JPH05291142A - 液体ソース供給装置 - Google Patents
液体ソース供給装置Info
- Publication number
- JPH05291142A JPH05291142A JP12135092A JP12135092A JPH05291142A JP H05291142 A JPH05291142 A JP H05291142A JP 12135092 A JP12135092 A JP 12135092A JP 12135092 A JP12135092 A JP 12135092A JP H05291142 A JPH05291142 A JP H05291142A
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Abstract
(57)【要約】
【目的】 液体供給装置の容器部分の液面を機械的に保
つことによって液体の蒸気圧変化を防ぎ、液体を安定供
給する。 【構成】 マスフローコントローラ１で流量を制御され
たバブリングガスがバルブ２を通して容器２０内の液体
をバブリングする。一方、容器２０内はヒータ３によっ
て適性温度に維持される。温度とバブリングによって発
生した液体の蒸気がバルブ４を通し、マスフローメータ
５で流量モニターを行って反応ガスとして反応炉内に供
給される。反応ガスを供給していると液面が減少する。
液面低下を液面センサ６が感知し、その信号を駆動部７
に送り、容器２０ｂを上昇させ液面を上昇させる。 【効果】 液面を機械的に制御することによって、自動
液供給による液体の温度変動がなくなり、気化した液体
を安定に供給することができる。
つことによって液体の蒸気圧変化を防ぎ、液体を安定供
給する。 【構成】 マスフローコントローラ１で流量を制御され
たバブリングガスがバルブ２を通して容器２０内の液体
をバブリングする。一方、容器２０内はヒータ３によっ
て適性温度に維持される。温度とバブリングによって発
生した液体の蒸気がバルブ４を通し、マスフローメータ
５で流量モニターを行って反応ガスとして反応炉内に供
給される。反応ガスを供給していると液面が減少する。
液面低下を液面センサ６が感知し、その信号を駆動部７
に送り、容器２０ｂを上昇させ液面を上昇させる。 【効果】 液面を機械的に制御することによって、自動
液供給による液体の温度変動がなくなり、気化した液体
を安定に供給することができる。
Description
【０００１】
【産業上の利用分野】本発明は、液体供給装置に関し、
特に液体ソースを必要とするＣＶＤ装置に関する。
特に液体ソースを必要とするＣＶＤ装置に関する。
【０００２】
【従来の技術】この従来の液体供給装置では図５，図６
に示すように、容器２０に液面センサ２１を持ち、液面
２２がある規格よりずれると、液体ソースを規定の液面
まで供給する。
に示すように、容器２０に液面センサ２１を持ち、液面
２２がある規格よりずれると、液体ソースを規定の液面
まで供給する。
【０００３】すなわち、図５において、セットポイント
ＳｔからΔＳだけ液面２２がずれた場合を示す。ΔＳ≧
規格のとき、バルブ２３を開き、設定した量だけの液体
ソースをライン２４を通して供給する。２５はキャリア
ガスライン、２６は反応ガスガス出力ラインである。図
６に液体ソースの供給状態を示す。
ＳｔからΔＳだけ液面２２がずれた場合を示す。ΔＳ≧
規格のとき、バルブ２３を開き、設定した量だけの液体
ソースをライン２４を通して供給する。２５はキャリア
ガスライン、２６は反応ガスガス出力ラインである。図
６に液体ソースの供給状態を示す。
【０００４】また、容器２０内の温度変動，体積変動に
より流量が変動するが、これをモニターするためのガス
流量計をガス供給側配管に配置している。蒸気圧の低い
装置では、熱による気化だけでなく、Ｈｅ等の不活性ガ
スでバブリングを行い、気化を促進し、反応ガスを供給
している。
より流量が変動するが、これをモニターするためのガス
流量計をガス供給側配管に配置している。蒸気圧の低い
装置では、熱による気化だけでなく、Ｈｅ等の不活性ガ
スでバブリングを行い、気化を促進し、反応ガスを供給
している。
【０００５】
【発明が解決しようとする課題】この従来の液体供給装
置では、液面を規格内に維持するため、液体ソースを容
器内に供給するが、容器内の液体の温度と供給される液
体に温度差が生じ、液体の蒸気圧を変動させてしまう。
置では、液面を規格内に維持するため、液体ソースを容
器内に供給するが、容器内の液体の温度と供給される液
体に温度差が生じ、液体の蒸気圧を変動させてしまう。
【０００６】このことにより、蒸気となった液体ソース
が安定に供給できなくなり、ウェハー間の膜厚，膜質が
相違してしまうという問題点があった。
が安定に供給できなくなり、ウェハー間の膜厚，膜質が
相違してしまうという問題点があった。
【０００７】本発明の目的は、蒸気となった液体ソース
を安定供給してウェハー間の膜厚，膜質を均一化した液
体ソース供給装置を提供することにある。
を安定供給してウェハー間の膜厚，膜質を均一化した液
体ソース供給装置を提供することにある。
【０００８】
【課題を解決するための手段】前記目的を達成するた
め、本発明に係る液体ソース供給装置は、容器を有し、
容器内の液体ソースをバブリングし、その蒸気となった
液体ソースを反応炉に供給する液体ソース供給装置であ
って、容器は、下部が開口した容器と、上部が開口した
容器とを組合せ、液面，蒸気圧の変動により容積を変化
させ蒸気圧を一定に維持する機能を有するものである。
め、本発明に係る液体ソース供給装置は、容器を有し、
容器内の液体ソースをバブリングし、その蒸気となった
液体ソースを反応炉に供給する液体ソース供給装置であ
って、容器は、下部が開口した容器と、上部が開口した
容器とを組合せ、液面，蒸気圧の変動により容積を変化
させ蒸気圧を一定に維持する機能を有するものである。
【０００９】
【作用】液面及び蒸気圧を検知し容器の体積を変化させ
蒸気圧を一定に保つ機能を備えている。
蒸気圧を一定に保つ機能を備えている。
【００１０】
【実施例】次に本発明について図面を参照して説明す
る。
る。
【００１１】（実施例１）図１は、本発明の実施例１を
示す構成図である。図２は、容器内液体ソースが減少し
た場合を示す図である。
示す構成図である。図２は、容器内液体ソースが減少し
た場合を示す図である。
【００１２】図１において、マスフローコントローラ１
で流量を制御されたキャリアガスあるいはバブリングガ
スがバルブ２を通して容器２０内の液体をバブリングす
る。
で流量を制御されたキャリアガスあるいはバブリングガ
スがバルブ２を通して容器２０内の液体をバブリングす
る。
【００１３】一方、容器２０内は、ヒータ３と熱伝対８
によって適性温度に維持される。温度とバブリングによ
って発生した液体の蒸気がバルブ４を通し、マスフロー
メータ５で流量モニターを行って反応ガスとして反応炉
内に供給される。
によって適性温度に維持される。温度とバブリングによ
って発生した液体の蒸気がバルブ４を通し、マスフロー
メータ５で流量モニターを行って反応ガスとして反応炉
内に供給される。
【００１４】本実施例では、容器２０は、固定側の容器
２０ａと可動側の容器２０ｂとの組合せからなり、両容
器２０ａと２０ｂとの隙間部分がシールリング２０ｃに
より封止され、可動側の容器２０ｂが駆動部７により昇
降可能となっている。
２０ａと可動側の容器２０ｂとの組合せからなり、両容
器２０ａと２０ｂとの隙間部分がシールリング２０ｃに
より封止され、可動側の容器２０ｂが駆動部７により昇
降可能となっている。
【００１５】反応ガスを供給していると、容器２０内の
液体が減少し、液面が低下すると、液面センサ６が感知
し、その信号を駆動部７に送る。駆動部７は容器２０ｂ
を上昇させ（図２）、液面を上昇させる。
液体が減少し、液面が低下すると、液面センサ６が感知
し、その信号を駆動部７に送る。駆動部７は容器２０ｂ
を上昇させ（図２）、液面を上昇させる。
【００１６】以上のように本実施例によれば、従来の技
術のように液面が低下するたびに液体ソースを供給する
方式に比べて容器内の温度変動がなく、蒸気圧を一定に
保つことができるので、液化した蒸気を安定供給するこ
とができる。
術のように液面が低下するたびに液体ソースを供給する
方式に比べて容器内の温度変動がなく、蒸気圧を一定に
保つことができるので、液化した蒸気を安定供給するこ
とができる。
【００１７】（実施例２）図３は、本発明の実施例２を
示す構成図である。
示す構成図である。
【００１８】図３において、圧力センサ９は容器２０内
の液体蒸気圧をモニターしている。圧力センサ９の出力
は図４のように蒸気圧のセットポイントと比較器１３に
よって比較され、蒸気圧が低くなった場合は、駆動部７
へ液面を高くする指令を発する。駆動部７が容器２０ｂ
を上昇させ、液面が上昇することによって体積が減少
