はシール12
を介在して蓋13で密閉されている。この蓋13は図示
しないが自動施錠機構を内蔵しており、当該自動施錠機
構の進退駆動されるロッド14の端部がコンテナ10の
開口11に係合する。15はウエハカセットであって、
複数枚例えば25枚の半導体ウエハWを段々に収納して
おり、コンテナ10に収容されて搬送される。図9はウ
エハカセット15を収容したコンテナ10が表面処理装
置1の上記したポート(カセット搬入搬出部)16Aを
構成するプレート16上へ載置された状態を示してお
り、レバー式ロック機構17によりプレート16上に固
定されており、プレート16上に固定されると、蓋13
の自動施錠機構は解錠される。18Aは昇降装置18の
昇降台であり、ウエハカセット15は蓋13とともにこ
の昇降台18Aへ移載されて下降し、図示しない搬送装
置によりウエハカセット15だけが図示しない表面処理
炉へ運ばれる。半導体ウエハの表面処理が終了すると、
ウエハカセット15は昇降台18Aに載っている蓋13
上へ搬送され、昇降台18Aが上昇して当該ウエハカセ
ット15をコンテナ10内へ搬入する。コンテナ10で
は、蓋13を施錠して密閉する。密閉されたコンテナ1
0は移載ロボット3によりウエハ保管庫4のエプロン4
Aからへ搬送され、ウエハ保管庫4へ搬入されたコンテ
ナ10はスタッカークレーン7により、図示しない中央
制御装置から指定された棚の所定のポジションに搬入さ
れる。
半導体製造プロセスは、清浄雰囲気にしたクリーンルー
ム内で実行され、従来は、ウエハカセット15を裸のま
まで、装置から装置へ搬送していたが、半導体回路の高
集積化が進むに伴い、上記のようにウエハカセット15
を密閉式コンテナ10に収容して装置から装置へ搬送す
るようになり、更に、密閉式コンテナ10内および表面
処理装置1等の装置内を不活性雰囲気にして、半導体ウ
エハの自然酸化膜の成長を抑制するまでになった。
式ではあるが、不活性ガス、例えばN2 ガスを封入した
のち長い期間そのままにしておくと、除々にガスが漏れ
出てコンテナ内のN2 ガス濃度が低下してしまう。
れる場合や長く保管庫に入れておくコンテナはガス補給
のために所定時間経過毎にN2 ガスパージステーション
まで搬送してガスパージするようにしており、この作業
がシステムの動きを複雑にしている。
たもので、着脱可能なガス補給源を一体に備え、ガス補
給のためにN2 ガスパージステーションまで移動させな
くても済むクリーンルーム用密閉式コンテナを提供する
ことを目的とする。
的を達成するため、ウエハを収納し内部を不活性ガス雰
囲気にして半導体製造システムの装置から装置へ搬送さ
れる密閉式コンテナにおいて、当該コンテナは、一端が
内部に開口し他端が外部に開口するガス通路孔を有し、
このガス通路孔の上記他端部に、可搬式の不活性ガスボ
ンベが着脱可能に取付けられ、当該不活性ガスボンベ
は、前記コンテナの内圧がガス漏れにより所定レベルに
低下したときに、該内圧の低下に連動してガス漏れ分を
補給するコンテナ漏れガス分補給用である。 また、請求
項2の発明は上記目的を達成するため、ウエハを収納し
内部を不活性ガス雰囲気にして半導体等製造システムの
装置から装置へ搬送される密閉式コンテナにおいて、当
該コンテナは、一端が内部に開口し他端が外部に開口す
るガス通路孔を有し、このガス通路孔の上記他端部に、
可搬式の不活性ガスボンベが着脱可能に取付けられ、該
不活性ガスボンベは、前記コンテナの内圧がガス漏れに
より所定レベルに低下したときに該ガス漏れ分を補給す
るように、前記コンテナの内圧とバネとで付勢された調
整弁により開栓可能にされている。
その内圧が所定レベルに低下すると、自動的にN2 ガス
ボンベ20が漏れガス分の補給を行なう。
明する。
搬タイプの小型のN2 ガスボンベである。コンテナ10
には、そのフランジ10Aの上面に一端31Aが開口
し、他端31Bが内側面に開口する小径のガス通路孔3
1が形成され、ガス通路孔31の上記他端31Bが開口
する部分にはフィルタ32が設けられている。
圧弁22が取りつけられ、減圧弁22から突出する給ガ
ス管部23が図2に示すようにガス通路孔31の上記一
端31Aに螺入されている。33はバネ34で付勢され
た調整弁である。
は図示しないN2 ガスパージステーション等でガスパー
ジされ、N2 ガスを封入して大気圧より若干高い圧力ま
で与え圧されている。
管庫4の棚に載置され、載置されたまま時間が経過する
と前記したガス漏れが進む。コンテナ10のガス漏れが
進み、そのガス圧が、例えば大気圧まで下がると、弁3
3がばね34の付勢力に抗して押し下げられて、給ガス
管部23の開口23Aから離間し、N2 ガスボンベ20
のN2 ガスが減圧弁22で大気圧より高い与圧レベルま
で減圧されてガス通路孔31へ噴出する。ガス通路孔3
1へ噴出したN2 ガスは当該ガス通路孔31の他端31
Bからコンテナ10内へ流れ込み、コンテナ10内のN
2 ガス濃度を上昇する。
のガス漏れが進み、その内圧が所定レベルに低下する
と、自動的にN2 ガスボンベ20が漏れガス分の補給を
行なうので、コンテナ10を定期的にN2 ガスパージス
テーションへ搬送してN2 ガスする手間を省くことがで
きる。
補給用の不活性ガスボンベをコンテナに搭載してあるの
で、コンテナ内のガス濃度は常に自動的に高純度に維持
され、パージステーションへ運んでガス補給する必要が
ないから、その分、システム内の負担を軽減することが
できる。
の部分断面図である。
Claims (2)
- 【請求項1】 ウエハを収納し内部を不活性ガス雰囲気
にして半導体製造システムの装置から装置へ搬送される
密閉式コンテナにおいて、当該コンテナは、一端が内部
に開口し他端が外部に開口するガス通路孔を有し、この
ガス通路孔の上記他端部に、可搬式の不活性ガスボンベ
が着脱可能に取付けられ、当該不活性ガスボンベは、前
記コンテナの内圧がガス漏れにより所定レベルに低下し
たときに、該内圧の低下に連動してガス漏れ分を補給す
るコンテナ漏れガス分補給用であることを特徴とするク
リーンルーム用密閉式コンテナ。 - 【請求項2】 ウエハを収納し内部を不活性ガス雰囲気
にして半導体等製造システムの装置から装置へ搬送され
る密閉式コンテナにおいて、当該コンテナは、一端が内
部に開口し他端が外部に開口するガス通路孔を有し、こ
のガス通路孔の上記他端部に、可搬式の不活性ガスボン
ベが着脱可能に取付けられ、該不活性ガスボンベは、前
記コンテナの内圧がガス漏れにより所定レベルに低下し
たときに該ガス漏れ分を補給するように、前記コンテナ
の内圧とバネとで付勢された調整弁により開栓可能にさ
れていることを特徴とするクリーンルーム用密閉式コン
テナ。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8441192A JP3191392B2 (ja) | 1992-04-07 | 1992-04-07 | クリーンルーム用密閉式コンテナ |
