JPS62121417A - 液浸対物レンズ装置 - Google Patents

液浸対物レンズ装置

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Publication number
JPS62121417A
JPS62121417A JP26101885A JP26101885A JPS62121417A JP S62121417 A JPS62121417 A JP S62121417A JP 26101885 A JP26101885 A JP 26101885A JP 26101885 A JP26101885 A JP 26101885A JP S62121417 A JPS62121417 A JP S62121417A
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Japan
Prior art keywords
objective lens
sample
observed
medium
oil film
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English (en)
Inventor
Koji Nakazawa
中沢 宏治
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Hitachi Ltd
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Hitachi Ltd
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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、′/VL浸対物レンズ装置に係り、液体媒体
の流動を防止するのに好適な液浸対物レンズ装置に関す
るものである。
〔発明の背景〕
顕微鏡観察によりICパターンや磁気ヘッド等の微細な
寸法形状を01μm オーダの高精度で測定する場合、
乾燥系対物レンズよりも液浸対物レンズの方が解像力が
良いため有利となるが、液浸対物レンズでは、対物レン
ズと被観察試料(以下単に試料という)との間に油膜な
ど液体媒体を介在させることが必要になる。
従来の液浸対物レンズ装置による観察について第9図お
よび第10図を診照して説明する。
第9図は、従来の液浸対物レンズ装置の断面図、第10
図は、第9図の装置による試料の端部観察状態を示す説
明図である。
従来の液浸対物レンズ装置では、第9図に示すように、
対物レンズ4の先端に油などの液体媒体2t−塗布して
試料1を観察するようになっている。
液体媒体2の屈折率を34とすると、対物レンズの性能
を表わす開口数NAは次式で与えられる。
NA=ル 自ttルθ    ・・・・・・・・・・−
・filA       I ただし、θ1は光軸上の物点Oから対物レンズ4に入射
する角度の最大値である。
ところで、顕微鏡の分解能εは、使用する光の波長をλ
として、 t=f、” NA    (K:定数)・川・・四・・(2)で与え
られる。
液浸対物レンズでは、液体媒体2の屈折率か^が、乾燥
系対物レンズにおける突気の屈折率ル。
#1にくらべて大きく、a、)rL、となるので、対物
レンズの分解能εは液浸系の方が乾燥系よシも優れてい
る。そこで、サブミクロン・オーダの微細な寸法形状を
顕微鏡観察する場合、液浸対物レンズの方が高精度な汲
察が可能となる。
例えば、上式でK # 0.6 、λ= o、saμm
とし、100×対物レンズにおける」請θ、=0.93
とすると、市販されている顕微鏡用の油の屈折率−=1
.5であるから、ε: Q、25μmの分解能が油浸対
物レンズにおいて得られるが、乾燥系対物レンズでは、
ε:137μmとなる。
試料上の観察点が試料の平面内にある場合は、液浸対物
