JP3977324B2 - リソグラフィ装置 - Google Patents
リソグラフィ装置 Download PDFInfo
- Publication number
- JP3977324B2 JP3977324B2 JP2003417259A JP2003417259A JP3977324B2 JP 3977324 B2 JP3977324 B2 JP 3977324B2 JP 2003417259 A JP2003417259 A JP 2003417259A JP 2003417259 A JP2003417259 A JP 2003417259A JP 3977324 B2 JP3977324 B2 JP 3977324B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- substrate
- liquid
- inlet
- seal member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Multimedia (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
− 放射線の投影ビームを供給する放射線システムと、
− 所望するパターンに従って投影ビームをパターン化するパターニング手段を支持する支持構造と、
− 基板を保持する基板テーブルと、
− パターン化されたビームを基板の目標部分に投影する投影システムと、
− 該投影システムの最終素子と該基板間のスペースを少なくとも部分的に液体で満たす液体供給システムとから成るリソグラフィ投影装置に関する。
− マスク。マスクの概念はリソグラフィにおいて周知のものであり、これには、様々なハイブリッドマスクタイプのみならず、バイナリマスク、レベンソンマスク、減衰位相シフトマスクといったようなマスクタイプも含まれる。放射線ビームにこのようなマスクを配置することにより、マスクに照射する放射線の、マスクパターンに従う選択的透過(透過性マスクの場合)や選択的反射(反射性マスクの場合)を可能にする。マスクの場合、その支持構造は一般的に、入射する放射線ビームの所望する位置にマスクを保持しておくことが可能であり、かつ、必要な場合、ビームに対して運動させることの可能なマスクテーブルである。
− プログラマブルミラーアレイ。このようなデバイスの一例として、粘弾性制御層および反射面を有するマトリクスアドレス可能面があげられる。こうした装置の基本的原理は、(例えば)反射面のアドレスされた領域は入射光を回折光として反射するが、アドレスされていない領域は入射光を非回折光として反射するといったことである。適切なフィルタを使用することにより、回折光のみを残して上記非回折光を反射ビームからフィルタすることが可能である。この方法において、ビームはマトリクスアドレス可能面のアドレスパターンに従ってパターン形成される。プログラマブルミラーアレイのまた別の実施形態では小さな複数のミラーのマトリクス配列を用いる。そのミラーの各々は、適した局部電界を適用することによって、もしくは圧電作動手段を用いることによって、軸を中心に個々に傾けられている。もう一度言うと、ミラーはマトリクスアドレス可能であり、それによりアドレスされたミラーはアドレスされていないミラーとは異なる方向に入射の放射線ビームを反射する。このようにして、反射されたビームはマトリクスアドレス可能ミラーのアドレスパターンに従いパターン形成される。必要とされるマトリクスアドレッシングは適切な電子手段を用いて実行される。前述の両方の状況において、パターニング手段は1つ以上のプログラマブルミラーアレイから構成可能である。ここに参照を行ったミラーアレイに関するより多くの情報は、例えば、米国特許第US5,296,891号および同第US5,523,193号、並びに、PCT特許種出願第WO98/38597および同WO98/33096に開示されているので詳細は、これらの内容を参照されたい。プログラマブルミラーアレイの場合、上記支持構造は、例えばフレームもしくはテーブルとして具体化され、これは必要に応じて、固定式となるか、もしくは可動式となる。
− プログラマブルLCDアレイ。このような構成の例が米国特許第US5,229,872号に開示されているので詳細は、この内容を参照されたい。上記同様、この場合における支持構造も、例えばフレームもしくはテーブルとして具体化され、これも必要に応じて、固定式となるか、もしくは可動式となる。簡潔化の目的で、本文の残りを、特定の箇所において、マスクおよびマスクテーブルを必要とする例に限定して説明することとする。しかし、こうした例において論じられる一般的な原理は、既に述べたようなパターニング手段のより広範な状況において理解されるべきである。
− 上記投影システムの最終素子と上記基板テーブル間の上記スペースの少なくとも境界の部分に沿って伸長したシール部材と、
− 該シール部材と該基板の表面間においてガスシールを形成するガスシール手段とから構成される。
となり、△Vは時間tmin内に該スペースから取り除かれなくてはならない液体の量であり、Lはダクト長であり、ηは該スペースにおける液体の粘度であり、そして△Pmaxは該最終素子にかかる最大許容圧力である。
− 放射線感光材料の層により少なくとも部分的に覆われた基板を提供するステップと、
− 放射線システムを用いて放射線の投影ビームを供給するステップと、
− パターニング手段を用いて投影ビームのその断面にパターンを与えるステップと、
− 放射線感光材料の層の目標部分に放射線のパターン化されたビームを投影するステップと、
− 基板と、上記投影ステップにおいて使用される投影システムの最終素子間のスペースを満たすように液体を供給するステップとからなるデバイス製造方法が提供され、
− 該スペースの少なくとも境界の部分に沿って伸長したシール部材と該基板の表面間においてガスシールを形成するか、あるいは、
− ダクトを通して該スペースと液体にて連結する液体リザーバを提供するかのいずれかであって、
− 該ダクトは、
の液体の流れ方向に垂直な面において最小の断面領域を有しており、ここで、△Vは時間tmin内に該スペースから取り除かれなくてはならない液体の量であり、Lはダクト長であり、ηは該スペースにおける液体の粘度であり、そして△Pmaxは該最終素子上の最大許容圧力であることを特徴とし、あるいは、
− 抑制手段によって該液体の波の発生を抑制し、かつ、該液体の圧力を解除させることを特徴とする。
− ステップモードにおいて、マスクテーブルMTは基本的に静止状態に保たれている。そして、マスクの像全体が1回の作動(すなわち1回の「フラッシュ」)で目標部分Cに投影される。次に基板テーブルWTがx方向および/あるいはy方向にシフトされ、異なる目標部分CがビームPBにより照射され得る。
− スキャンモードにおいて、基本的に同一シナリオが適用されるが、但し、ここでは、所定の目標部分Cは1回の「フラッシュ」では露光されない。代わって、マスクテーブルMTが、速度vにて所定方向(いわゆる「走査方向」、例えばy方向)に運動可能であり、それによってビームPBがマスクの像を走査する。これと同時に、基板テーブルWTが速度V=Mvで、同一方向あるいは反対方向に運動する。ここで、MはレンズPLの倍率(一般的にM=1/4あるいは1/5)である。このように、解像度を妥協することなく、比較的大きな目標部分Cを露光することが可能となる。
ここで、Rはダクト半径であり、△Vは時間t内にリザーバ10から取り除かれなくてはならない液体の量であり、Lはダクトの長さであり、ηは液体の粘度であり、そして△Pは第二リザーバと第一リザーバ10間の圧力差である。基板テーブルが0.2m/秒(実験により計測)の速度でクラッシュする可能性があり、かつ、△Pmaxは104Paである(最大圧力において投影システムの最終素子はダメージが生じる前は持ちこたえることが出来る)という仮定がたてられる場合、必要パイプ半径は0.2mのダクト長に対して約2.5ミリメータである。望ましくは、ダクトの有効半径は式から得られる最小値の少なくとも2倍である。
Claims (22)
- 放射線の投影ビームを供給する放射線システムと、
所望するパターンに従って投影ビームをパターン化するパターニング手段を支持する支持構造と、
基板を保持する基板テーブルと、
パターン化されたビームを基板の目標部分に投影する投影システムと、
該投影システムの最終素子と該基板間のスペースを少なくとも部分的に液体で満たす液体供給システムとから成るリソグラフィ投影装置において、該液体供給システムは、
上記投影システムの最終素子と上記基板テーブル間の上記スペースの少なくとも境界の部分に沿って伸長したシール部材と、
該シール部材と該基板の表面間においてガスシールを形成するガスシール手段とにより構成されることを特徴とするリソグラフィ投影装置。 - 上記のガスシール手段は、上記基板上にて上記シール部材を支持するガスベアリングであることを特徴とする、
請求項1に記載の装置。 - 上記のガスシール手段は、上記基板に対向した上記シール部材の面に形成されたガス導入口および第一ガス導出口と、該導入口に加圧下にてガスを供給する手段と、該第一ガス導出口からガスを抽出する真空手段とにより構成されていることを特徴とする、
請求項1または2に記載の装置。 - ガスソースに連結した、上記第一ガス導出口と上記ガス導入口間に配置されたさらなる導入口をさらに備えていることを特徴とする、
請求項3に記載の装置。 - 上記のさらなる導入口は、上記基板に面した上記シール部材の面における連続した環状の溝から成ることを特徴とする、
請求項4に記載の装置。 - 上記の溝の放射状の最も内側のコーナーは半径を有することを特徴とする、
請求項5に記載の装置。 - 上記の第一ガス導出口は、上記基板に面した上記シール部材の面における連続した環状の溝から成ることを特徴とする、
請求項3から6のいずれか1項に記載の装置。 - 上記の第一ガス導出口および/または上記のガス導入口は、上記供給の手段と上記真空手段間のそれぞれのチャンバと、上記表面における導入口あるいは導出口の開口から成り、チャンバは該開口よりも低い流量制限をもたらすことを特徴とする、
請求項3から7のいずれか1項に記載の装置。 - 上記のガス導入口は、上記基板に面した上記シール部材の面における一続きの別々の開口からなることを特徴とする、
請求項3から8のいずれか1項に記載の装置。 - ガス導入口の領域にガスの流れを均等に分配するよう、該ガス導入口に多孔質部材が配置されることを特徴とする、
請求項3から9のいずれか1項に記載の装置。 - 上記のガスシール手段は、上記基板に対向した上記シール部材の上記面に形成された第二ガス導出口をさらに備え、上記第一ガス導出口および該第二ガス導出口は上記ガス導入口の両側に形成されることを特徴とする、
請求項3から10のいずれか1項に記載の装置。 - 上記基板に対する、上記第一ガス導出口と上記ガス導入口間における上記面の部分の距離を変える手段をさらに備えていることを特徴とする、
請求項3から11のいずれか1項に記載の装置。 - 該装置は、上記基板に対する、上記第一ガス導出口と上記光軸に最も近い面のエッジ間における上記面の部分の距離を変える手段をさらに備えていることを特徴とする、
請求項3から12のいずれか1項に記載の装置。 - 上記のガスシール手段は、上記第一ガス導出口よりも投影システムの光軸に近くに位置して、上記面に形成されるチャネルを備えていることを特徴とする、
請求項3から13のいずれか1項に記載の装置。 - 上記のチャネルは第二ガス導入口であることを特徴とする、
請求項14に記載の装置。 - 上記のチャネルは、上記スペースにおける液面の上の周囲圧に開口していることを特徴とする、
請求項15に記載の装置。 - 上記のガス導入口は、上記投影システムの光軸から、上記第一ガス導出口よりもさらに外側に配置されていることを特徴とする、
請求項3から16のいずれか1項に記載の装置。 - 上記のガス導入口およびガス導出口は、それぞれ該基板に対向した該シール部材の該面における溝と、間隔をとって配置された該溝に導かれる複数の導管とから成ることを特徴とする、
請求項3から17のいずれか1項に記載の装置。 - 上記シール部材の上記面と、上記基板および/または上記基板のトポロジー間の距離を測定するセンサーをさらに備えていることを特徴とする、
請求項1から18のいずれか1項に記載の装置。 - 上記シール部材と上記基板間の剛性、および/または、上記シール部材と上記基板間の距離を調整するために、上記ガスシール手段におけるガスの圧力を調節する調整手段をさらに備えていることを特徴とする、
請求項1から19のいずれか1項に記載の装置。 - 毛管作用によりギャップ内に液体を引き込むよう、かつ/またはガスシール部材からのガスが上記投影システムと上記基板間の上記スペースに入るのを防ぐよう、上記シール部材と上記ガスシール手段の内側にある該基板の面との間のギャップは小さいことを特徴とする、
前記請求項のいずれか1項に記載の装置。 - 上記シール部材は、上記投影システムと上記基板間の上記スペースを囲んでいることを特徴とする、
前記請求項のいずれか1項に記載の装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02257822 | 2002-11-12 | ||
EP03252955 | 2003-05-13 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007038065A Division JP4567013B2 (ja) | 2002-11-12 | 2007-02-19 | リソグラフィ投影装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2004289126A JP2004289126A (ja) | 2004-10-14 |
JP3977324B2 true JP3977324B2 (ja) | 2007-09-19 |
Family
ID=33160979
Family Applications (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003417259A Expired - Fee Related JP3977324B2 (ja) | 2002-11-12 | 2003-11-11 | リソグラフィ装置 |
JP2007038065A Expired - Fee Related JP4567013B2 (ja) | 2002-11-12 | 2007-02-19 | リソグラフィ投影装置 |
JP2010059726A Expired - Fee Related JP5017403B2 (ja) | 2002-11-12 | 2010-03-16 | リソグラフィ投影装置 |
JP2011281445A Expired - Fee Related JP5480880B2 (ja) | 2002-11-12 | 2011-12-22 | リソグラフィ投影装置 |
Family Applications After (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007038065A Expired - Fee Related JP4567013B2 (ja) | 2002-11-12 | 2007-02-19 | リソグラフィ投影装置 |
JP2010059726A Expired - Fee Related JP5017403B2 (ja) | 2002-11-12 | 2010-03-16 | リソグラフィ投影装置 |
JP2011281445A Expired - Fee Related JP5480880B2 (ja) | 2002-11-12 | 2011-12-22 | リソグラフィ投影装置 |
Country Status (6)
Country | Link |
---|---|
US (8) | US6952253B2 (ja) |
JP (4) | JP3977324B2 (ja) |
KR (1) | KR100585476B1 (ja) |
CN (1) | CN100470367C (ja) |
SG (3) | SG135052A1 (ja) |
TW (1) | TWI232357B (ja) |
Families Citing this family (1121)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3639807B2 (ja) * | 2001-06-27 | 2005-04-20 | キヤノン株式会社 | 光学素子及び製造方法 |
US7367345B1 (en) | 2002-09-30 | 2008-05-06 | Lam Research Corporation | Apparatus and method for providing a confined liquid for immersion lithography |
US10503084B2 (en) | 2002-11-12 | 2019-12-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
DE60335595D1 (de) * | 2002-11-12 | 2011-02-17 | Asml Netherlands Bv | Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung |
US9482966B2 (en) | 2002-11-12 | 2016-11-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
CN100568101C (zh) | 2002-11-12 | 2009-12-09 | Asml荷兰有限公司 | 光刻装置和器件制造方法 |
SG121822A1 (en) * | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
US7110081B2 (en) * | 2002-11-12 | 2006-09-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7372541B2 (en) | 2002-11-12 | 2008-05-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
SG135052A1 (en) * | 2002-11-12 | 2007-09-28 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
EP1571694A4 (en) * | 2002-12-10 | 2008-10-15 | Nikon Corp | EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING THE DEVICE |
WO2004053955A1 (ja) * | 2002-12-10 | 2004-06-24 | Nikon Corporation | 露光装置及びデバイス製造方法 |
US7242455B2 (en) * | 2002-12-10 | 2007-07-10 | Nikon Corporation | Exposure apparatus and method for producing device |
JP4352874B2 (ja) * | 2002-12-10 | 2009-10-28 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
KR101101737B1 (ko) * | 2002-12-10 | 2012-01-05 | 가부시키가이샤 니콘 | 노광장치 및 노광방법, 디바이스 제조방법 |
SG150388A1 (en) * | 2002-12-10 | 2009-03-30 | Nikon Corp | Exposure apparatus and method for producing device |
US7948604B2 (en) * | 2002-12-10 | 2011-05-24 | Nikon Corporation | Exposure apparatus and method for producing device |
USRE48515E1 (en) | 2002-12-19 | 2021-04-13 | Asml Netherlands B.V. | Method and device for irradiating spots on a layer |
DE10261775A1 (de) | 2002-12-20 | 2004-07-01 | Carl Zeiss Smt Ag | Vorrichtung zur optischen Vermessung eines Abbildungssystems |
KR101288767B1 (ko) | 2003-02-26 | 2013-07-23 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
KR20050110033A (ko) | 2003-03-25 | 2005-11-22 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
EP1612850B1 (en) * | 2003-04-07 | 2009-03-25 | Nikon Corporation | Exposure apparatus and method for manufacturing a device |
KR20110104084A (ko) * | 2003-04-09 | 2011-09-21 | 가부시키가이샤 니콘 | 액침 리소그래피 유체 제어 시스템 |
KR101121655B1 (ko) | 2003-04-10 | 2012-03-09 | 가부시키가이샤 니콘 | 액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템 |
KR101238142B1 (ko) | 2003-04-10 | 2013-02-28 | 가부시키가이샤 니콘 | 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템 |
WO2004090633A2 (en) * | 2003-04-10 | 2004-10-21 | Nikon Corporation | An electro-osmotic element for an immersion lithography apparatus |
EP1611482B1 (en) * | 2003-04-10 | 2015-06-03 | Nikon Corporation | Run-off path to collect liquid for an immersion lithography apparatus |
WO2004092830A2 (en) | 2003-04-11 | 2004-10-28 | Nikon Corporation | Liquid jet and recovery system for immersion lithography |
SG10201504396VA (en) | 2003-04-11 | 2015-07-30 | Nikon Corp | Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly |
SG2014015135A (en) | 2003-04-11 | 2015-06-29 | Nippon Kogaku Kk | Cleanup method for optics in immersion lithography |
ATE542167T1 (de) | 2003-04-17 | 2012-02-15 | Nikon Corp | Lithographisches immersionsgerät |
TWI295414B (en) | 2003-05-13 | 2008-04-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
WO2004102646A1 (ja) * | 2003-05-15 | 2004-11-25 | Nikon Corporation | 露光装置及びデバイス製造方法 |
TWI503865B (zh) | 2003-05-23 | 2015-10-11 | 尼康股份有限公司 | A method of manufacturing an exposure apparatus and an element |
TWI612557B (zh) | 2003-05-23 | 2018-01-21 | Nikon Corp | 曝光方法及曝光裝置以及元件製造方法 |
KR20150036794A (ko) * | 2003-05-28 | 2015-04-07 | 가부시키가이샤 니콘 | 노광 방법, 노광 장치, 및 디바이스 제조 방법 |
DE10324477A1 (de) * | 2003-05-30 | 2004-12-30 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage |
TWI442694B (zh) * | 2003-05-30 | 2014-06-21 | Asml Netherlands Bv | 微影裝置及元件製造方法 |
US7213963B2 (en) | 2003-06-09 | 2007-05-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP1486827B1 (en) | 2003-06-11 | 2011-11-02 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7317504B2 (en) * | 2004-04-08 | 2008-01-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
TWI467634B (zh) * | 2003-06-13 | 2015-01-01 | 尼康股份有限公司 | An exposure method, a substrate stage, an exposure apparatus, and an element manufacturing method |
US6867844B2 (en) * | 2003-06-19 | 2005-03-15 | Asml Holding N.V. | Immersion photolithography system and method using microchannel nozzles |
KR101265450B1 (ko) | 2003-06-19 | 2013-05-16 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조방법 |
US6809794B1 (en) * | 2003-06-27 | 2004-10-26 | Asml Holding N.V. | Immersion photolithography system and method using inverted wafer-projection optics interface |
JP3862678B2 (ja) * | 2003-06-27 | 2006-12-27 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
DE60321779D1 (de) * | 2003-06-30 | 2008-08-07 | Asml Netherlands Bv | Lithographischer Apparat und Verfahren zur Herstellung eines Artikels |
KR20060027832A (ko) * | 2003-07-01 | 2006-03-28 | 가부시키가이샤 니콘 | 광학 엘리먼트로서 동위원소적으로 특정된 유체를 사용하는방법 |
EP2466382B1 (en) * | 2003-07-08 | 2014-11-26 | Nikon Corporation | Wafer table for immersion lithography |
WO2005006415A1 (ja) * | 2003-07-09 | 2005-01-20 | Nikon Corporation | 露光装置及びデバイス製造方法 |
ATE489724T1 (de) * | 2003-07-09 | 2010-12-15 | Nikon Corp | Belichtungsvorrichtung und verfahren zur bauelementherstellung |
KR101296501B1 (ko) * | 2003-07-09 | 2013-08-13 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
US7738074B2 (en) | 2003-07-16 | 2010-06-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP1500982A1 (en) | 2003-07-24 | 2005-01-26 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2005010960A1 (ja) | 2003-07-25 | 2005-02-03 | Nikon Corporation | 投影光学系の検査方法および検査装置、ならびに投影光学系の製造方法 |
EP1503244A1 (en) * | 2003-07-28 | 2005-02-02 | ASML Netherlands B.V. | Lithographic projection apparatus and device manufacturing method |
CN102012641B (zh) * | 2003-07-28 | 2015-05-06 | 株式会社尼康 | 曝光装置、器件制造方法 |
US7326522B2 (en) | 2004-02-11 | 2008-02-05 | Asml Netherlands B.V. | Device manufacturing method and a substrate |
US7779781B2 (en) | 2003-07-31 | 2010-08-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7370659B2 (en) * | 2003-08-06 | 2008-05-13 | Micron Technology, Inc. | Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines |
KR20180120816A (ko) * | 2003-08-21 | 2018-11-06 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
US8149381B2 (en) * | 2003-08-26 | 2012-04-03 | Nikon Corporation | Optical element and exposure apparatus |
SG133589A1 (en) * | 2003-08-26 | 2007-07-30 | Nikon Corp | Optical element and exposure device |
WO2005022615A1 (ja) * | 2003-08-29 | 2005-03-10 | Nikon Corporation | 液体回収装置、露光装置、露光方法及びデバイス製造方法 |
EP2261740B1 (en) | 2003-08-29 | 2014-07-09 | ASML Netherlands BV | Lithographic apparatus |
CN100407371C (zh) * | 2003-08-29 | 2008-07-30 | 株式会社尼康 | 曝光装置和器件加工方法 |
TWI245163B (en) | 2003-08-29 | 2005-12-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
TWI263859B (en) | 2003-08-29 | 2006-10-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
EP1660925B1 (en) * | 2003-09-03 | 2015-04-29 | Nikon Corporation | Apparatus and method for providing fluid for immersion lithography |
WO2005029559A1 (ja) * | 2003-09-19 | 2005-03-31 | Nikon Corporation | 露光装置及びデバイス製造方法 |
EP1519231B1 (en) * | 2003-09-29 | 2005-12-21 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
TWI525660B (zh) | 2003-09-29 | 2016-03-11 | 尼康股份有限公司 | An exposure apparatus and an exposure method, and an element manufacturing method |
US7158211B2 (en) * | 2003-09-29 | 2007-01-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7369217B2 (en) * | 2003-10-03 | 2008-05-06 | Micronic Laser Systems Ab | Method and device for immersion lithography |
JP2005136364A (ja) * | 2003-10-08 | 2005-05-26 | Zao Nikon Co Ltd | 基板搬送装置、露光装置、並びにデバイス製造方法 |
JP4319188B2 (ja) | 2003-10-08 | 2009-08-26 | 株式会社蔵王ニコン | 基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造装置及びデバイス製造方法 |
WO2005036623A1 (ja) | 2003-10-08 | 2005-04-21 | Zao Nikon Co., Ltd. | 基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造方法 |
TWI598934B (zh) | 2003-10-09 | 2017-09-11 | Nippon Kogaku Kk | Exposure apparatus, exposure method, and device manufacturing method |
EP1524557A1 (en) * | 2003-10-15 | 2005-04-20 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP1524558A1 (en) | 2003-10-15 | 2005-04-20 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2005041276A1 (ja) | 2003-10-28 | 2005-05-06 | Nikon Corporation | 露光装置、露光方法、デバイスの製造方法 |
US7411653B2 (en) | 2003-10-28 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus |
US7352433B2 (en) | 2003-10-28 | 2008-04-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4513747B2 (ja) | 2003-10-31 | 2010-07-28 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
US7528929B2 (en) * | 2003-11-14 | 2009-05-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7545481B2 (en) | 2003-11-24 | 2009-06-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8054447B2 (en) | 2003-12-03 | 2011-11-08 | Nikon Corporation | Exposure apparatus, exposure method, method for producing device, and optical part |
KR101111363B1 (ko) * | 2003-12-15 | 2012-04-12 | 가부시키가이샤 니콘 | 투영노광장치 및 스테이지 장치, 그리고 노광방법 |
KR101941351B1 (ko) | 2003-12-15 | 2019-01-22 | 가부시키가이샤 니콘 | 스테이지 장치, 노광 장치, 및 노광 방법 |
US20070081133A1 (en) * | 2004-12-14 | 2007-04-12 | Niikon Corporation | Projection exposure apparatus and stage unit, and exposure method |
US7394521B2 (en) * | 2003-12-23 | 2008-07-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7589818B2 (en) * | 2003-12-23 | 2009-09-15 | Asml Netherlands B.V. | Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus |
JP2005191393A (ja) * | 2003-12-26 | 2005-07-14 | Canon Inc | 露光方法及び装置 |
JP2005191394A (ja) * | 2003-12-26 | 2005-07-14 | Canon Inc | 露光方法及び装置 |
JP4954444B2 (ja) * | 2003-12-26 | 2012-06-13 | 株式会社ニコン | 流路形成部材、露光装置及びデバイス製造方法 |
DE602004027162D1 (de) | 2004-01-05 | 2010-06-24 | Nippon Kogaku Kk | Belichtungsvorrichtung, belichtungsverfahren und bauelementeherstellungsverfahren |
WO2005071491A2 (en) | 2004-01-20 | 2005-08-04 | Carl Zeiss Smt Ag | Exposure apparatus and measuring device for a projection lens |
US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
US7990516B2 (en) | 2004-02-03 | 2011-08-02 | Nikon Corporation | Immersion exposure apparatus and device manufacturing method with liquid detection apparatus |
EP3093873B1 (en) | 2004-02-04 | 2017-10-11 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing a device |
US20070058146A1 (en) * | 2004-02-04 | 2007-03-15 | Nikon Corporation | Exposure apparatus, exposure method, position control method, and method for producing device |
US7050146B2 (en) | 2004-02-09 | 2006-05-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4572896B2 (ja) * | 2004-02-19 | 2010-11-04 | 株式会社ニコン | 露光装置及びデバイスの製造方法 |
DE102004013886A1 (de) | 2004-03-16 | 2005-10-06 | Carl Zeiss Smt Ag | Verfahren zur Mehrfachbelichtung, Mikrolithografie-Projektionsbelichtungsanlage und Projektionssystem |
KR101707294B1 (ko) * | 2004-03-25 | 2017-02-15 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
US7034917B2 (en) * | 2004-04-01 | 2006-04-25 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
US7898642B2 (en) | 2004-04-14 | 2011-03-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP1753016B1 (en) * | 2004-04-19 | 2012-06-20 | Nikon Corporation | Exposure apparatus and device producing method |
US7379159B2 (en) | 2004-05-03 | 2008-05-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP1747499A2 (en) | 2004-05-04 | 2007-01-31 | Nikon Corporation | Apparatus and method for providing fluid for immersion lithography |
JP3981368B2 (ja) * | 2004-05-17 | 2007-09-26 | 松下電器産業株式会社 | パターン形成方法 |
US7616383B2 (en) * | 2004-05-18 | 2009-11-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7486381B2 (en) * | 2004-05-21 | 2009-02-03 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR101257960B1 (ko) | 2004-06-04 | 2013-04-24 | 칼 짜이스 에스엠테 게엠베하 | 광학적 결상 시스템의 결상 품질을 측정하기 위한 시스템 |
US20070103661A1 (en) * | 2004-06-04 | 2007-05-10 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
US20070216889A1 (en) * | 2004-06-04 | 2007-09-20 | Yasufumi Nishii | Exposure Apparatus, Exposure Method, and Method for Producing Device |
KR101422964B1 (ko) * | 2004-06-09 | 2014-07-24 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
CN100547730C (zh) * | 2004-06-10 | 2009-10-07 | 尼康股份有限公司 | 曝光装置及元件制造方法 |
US8717533B2 (en) | 2004-06-10 | 2014-05-06 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
US8508713B2 (en) | 2004-06-10 | 2013-08-13 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
EP3067750B1 (en) * | 2004-06-10 | 2019-01-30 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
US20070139628A1 (en) * | 2004-06-10 | 2007-06-21 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
US8373843B2 (en) | 2004-06-10 | 2013-02-12 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
US20070222959A1 (en) * | 2004-06-10 | 2007-09-27 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
EP2624282B1 (en) | 2004-06-10 | 2017-02-08 | Nikon Corporation | Immersion exposure apparatus and method, and methods for producing a device |
US7481867B2 (en) | 2004-06-16 | 2009-01-27 | Edwards Limited | Vacuum system for immersion photolithography |
US7688421B2 (en) * | 2004-06-17 | 2010-03-30 | Nikon Corporation | Fluid pressure compensation for immersion lithography lens |
US8698998B2 (en) * | 2004-06-21 | 2014-04-15 | Nikon Corporation | Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device |
US7463330B2 (en) | 2004-07-07 | 2008-12-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2006024715A (ja) * | 2004-07-07 | 2006-01-26 | Toshiba Corp | リソグラフィー装置およびパターン形成方法 |
EP1780772B1 (en) | 2004-07-12 | 2009-09-02 | Nikon Corporation | Exposure equipment and device manufacturing method |
US7161663B2 (en) * | 2004-07-22 | 2007-01-09 | Asml Netherlands B.V. | Lithographic apparatus |
US7224427B2 (en) * | 2004-08-03 | 2007-05-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Megasonic immersion lithography exposure apparatus and method |
KR101230712B1 (ko) * | 2004-08-03 | 2013-02-07 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
US7304715B2 (en) * | 2004-08-13 | 2007-12-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP1801853A4 (en) * | 2004-08-18 | 2008-06-04 | Nikon Corp | EXPOSURE DEVICE AND COMPONENT MANUFACTURING METHOD |
US7701550B2 (en) * | 2004-08-19 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20060044533A1 (en) * | 2004-08-27 | 2006-03-02 | Asmlholding N.V. | System and method for reducing disturbances caused by movement in an immersion lithography system |
JP2006080143A (ja) * | 2004-09-07 | 2006-03-23 | Matsushita Electric Ind Co Ltd | 露光装置及びパターン形成方法 |
