CN110945639A - 用于竖式炉的衬里和凸缘的组件及衬里和竖式炉 - Google Patents
用于竖式炉的衬里和凸缘的组件及衬里和竖式炉 Download PDFInfo
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Abstract
提供了一种用于处理衬底的竖式炉的衬里和凸缘的组件。衬里构造成在竖式炉的处理管的内部中延伸,且凸缘构造成至少部分地封闭衬里开口。衬里包括基本上圆柱形壁,其由下端处的衬里开口和较高端处的顶部封闭件界定,并且对于衬里开口上方的气体基本上封闭,并且限定内部空间。凸缘包括:入口开口,其构造成插入和移除构造成在衬里的内部空间中承载衬底的舟皿;向内部空间提供气体的气体入口。组件构造并且布置成具有气体排放开口以从内部空间以及衬里与低压管之间的空间移除气体。
Description
技术领域
本发明涉及低压竖式炉,且更具体地涉及用于低压竖式炉的衬里和凸缘的组件,以及其中使用的竖式炉。衬里构造成在竖式炉的低压处理管的内部中延伸,并且凸缘构造成部分地封闭管的内部。
背景技术
用于处理例如半导体晶片的衬底的竖式处理炉可包括围绕钟形罐状处理管放置的加热装置,以及同轴地设置在处理管内的基本上圆柱形的衬里。处理管的上端可例如由圆顶形结构封闭,而处理管的下端表面可为敞开的。
衬里可在其上端和下端处敞开。下端可由凸缘部分地封闭。衬里和凸缘界定的内部空间形成处理室,其中可处理待处理的晶片。在衬里与处理管之间是周向空间。凸缘可设有用于将承载晶片的晶舟插入到内部空间中的入口开口。晶舟可以放置在门上,所述门以可竖直移动方式布置且构造成封闭凸缘中的入口开口。
凸缘还可包括至少一个气体入口,至少一个气体入口与由衬里界定的内部空间流体连接。另外,可提供气体排气装置,其与衬里和处理管之间的周向空间流体连接。该气体排气装置可连接到真空泵以用于从周向空间泵送气体。这种构造可导致气体从衬里下端的空气入口穿过衬里的内部空间向上流动穿过衬里的开口端进入周向空间并通向气体排气装置。流中的气体可为用于在晶片上进行沉积反应的反应(处理)气体。此反应气体还可沉积于除竖式炉内的晶片外的其它表面上。
用于处理衬底的竖式处理炉的问题可能是处理管的内部空间中的污染。
发明内容
因此,可能需要一种衬里和凸缘的改进的组件,其可能引起较少污染。
因此,提供了一种根据第一实施例的衬里和凸缘的组件,衬里构造成在竖式炉的低压处理管的内部中延伸。组件的衬里可包括由下端处的衬里开口和较高端处的顶部封闭件界定的基本上圆柱形壁。衬里可在用于气体的衬里开口上方基本上封闭,并限定内部空间。凸缘可包括入口开口,入口开口构造成插入和移除构造成将衬底承载在衬里的内部空间中的舟皿。凸缘可构造成至少部分地封闭管的开口。凸缘可具有气体入口管道以将反应气体提供至内部空间。组件可构造和布置成具有气体排放开口,以从内部空间以及衬里与低压处理管之间的空间移除气体。
可通过针对反应气体封闭衬里开口上方的衬里,并通过凸缘处的排气管从内部空间以及衬里与处理管之间的空间移除气体,使得反应气体无法到达衬里与管之间的空间而避免了污染。因此,处理管的内部和衬里的外部可保持清洁,因为基本上没有反应气体在此处流动。
根据一个实施例,提供了一种竖式炉,其包括:
限定内部的低压处理管;
构造成加热所述管的内部的加热器;
根据第一实施例所述的组件,其中凸缘部分地封闭处理管的开口端,使得中心入口开口敞开,并且其中衬里在处理管的内部中延伸;
可竖直移动地布置的门,其构造成封闭所述凸缘中的中心入口开口,并且构造成支承构造成保持衬底的晶舟。
竖式炉具有上文参考衬里和凸缘的组件描述的优点。优点可为通过将衬里提供为内部空间与管之间的屏障来防止污染。
根据另一个实施例,可提供衬里,其构造成在竖式炉的低压处理管的内部中延伸,衬里包括:
基本上圆柱形壁,其由下端处的衬里开口和较高端处的顶部封闭件界定,并且对于衬里开口上方的气体基本上封闭,并限定内部空间,其中衬里包括碳化硅。
本发明的各种实施例可以彼此分开地应用或可以进行组合。本发明的实施例将在具体实施方式中参考图中示出的一些实例进一步阐明。
附图说明
应了解,图中的元件仅为了简单和清晰而示出的,且不一定按比例绘制。例如,图中的一些元件的尺寸可能相对于其它元件被放大,以有助于改进对本公开所说明实施例的理解。
