KR20190015146A - 개선된 게르마늄 식각 시스템들 및 방법들 - Google Patents
개선된 게르마늄 식각 시스템들 및 방법들 Download PDFInfo
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- KR20190015146A KR20190015146A KR1020180090661A KR20180090661A KR20190015146A KR 20190015146 A KR20190015146 A KR 20190015146A KR 1020180090661 A KR1020180090661 A KR 1020180090661A KR 20180090661 A KR20180090661 A KR 20180090661A KR 20190015146 A KR20190015146 A KR 20190015146A
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- Prior art keywords
- germanium
- plasma
- containing material
- fluorine
- rti
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- 238000000034 method Methods 0.000 title claims abstract description 122
- 229910052732 germanium Inorganic materials 0.000 title claims abstract description 66
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
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- C—CHEMISTRY; METALLURGY
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- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
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- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
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- H01L21/67005—Apparatus not specifically provided for elsewhere
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- Drying Of Semiconductors (AREA)
- Chemical Kinetics & Catalysis (AREA)
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- Inorganic Chemistry (AREA)
Abstract
게르마늄 함유 재료를 식각하기 위한 예시적인 방법들은, 반도체 처리 챔버의 원격 플라즈마 영역에서 플루오린 함유 전구체의 플라즈마를 형성하는 단계를 포함할 수 있다. 방법들은, 플루오린 함유 전구체의 유출물들을, 챔버 구성요소에 한정된 애퍼처들을 통해 유동시키는 단계를 포함할 수 있다. 애퍼처들은 촉매 재료로 코팅될 수 있다. 방법들은, 플라즈마 유출물들에 있는 플루오린 라디칼들의 농도를 촉매 재료를 이용하여 감소시키는 단계를 포함할 수 있다. 방법들은 또한, 플라즈마 유출물들을 반도체 처리 챔버의 처리 영역에 전달하는 단계를 포함할 수 있다. 게르마늄 함유 재료의 노출된 영역을 갖는 기판은 처리 영역 내에 수납될 수 있다. 방법들은, 게르마늄 함유 재료를 식각하는 단계를 더 포함할 수 있다.
Description
본 기술은 반도체 프로세스들 및 장비에 관한 것이다. 더 구체적으로, 본 기술은, 촉매 변환을 이용하는 반도체 처리 동안에 SiGe를 식각하는 것에 관한 것이다.
집적 회로들은, 복잡하게 패터닝된 재료 층들을 기판 표면들 상에 생성하는 프로세스들에 의해 가능하게 된다. 패터닝된 재료를 기판 상에 생성하기 위해서는 노출된 재료의 제거를 위한 제어된 방법들이 요구된다. 포토레지스트 내의 패턴을 하부 층들 내로 전사하는 것, 층들을 시닝(thinning)하는 것, 또는 표면 상에 이미 존재하는 피처들의 측방향 치수들을 시닝하는 것을 포함하는 다양한 목적들을 위해 화학적 식각이 사용된다. 보통, 예컨대, 패턴 전사 프로세스를 용이하게 하는, 하나의 재료를 다른 재료보다 더 빠르게 식각하는 식각 프로세스를 갖는 것이 바람직하다. 그러한 식각 프로세스는 제1 재료에 대해 선택적이라고 한다. 재료들, 회로들, 및 프로세스들의 다양성의 결과로서, 다양한 재료들에 대하여 선택성이 있는 식각 프로세스들이 개발되었다.
식각 프로세스들은, 프로세스에서 사용되는 재료들에 기반하여 습식 또는 건식으로 명명될 수 있다. 습식 HF 식각은 다른 유전체들 및 재료들에 비해 실리콘 산화물을 우선적으로 제거한다. 그러나, 습식 프로세스들은 일부 제한된 트렌치들을 침투하는데 어려움을 가질 수 있고, 또한 때로는 잔여 재료를 변형시킬 수 있다. 기판 처리 영역 내에 형성되는 로컬 플라즈마들에서 야기되는 건식 식각들은, 더 제한된 트렌치들을 관통할 수 있고, 세밀한 잔여 구조들의 더 적은 변형을 나타낼 수 있다. 그러나, 로컬 플라즈마들은 이들이 방전할 때 전기 아크들의 생성을 통해 기판을 손상시킬 수 있다.
따라서, 고품질 디바이스들 및 구조들을 생산하는데 사용될 수 있는 개선된 시스템들 및 방법들에 대한 필요가 있다. 이러한 그리고 다른 필요들이 본 기술에 의해 다루어진다.
게르마늄 함유 재료를 식각하기 위한 예시적인 방법들은, 반도체 처리 챔버의 원격 플라즈마 영역에서 플루오린 함유 전구체(fluorine-containing precursor)의 플라즈마를 형성하는 단계를 포함할 수 있다. 방법들은, 플루오린 함유 전구체의 플라즈마 유출물들을, 챔버 구성요소에 한정된 애퍼처들을 통해 유동시키는 단계를 포함할 수 있다. 애퍼처들은 촉매 재료로 코팅될 수 있다. 방법들은, 플라즈마 유출물들에 있는 플루오린 라디칼들의 농도를 촉매 재료를 이용하여 감소시키는 단계를 포함할 수 있다. 방법들은 또한, 플라즈마 유출물들을 반도체 처리 챔버의 처리 영역에 전달하는 단계를 포함할 수 있다. 노출된 게르마늄 함유 재료를 갖는 기판은 처리 영역 내에 수납될 수 있다. 방법들은, 게르마늄 함유 재료를 식각하는 단계를 더 포함할 수 있다.
일부 실시예들에서, 촉매 재료는, 니켈, 코발트, 바나듐, 니오븀, 탄탈럼, 크로뮴, 망가니즈, 레늄, 철, 루테늄, 오스뮴, 팔라듐, 백금, 로듐, 및 이리듐으로 구성된 군으로부터 선택된 원소를 포함하는 하나 이상의 재료들을 포함하거나, 그러한 재료들일 수 있다. 이는, 언급된 재료들 중 임의의 재료의 산화물들을 포함할 수 있다. 챔버 구성요소는 약 70 ℃ 초과의 온도에서 유지될 수 있다. 기판은 약 30 ℃ 미만의 온도에서 유지될 수 있다. 게르마늄 함유 재료는 SiGe이거나 SiGe를 포함할 수 있다. 게르마늄 함유 재료는 제1 게르마늄 함유 재료일 수 있고, 제1 게르마늄 함유 재료는 실리콘 또는 제2 게르마늄 함유 재료에 대해 식각될 수 있다. 제2 게르마늄 함유 재료는, 제1 게르마늄 함유 재료보다 더 낮은 게르마늄 농도에 의해 특성화될 수 있다. 식각은, 실리콘 또는 제2 게르마늄 함유 재료에 대한 제1 게르마늄 함유 재료의 선택성이 약 300:1 이상일 수 있다. 처리 챔버 내의 압력은 약 2 Torr 초과로 유지될 수 있다. 챔버 구성요소는 샤워헤드 또는 이온 억제기일 수 있다.