TWI508136B (zh) | 2004-09-17 | 2015-11-11 | 尼康股份有限公司 | Exposure apparatus, exposure method, and device manufacturing method |
CN100539019C (zh) * | 2004-09-17 | 2009-09-09 | 株式会社尼康 | 曝光装置、曝光方法以及器件制造方法 |
US7522261B2 (en) * | 2004-09-24 | 2009-04-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7355674B2 (en) | 2004-09-28 | 2008-04-08 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and computer program product |
US7894040B2 (en) * | 2004-10-05 | 2011-02-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7209213B2 (en) * | 2004-10-07 | 2007-04-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4625673B2 (ja) * | 2004-10-15 | 2011-02-02 | 株式会社東芝 | 露光方法及び露光装置 |
US7119876B2 (en) * | 2004-10-18 | 2006-10-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7379155B2 (en) | 2004-10-18 | 2008-05-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7196768B2 (en) | 2004-10-26 | 2007-03-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2006049134A1 (ja) | 2004-11-01 | 2006-05-11 | Nikon Corporation | 露光装置及びデバイス製造方法 |
US7414699B2 (en) * | 2004-11-12 | 2008-08-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7583357B2 (en) * | 2004-11-12 | 2009-09-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7251013B2 (en) | 2004-11-12 | 2007-07-31 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7423720B2 (en) | 2004-11-12 | 2008-09-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7411657B2 (en) | 2004-11-17 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7230681B2 (en) * | 2004-11-18 | 2007-06-12 | International Business Machines Corporation | Method and apparatus for immersion lithography |
US7362412B2 (en) * | 2004-11-18 | 2008-04-22 | International Business Machines Corporation | Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system |
US7145630B2 (en) * | 2004-11-23 | 2006-12-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7256121B2 (en) * | 2004-12-02 | 2007-08-14 | Texas Instruments Incorporated | Contact resistance reduction by new barrier stack process |
US7161654B2 (en) * | 2004-12-02 | 2007-01-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7446850B2 (en) * | 2004-12-03 | 2008-11-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7804576B2 (en) * | 2004-12-06 | 2010-09-28 | Nikon Corporation | Maintenance method, maintenance device, exposure apparatus, and device manufacturing method |
US7248334B2 (en) * | 2004-12-07 | 2007-07-24 | Asml Netherlands B.V. | Sensor shield |
US7196770B2 (en) * | 2004-12-07 | 2007-03-27 | Asml Netherlands B.V. | Prewetting of substrate before immersion exposure |
US7397533B2 (en) * | 2004-12-07 | 2008-07-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7180571B2 (en) * | 2004-12-08 | 2007-02-20 | Asml Netherlands B.V. | Lithographic projection apparatus and actuator |
US7365827B2 (en) | 2004-12-08 | 2008-04-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4752473B2 (ja) * | 2004-12-09 | 2011-08-17 | 株式会社ニコン | 露光装置、露光方法及びデバイス製造方法 |
US7352440B2 (en) | 2004-12-10 | 2008-04-01 | Asml Netherlands B.V. | Substrate placement in immersion lithography |
GB0427104D0 (en) * | 2004-12-10 | 2005-01-12 | Exitech Ltd | Positioning device |
US7403261B2 (en) | 2004-12-15 | 2008-07-22 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7528931B2 (en) * | 2004-12-20 | 2009-05-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7880860B2 (en) | 2004-12-20 | 2011-02-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4551758B2 (ja) * | 2004-12-27 | 2010-09-29 | 株式会社東芝 | 液浸露光方法および半導体装置の製造方法 |
US7491661B2 (en) * | 2004-12-28 | 2009-02-17 | Asml Netherlands B.V. | Device manufacturing method, top coat material and substrate |
US7405805B2 (en) | 2004-12-28 | 2008-07-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20060147821A1 (en) | 2004-12-30 | 2006-07-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7450217B2 (en) * | 2005-01-12 | 2008-11-11 | Asml Netherlands B.V. | Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby |
SG124359A1 (en) | 2005-01-14 | 2006-08-30 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
SG124351A1 (en) * | 2005-01-14 | 2006-08-30 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
WO2006078292A1 (en) * | 2005-01-21 | 2006-07-27 | Nikon Corporation | Offset partial ring seal in immersion lithographic system |
US8692973B2 (en) | 2005-01-31 | 2014-04-08 | Nikon Corporation | Exposure apparatus and method for producing device |
JP5005226B2 (ja) * | 2005-01-31 | 2012-08-22 | 株式会社ニコン | 露光装置及びデバイス製造方法、液体保持方法 |
JP2011258999A (ja) * | 2005-01-31 | 2011-12-22 | Nikon Corp | 露光装置及びデバイス製造方法 |
KR20180125636A (ko) * | 2005-01-31 | 2018-11-23 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
EP1849040A2 (en) * | 2005-02-10 | 2007-10-31 | ASML Netherlands B.V. | Immersion liquid, exposure apparatus, and exposure process |
JP4807086B2 (ja) * | 2005-02-21 | 2011-11-02 | 株式会社ニコン | 露光装置、露光方法、及びデバイス製造方法 |
JP5343958B2 (ja) * | 2005-02-21 | 2013-11-13 | 株式会社ニコン | 露光装置、露光方法、及びデバイス製造方法 |
US8018573B2 (en) * | 2005-02-22 | 2011-09-13 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7224431B2 (en) * | 2005-02-22 | 2007-05-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7378025B2 (en) | 2005-02-22 | 2008-05-27 | Asml Netherlands B.V. | Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method |
US7282701B2 (en) | 2005-02-28 | 2007-10-16 | Asml Netherlands B.V. | Sensor for use in a lithographic apparatus |
US7428038B2 (en) | 2005-02-28 | 2008-09-23 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid |
JP4262252B2 (ja) * | 2005-03-02 | 2009-05-13 | キヤノン株式会社 | 露光装置 |
US7324185B2 (en) * | 2005-03-04 | 2008-01-29 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7684010B2 (en) * | 2005-03-09 | 2010-03-23 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing |
JP5040646B2 (ja) * | 2005-03-23 | 2012-10-03 | 株式会社ニコン | 露光装置及び露光方法、並びにデバイス製造方法 |
US7330238B2 (en) * | 2005-03-28 | 2008-02-12 | Asml Netherlands, B.V. | Lithographic apparatus, immersion projection apparatus and device manufacturing method |
KR101197071B1 (ko) | 2005-03-30 | 2012-11-06 | 가부시키가이샤 니콘 | 노광 조건의 결정 방법, 노광 방법 및 노광 장치, 그리고디바이스 제조 방법 |
US20070132976A1 (en) * | 2005-03-31 | 2007-06-14 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
KR20070115857A (ko) * | 2005-03-31 | 2007-12-06 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
JP2007019463A (ja) * | 2005-03-31 | 2007-01-25 | Nikon Corp | 露光装置、露光方法、及びデバイス製造方法 |
US7411654B2 (en) * | 2005-04-05 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
USRE43576E1 (en) | 2005-04-08 | 2012-08-14 | Asml Netherlands B.V. | Dual stage lithographic apparatus and device manufacturing method |
US7291850B2 (en) * | 2005-04-08 | 2007-11-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR101555707B1 (ko) | 2005-04-18 | 2015-09-25 | 가부시키가이샤 니콘 | 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법 |
US20060232753A1 (en) * | 2005-04-19 | 2006-10-19 | Asml Holding N.V. | Liquid immersion lithography system with tilted liquid flow |
EP1876635A4 (en) | 2005-04-25 | 2010-06-30 | Nikon Corp | EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD |
EP2527921A3 (en) | 2005-04-28 | 2017-10-18 | Nikon Corporation | Exposure method and exposure apparatus |
US7317507B2 (en) * | 2005-05-03 | 2008-01-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8248577B2 (en) * | 2005-05-03 | 2012-08-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7433016B2 (en) | 2005-05-03 | 2008-10-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7315033B1 (en) | 2005-05-04 | 2008-01-01 | Advanced Micro Devices, Inc. | Method and apparatus for reducing biological contamination in an immersion lithography system |
CN100445872C (zh) * | 2005-05-09 | 2008-12-24 | 浙江大学 | 浸没式光刻系统中的液体传送及气密封装置 |
JP2006339448A (ja) | 2005-06-02 | 2006-12-14 | Canon Inc | 受光ユニットを有する露光装置 |
JP2006344329A (ja) * | 2005-06-10 | 2006-12-21 | Sony Corp | 光ディスク記録再生装置 |
JP4884708B2 (ja) * | 2005-06-21 | 2012-02-29 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
US7652746B2 (en) | 2005-06-21 | 2010-01-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7751027B2 (en) * | 2005-06-21 | 2010-07-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP1895571A4 (en) | 2005-06-21 | 2011-04-27 | Nikon Corp | EXPOSURE DEVICE, EXPOSURE METHOD, MAINTENANCE METHOD AND COMPONENT MANUFACTURING METHOD |
US20070085989A1 (en) * | 2005-06-21 | 2007-04-19 | Nikon Corporation | Exposure apparatus and exposure method, maintenance method, and device manufacturing method |
JP4708876B2 (ja) * | 2005-06-21 | 2011-06-22 | キヤノン株式会社 | 液浸露光装置 |
US7924416B2 (en) | 2005-06-22 | 2011-04-12 | Nikon Corporation | Measurement apparatus, exposure apparatus, and device manufacturing method |
US7468779B2 (en) * | 2005-06-28 | 2008-12-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7834974B2 (en) * | 2005-06-28 | 2010-11-16 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7474379B2 (en) | 2005-06-28 | 2009-01-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7170583B2 (en) * | 2005-06-29 | 2007-01-30 | Asml Netherlands B.V. | Lithographic apparatus immersion damage control |
KR20080026082A (ko) | 2005-06-30 | 2008-03-24 | 가부시키가이샤 니콘 | 노광장치 및 방법, 노광장치의 메인터넌스 방법 및디바이스 제조방법 |
US7583358B2 (en) * | 2005-07-25 | 2009-09-01 | Micron Technology, Inc. | Systems and methods for retrieving residual liquid during immersion lens photolithography |
US7535644B2 (en) * | 2005-08-12 | 2009-05-19 | Asml Netherlands B.V. | Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby |
US8054445B2 (en) * | 2005-08-16 | 2011-11-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
TWI430039B (zh) | 2005-08-23 | 2014-03-11 | 尼康股份有限公司 | An exposure apparatus and an exposure method, and an element manufacturing method |
US7580112B2 (en) * | 2005-08-25 | 2009-08-25 | Nikon Corporation | Containment system for immersion fluid in an immersion lithography apparatus |
US7456928B2 (en) * | 2005-08-29 | 2008-11-25 | Micron Technology, Inc. | Systems and methods for controlling ambient pressure during processing of microfeature workpieces, including during immersion lithography |
TWI345685B (en) | 2005-09-06 | 2011-07-21 | Asml Netherlands Bv | Lithographic method |
US7426011B2 (en) * | 2005-09-12 | 2008-09-16 | Asml Netherlands B.V. | Method of calibrating a lithographic apparatus and device manufacturing method |
EP1933371A1 (en) | 2005-09-09 | 2008-06-18 | Nikon Corporation | Exposure apparatus, exposure method, and device production method |
US20070070323A1 (en) * | 2005-09-21 | 2007-03-29 | Nikon Corporation | Exposure apparatus, exposure method, and device fabricating method |
JPWO2007034838A1 (ja) | 2005-09-21 | 2009-03-26 | 株式会社ニコン | 露光装置及び露光方法、並びにデバイス製造方法 |
US7357768B2 (en) * | 2005-09-22 | 2008-04-15 | William Marshall | Recliner exerciser |
JP2007096050A (ja) | 2005-09-29 | 2007-04-12 | Canon Inc | 露光装置 |
US7411658B2 (en) | 2005-10-06 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR20080059572A (ko) * | 2005-10-07 | 2008-06-30 | 가부시키가이샤 니콘 | 광학 특성 계측 방법, 노광 방법 및 디바이스 제조 방법,그리고 검사 장치 및 계측 방법 |
JP4125315B2 (ja) | 2005-10-11 | 2008-07-30 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
JP2007142366A (ja) * | 2005-10-18 | 2007-06-07 | Canon Inc | 露光装置及びデバイス製造方法 |
DE102005052757B4 (de) * | 2005-11-04 | 2007-07-26 | Vistec Semiconductor Systems Gmbh | Vorrichtung zur Positionsmessung eines Objekts mit einem Laser-Interferometersystem |
US20070127002A1 (en) * | 2005-11-09 | 2007-06-07 | Nikon Corporation | Exposure apparatus and method, and device manufacturing method |
JPWO2007055199A1 (ja) | 2005-11-09 | 2009-04-30 | 株式会社ニコン | 露光装置及び方法、並びにデバイス製造方法 |
WO2007055237A1 (ja) | 2005-11-09 | 2007-05-18 | Nikon Corporation | 露光装置及び露光方法、並びにデバイス製造方法 |
CN100462845C (zh) * | 2005-11-11 | 2009-02-18 | 台湾积体电路制造股份有限公司 | 具有晶圆密封机构的改良型浸润式微影系统及其方法 |
KR20080068013A (ko) * | 2005-11-14 | 2008-07-22 | 가부시키가이샤 니콘 | 액체 회수 부재, 노광 장치, 노광 방법, 및 디바이스 제조방법 |
TWI479271B (zh) | 2005-11-15 | 2015-04-01 | 尼康股份有限公司 | An exposure apparatus and an exposure method, and an element manufacturing method |
US7864292B2 (en) | 2005-11-16 | 2011-01-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7656501B2 (en) * | 2005-11-16 | 2010-02-02 | Asml Netherlands B.V. | Lithographic apparatus |
US7804577B2 (en) | 2005-11-16 | 2010-09-28 | Asml Netherlands B.V. | Lithographic apparatus |
JP4968589B2 (ja) | 2005-11-16 | 2012-07-04 | 株式会社ニコン | 基板処理方法、フォトマスクの製造方法及びフォトマスク、並びにデバイス製造方法 |
US7633073B2 (en) * | 2005-11-23 | 2009-12-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7773195B2 (en) * | 2005-11-29 | 2010-08-10 | Asml Holding N.V. | System and method to increase surface tension and contact angle in immersion lithography |
US20070124987A1 (en) * | 2005-12-05 | 2007-06-07 | Brown Jeffrey K | Electronic pest control apparatus |
KR20080071555A (ko) | 2005-12-06 | 2008-08-04 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법, 투영 광학계 및 디바이스 제조방법 |
US7782442B2 (en) | 2005-12-06 | 2010-08-24 | Nikon Corporation | Exposure apparatus, exposure method, projection optical system and device producing method |
TW200725195A (en) | 2005-12-06 | 2007-07-01 | Nikon Corp | Exposure method, exposure apparatus, and unit manufacturing method |
KR100768849B1 (ko) * | 2005-12-06 | 2007-10-22 | 엘지전자 주식회사 | 계통 연계형 연료전지 시스템의 전원공급장치 및 방법 |
US20070126999A1 (en) * | 2005-12-07 | 2007-06-07 | Nikon Corporation | Apparatus and method for containing immersion liquid in immersion lithography |
US7420194B2 (en) * | 2005-12-27 | 2008-09-02 | Asml Netherlands B.V. | Lithographic apparatus and substrate edge seal |
US8953148B2 (en) * | 2005-12-28 | 2015-02-10 | Nikon Corporation | Exposure apparatus and making method thereof |
US7839483B2 (en) * | 2005-12-28 | 2010-11-23 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and a control system |
US7932994B2 (en) * | 2005-12-28 | 2011-04-26 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
US7649611B2 (en) | 2005-12-30 | 2010-01-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8472004B2 (en) * | 2006-01-18 | 2013-06-25 | Micron Technology, Inc. | Immersion photolithography scanner |
EP2963498B8 (en) | 2006-01-19 | 2017-07-26 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
US7848516B2 (en) * | 2006-01-20 | 2010-12-07 | Chiou-Haun Lee | Diffused symmetric encryption/decryption method with asymmetric keys |
JP2007201252A (ja) * | 2006-01-27 | 2007-08-09 | Canon Inc | 露光装置及びデバイス製造方法 |
EP1986222A4 (en) | 2006-02-16 | 2010-09-01 | Nikon Corp | EXPOSURE DEVICE, EXPOSURE METHOD AND COMPONENT MANUFACTURING METHOD |
US7714982B2 (en) | 2006-02-16 | 2010-05-11 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
KR20080102192A (ko) | 2006-02-16 | 2008-11-24 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
EP1986224A4 (en) | 2006-02-16 | 2012-01-25 | Nikon Corp | EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD |
EP3279739A1 (en) * | 2006-02-21 | 2018-02-07 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
KR20130057496A (ko) | 2006-02-21 | 2013-05-31 | 가부시키가이샤 니콘 | 패턴 형성 장치, 마크 검출 장치, 노광 장치, 패턴 형성 방법, 노광 방법 및 디바이스 제조 방법 |
EP3293577A1 (en) | 2006-02-21 | 2018-03-14 | Nikon Corporation | Exposure apparatus, exposure method and device manufacturing method |
WO2007102484A1 (ja) * | 2006-03-07 | 2007-09-13 | Nikon Corporation | デバイス製造方法、デバイス製造システム及び測定検査装置 |
US8045134B2 (en) | 2006-03-13 | 2011-10-25 | Asml Netherlands B.V. | Lithographic apparatus, control system and device manufacturing method |
WO2007105645A1 (ja) | 2006-03-13 | 2007-09-20 | Nikon Corporation | 露光装置、メンテナンス方法、露光方法及びデバイス製造方法 |
US7307687B2 (en) | 2006-03-20 | 2007-12-11 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and substrate |
JP4889331B2 (ja) * | 2006-03-22 | 2012-03-07 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
US8027019B2 (en) | 2006-03-28 | 2011-09-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2007266504A (ja) * | 2006-03-29 | 2007-10-11 | Canon Inc | 露光装置 |
US20070238261A1 (en) * | 2006-04-05 | 2007-10-11 | Asml Netherlands B.V. | Device, lithographic apparatus and device manufacturing method |
EP1843206B1 (en) * | 2006-04-06 | 2012-09-05 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7903232B2 (en) * | 2006-04-12 | 2011-03-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20070291261A1 (en) * | 2006-04-14 | 2007-12-20 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
US7701551B2 (en) * | 2006-04-14 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9477158B2 (en) * | 2006-04-14 | 2016-10-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7675604B2 (en) * | 2006-05-04 | 2010-03-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Hood for immersion lithography |
DE102006021797A1 (de) | 2006-05-09 | 2007-11-15 | Carl Zeiss Smt Ag | Optische Abbildungseinrichtung mit thermischer Dämpfung |
WO2007132862A1 (ja) * | 2006-05-16 | 2007-11-22 | Nikon Corporation | 投影光学系、露光方法、露光装置、及びデバイス製造方法 |
US8144305B2 (en) * | 2006-05-18 | 2012-03-27 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR20090018024A (ko) | 2006-05-18 | 2009-02-19 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 메인터넌스 방법, 그리고 디바이스 제조 방법 |
US7969548B2 (en) * | 2006-05-22 | 2011-06-28 | Asml Netherlands B.V. | Lithographic apparatus and lithographic apparatus cleaning method |
SG172607A1 (en) * | 2006-05-22 | 2011-07-28 | Nikon Corp | Exposure method and apparatus, maintenance method, and device manufacturing method |
EP2034515A4 (en) | 2006-05-23 | 2012-01-18 | Nikon Corp | MAINTENANCE METHOD, EXPOSURE METHOD AND DEVICE AND COMPONENT MANUFACTURING METHOD |
WO2007138834A1 (ja) | 2006-05-31 | 2007-12-06 | Nikon Corporation | 露光装置及び露光方法 |
EP2037488A4 (en) | 2006-06-09 | 2011-11-23 | Nikon Corp | METHOD AND DEVICE FOR FORMING PATTERNS, METHOD AND DEVICE FOR EXPOSING, AND METHOD FOR MANUFACTURING DEVICES |
US7656502B2 (en) * | 2006-06-22 | 2010-02-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP2043134A4 (en) | 2006-06-30 | 2012-01-25 | Nikon Corp | MAINTENANCE METHOD, EXPOSURE METHOD, AND DEVICE AND DEVICE MANUFACTURING METHOD |
US7826030B2 (en) | 2006-09-07 | 2010-11-02 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR20090060270A (ko) * | 2006-09-08 | 2009-06-11 | 가부시키가이샤 니콘 | 클리닝용 부재, 클리닝 방법, 그리고 디바이스 제조 방법 |
US7872730B2 (en) | 2006-09-15 | 2011-01-18 | Nikon Corporation | Immersion exposure apparatus and immersion exposure method, and device manufacturing method |
US8330936B2 (en) | 2006-09-20 | 2012-12-11 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR101419196B1 (ko) | 2006-09-29 | 2014-07-15 | 가부시키가이샤 니콘 | 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법 |
US20080100812A1 (en) * | 2006-10-26 | 2008-05-01 | Nikon Corporation | Immersion lithography system and method having a wafer chuck made of a porous material |
JP2008124194A (ja) | 2006-11-10 | 2008-05-29 | Canon Inc | 液浸露光方法および液浸露光装置 |
US20080158531A1 (en) | 2006-11-15 | 2008-07-03 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
US8045135B2 (en) | 2006-11-22 | 2011-10-25 | Asml Netherlands B.V. | Lithographic apparatus with a fluid combining unit and related device manufacturing method |
JP4758977B2 (ja) * | 2006-12-07 | 2011-08-31 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ投影装置、デバイス製造方法 |
US9632425B2 (en) | 2006-12-07 | 2017-04-25 | Asml Holding N.V. | Lithographic apparatus, a dryer and a method of removing liquid from a surface |
US8634053B2 (en) | 2006-12-07 | 2014-01-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4902505B2 (ja) * | 2006-12-07 | 2012-03-21 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置およびデバイス製造方法 |
US7791709B2 (en) * | 2006-12-08 | 2010-09-07 | Asml Netherlands B.V. | Substrate support and lithographic process |
US8634052B2 (en) * | 2006-12-13 | 2014-01-21 | Asml Netherlands B.V. | Lithographic apparatus and method involving a ring to cover a gap between a substrate and a substrate table |
US8416383B2 (en) * | 2006-12-13 | 2013-04-09 | Asml Netherlands B.V. | Lithographic apparatus and method |
JP2008147577A (ja) * | 2006-12-13 | 2008-06-26 | Canon Inc | 露光装置及びデバイス製造方法 |
US8654305B2 (en) | 2007-02-15 | 2014-02-18 | Asml Holding N.V. | Systems and methods for insitu lens cleaning in immersion lithography |
US8817226B2 (en) | 2007-02-15 | 2014-08-26 | Asml Holding N.V. | Systems and methods for insitu lens cleaning using ozone in immersion lithography |
US8237911B2 (en) | 2007-03-15 | 2012-08-07 | Nikon Corporation | Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine |
CN100462848C (zh) * | 2007-03-15 | 2009-02-18 | 浙江大学 | 浸没式光刻系统中的液体供给及回收的密封控制装置 |
US7948616B2 (en) | 2007-04-12 | 2011-05-24 | Nikon Corporation | Measurement method, exposure method and device manufacturing method |
US8011377B2 (en) * | 2007-05-04 | 2011-09-06 | Asml Netherlands B.V. | Cleaning device and a lithographic apparatus cleaning method |
US9013672B2 (en) * | 2007-05-04 | 2015-04-21 | Asml Netherlands B.V. | Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
US7866330B2 (en) * | 2007-05-04 | 2011-01-11 | Asml Netherlands B.V. | Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
US8947629B2 (en) * | 2007-05-04 | 2015-02-03 | Asml Netherlands B.V. | Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method |
US20090122282A1 (en) * | 2007-05-21 | 2009-05-14 | Nikon Corporation | Exposure apparatus, liquid immersion system, exposing method, and device fabricating method |
US8435593B2 (en) | 2007-05-22 | 2013-05-07 | Asml Netherlands B.V. | Method of inspecting a substrate and method of preparing a substrate for lithography |
KR20100031694A (ko) | 2007-05-28 | 2010-03-24 | 가부시키가이샤 니콘 | 노광 장치, 디바이스 제조 방법, 세정 장치, 및 클리닝 방법 그리고 노광 방법 |
US8164736B2 (en) * | 2007-05-29 | 2012-04-24 | Nikon Corporation | Exposure method, exposure apparatus, and method for producing device |
US8098362B2 (en) | 2007-05-30 | 2012-01-17 | Nikon Corporation | Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method |
US8514365B2 (en) * | 2007-06-01 | 2013-08-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8264662B2 (en) * | 2007-06-18 | 2012-09-11 | Taiwan Semiconductor Manufacturing Company, Ltd. | In-line particle detection for immersion lithography |
