TWM553518U - 馬達絕緣結構 - Google Patents

馬達絕緣結構 Download PDF

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TWM553518U
TWM553518U TW106210686U TW106210686U TWM553518U TW M553518 U TWM553518 U TW M553518U TW 106210686 U TW106210686 U TW 106210686U TW 106210686 U TW106210686 U TW 106210686U TW M553518 U TWM553518 U TW M553518U
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motor
insulation structure
motor housing
rotor
stator
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TW106210686U
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Qing Kui Xu
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Green Wind Technology Co Ltd
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馬達絕緣結構
本創作係有關於一種馬達絕緣結構,尤指一種可有效降低漏電流,並防止感應電流造成馬達損壞之馬達絕緣結構。
按,馬達可將電能轉換為機械能,而被廣泛運用於工業、民生、運輸等產業,諸如工具機、冷氣機、風扇、電動車等產品皆係以馬達作為主要動力來源。
現有馬達結構係主要於馬達殼體內設定子,並於定子鐵芯纏繞線圈,且於定子中央處設有轉子,又於轉子中心穿接軸桿,並使馬達殼體於相對軸桿處組設有軸承,以供軸桿端部與軸承穿設組接,藉此,當使用實施時,係通電予定子線圈,以使定子產生電磁場,並利用磁場間相互作用,帶動具磁性轉子旋轉,繼由轉子連動軸桿轉動,並藉由軸承支撐提高軸桿轉動順暢性。
然,現有馬達其定子鐵芯係緊貼結合於馬達殼體內面,由於馬達殼體係由金屬製成,另定子鐵芯也由矽鋼片等導體構成,因此,當定子線圈通電時,電流往往會經定子鐵芯傳導至與其緊密貼觸之馬達殼體,而造成漏電流現象,以致影響操作使用上安全性,再者,當轉子轉動時產生的感應電流係會經軸桿傳導至與其相接軸承上,而於軸承之滾珠表面發生尖端放電現象,造成滾珠表面熱熔形成凹凸粗糙狀,而失去滾動效果,如此一來,即導致轉子無法順利運轉,連帶使定子因電壓負荷過大等產生損壞,因此,現有馬達常使用一段時間即須進行維修,不僅造成維修成本負擔也造成使用不便性。
緣是,本創作人有鑑於現有馬達於使用上仍有上述缺失,乃藉其多年於相關領域的製造及設計經驗和知識的輔佐,並經多方巧思,研創出本創作。
本創作係有關於一種馬達絕緣結構,其主要目的係為了提供一種可有效降低漏電流,並防止感應電流造成馬達損壞之馬達絕緣結構。
為了達到上述實施目的,本創作人乃研擬如下馬達絕緣結構,係主要設有一馬達殼體,並使該馬達殼體成型有一容置空間,又於該馬達殼體之容置空間內容置有對應之定子及轉子,且使該馬達殼體之容置空間其壁面成型有數凹部及數凸部。
如上所述之馬達絕緣結構,其中,該馬達殼體其容置空間壁面之數凹部及數凸部係呈相鄰間隔設立。
如上所述之馬達絕緣結構,其中,該馬達絕緣結構係進一步包含一絕緣套,乃使該絕緣套容置於該馬達殼體之容置空間,並使該絕緣套遮蔽於該馬達殼體及定子間。
如上所述之馬達絕緣結構,其中,該定子係於其中央處形成一空置區間,且使該轉子位置於該定子之空置區間中。
如上所述之馬達絕緣結構,其中,該轉子係於其中心穿接有一軸桿,另使該馬達殼體二端相對該轉子其軸桿處各組設有一軸承,且使該軸承中央設一軸孔,又使該轉子其軸桿二端分別穿接於該二軸承之軸孔。
如上所述之馬達絕緣結構,其中,該馬達殼體係包含二殼部,並使該二殼部各形成有一容槽,又使該二殼部其容槽槽口一端對合組接,以使該二對接殼部其容槽共同形成該馬達殼體之容置空間,另使該二殼部其容槽槽壁各成型有該數凹部及數凸部。
如上所述之馬達絕緣結構,其中,該該馬達殼體其二殼部之容槽槽壁成型之該數凹部及數凸部係呈相鄰間隔設立。
如上所述之馬達絕緣結構,其中,該馬達絕緣結構係進一步包含一絕緣套,乃使該絕緣套容置於該馬達殼體之容置空間,並使該絕緣套遮蔽於該馬達殼體及定子間。
如上所述之馬達絕緣結構,其中,該定子係於其中央處形成一空置區間,且使該轉子位置於該定子之空置區間中。
如上所述之馬達絕緣結構,其中,該馬達殼體其二殼部之容槽槽底各成型有一套接部,又設有二軸承,並使該二軸承分別組設於該馬達殼體其二殼部之套接部中,另使該轉子中心穿接有一軸桿,並使該軸承中央設一軸孔,且使該轉子其軸桿二端分別穿接於該二軸承之軸孔。
藉此,本創作於實施時,利用該絕緣套設置,即可阻隔定子處電流傳導至馬達殼體,發生漏電流現象,另藉由馬達殼體其容置空間壁面凹凸設計,以將感應電流分成數小渦流後轉換成熱能散逸,據此,俾達到有效防止馬達損壞及提高馬達使用安全便利性者。
而為令本創作之技術手段及其所能達成之效果,能夠有更完整且清楚的揭露,茲詳細說明如下,請一併參閱揭露之圖式及圖號:
首先,請參閱第一、二圖所示,為本創作之馬達絕緣結構,係主要包含:
一馬達殼體(1),乃使該馬達殼體(1)包含二殼部(11),並使該二殼部(11)各形成有一容槽(12),且使該二殼部(11)其容槽(12)槽底各設有一套接部(13),又使該二殼部(11)其容槽(12)槽壁各成型有相鄰間隔設立之數凹部(14)及數凸部(15),並使該凸部(15)形成有一中空部(151),另使該二殼部(11)其容槽(12)槽口一端對合組接,並使該二對接殼部(11)其容槽(12)共同形成一容置空間;
一絕緣套(2),該絕緣套(2)係由塑膠材質製成,乃使該絕緣套(2)容置於該馬達殼體(1)之容置空間內,並使該絕緣套(2)外壁與該馬達殼體(1)其容置空間之凸部(15)壁面相接觸,又使該絕緣套(2)中央成型一通孔(21);
一定子(3),乃使該定子(3)設置於該絕緣套(2)之通孔(21)中,並與通孔(21)壁面相接觸,以使該絕緣套(2)遮蔽於該定子(3)及馬達殼體(1)間,又於該定子(3)其鐵芯(31)繞設有線圈(32),且使該定子(3)其鐵芯(31)於中央處形成一空置區間(33);
一轉子(4),係使該轉子(4)對應設置於該定子(3)之空置區間(33)中,並使該轉子(4)與該定子(3)其空置區間(33)保持一適當氣隙,又於該轉子(4)組設有數磁鐵,且於該轉子(4)中心穿接有一軸桿(41);
二軸承(5),該軸承(5)係為滾珠軸承,乃使該二軸承(5)分別套設於該馬達殼體(1)其二殼部(11)之套接部(13)中,並使該軸承(5)中央設有一軸孔(51),又使該轉子(4)其軸桿(41)二端分別穿接於該二軸承(5)之軸孔(51)。
據此,當使用實施時,係將電能傳送至定子(3)線圈(32),以使定子(3)產生電磁場,並利用磁場間相互作用,帶動具磁性轉子(4)旋轉,以由轉子(4)連動其軸桿(41)轉動,並藉由軸桿(41)二端穿接之軸承(5)支撐,以提高軸桿(41)轉動順暢性。
當定子(3)線圈(32)導通電流,而有電流傳導至定子(3)鐵芯(31)時,利用遮蔽於定子(3)與馬達殼體(1)之絕緣套(2)設置,即可阻隔傳導至定子(3)鐵芯(31)電流再傳導至該金屬材質馬達殼體(1),而發生漏電流現象,再者,當轉子(4)轉動產生感應電流時,該感應電流係會於馬達殼體(1)其容槽(12)呈凹部(14)與凸部(15)相間槽壁作用下,而於馬達殼體(1)其容槽(12)之各凸部(15)處形成繞著該凸部(15)其中空部(151)環繞之數小渦流,並轉換成熱能由馬達殼體(1)發散於外,藉此,即可將轉子(4)轉動產生感應電流予以削減,以有效防止感應電流經軸桿(41)傳導至與其相接軸承(5)上,造成軸承(5)內滾珠表面發生尖端放電,形成凹凸粗糙表面情形,如此,即可確保轉子(4)與定子(3)間順暢運轉,避免馬達於使用一段時間即發生損壞,須時常維修情形。