KR1019930004904A KR100273842B1 (ko) | 1992-04-07 | 1993-03-29 | 클린룸용 밀폐식 컨테이너 |
EP93105522A EP0565001B1 (en) | 1992-04-07 | 1993-04-02 | Closed container to be used in a clean room |
DE69304385T DE69304385T2 (de) | 1992-04-07 | 1993-04-02 | Geschlossener Behälter für Gebrauch in einem Reinraum |
US08/042,644 US5320218A (en) | 1992-04-07 | 1993-04-05 | Closed container to be used in a clean room |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8441192A JP3191392B2 (ja) | 1992-04-07 | 1992-04-07 | クリーンルーム用密閉式コンテナ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH05286567A JPH05286567A (ja) | 1993-11-02 |
JP3191392B2 true JP3191392B2 (ja) | 2001-07-23 |
Family
ID=13829852
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8441192A Expired - Fee Related JP3191392B2 (ja) | 1992-04-07 | 1992-04-07 | クリーンルーム用密閉式コンテナ |
Country Status (5)
Country | Link |
---|---|
US (1) | US5320218A (ja) |
EP (1) | EP0565001B1 (ja) |
JP (1) | JP3191392B2 (ja) |
KR (1) | KR100273842B1 (ja) |
DE (1) | DE69304385T2 (ja) |
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DE102021125523A1 (de) * | 2021-10-01 | 2023-04-06 | Körber Technologies Gmbh | Verfahren und Behälter zum Transportieren und/oder Lagern von flächigen Produken |
DE102023105346A1 (de) | 2023-03-03 | 2024-09-05 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein | Transporteinheit und Verfahren zur Bereitstellung eines Batteriematerials für die Batteriefertigung sowie Fertigungseinheit und Fertigungssystem |
Family Cites Families (6)
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JPS61291032A (ja) * | 1985-06-17 | 1986-12-20 | Fujitsu Ltd | 真空装置 |
US4724874A (en) * | 1986-05-01 | 1988-02-16 | Asyst Technologies | Sealable transportable container having a particle filtering system |
EP0313693B1 (en) * | 1987-10-28 | 1994-02-09 | Asyst Technologies | Sealable transportable container having a particle filtering system |
JPS6453544A (en) * | 1987-08-25 | 1989-03-01 | Mitsubishi Electric Corp | Semiconductor manufacturing apparatus |
JPH0712093B2 (ja) * | 1988-08-03 | 1995-02-08 | 信越半導体株式会社 | 発光半導体素子基板及びその製造方法 |
US5074736A (en) * | 1988-12-20 | 1991-12-24 | Texas Instruments Incorporated | Semiconductor wafer carrier design |
-
1992
- 1992-04-07 JP JP8441192A patent/JP3191392B2/ja not_active Expired - Fee Related
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1993
- 1993-03-29 KR KR1019930004904A patent/KR100273842B1/ko not_active IP Right Cessation
- 1993-04-02 EP EP93105522A patent/EP0565001B1/en not_active Expired - Lifetime
- 1993-04-02 DE DE69304385T patent/DE69304385T2/de not_active Expired - Fee Related
- 1993-04-05 US US08/042,644 patent/US5320218A/en not_active Expired - Lifetime
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EP0565001B1 (en) | 1996-09-04 |
KR100273842B1 (ko) | 2001-01-15 |
US5320218A (en) | 1994-06-14 |
DE69304385D1 (de) | 1996-10-10 |
JPH05286567A (ja) | 1993-11-02 |
KR930022515A (ko) | 1993-11-24 |
EP0565001A1 (en) | 1993-10-13 |
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