レンズを使う上で問題は生じないが、第10図に示すご
とく、試料1の周辺部や端部を観察する場合は、液体媒
体2の油膜が流出してしまい、液浸観察が不可能となる
。ここで100×対物レンズの場合、−例として、作動
距離d= 0.23 M程度である。
なお、上記の顕微鏡の分解能や対物レンズの種類等に関
しては、例えば、筒井他2名、応用工学概論、金属出版
(昭和舗年2月)、P、87に記載されている。
〔発明の目的〕
本発明は、前述の従来技術の問題点を解決するためにな
されたもので、試料端部や周辺部を顕微鏡観最する場合
でも、対物レンズ先端と試料との間に介在する液体媒体
が流出することなく、高分解能の観察を可能にする液浸
対物レンズ装置の提供を、その目的としている。
〔発明の概要〕
本発明に係るg浸対物レンズ装置の構成は、対物レンズ
先端と被観察試料との間に、少なくとも液体の媒体を介
在させる液浸対物レンズ装置において、前記対物レンズ
先端と前記被観察試料との間に介在させる媒体を、複数
の異質の媒体で層状に積層したものである。
なお、付記すると、対物レンズ先端と被観察試料との間
に介在させる媒体は、液体媒体中に、透明な固体により
形成された中間媒体を介入させ層状に積層するものとし
、前記液体媒体は油とし、少なくとも中間媒体と被観察
試料との間に表面張力を発生する油膜を形成せしめたも
のである。
すなわち、本発明では、液浸対物レンズの作動距離を見
かけ上小さくし、試料上の油膜厚さを減少させることに
より油膜の流出を防止している。
また、使用する液体媒体の油の粘度を大きくすることに
よシ油膜の流動を防止している。その結果、試料の端部
や周辺部についても、液浸対物レンズによシ高精度な観
察を可能にしたものである。
〔発明の実施例〕
以下、本発明の各実施例を第1図ないし第8図を参照し
て説明する。
まず、第1図は、本発明の一実施例に係る液浸対物レン
ズ装置による試料端部観察状況を示す構成図、第2図は
、本発明の他の実施例に係る液浸対物レンズ装置による
開口数の改善を示す構成図である。
なお、各図において、第9図と同一符号のものは従来技
術と同等部分を示しており、対物レンズ4は外形を示し
ているが、その内容は第9図に示したレンズ構成と同じ
ものである。
第1図において、2−1.2−2は、対物レンズ4先端
と被観察試料(以下単に試料という)1との間に介在さ
せる液体媒体に係る油による油膜を示す。3は、液体媒
体中の中間媒体を構成する薄い平板状の透明な板ガラス
である。
このようK、本実施例では、油膜2−1.板ガラス6、
油膜2−2が層状に積層して媒体を形成している。
その装置の構成の仕方と作用を説明する。
まず、板ガラス3を油膜2−2によシ対物レンズ4に付
着させておく。一方、試料1の表面に油膜2−1を滴下
しておき、前記対物レンズ4を合焦点位置まで近づける
と、油膜2−1は中間媒体である透明ガラス3に付着す
る。このとき、油膜2−1の厚さは十分に薄くなってい
るので、油膜の表面張力により第1図のように油膜が保
持され、試料1の端部から流出することを防止できる。
したがって、従来の油浸観察では、油が流出して観察で
きなかった試料1の端部2点近傍を油浸観察することが
可能である。
一例として、対物レンズ4の作動距離を0.23襲とし
、板ガラス3をQ、Q9mの板厚にすると、油膜2−1
.2−2は、各々0.07 m程度の薄さとなる。また
、対物レンズ4先端の油膜と接する直径は、例えば5M
で、板ガラス3の直径はこれより多少大きめに作ること
ができる。
油膜2−1.2−2の屈折率は異なる値をもつように別
々の油を用いることもできるが、一般的には同一の油を
用いて同じ屈折率とすることができ、例えば屈折率ル、
=15である。また、板ガラス6の屈折率は通常は上記
油の屈折率と同一になるような材質を選ぶことができる
が、別の屈折率とすることもできる。
油1[2−1,2−2および板ガラス5の屈折率をみな