본 기술은 또한, 게르마늄 함유 재료를 식각하는 부가적인 방법들을 포괄한다. 방법들은, 반도체 처리 챔버의 원격 플라즈마 영역에서 플루오린 함유 전구체의 플라즈마를 형성하는 단계를 포함할 수 있다. 방법들은, 플루오린 함유 전구체의 플라즈마 유출물들을, 촉매 재료를 포함하는 챔버 구성요소를 통해 유동시키는 단계를 포함할 수 있다. 방법들은, 플라즈마 유출물들에 있는 플루오린 라디칼들의 적어도 일부를 촉매 재료를 이용하여 촉매 반응으로 변환시키는 단계를 포함할 수 있다. 방법들은, 플라즈마 유출물들을 반도체 처리 챔버의 처리 영역에 전달하는 단계를 포함할 수 있다. 게르마늄 함유 재료의 노출된 영역을 갖는 기판은 처리 영역에 수납될 수 있다. 방법들은 또한, 게르마늄 함유 재료를 식각하는 단계를 포함할 수 있다.
일부 실시예들에서, 플루오린 라디칼들을 변환시키는 단계는, 플루오린 라디칼들로부터 적어도 2개의 플루오린 원자들을 포함하는 재료들을 촉매 재료 상에 형성하는 것을 포함할 수 있다. 챔버 구성요소는 원격 플라즈마 유닛 전달 튜브, 차단기 판, 면판, 이온 억제기, 또는 샤워헤드 중 하나 이상을 포함할 수 있다. 촉매 재료는, 니켈, 코발트, 바나듐, 니오븀, 탄탈럼, 크로뮴, 망가니즈, 레늄, 철, 루테늄, 오스뮴, 팔라듐, 백금, 로듐, 및 이리듐으로 구성된 군으로부터 선택된 원소를 포함하는 하나 이상의 재료들뿐만 아니라 이러한 재료들 중 임의의 재료의 산화물들을 포함하거나, 그러한 재료들일 수 있다. 챔버 구성요소는 약 70 ℃ 초과의 온도에서 유지될 수 있다. 기판은 약 30 ℃ 미만의 온도에서 유지될 수 있다. 처리 챔버 내의 압력은 약 1 Torr 내지 약 30 Torr에서 유지될 수 있다.
본 기술은 또한, 게르마늄 함유 재료를 식각하는 다른 방법들을 포함할 수 있다. 방법들은, 반도체 처리 챔버의 원격 플라즈마 영역에서 플루오린 함유 전구체의 플라즈마를 형성하는 단계를 포함할 수 있다. 방법들은, 플루오린 함유 전구체의 플라즈마 유출물들을, 챔버 구성요소에 한정된 애퍼처들을 통해 유동시키는 단계를 포함할 수 있다. 애퍼처들은 촉매 재료로 코팅될 수 있고, 챔버 구성요소는 약 70 ℃ 내지 약 150 ℃의 온도에서 유지될 수 있다. 방법들은, 플라즈마 유출물들에 있는 플루오린 라디칼들의 농도를 촉매 재료를 이용하여 감소시키는 단계를 포함할 수 있다. 방법들은, 플라즈마 유출물들을 반도체 처리 챔버의 처리 영역에 전달하는 단계를 포함할 수 있다. 노출된 게르마늄 함유 재료를 갖는 기판은 처리 영역에 수납될 수 있다. 기판은 약 30 ℃ 미만의 온도에서 유지될 수 있다. 방법들은 또한, 게르마늄 함유 재료를 식각하는 단계를 포함할 수 있다.
일부 실시예들에서, 촉매 재료는, 니켈, 코발트, 바나듐, 니오븀, 탄탈럼, 크로뮴, 망가니즈, 레늄, 철, 루테늄, 오스뮴, 팔라듐, 백금, 로듐, 및 이리듐으로 구성된 군으로부터 선택된 원소를 포함하는 하나 이상의 재료들뿐만 아니라 이러한 재료들의 산화물들을 포함할 수 있다. 처리 챔버 내의 압력은 약 1 Torr 내지 약 30 Torr에서 유지될 수 있다. 챔버 구성요소는 샤워헤드 또는 이온 억제기일 수 있거나, 샤워헤드 또는 이온 억제기를 포함할 수 있다.
그러한 기술은 종래의 시스템들 및 기술들에 비해 많은 이점들을 제공할 수 있다. 예를 들어, 프로세스들은 기판 상의 다른 노출된 재료들에 대한 게르마늄 함유 재료의 높은 식각 선택성을 허용할 수 있다. 부가적으로, 플라즈마 동작들은 열 기반 식각 동작들에 비해 더 많은 조정 능력들을 제공할 수 있다. 이러한 그리고 다른 실시예들이, 실시예들의 다수의 이점들 및 특징들과 더불어, 이하의 설명 및 첨부된 도면들과 함께 더 상세히 설명된다.
개시된 기술의 본질 및 이점들에 대한 추가의 이해가 본 명세서의 나머지 부분들 및 도면들을 참조하여 실현될 수 있다.
도 1은, 본 기술의 실시예들에 따른 예시적인 처리 시스템의 일 실시예의 상부 평면도를 도시한다.
도 2a는, 본 기술의 실시예들에 따른 예시적인 처리 챔버의 개략적인 횡단면도를 도시한다.
도 2b는, 본 기술의 실시예들에 따른, 도 2a에 예시된 처리 챔버의 일부의 상세도를 도시한다.
도 3은, 본 기술의 실시예들에 따른 예시적인 샤워헤드의 저부 평면도를 도시한다.
도 4는, 본 기술의 실시예들에 따른 방법에서의 예시적인 동작들을 도시한다.
도면들 중 몇몇은 개략도들로서 포함된다. 도면들은 예시적인 목적들을 위한 것이며, 비율을 고려했다고 구체적으로 언급되어 있지 않은 한, 비율을 고려하지 않은 것임을 이해해야 한다. 부가적으로, 개략도들로서, 도면들은 이해를 돕기 위해 제공되며, 현실적인 표현들에 비교하여 모든 양상들 또는 정보를 포함하지 않을 수 있고, 예시를 목적으로 과장된 자료를 포함할 수 있다.
첨부된 도면들에서, 유사한 구성요소들 및/또는 피처들은 동일한 참조 라벨을 가질 수 있다. 또한, 동일한 유형의 다양한 구성요소들은, 유사한 구성요소들을 구별하는 문자를 참조 라벨 뒤에 둠으로써 구별될 수 있다. 명세서에서 제1 참조 라벨만이 이용되는 경우, 그 설명은, 문자와 무관하게, 동일한 제1 참조 라벨을 갖는 유사한 구성요소들 중 어느 것에라도 적용될 수 있다.
도 1은, 본 기술의 실시예들에 따른 예시적인 처리 시스템의 일 실시예의 상부 평면도를 도시한다.
도 2a는, 본 기술의 실시예들에 따른 예시적인 처리 챔버의 개략적인 횡단면도를 도시한다.
도 2b는, 본 기술의 실시예들에 따른, 도 2a에 예시된 처리 챔버의 일부의 상세도를 도시한다.
도 3은, 본 기술의 실시예들에 따른 예시적인 샤워헤드의 저부 평면도를 도시한다.
도 4는, 본 기술의 실시예들에 따른 방법에서의 예시적인 동작들을 도시한다.
도면들 중 몇몇은 개략도들로서 포함된다. 도면들은 예시적인 목적들을 위한 것이며, 비율을 고려했다고 구체적으로 언급되어 있지 않은 한, 비율을 고려하지 않은 것임을 이해해야 한다. 부가적으로, 개략도들로서, 도면들은 이해를 돕기 위해 제공되며, 현실적인 표현들에 비교하여 모든 양상들 또는 정보를 포함하지 않을 수 있고, 예시를 목적으로 과장된 자료를 포함할 수 있다.
