NL2002983A1 - A lithographic apparatus and a method of operating the lithographic apparatus. - Google Patents

A lithographic apparatus and a method of operating the lithographic apparatus.

Info

Publication number
NL2002983A1
NL2002983A1 NL2002983A NL2002983A NL2002983A1 NL 2002983 A1 NL2002983 A1 NL 2002983A1 NL 2002983 A NL2002983 A NL 2002983A NL 2002983 A NL2002983 A NL 2002983A NL 2002983 A1 NL2002983 A1 NL 2002983A1
Authority
NL
Netherlands
Prior art keywords
lithographic apparatus
operating
lithographic
Prior art date
Application number
NL2002983A
Other languages
English (en)
Inventor
Edwin Kadijk
Stefan Kruijswijk
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2002983A1 publication Critical patent/NL2002983A1/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
NL2002983A 2008-06-26 2009-06-08 A lithographic apparatus and a method of operating the lithographic apparatus. NL2002983A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12944508P 2008-06-26 2008-06-26

Publications (1)

Publication Number Publication Date
NL2002983A1 true NL2002983A1 (nl) 2009-12-29

Family

ID=41446992

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2002983A NL2002983A1 (nl) 2008-06-26 2009-06-08 A lithographic apparatus and a method of operating the lithographic apparatus.

Country Status (3)

Country Link
US (1) US8441609B2 (nl)
JP (1) JP4990327B2 (nl)
NL (1) NL2002983A1 (nl)

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4509852A (en) * 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
EP1420299B1 (en) 2002-11-12 2011-01-05 ASML Netherlands B.V. Immersion lithographic apparatus and device manufacturing method
KR100585476B1 (ko) * 2002-11-12 2006-06-07 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조방법
SG121822A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
EP1420300B1 (en) 2002-11-12 2015-07-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP3104396B1 (en) * 2003-06-13 2018-03-21 Nikon Corporation Exposure method, substrate stage, exposure apparatus, and device manufacturing method
US7394521B2 (en) 2003-12-23 2008-07-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4220423B2 (ja) * 2004-03-24 2009-02-04 株式会社東芝 レジストパターン形成方法
JP2006019623A (ja) * 2004-07-05 2006-01-19 Toshiba Corp 半導体ウェハ
US7701550B2 (en) * 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7133114B2 (en) * 2004-09-20 2006-11-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4625673B2 (ja) * 2004-10-15 2011-02-02 株式会社東芝 露光方法及び露光装置
US7397533B2 (en) * 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG124359A1 (en) * 2005-01-14 2006-08-30 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7433016B2 (en) * 2005-05-03 2008-10-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7468779B2 (en) * 2005-06-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JPWO2007080779A1 (ja) * 2006-01-12 2009-06-11 株式会社ニコン 物体搬送装置、露光装置、物体温調装置、物体搬送方法、及びマイクロデバイスの製造方法
JP4784860B2 (ja) * 2006-01-31 2011-10-05 株式会社ニコン 処理装置及び処理方法、並びに露光装置
US7310132B2 (en) * 2006-03-17 2007-12-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
US8441609B2 (en) 2013-05-14
JP2010010677A (ja) 2010-01-14
JP4990327B2 (ja) 2012-08-01
US20090323045A1 (en) 2009-12-31

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