同一のζ=1.5とした場合には、光学的には、第9図
に示した従来の油浸対物レンズ装置と全く同じになり、
だだ板ガラス5が油膜の形状を保持しているという点の
みが異なる。
油膜と板ガラスの屈折率を異ならせた他の実施例が第2
図に示すものである。
第2図の液浸対物レンズ装置では、油膜2−1の屈折率
を相対的に大きく、例えばn A =16とし、板ガラ
ス6′の屈折率を小さく、例えばル=t45とする。
このように、屈折率を調整することによシ、対物レンズ
4に対する最大入射角は、第9図に示したと同じθ1に
しながら、試料1表面の光軸上の観察点Oから対物レン
ズ4に向う光の光軸となす最大角度θ、を、θ、〉θ1
と大きくすることにより、先に+11式で示した開口数
HAを従来よシ大きくでき、対物レンズの分解能を従来
よシ向上させることができる。
なお、前述の第1.2図の液浸対物レンズ装置において
、板ガラス3.3′を対物レンズ4の先端に吸着または
吸着可能にすることKよシ、油膜2−2は省くことがで
きる。
また、板ガラス3を、試料1の上に密着してのせること
を可能にすることによシ、油膜2−1を省くことができ
る。
さらに、特殊な例として、油膜2−1に、例えば粘性の
高い油を用いることができれば、板ガラス3を用いるこ
となく、油膜2−2を油膜2−1の上に直接積層するこ
とが可能である。
このとき、対物レンズ4の作動距離をdとして、油膜2
−2の厚さは0〜dの間で可変であり、これに対応して
油膜2−1の厚さはd〜0の間で可変である。
また、さらに特殊な例として、第2図に示した層状に積
層された複数の媒体、すなわち油膜2−1.2−2、板
ガラス3′の各層のうちの一層を、空気層または真窒層
(屈折率ル=1)とすることも可能である。
例えば、試料1に接する油膜2−1に相当する層に、屈
折率の非常に高い物質(例えばかミ2)を使い、板ガラ
ス3′に相当する層を空気層として、各層の厚さを調整
すれば、対物レンズに対する最大入射角θ、を従来と等
しくすることが可能である。
なお、第1図に示すように、試料1の表面に透明な保護
膜1−1が形成されていて、この保護膜1−1を通して
素子1−2の表面、例えばq点を観察するような場合も
ある。
このような場合は、保護膜1−1の膜厚を十分厚く形成
することによシ油膜部の厚さを薄くして油膜の流出を防
止することができ、板ガラス3を用いずに油浸観察を行
うことも可能である。
ところで、第1図に示すように、試料1の端部、周辺部
を観察する液浸対物レンズ装置の構成では、試料1を対
物レンズ4から遠ざけた場合、板ガラス3は、油膜の接
触面積の大きい対物レンズ4側に付着するので都合がよ
い。
しかるに、試料1の端部、周辺部を観察する第1図の場
合と違って、試料1の中央平面部を観察する第2図の例
では、板ガラス3の上下面の油膜接触面積はほぼ等しい
ので、試料1を対物レンズ4から遠ざけた場合、板ガラ
ス6が、対物レンズ4と試料1とのどちら側に付着して
残るかは一層に決まらず、試料の場所を変えて観察を継
続するのに作業性が悪くなる。
そこで、これを改善した液浸対物レンズ装置が第3図に
示すものである。
第3図は、本発明のさらに他の実施例に係る液浸対物レ
ンズ装置の構成図であシ、図中、第1図と同一符号のも
のは、同等部分であるから、その説明を省略する。
第3図に示す実施例は、液体媒体に係る油膜2−1.2
−2間K、中間媒体に係る透明な板ガラス3が介入され
ておシ、この板ガラス3はリング6に固定されている。
このリング6は、対物レンズ4の外周面に、上下方向に
特定範囲を摺動できるように装備されている。5は、リ
ング6が対物レンズ4から抜けるのを防止するストッパ
である。
リング6の内側は油膜2−2で満たされておシ、リング
6の上下動によシ板ガラス3と対物レンズ4先端との間
の油膜が途切れることがないように構成されている。
このように、中間媒体に係る板ガラス6を対物レンズ4
側に拘束することにより、第1.2図に示したような油