첨부된 도면들에서, 유사한 구성요소들 및/또는 피처들은 동일한 참조 라벨을 가질 수 있다. 또한, 동일한 유형의 다양한 구성요소들은, 유사한 구성요소들을 구별하는 문자를 참조 라벨 뒤에 둠으로써 구별될 수 있다. 명세서에서 제1 참조 라벨만이 이용되는 경우, 그 설명은, 문자와 무관하게, 동일한 제1 참조 라벨을 갖는 유사한 구성요소들 중 어느 것에라도 적용될 수 있다.
많은 새로운 반도체 구조들이 대안적인 재료들을 활용하기 때문에, 게르마늄 함유 재료들, 예컨대, 게르마늄 및 실리콘 게르마늄 또는 SiGe의 보급이 증가할 수 있다. 플루오린 함유 전구체들은 게르마늄 함유 재료들을 식각하기 위한 일부 기술에서 사용될 수 있지만, 기판 상의 많은 다른 노출된 재료들은 식각에 민감할 수 있다. 예를 들면, 플루오린 재료들, 예컨대, 플라즈마 유출물들에 있는 플루오린 라디칼들은, 프로세스 조건들 및 프로세스들에서 활용되는 부가적인 전구체들에 따라, 실리콘, 실리콘 질화물, 또는 실리콘 산화물을 식각할 수 있다. 종래의 프로세스들은, 이러한 한계에 맞추기 위해, 이 결함을 수용하고 특정 프로세스 조건들, 구조적 특징들, 및 식각제 화학물질들을 조정했을 수 있다. 본 기술은, 특히, 실리콘, 질화물, 및 다른 반도체 재료들과의 반응성을 감소시키도록 조정된 식각제를 인 시튜로 제조함으로써 이 문제들을 극복할 수 있다. 이는, 종래의 기술에 비해 상당히 증가된 식각률을 제공할 수 있다.
나머지 개시내용은 개시된 기술을 활용하는 구체적인 식각 프로세스들을 일상적으로 식별할 것이지만, 본 시스템들 및 방법들은 설명된 챔버들 내에서 발생할 수 있는 것으로서 증착 및 세정 프로세스들에 동등하게 적용가능함을 쉽게 이해할 것이다. 따라서, 본 기술은 오직 식각 프로세스들 또는 챔버들과 함께 사용하기 위한 것으로 제한되는 것으로 간주되어서는 안된다. 게다가, 예시적인 챔버가, 본 기술을 위한 기초를 제공하기 위해 설명되더라도, 본 기술은, 설명된 단일 챔버 동작들을 허용할 수 있는 사실상 임의의 반도체 처리 챔버에 적용될 수 있다는 것을 이해해야 한다.
도 1은, 실시예들에 따른 증착, 식각, 베이킹, 및 경화 챔버들의 처리 시스템(100)의 일 실시예의 상부 평면도를 도시한다. 이 도면에서, 한 쌍의 FOUP(front opening unified pod)들(102)이 다양한 크기들의 기판들을 공급하며, 이 기판들은, 로봇 암들(104)에 의해 수취되고, 탠덤 섹션들(109a-c) 내에 위치된 기판 처리 챔버들(108a-f) 중 하나 내에 배치되기 전에, 저압 유지 영역(106)에 배치된다. 제2 로봇 암(110)은, 기판 웨이퍼들을 유지 영역(106)으로부터 기판 처리 챔버들(108a-f)로 운반하고 역으로 운반하는 데에 사용될 수 있다. 각각의 기판 처리 챔버(108a-f)는, 주기적 층 증착(CLD), 원자 층 증착(ALD), 화학 기상 증착(CVD), 물리 기상 증착(PVD), 식각, 예비 세정, 탈기(degas), 배향, 및 다른 기판 프로세스들 이외에도 본원에 설명된 건식 식각 프로세스들을 포함하는 다수의 기판 처리 동작들을 수행하도록 갖추어질 수 있다.
기판 처리 챔버들(108a-f)은 기판 웨이퍼 상에 유전체 또는 금속성 막을 증착, 어닐링, 경화, 및/또는 식각하기 위한 하나 이상의 시스템 구성요소들을 포함할 수 있다. 일 구성에서, 처리 챔버들의 2개의 쌍들(예를 들어, 108c-d 및 108e-f)은 기판 상에 재료를 증착시키는 데에 사용될 수 있고, 처리 챔버들의 제3 쌍(예를 들어, 108a-b)은 증착된 재료를 식각하는 데에 사용될 수 있다. 다른 구성에서, 챔버들의 3개의 쌍들 전부(예를 들어, 108a-f)가 기판 상의 유전체 또는 금속성 막을 식각하도록 구성될 수 있다. 설명되는 프로세스들 중 임의의 하나 이상의 프로세스는, 상이한 실시예들에 도시된 제조 시스템과 분리된 챔버(들)에서 수행될 수 있다. 유전체 막들을 위한 증착, 식각, 어닐링, 및 경화 챔버들의 부가적인 구성들이 시스템(100)에 의해 고려된다는 것이 이해될 것이다.
도 2a는, 처리 챔버 내에서 분할된 플라즈마 발생 영역들을 갖는 예시적인 처리 챔버 시스템(200)의 횡단면도를 도시한다. 예를 들어, 티타늄 질화물, 탄탈럼 질화물, 텅스텐, 구리, 코발트, 실리콘, 폴리실리콘, 실리콘 산화물, 실리콘 질화물, 실리콘 산화질화물, 실리콘 산화탄화물 등과 같은 막 식각 동안, 프로세스 가스는 가스 입구 조립체(205)를 통해 제1 플라즈마 영역(215) 내로 유동될 수 있다. 원격 플라즈마 시스템(RPS)(201)이 시스템에 선택적으로 포함될 수 있고, 제1 가스를 처리할 수 있으며, 이 가스는 그 후 가스 입구 조립체(205)를 통해 이동한다. 입구 조립체(205)는, 제2 채널(도시되지 않음)이, 포함되는 경우, RPS(201)를 우회할 수 있는 2개 이상의 별개의 가스 공급 채널들을 포함할 수 있다.
차단기 판(203), 면판(217), 이온 억제기(223), 샤워헤드(225), 및 기판 지지 받침대(265) ― 기판 지지 받침대(265) 상에 기판(255)이 배치됨 ― 가 도시되어 있고, 이들 각각은 실시예들에 따라 포함될 수 있다. 받침대(265)는 열 교환 채널을 가질 수 있고, 기판의 온도를 제어하기 위해 이 열 교환 채널을 통해 열 교환 유체가 유동되며, 이 열 교환 채널은 처리 동작들 동안 기판 또는 웨이퍼를 가열하고/가열하거나 냉각하도록 동작될 수 있다. 알루미늄, 세라믹, 또는 이들의 조합을 포함할 수 있는, 받침대(265)의 웨이퍼 지지 플래터는 또한, 내장된 저항성 가열기 요소를 이용하여 비교적 높은 온도들, 예컨대, 약 100°C 또는 최대 100°C로부터 약 600°C 또는 600°C 초과까지 달성하기 위해 저항성 가열될 수 있다.
면판(217)은 피라미드형, 원뿔형, 또는 좁은 최상부 부분이 넓은 최하부 부분으로 확장되는 다른 유사한 구조일 수 있다. 부가적으로, 면판(217)은 도시된 바와 같이 평평할 수 있고, 프로세스 가스들을 분배하는 데에 사용되는 복수의 관통 채널들을 포함할 수 있다. RPS(201)의 사용에 따라, 플라즈마 발생 가스들 및/또는 플라즈마 여기 종은, 제1 플라즈마 영역(215) 내로의 더 균일한 전달을 위해, 면판(217)에 있는, 도 2b에 도시된, 복수의 홀들을 통과할 수 있다.