图1示出了根据实施例的包括衬里和凸缘的组件的竖式处理炉的管的横截面视图;
图2是图1的组件的示意性俯视图;
图3是图2的线III-III上的组件的横截面透视侧视图,其中示出了竖式炉的处理管;
图4是图2中的线IV-IV上的横截面;
图5是如图4所示的类似横截面,但为凸缘设有支承垫的实施例;
图6示出了根据另一个实施例的包括衬里和凸缘的组件的竖式炉的横截面视图;
图7示出了根据又一个实施例的包括衬里和凸缘的组件的竖式炉的横截面视图;
图8描绘了位于根据图1、6或7的衬里内的根据实施例的喷射器的仰视透视图;以及,
图9描绘了用于图1、6、7或8的喷射器。
具体实施方式
在本申请中,类似或对应特征由类似或对应的参考符号表示。各种实施例的描述不限于图中示出的实例,且具体实施方式和权利要求书中所使用的附图标号并不意图将所描述的内容限制为图中示出的实例。
图1示出了根据实施例的包括衬里和凸缘的组件的竖式炉的横截面视图。竖式炉包括限定内部的低压处理管12和配置成加热内部的加热器H。
衬里2在内部中延伸,衬里包括基本上圆柱形壁,其由下端处的衬里开口和较高端处的圆顶形顶部封闭件2d界定。衬里对于衬里开口上方的气体基本上封闭,并限定了内部空间I。
可提供凸缘3以至少部分地封闭低压处理管12的开口。可竖直移动地布置的门14可构造成封闭凸缘3中的中心入口开口O,并且可构造成支承晶舟B,所述晶舟B构造成固持衬底W。凸缘3可部分地封闭处理管12的开口端。门14可设有底座R。可以旋转底座R以使晶舟B在内部空间中旋转。在舟皿B中的最低衬底下方,可提供流动空间以防止在舟皿中的衬底W之间的反应气体的流动。
在图1所示的实例中,组件1包括衬里2,其包括具有基本上圆柱形外表面2a和基本上圆柱形内表面2b的基本上圆柱形衬里壁。凸缘3构造成至少部分地封闭管开口和由衬里2的下端表面2c更精确地限定的衬里开口。凸缘3包括:
入口开口O,所述入口开口O构造成插入并移除舟皿B,舟皿B构造成在衬里2的内部空间I中承载衬底W;
气体入口16,其用以提供气体F,例如反应气体到内部空间I;以及,
排气管7,其用以从内部空间移除气体。
气体入口16可设有喷射器17,该喷射器构造和布置在组件内,以沿衬里2的基本上圆柱形壁朝较高端垂直地延伸到内部空间I中,并且包括喷射器开口18,用以将气体喷射到内部空间I中。
连接到排气管7的用于从内部空间移除气体的气体排放开口8可构造和布置在喷射器开口18下方。以此方式,通过对于气体封闭衬里开口以上的衬里2,利用喷射器17通过喷射器开口18在内部空间I的上端处向内部空间提供气体并通过排放开口8在内部空间的下端处从内部空间中移除气体,可以在衬里2的内部空间中形成下行流F。此下行流F可将反应副产物的污染向下转移到远离经处理衬底W的排放开口8,所述反应副产物即来自衬底W、舟皿B、衬里2和/或支承凸缘3的颗粒。
用于从内部空间I中移除气体的气体排放开口8可设置在衬里2的开口端下面。这可为有益的,因为处理室的污染源可能由衬里2与凸缘3之间的接触而形成。具体地说,污染源可存在于衬里在开口端处的下端表面与凸缘接触的位置处。在衬底的处理期间,且具体地在处理之后的舟皿的卸载期间,衬里和凸缘可受热,这会增加衬里和凸缘两者的温度。由于温度升高,衬里和凸缘可能经历热膨胀,这引起它们沿径向膨胀。由于衬里和凸缘可具有不同的热膨胀系数,因为例如由于衬里2可由碳化硅制成并且凸缘由金属制成,因此衬里和凸缘可在膨胀期间相对于彼此移动。这可引起衬里的下端表面与凸缘的上表面之间的摩擦,这可导致污染物,例如,脱离衬里和/或凸缘的小颗粒。颗粒可能会迁移到处理室中,并且可能会污染处理室和正在进行处理的衬底。
通过对于气体封闭衬里开口以上的衬里,利用气体喷射器在内部空间的上端处向内部空间提供处理气体并通过气体排气装置在内部空间的下端处从内部空间移除气体,可以在内部空间中形成下行流。此下行流可将颗粒从衬里-凸缘交接面向下转移到远离经处理衬底的排气装置。
气体排放开口8可构造并布置在衬里2与管12之间的凸缘3中,以从衬里2与管12之间的周向空间中移除气体。以此方式,可使周向空间和内部空间I中的压力相等,并且可使低压竖式炉中的压力低于管12周围的周围大气压。竖式炉可设有压力控制系统,以从低压竖式炉的管的内部(包含衬里的内部空间)移除气体。
以此方式,衬里2可制造得相当薄,并且可由相对脆弱的材料制成,因为它不必补偿大气压。这在选择衬里2的材料方面具有较大的自由度。衬里2的材料的热膨胀可被选择成使得它可与沉积在内部空间中的衬底上的材料相当。后者的优势在于,衬里和同样沉积在衬里上的材料的膨胀可为相同的。后者使由于衬里2的温度变化而导致沉积材料掉落的风险最小化。
管12可制造得相当厚,并且可由相对较强的抗压强度材料制成,因为它可能必须相对于管内部的低压而补偿大气压。例如,低压处理管12可由5到8mm,优选大约6mm厚的石英制成。石英具有极低的热膨胀系数(CTE):0.59×10-6K-1(见表1),这使得它更易于处理设备中的热波动。尽管沉积材料的CTE可能更高(例如,Si3N4的CTE=3×10-6K-1,Si的CTE=2.3×10-6K-1),但是差异可能相对较小。当将膜沉积到由石英制成的管上时,即使管经历许多大的热循环,它们也可能会黏附,但是污染的风险可能会增加。
衬里2可避免管2的内部上的任何沉积,并且因此管12上的沉积掉落的风险可以降低。因此,管可由石英制成。
碳化硅衬里2(SiC的CTE=4×10-6K-1)可在沉积的膜衬里之间提供更好的CTE匹配度,导致在可能需要从衬里移除沉积的膜之前更大的累积厚度。CTE的不匹配导致沉积的膜开裂并剥落,并相应地产生较多的颗粒,这是不希望的,可以通过使用SIC衬里2来缓解。相同机制可适用于喷射器17;然而,对于喷射器17,情况可能是:如果沉积了过多具有不同热膨胀的材料,那么喷射器可能会断裂。因此,可有利地由碳化硅或硅制成喷射器17。
表1
半导体处理中的材料的热膨胀系数(CTE)
材料 | 热膨胀(ppm/K) |
石英 | 0.59 |
氮化硅 | 3 |
硅 | 2.3 |
碳化硅 | 4.0 |
钨 | 4.5 |
材料是否适用于衬里2和或喷射器17可取决于所沉积的材料。因此,有利的是能够使用其中沉积材料的热膨胀与衬里2和/或喷射器17大体上相同的材料。因此,可为有利的是能够使用其中衬里2和/或喷射器17的热膨胀相对高于石英的热膨胀的材料。例如,可使用碳化硅SiC。碳化硅衬里的厚度可以在4到6mm之间,优选地是5mm,因为它不必补偿大气压。压力补偿可以利用管来完成。
对于沉积CTE在约4×10-6K-1和6×10-6K-1之间的金属和金属化合物材料(例如,TaN、HfO2和TaO5)的系统,优选地,衬里和喷射器材料可具有在约4×10-6K-1与9×10 6K-1的CTE,包括例如碳化硅。
对于具有更高CTE的材料的沉积,衬里和/或喷射器材料可以如例如表2所描绘的那样选择。
表2
陶瓷构造材料的热膨胀系数(CTE)
材料 | 热膨胀(ppm/K) |
玻璃陶瓷 | 12.6 |
氮化硼 | 11.9 |
普通玻璃 | 9 |
莫来石 | 5.4 |
组件可设有安装在凸缘上的吹扫气体入口19,所述吹扫气体入口用于向衬里2b的外表面与处理管12之间的周向空间S提供吹扫气体P。吹扫气体入口可包括吹扫气体喷射器20,所述吹扫气体喷射器沿着衬里2的圆柱形壁的外表面从凸缘3朝衬里的顶端竖直延伸。前往周向空间S的吹扫气体P可在气体排放开口8中形成流,并抵消反应气体从排放管7到周向空间S的扩散。
凸缘3可具有上表面。衬里2可由支承部件4支承,所述支承部件可连接到衬里壁2a的圆柱形外表面,且各自具有方向向下的支承表面。衬里还可通过其下表面2c直接支承在凸缘3的上表面上。
支承部件4的支承表面可从衬里2的圆柱形内表面2b沿径向向外定位。在本实例中,支承部件4的支承表面还可从它们所附接的衬里2的圆柱形外表面2a沿径向向外定位。支承部件4的方向向下的支承表面可与凸缘3的上表面接触并支承衬里2。
封闭件的支承凸缘3可包括用于从衬里2的内部空间以及衬里2与低压管12之间的圆形空间移除气体的气体排放开口8。气体排放开口中的至少一些可以在衬里2的外部径向设置在凸缘3的上表面中。气体排放开口中的至少一些可以设置在衬里开口附近。气体排放开口8可通过排气管7与泵成流体连接,以用于从内部空间以及处理管12与衬里2之间的周向空间中抽出气体。可通过支承部件4与支承凸缘3的上表面部分之间的摩擦产生的任何颗粒可连同气体一起通过气体排放开口8排放。在任何情况下,释放的颗粒将不能在衬底W周围进入处理室。