浸観察の作業性が著しく向上する。
次に、本発明のさらに他の実施例を第4図を参照して説
明する。
第4図は、本発明のさらに他の実施例に係る液浸対物レ
ンズ装置の構成図で、図中、第2図と同一符号のものは
同等部分であるから、その説明を省略する。
前述の第1図ないし第3図の装置では、中間媒体は平面
状の板ガラスを用いたものであるが、第4図の例は、油
膜中の中間媒体に、球面状または非平面状の板ガラス5
Aを用いたものである。
本実施例によれば、先の実施例と同様の効果が期待され
るほか、中間媒体の介入によって生じる球面収差を改善
することも可能である。
次に、液浸対物レンズ装置による観察の具体例を第5図
ないし第8図を参照して説明する。
第5図は、第1図の装置による油浸観察例を拡大して示
す説明図、第5図は、その顕微鏡観察像、第7図は、第
5図のL −L/面上の輝度信号線図、第8図は、TV
モニタ付き顕微鏡装置の構成図である。
第5図に示す油浸観察では、試料1は、表面に透明の保
護膜1−1が形成されたもので、素子1−2端部のパタ
ーン寸法形状を観察するものである。
素子1−2は、特定の点α、端部す1段差部Cで示され
る形状を有している。
素子1−2上の端部近傍の特定の点αに矢印のように入
射して反射した元は、保護膜1−1の端面MN上で全反
射し、矢印のように対物レンズ4に戻るため鏡像α′を
形成する。
このように、保護膜1−1の端面KNで全反射させるた
めには、保護膜1−1の屈折率を油膜2−1の屈折率よ
り大きくしなければいけない。例えば、油膜2−1の屈
折率−を15とし、保護膜1−1の屈折率町を163と
すれば、上記のように全反射するための臨界角は67’
となる。
このような油浸観察を行うTVモニタ付顕微鏡装置の構
成を第8図に示す。
第8図において、1は試料、4は、顕微鏡の対物レンズ
で、液浸対物レンズ装置を構成している。7は、顕微鏡
の鏡筒、8は、顕微鏡に搭載したTVカメラ、9は信号
処理回路、1oは、モニタ用のディスプレイ装置である
第5図に示すように、液浸対物レンズ装置で観察したと
きの、顕微鏡像は第5図に示すようになり、実線の実像
パターンに対応して、破線の鏡像パターンが観察される
いま、第8図に示したように、液浸対物レンズ装置を備
えた顕微鏡にTVカメラ8を搭載し、顕微鏡画儂をディ
スプレイ装置lO上に撮し出すと、第5図のL −L’
断面上の輝度信号は、第7図に示すようになり、実像と
鏡像の境界上のb点と、パターン段差部C点は暗いため
同図のように落ち込んだ波形形状となる。
したがってb −c間の距離りを、乾燥系対物レンズで
は観察することのできなかった0、1μ篤オーダの微細
な寸法まで、高精度に測定することができる。
〔発明の効果〕
以上述べたように、本発明によれば、試料端部や周辺部
を顕微鏡観察する場合でも、対物レンズ先端と試料との
間に介在する液体媒体が流出することなく、高分解能の
観察を可能にする液浸対物レンズ装置を提供することが
できる。
【図面の簡単な説明】
第1図は、本発明の一実施例に係る液浸対物レンズ装置
による試料端部観測状況を示す構成図、第2図は、本発
明の他の実施例に係る液浸対物レンズ装置による開口数
の改善を示す構成図、第3図は、本発明のさらに他の実
施例に係る液浸対物レンズ装置の構成図、第4図は、本
発明のさらに他の実施例に係るg、浸対物レンズ装置の
構成図、第5図は、第1図の装置による油浸観察例を拡
大して示す説明図、第5図は、その顕微鏡観察保、第7
図は、第5図のL −L’圃面上輝度信号線図、第8図
は、TVモニタ付き題微鏡装置の構成図、第9図は、従
来の液浸対物レンズ装置の断面図、第10図は、第9図
の装置による試料の端部観察状態を示す説明図である。 1・・・試料       2−1.2−2・・・油膜
4f理人#押+  /1)Ill  R胴線 1 図 第3 図 M4 図 85図 第5図 第 7 図 第8図 第 9 図