예시적인 구성들은, 가스들/종이 면판(217)의 홀들을 통해 제1 플라즈마 영역(215) 내로 유동하도록, 면판(217)에 의해 제1 플라즈마 영역(215)으로부터 분할된 가스 공급 영역(258) 내로 개방된 가스 입구 조립체(205)를 갖는 것을 포함할 수 있다. 플라즈마가 제1 플라즈마 영역(215)으로부터 공급 영역(258), 가스 입구 조립체(205), 및 유체 공급 시스템(210) 내로 상당히 역류하는 것을 방지하기 위해, 구조적 및 동작적 특징들이 선택될 수 있다. 면판(217), 또는 챔버의 전도성 최상부 부분, 및 샤워헤드(225)는 피처들 사이에 절연 링(220)이 위치된 상태로 도시되고, 절연 링은 이온 억제기(223) 및/또는 샤워헤드(225)에 대해 면판(217)에 AC 전위가 인가되는 것을 허용한다. 절연 링(220)은, 면판(217)과 샤워헤드(225) 및/또는 이온 억제기(223) 사이에 위치될 수 있고, 용량 결합된 플라즈마(CCP)가 제1 플라즈마 영역 내에 형성될 수 있게 한다. 부가적으로, 배플(도시되지 않음)이, 가스 입구 조립체(205)를 통한 제1 플라즈마 영역(215) 내로의 유체의 유동에 영향을 미치기 위해, 영역에 위치되거나, 다른 방식으로 가스 입구 조립체(205)와 커플링될 수 있다.
이온 억제기(223)는, 이온성 대전된 종이 제1 플라즈마 영역(215) 밖으로 이동하는 것을 억제하는 한편, 대전되지 않은 중성 또는 라디칼 종이 이온 억제기(223)를 통과하여 억제기와 샤워헤드 사이의 활성화된 가스 전달 영역 내로 가는 것을 허용하도록 구성된 구조 전체에 걸친 복수의 애퍼처들을 한정하는 판 또는 다른 기하형상을 포함할 수 있다. 실시예들에서, 이온 억제기(223)는 다양한 애퍼처 구성들을 갖는 천공된 판을 포함할 수 있다. 이러한 대전되지 않은 종은, 반응성이 낮은 캐리어 가스와 함께 애퍼처들을 통해 운반되는 반응성이 높은 종을 포함할 수 있다. 위에서 언급된 바와 같이, 홀들을 통한 이온 종의 이동이 감소될 수 있고, 일부 경우들에서는 완전히 억제될 수 있다. 이온 억제기(223)를 통과하는 이온 종의 양을 제어하는 것은, 하부의 웨이퍼 기판과 접촉하게 되는 가스 혼합물에 대한 증가된 제어를 유리하게 제공할 수 있고, 이는 결과적으로 가스 혼합물의 증착 및/또는 식각 특성들의 제어를 증가시킬 수 있다. 예를 들어, 가스 혼합물의 이온 농도의 조절은 가스 혼합물의 식각 선택성, 예를 들어 SiNx:SiOx 식각 비들, Si:SiOx 식각 비들 등을 상당히 변경할 수 있다. 증착이 수행되는 대안적인 실시예들에서, 이는 또한, 유전체 재료들에 대한 등각성-대-유동성 스타일 증착들의 균형(balance of conformal-to-flowable style depositions)을 변경할 수 있다.
이온 억제기(223)에 있는 복수의 애퍼처들은 이온 억제기(223)를 통한 활성화된 가스, 즉 이온, 라디칼, 및/또는 중성 종의 통과를 제어하도록 구성될 수 있다. 예를 들어, 홀들의 종횡비 또는 홀 직경 대 길이, 및/또는 홀들의 기하형상은, 이온 억제기(223)를 통과하는 활성화된 가스에 있는 이온성 대전된 종의 유동이 감소되도록 제어될 수 있다. 이온 억제기(223)에 있는 홀들은 플라즈마 여기 영역(215)과 대면하는 테이퍼된 부분, 및 샤워헤드(225)와 대면하는 원통형 부분을 포함할 수 있다. 원통형 부분은, 샤워헤드(225)에 전달되는 이온 종의 유동을 제어하기 위한 형상 및 치수를 가질 수 있다. 또한, 이온 억제기(223)를 통한 이온 종의 유동을 제어하기 위한 부가적인 수단으로서, 조정가능한 전기 바이어스가 억제기에 인가될 수 있다.
이온 억제기(223)는 플라즈마 발생 영역으로부터 기판으로 이동하는 대전된 종의 양을 감소시키거나 제거하는 기능을 할 수 있다. 대전되지 않은 중성 및 라디칼 종은, 기판과 반응하기 위해, 이온 억제기에 있는 개구들을 여전히 통과할 수 있다. 실시예들에서, 기판을 둘러싸는 반응 영역에 있는 대전된 종의 완전한 제거가 수행되지 않을 수 있다는 점이 주목되어야 한다. 특정한 경우들에서, 대전된 종은 식각 및/또는 증착 프로세스를 수행하기 위해 기판에 도달하도록 의도된다. 이러한 경우들에서, 이온 억제기는 반응 영역에서의 대전된 종의 농도를 프로세스에 도움이 되는 수준으로 제어하는 데에 도움을 줄 수 있다.
이온 억제기(223)와 조합된 샤워헤드(225)는, 제1 플라즈마 영역(215)에 존재하는 플라즈마가 기판 처리 영역(233)에서의 가스들의 직접적인 여기를 회피하는 것을 허용하는 한편, 여기된 종이 챔버 플라즈마 영역(215)으로부터 기판 처리 영역(233) 내로 이동하는 것은 여전히 허용할 수 있다. 이 방식으로, 챔버는, 플라즈마가, 식각 중인 기판(255)과 접촉하는 것을 방지하도록 구성될 수 있다. 이는, 발생된 플라즈마에 의해 직접 접촉되는 경우에는 손상되거나 전위되거나 다른 방식으로 휘어질 수 있는, 기판 상에 패터닝되는 다양한 복잡한 구조들 및 막들을 유리하게 보호할 수 있다. 부가적으로, 플라즈마가 기판과 접촉하거나 기판 레벨에 접근하도록 허용될 때, 산화물 종이 식각하는 식각률이 증가할 수 있다. 따라서, 재료의 노출된 영역이 산화물인 경우, 이 재료는 플라즈마를 기판으로부터 원격으로 유지함으로써 더 보호될 수 있다.
처리 시스템은, 제1 플라즈마 영역(215) 또는 처리 영역(233)에 플라즈마를 발생시키기 위해, 면판(217), 이온 억제기(223), 샤워헤드(225), 및/또는 받침대(265)에 전력을 제공하도록 처리 챔버와 전기적으로 커플링되는 전력 공급부(240)를 더 포함할 수 있다. 전력 공급부는, 수행되는 프로세스에 따라, 조절가능한 양의 전력을 챔버에 전달하도록 구성될 수 있다. 그러한 구성은, 조정가능한 플라즈마가, 수행 중인 프로세스들에서 사용되는 것을 허용할 수 있다. 종종, 켜거나 끄는 기능과 함께 제공되는 원격 플라즈마 유닛과 달리, 조정가능한 플라즈마는 특정 양의 전력을 플라즈마 영역(215)에 전달하도록 구성될 수 있다. 이는 결과적으로, 전구체들이, 이 전구체들에 의해 초래되는 식각 프로파일들을 증진시키는 특정 방식들로 해리될 수 있도록, 특정 플라즈마 특성들의 전개를 허용할 수 있다.