し、蒸気圧をセットポイントに近付ける。
の液体蒸気圧をモニターしている。圧力センサ９の出力
は図４のように蒸気圧のセットポイントと比較器１３に
よって比較され、蒸気圧が低くなった場合は、駆動部７
へ液面を高くする指令を発する。駆動部７が容器２０ｂ
を上昇させ、液面が上昇することによって体積が減少
し、蒸気圧をセットポイントに近付ける。
【００１９】また、蒸気圧が高くなった場合は、液面を
低くする方向へ移動させ、体積を増加し蒸気圧をセット
ポイントに近付ける。
低くする方向へ移動させ、体積を増加し蒸気圧をセット
ポイントに近付ける。
【００２０】実施例２では、蒸気流量が変動を最も受け
る蒸気圧をモニターしているため、より安定した反応の
よい制御ができるという利点がある。
る蒸気圧をモニターしているため、より安定した反応の
よい制御ができるという利点がある。
【００２１】
【発明の効果】以上説明したように本発明は、液体ソー
スを蓄えるための温度調整可能であり、前記液体ソース
の蒸気圧を操作できる容器を有し、前記液体ソースの蒸
気を送る配管と気体を制御するための流量コントローラ
を有する液体供給装置において、前記容器の体積を可変
できる機能を有したもので、温度変動を与えることな
く、液面を一定に保つことができる。
スを蓄えるための温度調整可能であり、前記液体ソース
の蒸気圧を操作できる容器を有し、前記液体ソースの蒸
気を送る配管と気体を制御するための流量コントローラ
を有する液体供給装置において、前記容器の体積を可変
できる機能を有したもので、温度変動を与えることな
く、液面を一定に保つことができる。
【００２２】液面を一定に保つことにより、液体の蒸気
が存在する体積が一定になり、蒸気圧を一定にできるの
で、蒸気流量が安定した状態で供給できる。
が存在する体積が一定になり、蒸気圧を一定にできるの
で、蒸気流量が安定した状態で供給できる。
【００２３】以上のことにより、ＣＶＤ装置での成膜に
おいて膜厚，膜質の再現性がよくなり、歩留りを向上で
きる。
おいて膜厚，膜質の再現性がよくなり、歩留りを向上で
きる。
【図１】本発明の実施例１を示す構成図である。
【図２】図１の容器内液体ソースが減少した状態を示す
図である。
図である。
【図３】本発明の実施例２を示す構成図である。
【図４】圧力センサの出力と駆動部への信号の関係を示
す図である。
す図である。
【図５】従来の液体供給装置を示す構成図である。
【図６】図５において減少した分の液体を供給している
状態を示す図である。
状態を示す図である。
１ マスフローコントローラ ２，４ バルブ ３ ヒータ ５ マスフローメータ ６ 液面センサ ７ 駆動部 ８ 熱伝対 ９ 圧力センサ ２０ 容器
Claims (1)
- 【請求項１】 容器を有し、容器内の液体ソースをバブ
リングし、その蒸気となった液体ソースを反応炉に供給
する液体ソース供給装置であって、 容器は、下部が開口した容器と、上部が開口した容器と
を組合せ、液面，蒸気圧の変動により容積を変化させ蒸
気圧を一定に維持する機能を有することを特徴とする液
体ソース供給装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12135092A JPH05291142A (ja) | 1992-04-15 | 1992-04-15 | 液体ソース供給装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12135092A JPH05291142A (ja) | 1992-04-15 | 1992-04-15 | 液体ソース供給装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH05291142A true JPH05291142A (ja) | 1993-11-05 |
Family
ID=14809105
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12135092A Pending JPH05291142A (ja) | 1992-04-15 | 1992-04-15 | 液体ソース供給装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH05291142A (ja) |
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