JP6136613B2 - プラズマ処理方法 - Google Patents
プラズマ処理方法 Download PDFInfo
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- JP6136613B2 JP6136613B2 JP2013125684A JP2013125684A JP6136613B2 JP 6136613 B2 JP6136613 B2 JP 6136613B2 JP 2013125684 A JP2013125684 A JP 2013125684A JP 2013125684 A JP2013125684 A JP 2013125684A JP 6136613 B2 JP6136613 B2 JP 6136613B2
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- 238000003672 processing method Methods 0.000 title claims description 9
- 239000007789 gas Substances 0.000 claims description 184
- 238000012545 processing Methods 0.000 claims description 175
- 238000000034 method Methods 0.000 claims description 49
- 239000000758 substrate Substances 0.000 claims description 36
- 230000008569 process Effects 0.000 claims description 33
- 230000008878 coupling Effects 0.000 claims description 28
- 238000010168 coupling process Methods 0.000 claims description 28
- 238000005859 coupling reaction Methods 0.000 claims description 28
- 239000012495 reaction gas Substances 0.000 claims description 15
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 238000011282 treatment Methods 0.000 claims description 2
- 230000007246 mechanism Effects 0.000 description 128
- 235000012431 wafers Nutrition 0.000 description 104
- 210000002381 plasma Anatomy 0.000 description 95
- 239000010408 film Substances 0.000 description 81
- 238000006243 chemical reaction Methods 0.000 description 41
- 230000015572 biosynthetic process Effects 0.000 description 29
- 230000000694 effects Effects 0.000 description 26
- 239000010409 thin film Substances 0.000 description 21
- 150000002500 ions Chemical class 0.000 description 20
- 238000001179 sorption measurement Methods 0.000 description 18
- 230000009471 action Effects 0.000 description 17
- 239000002994 raw material Substances 0.000 description 17
- 238000000926 separation method Methods 0.000 description 14
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 12
- 239000007795 chemical reaction product Substances 0.000 description 12
- -1 oxygen radicals Chemical class 0.000 description 12
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 11
- 239000001301 oxygen Substances 0.000 description 11
- 229910052760 oxygen Inorganic materials 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- 239000011162 core material Substances 0.000 description 10
- 238000012546 transfer Methods 0.000 description 10
- 229910052581 Si3N4 Inorganic materials 0.000 description 9
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000000231 atomic layer deposition Methods 0.000 description 8
- 150000002831 nitrogen free-radicals Chemical class 0.000 description 8
- 229910052814 silicon oxide Inorganic materials 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 7
- 238000009832 plasma treatment Methods 0.000 description 6
- 238000000280 densification Methods 0.000 description 5
- 238000010926 purge Methods 0.000 description 5
- 238000003860 storage Methods 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 238000011144 upstream manufacturing Methods 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 229910001882 dioxygen Inorganic materials 0.000 description 3
- 230000003028 elevating effect Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002052 molecular layer Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- CJNBYAVZURUTKZ-UHFFFAOYSA-N hafnium(IV) oxide Inorganic materials O=[Hf]=O CJNBYAVZURUTKZ-UHFFFAOYSA-N 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
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- C—CHEMISTRY; METALLURGY
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- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
- C23C16/45536—Use of plasma, radiation or electromagnetic fields
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
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- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
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- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/32174—Circuits specially adapted for controlling the RF discharge
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- H—ELECTRICITY
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- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
- H01J37/32669—Particular magnets or magnet arrangements for controlling the discharge
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02164—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon oxide, e.g. SiO2
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/0217—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz
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- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/02274—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
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- H01L21/02107—Forming insulating materials on a substrate
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- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/0228—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
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Description
特許文献1には、処理チャンバの外側にダイポールリング磁石を配置した装置が記載されているが、既述の課題については検討されていない。
基板の載置部をなす下部電極と前記載置部に対向する上部電極とを備えたプラズマ処理装置を用い、凹部が形成された半導体デバイス製造用の基板にプラズマを用いて成膜する方法において、
処理容器内に設けられた載置部に、基板を載置する工程と、
前記処理容器内を真空排気する工程と、
次いで、前記処理容器内に処理ガスを供給する工程と、
続いて、処理ガスを高周波電力によりプラズマ化してプラズマを得る工程と、
平面で見た時に基板の周縁を囲む磁力線のループが形成されないように、当該基板の周縁における少なくとも一箇所の磁力線が開口する磁場を処理雰囲気に形成して、処理ガスのプラズマ中における電子を基板の表面に沿う方向に移動させる工程と、を含み、
前記プラズマを得る工程は、電気的なカップリングの状態を、高周波電源を前記上部電極に接続したアノードカップリングの状態と、前記高周波電源を前記下部電極に接続したカソードカップリングの状態と、の間で交互に切り替える工程を含むことを特徴とする。
前記移動させる工程の後、処理雰囲気における磁力線を切り替えることにより、前記電子の移動方向を、前記方向とは異なる方向で且つ基板の表面に沿う方向に切り替える工程を行っても良い。前記移動させる工程は、前記磁場を形成した時のプラズマ密度及び当該磁場を形成しない時におけるプラズマ密度を夫々P1及びP2とすると、P1とP2とがほぼ等しくなっていても良い。
本発明のプラズマ処理装置の第1の実施の形態の一例について、図1〜図3を参照して説明する。始めにこのプラズマ処理装置の概略について簡単に説明すると、この装置は、互いに反応する複数種類この例では2種類の処理ガスのプラズマをウエハWに対して順番に(交互に)供給して反応生成物を積層するALD法により薄膜を成膜する成膜装置として構成されている。そして、数十あるいは数百程度もの大きさのアスペクトレシオを持つ凹部が形成されているウエハWであっても、当該凹部の内壁面における薄膜について、ウエハの水平面と同レベルの膜厚及び膜質で成膜出来るように構成されている。続いて、成膜装置の構成及びこの成膜装置を用いた成膜方法について、以下に説明する。
(a)平面で見た時に、ウエハWを囲む環状の磁力線が形成されていない
(b)複数の磁場形成機構20のうち一の磁場形成機構20と、当該一の磁場形成機構20に隣接する他の磁場形成機構20との間では、平面で見た時に、これら一の磁場形成機構20と他の磁場形成機構20とを接続する磁力線が形成されていない