플라즈마는, 샤워헤드(225) 아래의 기판 처리 영역(233) 또는 샤워헤드(225) 위의 챔버 플라즈마 영역(215)에서 점화될 수 있다. 플라즈마는, 예를 들어, 플루오린 함유 전구체 또는 다른 전구체의 유입으로부터 라디칼 전구체들을 생성하기 위해, 챔버 플라즈마 영역(215) 내에 존재할 수 있다. 전형적으로 무선 주파수(RF) 범위에 있는 AC 전압이, 증착 동안 챔버 플라즈마 영역(215)에서 플라즈마를 점화하기 위해, 처리 챔버의 전도성 최상부 부분, 예컨대, 면판(217)과 샤워헤드(225) 및/또는 이온 억제기(223) 사이에 인가될 수 있다. RF 전력 공급부는 13.56 MHz의 높은 RF 주파수를 발생시킬 수 있지만, 또한, 13.56 MHz 주파수와 조합하여 또는 단독으로 다른 주파수들을 발생시킬 수 있다.
도 2b는, 면판(217)을 통한 처리 가스 분배에 영향을 주는 피처들의 상세도(253)를 도시한다. 도 2a 및 2b에 도시된 바와 같이, 가스 공급 영역(258)을 한정하기 위해 면판(217), 차단기 판(203), 및 가스 입구 조립체(205)가 교차하고, 프로세스 가스들은 가스 입구 조립체(205)로부터 이 가스 공급 영역(258) 내로 전달될 수 있다. 가스들은 가스 공급 영역(258)을 채울 수 있고, 면판(217)에 있는 애퍼처들(259)을 통해 제1 플라즈마 영역(215)으로 유동할 수 있다. 애퍼처들(259)은, 프로세스 가스들이 처리 영역(233) 내로 유동할 수 있지만, 면판(217)을 횡단한 후 가스 공급 영역(258) 내로 역류하는 것은 부분적으로 또는 완전하게 방지될 수 있도록, 유동을 실질적으로 단방향 방식으로 지향시키도록 구성될 수 있다.
처리 챔버 시스템(200)에서 사용하기 위한 가스 분배 조립체들, 예컨대, 샤워헤드(225)는 이중 채널 샤워헤드들(DCSH)로서 지칭될 수 있고, 도 3에 설명된 실시예들에서 부가적으로 상세히 설명된다. 이중 채널 샤워헤드는, 식각제들이 처리 영역(233) 내에 전달되기 전에 챔버 구성요소들과 그리고 서로 상호작용하는 것을 제한하기 위해 처리 영역 외부에서의 식각제들의 분리를 허용하는 식각 프로세스들을 제공할 수 있다.
샤워헤드(225)는 상부 판(214) 및 하부 판(216)을 포함할 수 있다. 판들은 서로 결합되어 판들 사이의 용적(218)을 한정할 수 있다. 판들의 결합은, 상부 및 하부 판들을 통한 제1 유체 채널들(219) 및 하부 판(216)을 통한 제2 유체 채널들(221)을 제공하기 위한 것일 수 있다. 형성된 채널들은, 용적(218)으로부터 제2 유체 채널들(221)만을 단독으로 경유하여 하부 판(216)을 통하는 유체 접근을 제공하도록 구성될 수 있고, 제1 유체 채널들(219)은 제2 유체 채널들(221) 및 판들 사이의 용적(218)으로부터 유체적으로 격리될 수 있다. 용적(218)은, 가스 분배 조립체 또는 샤워헤드(225)의 측면을 통해 유체적으로 접근가능할 수 있다.
도 3은, 실시예들에 따른 처리 챔버와 함께 사용하기 위한 샤워헤드(325)의 저면도이다. 샤워헤드(325)는 도 2a에 도시된 샤워헤드(225)에 대응할 수 있다. 제1 유체 채널들(219)의 모습을 보여주는 관통 홀들(365)은, 샤워헤드(225)를 통한 전구체들의 유동을 제어하고 이 유동에 영향을 주기 위해, 복수의 형상들 및 구성들을 가질 수 있다. 제2 유체 채널들(221)의 모습을 보여주는 작은 홀들(375)은, 샤워헤드의 표면에 걸쳐서, 심지어는 관통 홀들(365) 사이에서도 실질적으로 균일하게 분포될 수 있고, 전구체들이 샤워헤드에서 빠져나갈 때, 다른 구성들에 비해 더 균일한 전구체들의 혼합을 제공하는 데에 도움이 될 수 있다.
앞서 논의된 챔버들은, 식각 방법들을 포함하는 예시적인 방법들을 수행하는 데에 사용될 수 있다. 본 기술의 실시예들에 따른 방법(400)에서의 예시적인 동작들이 도시된 도 4를 참조한다. 방법의 제1 동작 이전에, 기판은, 방법(400)이 수행될 수 있는 챔버의 처리 영역 내에 배치되기 전에 하나 이상의 방식들로 처리될 수 있다. 예를 들어, 피처들이 제조될 수 있고, 게르마늄 함유 재료가 기판 상에 형성될 수 있다. 일부 실시예들에서, 제1 게르마늄 농도에 의해 특성화되는 제1 게르마늄 함유 재료가 형성될 수 있고, 제2 게르마늄 농도에 의해 특성화되는 제2 게르마늄 함유 재료가 형성될 수 있다. 기판 상에 형성되고/형성되거나 노출될 수 있는 부가적인 재료들은 실리콘, 질화물, 또는 산화물 재료들을 포함할 수 있다.
방법(400)은, 동작(405)에서, 반도체 처리 챔버의 원격 플라즈마 영역에서 플루오린 함유 전구체의 플라즈마를 형성하는 단계를 포함할 수 있다. 원격 플라즈마 영역은, 기판이 수납될 수 있는 처리 영역에 인접한 영역, 예컨대, 앞서 논의된 영역(215)일 수 있다. 원격 플라즈마 영역은 또한, 처리 챔버와 유체적으로 커플링된 개별 원격 플라즈마 유닛, 예컨대, 앞서 설명된 RPS(201)일 수 있다. 플라즈마는, 플라즈마가 웨이퍼 또는 기판 레벨에 형성되지 않을 수 있는 원격 플라즈마일 수 있으며, 일부 실시예들에서, 기판이 수납되는 처리 영역은, 식각 방법(400)의 동작들 동안, 플라즈마가 없는 상태로 유지될 수 있다. 플라즈마가 없다는 것은, 원격 플라즈마 영역으로부터의 일부 이동성 요소들이 처리 영역 내로 연장될 수 있지만, 동작들 동안에 웨이퍼 레벨 플라즈마가 형성되지 않을 수 있음을 의미한다.
