TW294820B - Gas distribution apparatus - Google Patents

Gas distribution apparatus Download PDF

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Publication number
TW294820B
TW294820B TW84107130A TW84107130A TW294820B TW 294820 B TW294820 B TW 294820B TW 84107130 A TW84107130 A TW 84107130A TW 84107130 A TW84107130 A TW 84107130A TW 294820 B TW294820 B TW 294820B
Authority
TW
Taiwan
Prior art keywords
plenum
gaseous substance
gas distribution
chamber
distribution apparatus
Prior art date
Application number
TW84107130A
Inventor
Petru N Nitescu
Richard H Matthiesen
Original Assignee
Watkins Johnson Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Watkins Johnson Co filed Critical Watkins Johnson Co
Priority to US49986195A priority Critical
Application granted granted Critical
Publication of TW294820B publication Critical patent/TW294820B/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber

Abstract

A gas distribution apparatus for delivering a gaseous substance to a chamber for processing semiconductor wafers. The apparatus includes at least one plenum formed for receiving a gaseous substance, a plenum body mountable to the chamber and having at least one conduit formed therein and a nozzle structure removably mounted to the plenum body. The conduit is coupled to the plenum for delivery of the gaseous substance to the plenum and the nozzle structure has a plurality of nozzles coupled to the plenum and configured for injection of the gaseous substance into the chamber.
TW84107130A 1995-07-10 1995-07-10 Gas distribution apparatus TW294820B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US49986195A true 1995-07-10 1995-07-10

Publications (1)

Publication Number Publication Date
TW294820B true TW294820B (en) 1997-01-01

Family

ID=23987048

Family Applications (1)

Application Number Title Priority Date Filing Date
TW84107130A TW294820B (en) 1995-07-10 1995-07-10 Gas distribution apparatus

Country Status (2)

Country Link
TW (1) TW294820B (en)
WO (1) WO1997003223A1 (en)

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US10283353B2 (en) 2017-03-29 2019-05-07 Asm Ip Holding B.V. Method of reforming insulating film deposited on substrate with recess pattern
US10529563B2 (en) 2017-03-29 2020-01-07 Asm Ip Holdings B.V. Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
US10446393B2 (en) 2017-05-08 2019-10-15 Asm Ip Holding B.V. Methods for forming silicon-containing epitaxial layers and related semiconductor device structures
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US10249524B2 (en) 2017-08-09 2019-04-02 Asm Ip Holding B.V. Cassette holder assembly for a substrate cassette and holding member for use in such assembly
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