另本創作人係對本創作之馬達絕緣結構進行實務測試,其測試結果係顯示本創作可將馬達殼體(1)洩漏電壓控制在25伏特以下,另更測得轉子(4)其軸桿(41)處輸出感應電流為0,故由此可證,本創作之馬達絕緣結構係可將馬達漏電流現象大幅削減,並將感應電流有效消除,以降低馬達損壞率,並提高馬達使用上安全、便利性者。
前述之實施例或圖式並非限定本創作之馬達絕緣結構實施態樣,凡所屬技術領域中具有通常知識者所為之適當變化或修飾,皆應視為不脫離本創作之專利範疇。
由上述結構及實施方式可知,本創作係具有如下優點:
1.本創作之馬達絕緣結構係於馬達殼體及定子間設有一絕緣套,藉由絕緣套設置,即可阻隔定子處電流傳導至馬達殼體,發生漏電流現象,據此,以提高使用安全性。
2.本創作之馬達絕緣結構係於馬達殼體其容槽槽壁形成凹凸相間狀,藉此,以使轉子轉動產生感應電流,於該凹凸相間槽壁作用下,分成數小渦流並轉換成熱能型態散逸,以有效避免感應電流對馬達造成損壞者。
綜上所述,本創作之實施例確能達到所預期功效,又其所揭露之具體構造,不僅未曾見諸於同類產品中,亦未曾公開於申請前,誠已完全符合專利法之規定與要求,爰依法提出新型專利之申請,懇請惠予審查,並賜准專利,則實感德便。
(1)‧‧‧馬達殼體
(11)‧‧‧殼部
(12)‧‧‧容槽
(13)‧‧‧套接部
(14)‧‧‧凹部
(15)‧‧‧凸部
(151)‧‧‧中空部
(2)‧‧‧絕緣套
(21)‧‧‧通孔
(3)‧‧‧定子
(31)‧‧‧鐵芯
(32)‧‧‧線圈
(33)‧‧‧空置區間
(4)‧‧‧轉子
(41)‧‧‧軸桿
(5)‧‧‧軸承
(51)‧‧‧軸孔
第一圖:本創作之立體分解圖。
第二圖:本創作之剖視圖。
(1)‧‧‧馬達殼體
(11)‧‧‧殼部
(12)‧‧‧容槽
(13)‧‧‧套接部
(14)‧‧‧凹部
(15)‧‧‧凸部
(151)‧‧‧中空部
(2)‧‧‧絕緣套
(21)‧‧‧通孔
(3)‧‧‧定子
(31)‧‧‧鐵芯
(32)‧‧‧線圈
(33)‧‧‧空置區間
(4)‧‧‧轉子
(41)‧‧‧軸桿
(5)‧‧‧軸承
(51)‧‧‧軸孔

Claims (10)

  1. 一種馬達絕緣結構,係主要設有一馬達殼體,並使該馬達殼體成型有一容置空間,又於該馬達殼體之容置空間內容置有對應之定子及轉子,且使該馬達殼體之容置空間其壁面成型有數凹部及數凸部。
  2. 如申請專利範圍第1項所述馬達絕緣結構,其中,該馬達殼體其容置空間壁面之數凹部及數凸部係呈相鄰間隔設立。
  3. 如申請專利範圍第1項所述馬達絕緣結構,其中,該馬達絕緣結構係進一步包含一絕緣套,乃使該絕緣套容置於該馬達殼體之容置空間,並使該絕緣套遮蔽於該馬達殼體及定子間。
  4. 如申請專利範圍第1項所述馬達絕緣結構,其中,該定子係於其中央處形成一空置區間,且使該轉子位置於該定子之空置區間中。
  5. 如申請專利範圍第1項所述馬達絕緣結構,其中,該轉子係於其中心穿接有一軸桿,另使該馬達殼體二端相對該轉子其軸桿處各組設有一軸承,且使該軸承中央設一軸孔,又使該轉子其軸桿二端分別穿接於該二軸承之軸孔。
  6. 如申請專利範圍第1項所述馬達絕緣結構,其中,該馬達殼體係包含二殼部,並使該二殼部各形成有一容槽,又使該二殼部其容槽槽口一端對合組接,以使該二對接殼部其容槽共同形成該馬達殼體之容置空間,另使該二殼部其容槽槽壁各成型有該數凹部及數凸部。
  7. 如申請專利範圍第6項所述馬達絕緣結構,其中,該該馬達殼體其二殼部之容槽槽壁成型之該數凹部及數凸部係呈相鄰間隔設立。
  8. 如申請專利範圍第6項所述馬達絕緣結構,其中,該馬達絕緣結構係進一步包含一絕緣套,乃使該絕緣套容置於該馬達殼體之容置空間,並使該絕緣套遮蔽於該馬達殼體及定子間。
  9. 如申請專利範圍第6項所述馬達絕緣結構,其中,該定子係於其中央處形成一空置區間,且使該轉子位置於該定子之空置區間中。
  10. 如申請專利範圍第6項所述馬達絕緣結構,其中,該馬達殼體其二殼部之容槽槽底各成型有一套接部,又設有二軸承,並使該二軸承分別組設於該馬達殼體其二殼部之套接部中,另使該轉子中心穿接有一軸桿,並使該軸承中央設一軸孔,且使該轉子其軸桿二端分別穿接於該二軸承之軸孔。
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US11139308B2 (en) 2015-12-29 2021-10-05 Asm Ip Holding B.V. Atomic layer deposition of III-V compounds to form V-NAND devices
US11158513B2 (en) 2018-12-13 2021-10-26 Asm Ip Holding B.V. Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures
US11164955B2 (en) 2017-07-18 2021-11-02 Asm Ip Holding B.V. Methods for forming a semiconductor device structure and related semiconductor device structures
USD935572S1 (en) 2019-05-24 2021-11-09 Asm Ip Holding B.V. Gas channel plate
US11168395B2 (en) 2018-06-29 2021-11-09 Asm Ip Holding B.V. Temperature-controlled flange and reactor system including same
US11171025B2 (en) 2019-01-22 2021-11-09 Asm Ip Holding B.V. Substrate processing device
US11205585B2 (en) 2016-07-28 2021-12-21 Asm Ip Holding B.V. Substrate processing apparatus and method of operating the same
US11217444B2 (en) 2018-11-30 2022-01-04 Asm Ip Holding B.V. Method for forming an ultraviolet radiation responsive metal oxide-containing film
US11222772B2 (en) 2016-12-14 2022-01-11 Asm Ip Holding B.V. Substrate processing apparatus
USD940837S1 (en) 2019-08-22 2022-01-11 Asm Ip Holding B.V. Electrode
US11227789B2 (en) 2019-02-20 2022-01-18 Asm Ip Holding B.V. Method and apparatus for filling a recess formed within a substrate surface
US11227782B2 (en) 2019-07-31 2022-01-18 Asm Ip Holding B.V. Vertical batch furnace assembly
US11232963B2 (en) 2018-10-03 2022-01-25 Asm Ip Holding B.V. Substrate processing apparatus and method
US11233133B2 (en) 2015-10-21 2022-01-25 Asm Ip Holding B.V. NbMC layers
US11230766B2 (en) 2018-03-29 2022-01-25 Asm Ip Holding B.V. Substrate processing apparatus and method
US11244825B2 (en) 2018-11-16 2022-02-08 Asm Ip Holding B.V. Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process