US7576833B2 (en) * | 2007-06-28 | 2009-08-18 | Nikon Corporation | Gas curtain type immersion lithography tool using porous material for fluid removal |
US20090002656A1 (en) * | 2007-06-29 | 2009-01-01 | Asml Netherlands B.V. | Device and method for transmission image detection, lithographic apparatus and mask for use in a lithographic apparatus |
US8194232B2 (en) | 2007-07-24 | 2012-06-05 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method |
TWI475336B (zh) | 2007-07-24 | 2015-03-01 | 尼康股份有限公司 | Mobile body driving method and moving body driving system, pattern forming method and apparatus, exposure method and apparatus, and component manufacturing method |
US20090025753A1 (en) * | 2007-07-24 | 2009-01-29 | Asml Netherlands B.V. | Lithographic Apparatus And Contamination Removal Or Prevention Method |
US7916269B2 (en) | 2007-07-24 | 2011-03-29 | Asml Netherlands B.V. | Lithographic apparatus and contamination removal or prevention method |
US8547527B2 (en) | 2007-07-24 | 2013-10-01 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method |
NL1035757A1 (nl) * | 2007-08-02 | 2009-02-03 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
US8064151B2 (en) * | 2007-08-14 | 2011-11-22 | Asml Netherlands B.V. | Lithographic apparatus and thermal optical manipulator control method |
US7924404B2 (en) * | 2007-08-16 | 2011-04-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9304412B2 (en) | 2007-08-24 | 2016-04-05 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method |
US20090051895A1 (en) * | 2007-08-24 | 2009-02-26 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, device manufacturing method, and processing system |
US8218129B2 (en) | 2007-08-24 | 2012-07-10 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system |
US8023106B2 (en) | 2007-08-24 | 2011-09-20 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method |
US8237919B2 (en) | 2007-08-24 | 2012-08-07 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads |
US8867022B2 (en) | 2007-08-24 | 2014-10-21 | Nikon Corporation | Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method |
US8681308B2 (en) * | 2007-09-13 | 2014-03-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20090109416A1 (en) * | 2007-09-13 | 2009-04-30 | Applied Precision, Inc. | Dispersing immersion liquid for high resolution imaging and lithography |
NL1035908A1 (nl) | 2007-09-25 | 2009-03-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
JP4533416B2 (ja) * | 2007-09-25 | 2010-09-01 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
NL1035942A1 (nl) * | 2007-09-27 | 2009-03-30 | Asml Netherlands Bv | Lithographic Apparatus and Method of Cleaning a Lithographic Apparatus. |
SG151198A1 (en) | 2007-09-27 | 2009-04-30 | Asml Netherlands Bv | Methods relating to immersion lithography and an immersion lithographic apparatus |
JP2009094145A (ja) * | 2007-10-04 | 2009-04-30 | Canon Inc | 露光装置、露光方法およびデバイス製造方法 |
NL1036009A1 (nl) * | 2007-10-05 | 2009-04-07 | Asml Netherlands Bv | An Immersion Lithography Apparatus. |
US8279399B2 (en) | 2007-10-22 | 2012-10-02 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
JP5145524B2 (ja) * | 2007-10-25 | 2013-02-20 | 株式会社ブイ・テクノロジー | 露光装置 |
NL1036069A1 (nl) * | 2007-10-30 | 2009-05-07 | Asml Netherlands Bv | An Immersion Lithography Apparatus. |
JP5017232B2 (ja) | 2007-10-31 | 2012-09-05 | エーエスエムエル ネザーランズ ビー.ブイ. | クリーニング装置および液浸リソグラフィ装置 |
US9013681B2 (en) * | 2007-11-06 | 2015-04-21 | Nikon Corporation | Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method |
JP2009117832A (ja) * | 2007-11-06 | 2009-05-28 | Asml Netherlands Bv | リソグラフィの基板を準備する方法、基板、デバイス製造方法、密封コーティングアプリケータ及び密封コーティング測定装置 |
US9256140B2 (en) * | 2007-11-07 | 2016-02-09 | Nikon Corporation | Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction |
CN101675500B (zh) * | 2007-11-07 | 2011-05-18 | 株式会社尼康 | 曝光装置、曝光方法以及元件制造方法 |
US8665455B2 (en) * | 2007-11-08 | 2014-03-04 | Nikon Corporation | Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method |
US8422015B2 (en) | 2007-11-09 | 2013-04-16 | Nikon Corporation | Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method |
NL1036187A1 (nl) * | 2007-12-03 | 2009-06-04 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL1036194A1 (nl) * | 2007-12-03 | 2009-06-04 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL1036211A1 (nl) * | 2007-12-03 | 2009-06-04 | Asml Netherlands Bv | Lithographic Apparatus and Device Manufacturing Method. |
NL1036186A1 (nl) * | 2007-12-03 | 2009-06-04 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL1036253A1 (nl) * | 2007-12-10 | 2009-06-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
WO2009075103A1 (ja) | 2007-12-11 | 2009-06-18 | Nikon Corporation | 移動体装置、露光装置及びパターン形成装置、並びにデバイス製造方法 |
NL1036279A1 (nl) * | 2007-12-13 | 2009-06-16 | Asml Netherlands Bv | A device for transmission image detection for use in a lithographic projection apparatus and a method for determining third order distortions of a patterning device and/or a projection system of such a lithographic apparatus. |
US8711327B2 (en) * | 2007-12-14 | 2014-04-29 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
NL1036273A1 (nl) * | 2007-12-18 | 2009-06-19 | Asml Netherlands Bv | Lithographic apparatus and method of cleaning a surface of an immersion lithographic apparatus. |
NL1036306A1 (nl) | 2007-12-20 | 2009-06-23 | Asml Netherlands Bv | Lithographic apparatus and in-line cleaning apparatus. |
US8953141B2 (en) | 2007-12-21 | 2015-02-10 | Asml Netherlands B.V. | Immersion lithographic apparatus and device manufacturing method with asymmetric acceleration profile of substrate table to maintain meniscus of immersion liquid |
US8269945B2 (en) | 2007-12-28 | 2012-09-18 | Nikon Corporation | Movable body drive method and apparatus, exposure method and apparatus, pattern formation method and apparatus, and device manufacturing method |
KR101497862B1 (ko) | 2007-12-28 | 2015-03-04 | 가부시키가이샤 니콘 | 노광 장치, 이동체 구동 시스템, 패턴 형성 장치 및 노광 방법, 그리고 디바이스 제조 방법 |
NL1036333A1 (nl) * | 2008-01-02 | 2009-07-07 | Asml Netherlands Bv | Immersion lithography. |
NL1036432A1 (nl) * | 2008-01-23 | 2009-07-27 | Asml Holding Nv | An immersion lithographic apparatus with immersion fluid re-circulating system. |
US8339572B2 (en) | 2008-01-25 | 2012-12-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US20090190106A1 (en) * | 2008-01-29 | 2009-07-30 | Asml Holding Nv | Immersion lithography apparatus |
JP5344180B2 (ja) | 2008-02-08 | 2013-11-20 | 株式会社ニコン | 位置計測システム及び位置計測方法、移動体装置、移動体駆動方法、露光装置及び露光方法、パターン形成装置、並びにデバイス製造方法 |
JP4922322B2 (ja) * | 2008-02-14 | 2012-04-25 | エーエスエムエル ネザーランズ ビー.ブイ. | コーティング |
NL1036596A1 (nl) * | 2008-02-21 | 2009-08-24 | Asml Holding Nv | Re-flow and buffer system for immersion lithography. |
NL1036571A1 (nl) * | 2008-03-07 | 2009-09-08 | Asml Netherlands Bv | Lithographic Apparatus and Methods. |
NL1036631A1 (nl) * | 2008-03-24 | 2009-09-25 | Asml Netherlands Bv | Immersion Lithographic Apparatus and Device Manufacturing Method. |
KR101448152B1 (ko) * | 2008-03-26 | 2014-10-07 | 삼성전자주식회사 | 수직 포토게이트를 구비한 거리측정 센서 및 그를 구비한입체 컬러 이미지 센서 |
NL1036715A1 (nl) * | 2008-04-16 | 2009-10-19 | Asml Netherlands Bv | Lithographic apparatus. |
NL1036709A1 (nl) | 2008-04-24 | 2009-10-27 | Asml Netherlands Bv | Lithographic apparatus and a method of operating the apparatus. |
NL1036766A1 (nl) * | 2008-04-25 | 2009-10-27 | Asml Netherlands Bv | Methods relating to immersion lithography and an immersion lithographic apparatus. |
US8421993B2 (en) * | 2008-05-08 | 2013-04-16 | Asml Netherlands B.V. | Fluid handling structure, lithographic apparatus and device manufacturing method |
EP2131241B1 (en) * | 2008-05-08 | 2019-07-31 | ASML Netherlands B.V. | Fluid handling structure, lithographic apparatus and device manufacturing method |
NL1036835A1 (nl) * | 2008-05-08 | 2009-11-11 | Asml Netherlands Bv | Lithographic Apparatus and Method. |
EP2249205B1 (en) | 2008-05-08 | 2012-03-07 | ASML Netherlands BV | Immersion lithographic apparatus, drying device, immersion metrology apparatus and device manufacturing method |
JP5097166B2 (ja) | 2008-05-28 | 2012-12-12 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置及び装置の動作方法 |
NL1036924A1 (nl) * | 2008-06-02 | 2009-12-03 | Asml Netherlands Bv | Substrate table, lithographic apparatus and device manufacturing method. |
EP2131242A1 (en) | 2008-06-02 | 2009-12-09 | ASML Netherlands B.V. | Substrate table, lithographic apparatus and device manufacturing method |
NL2002964A1 (nl) * | 2008-06-16 | 2009-12-17 | Asml Netherlands Bv | Lithographic Apparatus, a Metrology Apparatus and a Method of Using the Apparatus. |
EP2136250A1 (en) * | 2008-06-18 | 2009-12-23 | ASML Netherlands B.V. | Lithographic apparatus and method |
NL2002983A1 (nl) * | 2008-06-26 | 2009-12-29 | Asml Netherlands Bv | A lithographic apparatus and a method of operating the lithographic apparatus. |
JP4922359B2 (ja) * | 2008-07-25 | 2012-04-25 | エーエスエムエル ネザーランズ ビー.ブイ. | 流体ハンドリング構造、リソグラフィ装置及びデバイス製造方法 |
NL2003226A (en) | 2008-08-19 | 2010-03-09 | Asml Netherlands Bv | Lithographic apparatus, drying device, metrology apparatus and device manufacturing method. |
NL2003341A (en) * | 2008-08-22 | 2010-03-10 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
SG159467A1 (en) * | 2008-09-02 | 2010-03-30 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method |
NL2003363A (en) | 2008-09-10 | 2010-03-15 | Asml Netherlands Bv | Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method. |
NL2003392A (en) | 2008-09-17 | 2010-03-18 | Asml Netherlands Bv | Lithographic apparatus and a method of operating the apparatus. |
TWI457714B (zh) * | 2008-09-17 | 2014-10-21 | Asml Netherlands Bv | 微影裝置及其操作方法 |
US8384875B2 (en) | 2008-09-29 | 2013-02-26 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
NL2003362A (en) * | 2008-10-16 | 2010-04-19 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL2003421A (en) * | 2008-10-21 | 2010-04-22 | Asml Netherlands Bv | Lithographic apparatus and a method of removing contamination. |
US8477284B2 (en) | 2008-10-22 | 2013-07-02 | Nikon Corporation | Apparatus and method to control vacuum at porous material using multiple porous materials |
US8634055B2 (en) * | 2008-10-22 | 2014-01-21 | Nikon Corporation | Apparatus and method to control vacuum at porous material using multiple porous materials |
NL2003333A (en) * | 2008-10-23 | 2010-04-26 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method. |
NL2003575A (en) | 2008-10-29 | 2010-05-03 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL2003638A (en) | 2008-12-03 | 2010-06-07 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL2003758A (en) * | 2008-12-04 | 2010-06-07 | Asml Netherlands Bv | A member with a cleaning surface and a method of removing contamination. |
JP5199982B2 (ja) | 2008-12-08 | 2013-05-15 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置 |
EP2196857A3 (en) * | 2008-12-09 | 2010-07-21 | ASML Netherlands BV | Lithographic apparatus and device manufacturing method |
JP5001343B2 (ja) | 2008-12-11 | 2012-08-15 | エーエスエムエル ネザーランズ ビー.ブイ. | 流体抽出システム、液浸リソグラフィ装置、及び液浸リソグラフィ装置で使用される液浸液の圧力変動を低減する方法 |
JP2010147471A (ja) * | 2008-12-18 | 2010-07-01 | Asml Netherlands Bv | リソグラフィ装置及び少なくとも2つのターゲット部分を照射する方法 |
NL2003820A (en) * | 2008-12-22 | 2010-06-23 | Asml Netherlands Bv | Fluid handling structure, table, lithographic apparatus, immersion lithographic apparatus, and device manufacturing methods. |
US8896806B2 (en) * | 2008-12-29 | 2014-11-25 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
NL2004162A (en) * | 2009-02-17 | 2010-08-18 | Asml Netherlands Bv | A fluid supply system, a lithographic apparatus, a method of varying fluid flow rate and a device manufacturing method. |
EP2221669A3 (en) | 2009-02-19 | 2011-02-09 | ASML Netherlands B.V. | A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method |
NL2004102A (en) * | 2009-02-25 | 2010-08-26 | Asml Holding Nv | A fluid handling device, an immersion lithographic apparatus and a device manufacturing method. |
NL2004305A (en) | 2009-03-13 | 2010-09-14 | Asml Netherlands Bv | Substrate table, immersion lithographic apparatus and device manufacturing method. |
NL2004362A (en) * | 2009-04-10 | 2010-10-12 | Asml Netherlands Bv | A fluid handling device, an immersion lithographic apparatus and a device manufacturing method. |
JP2010251745A (ja) * | 2009-04-10 | 2010-11-04 | Asml Netherlands Bv | 液浸リソグラフィ装置及びデバイス製造方法 |
NL2004363A (en) * | 2009-04-22 | 2010-10-26 | Asml Netherlands Bv | Lithographic apparatus and a method of operating the apparatus. |
US20100296074A1 (en) * | 2009-04-30 | 2010-11-25 | Nikon Corporation | Exposure method, and device manufacturing method |
NL2004497A (en) | 2009-05-01 | 2010-11-02 | Asml Netherlands Bv | Lithographic apparatus and a method of operating the apparatus. |
NL2004523A (en) * | 2009-05-08 | 2010-11-09 | Asml Netherlands Bv | Immersion lithographic apparatus and device manufacturing method. |
NL2004547A (en) * | 2009-05-14 | 2010-11-18 | Asml Netherlands Bv | An immersion lithographic apparatus and a device manufacturing method. |
NL2004540A (en) * | 2009-05-14 | 2010-11-18 | Asml Netherlands Bv | Lithographic apparatus and a method of operating the apparatus. |
SG166747A1 (en) * | 2009-05-26 | 2010-12-29 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method |
JP5016705B2 (ja) | 2009-06-09 | 2012-09-05 | エーエスエムエル ネザーランズ ビー.ブイ. | 流体ハンドリング構造 |
EP2264529A3 (en) * | 2009-06-16 | 2011-02-09 | ASML Netherlands B.V. | A lithographic apparatus, a method of controlling the apparatus and a method of manufacturing a device using a lithographic apparatus |
NL2004716A (en) * | 2009-06-17 | 2010-12-20 | Asml Netherlands Bv | Lithographic method and arrangement. |
JP5058305B2 (ja) | 2009-06-19 | 2012-10-24 | エーエスエムエル ネザーランズ ビー.ブイ. | 液浸リソグラフィ装置、液体閉じ込め構造体、液浸リソグラフィ装置用の投影システムの最終エレメント、および基板テーブル |
EP2264528A1 (en) * | 2009-06-19 | 2010-12-22 | ASML Netherlands B.V. | Sensor and lithographic apparatus |
NL2004808A (en) * | 2009-06-30 | 2011-01-12 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method. |
NL2004807A (en) * | 2009-06-30 | 2011-01-04 | Asml Netherlands Bv | Substrate table for a lithographic apparatus, litographic apparatus, method of using a substrate table and device manufacturing method. |
NL2004820A (en) * | 2009-06-30 | 2011-01-04 | Asml Netherlands Bv | Lithographic apparatus and a method of measuring flow rate in a two phase flow. |
NL2004980A (en) * | 2009-07-13 | 2011-01-17 | Asml Netherlands Bv | Heat transfers assembly, lithographic apparatus and manufacturing method. |
NL2005009A (en) * | 2009-07-27 | 2011-01-31 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
TWI579659B (zh) | 2009-08-07 | 2017-04-21 | 尼康股份有限公司 | An exposure apparatus, and an element manufacturing method |
US20110032495A1 (en) * | 2009-08-07 | 2011-02-10 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
NL2005322A (en) | 2009-09-11 | 2011-03-14 | Asml Netherlands Bv | A shutter member, a lithographic apparatus and device manufacturing method. |
NL2005126A (en) * | 2009-09-21 | 2011-03-22 | Asml Netherlands Bv | Lithographic apparatus, coverplate and device manufacturing method. |
NL2005120A (en) * | 2009-09-21 | 2011-03-22 | Asml Netherlands Bv | Lithographic apparatus, coverplate and device manufacturing method. |
NL2005089A (nl) | 2009-09-23 | 2011-03-28 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method. |
NL2005207A (en) * | 2009-09-28 | 2011-03-29 | Asml Netherlands Bv | Heat pipe, lithographic apparatus and device manufacturing method. |
NL2005208A (en) * | 2009-09-28 | 2011-03-29 | Asml Netherlands Bv | Heat pipe, lithographic apparatus and device manufacturing method. |
NL2005167A (en) * | 2009-10-02 | 2011-04-05 | Asml Netherlands Bv | Lithographic apparatus and a method of operating the apparatus. |
NL2005478A (en) * | 2009-11-17 | 2011-05-18 | Asml Netherlands Bv | Lithographic apparatus, removable member and device manufacturing method. |
NL2005479A (en) * | 2009-11-17 | 2011-05-18 | Asml Netherlands Bv | Lithographic apparatus, removable member and device manufacturing method. |
NL2005610A (en) | 2009-12-02 | 2011-06-06 | Asml Netherlands Bv | Lithographic apparatus and surface cleaning method. |
NL2005528A (en) * | 2009-12-02 | 2011-06-07 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
NL2005657A (en) * | 2009-12-03 | 2011-06-06 | Asml Netherlands Bv | A lithographic apparatus and a method of forming a lyophobic coating on a surface. |
US20110134400A1 (en) * | 2009-12-04 | 2011-06-09 | Nikon Corporation | Exposure apparatus, liquid immersion member, and device manufacturing method |
NL2005655A (en) * | 2009-12-09 | 2011-06-14 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
NL2005717A (en) * | 2009-12-18 | 2011-06-21 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
NL2005666A (en) * | 2009-12-18 | 2011-06-21 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
NL2005874A (en) | 2010-01-22 | 2011-07-25 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
NL2005951A (en) * | 2010-02-02 | 2011-08-03 | Asml Netherlands Bv | Lithographic apparatus and a device manufacturing method. |
NL2006054A (en) | 2010-02-09 | 2011-08-10 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method. |
US8841065B2 (en) * | 2010-02-12 | 2014-09-23 | Nikon Corporation | Manufacturing method of exposure apparatus and device manufacturing method |
NL2005974A (en) | 2010-02-12 | 2011-08-15 | Asml Netherlands Bv | Lithographic apparatus and a device manufacturing method. |
NL2006127A (en) | 2010-02-17 | 2011-08-18 | Asml Netherlands Bv | A substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus. |
NL2006076A (en) | 2010-03-04 | 2011-09-06 | Asml Netherlands Bv | A lithographic apparatus and a method of manufacturing a device using a lithographic apparatus. |
JP5981855B2 (ja) * | 2010-03-05 | 2016-08-31 | テラダイオード, インコーポレーテッド | 波長ビーム結合システムおよび方法 |
JP2011192991A (ja) | 2010-03-12 | 2011-09-29 | Asml Netherlands Bv | リソグラフィ装置および方法 |
NL2006244A (en) * | 2010-03-16 | 2011-09-19 | Asml Netherlands Bv | Lithographic apparatus, cover for use in a lithographic apparatus and method for designing a cover for use in a lithographic apparatus. |
NL2006203A (en) * | 2010-03-16 | 2011-09-19 | Asml Netherlands Bv | Cover for a substrate table, substrate table for a lithographic apparatus, lithographic apparatus, and device manufacturing method. |
NL2006243A (en) * | 2010-03-19 | 2011-09-20 | Asml Netherlands Bv | A lithographic apparatus, an illumination system, a projection system and a method of manufacturing a device using a lithographic apparatus. |
NL2006389A (en) | 2010-04-15 | 2011-10-18 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and a device manufacturing method. |
EP2381310B1 (en) | 2010-04-22 | 2015-05-06 | ASML Netherlands BV | Fluid handling structure and lithographic apparatus |
NL2006272A (en) | 2010-05-04 | 2011-11-07 | Asml Netherlands Bv | A fluid handling structure, a lithographic apparatus and a device manufacturing method. |
NL2006615A (en) | 2010-05-11 | 2011-11-14 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method. |
JP5313293B2 (ja) | 2010-05-19 | 2013-10-09 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置、リソグラフィ装置で使用する流体ハンドリング構造およびデバイス製造方法 |
NL2006648A (en) | 2010-06-01 | 2011-12-06 | Asml Netherlands Bv | A fluid supply system, a lithographic apparatus, a method of varying fluid flow rate and a device manufacturing method. |
JP2012004465A (ja) | 2010-06-19 | 2012-01-05 | Nikon Corp | 照明光学系、露光装置、およびデバイス製造方法 |
NL2006818A (en) | 2010-07-02 | 2012-01-03 | Asml Netherlands Bv | A method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus. |
NL2006913A (en) | 2010-07-16 | 2012-01-17 | Asml Netherlands Bv | Lithographic apparatus and method. |
EP2423749B1 (en) * | 2010-08-24 | 2013-09-11 | ASML Netherlands BV | A lithographic apparatus and device manufacturing method |
NL2007453A (en) | 2010-10-18 | 2012-04-19 | Asml Netherlands Bv | A fluid handling structure, a lithographic apparatus and a device manufacturing method. |
NL2007477A (en) | 2010-10-22 | 2012-04-24 | Asml Netherlands Bv | Method of optimizing a lithographic process, device manufacturing method, lithographic apparatus, computer program product and simulation apparatus. |
NL2007633A (en) | 2010-11-22 | 2012-05-23 | Asml Netherlands Bv | A positioning system, a lithographic apparatus and a method for positional control. |
TWI542952B (zh) * | 2010-12-02 | 2016-07-21 | Asml控股公司 | 圖案化裝置支撐件 |
NL2007768A (en) | 2010-12-14 | 2012-06-18 | Asml Netherlands Bv | Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder. |
NL2007818A (en) | 2010-12-20 | 2012-06-21 | Asml Netherlands Bv | Method of updating calibration data and a device manufacturing method. |
NL2007802A (en) | 2010-12-21 | 2012-06-25 | Asml Netherlands Bv | A substrate table, a lithographic apparatus and a device manufacturing method. |
NL2007498A (en) | 2010-12-23 | 2012-06-27 | Asml Netherlands Bv | Lithographic apparatus and method of modifying a beam of radiation within a lithographic apparatus. |
EP2490073B1 (en) | 2011-02-18 | 2015-09-23 | ASML Netherlands BV | Substrate holder, lithographic apparatus, and method of manufacturing a substrate holder |
NL2008183A (en) | 2011-02-25 | 2012-08-28 | Asml Netherlands Bv | A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method. |
NL2008199A (en) | 2011-02-28 | 2012-08-29 | Asml Netherlands Bv | A fluid handling structure, a lithographic apparatus and a device manufacturing method. |
NL2008285A (en) | 2011-03-11 | 2012-09-12 | Asml Netherlands Bv | Method of controlling a lithographic apparatus, device manufacturing method, lithographic apparatus, computer program product and method of improving a mathematical model of a lithographic process. |
NL2008335A (en) | 2011-04-07 | 2012-10-09 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and method of correcting a mask. |
US8945407B2 (en) * | 2011-12-27 | 2015-02-03 | Intermolecular, Inc. | Touchless site isolation using gas bearing |
NL2008630A (en) | 2011-04-27 | 2012-10-30 | Asml Netherlands Bv | Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder. |