(c)平面で見た時に、磁力線は、ウエハWの周縁における少なくとも一箇所が開口している
(d)ウエハWの外側におけるある任意の位置から、当該ウエハWの周囲を一回りするように磁力線をたどろうとしても、元の位置に戻ることができない
処理容器1の床面近傍における側壁面には、当該処理容器1内を真空排気するための排気口31が形成されており、この排気口31から伸びる排気路32には、バタフライバルブなどの圧力調整部33を介して排気機構をなす真空ポンプ34が接続されている。
更に、磁場形成機構20を処理容器1の外部に配置していることから、金属のコンタミ混入を抑えて成膜処理を行うことができる。
こうして通電する磁場形成機構20、20を周方向に沿って順次切り替えていくと、水平方向に沿って形成される磁力線について、処理容器1の中心を鉛直方向に伸びる軸の周りにいわば回転するので、既述の例と同様の効果が得られる。
以上説明した例において、載置部2にウエハWを載置するにあたり、当該載置部2に図示しない静電チャックを埋設して、ウエハWを載置部2に静電吸着しても良い。
続いて、本発明の第2の実施の形態として、複数枚例えば5枚のウエハWに対して共通の処理容器内にて同時に成膜を行うセミバッチタイプの装置について図40〜図44を参照して説明する。この装置は、平面形状が概ね円形である処理容器をなす真空容器101と、この真空容器101内に設けられ、当該真空容器101の中心に回転中心を有する載置部である回転テーブル102とを備えている。真空容器101の天板111の上面側における中央部には、真空容器101内の中心部領域Cにおいて互いに異なる処理ガス同士が混ざり合うことを抑制するために、窒素(N2)ガスを供給するための分離ガス供給管151が接続されている。図40中113は、シール部材例えばOリングであり、107は真空容器101の底面部114と回転テーブル102との間に設けられたヒータユニットである。また、図40中173は、ヒータユニット107の配置空間をパージするためのパージガス供給管である。
こうして既述の例と同様に真空容器101内における磁場を切り替えながら回転テーブル102を多数回に亘って回転させることにより、各々のウエハWにおいて、反応層52が多層に亘って積層されて薄膜が形成される。
続いて、本発明の第3の実施の形態について、多数枚例えば150枚のウエハWに対して一括して成膜処理を行うバッチ式の装置について図51及び図52を参照して説明する。この装置は、ウエハWを棚状に積載するための載置部をなすウエハボート201と、このウエハボート201を内部に気密に収納して成膜処理を行うための縦型の処理容器である反応管202とを備えている。反応管202の外側には加熱炉本体204が設けられており、この加熱炉本体204の内壁面には周方向に亘って加熱部であるヒータ203が配置されている。
以上の各例において、処理容器1(真空容器101、反応管202)の内部に形成する磁場の強度としては、0.1mT/cm〜1T/cmである。ここで、以上の各例では、プラズマ処理の途中において、処理容器1(真空容器101、反応管202)の内部における磁力線を切り替えたが、0.25mT/cm〜0.75mT/cm程度の弱磁場であれば、電子やイオンが蛇行する。従って、前記弱磁場を処理容器1内に形成する場合には、磁力線を切り替えなくても、既述の各例と同様の効果が得られる。
(成膜条件)
成膜温度:R.T.(室温)
処理圧力:66.66Pa(0.5Torr)
原料ガス:BDEAS(ビスジエチルアミノシラン)ガス
反応ガス:O2=1000sccm
その他ガス:Ar=500sccm
磁場強度:0.26mT/cm(ただし、ウエハの中心位置における強度)
ALDの処理サイクル数:120サイクル
プラズマ発生用の高周波電力:1000W
プラズマ発生用の高周波周波数:13.56MHz
その結果、図53に示すように、磁場を発生させずに成膜処理を行った場合には、トレンチ(溝)の内部では、ウエハWの表面(平坦面)と比べて、フッ酸に溶解しやすくなっており、従ってそれ程膜密度が高くなっていないことが分かる。一方、弱磁場を形成しながら成膜処理を行った場合には、ウエハWの表面及びトレンチの内部のいずれにおいても、フッ酸に対する溶解度が同レベルになっており、トレンチの内部についても良好な膜密度になっていることが分かる。従って、この実験結果から、弱磁場では処理容器1内の磁力線を切り替えずに成膜処理を行っても、本発明の効果が得られることが分かる。
1 処理容器
2 載置部
3a 高周波電源
12 ガスシャワーヘッド
11a 原料ガス供給路
11b 反応ガス供給路
12a 高周波電源
20 磁場形成機構
31 排気口
50 凹部
51 吸着層
52 反応層
Claims (5)
- 基板の載置部をなす下部電極と前記載置部に対向する上部電極とを備えたプラズマ処理装置を用い、凹部が形成された半導体デバイス製造用の基板にプラズマを用いて成膜する方法において、
処理容器内に設けられた載置部に、基板を載置する工程と、
前記処理容器内を真空排気する工程と、
次いで、前記処理容器内に処理ガスを供給する工程と、
続いて、処理ガスを高周波電力によりプラズマ化してプラズマを得る工程と、
平面で見た時に基板の周縁を囲む磁力線のループが形成されないように、当該基板の周縁における少なくとも一箇所の磁力線が開口する磁場を処理雰囲気に形成して、処理ガスのプラズマ中における電子を基板の表面に沿う方向に移動させる工程と、を含み、
前記プラズマを得る工程は、電気的なカップリングの状態を、高周波電源を前記上部電極に接続したアノードカップリングの状態と、前記高周波電源を前記下部電極に接続したカソードカップリングの状態と、の間で交互に切り替える工程を含むことを特徴とするプラズマ処理方法。 - 前記アノードカップリングの状態と前記カソードカップリングの状態との間で切り替えるときには、上部電極及び下部電極の短絡を防止するために、一旦高周波の出力を停止することを特徴とする請求項1記載のプラズマ処理方法。
- シリコンを含む処理ガスである原料ガスを処理容器内に供給して前記基板に吸着させる工程と、処理ガスである反応ガスをプラズマ化して、前記基板に吸着されている原料ガスと反応させる工程と、が交互に繰り返されることを特徴とする請求項1または2記載のプラズマ処理方法。
- 前記移動させる工程の後、処理雰囲気における磁力線を切り替えることにより、前記電子の移動方向を、前記方向とは異なる方向で且つ基板の表面に沿う方向に切り替える工程を行うことを特徴とする請求項1ないし3のいずれか一項に記載のプラズマ処理方法。
- 前記移動させる工程は、前記磁場を形成した時のプラズマ密度及び当該磁場を形成しない時におけるプラズマ密度を夫々P1及びP2とすると、P1とP2とがほぼ等しくなるように磁場を形成する工程であることを特徴とする請求項1ないし4のいずれか一項に記載のプラズマ処理方法。
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