US11251035B2 (en) 2016-12-22 2022-02-15 Asm Ip Holding B.V. Method of forming a structure on a substrate
US11251068B2 (en) 2018-10-19 2022-02-15 Asm Ip Holding B.V. Substrate processing apparatus and substrate processing method
US11251040B2 (en) 2019-02-20 2022-02-15 Asm Ip Holding B.V. Cyclical deposition method including treatment step and apparatus for same
USD944946S1 (en) 2019-06-14 2022-03-01 Asm Ip Holding B.V. Shower plate
US11270899B2 (en) 2018-06-04 2022-03-08 Asm Ip Holding B.V. Wafer handling chamber with moisture reduction
US11274369B2 (en) 2018-09-11 2022-03-15 Asm Ip Holding B.V. Thin film deposition method
US11282698B2 (en) 2019-07-19 2022-03-22 Asm Ip Holding B.V. Method of forming topology-controlled amorphous carbon polymer film
US11289326B2 (en) 2019-05-07 2022-03-29 Asm Ip Holding B.V. Method for reforming amorphous carbon polymer film
US11286562B2 (en) 2018-06-08 2022-03-29 Asm Ip Holding B.V. Gas-phase chemical reactor and method of using same
US11286558B2 (en) 2019-08-23 2022-03-29 Asm Ip Holding B.V. Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
USD947913S1 (en) 2019-05-17 2022-04-05 Asm Ip Holding B.V. Susceptor shaft
US11295980B2 (en) 2017-08-30 2022-04-05 Asm Ip Holding B.V. Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
US11296189B2 (en) 2018-06-21 2022-04-05 Asm Ip Holding B.V. Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
USD949319S1 (en) 2019-08-22 2022-04-19 Asm Ip Holding B.V. Exhaust duct
US11306395B2 (en) 2017-06-28 2022-04-19 Asm Ip Holding B.V. Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
US11315794B2 (en) 2019-10-21 2022-04-26 Asm Ip Holding B.V. Apparatus and methods for selectively etching films
US11339476B2 (en) 2019-10-08 2022-05-24 Asm Ip Holding B.V. Substrate processing device having connection plates, substrate processing method
US11342216B2 (en) 2019-02-20 2022-05-24 Asm Ip Holding B.V. Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
US11345999B2 (en) 2019-06-06 2022-05-31 Asm Ip Holding B.V. Method of using a gas-phase reactor system including analyzing exhausted gas
US11355338B2 (en) 2019-05-10 2022-06-07 Asm Ip Holding B.V. Method of depositing material onto a surface and structure formed according to the method
US11361990B2 (en) 2018-05-28 2022-06-14 Asm Ip Holding B.V. Substrate processing method and device manufactured by using the same
US11374112B2 (en) 2017-07-19 2022-06-28 Asm Ip Holding B.V. Method for depositing a group IV semiconductor and related semiconductor device structures
US11378337B2 (en) 2019-03-28 2022-07-05 Asm Ip Holding B.V. Door opener and substrate processing apparatus provided therewith
US11387120B2 (en) 2017-09-28 2022-07-12 Asm Ip Holding B.V. Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
US11387106B2 (en) 2018-02-14 2022-07-12 Asm Ip Holding B.V. Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
US11393690B2 (en) 2018-01-19 2022-07-19 Asm Ip Holding B.V. Deposition method
US11390945B2 (en) 2019-07-03 2022-07-19 Asm Ip Holding B.V. Temperature control assembly for substrate processing apparatus and method of using same
US11390950B2 (en) 2017-01-10 2022-07-19 Asm Ip Holding B.V. Reactor system and method to reduce residue buildup during a film deposition process
US11390946B2 (en) 2019-01-17 2022-07-19 Asm Ip Holding B.V. Methods of forming a transition metal containing film on a substrate by a cyclical deposition process
US11398382B2 (en) 2018-03-27 2022-07-26 Asm Ip Holding B.V. Method of forming an electrode on a substrate and a semiconductor device structure including an electrode
US11396702B2 (en) 2016-11-15 2022-07-26 Asm Ip Holding B.V. Gas supply unit and substrate processing apparatus including the gas supply unit
US11401605B2 (en) 2019-11-26 2022-08-02 Asm Ip Holding B.V. Substrate processing apparatus
US11410851B2 (en) 2017-02-15 2022-08-09 Asm Ip Holding B.V. Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
US11411088B2 (en) 2018-11-16 2022-08-09 Asm Ip Holding B.V. Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
US11414760B2 (en) 2018-10-08 2022-08-16 Asm Ip Holding B.V. Substrate support unit, thin film deposition apparatus including the same, and substrate processing apparatus including the same
US11417545B2 (en) 2017-08-08 2022-08-16 Asm Ip Holding B.V. Radiation shield
US11424119B2 (en) 2019-03-08 2022-08-23 Asm Ip Holding B.V. Method for selective deposition of silicon nitride layer and structure including selectively-deposited silicon nitride layer
US11430674B2 (en) 2018-08-22 2022-08-30 Asm Ip Holding B.V. Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
US11430640B2 (en) 2019-07-30 2022-08-30 Asm Ip Holding B.V. Substrate processing apparatus
US11437241B2 (en) 2020-04-08 2022-09-06 Asm Ip Holding B.V. Apparatus and methods for selectively etching silicon oxide films
US11443926B2 (en) 2019-07-30 2022-09-13 Asm Ip Holding B.V. Substrate processing apparatus
US11447864B2 (en) 2019-04-19 2022-09-20 Asm Ip Holding B.V. Layer forming method and apparatus
US11447861B2 (en) 2016-12-15 2022-09-20 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus and a method of forming a patterned structure
US11450529B2 (en) 2019-11-26 2022-09-20 Asm Ip Holding B.V. Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
USD965044S1 (en) 2019-08-19 2022-09-27 Asm Ip Holding B.V. Susceptor shaft
USD965524S1 (en) 2019-08-19 2022-10-04 Asm Ip Holding B.V. Susceptor support
US11469098B2 (en) 2018-05-08 2022-10-11 Asm Ip Holding B.V. Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures
US11473195B2 (en) 2018-03-01 2022-10-18 Asm Ip Holding B.V. Semiconductor processing apparatus and a method for processing a substrate
US11476109B2 (en) 2019-06-11 2022-10-18 Asm Ip Holding B.V. Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method
US11482418B2 (en) 2018-02-20 2022-10-25 Asm Ip Holding B.V. Substrate processing method and apparatus
US11482533B2 (en) 2019-02-20 2022-10-25 Asm Ip Holding B.V. Apparatus and methods for plug fill deposition in 3-D NAND applications
US11482412B2 (en) 2018-01-19 2022-10-25 Asm Ip Holding B.V. Method for depositing a gap-fill layer by plasma-assisted deposition
US11488819B2 (en) 2018-12-04 2022-11-01 Asm Ip Holding B.V. Method of cleaning substrate processing apparatus
US11488854B2 (en) 2020-03-11 2022-11-01 Asm Ip Holding B.V. Substrate handling device with adjustable joints
US11495459B2 (en) 2019-09-04 2022-11-08 Asm Ip Holding B.V. Methods for selective deposition using a sacrificial capping layer
US11492703B2 (en) 2018-06-27 2022-11-08 Asm Ip Holding B.V. Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
US11501968B2 (en) 2019-11-15 2022-11-15 Asm Ip Holding B.V. Method for providing a semiconductor device with silicon filled gaps
US11501973B2 (en) 2018-01-16 2022-11-15 Asm Ip Holding B.V. Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures
US11499222B2 (en) 2018-06-27 2022-11-15 Asm Ip Holding B.V. Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
US11499226B2 (en) 2018-11-02 2022-11-15 Asm Ip Holding B.V. Substrate supporting unit and a substrate processing device including the same
US11501956B2 (en) 2012-10-12 2022-11-15 Asm Ip Holding B.V. Semiconductor reaction chamber showerhead
US11515188B2 (en) 2019-05-16 2022-11-29 Asm Ip Holding B.V. Wafer boat handling device, vertical batch furnace and method
US11515187B2 (en) 2020-05-01 2022-11-29 Asm Ip Holding B.V. Fast FOUP swapping with a FOUP handler
US11521851B2 (en) 2020-02-03 2022-12-06 Asm Ip Holding B.V. Method of forming structures including a vanadium or indium layer
US11527403B2 (en) 2019-12-19 2022-12-13 Asm Ip Holding B.V. Methods for filling a gap feature on a substrate surface and related semiconductor structures
US11527400B2 (en) 2019-08-23 2022-12-13 Asm Ip Holding B.V. Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane
US11530876B2 (en) 2020-04-24 2022-12-20 Asm Ip Holding B.V. Vertical batch furnace assembly comprising a cooling gas supply
US11532757B2 (en) 2016-10-27 2022-12-20 Asm Ip Holding B.V. Deposition of charge trapping layers
US11530483B2 (en) 2018-06-21 2022-12-20 Asm Ip Holding B.V. Substrate processing system
US11551925B2 (en) 2019-04-01 2023-01-10 Asm Ip Holding B.V. Method for manufacturing a semiconductor device
US11551912B2 (en) 2020-01-20 2023-01-10 Asm Ip Holding B.V. Method of forming thin film and method of modifying surface of thin film
USD975665S1 (en) 2019-05-17 2023-01-17 Asm Ip Holding B.V. Susceptor shaft
US11557474B2 (en) 2019-07-29 2023-01-17 Asm Ip Holding B.V. Methods for selective deposition utilizing n-type dopants and/or alternative dopants to achieve high dopant incorporation
US11562901B2 (en) 2019-09-25 2023-01-24 Asm Ip Holding B.V. Substrate processing method
US11572620B2 (en) 2018-11-06 2023-02-07 Asm Ip Holding B.V. Methods for selectively depositing an amorphous silicon film on a substrate
US11581186B2 (en) 2016-12-15 2023-02-14 Asm Ip Holding B.V. Sequential infiltration synthesis apparatus
US11587814B2 (en) 2019-07-31 2023-02-21 Asm Ip Holding B.V. Vertical batch furnace assembly
US11587815B2 (en) 2019-07-31 2023-02-21 Asm Ip Holding B.V. Vertical batch furnace assembly
US11587821B2 (en) 2017-08-08 2023-02-21 Asm Ip Holding B.V. Substrate lift mechanism and reactor including same
US11594450B2 (en) 2019-08-22 2023-02-28 Asm Ip Holding B.V. Method for forming a structure with a hole
US11594600B2 (en) 2019-11-05 2023-02-28 Asm Ip Holding B.V. Structures with doped semiconductor layers and methods and systems for forming same
USD980814S1 (en) 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus
US11605528B2 (en) 2019-07-09 2023-03-14 Asm Ip Holding B.V. Plasma device using coaxial waveguide, and substrate treatment method
USD980813S1 (en) 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
US11610775B2 (en) 2016-07-28 2023-03-21 Asm Ip Holding B.V. Method and apparatus for filling a gap
US11610774B2 (en) 2019-10-02 2023-03-21 Asm Ip Holding B.V. Methods for forming a topographically selective silicon oxide film by a cyclical plasma-enhanced deposition process
US11615970B2 (en) 2019-07-17 2023-03-28 Asm Ip Holding B.V. Radical assist ignition plasma system and method
USD981973S1 (en) 2021-05-11 2023-03-28 Asm Ip Holding B.V. Reactor wall for substrate processing apparatus
US11626308B2 (en) 2020-05-13 2023-04-11 Asm Ip Holding B.V. Laser alignment fixture for a reactor system
US11626316B2 (en) 2019-11-20 2023-04-11 Asm Ip Holding B.V. Method of depositing carbon-containing material on a surface of a substrate, structure formed using the method, and system for forming the structure
US11629407B2 (en) 2019-02-22 2023-04-18 Asm Ip Holding B.V. Substrate processing apparatus and method for processing substrates
US11629406B2 (en) 2018-03-09 2023-04-18 Asm Ip Holding B.V. Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate
US11637014B2 (en) 2019-10-17 2023-04-25 Asm Ip Holding B.V. Methods for selective deposition of doped semiconductor material
US11637011B2 (en) 2019-10-16 2023-04-25 Asm Ip Holding B.V. Method of topology-selective film formation of silicon oxide
US11639548B2 (en) 2019-08-21 2023-05-02 Asm Ip Holding B.V. Film-forming material mixed-gas forming device and film forming device
US11639811B2 (en) 2017-11-27 2023-05-02 Asm Ip Holding B.V. Apparatus including a clean mini environment
US11646205B2 (en) 2019-10-29 2023-05-09 Asm Ip Holding B.V. Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same
US11646204B2 (en) 2020-06-24 2023-05-09 Asm Ip Holding B.V. Method for forming a layer provided with silicon
US11646184B2 (en) 2019-11-29 2023-05-09 Asm Ip Holding B.V. Substrate processing apparatus
US11646197B2 (en) 2018-07-03 2023-05-09 Asm Ip Holding B.V. Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US11643724B2 (en) 2019-07-18 2023-05-09 Asm Ip Holding B.V. Method of forming structures using a neutral beam
US11644758B2 (en) 2020-07-17 2023-05-09 Asm Ip Holding B.V. Structures and methods for use in photolithography
US11649546B2 (en) 2016-07-08 2023-05-16 Asm Ip Holding B.V. Organic reactants for atomic layer deposition
US11658029B2 (en) 2018-12-14 2023-05-23 Asm Ip Holding B.V. Method of forming a device structure using selective deposition of gallium nitride and system for same
US11658035B2 (en) 2020-06-30 2023-05-23 Asm Ip Holding B.V. Substrate processing method
US11664199B2 (en) 2018-10-19 2023-05-30 Asm Ip Holding B.V. Substrate processing apparatus and substrate processing method
US11664245B2 (en) 2019-07-16 2023-05-30 Asm Ip Holding B.V. Substrate processing device
US11664267B2 (en) 2019-07-10 2023-05-30 Asm Ip Holding B.V. Substrate support assembly and substrate processing device including the same
US11676812B2 (en) 2016-02-19 2023-06-13 Asm Ip Holding B.V. Method for forming silicon nitride film selectively on top/bottom portions
US11674220B2 (en) 2020-07-20 2023-06-13 Asm Ip Holding B.V. Method for depositing molybdenum layers using an underlayer
US11680839B2 (en) 2019-08-05 2023-06-20 Asm Ip Holding B.V. Liquid level sensor for a chemical source vessel
US11688603B2 (en) 2019-07-17 2023-06-27 Asm Ip Holding B.V. Methods of forming silicon germanium structures
USD990441S1 (en) 2021-09-07 2023-06-27 Asm Ip Holding B.V. Gas flow control plate
USD990534S1 (en) 2020-09-11 2023-06-27 Asm Ip Holding B.V. Weighted lift pin
US11685991B2 (en) 2018-02-14 2023-06-27 Asm Ip Holding B.V. Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
US11694892B2 (en) 2016-07-28 2023-07-04 Asm Ip Holding B.V. Method and apparatus for filling a gap
US11705333B2 (en) 2020-05-21 2023-07-18 Asm Ip Holding B.V. Structures including multiple carbon layers and methods of forming and using same
US11718913B2 (en) 2018-06-04 2023-08-08 Asm Ip Holding B.V. Gas distribution system and reactor system including same
US11725280B2 (en) 2020-08-26 2023-08-15 Asm Ip Holding B.V. Method for forming metal silicon oxide and metal silicon oxynitride layers
US11725277B2 (en) 2011-07-20 2023-08-15 Asm Ip Holding B.V. Pressure transmitter for a semiconductor processing environment