NL2008701A (en) | 2011-05-31 | 2012-12-03 | Asml Netherlands Bv | Method of optimizing a die size, method of designing a pattern device manufacturing method, and computer program product. |
NL2008751A (en) | 2011-06-06 | 2012-12-10 | Asml Netherlands Bv | Temperature sensing probe, burl plate, lithographic apparatus and method. |
TWI652508B (zh) | 2011-06-13 | 2019-03-01 | 尼康股份有限公司 | 照明方法 |
NL2008833A (en) | 2011-06-21 | 2012-12-28 | Asml Netherlands Bv | Lithographic apparatus, method of deforming a substrate table and device manufacturing method. |
NL2008980A (en) * | 2011-07-11 | 2013-01-14 | Asml Netherlands Bv | A fluid handling structure, a lithographic apparatus and a device manufacturing method. |
NL2008979A (en) * | 2011-07-11 | 2013-01-14 | Asml Netherlands Bv | A fluid handling structure, a lithographic apparatus and a device manufacturing method. |
JP5232901B2 (ja) * | 2011-07-22 | 2013-07-10 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
NL2009139A (en) | 2011-08-05 | 2013-02-06 | Asml Netherlands Bv | A fluid handling structure, a lithographic apparatus and a device manufacturing method. |
JP5778093B2 (ja) | 2011-08-10 | 2015-09-16 | エーエスエムエル ネザーランズ ビー.ブイ. | 基板テーブルアセンブリ、液浸リソグラフィ装置及びデバイス製造方法 |
NL2009189A (en) | 2011-08-17 | 2013-02-19 | Asml Netherlands Bv | Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method. |
SG188036A1 (en) | 2011-08-18 | 2013-03-28 | Asml Netherlands Bv | Lithographic apparatus, support table for a lithographic apparatus and device manufacturing method |
US8937707B2 (en) | 2011-08-23 | 2015-01-20 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method, and method of calibrating a displacement measuring system |
NL2009272A (en) | 2011-08-31 | 2013-03-04 | Asml Netherlands Bv | A fluid handling structure, a lithographic apparatus and a device manufacturing method. |
NL2009271A (en) | 2011-09-15 | 2013-03-18 | Asml Netherlands Bv | A fluid handling structure, a lithographic apparatus and a device manufacturing method. |
NL2009487A (en) | 2011-10-14 | 2013-04-16 | Asml Netherlands Bv | Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder. |
NL2009472A (en) | 2011-10-24 | 2013-04-25 | Asml Netherlands Bv | A fluid handling structure, a lithographic apparatus and a device manufacturing method. |
NL2009692A (en) | 2011-12-07 | 2013-06-10 | Asml Netherlands Bv | A lithographic apparatus and a device manufacturing method. |
NL2009899A (en) | 2011-12-20 | 2013-06-24 | Asml Netherlands Bv | A pump system, a carbon dioxide supply system, an extraction system, a lithographic apparatus and a device manufacturing method. |
NL2009858A (en) | 2011-12-27 | 2013-07-01 | Asml Netherlands Bv | Substrate holder, lithographic apparatus, and device manufacturing method. |
KR101652782B1 (ko) | 2012-02-03 | 2016-08-31 | 에이에스엠엘 네델란즈 비.브이. | 기판 홀더 및 리소그래피 장치 |
KR20150016508A (ko) | 2012-04-19 | 2015-02-12 | 에이에스엠엘 네델란즈 비.브이. | 기판 홀더, 리소그래피 장치 및 디바이스 제조 방법 |
KR20150013570A (ko) | 2012-04-27 | 2015-02-05 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 |
CN107300835B (zh) | 2012-05-17 | 2019-02-15 | Asml荷兰有限公司 | 热调节单元、光刻设备以及器件制造方法 |
KR101689226B1 (ko) | 2012-05-22 | 2016-12-23 | 에이에스엠엘 네델란즈 비.브이. | 센서, 리소그래피 장치 및 디바이스 제조 방법 |
KR102054322B1 (ko) | 2012-05-29 | 2019-12-10 | 에이에스엠엘 네델란즈 비.브이. | 대상물 홀더 및 리소그래피 장치 |
NL2010817A (en) | 2012-05-29 | 2013-12-02 | Asml Netherlands Bv | A support apparatus, a lithographic apparatus and a device manufacturing method. |
NL2010934A (en) | 2012-06-11 | 2013-12-12 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
CN104471485B (zh) | 2012-07-18 | 2016-11-02 | Asml荷兰有限公司 | 磁性装置和光刻设备 |
WO2014029603A1 (en) | 2012-08-20 | 2014-02-27 | Asml Netherlands B.V. | Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer program |
US10242903B2 (en) | 2012-11-30 | 2019-03-26 | Nikon Corporation | Suction device, carry-in method, carrier system and exposure apparatus, and device manufacturing method |
KR101754679B1 (ko) | 2012-12-20 | 2017-07-06 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 이러한 장치에서 이용되는 테이블 |
US9017934B2 (en) | 2013-03-08 | 2015-04-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist defect reduction system and method |
US9543147B2 (en) | 2013-03-12 | 2017-01-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist and method of manufacture |
US9245751B2 (en) | 2013-03-12 | 2016-01-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Anti-reflective layer and method |
US9256128B2 (en) | 2013-03-12 | 2016-02-09 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method for manufacturing semiconductor device |
US9354521B2 (en) | 2013-03-12 | 2016-05-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist system and method |
US9110376B2 (en) | 2013-03-12 | 2015-08-18 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist system and method |
US9502231B2 (en) | 2013-03-12 | 2016-11-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist layer and method |
US8932799B2 (en) | 2013-03-12 | 2015-01-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist system and method |
US9175173B2 (en) | 2013-03-12 | 2015-11-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Unlocking layer and method |
US9117881B2 (en) | 2013-03-15 | 2015-08-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Conductive line system and process |
NL2010527A (en) | 2013-03-27 | 2014-09-30 | Asml Netherlands Bv | Object holder, lithographic apparatus, device manufacturing method, and method of manufacturing an object holder. |
US9341945B2 (en) | 2013-08-22 | 2016-05-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist and method of formation and use |
JP6216460B2 (ja) | 2013-08-30 | 2017-10-18 | エーエスエムエル ネザーランズ ビー.ブイ. | 液浸リソグラフィ装置 |
US9835957B2 (en) | 2013-09-27 | 2017-12-05 | Asml Netherlands B.V. | Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method |
JP6436090B2 (ja) | 2013-10-30 | 2018-12-12 | 株式会社ニコン | 基板保持装置、露光装置及びデバイス製造方法 |
US10036953B2 (en) | 2013-11-08 | 2018-07-31 | Taiwan Semiconductor Manufacturing Company | Photoresist system and method |
US10095113B2 (en) | 2013-12-06 | 2018-10-09 | Taiwan Semiconductor Manufacturing Company | Photoresist and method |
US9761449B2 (en) | 2013-12-30 | 2017-09-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Gap filling materials and methods |
WO2015107976A1 (ja) | 2014-01-16 | 2015-07-23 | 株式会社ニコン | 露光装置及び露光方法、並びにデバイス製造方法 |
US9939736B2 (en) | 2014-01-20 | 2018-04-10 | Asml Netherlands B.V. | Substrate holder and support table for lithography |
US9599896B2 (en) | 2014-03-14 | 2017-03-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist system and method |
WO2015165653A1 (en) | 2014-04-30 | 2015-11-05 | Asml Netherlands B.V. | Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method |
US9581908B2 (en) | 2014-05-16 | 2017-02-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Photoresist and method |
CN106462082B (zh) | 2014-06-10 | 2018-05-18 | Asml荷兰有限公司 | 光刻设备及制造光刻设备的方法 |
NL2014792A (en) | 2014-06-16 | 2016-03-31 | Asml Netherlands Bv | Lithographic apparatus, method of transferring a substrate and device manufacturing method. |
JP6537194B2 (ja) * | 2014-07-04 | 2019-07-03 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置及びリソグラフィ装置を用いてデバイスを製造する方法 |
EP3172623B1 (en) | 2014-07-24 | 2020-12-23 | ASML Netherlands B.V. | Fluid handling structure and immersion lithographic apparatus |
US10001712B2 (en) | 2014-07-25 | 2018-06-19 | Asml Netherlands B.V. | Immersion lithographic apparatus and device manufacturing method |
WO2016020170A1 (en) | 2014-08-06 | 2016-02-11 | Asml Netherlands B.V. | A lithographic apparatus and an object positioning system |
CN106716255B (zh) | 2014-08-07 | 2019-06-14 | Asml荷兰有限公司 | 光刻设备和制造器件的方法 |
JP6384252B2 (ja) * | 2014-10-07 | 2018-09-05 | 株式会社ニコン | パターン露光装置 |
CN107077078B (zh) | 2014-10-23 | 2019-04-09 | Asml荷兰有限公司 | 用于光刻设备的支撑台、加载衬底的方法、光刻设备和器件制造方法 |
WO2016066392A1 (en) | 2014-10-28 | 2016-05-06 | Asml Netherlands B.V. | Component for a lithography tool, lithography apparatus, inspection tool and a method of manufacturing a device |
CN105739245B (zh) * | 2014-12-12 | 2018-12-14 | 上海微电子装备(集团)股份有限公司 | 一种浸没光刻机浸没单元防碰撞装置及方法 |
US10551748B2 (en) | 2014-12-19 | 2020-02-04 | Asml Netherlands B.V. | Fluid handling structure, a lithographic apparatus and a device manufacturing method |
CN111610696A (zh) | 2015-02-23 | 2020-09-01 | 株式会社尼康 | 基板处理系统及基板处理方法、以及组件制造方法 |
JP6691693B2 (ja) | 2015-02-23 | 2020-05-13 | 株式会社ニコン | 計測装置、リソグラフィシステム及び露光装置、並びに重ね合わせ計測方法及びデバイス製造方法 |
CN112068406A (zh) | 2015-02-23 | 2020-12-11 | 株式会社尼康 | 测量装置、光刻系统、以及组件制造方法 |
JP6384372B2 (ja) * | 2015-03-20 | 2018-09-05 | 株式会社ニコン | 湿式処理装置 |
EP3291011A4 (en) | 2015-03-25 | 2019-02-27 | Nikon Corporation | LAYOUT METHOD, BRAND DETECTION METHOD, LIGHT EXPOSURE METHOD, MEASURING APPARATUS, LIGHT EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD |
JP6466597B2 (ja) | 2015-04-29 | 2019-02-06 | エーエスエムエル ネザーランズ ビー.ブイ. | サポート装置、リソグラフィ装置およびデバイス製造方法 |
WO2016198255A1 (en) | 2015-06-11 | 2016-12-15 | Asml Netherlands B.V. | Lithographic apparatus and method for loading a substrate |
WO2016207122A1 (en) | 2015-06-23 | 2016-12-29 | Asml Netherlands B.V. | Support apparatus, lithographic apparatus and device manufacturing method |
NL2017128A (en) | 2015-07-16 | 2017-01-23 | Asml Netherlands Bv | A lithographic apparatus, a projection system, a last lens element, a liquid control member and a device manufacturing method |
US10216100B2 (en) | 2015-07-16 | 2019-02-26 | Asml Netherlands B.V. | Inspection substrate and an inspection method |
NL2017342A (en) | 2015-08-31 | 2017-03-06 | Asml Netherlands Bv | A Gas Leak Detector and a Method of Detecting a Leak of Gas |
NL2017344A (en) | 2015-10-01 | 2017-04-11 | Asml Netherlands Bv | A lithography apparatus, a method of manufacturing a device and a control program |
NL2017837A (en) | 2015-11-25 | 2017-06-02 | Asml Netherlands Bv | A Measurement Substrate and a Measurement Method |
EP3387491B1 (en) | 2015-12-08 | 2020-01-01 | ASML Netherlands B.V. | Substrate table, lithographic apparatus and method of operating a lithographic apparatus |
US10895808B2 (en) | 2015-12-15 | 2021-01-19 | Asml Netherlands B.V. | Substrate holder, a lithographic apparatus and method of manufacturing devices |
WO2017121547A1 (en) | 2016-01-13 | 2017-07-20 | Asml Netherlands B.V. | Fluid handling structure and lithographic apparatus |
US11664264B2 (en) | 2016-02-08 | 2023-05-30 | Asml Netherlands B.V. | Lithographic apparatus, method for unloading a substrate and method for loading a substrate |
JP6707964B2 (ja) * | 2016-04-12 | 2020-06-10 | 日本精工株式会社 | 位置決め装置及び回転機構 |
EP3455677A1 (en) | 2016-05-12 | 2019-03-20 | ASML Netherlands B.V. | Extraction body for lithographic apparatus |
CN109416516B (zh) | 2016-07-04 | 2020-08-11 | Asml荷兰有限公司 | 检查衬底和检查方法 |
US11099490B2 (en) * | 2016-07-07 | 2021-08-24 | Asml Netherlands B.V. | Inspection substrate and an inspection method |
CN109863457A (zh) | 2016-08-24 | 2019-06-07 | 株式会社尼康 | 测量系统及基板处理系统、以及元件制造方法 |
CN109690413B (zh) | 2016-09-12 | 2021-04-13 | Asml荷兰有限公司 | 用于光刻设备的流体处理结构 |
NL2019464A (en) | 2016-09-20 | 2018-03-27 | Asml Netherlands Bv | A lithography apparatus and a method of manufacturing a device |
CN109791368B (zh) | 2016-09-27 | 2021-11-26 | 株式会社尼康 | 决定方法及装置、程序、信息记录媒体、曝光装置、布局信息提供方法、布局方法、标记检测方法、曝光方法、以及器件制造方法 |
EP3521932A4 (en) | 2016-09-30 | 2020-05-27 | Nikon Corporation | MEASURING SYSTEM, SUBSTRATE PROCESSING SYSTEM, AND DEVICE MANUFACTURING METHOD |
JP6818881B2 (ja) | 2016-10-20 | 2021-01-20 | エーエスエムエル ネザーランズ ビー.ブイ. | 圧力制御弁、リソグラフィ装置のための流体ハンドリング構造、及びリソグラフィ装置 |
US10451981B2 (en) | 2016-10-28 | 2019-10-22 | Asml Netherlands B.V. | Measurement substrate, a measurement method and a measurement system |
WO2018108380A1 (en) | 2016-12-14 | 2018-06-21 | Asml Netherlands B.V. | Lithography apparatus and device manufacturing method |
EP3796088A1 (en) | 2019-09-23 | 2021-03-24 | ASML Netherlands B.V. | Method and apparatus for lithographic process performance determination |
NL2019979A (en) | 2016-12-22 | 2018-06-28 | Asml Netherlands Bv | An Object in a Lithographic Apparatus |
US10534271B2 (en) | 2017-01-26 | 2020-01-14 | Asml Netherlands B.V. | Lithography apparatus and a method of manufacturing a device |
JP6852183B2 (ja) | 2017-03-15 | 2021-03-31 | エーエスエムエル ネザーランズ ビー.ブイ. | センサマークおよびセンサマークの製造方法 |
WO2018168923A1 (ja) | 2017-03-16 | 2018-09-20 | 株式会社ニコン | 制御装置及び制御方法、露光装置及び露光方法、デバイス製造方法、データ生成方法、並びに、プログラム |
WO2018192710A1 (en) | 2017-04-20 | 2018-10-25 | Asml Netherlands B.V. | Method of performance testing a fluid handling structure |
KR102296942B1 (ko) | 2017-05-05 | 2021-09-01 | 에이에스엠엘 네델란즈 비.브이. | 디바이스 제조 프로세스의 수율의 예측 방법 |
JP7246325B2 (ja) | 2017-06-06 | 2023-03-27 | エーエスエムエル ネザーランズ ビー.ブイ. | サポートテーブルから物体をアンロードする方法 |
WO2018233947A1 (en) | 2017-06-20 | 2018-12-27 | Asml Netherlands B.V. | DETERMINATION OF EDGE ROUGHNESS PARAMETERS |
EP3467589A1 (en) | 2017-10-06 | 2019-04-10 | ASML Netherlands B.V. | Determining edge roughness parameters |
US10948837B2 (en) | 2017-07-17 | 2021-03-16 | Asml Netherlands B.V. | Information determining apparatus and method |
EP3432071A1 (en) | 2017-07-17 | 2019-01-23 | ASML Netherlands B.V. | Information determining apparatus and method |
KR102374949B1 (ko) | 2017-07-25 | 2022-03-15 | 에이에스엠엘 네델란즈 비.브이. | 파라미터 결정 방법 및 그 장치 |
EP3444675A1 (en) | 2017-08-14 | 2019-02-20 | ASML Netherlands B.V. | Optical detector |
EP3447581A1 (en) | 2017-08-23 | 2019-02-27 | ASML Netherlands B.V. | A clear-out tool, a lithographic apparatus and a device manufacturing method |
WO2019042809A1 (en) | 2017-09-01 | 2019-03-07 | Asml Netherlands B.V. | OPTICAL SYSTEMS, METROLOGY APPARATUS AND ASSOCIATED METHODS |
KR102390687B1 (ko) | 2017-09-11 | 2022-04-26 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 프로세스들에서의 계측 |
EP3462239A1 (en) | 2017-09-27 | 2019-04-03 | ASML Netherlands B.V. | Metrology in lithographic processes |
EP3457211A1 (en) | 2017-09-13 | 2019-03-20 | ASML Netherlands B.V. | A method of aligning a pair of complementary diffraction patterns and associated metrology method and apparatus |
JP6839787B2 (ja) | 2017-09-29 | 2021-03-10 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射源 |
EP3467588A1 (en) | 2017-10-03 | 2019-04-10 | ASML Netherlands B.V. | Method and apparatus for determining alignment properties of a beam of radiation |
EP3480554A1 (en) | 2017-11-02 | 2019-05-08 | ASML Netherlands B.V. | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
KR102514423B1 (ko) | 2017-10-05 | 2023-03-27 | 에이에스엠엘 네델란즈 비.브이. | 기판 상의 하나 이상의 구조체의 특성을 결정하기 위한 계측 시스템 및 방법 |
JP7015910B2 (ja) | 2017-10-12 | 2022-02-03 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置において使用される基板ホルダ |
EP3474074A1 (en) | 2017-10-17 | 2019-04-24 | ASML Netherlands B.V. | Scatterometer and method of scatterometry using acoustic radiation |
EP3477389A1 (en) | 2017-10-24 | 2019-05-01 | ASML Netherlands B.V. | Mark, overlay target, and methods of alignment and overlay |
CN111344636B (zh) | 2017-10-24 | 2022-02-15 | Asml荷兰有限公司 | 标记、重叠目标及对齐和重叠方法 |
IL273836B2 (en) | 2017-10-31 | 2023-09-01 | Asml Netherlands Bv | A measuring device, a method for measuring a structure, a method for making a device |
EP3480659A1 (en) | 2017-11-01 | 2019-05-08 | ASML Netherlands B.V. | Estimation of data in metrology |
KR102529770B1 (ko) | 2017-11-07 | 2023-05-04 | 에이에스엠엘 네델란즈 비.브이. | 관심 특성을 결정하는 계측 장치 및 방법 |
EP3499312A1 (en) | 2017-12-15 | 2019-06-19 | ASML Netherlands B.V. | Metrology apparatus and a method of determining a characteristic of interest |
EP3714329A1 (en) | 2017-11-20 | 2020-09-30 | ASML Netherlands B.V. | Substrate holder, substrate support and method of clamping a substrate to a clamping system |
US11705351B2 (en) | 2017-12-01 | 2023-07-18 | Elemental Scientific, Inc. | Systems for integrated decomposition and scanning of a semiconducting wafer |
WO2019115195A1 (en) | 2017-12-13 | 2019-06-20 | Asml Netherlands B.V. | Substrate holder for use in a lithographic apparatus |
US11048178B2 (en) | 2017-12-14 | 2021-06-29 | Asml Netherlands B.V. | Lithographic apparatus with improved patterning performance |
KR102446678B1 (ko) | 2017-12-15 | 2022-09-23 | 에이에스엠엘 네델란즈 비.브이. | 유체 핸들링 구조체, 리소그래피 장치, 유체 핸들링 구조체를 사용하는 방법 및 리소그래피 장치를 사용하는 방법 |
WO2019129456A1 (en) | 2017-12-28 | 2019-07-04 | Asml Netherlands B.V. | Apparatus for and a method of removing contaminant particles from a component of an apparatus |
EP3528048A1 (en) | 2018-02-15 | 2019-08-21 | ASML Netherlands B.V. | A metrology apparatus for and a method of determining a characteristic of interest of a structure on a substrate |
WO2019129465A1 (en) | 2017-12-28 | 2019-07-04 | Asml Netherlands B.V. | A metrology apparatus for and a method of determining a characteristic of interest of a structure on a substrate |
EP3506011A1 (en) | 2017-12-28 | 2019-07-03 | ASML Netherlands B.V. | Apparatus for and a method of removing contaminant particles from a component of a metrology apparatus |
NL2022264A (en) | 2018-01-26 | 2019-07-30 | Asml Netherlands Bv | Apparatus and methods for determining the position of a target structure on a substrate |
EP3518040A1 (en) | 2018-01-30 | 2019-07-31 | ASML Netherlands B.V. | A measurement apparatus and a method for determining a substrate grid |
WO2019149562A1 (en) | 2018-01-31 | 2019-08-08 | Asml Netherlands B.V. | Method to label substrates based on process parameters |
EP3534211A1 (en) | 2018-03-02 | 2019-09-04 | ASML Netherlands B.V. | Method and apparatus for forming a patterned layer of material |
CN112005157B (zh) | 2018-02-27 | 2023-03-03 | Asml荷兰有限公司 | 用于确定衬底上的一个或更多个结构的特性的量测设备和方法 |
US11126091B2 (en) | 2018-02-27 | 2021-09-21 | Asml Netherlands B.V. | Measurement apparatus and method for predicting aberrations in a projection system |
EP3531191A1 (en) | 2018-02-27 | 2019-08-28 | Stichting VU | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
EP3531207A1 (en) | 2018-02-27 | 2019-08-28 | ASML Netherlands B.V. | Alignment mark positioning in a lithographic process |
NL2022501A (en) | 2018-02-28 | 2019-09-03 | Asml Netherlands Bv | Apodization measurement for lithographic apparatus |
KR102447189B1 (ko) | 2018-03-02 | 2022-09-26 | 에이에스엠엘 네델란즈 비.브이. | 재료의 패터닝된 층을 형성하기 위한 방법 및 장치 |
NL2022663A (en) | 2018-03-29 | 2019-10-03 | Asml Netherlands Bv | Position measurement system, interferometer system and lithographic apparatus |
EP3553602A1 (en) | 2018-04-09 | 2019-10-16 | ASML Netherlands B.V. | Model based reconstruction of semiconductor structures |
NL2021848A (en) | 2018-04-09 | 2018-11-06 | Stichting Vu | Holographic metrology apparatus. |
WO2019197111A1 (en) | 2018-04-11 | 2019-10-17 | Asml Netherlands B.V. | Level sensor and lithographic apparatus |
CN111971623A (zh) | 2018-04-16 | 2020-11-20 | Asml荷兰有限公司 | 清洁装置和清洁方法 |
WO2019206517A1 (en) | 2018-04-25 | 2019-10-31 | Asml Netherlands B.V. | Pneumatic support device and lithographic apparatus with pneumatic support device |
NL2022779A (en) | 2018-04-25 | 2019-10-31 | Asml Netherlands Bv | Tubular linear actuator, patterning device masking device and lithographic apparatus |
US11269262B2 (en) | 2018-04-25 | 2022-03-08 | Asml Netherlands B.V. | Frame assembly, lithographic apparatus and device manufacturing method |
US11409206B2 (en) | 2018-04-26 | 2022-08-09 | Asml Netherlands B.V. | Alignment method and apparatus |
EP3385792A3 (en) | 2018-04-26 | 2018-12-26 | ASML Netherlands B.V. | Stage apparatus for use in a lithographic apparatus |
WO2019206548A1 (en) | 2018-04-26 | 2019-10-31 | Asml Netherlands B.V. | Stage apparatus, lithographic apparatus, control unit and method |
EP3594749A1 (en) | 2018-07-10 | 2020-01-15 | ASML Netherlands B.V. | Method to label substrates based on process parameters |
WO2019206498A1 (en) | 2018-04-27 | 2019-10-31 | Asml Netherlands B.V. | Method to label substrates based on process parameters |
US11422477B2 (en) | 2018-05-08 | 2022-08-23 | Asml Netherlands B.V. | Vibration isolation system and lithographic apparatus |
EP3570109A1 (en) | 2018-05-14 | 2019-11-20 | ASML Netherlands B.V. | Illumination source for an inspection apparatus, inspection apparatus and inspection method |
EP3570110A1 (en) | 2018-05-16 | 2019-11-20 | ASML Netherlands B.V. | Estimating a parameter of a substrate |
EP3572881A1 (en) | 2018-05-24 | 2019-11-27 | ASML Netherlands B.V. | Bandwidth calculation system and method for determining a desired wavelength bandwidth for a measurement beam in a mark detection system |
WO2019233698A1 (en) | 2018-06-05 | 2019-12-12 | Asml Netherlands B.V. | Assembly comprising a cryostat and layer of superconducting coils and motor system provided with such an assembly |
EP3579052A1 (en) | 2018-06-08 | 2019-12-11 | ASML Netherlands B.V. | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
CN116758012A (zh) | 2018-06-08 | 2023-09-15 | Asml荷兰有限公司 | 确定与在衬底上的结构相关的感兴趣的特性的方法、掩模版、衬底 |
CN112262345B (zh) | 2018-06-13 | 2024-03-12 | Asml荷兰有限公司 | 量测设备 |
EP3614207A1 (en) | 2018-08-21 | 2020-02-26 | ASML Netherlands B.V. | Metrology apparatus |
EP3582007A1 (en) | 2018-06-15 | 2019-12-18 | ASML Netherlands B.V. | Determining significant relationships between parameters describing operation of an apparatus |
EP3582009A1 (en) | 2018-06-15 | 2019-12-18 | ASML Netherlands B.V. | Reflector and method of manufacturing a reflector |
CN112292641A (zh) | 2018-06-19 | 2021-01-29 | Asml荷兰有限公司 | 用于光刻测量的传感器装置 |
KR102539367B1 (ko) | 2018-07-04 | 2023-06-01 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 측정을 위한 센서 장치 및 방법 |
JP7101268B2 (ja) | 2018-07-06 | 2022-07-14 | エーエスエムエル ネザーランズ ビー.ブイ. | 位置センサ |
EP3598235A1 (en) | 2018-07-18 | 2020-01-22 | ASML Netherlands B.V. | Metrology apparatus and method for determining a characteristic relating to one or more structures on a substrate |
EP3605230A1 (en) | 2018-08-01 | 2020-02-05 | Stichting VU | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
NL2021852A (en) | 2018-08-01 | 2018-11-09 | Asml Netherlands Bv | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
WO2020035203A1 (en) | 2018-08-16 | 2020-02-20 | Asml Netherlands B.V. | Apparatus and method for clearing and detecting marks |
EP3611569A1 (en) | 2018-08-16 | 2020-02-19 | ASML Netherlands B.V. | Metrology apparatus and photonic crystal fiber |