Claims (1)

  1. 【特許請求の範囲】 1、対物レンズ先端と被観察試料との間に、少なくとも
    液体の媒体を介在させる液浸対物レンズ装置において、
    前記対物レンズ先端と前記被観察試料との間に介在させ
    る媒体を、複数の異質の媒体で層状に積層したことを特
    徴とする液浸対物レンズ装置。 2、特許請求の範囲第1項記載のものにおいて、対物レ
    ンズ先端と被観察試料との間に介在させる媒体を、屈折
    率の異なる複数の媒体で層状に積層したものである液浸
    対物レンズ装置。 3、特許請求の範囲第1項または第2項記載のもののい
    ずれかにおいて、対物レンズ先端と被観察試料との間に
    介在させる媒体は、液体媒体中に、透明な固体により形
    成された中間媒体を介入させ層状に積層するものとし、
    前記液体媒体は油とし、少なくとも中間媒体と被観察諸
    料との間に表面張力を発生する油膜を形成せしめたもの
    である液浸対物レンズ装置。 4、特許請求の範囲第3項記載のものにおいて、液体媒
    体中の中間媒体を透明な平面状の板ガラスとしたもので
    ある液浸対物レンズ装置。 5、特許請求の範囲第5項記載のものにおいて、液体媒
    体中の中間媒体を透明な非平面状の板ガラスとしたもの
    である液浸対物レンズ装置。 6、特許請求の範囲第3項記載のものにおいて、液体媒
    体中の中間媒体を透明な板ガラスとし、この板ガラスを
    リングに固定し、このリングを対物レンズ先端部の外周
    に、特定範囲を摺動可能に装備したものである涎浸対物
    レンズ装置。
JP26101885A 1985-11-22 1985-11-22 液浸対物レンズ装置 Pending JPS62121417A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26101885A JPS62121417A (ja) 1985-11-22 1985-11-22 液浸対物レンズ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26101885A JPS62121417A (ja) 1985-11-22 1985-11-22 液浸対物レンズ装置

Publications (1)

Publication Number Publication Date
JPS62121417A true JPS62121417A (ja) 1987-06-02

Family

ID=17355905

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Application Number Title Priority Date Filing Date
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Country Link
JP (1) JPS62121417A (ja)

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JP2014168068A (ja) * 2007-03-15 2014-09-11 Nikon Corp 液浸リソグラフィマシンにおける基板交換の間に、液浸流体を光学アセンブリに隣接して保持する装置および方法
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JP2012054572A (ja) * 2007-12-03 2012-03-15 Asml Netherlands Bv リソグラフィ装置、及びデバイス製造方法
JP2009141356A (ja) * 2007-12-03 2009-06-25 Asml Netherlands Bv リソグラフィ装置、及びデバイス製造方法
JP2009200492A (ja) * 2008-02-19 2009-09-03 Asml Netherlands Bv リソグラフィ装置及び方法
JP2013519909A (ja) * 2010-02-12 2013-05-30 ライカ マイクロシステムス ツェーエムエス ゲーエムベーハー 対象物を走査する装置とその方法および顕微鏡
US9846372B2 (en) 2010-04-22 2017-12-19 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
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US10620544B2 (en) 2010-04-22 2020-04-14 Asml Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
JP2015072230A (ja) * 2013-10-04 2015-04-16 三菱電機株式会社 半導体装置の発熱解析方法及び発熱解析装置
WO2016017049A1 (ja) * 2014-07-30 2016-02-04 パナソニックIpマネジメント株式会社 保護部材
JP5938702B1 (ja) * 2014-07-30 2016-06-22 パナソニックIpマネジメント株式会社 保護部材
US9500861B2 (en) 2014-07-30 2016-11-22 Panasonic Intellectual Property Management Co., Ltd. Protective member and method for using protective member
CN113237726A (zh) * 2021-05-18 2021-08-10 青岛泰睿思微电子有限公司 半导体器件开封样品的观察方法

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