실시예들에서, 플루오린 함유 전구체는 삼플루오린화질소일 수 있다. 플루오린의 다른 공급원들이, 삼플루오린화질소를 증대시키거나 교체하는 데에 사용될 수 있다. 일반적으로, 플루오린 함유 전구체는 플라즈마 영역 내로 유동될 수 있고, 플루오린 함유 전구체는 하나 이상의 플루오린 함유 재료들, 예컨대, 플루오로카본, 원자 플루오린, 이원자 플루오린, 할로겐간 플루오린화물, 예컨대, 삼플루오린화브로민 또는 삼플루오린화염소, 삼플루오린화질소, 육플루오린화황, 또는 이플루오린화제논을 포함할 수 있다. 일부 실시예들에서, 플루오린 함유 전구체는, 수명이 더 긴 여기된 중성 플루오린 종을 플라즈마 유출물들에 생성할 수 있는 삼플루오린화질소일 수 있다. 하나 이상의 부가적인 전구체들은 플루오린 함유 전구체와 함께 유동될 수 있고, 캐리어 가스로서 사용될 수 있거나, 개별적으로 처리 챔버에 전달될 수 있다. 부가적인 전구체들은 아르곤, 헬륨, 네온, 제논, 또는 플루오린 함유 재료들의 유동 특성들, 식각제 형성, 또는 해리를 보조하도록 구성된 일부 다른 재료를 포함할 수 있다. 실시예들에서, 부가적인 전구체의 유량은 삼플루오린화질소의 유량보다 2배, 3배, 4배, 또는 5배 더 클 수 있고, 이는 실리콘 게르마늄의 식각 선택성을 증가시킬 수 있다.
동작(410)에서, 플라즈마로부터 형성된 플라즈마 유출물들은 챔버 내로 또는 챔버를 통해 유동될 수 있고, 촉매 재료와 접촉하거나 촉매 재료를 통과할 수 있다. 실시예들에서, 촉매 재료는 하나 이상의 챔버 구성요소들에 포함될 수 있고, 플라즈마 형성에 대해서 위치될 수 있다. 예를 들어, 촉매 재료는, 이온 억제기(223) 및 샤워헤드(225)와 같은, 이온 억제기 또는 샤워헤드와 연관될 수 있다. 촉매 재료는 구성요소 상에 코팅될 수 있거나, 인서트들로서 통합될 수 있거나, 구성요소가 적어도 부분적으로 촉매 재료로 형성될 수 있다. 비제한적인 예들로서, 일부 실시예들에서, 촉매 재료는 구성요소의 하나 이상의 표면들 상에 코팅될 수 있다. 샤워헤드 또는 이온 억제기의 경우, 촉매 재료는 구성요소의 상류 측들 상에 또는 전체 구성요소 상에 코팅될 수 있다.
촉매 재료는 특히, 구성요소의 애퍼처들을 통해 형성될 수 있다. 이 애퍼처들은 높은 표면적을 제공할 수 있고, 입자들은 구성요소를 통해 진행하기 이전에 애퍼처들의 측벽들과 여러 번 충돌하거나 상호작용할 수 있다. 이는, 촉매 변환이 일어날 충분한 기회를 제공할 수 있다. 부가적으로, 처리 챔버의 다른 구성요소들이 촉매 재료로 코팅될 수 있거나 촉매 재료를 포함할 수 있다. 예를 들어, 플라즈마 유출물들이 RPS 유닛에서 형성될 때, 촉매 재료는 챔버의 하나 이상의 구성요소들에 포함될 수 있다. 예를 들어, 입구 조립체(205)의 전달 튜브가 촉매 재료로 라이닝될 수 있다. 부가적으로, 차단기 판(203), 면판(217), 이온 억제기(223), 또는 샤워헤드(225)의 애퍼처 측벽들을 포함하는 표면들 중 임의의 표면이 촉매 재료로 코팅될 수 있거나, 촉매 재료와 커플링될 수 있다.
동작(415)에서, 플라즈마 유출물들에 있는 플루오린 라디칼들의 농도 또는 개수를 감소시키기 위해, 촉매 변환이 일어날 수 있다. 촉매 재료는, 플루오린 원자들의, 분자당 적어도 2개의 플루오린 원자들을 포함하는 부가적인 재료들로의 변환을 용이하게 할 수 있다. 예를 들어, 삼플루오린화질소가 예시적인 플루오린 함유 전구체로서 사용되는 경우, 플라즈마 유출물들은 NF*, NF2 *, 및 F*를 포함하는 재료들의 조합을 포함할 수 있다. 플루오린 라디칼들은, 기판 상에 노출된 실리콘 및 실리콘 질화물 재료들을 식각할 수 있고, 이는, 게르마늄 또는 SiGe 식각의 선택성을 감소시킬 수 있다. 끊임없이 축소되는 디바이스에 대한 임계 치수들이 계속 감소하기 때문에, 10, 50 또는 심지어 100의 선택성들은 게르마늄 식각 중에 다른 재료들을 유지하기에 충분하지 않을 수 있다.
촉매 재료는, F2, N2F4, 또는 다수의 결합된 플루오린 원자들을 갖거나, 감소된 라디칼 성분들을 갖거나, 라디칼 성분들을 갖지 않는 다른 조합들과 같은 대안적인 식각제 재료들로의 플루오린 라디칼들의 변환을 용이하게 할 수 있다. 이 식각제들, 이를테면 F2는, 게르마늄 또는 실리콘 게르마늄을, 예컨대, 게르마늄 농도가 감소된, 다른 실리콘 게르마늄, 산화물, 질화물, 및 실리콘에 대해 우선적으로 식각할 수 있다. 일단 플루오린 라디칼들의 감소 또는 촉매 변환이 일어나면, 동작(420)에서, 개질된 플라즈마 유출물들은, 기판이 수납될 수 있는 처리 영역으로 전달될 수 있다. 후속하여, 동작(425)에서, 게르마늄 함유 재료는 식각될 수 있다. 플루오린 라디칼 종의 농도를 상당히 감소시킴으로써, 본 기술은 종래 기술들에 비해 증가된 식각 선택성들을 생성할 수 있다. 예를 들어, 실시예들에서, 본 기술은 실리콘 게르마늄 또는 게르마늄을, 더 낮은 게르마늄 농도를 갖는 실리콘 게르마늄, 실리콘 질화물, 또는 실리콘에 대해 약 100:1 이상, 약 200:1 이상, 약 300:1 이상, 약 400:1 이상, 약 500:1 이상, 약 600:1 이상, 약 700:1 이상, 약 800:1 이상, 약 900:1 이상, 또는 최대 1000:1 이상의 선택성으로 식각할 수 있다.
본 기술은 제1 실리콘 게르마늄을, 더 낮은 게르마늄 농도를 갖는 제2 실리콘 게르마늄에 대해 식각할 수 있다. 일반적으로 말해서, 막이 실리콘을 포함하는, Y가 0인 것에 이르기까지, 그리고 막이 게르마늄을 포함하는, X가 1인 것에 이르기까지 모든 X>Y 경우에 대해, Si(1-X)GeX는 Si(1-Y)GeY보다 더 빨리 식각될 수 있다. Si(1-X)GeX는 제1 식각률로 식각될 수 있는 반면, Si(1-Y)GeY는 제2 식각률로 식각될 수 있다. 실시예들에 따라, 제1 식각률은 제2 식각률보다 더 클 수 있다. 실시예들에서, 제1 식각률은, 2개의 재료들 간의 게르마늄 농도 차이에 따라, 제2 식각률을 10배, 20배, 50배, 100배, 300배, 500배 이상만큼 초과할 수 있다.