EP3611770A1 (en) | 2018-08-16 | 2020-02-19 | ASML Netherlands B.V. | Piezoelectric actuator, actuator system, substrate support and lithographic apparatus including the actuator |
CN112639623A (zh) | 2018-08-20 | 2021-04-09 | Asml荷兰有限公司 | 用于测量对准标记的位置的设备和方法 |
EP3614813A1 (en) | 2018-08-21 | 2020-02-26 | ASML Netherlands B.V. | High harmonic generation radiation source |
WO2020038642A1 (en) | 2018-08-22 | 2020-02-27 | Asml Netherlands B.V. | Metrology apparatus |
NL2023606A (en) | 2018-08-22 | 2020-02-27 | Asml Netherlands Bv | Pulse stretcher and method |
NL2023511A (en) | 2018-08-23 | 2020-02-27 | Asml Netherlands Bv | Substrate Support, Lithographic Apparatus, Substrate Inspection Apparatus, Device Manufacturing Method |
CN112585539A (zh) | 2018-08-23 | 2021-03-30 | Asml荷兰有限公司 | 用于校准物体装载过程的平台设备和方法 |
NL2023571A (en) | 2018-08-28 | 2020-06-05 | Asml Netherlands Bv | Electromagnetic actuator, position control system and lithographic apparatus |
EP3617800A1 (en) | 2018-09-03 | 2020-03-04 | ASML Netherlands B.V. | Method and apparatus for configuring spatial dimensions of a beam during a scan |
EP3680714A1 (en) | 2019-01-09 | 2020-07-15 | ASML Netherlands B.V. | Method and apparatus for configuring spatial dimensions of a beam during a scan |
WO2020048693A1 (en) | 2018-09-03 | 2020-03-12 | Asml Netherlands B.V. | Method and apparatus for configuring spatial dimensions of a beam during a scan |
KR20210040134A (ko) | 2018-09-04 | 2021-04-12 | 에이에스엠엘 네델란즈 비.브이. | 계측 장치 |
EP3620857A1 (en) | 2018-09-04 | 2020-03-11 | ASML Netherlands B.V. | Metrology apparatus |
EP3623868A1 (en) | 2018-09-12 | 2020-03-18 | ASML Netherlands B.V. | Metrology apparatus and method for determining a characteristic of one or more structures on a substrate |
EP3627226A1 (en) | 2018-09-20 | 2020-03-25 | ASML Netherlands B.V. | Optical system, metrology apparatus and associated method |
JP7195411B2 (ja) | 2018-09-21 | 2022-12-23 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射システム |
US11720032B2 (en) | 2018-09-24 | 2023-08-08 | Asml Netherlands B.V. | Process tool and an inspection method |
EP3629086A1 (en) * | 2018-09-25 | 2020-04-01 | ASML Netherlands B.V. | Method and apparatus for determining a radiation beam intensity profile |
EP3629087A1 (en) | 2018-09-26 | 2020-04-01 | ASML Netherlands B.V. | Method of manufacturing devices |
US11087065B2 (en) | 2018-09-26 | 2021-08-10 | Asml Netherlands B.V. | Method of manufacturing devices |
US11650513B2 (en) | 2018-09-27 | 2023-05-16 | Asml Netherlands B.V. | Apparatus and method for measuring a position of a mark |
EP3629088A1 (en) | 2018-09-28 | 2020-04-01 | ASML Netherlands B.V. | Providing a trained neural network and determining a characteristic of a physical system |
JP7297878B2 (ja) | 2018-10-01 | 2023-06-26 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ装置におけるオブジェクト |
US20210356252A1 (en) | 2018-10-02 | 2021-11-18 | Asml Netherlands B.V. | Laser triangulation apparatus and calibration method |
EP3637186A1 (en) | 2018-10-09 | 2020-04-15 | ASML Netherlands B.V. | Method of calibrating a plurality of metrology apparatuses, method of determining a parameter of interest, and metrology apparatus |
US20210387892A1 (en) | 2018-10-24 | 2021-12-16 | Asml Netherlands B.V. | Optical fibers and production methods therefor |
EP3647874A1 (en) | 2018-11-05 | 2020-05-06 | ASML Netherlands B.V. | Optical fibers and production methods therefor |
US11205562B2 (en) | 2018-10-25 | 2021-12-21 | Tokyo Electron Limited | Hybrid electron beam and RF plasma system for controlled content of radicals and ions |
EP3647872A1 (en) | 2018-11-01 | 2020-05-06 | ASML Netherlands B.V. | A method for controlling the dose profile adjustment of a lithographic apparatus |
EP3647873A1 (en) | 2018-11-02 | 2020-05-06 | ASML Netherlands B.V. | Method to characterize post-processing data in terms of individual contributions from processing stations |
EP3650939A1 (en) | 2018-11-07 | 2020-05-13 | ASML Netherlands B.V. | Predicting a value of a semiconductor manufacturing process parameter |
KR20230130767A (ko) | 2018-11-07 | 2023-09-12 | 에이에스엠엘 네델란즈 비.브이. | 공정에 대한 보정 결정 |
EP3650941A1 (en) | 2018-11-12 | 2020-05-13 | ASML Netherlands B.V. | Method of determining the contribution of a processing apparatus to a substrate parameter |
CN113039487A (zh) | 2018-11-16 | 2021-06-25 | Asml荷兰有限公司 | 用于监测光刻装置的方法 |
EP3654104A1 (en) | 2018-11-16 | 2020-05-20 | ASML Netherlands B.V. | Method for monitoring lithographic apparatus |
EP3657281B1 (en) | 2018-11-26 | 2022-11-30 | ASML Netherlands B.V. | Control strategy evaluation tool for a semiconductor manufacturing process and its user interface |
EP3705959A1 (en) | 2019-03-04 | 2020-09-09 | ASML Netherlands B.V. | Method for determining root causes of events of a semiconductor manufacturing process and for monitoring a semiconductor manufacturing process |
KR102649158B1 (ko) | 2018-12-03 | 2024-03-20 | 에이에스엠엘 네델란즈 비.브이. | 반도체 제조 공정의 수율을 예측하는 방법 |
WO2020114684A1 (en) | 2018-12-03 | 2020-06-11 | Asml Netherlands B.V. | Method of manufacturing devices |
US10871715B2 (en) | 2018-12-06 | 2020-12-22 | Asml Netherlands B.V. | Lithographic apparatus and a device manufacturing method |
WO2020114692A1 (en) | 2018-12-07 | 2020-06-11 | Asml Netherlands B.V. | Method for determining root cause affecting yield in a semiconductor manufacturing process |
EP3671347A1 (en) | 2018-12-19 | 2020-06-24 | ASML Netherlands B.V. | Method for controling a manufacturing process and associated apparatuses |
EP3699688A1 (en) | 2019-02-19 | 2020-08-26 | ASML Netherlands B.V. | Methods and apparatus for metrology |
CN113196176A (zh) | 2018-12-21 | 2021-07-30 | Asml荷兰有限公司 | 用于计量的方法和装置 |
EP3903152A1 (en) | 2018-12-28 | 2021-11-03 | ASML Netherlands B.V. | Substrate holder for use in a lithographic apparatus and a method of manufacturing a substrate holder |
SG11202107101PA (en) | 2019-01-23 | 2021-07-29 | Asml Netherlands Bv | Substrate holder for use in a lithographic apparatus and a device manufacturing method |
EP3693795A1 (en) | 2019-02-06 | 2020-08-12 | ASML Netherlands B.V. | Method for decision making in a semiconductor manufacturing process |
EP3918420A1 (en) | 2019-01-29 | 2021-12-08 | ASML Netherlands B.V. | Method for decision making in a semiconductor manufacturing process |
EP3712817A1 (en) | 2019-03-20 | 2020-09-23 | ASML Netherlands B.V. | Apparatus and method for property joint interpolation and prediction |
KR20210102976A (ko) | 2019-01-30 | 2021-08-20 | 에이에스엠엘 네델란즈 비.브이. | 속성 공동 보간 및 예측을 위한 장치 및 방법 |
EP3696606A1 (en) | 2019-02-15 | 2020-08-19 | ASML Netherlands B.V. | A metrology apparatus with radiation source having multiple broadband outputs |
US11774867B2 (en) | 2019-02-25 | 2023-10-03 | Asml Netherlands B.V. | Radiation measurement system |
EP3703114A1 (en) | 2019-02-26 | 2020-09-02 | ASML Netherlands B.V. | Reflector manufacturing method and associated reflector |
US11914307B2 (en) | 2019-02-26 | 2024-02-27 | Asml Netherlands B.V. | Inspection apparatus lithographic apparatus measurement method |
EP3931640A1 (en) | 2019-02-28 | 2022-01-05 | ASML Netherlands B.V. | Stage system and lithographic apparatus |
CN113544587A (zh) | 2019-03-01 | 2021-10-22 | Asml荷兰有限公司 | 物体定位器装置及装置制造方法 |
EP3702840A1 (en) | 2019-03-01 | 2020-09-02 | ASML Netherlands B.V. | Alignment method and associated metrology device |
WO2020177971A1 (en) | 2019-03-01 | 2020-09-10 | Asml Netherlands B.V. | Object holder comprising an electrostatic clamp |
EP3705942A1 (en) | 2019-03-04 | 2020-09-09 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based optical component for broadband radiation generation |
EP3705945A1 (en) | 2019-03-08 | 2020-09-09 | ASML Netherlands B.V. | Methods and apparatus for estimating substrate shape |
WO2020182540A1 (en) | 2019-03-14 | 2020-09-17 | Asml Netherlands B.V. | Providing substantially laminar fluid flow in a lithographic apparatus |
WO2020187473A1 (en) | 2019-03-20 | 2020-09-24 | Asml Netherlands B.V. | A substrate container, a lithographic apparatus and a method using a lithographic apparatus |
KR102636261B1 (ko) | 2019-03-25 | 2024-02-13 | 에이에스엠엘 네델란즈 비.브이. | 주파수 확장 장치 및 방법 |
EP3715944A1 (en) | 2019-03-25 | 2020-09-30 | ASML Netherlands B.V. | Frequency broadening apparatus and method |
WO2020193039A1 (en) | 2019-03-27 | 2020-10-01 | Asml Netherlands B.V. | Method of measuring an alignment mark or an alignment mark assembly, alignment system, and lithographic tool |
EP3719545A1 (en) | 2019-04-03 | 2020-10-07 | ASML Netherlands B.V. | Manufacturing a reflective diffraction grating |
EP3948373A1 (en) | 2019-04-03 | 2022-02-09 | ASML Netherlands B.V. | Optical fiber |
EP3719551A1 (en) | 2019-04-03 | 2020-10-07 | ASML Netherlands B.V. | Optical fiber |
JP7361787B2 (ja) | 2019-04-08 | 2023-10-16 | エーエスエムエル ホールディング エヌ.ブイ. | リソグラフィ測定のためのセンサ装置及び方法 |
WO2020207632A1 (en) | 2019-04-10 | 2020-10-15 | Asml Netherlands B.V. | A method and system for determining overlay |
WO2020207759A1 (en) | 2019-04-12 | 2020-10-15 | Asml Netherlands B.V. | Method and apparatus for forming a patterned layer of material |
EP3722457A1 (en) | 2019-04-12 | 2020-10-14 | ASML Netherlands B.V. | Method and apparatus for forming a patterned layer of material |
CN113711128A (zh) | 2019-04-16 | 2021-11-26 | Asml荷兰有限公司 | 用于确定针对光刻设备的校正的方法 |
US11774868B2 (en) | 2019-04-16 | 2023-10-03 | Asml Netherlands B.V. | Image sensor for immersion lithography |
US11880144B2 (en) | 2019-04-23 | 2024-01-23 | Asml Netherlands B.V. | Object table, a stage apparatus and a lithographic apparatus |
EP3731018A1 (en) | 2019-04-23 | 2020-10-28 | ASML Netherlands B.V. | A method for re-imaging an image and associated metrology apparatus |
WO2020221529A1 (en) | 2019-05-01 | 2020-11-05 | Asml Netherlands B.V. | Object positioner, method for correcting the shape of an object, lithographiic apparatus, object inspection apparatus, device manufacturing method |
CN113906345A (zh) | 2019-05-03 | 2022-01-07 | Asml荷兰有限公司 | 基于倾斜拟合技术来确定对准模型的方法 |
US11947264B2 (en) | 2019-05-09 | 2024-04-02 | Asml Netherlands B.V. | Guiding device |
KR20210145287A (ko) | 2019-05-13 | 2021-12-01 | 에이에스엠엘 네델란즈 비.브이. | 대상물의 다수의 다양한 이미지의 동시 획득을 위한 검출 장치 |
EP3742230A1 (en) | 2019-05-23 | 2020-11-25 | ASML Netherlands B.V. | Detection apparatus for simultaneous acquisition of multiple diverse images of an object |
EP3739389A1 (en) | 2019-05-17 | 2020-11-18 | ASML Netherlands B.V. | Metrology tools comprising aplanatic objective singlet |
WO2020234045A1 (en) | 2019-05-20 | 2020-11-26 | Asml Netherlands B.V. | Actuator assemblies comprising piezo actuators or electrostrictive actuators |
CN113966490A (zh) | 2019-06-03 | 2022-01-21 | Asml荷兰有限公司 | 图像形成设备 |
WO2020244853A1 (en) | 2019-06-03 | 2020-12-10 | Asml Netherlands B.V. | Causal inference using time series data |
EP3751229A1 (en) | 2019-06-11 | 2020-12-16 | ASML Netherlands B.V. | Interferometer system, method of determining a mode hop of a laser source of an interferometer system, method of determining a position of a movable object, and lithographic apparatus |
WO2020249339A1 (en) | 2019-06-11 | 2020-12-17 | Asml Netherlands B.V. | Interferometer system, method of determining a mode hop of a laser source of an interferometer system, method of determining a position of a movable object, and lithographic apparatus |
EP3751342A1 (en) | 2019-06-13 | 2020-12-16 | Stichting VU | Metrology method and method for training a data structure for use in metrology |
EP3754427A1 (en) | 2019-06-17 | 2020-12-23 | ASML Netherlands B.V. | Metrology method and apparatus for of determining a complex-valued field |
KR20220010548A (ko) | 2019-06-17 | 2022-01-25 | 에이에스엠엘 네델란즈 비.브이. | 복소-값 필드를 결정하는 계측 방법 및 장치 |
EP3767347A1 (en) | 2019-07-17 | 2021-01-20 | ASML Netherlands B.V. | Mounted hollow-core fibre arrangement |
KR20220008912A (ko) | 2019-06-21 | 2022-01-21 | 에이에스엠엘 네델란즈 비.브이. | 장착된 중공 코어 섬유 배열체 |
EP3758168A1 (en) | 2019-06-25 | 2020-12-30 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based optical component for broadband radiation generation |
CN114026707A (zh) | 2019-06-27 | 2022-02-08 | Asml荷兰有限公司 | 多层超导制品、超导线圈、致动器、马达、平台设备和光刻设备 |
EP3767392A1 (en) | 2019-07-17 | 2021-01-20 | ASML Netherlands B.V. | Method and apparatus for determining feature contribution to performance |
EP3786711A1 (en) | 2019-08-28 | 2021-03-03 | ASML Netherlands B.V. | Non-correctable error in metrology |
JP7299406B2 (ja) | 2019-07-04 | 2023-06-27 | エーエスエムエル ネザーランズ ビー.ブイ. | メトロロジにおける補正不能誤差 |
CN114008535B (zh) | 2019-07-04 | 2024-04-12 | Asml荷兰有限公司 | 用于确定特征对性能的贡献的方法和设备 |
EP3761116A1 (en) | 2019-07-05 | 2021-01-06 | ASML Netherlands B.V. | A mirror calibrating method, a position measuring method, a lithographic apparatus and a device manufacturing method |
WO2021004705A1 (en) | 2019-07-08 | 2021-01-14 | Asml Netherlands B.V. | A lithographic apparatus |
JP7383732B2 (ja) | 2019-07-08 | 2023-11-20 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射スポットの中心を決定するための方法、センサ、及びステージ装置 |
EP3764165A1 (en) | 2019-07-12 | 2021-01-13 | ASML Netherlands B.V. | Substrate shape measuring device |
EP3767394A1 (en) | 2019-07-18 | 2021-01-20 | ASML Netherlands B.V. | Mark, overlay target, and methods of alignment and overlay |
CN114008540A (zh) | 2019-07-15 | 2022-02-01 | Asml荷兰有限公司 | 对准、重叠、配置标记、制造图案形成装置和图案化标记的方法 |
EP3611567A3 (en) | 2019-07-23 | 2020-05-13 | ASML Netherlands B.V. | Improvements in metrology targets |
KR102628796B1 (ko) | 2019-07-23 | 2024-01-23 | 사이머 엘엘씨 | 반복률 편차에 의해 유도된 파장 오차를 보상하는 방법 |
WO2021013611A1 (en) | 2019-07-24 | 2021-01-28 | Asml Netherlands B.V. | Radiation source |
EP3796080A1 (en) | 2019-09-18 | 2021-03-24 | ASML Netherlands B.V. | Radiation source |
US20220236651A1 (en) | 2019-07-29 | 2022-07-28 | Asml Netherlands B.V. | Thermo-mechanical actuator |
US20220260933A1 (en) | 2019-07-30 | 2022-08-18 | Asml Netherlands B.V. | Method of determining a mark measurement sequence, stage apparatus and lithographic apparatus |
KR20220027244A (ko) | 2019-08-05 | 2022-03-07 | 에이에스엠엘 네델란즈 비.브이. | 지지체, 방진 시스템, 리소그래피 장치, 대상물 측정 장치, 디바이스 제조 방법 |
EP3783436A1 (en) | 2019-08-19 | 2021-02-24 | ASML Netherlands B.V. | Illumination and detection apparatus for a metrology apparatus |
WO2021032376A1 (en) | 2019-08-20 | 2021-02-25 | Asml Netherlands B.V. | Method for controlling a semiconductor manufacturing process |
JP2022544905A (ja) | 2019-08-20 | 2022-10-24 | エーエスエムエル ネザーランズ ビー.ブイ. | 基板ホルダ、リソグラフィ装置、及び方法 |
KR20220034902A (ko) | 2019-08-22 | 2022-03-18 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 제어 방법 |
EP3783439A1 (en) | 2019-08-22 | 2021-02-24 | ASML Netherlands B.V. | Metrology device and detection apparatus therefor |
EP3848757A1 (en) | 2020-01-13 | 2021-07-14 | ASML Netherlands B.V. | Method for controlling a lithographic apparatus |
WO2021037453A1 (en) | 2019-08-23 | 2021-03-04 | Asml Netherlands B.V. | Method of controlling a position of a first object relative to a second object, control unit, stage apparatus and lithographic apparatus. |
KR20220044532A (ko) | 2019-09-02 | 2022-04-08 | 에이에스엠엘 네델란즈 비.브이. | 광결정 섬유 기반의 광대역 광원의 모드 제어 |
EP3786713A1 (en) | 2019-09-02 | 2021-03-03 | ASML Netherlands B.V. | Metrology method and device for determining a complex-valued field |
EP3786702A1 (en) | 2019-09-02 | 2021-03-03 | ASML Netherlands B.V. | Mode control of photonic crystal fiber based broadband light sources |
EP3792673A1 (en) | 2019-09-16 | 2021-03-17 | ASML Netherlands B.V. | Assembly for collimating broadband radiation |
KR20220035963A (ko) | 2019-09-03 | 2022-03-22 | 에이에스엠엘 네델란즈 비.브이. | 광대역 방사선을 시준하기 위한 어셈블리 |
WO2021043952A1 (en) | 2019-09-05 | 2021-03-11 | Asml Netherlands B.V. | An improved high harmonic generation apparatus |
EP3790364A1 (en) | 2019-09-05 | 2021-03-10 | ASML Netherlands B.V. | An improved high harmonic generation apparatus |
EP3796087A1 (en) | 2019-09-20 | 2021-03-24 | ASML Netherlands B.V. | Determining lithographic matching performance |
CN114391124A (zh) | 2019-09-12 | 2022-04-22 | Asml荷兰有限公司 | 确定光刻匹配性能 |
EP4028832A1 (en) | 2019-09-13 | 2022-07-20 | ASML Netherlands B.V. | Fluid handling system and lithographic apparatus |
EP3805857A1 (en) | 2019-10-09 | 2021-04-14 | ASML Netherlands B.V. | Improved broadband radiation generation in hollow-core fibres |
EP3796089A1 (en) | 2019-09-18 | 2021-03-24 | ASML Holding N.V. | A method for filtering an image and associated metrology apparatus |
CN114514465A (zh) | 2019-09-18 | 2022-05-17 | Asml荷兰有限公司 | 中空芯部光纤中的改进的宽带辐射生成 |
JP7378589B2 (ja) | 2019-09-19 | 2023-11-13 | サイマー リミテッド ライアビリティ カンパニー | ガス制御方法及びそれに関連した使用 |
EP3800505A1 (en) | 2019-10-03 | 2021-04-07 | ASML Netherlands B.V. | Measurement system and method for characterizing a patterning device |
KR20220058956A (ko) | 2019-10-11 | 2022-05-10 | 사이머 엘엘씨 | 방전 레이저용 도전성 부재 |
EP3809190A1 (en) | 2019-10-14 | 2021-04-21 | ASML Netherlands B.V. | Method and apparatus for coherence scrambling in metrology applications |
US20220382124A1 (en) | 2019-10-17 | 2022-12-01 | Asml Netherlands B.V. | An illumination source and associated metrology apparatus |
EP3839621A1 (en) | 2019-12-16 | 2021-06-23 | ASML Netherlands B.V. | An illumination source and associated metrology apparatus |
CN114585953A (zh) | 2019-10-24 | 2022-06-03 | Asml荷兰有限公司 | 用于宽带辐射生成的基于空芯光子晶体光纤的光学部件 |
EP3839586A1 (en) | 2019-12-18 | 2021-06-23 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based optical component for broadband radiation generation |
EP3816721A1 (en) | 2019-10-29 | 2021-05-05 | ASML Netherlands B.V. | Method and apparatus for efficient high harmonic generation |
CN114631061A (zh) | 2019-10-30 | 2022-06-14 | 西默有限公司 | 辐射源测试 |
EP3869270A1 (en) | 2020-02-18 | 2021-08-25 | ASML Netherlands B.V. | Assemblies and methods for guiding radiation |
US20220397834A1 (en) | 2019-11-05 | 2022-12-15 | Asml Netherlands B.V. | Measuring method and measuring apparatus |
EP3819267B1 (en) | 2019-11-07 | 2022-06-29 | ASML Netherlands B.V. | Method of manufacture of a capillary for a hollow-core photonic crystal fiber |
EP3819266A1 (en) | 2019-11-07 | 2021-05-12 | ASML Netherlands B.V. | Method of manufacture of a capillary for a hollow-core photonic crystal fiber |
KR20220078669A (ko) | 2019-11-08 | 2022-06-10 | 사이머 엘엘씨 | 방사선의 펄스의 버스트를 제어하기 위한 방사선 시스템 |
WO2021094207A1 (en) | 2019-11-12 | 2021-05-20 | Asml Netherlands B.V. | Tunable laser device, method to tune a laser beam, interferometer system and lithographic apparatus |
KR20220100596A (ko) | 2019-11-14 | 2022-07-15 | 에이에스엠엘 네델란즈 비.브이. | 기판 지지부, 리소그래피 장치, 전하 분포를 조작하기 위한 방법 및 기판을 준비하기 위한 방법 |
WO2021099047A1 (en) | 2019-11-19 | 2021-05-27 | Asml Netherlands B.V. | A method of obtaining performance information about a lithography process |
EP3839630A1 (en) | 2019-12-19 | 2021-06-23 | ASML Netherlands B.V. | Methods and apparatus for configuring a lens model request |
EP3828632A1 (en) | 2019-11-29 | 2021-06-02 | ASML Netherlands B.V. | Method and system for predicting electric field images with a parameterized model |
CN114766012A (zh) | 2019-11-29 | 2022-07-19 | Asml荷兰有限公司 | 用参数化模型预测过程信息的方法和系统 |
KR20220088487A (ko) | 2019-11-29 | 2022-06-27 | 에이에스엠엘 네델란즈 비.브이. | 개선된 안정성을 갖는 리소그래피 장치 |
WO2021115765A1 (en) | 2019-12-09 | 2021-06-17 | Asml Netherlands B.V. | Method of manufacturing a substrate support for a ithographic apparatus, substrate table, lithographic apparatus, device manufacturing method, method of use |
EP3839635A1 (en) | 2019-12-17 | 2021-06-23 | ASML Netherlands B.V. | Dark field digital holographic microscope and associated metrology method |
WO2021121733A1 (en) | 2019-12-17 | 2021-06-24 | Asml Netherlands B.V. | Dark field digital holographic microscope and associated metrology method |
EP3851915A1 (en) | 2020-01-14 | 2021-07-21 | ASML Netherlands B.V. | Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses |
CN114902139A (zh) | 2019-12-18 | 2022-08-12 | Asml荷兰有限公司 | 用于校正集成电路和关联设备的制造中的测量值的方法 |
WO2021123135A1 (en) | 2019-12-19 | 2021-06-24 | Asml Netherlands B.V. | Scatterometer and method of scatterometry using acoustic radiation |
WO2021122065A1 (en) | 2019-12-19 | 2021-06-24 | Asml Netherlands B.V. | Improved lithography methods |
EP3839632A1 (en) | 2019-12-20 | 2021-06-23 | ASML Netherlands B.V. | Method for determining a measurement recipe and associated apparatuses |
KR20210143725A (ko) * | 2019-12-26 | 2021-11-29 | 난징 리안 세미컨덕터 리미티드 | 반도체 산업에서 웨이퍼 기하학적 구조 측정을 위한 툴 아키텍처 |
CN112864075A (zh) | 2019-12-26 | 2021-05-28 | 南京力安半导体有限公司 | 晶圆几何参数以及晶圆上掩膜层的厚度的测量方法 |
WO2021144108A1 (en) | 2020-01-14 | 2021-07-22 | Asml Netherlands B.V. | Improved lithography apparatus |
EP3865931A1 (en) | 2020-02-12 | 2021-08-18 | ASML Netherlands B.V. | Method, assembly, and apparatus for improved control of broadband radiation generation |
WO2021144093A1 (en) | 2020-01-15 | 2021-07-22 | Asml Netherlands B.V. | Method, assembly, and apparatus for improved control of broadband radiation generation |
EP3851916A1 (en) | 2020-01-17 | 2021-07-21 | ASML Netherlands B.V. | Suction clamp, object handler, stage apparatus and lithographic apparatus |
EP3859448A1 (en) | 2020-01-28 | 2021-08-04 | ASML Netherlands B.V. | Positioning device and method to use a positioning device |
JP7365510B2 (ja) | 2020-01-29 | 2023-10-19 | エーエスエムエル ネザーランズ ビー.ブイ. | 基板上の周期構造を測定するための計測方法およびデバイス |
EP3876037A1 (en) | 2020-03-06 | 2021-09-08 | ASML Netherlands B.V. | Metrology method and device for measuring a periodic structure on a substrate |
WO2021155991A1 (en) | 2020-02-06 | 2021-08-12 | Asml Netherlands B.V. | Method of using a dual stage lithographic apparatus and lithographic apparatus |
WO2021155990A1 (en) | 2020-02-07 | 2021-08-12 | Asml Netherlands B.V. | A stage system, stage system operating method, inspection tool, lithographic apparatus, calibration method and device manufacturing method |
EP4104017A1 (en) | 2020-02-14 | 2022-12-21 | ASML Netherlands B.V. | Determining lithographic matching performance |
EP3869272A1 (en) | 2020-02-21 | 2021-08-25 | ASML Netherlands B.V. | Substrate table and method of handling a substrate |
KR20220145343A (ko) | 2020-02-24 | 2022-10-28 | 에이에스엠엘 네델란즈 비.브이. | 기판 지지체 및 기판 테이블 |