图2是图1的组件的示意性俯视图。附图示出了衬里2,其具有限定基本上圆柱形内表面2b和基本上圆柱形外表面2a的圆柱形壁,该圆柱形壁形成用于插入构造成承载衬底的舟皿的开口13。
支承构件4也可见。在此实例中,衬里2具有三个支承构件4,其沿着衬里2的圆柱形外表面2a的圆周等距间隔开。支承构件4可体现为连接到衬里2的圆柱形壁的圆柱形外表面2a的凹口。凸缘可设有从凸缘的上表面3a向上延伸的定位突起5。定位突起5可在其切向端表面上接合支承构件4。因此,定位突起5具有衬里2相对于支承凸缘3的定心功能。定位突起5与衬里2的圆柱形外表面2a在空间上分离,以允许衬里2沿径向膨胀。
形成支承构件4的衬里2和凹口可由石英、硅或碳化硅制造。代替三个支承构件4,备选实施例可包括两个支承构件4或多于三个支承构件4。此外,支承构件4从圆柱形内表面2b沿径向向外并且优选地也从衬里2的圆柱形外表面2a沿径向向外间隔开。还清楚地示出了衬里2的圆柱形外表面2a与定位突起5之间的空间,使得圆柱形衬里壁2的径向膨胀是可能的。支承构件4的切向长度通常可在1-5cm的范围内。界定内部空间的衬里2可具有沿径向向外延伸的凸起2e,以容纳内部空间中的喷射器17或温度测量系统。
图3是图2中的线III-III上的局部透视横截面视图,其中也示出了竖式处理炉的处理管12。凸缘可设有凹槽15,该凹槽构造和布置成用于在其中提供诸如O形环的密封件,以实现凸缘3与管12之间的良好密封。这种良好密封是必需的,因为凸缘3、管12和O形环可在外部大气压与管12内部的低压之间形成压力屏障的一部分。O形环可设在石英的界面处,因为石英具有相对低的热膨胀,因此可能引起O形环磨损的石英相对于O形环的移动不太多。
图3进一步示出了具有支承构件4的衬里2,该支承构件附接到衬里2的圆柱形外表面2a。明显可见的是,支承构件4可相对于衬里2的圆柱形壁径向向外定位。支承部件4的方向向下的支承表面可与凸缘3的上表面3a接触并可支承衬里2。还可见的是,凸缘3可具有在支承构件4下方延伸的第一上表面部分3a1,以及可在衬里2的圆柱形壁的下端表面2c下方延伸的第二上表面部分3a2。在此实例中,第二上表面部分3a2可形成为圆形凹槽,其内径小于衬里2的内径。形成第二上表面部分3a2的凹槽的外径可具有大于衬里2的外径的外径。
支承构件4可在第一上表面部分3a1上支承衬里2,使得衬里2的下端表面2c与凸缘3的第二上表面部分3a2竖直间隔开。因此,间隙可形成于衬里2的下端表面2c与支承凸缘3的第二上表面部分3a2之间。借助于此间隙,在衬里2与邻近衬里壁2的圆柱形内表面2b的凸缘3的上表面之间可不存在接触。在衬里2与邻近圆柱形内表面2b的凸缘3的上表面之间没有接触可降低任何颗粒的风险,这可通过衬里2与上表面3a之间的摩擦而产生。间隙可在0.1到10mm之间,优选0.2和0.5mm之间。支承构件4另外可包括凹部10,该凹部沿着支承构件4的切向长度延伸并且具有敞开的方向向下的一侧。
图4是图2中的线IV-IV上的横截面。径向向内的凹部边缘10a可相对于衬里2的圆柱形内表面2b沿径向向外定位。凹部10的径向向外的凹部边缘10b可相对于支承构件4的支承表面沿径向向内定位。因此,凹部10可至少部分地定位成穿过支承凸缘3中的圆形凹槽3a2;径向向内的凹部边缘10a可位于凹槽3a2外径的径向内侧,并且径向向外的凹部边缘10b可位于凹槽3a2外径的径向外侧。该构造可允许反应气体流从由圆柱形内表面2b界定的空间流到由衬里2的圆柱形外表面2a的外侧和处理管12(图3中示出)界定的空间。
可通过支承构件4的方向向下的表面和与支承构件4相对的支承凸缘3的上表面3a1之间的摩擦产生的任何颗粒可远离下端表面2c与凸缘的上表面3a之间的间隙输送。包括颗粒的气体可通过气体排放开口8,且随后通过排气管7朝向泵移除。
图5是不同实施例的图2中的线IV-IV上的横截面,其中支承凸缘3可设有支承垫11。图5描绘了衬里2、支承构件4和支承凸缘3。在此实例中,支承凸缘3可设有嵌入支承凸缘3中的支承垫11。支承垫11可与支承构件4的方向向下的支承表面接触,且可构造成减小支承凸缘3与支承构件4的支承表面之间的摩擦。为了提供所述摩擦减小,支承垫11可由具有相对低摩擦常数的材料制成,例如,如特氟龙、聚酰亚胺、PEEK、哈氏合金或任何其它合适的材料。另外,支承垫11还可由具有相对低摩擦常数的材料涂层的金属制成,例如,如特氟龙、聚酰亚胺、PEEK、哈氏合金、其它聚合物涂层或类金刚石碳的涂层。
图6和7示出了根据另外的实施例的包括衬里2和凸缘3的组件的竖式处理炉的横截面视图。图6是竖式处理炉的实例的横截面侧视图,所述竖式处理炉包括限定低压处理管内部空间的低压处理管12、构造成加热处理管内部空间的加热器、构造成关闭凸缘3中的中心入口开口并构造成支承构造成保持衬底的晶舟B的可竖直移动的门;且其中凸缘3部分地封闭处理管12的开口端,并且其中衬里2在处理管内部空间中延伸。门可设有旋转器M以使晶舟B在内部空间中旋转。可在旋转器M与晶舟B之间设置底座R。底座R可设有加热器和/或绝热体,以改善舟皿B中晶片的热均匀性。
衬里2可在较高端处例如以圆顶形状封闭,并且可对于衬里开口上方的气体基本上封闭。凸缘3包括入口开口,所述入口开口构造成插入和移除构造成在衬里2的内部空间中承载衬底的舟皿B。空气入口16可包括喷射器17,所述喷射器构造且布置在组件内以沿着衬里2的圆柱形壁朝向较高端延伸到内部空间中。图6中的喷射器17可设有沿喷射器17的长度提供的多个孔以在内部空间中喷射气体。
图7中的喷射器17可在喷射器的顶端附近设有一个大开口以在内部空间中喷射气体。在喷射器的端部处具有一个大开口的图7的喷射器17还可与具有沿着长度的多个孔的根据图6的一个或多个喷射器组合,以此方式,内部空间的每一部分可设有气体。限定内部空间的衬里2可具有沿径向向外延伸的凸起以容纳喷射器17。
可在内部空间I的下端构造并布置用于移除气体的气体排放开口8。以此方式,通过对于衬里开口上方的气体封闭衬里2,利用气体喷射器17向内部空间提供处理气体并通过内部空间下端处的气体排放开口8从内部空间I中移除气体,可在衬里2的内部空间I中形成下行流。此下行流可将反应副产物的污染远离经处理的衬底W向下且沿径向向外传送到排气装置8,所述反应副产物即来自衬底、舟皿B、衬里2和/或凸缘3上的衬里2的支承区域的颗粒。用于从内部空间I移除气体的气体排气装置8可设在衬里2的开口端下方。
组件可设有温度测量系统22,所述温度测量系统安装在凸缘3上并沿着衬里2的圆柱形壁的外表面朝衬里的顶端延伸以测量温度。温度测量系统22可包括横杆,所述横杆具有沿横杆长度设置的多个温度传感器以测量沿着衬里2的不同高度处的温度。由于温度测量系统22定位在衬里2外部,因此沉积可能无法到达温度测量系统22。这可能是有益的,因为沉积可能干扰温度测量。此外,温度测量系统22可包括石英,且因此具有与沉积材料不同的膨胀系数,引起颗粒和温度测量系统22的断裂的风险。衬里2可设有沿径向向内延伸的凸起以适应温度测量系统。
吹扫气体入口可设在衬里2与管12之间的周向空间S的底部处,以在衬里2与管12之间提供吹扫气体P。组件可构造和布置成使得在衬里2的下表面与凸缘3的上表面之间存在窄间隙21。吹扫气体可通过衬里2与凸缘3之间的窄间隙朝向排放开口8流动,且可产生逆流。间隙可为0.1到10mm,优选在0.2与0.5mm之间。逆流可避免来自喷射器17的处理气体穿过间隙扩散到周向空间中。因此,周向空间S可不受处理气体污染。
如图7所示,组件可设有安装在凸缘3上的吹扫气体喷射器20,所述吹扫气体喷射器用于向衬里2的外表面与处理管12的内表面之间的周向空间提供吹扫气体。吹扫气体喷射器20可沿衬里2的圆柱形壁的外表面从凸缘3朝衬里的顶端延伸。以此方式,可仅通过一个吹扫气体喷射器20更容易地在周向空间的整个圆周上获得正确吹扫气流。
根据实施例的竖式炉可包括:
限定内部的低压处理管;
构造成加热所述管的内部的加热器;
凸缘,所述凸缘部分地封闭所述处理管的开口端,使中心入口开口敞开;以及喷射器,所述喷射器构造并布置在所述组件内以朝管的较高端延伸到内部中,并且包括至少一个开口以喷射气体。在垂直方向上延伸的开口图案可沿喷射器设置。喷射器内部的气体传导通道的水平内部横截面可在100与1500之间,优选在200与1000之间,且最优选在300与500mm2之间。
喷射器内部的气体传导通道的水平内部横截面可具有一个形状,该形状的尺寸在与基本上圆柱形管的圆周相切的方向上可大于在径向方向上的尺寸。
开口的直径可在1到15mm之间,优选在3到12mm之间,更优选在4和10mm之间。开口的面积可在1到200mm2之间,优选在7到100mm2之间,更优选在13到80mm2之间。
开口之间的垂直距离可在从喷射器的下端到顶端时减小。开口的数量可在2到40之间,优选在3到30之间,并且更优选在4到10之间。
开口可构造成使得气体在至少两个不同方向上喷射。开口从喷射器的内部到外部可为凹形形状。开口可定位在喷射器的两个垂直延伸的、间隔开的分支上。喷射器可在管的顶端附近具有一个开口。
可提供衬里和凸缘的组件。衬里可构造成在竖式炉的低压管的内部延伸。衬里可包括基本上圆柱形壁,其由下端处的衬里开口和较高端处的顶部封闭件界定,并且对于衬里开口上方的气体基本上封闭,并限定内部空间。凸缘可构造成至少部分地封闭管的开口且包括:
入口开口,所述入口开口构造成插入并且移除构造成在所述衬里的内部空间中承载衬底的舟皿;和
气体入口,所述气体入口向内部空间提供气体。组件可构造和布置成具有气体排放开口以从内部空间以及衬里与低压管之间的空间移除气体。
图8描绘了位于衬里2内的喷射器上的透视仰视图。喷射器17可包括多个喷射器分支,例如两个喷射器分支22、23,每个喷射器分支各自设有单独的供气导管连接24、25。分支22将气体喷射到内部空间的下部中,并且分支23将气体喷射到内部空间的上部中。分支可通过连接部分连接。可提供额外喷射器分支,例如具有靠近衬里的端部的单个开口的分支。然而,对于本发明来说,喷射器包括两个或更多个喷射器分支并不是必需的。
喷射器可设有开口26的图案,所述图案大体上在晶片负载上延伸。根据本发明,开口的总横截面相对较大,例如,在100到600之间,优选在200到400mm2之间。并且,可用于源气体传导的喷射器17的内部横截面可在100到600之间,优选在200到500mm2或更多之间。
开口直径可在1到15mm之间,优选在3到12mm之间,更优选在4和10mm之间。开口的面积可在1到200mm2之间,优选在7到100mm2之间,更优选在13到80mm2之间。较大的开口可具有以下优势:由于开口内的沉积层,开口堵塞所需的时间更长。
在图8所示的实例中,喷射器整体上包括40个开口。对于3mm直径,开口的总横截面可为40×3×3×π/4=282mm2。喷射器的每个分支的横截面约为11×30=330mm2。其它喷射器可具有20个直径为4mm的开口,得到的总面积为251mm2。其它喷射器可具有5个直径为8mm的开口,得到的总面积同样为251mm2。
在每个喷射器分支22、23中,开口可以在相同高度处成对设置,这两个开口可在两个方向上以大约90度的角度喷射气体,从而改善径向均匀性。
开口可以竖直和水平间隔开的关系定位在喷射器上。一个喷射器分支上的开口图案可竖直延伸,其中在分支的较高部分处开口较密集,以补偿较高部分中减少的气流。喷射器分支可为喷射器管,每个喷射器管的进给端连接到单独的气体供应导管。喷射器管可通过单独的气体供应导管连接到单独的气体源,以便单独喷射两种或更多种源气体。一个喷射器分支上的开口图案可仅在舟皿的一部分上竖直延伸。喷射器17可容纳在衬里20中的凸起2e中。
组件可设有温度测量系统,所述温度测量系统安装在凸缘上并沿着衬里2的圆柱形壁的内表面或外表面朝衬里的顶端延伸以测量温度。温度测量系统可包括横杆,所述横杆具有沿着横杆的长度设置的多个温度传感器以测量沿衬里的不同高度处的温度。
可以在衬里2中设置第二凸起2f以容纳具有多个温度传感器的横杆,所述多个温度传感器在沿着衬里的内表面配置的情况下用于测量内部空间内部的温度。如所描绘,凸起向外延伸以便容纳衬里的内部上的温度测量系统,但是凸起还可向内延伸以容纳衬里的外部上的温度测量系统。通过分别在凸起2e和2f中容纳喷射器和温度系统,内部空间可以保持为基本上圆柱形对称,这对于沉积过程的均匀性来说是有利的。处理管12可在底端处设有加宽凸缘27。
图9描绘了用于图1、6、7或8的组件的喷射器17。在喷射器17中设置有五个喷射器开口18,从上到下编号为31、33、35、37、39。喷射器17的顶部附近的开口之间的距离相比于喷射器17的下端处的距离可减小,以补偿喷射器顶部处减小的压力。第一开口31与第二开口33之间的距离可在45到49mm之间,优选地是47mm,开口33与开口35之间的距离可在51到55mm之间,优选地是53mm,开口35与开口37之间的距离可在55到59mm之间,优选地是57mm,并且开口37与开口39之间的距离可在70到100mm之间,优选地是81mm,以便补偿压力减小。
开口的总横截面可相对较大,使得喷射器内部的压力保持在相对低的值。开口18的直径可在4和15mm之间。例如,开口可具有8mm的直径。喷射器的开口内的沉积可导致喷射器开口的堵塞。通过具有较大开口,例如,4到15mm,优选地是8mm,喷射器开口的堵塞将花费更长的时间,这增加了喷射器的使用寿命。
喷射器内部的气体传导通道的水平内部横截面可为长椭圆形,其中在与基本上圆柱形衬里的圆周相切的方向上的尺寸大于在径向方向上的尺寸。喷射器17的下部28可具有更小的横截面,并因此具有更高的压力。通常,这会造成额外沉积,但是因为在此部分中温度可能较低,所以沉积速率还是可接受的。
气体喷射器17的开口18可构造成减少开口的堵塞。开口从内到外可具有凹形形状。其中喷射器内部的表面上的开口的表面积大于喷射器外部上的开口18的表面积的凹形形状可减少堵塞。内部上的更大面积允许在压力更大且因此沉积更多的内侧处沉积更多。外部上的压力减小,并且因此沉积也更慢,且更小的面积可以收集与内部上的更大直径相同的沉积。
用喷射器减小压力可使得喷射器17内的反应速率减小,因为反应速率通常随着压力增加而增加。喷射器内部为低压的另一优势在于,通过喷射器的气体体积在低压下膨胀,并且为了源气体的恒定流动,喷射器内部的源气体的滞留时间相应地减少。由于这两者的组合,源气体的分解可以减少,并且从而也可以减少喷射器内的沉积。
喷射器内的沉积可导致喷射器的抗拉强度,导致喷射器在温度改变时断裂。因此,喷射器内的更少沉积延长了喷射器17的使用寿命。喷射器可由具有利用处理气体沉积的材料的热膨胀系数的材料制成。例如,如果通过处理气体沉积的是氮化硅,那么喷射器可由氮化硅制成,如果沉积的是硅,那么喷射器可由硅制成。因此,喷射器内的沉积层的热膨胀可与喷射器的热膨胀匹配,从而降低气体喷射器在温度改变期间断裂的可能性。对于喷射器17来说,碳化硅可能是一种合适的材料,因为它具有可以匹配许多沉积材料的热膨胀。
喷射器内部为低压的劣势在于,喷射器的传导显著减小。这将导致在喷射器长度上源气体流在开口图案上分布较差:大部分源气体将从喷射器的入口端附近的孔流出去。为了促进喷射器内部的源气体的流动,沿着喷射器的长度方向,喷射器可设有较大内部横截面。为了能够在反应空间内部容纳根据本发明的喷射器,喷射器的切向大小可大于径向大小,且对反应空间进行定界的衬里可设有向外延伸的凸起以容纳喷射器。
在优选实施例中,提供二元膜的两个构成要素的两种源气体在进入喷射器之前在气体供应系统中混合。这是在舟皿的长度上确保喷射的气体的均匀组成的最简单方式。然而,这并不是必不可少的。或者,两种不同的源气体可以通过单独的喷射器喷射并在喷射之后在反应空间中混合。
使用两个喷射器分支提供了一些调谐可能性。当具有大体上相同组成的气体通过单独的源气体供应供应到喷射器的两个部分时,可选择不同的被供应到不同喷射器分支的流,以便微调舟皿上的沉积速率的均匀性。还可向喷射器的两条线路供应具有不同组成的气体,以便微调舟皿上的二元膜的组成。然而,当两条喷射器线路的喷射气体的组成相同时,可以实现最佳结果。
虽然上文已描述特定实施例,但应了解,可以与所描述的方式不同的其它方式来实践本发明。以上描述意欲为说明性而非限制性的。因此,本领域技术人员将清楚的是,可以在不脱离下面阐述的权利要求的范围的情况下,对如上述内容中所描述的本发明进行修改。各种实施例可以组合应用,也可以彼此独立地应用。
Claims (29)
1.一种衬里和凸缘的组件,所述衬里构造成在竖式炉的低压管的内部中延伸,所述衬里包括:
基本上圆柱形壁,所述基本上圆柱形壁由下端处的衬里开口和较高端处的顶部封闭件界定,并且对于所述衬里开口上方的气体基本上封闭并且限定内部空间,所述凸缘构造成至少部分地封闭所述管的开口,并且包括:
入口开口,所述入口开口构造成插入并且移除构造成在所述衬里的内部空间中承载衬底的舟皿;和
气体入口,所述气体入口向所述内部空间提供气体,其中所述组件构造并且布置成具有气体排放开口,以从所述内部空间以及所述衬里与所述低压管之间的空间移除气体。
2.根据权利要求1所述的组件,其中所述气体入口包括喷射器,所述喷射器构造并且布置在所述组件内,以沿所述衬里的基本上圆柱形壁朝所述较高端延伸到所述内部空间中,并且包括至少一个开口以在所述内部空间中喷射气体。
