JP5410074B2 - オゾンガス濃度測定方法、オゾンガス濃度測定システム及び基板処理装置 - Google Patents
オゾンガス濃度測定方法、オゾンガス濃度測定システム及び基板処理装置 Download PDFInfo
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- JP5410074B2 JP5410074B2 JP2008286687A JP2008286687A JP5410074B2 JP 5410074 B2 JP5410074 B2 JP 5410074B2 JP 2008286687 A JP2008286687 A JP 2008286687A JP 2008286687 A JP2008286687 A JP 2008286687A JP 5410074 B2 JP5410074 B2 JP 5410074B2
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/10—Preparation of ozone
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/10—Preparation of ozone
- C01B13/11—Preparation of ozone by electric discharge
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2201/00—Preparation of ozone by electrical discharge
- C01B2201/60—Feed streams for electrical dischargers
- C01B2201/62—Air
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T436/00—Chemistry: analytical and immunological testing
- Y10T436/20—Oxygen containing
- Y10T436/206664—Ozone or peroxide
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- Oxygen, Ozone, And Oxides In General (AREA)
Description
3O2 (+N2) → 2O3 (+N2) … (1)
処理ガス生成器22が原料ガスへ放電等によって付与可能なエネルギーには限界があるため、原料ガス中の全ての酸素ガスはオゾンガスに変化せず、最大でも14%の酸素ガスしかオゾンガスに変化しない。なお、処理ガス生成器22は原料ガスに付与するエネルギーの量を調整することによってオゾンガスへの変化量を調整する。
10 ベベル部洗浄装置
19 処理ガス供給系
20 酸素ガス用マスフローコントローラ
21 窒素ガス用マスフローコントローラ
22 処理ガス生成器
23 処理ガス用マスフローコントローラ
Claims (5)
- 酸素ガスを含む原料ガスからオゾンガスを含む生成ガスを生成する生成ステップと、
前記原料ガスの流量と前記生成ガス流量とを測定する測定ステップと、
前記測定ステップで測定した前記原料ガスの流量から前記生成ガスの流量への流量変化が3O 2 →2O 3 の化学反応によるものであるとして、前記原料ガスの流量から前記生成ガスの流量への流量変化率に基づいて前記生成ガスに含まれる前記オゾンガスの濃度を算出する算出ステップとを有することを特徴とするオゾンガス濃度測定方法。 - 前記生成ステップに先立ち、前記流量変化率及び前記生成ガスに含まれる前記オゾンガスの濃度の関係を算出し、
前記算出ステップでは、前記関係に基づいて前記オゾンガスの濃度を算出することを特徴とする請求項1記載のオゾンガス濃度測定方法。 - 酸素ガスを含む原料ガスからオゾンガスを含む生成ガスを生成する生成装置と、
前記原料ガスの流量と前記生成ガスの流量を測定する測定装置と、
前記測定装置が測定した前記原料ガスの流量から前記生成ガスの流量への流量変化が3O 2 →2O 3 の化学反応によるものであるとして、前記原料ガスの流量から前記生成ガスの流量への流量変化率に基づいて前記生成ガスに含まれる前記オゾンガスの濃度を算出する算出装置とを備えることを特徴とするオゾンガス濃度測定システム。 - 前記算出装置は、前記流量変化率及び前記生成ガスに含まれる前記オゾンガスの濃度の関係を予め算出し、該関係に基づいて前記オゾンガスの濃度を算出することを特徴とする請求項3記載のオゾンガス濃度測定システム。
- 請求項3又は4のオゾンガス濃度測定システムを備えることを特徴とする基板処理装置。
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JP2008286687A JP5410074B2 (ja) | 2008-11-07 | 2008-11-07 | オゾンガス濃度測定方法、オゾンガス濃度測定システム及び基板処理装置 |
US12/612,923 US8497132B2 (en) | 2008-11-07 | 2009-11-05 | Ozone gas concentration measurement method, ozone gas concentration measurement system, and substrate processing apparatus |
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JP2008286687A JP5410074B2 (ja) | 2008-11-07 | 2008-11-07 | オゾンガス濃度測定方法、オゾンガス濃度測定システム及び基板処理装置 |
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JP2010114314A JP2010114314A (ja) | 2010-05-20 |
JP5410074B2 true JP5410074B2 (ja) | 2014-02-05 |
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