EP3872444A1 (en) | 2020-02-25 | 2021-09-01 | ASML Netherlands B.V. | Interferometer system and lithographic apparatus |
EP3875633A1 (en) | 2020-03-03 | 2021-09-08 | Stichting Nederlandse Wetenschappelijk Onderzoek Instituten | Method and apparatus for forming a patterned layer of material |
EP3876036A1 (en) | 2020-03-04 | 2021-09-08 | ASML Netherlands B.V. | Vibration isolation system and associated applications in lithography |
EP3879343A1 (en) | 2020-03-11 | 2021-09-15 | ASML Netherlands B.V. | Metrology measurement method and apparatus |
EP3889681A1 (en) | 2020-03-31 | 2021-10-06 | ASML Netherlands B.V. | An assembly including a non-linear element and a method of use thereof |
WO2021197747A1 (en) | 2020-03-31 | 2021-10-07 | Asml Netherlands B.V. | Method for preparing a substrate and lithographic apparatus |
EP3910417A1 (en) | 2020-05-13 | 2021-11-17 | ASML Netherlands B.V. | Method for determining an inspection strategy for a group of substrates in a semiconductor manufacturing process |
CN115398345A (zh) | 2020-04-02 | 2022-11-25 | Asml荷兰有限公司 | 在半导体制造过程中用于确定对于一组衬底的检查策略的方法 |
EP3901700A1 (en) | 2020-04-20 | 2021-10-27 | ASML Netherlands B.V. | Method and apparatus for predicting a process metric associated with a process |
KR20220147660A (ko) | 2020-04-02 | 2022-11-03 | 에이에스엠엘 네델란즈 비.브이. | 공정과 연관된 공정 메트릭 예측 방법 및 장치 |
WO2021204481A1 (en) | 2020-04-09 | 2021-10-14 | Asml Netherlands B.V. | Seed laser system for radiation source |
NL2025372A (en) | 2020-04-20 | 2020-05-07 | Asml Netherlands Bv | System, lithographic apparatus and method |
EP4139749A1 (en) | 2020-04-20 | 2023-03-01 | ASML Netherlands B.V. | Configuration of an imputer model |
EP3913435A1 (en) | 2020-05-19 | 2021-11-24 | ASML Netherlands B.V. | Configuration of an imputer model |
EP4139628A1 (en) | 2020-04-23 | 2023-03-01 | ASML Netherlands B.V. | Method for calibration of an optical measurement system and optical measurement system |
JP7443565B2 (ja) | 2020-05-04 | 2024-03-05 | エーエスエムエル ネザーランズ ビー.ブイ. | 基板の表面についてのレベルデータを生成するためのシステムおよび方法 |
CN115552334A (zh) | 2020-05-08 | 2022-12-30 | Asml荷兰有限公司 | 用于诊断未观察的操作参数的方法和设备 |
US11429176B2 (en) | 2020-05-14 | 2022-08-30 | Dell Products L.P. | Intelligent and predictive optimization of power needs across virtualized environments |
CN115516383A (zh) | 2020-05-14 | 2022-12-23 | Asml荷兰有限公司 | 对产品特征使用at分辨率量测的晶片对准方法 |
KR20230010648A (ko) | 2020-05-15 | 2023-01-19 | 에이에스엠엘 네델란즈 비.브이. | 기판 지지 시스템, 리소그래피 장치 및 기판 노광 방법 |
EP3913429A1 (en) | 2020-05-19 | 2021-11-24 | ASML Netherlands B.V. | A supercontinuum radiation source and associated metrology devices |
CN115668719A (zh) | 2020-05-20 | 2023-01-31 | Asml荷兰有限公司 | 磁体组件、线圈组件、平面马达、定位装置和光刻设备 |
CN115701293A (zh) | 2020-06-04 | 2023-02-07 | Asml荷兰有限公司 | 流体净化系统、投射系统、照射系统、光刻设备和方法 |
EP3923075A1 (en) | 2020-06-08 | 2021-12-15 | ASML Netherlands B.V. | Apparatus for use in a metrology process or lithographic process |
EP3923076A1 (en) | 2020-06-09 | 2021-12-15 | ASML Netherlands B.V. | Fluid purging system |
EP3923078A1 (en) | 2020-06-10 | 2021-12-15 | ASML Netherlands B.V. | Heigth measurement method and height measurement system |
WO2021254709A1 (en) | 2020-06-16 | 2021-12-23 | Asml Netherlands B.V. | A method for modeling measurement data over a substrate area and associated apparatuses |
WO2021259619A1 (en) | 2020-06-23 | 2021-12-30 | Asml Holding N.V. | Sub micron particle detection on burl tops by applying a variable voltage to an oxidized wafer |
WO2021259646A1 (en) | 2020-06-24 | 2021-12-30 | Asml Netherlands B.V. | Monolithic particle inspection device |
US20230266681A1 (en) | 2020-06-24 | 2023-08-24 | Asml Holding N.V. | Self-referencing integrated alignment sensor |
WO2022002497A1 (en) | 2020-06-29 | 2022-01-06 | Asml Netherlands B.V. | A signal parameter determination method, a heterodyne interferometer system, a lithographic apparatus and a device manufacturing method |
KR20230031885A (ko) | 2020-07-01 | 2023-03-07 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 생산 공정에서의 사용을 위한 열 민감성 요소 및 디바이스의 열-기계적 제어를 위한 방법 |
KR20230031288A (ko) | 2020-07-06 | 2023-03-07 | 에이에스엠엘 네델란즈 비.브이. | 레이저-대-액적 정렬을 위한 시스템 및 방법 |
EP3936936A1 (en) | 2020-07-08 | 2022-01-12 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator with extended fiber lifetime |
WO2022008164A1 (en) | 2020-07-08 | 2022-01-13 | Asml Netherlands B.V. | Hollow-core fiber based broadband radiation generator with extended fiber lifetime |
US20230315027A1 (en) | 2020-07-09 | 2023-10-05 | Asml Netherlands B.V. | Motion control using an artificial neural network |
EP3944020A1 (en) | 2020-07-20 | 2022-01-26 | ASML Netherlands B.V. | Method for adjusting a patterning process |
KR20230023789A (ko) | 2020-07-09 | 2023-02-17 | 에이에스엠엘 네델란즈 비.브이. | 패터닝 공정 조정 방법 |
KR20230023004A (ko) | 2020-07-10 | 2023-02-16 | 에이에스엠엘 네델란즈 비.브이. | 광학 장치를 컨디셔닝하기 위한 시스템 및 방법 |
US20230259037A1 (en) | 2020-07-14 | 2023-08-17 | Asml Netherlands B.V. | A fluid handling system, method and lithographic apparatus |
US20230260855A1 (en) | 2020-07-15 | 2023-08-17 | Asml Netherlands B. V. | Method of determining a correction strategy in a semiconductor manufacturing process and associated apparatuses |
EP3945548A1 (en) | 2020-07-30 | 2022-02-02 | ASML Netherlands B.V. | Method for classifying semiconductor wafers |
EP3962241A1 (en) | 2020-08-26 | 2022-03-02 | ASML Netherlands B.V. | An illumination source and associated metrology apparatus |
US20230288818A1 (en) | 2020-07-21 | 2023-09-14 | ASML Netherlands B,V. | An illumination source and associated metrology apparatus |
JP2023536576A (ja) | 2020-07-30 | 2023-08-28 | エーエスエムエル ホールディング エヌ.ブイ. | 粒子検査システムのスループットを改善するためのダブルスキャン・オプトメカニカル構成 |
US20230280661A1 (en) | 2020-08-05 | 2023-09-07 | Asml Netherlands B.V. | A fabrication process deviation determination method, calibration method, inspection tool, fabrication system and a sample |
US20230252347A1 (en) | 2020-08-06 | 2023-08-10 | Asml Netherlands B.V. | Method and apparatus for concept drift mitigation |
EP3961303A1 (en) | 2020-08-27 | 2022-03-02 | ASML Netherlands B.V. | Method and apparatus for identifying contamination in a semiconductor fab |
EP4196851A1 (en) | 2020-08-11 | 2023-06-21 | ASML Netherlands B.V. | Method and apparatus for identifying contamination in a semiconductor fab |
EP3958052A1 (en) | 2020-08-20 | 2022-02-23 | ASML Netherlands B.V. | Metrology method for measuring an exposed pattern and associated metrology apparatus |
NL2028788A (en) | 2020-08-27 | 2022-04-29 | Asml Netherlands Bv | Compact dual pass interferometer for a plane mirror interferometer |
EP3961304A1 (en) | 2020-08-31 | 2022-03-02 | ASML Netherlands B.V. | Mapping metrics between manufacturing systems |
EP3964892A1 (en) | 2020-09-02 | 2022-03-09 | Stichting VU | Illumination arrangement and associated dark field digital holographic microscope |
EP3964809A1 (en) | 2020-09-02 | 2022-03-09 | Stichting VU | Wavefront metrology sensor and mask therefor, method for optimizing a mask and associated apparatuses |
EP3988996A1 (en) | 2020-10-20 | 2022-04-27 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator |
IL300587A (en) | 2020-09-03 | 2023-04-01 | Asml Netherlands Bv | Photonic crystal radiation generator based on broadband hollow crystal fibers |
EP3971647A1 (en) | 2020-09-16 | 2022-03-23 | ASML Netherlands B.V. | Base plate and substrate assembly |
CN116075779A (zh) | 2020-09-16 | 2023-05-05 | Asml荷兰有限公司 | 基板和衬底组件 |
EP3971648A1 (en) | 2020-09-17 | 2022-03-23 | ASML Netherlands B.V. | Mark to be projected on an object durign a lithograhpic process and method for designing a mark |
EP3978964A1 (en) | 2020-10-01 | 2022-04-06 | ASML Netherlands B.V. | Achromatic optical relay arrangement |
EP4226214A1 (en) | 2020-10-08 | 2023-08-16 | ASML Netherlands B.V. | Substrate holder, carrier system comprising a substrate holder and lithographic apparatus |
US20230332880A1 (en) | 2020-10-12 | 2023-10-19 | Asml Netherlands B.V. | Interferometer system and lithographic apparatus |
CN116325113A (zh) | 2020-10-16 | 2023-06-23 | Asml荷兰有限公司 | 载物台、台式设备、保持方法和光刻设备 |
KR20230069214A (ko) | 2020-10-20 | 2023-05-18 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치에서의 기판 레벨 감지 |
WO2022100998A1 (en) | 2020-11-11 | 2022-05-19 | Asml Netherlands B.V. | Methods and computer programs for configuration of a sampling scheme generation model |
JP2023549319A (ja) | 2020-11-13 | 2023-11-24 | エーエスエムエル ネザーランズ ビー.ブイ. | 測定システム及びその使用方法 |
JP2023548684A (ja) | 2020-11-16 | 2023-11-20 | エーエスエムエル ネザーランズ ビー.ブイ. | 基板エリアの測定データをモデル化する方法及び関連する装置 |
EP4002015A1 (en) | 2020-11-16 | 2022-05-25 | ASML Netherlands B.V. | Dark field digital holographic microscope and associated metrology method |
EP4001455A1 (en) | 2020-11-18 | 2022-05-25 | ASML Netherlands B.V. | Method of forming a patterned layer of material |
WO2022106157A1 (en) | 2020-11-18 | 2022-05-27 | Asml Netherlands B.V. | Method of forming a patterned layer of material |
US20230408933A1 (en) | 2020-11-24 | 2023-12-21 | Asml Netherlands B.V. | A positioning system, a lithographic apparatus, an absolute position determination method, and a device manufacturing method |
WO2022111919A1 (en) | 2020-11-25 | 2022-06-02 | Asml Netherlands B.V. | A fluid handling system, method and lithographic apparatus |
EP4006640A1 (en) | 2020-11-26 | 2022-06-01 | Stichting Nederlandse Wetenschappelijk Onderzoek Instituten | Metrology apparatus and metrology methods based on high harmonic generation from a diffractive structure |
CN116472436A (zh) | 2020-11-26 | 2023-07-21 | Asml荷兰有限公司 | 镜斑位置校准方法、光刻设备和器件制造方法 |
KR20230110738A (ko) | 2020-11-30 | 2023-07-25 | 에이에스엠엘 네델란즈 비.브이. | 고차 고조파 생성에 기반한 계측 장치 및 관련 방법 |
EP4006641A1 (en) | 2020-11-30 | 2022-06-01 | Stichting Nederlandse Wetenschappelijk Onderzoek Instituten | Metrology apparatus based on high harmonic generation and associated method |
EP4009107A1 (en) | 2020-12-01 | 2022-06-08 | ASML Netherlands B.V. | Method and apparatus for imaging nonstationary object |
IL303441A (en) | 2020-12-10 | 2023-08-01 | Asml Netherlands Bv | Broadband radiation generator based on photonic fibers with a photonic core |
EP4012492A1 (en) | 2020-12-10 | 2022-06-15 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator |
EP4016144A1 (en) | 2020-12-18 | 2022-06-22 | ASML Netherlands B.V. | Metrology target simulation |
WO2022135852A1 (en) | 2020-12-21 | 2022-06-30 | Asml Netherlands B.V. | Interferometer head with directional sensitivity |
EP4017221A1 (en) | 2020-12-21 | 2022-06-22 | ASML Netherlands B.V. | Methods and apparatus for controlling electron density distributions |
US20240004319A1 (en) | 2020-12-23 | 2024-01-04 | Asml Netherlands B.V. | Methods and apparatus for providing a broadband light source |
EP4030230A1 (en) | 2021-01-18 | 2022-07-20 | ASML Netherlands B.V. | Methods and apparatus for providing a broadband light source |
US20230333480A1 (en) | 2020-12-23 | 2023-10-19 | Asml Netherlands B.V. | A fluid handling system, method and lithographic apparatus |
EP4050416A1 (en) | 2021-02-25 | 2022-08-31 | ASML Netherlands B.V. | Lithographic method |
KR20230122610A (ko) | 2020-12-24 | 2023-08-22 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 방법 |
EP4020086A1 (en) | 2020-12-28 | 2022-06-29 | ASML Netherlands B.V. | A metrology apparatus and a metrology method |
WO2022144144A1 (en) | 2020-12-29 | 2022-07-07 | Asml Holding N.V. | Vacuum sheet bond fixturing and flexible burl applications for substrate tables |
EP4075339A1 (en) | 2021-04-15 | 2022-10-19 | ASML Netherlands B.V. | Modular autoencoder model for manufacturing process parameter estimation |
EP4075341A1 (en) | 2021-04-18 | 2022-10-19 | ASML Netherlands B.V. | Modular autoencoder model for manufacturing process parameter estimation |
WO2022144203A1 (en) | 2020-12-30 | 2022-07-07 | Asml Netherlands B.V. | Modular autoencoder model for manufacturing process parameter estimation |
EP4075340A1 (en) | 2021-04-15 | 2022-10-19 | ASML Netherlands B.V. | Modular autoencoder model for manufacturing process parameter estimation |
EP4275094A1 (en) | 2021-01-11 | 2023-11-15 | ASML Netherlands B.V. | Gripper and lithographic apparatus comprising the gripper |
EP4278146A1 (en) | 2021-01-14 | 2023-11-22 | ASML Netherlands B.V. | An interferometer system, positioning system, a lithographic apparatus, a jitter determination method, and a device manufacturing method |
US20240053532A1 (en) | 2021-01-27 | 2024-02-15 | Asml Netherlands B.V. | Hollow-core photonic crystal fiber |
EP4036619A1 (en) | 2021-01-27 | 2022-08-03 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber |
KR20230132487A (ko) | 2021-01-27 | 2023-09-15 | 에이에스엠엘 네델란즈 비.브이. | 투영 광학기 가열을 위한 멀티-채널 광 소스 |
WO2022161795A1 (en) | 2021-01-28 | 2022-08-04 | Asml Holding N.V. | Fast uniformity drift correction |
EP4067968A1 (en) | 2021-03-29 | 2022-10-05 | ASML Netherlands B.V. | Methods and apparatuses for spatially filtering optical pulses |
WO2022167179A1 (en) | 2021-02-04 | 2022-08-11 | Asml Netherlands B.V. | Methods and apparatuses for spatially filtering optical pulses |
EP4047400A1 (en) | 2021-02-17 | 2022-08-24 | ASML Netherlands B.V. | Assembly for separating radiation in the far field |
KR20230146536A (ko) | 2021-02-17 | 2023-10-19 | 에이에스엠엘 네델란즈 비.브이. | 원거리 필드에서 방사선을 분리하기 위한 어셈블리 |
EP4050328A1 (en) | 2021-02-25 | 2022-08-31 | ASML Netherlands B.V. | Method to predict metrology offset of a semiconductor manufacturing process |
US20240069454A1 (en) | 2021-03-04 | 2024-02-29 | Asml Netherlands B.V. | Data filter for scanning metrology |
EP4057069A1 (en) | 2021-03-11 | 2022-09-14 | ASML Netherlands B.V. | Methods and apparatus for characterizing a semiconductor manufacturing process |
EP4060403A1 (en) | 2021-03-16 | 2022-09-21 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based multiple wavelength light source device |
EP4060408A1 (en) | 2021-03-16 | 2022-09-21 | ASML Netherlands B.V. | Method and system for predicting process information with a parameterized model |
EP4086698A1 (en) | 2021-05-06 | 2022-11-09 | ASML Netherlands B.V. | Hollow-core optical fiber based radiation source |
JP2024509518A (ja) | 2021-03-16 | 2024-03-04 | エーエスエムエル ネザーランズ ビー.ブイ. | 中空コア光ファイバベースの放射源 |
TW202243107A (zh) | 2021-03-18 | 2022-11-01 | 荷蘭商Asml荷蘭公司 | 用於經改良疊對之夾具電極修改 |
IL305689A (en) | 2021-03-22 | 2023-11-01 | Asml Holding Nv | Digital holographic microscope and associated metrological methods |
EP4063971A1 (en) | 2021-03-22 | 2022-09-28 | ASML Netherlands B.V. | Digital holographic microscope and associated metrology method |
CN117157586A (zh) | 2021-03-29 | 2023-12-01 | Asml荷兰有限公司 | 用于晶片对准的不对称性扩展栅格模型 |
JP2024513761A (ja) | 2021-04-01 | 2024-03-27 | エーエスエムエル ネザーランズ ビー.ブイ. | レーザシステム |
EP4071554A1 (en) | 2021-04-08 | 2022-10-12 | ASML Netherlands B.V. | A method for modeling measurement data over a substrate area and associated apparatuses |
WO2022214267A1 (en) | 2021-04-08 | 2022-10-13 | Asml Netherlands B.V. | A method for modeling measurement data over a substrate area and associated apparatuses |
WO2022218616A1 (en) | 2021-04-15 | 2022-10-20 | Asml Netherlands B.V. | A fluid handling system, method and lithographic apparatus |
JP2024514054A (ja) | 2021-04-19 | 2024-03-28 | エーエスエムエル ネザーランズ ビー.ブイ. | メトロロジツール較正方法及び関連するメトロロジツール |
EP4080284A1 (en) | 2021-04-19 | 2022-10-26 | ASML Netherlands B.V. | Metrology tool calibration method and associated metrology tool |
EP4102297A1 (en) | 2021-06-10 | 2022-12-14 | ASML Netherlands B.V. | Temperature conditioning system, a lithographic apparatus and a method of temperature conditioning an object |
EP4080285A1 (en) | 2021-04-21 | 2022-10-26 | ASML Netherlands B.V. | Surface treatment device |
KR20230170687A (ko) | 2021-04-21 | 2023-12-19 | 에이에스엠엘 네델란즈 비.브이. | 온도 컨디셔닝 시스템, 리소그래피 장치, 및 물체의 온도 컨디셔닝 방법 |
WO2022223277A1 (en) | 2021-04-21 | 2022-10-27 | Asml Netherlands B.V. | Surface treatment device and method |
EP4170421A1 (en) | 2021-10-25 | 2023-04-26 | ASML Netherlands B.V. | A cleaning method and associated illumination source metrology apparatus |
EP4330768A1 (en) | 2021-04-26 | 2024-03-06 | ASML Netherlands B.V. | A cleaning method and associated illumination source metrology apparatus |
EP4334766A1 (en) | 2021-05-03 | 2024-03-13 | ASML Netherlands B.V. | Optical element for generation of broadband radiation |
EP4105696A1 (en) | 2021-06-15 | 2022-12-21 | ASML Netherlands B.V. | Optical element for generation of broadband radiation |
EP4105719A1 (en) | 2021-06-15 | 2022-12-21 | ASML Netherlands B.V. | Causal convolution network for process control |
KR20240004599A (ko) | 2021-05-06 | 2024-01-11 | 에이에스엠엘 네델란즈 비.브이. | 프로세스 제어를 위한 인과적 합성곱 네트워크 |
CN117296011A (zh) | 2021-05-06 | 2023-12-26 | Asml荷兰有限公司 | 定位系统、光刻装置、驱动力衰减方法和器件制造方法 |
EP4089484A1 (en) | 2021-05-12 | 2022-11-16 | ASML Netherlands B.V. | System and method to ensure parameter measurement matching across metrology tools |
EP4187321A1 (en) | 2021-11-24 | 2023-05-31 | ASML Netherlands B.V. | Metrology method and associated metrology tool |
KR20240016967A (ko) | 2021-05-31 | 2024-02-06 | 에이에스엠엘 네델란즈 비.브이. | 메트롤로지 방법 및 연관된 메트롤로지 툴 |
IL308370A (en) | 2021-05-31 | 2024-01-01 | Asml Netherlands Bv | Metrological measurement method and device |
WO2022258251A1 (en) | 2021-06-07 | 2022-12-15 | Asml Netherlands B.V. | Method and arrangement for determining thermally-induced deformations |
WO2022258371A1 (en) | 2021-06-08 | 2022-12-15 | Asml Netherlands B.V. | Intensity imbalance calibration on an overfilled bidirectional mark |
KR20240021180A (ko) | 2021-06-14 | 2024-02-16 | 에이에스엠엘 네델란즈 비.브이. | 레티클용 냉각 후드 |
EP4356194A1 (en) | 2021-06-14 | 2024-04-24 | ASML Netherlands B.V. | An illumination source and associated method apparatus |
EP4134734A1 (en) | 2021-08-11 | 2023-02-15 | ASML Netherlands B.V. | An illumination source and associated method apparatus |
IL308972A (en) | 2021-06-18 | 2024-01-01 | Asml Netherlands Bv | Metrology method and instrument |
EP4124909A1 (en) | 2021-07-28 | 2023-02-01 | ASML Netherlands B.V. | Metrology method and device |
WO2022268438A1 (en) | 2021-06-24 | 2022-12-29 | Asml Netherlands B.V. | Structures for use on a substrate holder, substrate holder, lithographic apparatus and method |
EP4359866A1 (en) | 2021-06-25 | 2024-05-01 | ASML Netherlands B.V. | An inspection tool, method and lithographic apparatus |
EP4112572A1 (en) | 2021-06-28 | 2023-01-04 | ASML Netherlands B.V. | Method of producing photonic crystal fibers |
EP4116888A1 (en) | 2021-07-07 | 2023-01-11 | ASML Netherlands B.V. | Computer implemented method for diagnosing a system comprising a plurality of modules |
WO2023280692A1 (en) | 2021-07-07 | 2023-01-12 | Asml Netherlands B.V. | A position measurement system, a positioning system, a lithographic apparatus, and a device manufacturing method |
EP4116772A1 (en) | 2021-07-09 | 2023-01-11 | ASML Netherlands B.V. | Electromagnetic motor system, postion control system, stage apparatus, lithographic apparatus, method of determining a motor-dependent commutation model for an electromagnetic motor |
EP4120019A1 (en) | 2021-07-12 | 2023-01-18 | ASML Netherlands B.V. | Method of determining a correction for at least one control parameter in a semiconductor manufacturing process |
WO2023001463A1 (en) | 2021-07-20 | 2023-01-26 | Asml Netherlands B.V. | Methods and computer programs for data mapping for low dimensional data analysis |
EP4130880A1 (en) | 2021-08-03 | 2023-02-08 | ASML Netherlands B.V. | Methods of data mapping for low dimensional data analysis |
WO2023001448A1 (en) | 2021-07-23 | 2023-01-26 | Asml Netherlands B.V. | Metrology method and metrology device |
EP4124911A1 (en) | 2021-07-29 | 2023-02-01 | ASML Netherlands B.V. | Metrology method and metrology device |
EP4134744A1 (en) | 2021-08-09 | 2023-02-15 | ASML Netherlands B.V. | A sensor positioning method, a positioning system, a lithographic apparatus, a metrology apparatus, and a device manufacturing method |
EP4134746A1 (en) | 2021-08-12 | 2023-02-15 | ASML Netherlands B.V. | A method for modeling measurement data over a substrate area and associated apparatuses |
EP4134745A1 (en) | 2021-08-12 | 2023-02-15 | ASML Netherlands B.V. | A method for modeling measurement data over a substrate area and associated apparatuses |
CN117882013A (zh) | 2021-08-12 | 2024-04-12 | Asml荷兰有限公司 | 使用离轴照射的强度测量 |
WO2023016815A1 (en) | 2021-08-13 | 2023-02-16 | Asml Netherlands B.V. | Lithographic method to enhance illuminator transmission |
CN117897661A (zh) | 2021-08-18 | 2024-04-16 | Asml荷兰有限公司 | 量测目标优化 |
WO2023025468A1 (en) | 2021-08-24 | 2023-03-02 | Asml Netherlands B.V. | An object gripper, a method of holding an object and a lithographic apparatus |
EP4163715A1 (en) | 2021-10-05 | 2023-04-12 | ASML Netherlands B.V. | Improved broadband radiation generation in photonic crystal or highly non-linear fibres |
WO2023025578A1 (en) | 2021-08-25 | 2023-03-02 | Asml Netherlands B.V. | Improved broadband radiation generation in photonic crystal or highly non-linear fibres |
IL310738A (en) | 2021-08-26 | 2024-04-01 | Asml Netherlands Bv | A method for determining a measuring recipe and related devices |
EP4194952A1 (en) | 2021-12-13 | 2023-06-14 | ASML Netherlands B.V. | Method for determing a measurement recipe and associated apparatuses |
CN117882012A (zh) | 2021-08-30 | 2024-04-12 | Asml荷兰有限公司 | 量测系统、光刻设备和方法 |
WO2023036530A1 (en) | 2021-09-13 | 2023-03-16 | Asml Netherlands B.V. | Sensor system |
EP4184426A1 (en) | 2021-11-22 | 2023-05-24 | ASML Netherlands B.V. | Metrology method and device |
WO2023041274A1 (en) | 2021-09-14 | 2023-03-23 | Asml Netherlands B.V. | Metrology method and device |
WO2023041251A1 (en) | 2021-09-16 | 2023-03-23 | Asml Netherlands B.V. | Thermal conditioning unit, substrate handling device and lithographic apparatus |
EP4155821A1 (en) | 2021-09-27 | 2023-03-29 | ASML Netherlands B.V. | Method for focus metrology and associated apparatuses |
EP4160314A1 (en) | 2021-10-04 | 2023-04-05 | ASML Netherlands B.V. | Method for measuring at least one target on a substrate |
EP4167029A1 (en) | 2021-10-14 | 2023-04-19 | ASML Netherlands B.V. | A fluid extraction system, method and lithographic apparatus |