US11735414B2 (en) 2018-02-06 2023-08-22 Asm Ip Holding B.V. Method of post-deposition treatment for silicon oxide film
US11735422B2 (en) 2019-10-10 2023-08-22 Asm Ip Holding B.V. Method of forming a photoresist underlayer and structure including same
US11742198B2 (en) 2019-03-08 2023-08-29 Asm Ip Holding B.V. Structure including SiOCN layer and method of forming same
US11742189B2 (en) 2015-03-12 2023-08-29 Asm Ip Holding B.V. Multi-zone reactor, system including the reactor, and method of using the same
US11769682B2 (en) 2017-08-09 2023-09-26 Asm Ip Holding B.V. Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
US11767589B2 (en) 2020-05-29 2023-09-26 Asm Ip Holding B.V. Substrate processing device
US11776846B2 (en) 2020-02-07 2023-10-03 Asm Ip Holding B.V. Methods for depositing gap filling fluids and related systems and devices
US11781243B2 (en) 2020-02-17 2023-10-10 Asm Ip Holding B.V. Method for depositing low temperature phosphorous-doped silicon
US11781221B2 (en) 2019-05-07 2023-10-10 Asm Ip Holding B.V. Chemical source vessel with dip tube
US11795545B2 (en) 2014-10-07 2023-10-24 Asm Ip Holding B.V. Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
US11804364B2 (en) 2020-05-19 2023-10-31 Asm Ip Holding B.V. Substrate processing apparatus
US11802338B2 (en) 2017-07-26 2023-10-31 Asm Ip Holding B.V. Chemical treatment, deposition and/or infiltration apparatus and method for using the same
US11804388B2 (en) 2018-09-11 2023-10-31 Asm Ip Holding B.V. Substrate processing apparatus and method
US11810788B2 (en) 2016-11-01 2023-11-07 Asm Ip Holding B.V. Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
US11814747B2 (en) 2019-04-24 2023-11-14 Asm Ip Holding B.V. Gas-phase reactor system-with a reaction chamber, a solid precursor source vessel, a gas distribution system, and a flange assembly
US11823866B2 (en) 2020-04-02 2023-11-21 Asm Ip Holding B.V. Thin film forming method
US11823876B2 (en) 2019-09-05 2023-11-21 Asm Ip Holding B.V. Substrate processing apparatus
US11821078B2 (en) 2020-04-15 2023-11-21 Asm Ip Holding B.V. Method for forming precoat film and method for forming silicon-containing film
US11830730B2 (en) 2017-08-29 2023-11-28 Asm Ip Holding B.V. Layer forming method and apparatus
US11827981B2 (en) 2020-10-14 2023-11-28 Asm Ip Holding B.V. Method of depositing material on stepped structure
US11830738B2 (en) 2020-04-03 2023-11-28 Asm Ip Holding B.V. Method for forming barrier layer and method for manufacturing semiconductor device
US11828707B2 (en) 2020-02-04 2023-11-28 Asm Ip Holding B.V. Method and apparatus for transmittance measurements of large articles
US11840761B2 (en) 2019-12-04 2023-12-12 Asm Ip Holding B.V. Substrate processing apparatus
US11848200B2 (en) 2017-05-08 2023-12-19 Asm Ip Holding B.V. Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
US11873557B2 (en) 2020-10-22 2024-01-16 Asm Ip Holding B.V. Method of depositing vanadium metal
US11885013B2 (en) 2019-12-17 2024-01-30 Asm Ip Holding B.V. Method of forming vanadium nitride layer and structure including the vanadium nitride layer
US11887857B2 (en) 2020-04-24 2024-01-30 Asm Ip Holding B.V. Methods and systems for depositing a layer comprising vanadium, nitrogen, and a further element
US11885023B2 (en) 2018-10-01 2024-01-30 Asm Ip Holding B.V. Substrate retaining apparatus, system including the apparatus, and method of using same
USD1012873S1 (en) 2020-09-24 2024-01-30 Asm Ip Holding B.V. Electrode for semiconductor processing apparatus
US11885020B2 (en) 2020-12-22 2024-01-30 Asm Ip Holding B.V. Transition metal deposition method
US11891696B2 (en) 2020-11-30 2024-02-06 Asm Ip Holding B.V. Injector configured for arrangement within a reaction chamber of a substrate processing apparatus
US11898243B2 (en) 2020-04-24 2024-02-13 Asm Ip Holding B.V. Method of forming vanadium nitride-containing layer
US11901179B2 (en) 2020-10-28 2024-02-13 Asm Ip Holding B.V. Method and device for depositing silicon onto substrates
US11923181B2 (en) 2019-11-29 2024-03-05 Asm Ip Holding B.V. Substrate processing apparatus for minimizing the effect of a filling gas during substrate processing
US11923190B2 (en) 2018-07-03 2024-03-05 Asm Ip Holding B.V. Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
US11929251B2 (en) 2019-12-02 2024-03-12 Asm Ip Holding B.V. Substrate processing apparatus having electrostatic chuck and substrate processing method
US11939673B2 (en) 2018-02-23 2024-03-26 Asm Ip Holding B.V. Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment
US11946137B2 (en) 2020-12-16 2024-04-02 Asm Ip Holding B.V. Runout and wobble measurement fixtures
US11959168B2 (en) 2020-04-29 2024-04-16 Asm Ip Holding B.V. Solid source precursor vessel
US11961741B2 (en) 2020-03-12 2024-04-16 Asm Ip Holding B.V. Method for fabricating layer structure having target topological profile
US11967488B2 (en) 2013-02-01 2024-04-23 Asm Ip Holding B.V. Method for treatment of deposition reactor
US11976359B2 (en) 2020-01-06 2024-05-07 Asm Ip Holding B.V. Gas supply assembly, components thereof, and reactor system including same
US11987881B2 (en) 2020-05-22 2024-05-21 Asm Ip Holding B.V. Apparatus for depositing thin films using hydrogen peroxide
US11986868B2 (en) 2020-02-28 2024-05-21 Asm Ip Holding B.V. System dedicated for parts cleaning
US11996309B2 (en) 2019-05-16 2024-05-28 Asm Ip Holding B.V. Wafer boat handling device, vertical batch furnace and method
US11993847B2 (en) 2020-01-08 2024-05-28 Asm Ip Holding B.V. Injector
US11996289B2 (en) 2020-04-16 2024-05-28 Asm Ip Holding B.V. Methods of forming structures including silicon germanium and silicon layers, devices formed using the methods, and systems for performing the methods
US11996292B2 (en) 2019-10-25 2024-05-28 Asm Ip Holding B.V. Methods for filling a gap feature on a substrate surface and related semiconductor structures
US12009224B2 (en) 2020-09-29 2024-06-11 Asm Ip Holding B.V. Apparatus and method for etching metal nitrides
US12006572B2 (en) 2019-10-08 2024-06-11 Asm Ip Holding B.V. Reactor system including a gas distribution assembly for use with activated species and method of using same
US12009241B2 (en) 2019-10-14 2024-06-11 Asm Ip Holding B.V. Vertical batch furnace assembly with detector to detect cassette
US12020934B2 (en) 2020-07-08 2024-06-25 Asm Ip Holding B.V. Substrate processing method
US12027365B2 (en) 2020-11-24 2024-07-02 Asm Ip Holding B.V. Methods for filling a gap and related systems and devices
US12025484B2 (en) 2018-05-08 2024-07-02 Asm Ip Holding B.V. Thin film forming method
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US11725277B2 (en) 2011-07-20 2023-08-15 Asm Ip Holding B.V. Pressure transmitter for a semiconductor processing environment
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US12107005B2 (en) 2020-10-06 2024-10-01 Asm Ip Holding B.V. Deposition method and an apparatus for depositing a silicon-containing material
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USD980813S1 (en) 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
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