촉매 재료는 촉매 표면을 제공하기 위해 공지된 많은 재료들을 포함하거나 그러한 재료들일 수 있다. 예를 들어, 촉매 재료는, 다양한 농도들의, 니켈, 코발트, 바나듐, 니오븀, 탄탈럼, 크로뮴, 망가니즈, 레늄, 철, 루테늄, 오스뮴, 팔라듐, 백금, 로듐, 이리듐뿐만 아니라 이러한 재료들 중 임의의 재료의 산화물들, 또는 다른 공지된 촉매 물질들을 포함하거나, 그러한 재료들일 수 있다.
온도 및 압력은, 본 기술의 선택성뿐만 아니라 촉매 활성도 둘 모두에 영향을 미칠 수 있다. 예를 들어, 충분한 촉매 활성도를 보장하기 위해, 실시예들에서, 촉매 재료가 배치되는 디바이스의 온도는 약 50 ℃ 이상일 수 있다. 약 50 ℃ 미만 또는 그보다 더한 온도들은 플루오린 라디칼들을 충분히 변환시키지 않을 수 있고, 이는 식각 프로세스의 선택성을 감소시킬 수 있거나 실질적으로 감소시킬 수 있다. 부가적으로, 온도는 약 60 ℃ 이상, 약 65 ℃ 이상, 약 70 ℃ 이상, 약 75 ℃ 이상, 약 80 ℃ 이상, 약 85 ℃ 이상, 약 90 ℃ 이상, 약 95 ℃ 이상, 약 100 ℃ 이상, 약 105 ℃ 이상, 약 110 ℃ 이상, 약 115 ℃ 이상, 약 120 ℃ 이상, 약 125 ℃ 이상, 약 130 ℃ 이상, 약 135 ℃ 이상, 약 140 ℃ 이상, 약 145 ℃ 이상, 약 150 ℃ 이상이거나, 또는 더 높을 수 있다.
본 플라즈마 기술에 의해 생성된 이원자 플루오린은 게르마늄 함유 재료들을 유리하게 식각할 수 있다. 그러나, 이원자 플루오린은 챔버 환경 내에서의 해리에 민감할 수 있고, 이는 프로세스의 선택성을 감소시킬 수 있다. 이에 따라, 일부 실시예들에서, 온도는, 플루오린의 해리를 제한하고 충분한 식각 선택성을 유지하기 위해, 약 200 ℃ 이하, 약 190 ℃ 이하, 약 180 ℃ 이하, 약 170 ℃ 이하, 약 160 ℃ 이하, 약 150 ℃ 이하, 약 140 ℃ 이하, 약 130 ℃ 이하, 약 120 ℃ 이하로, 또는 더 낮게 유지될 수 있다.
부가적으로, 기판 온도가 식각 선택성에 기여할 수 있고, 증가된 촉매 온도가 식각제 생성에 유리할 수 있더라도, 그러한 온도들은, 식각제가 기판에 전달될 때, 프로세스의 선택성을 감소시킬 수 있다. 이에 따라, 방법(400) 동안에, 기판은, 실시예들에서, 약 50 ℃ 이하로 유지될 수 있고, 실시예들에서, 약 45 ℃ 이하, 약 40 ℃ 이하, 약 35 ℃ 이하, 약 30 ℃ 이하, 약 25 ℃ 이하, 약 20 ℃ 이하, 약 15 ℃ 이하, 약 10 ℃ 이하, 약 5 ℃ 이하, 약 0 ℃ 이하, 약 -5 ℃ 이하로, 또는 더 낮게 유지될 수 있다.
처리 챔버 내의 압력이 또한, 식각제 형성 및 동작들의 선택성에 기여할 수 있다. 일부 실시예들에서, 압력은 약 1 Torr 이상일 수 있고, 약 2 Torr 이상, 약 3 Torr 이상, 약 5 Torr 이상, 약 10 Torr 이상, 약 15 Torr 이상, 약 20 Torr 이상, 약 25 Torr 이상, 약 30 Torr 이상, 약 35 Torr 이상, 약 40 Torr 이상, 약 45 Torr 이상, 약 50 Torr 이상이거나, 또는 더 높을 수 있다. 더 높은 압력은 플라즈마 유출물 종의 충돌들 또는 상호작용들을 용이하게 할 수 있고, 따라서, 실시예들에서, 챔버 내의 압력은 약 2 또는 약 3 Torr 이상으로 유지될 수 있다. 그러나, 압력은 또한, 부분 압력이 증가할 때 이원자 플루오린의 해리에 기여할 수 있고, 이는, 형성된 식각제 종을 손상시키는 충돌들을 더 증가시킬 수 있다. 식각제 분자들이 해리될 때, 플루오린 라디칼 유출물들의 재생성 때문에 선택성이 감소될 수 있다. 이에 따라, 압력은, 앞서 설명된 선택성들을 유지하기 위해, 약 50 Torr 이하, 약 40 Torr 이하, 약 30 Torr 이하, 또는 약 20 Torr 이하로 유지될 수 있다.
논의된 압력 및 온도 영역들 내에서 동작들을 수행함으로써, 본 기술은 게르마늄 함유 재료들을 우선적으로 제거하는 식각제 종을 생성할 수 있다. 이 동작들은, 종래 기술들을 능가하는, 게르마늄 함유 재료들의 선택성들 및 제거율들을 제공할 수 있다.
앞의 설명에서는, 설명을 목적으로, 본 기술의 다양한 실시예들의 이해를 제공하기 위하여 다수의 세부사항들이 제시되었다. 그러나, 특정 실시예들이 이러한 세부사항들 중 일부가 없이, 또는 부가적인 세부사항들과 함께 실시될 수 있다는 점이, 관련 기술분야의 통상의 기술자에게 명백할 것이다.
몇몇 실시예들을 개시하였지만, 실시예들의 사상으로부터 벗어나지 않고 다양한 수정들, 대안적인 구성들, 및 등가물들이 사용될 수 있음이, 관련 기술분야의 통상의 기술자들에 의해 인식될 것이다. 부가적으로, 본 기술을 불필요하게 모호하게 하는 것을 회피하기 위해, 다수의 잘 공지된 프로세스들 및 요소들은 설명되지 않았다. 이에 따라, 상기 설명은 본 기술의 범위를 제한하는 것으로 간주되어서는 안 된다. 부가적으로, 방법들 또는 프로세스들은 순차적인 것으로서 또는 단계들로 설명될 수 있지만, 동작들은 동시에, 또는 나열된 것과 상이한 순서들로 수행될 수 있음을 이해해야 한다.
수치의 범위가 제공된 경우, 문맥에서 명확히 다르게 지시하지 않는 한, 그 범위의 상한 및 하한 사이의 각 중간 수치 (내지 하한의 단위의 가장 작은 부분까지)도 또한 분명히 개시됨을 이해하여야 한다. 임의의 명시된 수치 또는 명시된 범위 내 명시되지 않은 중간 수치와, 그 명시된 범위 내 임의의 다른 명시된 또는 중간 수치 사이의 임의의 더 좁은 범위가 포함된다. 이들 더 작은 범위의 상한 및 하한은 독립적으로 범위 내에 포함되거나 제외될 수 있고, 더 작은 범위 내 둘 중 하나의 한계가 포함되거나, 두 한계가 모두 포함되지 않거나 또는 두 한계가 모두 포함되는 각 범위는 또한 명시된 범위 내에 임의의 분명히 제외된 한계를 조건으로, 기술 내에 포함된다. 언급된 범위가 한계 중 하나 또는 그 둘 다를 포함할 경우, 상기 포함된 한계 중 하나 또는 그 둘 다를 제외한 범위 또한 포함된다.