EP4170430A1 (en) | 2021-10-25 | 2023-04-26 | ASML Netherlands B.V. | Metrology apparatus and metrology methods based on high harmonic generation from a diffractive structure |
EP4174568A1 (en) | 2021-11-01 | 2023-05-03 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator |
WO2023078619A1 (en) | 2021-11-02 | 2023-05-11 | Asml Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator |
EP4174567A1 (en) | 2021-11-02 | 2023-05-03 | ASML Netherlands B.V. | Hollow-core photonic crystal fiber based broadband radiation generator |
WO2023078788A1 (en) | 2021-11-03 | 2023-05-11 | Asml Netherlands B.V. | Lithographic apparatus stage coupling |
EP4181018A1 (en) | 2021-11-12 | 2023-05-17 | ASML Netherlands B.V. | Latent space synchronization of machine learning models for in-device metrology inference |
EP4184250A1 (en) | 2021-11-23 | 2023-05-24 | ASML Netherlands B.V. | Obtaining a parameter characterizing a fabrication process |
EP4194951A1 (en) | 2021-12-13 | 2023-06-14 | ASML Netherlands B.V. | Identifying deviating modules from a reference population for machine diagnostics |
WO2023110907A1 (en) | 2021-12-17 | 2023-06-22 | Asml Netherlands B.V. | Overlay metrology based on template matching with adaptive weighting |
WO2023110318A1 (en) | 2021-12-17 | 2023-06-22 | Asml Netherlands B.V. | Machine learning model for asymmetry-induced overlay error correction |
EP4202508A1 (en) | 2021-12-22 | 2023-06-28 | ASML Netherlands B.V. | Waveguides and manufacturing methods thereof |
WO2023117265A1 (en) | 2021-12-23 | 2023-06-29 | Asml Netherlands B.V. | An assembly for a laser-operated light source and method of use |
EP4206823A1 (en) | 2021-12-30 | 2023-07-05 | ASML Netherlands B.V. | Method of patterning a target layer, apparatus for patterning a target layer |
EP4209846A1 (en) | 2022-01-10 | 2023-07-12 | ASML Netherlands B.V. | Hierarchical anomaly detection and data representation method to identify system level degradation |
EP4212961A1 (en) | 2022-01-14 | 2023-07-19 | ASML Netherlands B.V. | Lithographic performance qualification and associated apparatuses |
EP4216106A1 (en) | 2022-01-19 | 2023-07-26 | ASML Netherlands B.V. | Method for controlling a production system and method for thermally controlling at least part of an environment |
WO2023143909A1 (en) | 2022-01-31 | 2023-08-03 | Asml Netherlands B.V. | Substrate table, lithographic apparatus, sticker, cover ring and method of operating a lithographic apparatus |
WO2023148326A1 (en) | 2022-02-04 | 2023-08-10 | Asml Netherlands B.V. | Lithographic apparatus controller system |
WO2023151973A1 (en) | 2022-02-10 | 2023-08-17 | Asml Netherlands B.V. | Systems and methods for generating sem-quality metrology data from optical metrology data using machine learning |
EP4231090A1 (en) | 2022-02-17 | 2023-08-23 | ASML Netherlands B.V. | A supercontinuum radiation source and associated metrology devices |
WO2023160924A1 (en) | 2022-02-22 | 2023-08-31 | Asml Netherlands B.V. | Method and apparatus for reflecting pulsed radiation |
WO2023160972A1 (en) | 2022-02-28 | 2023-08-31 | Asml Netherlands B.V. | Height measurement sensor |
WO2023165824A1 (en) | 2022-03-01 | 2023-09-07 | Asml Netherlands B.V. | Image analysis based on adaptive weighting of template contours |
WO2023165783A1 (en) | 2022-03-01 | 2023-09-07 | Asml Netherlands B.V. | Apparatus and methods for filtering measurement radiation |
EP4250010A1 (en) | 2022-03-25 | 2023-09-27 | ASML Netherlands B.V. | Apparatus and methods for filtering measurement radiation |
EP4242744A1 (en) | 2022-03-09 | 2023-09-13 | ASML Netherlands B.V. | Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses |
WO2023174648A1 (en) | 2022-03-18 | 2023-09-21 | Stichting Vu | Illumination arrangement for a metrology device and associated method |
EP4246232A1 (en) | 2022-03-18 | 2023-09-20 | Stichting VU | Illumination arrangement for a metrology device and associated method |
EP4246231A1 (en) | 2022-03-18 | 2023-09-20 | Stichting VU | A method for determining a vertical position of a structure on a substrate and associated apparatuses |
EP4280076A1 (en) | 2022-05-17 | 2023-11-22 | ASML Netherlands B.V. | Data retrieval |
WO2023186441A1 (en) | 2022-03-29 | 2023-10-05 | Asml Netherlands B.V. | Data retrieval |
EP4254266A1 (en) | 2022-03-29 | 2023-10-04 | ASML Netherlands B.V. | Methods related to an autoencoder model or similar for manufacturing process parameter estimation |
WO2023186508A1 (en) | 2022-03-31 | 2023-10-05 | Asml Netherlands B.V. | End-effector and method for handling a substrate |
WO2023186569A1 (en) | 2022-03-31 | 2023-10-05 | Asml Netherlands B.V. | Substrate warpage determination system |
WO2023194036A1 (en) | 2022-04-05 | 2023-10-12 | Asml Netherlands B.V. | Imaging method and metrology device |
EP4296780A1 (en) | 2022-06-24 | 2023-12-27 | ASML Netherlands B.V. | Imaging method and metrology device |
WO2023194049A1 (en) | 2022-04-08 | 2023-10-12 | Asml Netherlands B.V. | Hollow-core optical fiber based radiation source |
EP4273622A1 (en) | 2022-05-02 | 2023-11-08 | ASML Netherlands B.V. | Hollow-core optical fiber based radiation source |
EP4261618A1 (en) | 2022-04-14 | 2023-10-18 | ASML Netherlands B.V. | A method of determining a correction for control of a lithography and/or metrology process, and associated devices |
WO2023208487A1 (en) | 2022-04-25 | 2023-11-02 | Asml Netherlands B.V. | Source selection module and associated metrology apparatus |
EP4279993A1 (en) | 2022-05-18 | 2023-11-22 | ASML Netherlands B.V. | Source selection module and associated metrology apparatus |
WO2023208475A1 (en) | 2022-04-26 | 2023-11-02 | Asml Netherlands B.V. | Thermally actuated cooling system |
WO2023213527A1 (en) | 2022-05-03 | 2023-11-09 | Asml Netherlands B.V. | Illumination mode selector and associated optical metrology tool |
EP4276537A1 (en) | 2022-05-09 | 2023-11-15 | ASML Netherlands B.V. | Illumination mode selector and associated optical metrology tool |
WO2023217460A1 (en) | 2022-05-09 | 2023-11-16 | Asml Netherlands B.V. | Mechatronic system control method, lithographic apparatus control method and lithographic apparatus |
WO2023222328A1 (en) | 2022-05-20 | 2023-11-23 | Asml Netherlands B.V. | Illumination module and associated methods and metrology apparatus |
WO2023222342A1 (en) | 2022-05-20 | 2023-11-23 | Asml Netherlands B.V. | Measurement of fabrication parameters based on moiré interference pattern components |
WO2023222349A1 (en) | 2022-05-20 | 2023-11-23 | Asml Netherlands B.V. | Single pad overlay measurement |
EP4279994A1 (en) | 2022-05-20 | 2023-11-22 | ASML Netherlands B.V. | Illumination module and associated methods and metrology apparatus |
WO2023232408A1 (en) | 2022-05-31 | 2023-12-07 | Asml Netherlands B.V. | A membrane and associated method and apparatus |
EP4303655A1 (en) | 2022-07-04 | 2024-01-10 | ASML Netherlands B.V. | A membrane and associated method and apparatus |
EP4328670A1 (en) | 2022-08-23 | 2024-02-28 | ASML Netherlands B.V. | Method for parameter reconstruction of a metrology device and associated metrology device |
EP4296779A1 (en) | 2022-06-21 | 2023-12-27 | ASML Netherlands B.V. | Method for aligning an illumination-detection system of a metrology device and associated metrology device |
WO2023232478A1 (en) | 2022-06-02 | 2023-12-07 | Asml Netherlands B.V. | Method for parameter reconstruction of a metrology device and associated metrology device |
WO2023232397A1 (en) | 2022-06-02 | 2023-12-07 | Asml Netherlands B.V. | Method for aligning an illumination-detection system of a metrology device and associated metrology device |
EP4289798A1 (en) | 2022-06-07 | 2023-12-13 | ASML Netherlands B.V. | Method of producing photonic crystal fibers |
WO2023241893A1 (en) | 2022-06-15 | 2023-12-21 | Asml Netherlands B.V. | Substrate support and lithographic apparatus |
WO2023241867A1 (en) | 2022-06-16 | 2023-12-21 | Asml Netherlands B.V. | Calibration method and apparatus |
WO2023247125A1 (en) | 2022-06-23 | 2023-12-28 | Asml Netherlands B.V. | Method and apparatus for determining a physical quantity |
EP4300183A1 (en) | 2022-06-30 | 2024-01-03 | ASML Netherlands B.V. | Apparatus for broadband radiation generation |
WO2024008367A1 (en) | 2022-07-07 | 2024-01-11 | Asml Netherlands B.V. | A fluid handling system, method and lithographic apparatus |
WO2024008359A1 (en) | 2022-07-07 | 2024-01-11 | Asml Netherlands B.V. | Substrate holding system and lithographic apparatus |
WO2024012768A1 (en) | 2022-07-11 | 2024-01-18 | Asml Netherlands B.V. | Substrate holder, lithographic apparatus, computer program and method |
EP4312079A1 (en) | 2022-07-29 | 2024-01-31 | ASML Netherlands B.V. | Methods of mitigating crosstalk in metrology images |
EP4312005A1 (en) | 2022-07-29 | 2024-01-31 | Stichting VU | Method and apparatuses for fourier transform spectrometry |
EP4318131A1 (en) | 2022-08-01 | 2024-02-07 | ASML Netherlands B.V. | Sensor module, illuminator, metrology device and associated metrology method |
EP4318133A1 (en) | 2022-08-05 | 2024-02-07 | ASML Netherlands B.V. | System, apparatus and method for selective surface treatment |
WO2024033036A1 (en) | 2022-08-08 | 2024-02-15 | Asml Netherlands B.V. | Metrology method and associated metrology device |
WO2024033005A1 (en) | 2022-08-09 | 2024-02-15 | Asml Netherlands B.V. | Inference model training |
EP4321933A1 (en) | 2022-08-09 | 2024-02-14 | ASML Netherlands B.V. | A radiation source |
WO2024033035A1 (en) | 2022-08-10 | 2024-02-15 | Asml Netherlands B.V. | Metrology method and associated metrology device |
WO2024037797A1 (en) | 2022-08-16 | 2024-02-22 | Asml Netherlands B.V. | Classifying product units |
EP4343472A1 (en) | 2022-09-20 | 2024-03-27 | ASML Netherlands B.V. | Classifying product units |
WO2024037799A1 (en) | 2022-08-18 | 2024-02-22 | Asml Netherlands B.V. | Method to stabilize a wavelength of a tunable laser device, tunable laser device, and position measurement system provided with the tunable laser device |
NL2035465A (en) | 2022-08-18 | 2024-02-27 | Asml Netherlands Bv | Superconductive magnet assembly, planar motor and lithographic apparatus |
WO2024037801A1 (en) | 2022-08-19 | 2024-02-22 | Asml Netherlands B.V. | A conditioning system, arrangement and method |
EP4332678A1 (en) | 2022-09-05 | 2024-03-06 | ASML Netherlands B.V. | Holographic metrology apparatus and method |
EP4336262A1 (en) | 2022-09-07 | 2024-03-13 | ASML Netherlands B.V. | Metrology method and associated metrology device |
WO2024052012A1 (en) | 2022-09-07 | 2024-03-14 | Asml Netherlands B.V. | Metrology method and associated metrology device |
EP4336251A1 (en) | 2022-09-12 | 2024-03-13 | ASML Netherlands B.V. | A multi-pass radiation device |
WO2024056296A1 (en) | 2022-09-13 | 2024-03-21 | Asml Netherlands B.V. | Metrology method and associated metrology device |
EP4343020A1 (en) | 2022-09-21 | 2024-03-27 | ASML Netherlands B.V. | Method of forming a patterned layer of material, apparatus for forming a patterned layer of material |
WO2024074255A1 (en) | 2022-10-06 | 2024-04-11 | Asml Netherlands B.V. | Method and apparatus for controlling a lithographic apparatus, and a lithographic apparatus |
EP4354200A1 (en) | 2022-10-11 | 2024-04-17 | ASML Netherlands B.V. | An aberration correction optical system |
EP4354224A1 (en) | 2022-10-11 | 2024-04-17 | ASML Netherlands B.V. | Method for operating a detection system of a metrology device and associated metrology device |
WO2024078813A1 (en) | 2022-10-11 | 2024-04-18 | Asml Netherlands B.V. | An aberration correction optical system |
WO2024078802A1 (en) | 2022-10-12 | 2024-04-18 | Asml Netherlands B.V. | Substrate support qualification |
EP4357853A1 (en) | 2022-10-17 | 2024-04-24 | ASML Netherlands B.V. | Apparatus and methods for filtering measurement radiation |
EP4357854A1 (en) | 2022-10-20 | 2024-04-24 | ASML Netherlands B.V. | Method of predicting a parameter of interest in a semiconductor manufacturing process |
Family Cites Families (259)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE221563C (ja) | ||||
DE206607C (ja) | ||||
DE224448C (ja) | ||||
DE242880C (ja) | ||||
GB1242527A (en) | 1967-10-20 | 1971-08-11 | Kodak Ltd | Optical instruments |
US3573975A (en) | 1968-07-10 | 1971-04-06 | Ibm | Photochemical fabrication process |
US4280054A (en) | 1979-04-30 | 1981-07-21 | Varian Associates, Inc. | X-Y Work table |
ATE1462T1 (de) | 1979-07-27 | 1982-08-15 | Werner W. Dr. Tabarelli | Optisches lithographieverfahren und einrichtung zum kopieren eines musters auf eine halbleiterscheibe. |
FR2474708B1 (fr) | 1980-01-24 | 1987-02-20 | Dme | Procede de microphotolithographie a haute resolution de traits |
JPS5754317A (en) | 1980-09-19 | 1982-03-31 | Hitachi Ltd | Method and device for forming pattern |
US4509852A (en) | 1980-10-06 | 1985-04-09 | Werner Tabarelli | Apparatus for the photolithographic manufacture of integrated circuit elements |
US4346164A (en) | 1980-10-06 | 1982-08-24 | Werner Tabarelli | Photolithographic method for the manufacture of integrated circuits |
US4390273A (en) | 1981-02-17 | 1983-06-28 | Censor Patent-Und Versuchsanstalt | Projection mask as well as a method and apparatus for the embedding thereof and projection printing system |
JPS57153433A (en) * | 1981-03-18 | 1982-09-22 | Hitachi Ltd | Manufacturing device for semiconductor |
JPS58202448A (ja) | 1982-05-21 | 1983-11-25 | Hitachi Ltd | 露光装置 |
DD206607A1 (de) | 1982-06-16 | 1984-02-01 | Mikroelektronik Zt Forsch Tech | Verfahren und vorrichtung zur beseitigung von interferenzeffekten |
JPS5919912A (ja) * | 1982-07-26 | 1984-02-01 | Hitachi Ltd | 液浸距離保持装置 |
US4441808A (en) | 1982-11-15 | 1984-04-10 | Tre Semiconductor Equipment Corp. | Focusing device for photo-exposure system |
DD242880A1 (de) | 1983-01-31 | 1987-02-11 | Kuch Karl Heinz | Einrichtung zur fotolithografischen strukturuebertragung |
DD221563A1 (de) | 1983-09-14 | 1985-04-24 | Mikroelektronik Zt Forsch Tech | Immersionsobjektiv fuer die schrittweise projektionsabbildung einer maskenstruktur |
DD224448A1 (de) | 1984-03-01 | 1985-07-03 | Zeiss Jena Veb Carl | Einrichtung zur fotolithografischen strukturuebertragung |
JPS6265326A (ja) | 1985-09-18 | 1987-03-24 | Hitachi Ltd | 露光装置 |
JPS62121417A (ja) | 1985-11-22 | 1987-06-02 | Hitachi Ltd | 液浸対物レンズ装置 |
JPS62150828A (ja) | 1985-12-25 | 1987-07-04 | Mitsubishi Electric Corp | ウエハ乾燥装置 |
US4980896A (en) | 1986-04-15 | 1990-12-25 | Hampshire Instruments, Inc. | X-ray lithography system |
JPS6349893A (ja) | 1986-08-19 | 1988-03-02 | Matsushita Electric Ind Co Ltd | バ−コ−ド読み取り装置 |
JPS63157419A (ja) | 1986-12-22 | 1988-06-30 | Toshiba Corp | 微細パタ−ン転写装置 |
US4801352A (en) * | 1986-12-30 | 1989-01-31 | Image Micro Systems, Inc. | Flowing gas seal enclosure for processing workpiece surface with controlled gas environment and intense laser irradiation |
US4778995A (en) | 1987-05-12 | 1988-10-18 | Eastman Kodak Company | Stimulable phosphor imaging apparatus |
US5040020A (en) | 1988-03-31 | 1991-08-13 | Cornell Research Foundation, Inc. | Self-aligned, high resolution resonant dielectric lithography |
JPH0228312A (ja) | 1988-07-18 | 1990-01-30 | Nikon Corp | 露光装置 |
US5103102A (en) * | 1989-02-24 | 1992-04-07 | Micrion Corporation | Localized vacuum apparatus and method |
GB8911336D0 (en) | 1989-05-17 | 1989-07-05 | Heinz Co H J | Removing surface liquid from articles |
JPH03209479A (ja) | 1989-09-06 | 1991-09-12 | Sanee Giken Kk | 露光方法 |
US5121256A (en) | 1991-03-14 | 1992-06-09 | The Board Of Trustees Of The Leland Stanford Junior University | Lithography system employing a solid immersion lens |
JPH04305915A (ja) | 1991-04-02 | 1992-10-28 | Nikon Corp | 密着型露光装置 |
JPH04305917A (ja) | 1991-04-02 | 1992-10-28 | Nikon Corp | 密着型露光装置 |
JP3218478B2 (ja) | 1992-09-04 | 2001-10-15 | 株式会社ニコン | 投影露光装置及び方法 |
JPH0562877A (ja) | 1991-09-02 | 1993-03-12 | Yasuko Shinohara | 光によるlsi製造縮小投影露光装置の光学系 |
JPH06124873A (ja) | 1992-10-09 | 1994-05-06 | Canon Inc | 液浸式投影露光装置 |
JP2753930B2 (ja) * | 1992-11-27 | 1998-05-20 | キヤノン株式会社 | 液浸式投影露光装置 |
JP2520833B2 (ja) * | 1992-12-21 | 1996-07-31 | 東京エレクトロン株式会社 | 浸漬式の液処理装置 |
JP3747958B2 (ja) | 1995-04-07 | 2006-02-22 | 株式会社ニコン | 反射屈折光学系 |
JP3212199B2 (ja) | 1993-10-04 | 2001-09-25 | 旭硝子株式会社 | 平板型陰極線管 |
JPH07220990A (ja) | 1994-01-28 | 1995-08-18 | Hitachi Ltd | パターン形成方法及びその露光装置 |
US5874820A (en) | 1995-04-04 | 1999-02-23 | Nikon Corporation | Window frame-guided stage mechanism |
US5517344A (en) | 1994-05-20 | 1996-05-14 | Prime View Hk Limited | System for protection of drive circuits formed on a substrate of a liquid crystal display |
JP3116297B2 (ja) * | 1994-08-03 | 2000-12-11 | 東京エレクトロン株式会社 | 処理方法及び処理装置 |
JPH08136475A (ja) | 1994-11-14 | 1996-05-31 | Kawasaki Steel Corp | 板状材の表面観察装置 |
JP3387075B2 (ja) | 1994-12-12 | 2003-03-17 | 株式会社ニコン | 走査露光方法、露光装置、及び走査型露光装置 |
JPH08171054A (ja) | 1994-12-16 | 1996-07-02 | Nikon Corp | 反射屈折光学系 |
JPH08316125A (ja) | 1995-05-19 | 1996-11-29 | Hitachi Ltd | 投影露光方法及び露光装置 |
JPH08316124A (ja) | 1995-05-19 | 1996-11-29 | Hitachi Ltd | 投影露光方法及び露光装置 |
US5883704A (en) | 1995-08-07 | 1999-03-16 | Nikon Corporation | Projection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical system |
US5795390A (en) * | 1995-08-24 | 1998-08-18 | Camelot Systems, Inc. | Liquid dispensing system with multiple cartridges |
JPH103039A (ja) | 1996-06-14 | 1998-01-06 | Nikon Corp | 反射屈折光学系 |
JPH1020195A (ja) | 1996-06-28 | 1998-01-23 | Nikon Corp | 反射屈折光学系 |
US6104687A (en) | 1996-08-26 | 2000-08-15 | Digital Papyrus Corporation | Method and apparatus for coupling an optical lens to a disk through a coupling medium having a relatively high index of refraction |
US5825043A (en) * | 1996-10-07 | 1998-10-20 | Nikon Precision Inc. | Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus |
JPH1133506A (ja) * | 1997-07-24 | 1999-02-09 | Tadahiro Omi | 流体処理装置及び洗浄処理システム |
JP3612920B2 (ja) | 1997-02-14 | 2005-01-26 | ソニー株式会社 | 光学記録媒体の原盤作製用露光装置 |
JPH10255319A (ja) | 1997-03-12 | 1998-09-25 | Hitachi Maxell Ltd | 原盤露光装置及び方法 |
JP3747566B2 (ja) | 1997-04-23 | 2006-02-22 | 株式会社ニコン | 液浸型露光装置 |
JP3817836B2 (ja) | 1997-06-10 | 2006-09-06 | 株式会社ニコン | 露光装置及びその製造方法並びに露光方法及びデバイス製造方法 |
US5900354A (en) | 1997-07-03 | 1999-05-04 | Batchelder; John Samuel | Method for optical inspection and lithography |
US6103636A (en) * | 1997-08-20 | 2000-08-15 | Micron Technology, Inc. | Method and apparatus for selective removal of material from wafer alignment marks |
JP3495891B2 (ja) | 1997-10-22 | 2004-02-09 | 株式会社湯山製作所 | 薬剤分割包装装置 |
JPH11176727A (ja) | 1997-12-11 | 1999-07-02 | Nikon Corp | 投影露光装置 |
WO1999031717A1 (fr) | 1997-12-12 | 1999-06-24 | Nikon Corporation | Procede d'exposition par projection et graveur a projection |
US6126169A (en) | 1998-01-23 | 2000-10-03 | Nikon Corporation | Air bearing operable in a vacuum region |
JPH11239758A (ja) | 1998-02-26 | 1999-09-07 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
AU2747999A (en) * | 1998-03-26 | 1999-10-18 | Nikon Corporation | Projection exposure method and system |
US5997963A (en) * | 1998-05-05 | 1999-12-07 | Ultratech Stepper, Inc. | Microchamber |
JP2000058436A (ja) | 1998-08-11 | 2000-02-25 | Nikon Corp | 投影露光装置及び露光方法 |
JP2000076707A (ja) | 1998-08-31 | 2000-03-14 | Sony Corp | 光学記録媒体作製用原盤記録装置 |
US6333775B1 (en) | 1999-01-13 | 2001-12-25 | Euv Llc | Extreme-UV lithography vacuum chamber zone seal |
TWI242111B (en) | 1999-04-19 | 2005-10-21 | Asml Netherlands Bv | Gas bearings for use in vacuum chambers and their application in lithographic projection apparatus |
TW552480B (en) * | 1999-04-19 | 2003-09-11 | Asml Netherlands Bv | Moveable support in a vacuum chamber and its application in lithographic projection apparatus |
US6809802B1 (en) | 1999-08-19 | 2004-10-26 | Canon Kabushiki Kaisha | Substrate attracting and holding system for use in exposure apparatus |
JP4504479B2 (ja) | 1999-09-21 | 2010-07-14 | オリンパス株式会社 | 顕微鏡用液浸対物レンズ |
JP2001118773A (ja) | 1999-10-18 | 2001-04-27 | Nikon Corp | ステージ装置及び露光装置 |
KR100773165B1 (ko) | 1999-12-24 | 2007-11-02 | 가부시키가이샤 에바라 세이사꾸쇼 | 반도체기판처리장치 및 처리방법 |
US7187503B2 (en) | 1999-12-29 | 2007-03-06 | Carl Zeiss Smt Ag | Refractive projection objective for immersion lithography |
US6995930B2 (en) | 1999-12-29 | 2006-02-07 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
JP2001272604A (ja) | 2000-03-27 | 2001-10-05 | Olympus Optical Co Ltd | 液浸対物レンズおよびそれを用いた光学装置 |
DE60130754T2 (de) | 2000-05-03 | 2008-01-24 | Asml Holding, N.V. | Apparat zur Erzeugung eines gespülten optischen Weges in einer photolithographischen Projektionsanlage sowie ein entsprechendes Verfahren |
JP2001358056A (ja) | 2000-06-15 | 2001-12-26 | Canon Inc | 露光装置 |
EP1168422B1 (en) * | 2000-06-27 | 2009-12-16 | Imec | Method and apparatus for liquid-treating and drying a substrate |
US6488040B1 (en) | 2000-06-30 | 2002-12-03 | Lam Research Corporation | Capillary proximity heads for single wafer cleaning and drying |
US7234477B2 (en) * | 2000-06-30 | 2007-06-26 | Lam Research Corporation | Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces |
JP2002033267A (ja) | 2000-07-18 | 2002-01-31 | Nikon Corp | 排気方法及び排気装置、露光方法及び露光装置 |
TW591653B (en) | 2000-08-08 | 2004-06-11 | Koninkl Philips Electronics Nv | Method of manufacturing an optically scannable information carrier |
TW497013B (en) | 2000-09-07 | 2002-08-01 | Asm Lithography Bv | Method for calibrating a lithographic projection apparatus and apparatus capable of applying such a method |
JP2002170754A (ja) | 2000-11-30 | 2002-06-14 | Nikon Corp | 露光装置、光学特性検出方法及び露光方法 |
KR100866818B1 (ko) | 2000-12-11 | 2008-11-04 | 가부시키가이샤 니콘 | 투영광학계 및 이 투영광학계를 구비한 노광장치 |
EP1231514A1 (en) | 2001-02-13 | 2002-08-14 | Asm Lithography B.V. | Measurement of wavefront aberrations in a lithographic projection apparatus |
US20020163629A1 (en) | 2001-05-07 | 2002-11-07 | Michael Switkes | Methods and apparatus employing an index matching medium |
JP2002334862A (ja) * | 2001-05-10 | 2002-11-22 | Mitsubishi Electric Corp | 半導体装置の製造方法およびその製造方法に用いる半導体基板の洗浄装置 |
GB2376873A (en) | 2001-05-31 | 2002-12-31 | Ian Robert Fothergill | Analysis or disposal of surface adherents |
US6600547B2 (en) | 2001-09-24 | 2003-07-29 | Nikon Corporation | Sliding seal |