3.根据权利要求2所述的组件,其中在竖直方向上延伸的开口图案沿着所述喷射器设置。
4.根据权利要求2所述的组件,其中所述喷射器内部的气体传导通道的水平内部横截面面积在100和1500mm2之间。
5.根据权利要求2所述的组件,其中所述喷射器内部的气体传导通道的水平内部横截面具有一个形状,所述形状在与基本上圆柱形衬里的圆周相切的方向上的尺寸大于在径向方向上的尺寸。
6.根据权利要求2所述的组件,其中所述至少一个开口的面积能够在1到200mm2之间。
7.根据权利要求3所述的组件,其中所述开口之间的垂直距离在从所述喷射器的下端到顶端时减小。
8.根据权利要求3所述的组件,其中所述开口构造成使得在至少两个不同方向上喷射气体。
9.根据权利要求2所述的组件,其中所述至少一个开口从内到外具有凹形形状。
10.根据权利要求2所述的组件,其中所述开口定位在所述喷射器的两个垂直延伸的、间隔开的分支上。
11.根据权利要求2所述的组件,其中所述喷射器包括靠近所述衬里的顶端的一个开口。
12.根据权利要求1所述的组件,其中界定所述内部空间的所述衬里具有沿径向向外延伸的凸起。
13.根据权利要求1所述的组件,其中用于从所述内部空间移除气体的所述气体排放开口设置在所述衬里的开口端下方。
14.根据权利要求1所述的组件,其中所述组件设有安装在所述凸缘上的吹扫气体入口,以用于向所述衬里与所述管之间的空间提供吹扫气体。
15.根据权利要求14所述的组件,其中所述吹扫气体入口包括沿着所述衬里的基本上圆柱形壁的外表面朝向所述衬里的顶端延伸的吹扫气体喷射器。
16.根据权利要求1所述的组件,其中所述组件设有温度测量系统,所述温度测量系统安装在所述凸缘上,并且沿着所述衬里的基本上圆柱形壁朝向所述衬里的顶端延伸以测量温度。
17.根据权利要求16所述的组件,其中所述温度测量系统沿着所述衬里的外表面布置。
18.根据权利要求17所述的组件,其中所述衬里设有沿径向向内延伸的凸起以适应所述温度测量系统。
19.根据权利要求1所述的组件,其中所述衬里和所述气体喷射器中的至少一个包括选自碳化硅和硅的材料。
20.根据权利要求1所述的组件,其中所述组件构造并且布置成使得在所述衬里的下表面与所述凸缘的上表面之间存在间隙。
21.根据权利要求1所述的组件,其中所述凸缘的上表面设有用于容纳密封件以密封所述低压管的凹槽。
22.根据权利要求1所述的组件,其中所述组件包括设置在径向上位于衬里壁的基本上圆柱形外表面外部的区域中的至少一个排放开口。
23.一种竖式炉,包括:
限定内部的低压处理管;
构造成加热所述管的内部的加热器;
根据权利要求1所述的组件,其中所述凸缘部分地封闭所述处理管的开口端,使得中心入口开口敞开,并且其中所述衬里在所述处理管的内部中延伸;
可竖直移动地布置的门,其构造成封闭所述凸缘中的中心入口开口,并且构造成支承构造成保持衬底的晶舟。
24.根据权利要求23所述的竖式炉,其中所述门设有旋转器,以使所述晶舟在所述内部空间中旋转。
25.根据权利要求23所述的竖式炉,其中密封件设置在所述凸缘的上表面与所述管之间以密封所述低压管。
26.根据权利要求23所述的竖式炉,其中压力控制系统设置成经由所述气体排放开口从所述管的内部移除气体。
27.根据权利要求23所述的竖式炉,其中所述管设置为构造并且布置成在包括所述内部空间和所述衬里的所述管的低压内部空间与所述管外部的大气压力空间之间提供压力屏障。
28.一种构造成在竖式炉的低压管的内部中延伸的衬里,包括:
基本上圆柱形壁,所述基本上圆柱形壁由下端处的衬里开口和较高端处的顶部封闭件界定,并且对于所述衬里开口上方的气体基本上封闭,并且限定内部空间,其中所述衬里包括碳化硅。
29.根据权利要求28所述的衬里,其中碳化硅衬里的厚度为4到6mm之间。
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CN110945639B (zh) | 2023-11-17 |
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KR102538106B1 (ko) | 2023-05-31 |
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