본원에서 그리고 첨부된 청구항들에서 사용되는 바와 같이, 단수 형태는, 문맥이 명확히 달리 지시하지 않는 한, 복수의 지시대상들을 포함한다. 따라서, 예를 들어, "전구체"에 대한 언급은 복수의 그러한 전구체들을 포함하며, "층"에 대한 언급은 하나 이상의 층들 및 관련 기술분야의 통상의 기술자에게 공지된 이들의 등가물들에 대한 언급을 포함하는 것 등이다.
또한, "포함하다", "포함하는"이라는 단어들은, 본 명세서에서 그리고 이하의 청구항들에서 사용될 때, 언급된 특징들, 정수들, 구성요소들 또는 동작들의 존재를 특정하도록 의도되지만, 이 단어들은 하나 이상의 다른 특징들, 정수들, 구성요소들, 동작들, 작용들, 또는 군들의 존재 또는 부가를 배제하지는 않는다.
Claims (15)
- 게르마늄 함유 재료를 식각하는 방법으로서,
반도체 처리 챔버의 원격 플라즈마 영역에서 플루오린 함유 전구체의 플라즈마를 형성하는 단계;
상기 플루오린 함유 전구체의 플라즈마 유출물들을, 챔버 구성요소에 한정된 애퍼처들을 통해 유동시키는 단계 ― 상기 애퍼처들은 촉매 재료로 코팅됨 ―;
상기 플라즈마 유출물들에 있는 플루오린 라디칼들의 농도를 상기 촉매 재료를 이용하여 감소시키는 단계;
상기 플라즈마 유출물들을 상기 반도체 처리 챔버의 처리 영역에 전달하는 단계 ― 게르마늄 함유 재료를 포함하는 기판이 상기 처리 영역에 수납됨 ―; 및
상기 게르마늄 함유 재료를 식각하는 단계를 포함하는, 게르마늄 함유 재료를 식각하는 방법. - 제1항에 있어서,
상기 촉매 재료는, 니켈, 코발트, 바나듐, 니오븀, 탄탈럼, 크로뮴, 망가니즈, 레늄, 철, 루테늄, 오스뮴, 팔라듐, 백금, 로듐, 및 이리듐으로 구성된 군으로부터 선택된 원소를 포함하는 하나 이상의 재료들을 포함하는, 게르마늄 함유 재료를 식각하는 방법. - 제1항에 있어서,
상기 챔버 구성요소는 약 70 ℃ 초과의 온도에서 유지되는, 게르마늄 함유 재료를 식각하는 방법. - 제1항에 있어서,
상기 기판은 약 30 ℃ 미만의 온도에서 유지되는, 게르마늄 함유 재료를 식각하는 방법. - 제1항에 있어서,
상기 게르마늄 함유 재료는 SiGe를 포함하는, 게르마늄 함유 재료를 식각하는 방법. - 제1항에 있어서,
상기 게르마늄 함유 재료는 제1 게르마늄 함유 재료이고, 상기 제1 게르마늄 함유 재료는 실리콘 또는 제2 게르마늄 함유 재료에 대해 식각되며, 상기 제2 게르마늄 함유 재료는, 상기 제1 게르마늄 함유 재료보다 더 낮은 게르마늄 농도에 의해 특성화되는, 게르마늄 함유 재료를 식각하는 방법. - 제1항에 있어서,
상기 처리 챔버 내의 압력은 약 2 Torr 초과로 유지되는, 게르마늄 함유 재료를 식각하는 방법. - 게르마늄 함유 재료를 식각하는 방법으로서,
반도체 처리 챔버의 원격 플라즈마 영역에서 플루오린 함유 전구체의 플라즈마를 형성하는 단계;
상기 플루오린 함유 전구체의 플라즈마 유출물들을, 촉매 재료를 포함하는 챔버 구성요소를 통해 유동시키는 단계;
상기 플라즈마 유출물들에 있는 플루오린 라디칼들의 적어도 일부를 상기 촉매 재료를 이용하여 촉매 반응으로 변환시키는 단계;
상기 플라즈마 유출물들을 상기 반도체 처리 챔버의 처리 영역에 전달하는 단계 ― 게르마늄 함유 재료를 포함하는 기판이 상기 처리 영역에 수납됨 ―; 및
상기 게르마늄 함유 재료를 식각하는 단계를 포함하는, 게르마늄 함유 재료를 식각하는 방법. - 제8항에 있어서,
상기 변환 단계는, 상기 플루오린 라디칼들로부터 적어도 2개의 플루오린 원자들을 포함하는 재료들을 상기 촉매 재료 상에 형성하는 것을 포함하는, 게르마늄 함유 재료를 식각하는 방법. - 제8항에 있어서,
상기 챔버 구성요소는 원격 플라즈마 유닛 전달 튜브, 차단기 판, 면판, 이온 억제기, 또는 샤워헤드 중 하나 이상을 포함하는, 게르마늄 함유 재료를 식각하는 방법. - 제8항에 있어서,
상기 촉매 재료는, 니켈, 코발트, 바나듐, 니오븀, 탄탈럼, 크로뮴, 망가니즈, 레늄, 철, 루테늄, 오스뮴, 팔라듐, 백금, 로듐, 및 이리듐으로 구성된 군으로부터 선택된 원소를 포함하는 하나 이상의 재료들을 포함하는, 게르마늄 함유 재료를 식각하는 방법. - 제8항에 있어서,
상기 챔버 구성요소는 약 70 ℃ 초과의 온도에서 유지되는, 게르마늄 함유 재료를 식각하는 방법. - 제8항에 있어서,
상기 기판은 약 30 ℃ 미만의 온도에서 유지되는, 게르마늄 함유 재료를 식각하는 방법. - 게르마늄 함유 재료를 식각하는 방법으로서,
반도체 처리 챔버의 원격 플라즈마 영역에서 플루오린 함유 전구체의 플라즈마를 형성하는 단계;
상기 플루오린 함유 전구체의 플라즈마 유출물들을, 챔버 구성요소에 한정된 애퍼처들을 통해 유동시키는 단계 ― 상기 애퍼처들은 촉매 재료로 코팅되고, 상기 챔버 구성요소는 약 70 ℃ 내지 약 150 ℃의 온도에서 유지됨 ―;
상기 플라즈마 유출물들에 있는 플루오린 라디칼들의 농도를 상기 촉매 재료를 이용하여 감소시키는 단계;
상기 플라즈마 유출물들을 상기 반도체 처리 챔버의 처리 영역에 전달하는 단계 ― 게르마늄 함유 재료를 포함하는 기판이 상기 처리 영역에 수납되고, 상기 기판은 약 30 ℃ 미만의 온도에서 유지됨 ―; 및
상기 게르마늄 함유 재료를 식각하는 단계를 포함하는, 게르마늄 함유 재료를 식각하는 방법. - 제14항에 있어서,
상기 촉매 재료는, 니켈, 코발트, 바나듐, 니오븀, 탄탈럼, 크로뮴, 망가니즈, 레늄, 철, 루테늄, 오스뮴, 팔라듐, 백금, 로듐, 및 이리듐으로 구성된 군으로부터 선택된 원소를 포함하는 하나 이상의 재료들을 포함하는, 게르마늄 함유 재료를 식각하는 방법.
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TW201911412A (zh) | 2019-03-16 |
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JP2019062187A (ja) | 2019-04-18 |
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KR102655277B1 (ko) | 2024-04-08 |
TWM577172U (zh) | 2019-04-21 |
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