US6801301B2 (en) | 2001-10-12 | 2004-10-05 | Canon Kabushiki Kaisha | Exposure apparatus |
WO2003040830A2 (en) | 2001-11-07 | 2003-05-15 | Applied Materials, Inc. | Optical spot grid array printer |
JP4003441B2 (ja) | 2001-11-08 | 2007-11-07 | セイコーエプソン株式会社 | 表面処理装置および表面処理方法 |
US6842256B2 (en) | 2001-11-15 | 2005-01-11 | Zygo Corporation | Compensating for effects of variations in gas refractivity in interferometers |
JP2003158173A (ja) | 2001-11-20 | 2003-05-30 | Oki Electric Ind Co Ltd | ウェハホルダ |
DE10229818A1 (de) | 2002-06-28 | 2004-01-15 | Carl Zeiss Smt Ag | Verfahren zur Fokusdetektion und Abbildungssystem mit Fokusdetektionssystem |
DE10210899A1 (de) | 2002-03-08 | 2003-09-18 | Zeiss Carl Smt Ag | Refraktives Projektionsobjektiv für Immersions-Lithographie |
US7092069B2 (en) | 2002-03-08 | 2006-08-15 | Carl Zeiss Smt Ag | Projection exposure method and projection exposure system |
DE10211817A1 (de) * | 2002-03-16 | 2003-09-25 | Schlafhorst & Co W | Spinnvorrichtung |
WO2003085708A1 (fr) | 2002-04-09 | 2003-10-16 | Nikon Corporation | Procede d'exposition, dispositif d'exposition et procede de fabrication dudit dispositif |
EP1532489A2 (en) | 2002-08-23 | 2005-05-25 | Nikon Corporation | Projection optical system and method for photolithography and exposure apparatus and method using same |
US6988326B2 (en) | 2002-09-30 | 2006-01-24 | Lam Research Corporation | Phobic barrier meniscus separation and containment |
US7093375B2 (en) | 2002-09-30 | 2006-08-22 | Lam Research Corporation | Apparatus and method for utilizing a meniscus in substrate processing |
US7367345B1 (en) | 2002-09-30 | 2008-05-06 | Lam Research Corporation | Apparatus and method for providing a confined liquid for immersion lithography |
US6954993B1 (en) | 2002-09-30 | 2005-10-18 | Lam Research Corporation | Concentric proximity processing head |
US6788477B2 (en) | 2002-10-22 | 2004-09-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus for method for immersion lithography |
CN100568101C (zh) | 2002-11-12 | 2009-12-09 | Asml荷兰有限公司 | 光刻装置和器件制造方法 |
US9482966B2 (en) | 2002-11-12 | 2016-11-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7110081B2 (en) | 2002-11-12 | 2006-09-19 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
DE60335595D1 (de) * | 2002-11-12 | 2011-02-17 | Asml Netherlands Bv | Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung |
SG121822A1 (en) * | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
SG135052A1 (en) * | 2002-11-12 | 2007-09-28 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
CN101382738B (zh) * | 2002-11-12 | 2011-01-12 | Asml荷兰有限公司 | 光刻投射装置 |
SG131766A1 (en) * | 2002-11-18 | 2007-05-28 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
DE10253679A1 (de) | 2002-11-18 | 2004-06-03 | Infineon Technologies Ag | Optische Einrichtung zur Verwendung bei einem Lithographie-Verfahren, insbesondere zur Herstellung eines Halbleiter-Bauelements, sowie optisches Lithographieverfahren |
TWI255971B (en) * | 2002-11-29 | 2006-06-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
DE10258718A1 (de) | 2002-12-09 | 2004-06-24 | Carl Zeiss Smt Ag | Projektionsobjektiv, insbesondere für die Mikrolithographie, sowie Verfahren zur Abstimmung eines Projektionsobjektives |
WO2004053957A1 (ja) | 2002-12-10 | 2004-06-24 | Nikon Corporation | 面位置検出装置、露光方法、及びデバイス製造方法 |
JP4232449B2 (ja) | 2002-12-10 | 2009-03-04 | 株式会社ニコン | 露光方法、露光装置、及びデバイス製造方法 |
AU2003302830A1 (en) | 2002-12-10 | 2004-06-30 | Nikon Corporation | Exposure apparatus and method for manufacturing device |
JP4352874B2 (ja) | 2002-12-10 | 2009-10-28 | 株式会社ニコン | 露光装置及びデバイス製造方法 |
EP1429190B1 (en) | 2002-12-10 | 2012-05-09 | Canon Kabushiki Kaisha | Exposure apparatus and method |
EP1571696A4 (en) | 2002-12-10 | 2008-03-26 | Nikon Corp | EXPOSURE DEVICE AND METHOD OF MANUFACTURE |
EP1571694A4 (en) | 2002-12-10 | 2008-10-15 | Nikon Corp | EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING THE DEVICE |
SG150388A1 (en) | 2002-12-10 | 2009-03-30 | Nikon Corp | Exposure apparatus and method for producing device |
KR101101737B1 (ko) | 2002-12-10 | 2012-01-05 | 가부시키가이샤 니콘 | 노광장치 및 노광방법, 디바이스 제조방법 |
US7242455B2 (en) | 2002-12-10 | 2007-07-10 | Nikon Corporation | Exposure apparatus and method for producing device |
DE10257766A1 (de) | 2002-12-10 | 2004-07-15 | Carl Zeiss Smt Ag | Verfahren zur Einstellung einer gewünschten optischen Eigenschaft eines Projektionsobjektivs sowie mikrolithografische Projektionsbelichtungsanlage |
KR20050085026A (ko) | 2002-12-10 | 2005-08-29 | 가부시키가이샤 니콘 | 광학 소자 및 그 광학 소자를 사용한 투영 노광 장치 |
WO2004053951A1 (ja) | 2002-12-10 | 2004-06-24 | Nikon Corporation | 露光方法及び露光装置並びにデバイス製造方法 |
JP4529433B2 (ja) | 2002-12-10 | 2010-08-25 | 株式会社ニコン | 露光装置及び露光方法、デバイス製造方法 |
WO2004053955A1 (ja) | 2002-12-10 | 2004-06-24 | Nikon Corporation | 露光装置及びデバイス製造方法 |
EP1573730B1 (en) | 2002-12-13 | 2009-02-25 | Koninklijke Philips Electronics N.V. | Liquid removal in a method and device for irradiating spots on a layer |
USRE48515E1 (en) | 2002-12-19 | 2021-04-13 | Asml Netherlands B.V. | Method and device for irradiating spots on a layer |
US7010958B2 (en) | 2002-12-19 | 2006-03-14 | Asml Holding N.V. | High-resolution gas gauge proximity sensor |
US7399978B2 (en) | 2002-12-19 | 2008-07-15 | Koninklijke Philips Electronics N.V. | Method and device for irradiating spots on a layer |
US6781670B2 (en) | 2002-12-30 | 2004-08-24 | Intel Corporation | Immersion lithography |
US7090964B2 (en) | 2003-02-21 | 2006-08-15 | Asml Holding N.V. | Lithographic printing with polarized light |
US7206059B2 (en) | 2003-02-27 | 2007-04-17 | Asml Netherlands B.V. | Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
US6943941B2 (en) | 2003-02-27 | 2005-09-13 | Asml Netherlands B.V. | Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
US7029832B2 (en) | 2003-03-11 | 2006-04-18 | Samsung Electronics Co., Ltd. | Immersion lithography methods using carbon dioxide |
US20050164522A1 (en) | 2003-03-24 | 2005-07-28 | Kunz Roderick R. | Optical fluids, and systems and methods of making and using the same |
KR20050110033A (ko) | 2003-03-25 | 2005-11-22 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조 방법 |
KR20110104084A (ko) | 2003-04-09 | 2011-09-21 | 가부시키가이샤 니콘 | 액침 리소그래피 유체 제어 시스템 |
WO2004090633A2 (en) | 2003-04-10 | 2004-10-21 | Nikon Corporation | An electro-osmotic element for an immersion lithography apparatus |
EP1611482B1 (en) | 2003-04-10 | 2015-06-03 | Nikon Corporation | Run-off path to collect liquid for an immersion lithography apparatus |
KR101238142B1 (ko) * | 2003-04-10 | 2013-02-28 | 가부시키가이샤 니콘 | 액침 리소그래피 장치용 운반 영역을 포함하는 환경 시스템 |
KR101121655B1 (ko) | 2003-04-10 | 2012-03-09 | 가부시키가이샤 니콘 | 액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템 |
SG2014015135A (en) | 2003-04-11 | 2015-06-29 | Nippon Kogaku Kk | Cleanup method for optics in immersion lithography |
SG10201504396VA (en) | 2003-04-11 | 2015-07-30 | Nikon Corp | Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly |
WO2004092830A2 (en) | 2003-04-11 | 2004-10-28 | Nikon Corporation | Liquid jet and recovery system for immersion lithography |
ATE542167T1 (de) | 2003-04-17 | 2012-02-15 | Nikon Corp | Lithographisches immersionsgerät |
JP4025683B2 (ja) | 2003-05-09 | 2007-12-26 | 松下電器産業株式会社 | パターン形成方法及び露光装置 |
JP4146755B2 (ja) | 2003-05-09 | 2008-09-10 | 松下電器産業株式会社 | パターン形成方法 |
TWI295414B (en) * | 2003-05-13 | 2008-04-01 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
EP1477856A1 (en) | 2003-05-13 | 2004-11-17 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
TWI503865B (zh) | 2003-05-23 | 2015-10-11 | 尼康股份有限公司 | A method of manufacturing an exposure apparatus and an element |
JP2005277363A (ja) | 2003-05-23 | 2005-10-06 | Nikon Corp | 露光装置及びデバイス製造方法 |
JP5143331B2 (ja) | 2003-05-28 | 2013-02-13 | 株式会社ニコン | 露光方法及び露光装置、並びにデバイス製造方法 |
US7274472B2 (en) | 2003-05-28 | 2007-09-25 | Timbre Technologies, Inc. | Resolution enhanced optical metrology |
DE10324477A1 (de) * | 2003-05-30 | 2004-12-30 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage |
US7213963B2 (en) | 2003-06-09 | 2007-05-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP1486827B1 (en) * | 2003-06-11 | 2011-11-02 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP4084710B2 (ja) | 2003-06-12 | 2008-04-30 | 松下電器産業株式会社 | パターン形成方法 |
JP4054285B2 (ja) | 2003-06-12 | 2008-02-27 | 松下電器産業株式会社 | パターン形成方法 |
US6867844B2 (en) | 2003-06-19 | 2005-03-15 | Asml Holding N.V. | Immersion photolithography system and method using microchannel nozzles |
KR101265450B1 (ko) | 2003-06-19 | 2013-05-16 | 가부시키가이샤 니콘 | 노광 장치 및 디바이스 제조방법 |
JP4029064B2 (ja) | 2003-06-23 | 2008-01-09 | 松下電器産業株式会社 | パターン形成方法 |
JP4084712B2 (ja) | 2003-06-23 | 2008-04-30 | 松下電器産業株式会社 | パターン形成方法 |
JP2005019616A (ja) * | 2003-06-25 | 2005-01-20 | Canon Inc | 液浸式露光装置 |
JP4343597B2 (ja) * | 2003-06-25 | 2009-10-14 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
JP3862678B2 (ja) | 2003-06-27 | 2006-12-27 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
EP1498778A1 (en) * | 2003-06-27 | 2005-01-19 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US6809794B1 (en) | 2003-06-27 | 2004-10-26 | Asml Holding N.V. | Immersion photolithography system and method using inverted wafer-projection optics interface |
KR20060027832A (ko) | 2003-07-01 | 2006-03-28 | 가부시키가이샤 니콘 | 광학 엘리먼트로서 동위원소적으로 특정된 유체를 사용하는방법 |
EP2466382B1 (en) | 2003-07-08 | 2014-11-26 | Nikon Corporation | Wafer table for immersion lithography |
US7738074B2 (en) * | 2003-07-16 | 2010-06-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7384149B2 (en) | 2003-07-21 | 2008-06-10 | Asml Netherlands B.V. | Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
US7006209B2 (en) | 2003-07-25 | 2006-02-28 | Advanced Micro Devices, Inc. | Method and apparatus for monitoring and controlling imaging in immersion lithography systems |
US7175968B2 (en) | 2003-07-28 | 2007-02-13 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and a substrate |
US7326522B2 (en) * | 2004-02-11 | 2008-02-05 | Asml Netherlands B.V. | Device manufacturing method and a substrate |
US7061578B2 (en) | 2003-08-11 | 2006-06-13 | Advanced Micro Devices, Inc. | Method and apparatus for monitoring and controlling imaging in immersion lithography systems |
US7579135B2 (en) | 2003-08-11 | 2009-08-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Lithography apparatus for manufacture of integrated circuits |
US7700267B2 (en) | 2003-08-11 | 2010-04-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Immersion fluid for immersion lithography, and method of performing immersion lithography |
US7085075B2 (en) | 2003-08-12 | 2006-08-01 | Carl Zeiss Smt Ag | Projection objectives including a plurality of mirrors with lenses ahead of mirror M3 |
US6844206B1 (en) | 2003-08-21 | 2005-01-18 | Advanced Micro Devices, Llp | Refractive index system monitor and control for immersion lithography |
US6954256B2 (en) * | 2003-08-29 | 2005-10-11 | Asml Netherlands B.V. | Gradient immersion lithography |
US7070915B2 (en) | 2003-08-29 | 2006-07-04 | Tokyo Electron Limited | Method and system for drying a substrate |
US7014966B2 (en) | 2003-09-02 | 2006-03-21 | Advanced Micro Devices, Inc. | Method and apparatus for elimination of bubbles in immersion medium in immersion lithography systems |
EP1660925B1 (en) | 2003-09-03 | 2015-04-29 | Nikon Corporation | Apparatus and method for providing fluid for immersion lithography |
JP4378136B2 (ja) | 2003-09-04 | 2009-12-02 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
JP3870182B2 (ja) * | 2003-09-09 | 2007-01-17 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
US6961186B2 (en) | 2003-09-26 | 2005-11-01 | Takumi Technology Corp. | Contact printing using a magnified mask image |
US7369217B2 (en) | 2003-10-03 | 2008-05-06 | Micronic Laser Systems Ab | Method and device for immersion lithography |
US7678527B2 (en) | 2003-10-16 | 2010-03-16 | Intel Corporation | Methods and compositions for providing photoresist with improved properties for contacting liquids |
JP2005159322A (ja) * | 2003-10-31 | 2005-06-16 | Nikon Corp | 定盤、ステージ装置及び露光装置並びに露光方法 |
EP1685446A2 (en) | 2003-11-05 | 2006-08-02 | DSM IP Assets B.V. | A method and apparatus for producing microchips |
US7924397B2 (en) | 2003-11-06 | 2011-04-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Anti-corrosion layer on objective lens for liquid immersion lithography applications |
US7545481B2 (en) * | 2003-11-24 | 2009-06-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
EP1695148B1 (en) | 2003-11-24 | 2015-10-28 | Carl Zeiss SMT GmbH | Immersion objective |
US7125652B2 (en) | 2003-12-03 | 2006-10-24 | Advanced Micro Devices, Inc. | Immersion lithographic process using a conforming immersion medium |
JP2005175016A (ja) * | 2003-12-08 | 2005-06-30 | Canon Inc | 基板保持装置およびそれを用いた露光装置ならびにデバイス製造方法 |
JP2005175034A (ja) * | 2003-12-09 | 2005-06-30 | Canon Inc | 露光装置 |
WO2005059617A2 (en) | 2003-12-15 | 2005-06-30 | Carl Zeiss Smt Ag | Projection objective having a high aperture and a planar end surface |
JP2007516613A (ja) | 2003-12-15 | 2007-06-21 | カール・ツアイス・エスエムテイ・アーゲー | 少なくとも1つの液体レンズを備えるマイクロリソグラフィー投影対物レンズとしての対物レンズ |
US20050185269A1 (en) | 2003-12-19 | 2005-08-25 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
US7460206B2 (en) | 2003-12-19 | 2008-12-02 | Carl Zeiss Smt Ag | Projection objective for immersion lithography |
JP5102492B2 (ja) | 2003-12-19 | 2012-12-19 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 結晶素子を有するマイクロリソグラフィー投影用対物レンズ |
US7589818B2 (en) * | 2003-12-23 | 2009-09-15 | Asml Netherlands B.V. | Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus |
US7394521B2 (en) * | 2003-12-23 | 2008-07-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7119884B2 (en) | 2003-12-24 | 2006-10-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2005191393A (ja) | 2003-12-26 | 2005-07-14 | Canon Inc | 露光方法及び装置 |
JP2005191381A (ja) * | 2003-12-26 | 2005-07-14 | Canon Inc | 露光方法及び装置 |
US20050147920A1 (en) | 2003-12-30 | 2005-07-07 | Chia-Hui Lin | Method and system for immersion lithography |
US7088422B2 (en) | 2003-12-31 | 2006-08-08 | International Business Machines Corporation | Moving lens for immersion optical lithography |
JP4371822B2 (ja) | 2004-01-06 | 2009-11-25 | キヤノン株式会社 | 露光装置 |
JP4429023B2 (ja) | 2004-01-07 | 2010-03-10 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
US20050153424A1 (en) | 2004-01-08 | 2005-07-14 | Derek Coon | Fluid barrier with transparent areas for immersion lithography |
CN102830487A (zh) | 2004-01-14 | 2012-12-19 | 卡尔蔡司Smt有限责任公司 | 反射折射投影物镜 |
CN101793993B (zh) | 2004-01-16 | 2013-04-03 | 卡尔蔡司Smt有限责任公司 | 光学元件、光学布置及系统 |
WO2005069078A1 (en) | 2004-01-19 | 2005-07-28 | Carl Zeiss Smt Ag | Microlithographic projection exposure apparatus with immersion projection lens |
WO2005071491A2 (en) | 2004-01-20 | 2005-08-04 | Carl Zeiss Smt Ag | Exposure apparatus and measuring device for a projection lens |
US7026259B2 (en) | 2004-01-21 | 2006-04-11 | International Business Machines Corporation | Liquid-filled balloons for immersion lithography |
US7391501B2 (en) | 2004-01-22 | 2008-06-24 | Intel Corporation | Immersion liquids with siloxane polymer for immersion lithography |
WO2005074606A2 (en) | 2004-02-03 | 2005-08-18 | Rochester Institute Of Technology | Method of photolithography using a fluid and a system thereof |
US7050146B2 (en) * | 2004-02-09 | 2006-05-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
WO2005076084A1 (en) | 2004-02-09 | 2005-08-18 | Carl Zeiss Smt Ag | Projection objective for a microlithographic projection exposure apparatus |
JP4018647B2 (ja) | 2004-02-09 | 2007-12-05 | キヤノン株式会社 | 投影露光装置およびデバイス製造方法 |
EP1714192A1 (en) | 2004-02-13 | 2006-10-25 | Carl Zeiss SMT AG | Projection objective for a microlithographic projection exposure apparatus |
CN1922528A (zh) | 2004-02-18 | 2007-02-28 | 康宁股份有限公司 | 用于具有深紫外光的高数值孔径成象的反折射成象系统 |
US20050205108A1 (en) | 2004-03-16 | 2005-09-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and system for immersion lithography lens cleaning |
US7027125B2 (en) | 2004-03-25 | 2006-04-11 | International Business Machines Corporation | System and apparatus for photolithography |
US7084960B2 (en) | 2004-03-29 | 2006-08-01 | Intel Corporation | Lithography using controlled polarization |
JP2005286068A (ja) | 2004-03-29 | 2005-10-13 | Canon Inc | 露光装置及び方法 |
JP4510494B2 (ja) | 2004-03-29 | 2010-07-21 | キヤノン株式会社 | 露光装置 |
KR101227290B1 (ko) | 2004-06-09 | 2013-01-29 | 가부시키가이샤 니콘 | 기판 유지 장치 및 그것을 구비하는 노광 장치, 노광 방법,디바이스 제조 방법, 그리고 발액 플레이트 |
US7057702B2 (en) | 2004-06-23 | 2006-06-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7304715B2 (en) * | 2004-08-13 | 2007-12-04 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7701550B2 (en) * | 2004-08-19 | 2010-04-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7522261B2 (en) * | 2004-09-24 | 2009-04-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7532310B2 (en) * | 2004-10-22 | 2009-05-12 | Asml Netherlands B.V. | Apparatus, method for supporting and/or thermally conditioning a substrate, a support table, and a chuck |
US7411657B2 (en) | 2004-11-17 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
SG124359A1 (en) | 2005-01-14 | 2006-08-30 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
JP4262252B2 (ja) | 2005-03-02 | 2009-05-13 | キヤノン株式会社 | 露光装置 |
US7411654B2 (en) * | 2005-04-05 | 2008-08-12 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7834974B2 (en) * | 2005-06-28 | 2010-11-16 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7474379B2 (en) | 2005-06-28 | 2009-01-06 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7760324B2 (en) | 2006-03-20 | 2010-07-20 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
NL1036835A1 (nl) | 2008-05-08 | 2009-11-11 | Asml Netherlands Bv | Lithographic Apparatus and Method. |
-
2003
- 2003-11-11 SG SG200600228-1A patent/SG135052A1/en unknown
- 2003-11-11 TW TW092131527A patent/TWI232357B/zh not_active IP Right Cessation
- 2003-11-11 JP JP2003417259A patent/JP3977324B2/ja not_active Expired - Fee Related
- 2003-11-11 KR KR1020030079336A patent/KR100585476B1/ko active IP Right Grant
- 2003-11-11 SG SG200306755A patent/SG121818A1/en unknown
- 2003-11-11 SG SG2010050110A patent/SG2010050110A/en unknown
- 2003-11-11 CN CNB2003101209571A patent/CN100470367C/zh not_active Expired - Lifetime
- 2003-11-12 US US10/705,783 patent/US6952253B2/en not_active Expired - Lifetime
-
2005
- 2005-09-30 US US11/239,493 patent/US7388648B2/en not_active Expired - Lifetime
-
2007
- 2007-02-19 JP JP2007038065A patent/JP4567013B2/ja not_active Expired - Fee Related
-
2008
- 2008-04-09 US US12/078,997 patent/US8208120B2/en not_active Expired - Fee Related
- 2008-05-15 US US12/153,276 patent/US7982850B2/en not_active Expired - Fee Related
-
2010
- 2010-03-16 JP JP2010059726A patent/JP5017403B2/ja not_active Expired - Fee Related
-
2011
- 2011-05-31 US US13/149,404 patent/US8797503B2/en not_active Expired - Fee Related
- 2011-12-22 JP JP2011281445A patent/JP5480880B2/ja not_active Expired - Fee Related
-
2012
- 2012-12-20 US US13/722,830 patent/US9091940B2/en not_active Expired - Fee Related
-
2015
- 2015-06-18 US US14/743,775 patent/US10222706B2/en not_active Expired - Fee Related
-
2019
- 2019-02-27 US US16/286,885 patent/US10620545B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US10620545B2 (en) | 2020-04-14 |
US10222706B2 (en) | 2019-03-05 |
US20130301017A1 (en) | 2013-11-14 |
CN100470367C (zh) | 2009-03-18 |
US20060023189A1 (en) | 2006-02-02 |
SG2010050110A (en) | 2014-06-27 |
US20110228241A1 (en) | 2011-09-22 |
JP2004289126A (ja) | 2004-10-14 |
JP2012064979A (ja) | 2012-03-29 |
JP4567013B2 (ja) | 2010-10-20 |
KR100585476B1 (ko) | 2006-06-07 |
JP5480880B2 (ja) | 2014-04-23 |
CN1501173A (zh) | 2004-06-02 |
TWI232357B (en) | 2005-05-11 |
US20190265596A1 (en) | 2019-08-29 |
US8797503B2 (en) | 2014-08-05 |
US9091940B2 (en) | 2015-07-28 |
JP5017403B2 (ja) | 2012-09-05 |
SG121818A1 (en) | 2006-05-26 |
US20090002652A1 (en) | 2009-01-01 |
TW200426521A (en) | 2004-12-01 |
US20080218726A1 (en) | 2008-09-11 |
US7982850B2 (en) | 2011-07-19 |
US8208120B2 (en) | 2012-06-26 |
US20150362844A1 (en) | 2015-12-17 |
JP2007142460A (ja) | 2007-06-07 |
US20040207824A1 (en) | 2004-10-21 |
SG135052A1 (en) | 2007-09-28 |
KR20040044119A (ko) | 2004-05-27 |
US7388648B2 (en) | 2008-06-17 |
US6952253B2 (en) | 2005-10-04 |
JP2010135857A (ja) | 2010-06-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3977324B2 (ja) | リソグラフィ装置 | |
US11789369B2 (en) | Lithographic apparatus and device manufacturing method | |
US10768536B2 (en) | Lithographic apparatus and device manufacturing method | |
US7372541B2 (en) | Lithographic apparatus and device manufacturing method | |
EP2495613B1 (en) | Lithographic apparatus | |
TWI394011B (zh) | 微影裝置及器件製造方法 | |
US20080057440A1 (en) | Lithographic apparatus and device manufacturing method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20060904 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20061213 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20061218 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070219 |
|
RD05 | Notification of revocation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7425 Effective date: 20070313 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070510 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20070613 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20070620 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100629 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 3977324 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20100629 Year of fee payment: 3 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20110629 Year of fee payment: 4 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
S802 | Written request for registration of partial abandonment of right |
Free format text: JAPANESE INTERMEDIATE CODE: R311802 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120629 Year of fee payment: 5 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130629 Year of fee payment: 6 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |