NL2002016A1 - Exposure apparatus and method for photolithography process. - Google Patents
Exposure apparatus and method for photolithography process.Info
- Publication number
- NL2002016A1 NL2002016A1 NL2002016A NL2002016A NL2002016A1 NL 2002016 A1 NL2002016 A1 NL 2002016A1 NL 2002016 A NL2002016 A NL 2002016A NL 2002016 A NL2002016 A NL 2002016A NL 2002016 A1 NL2002016 A1 NL 2002016A1
- Authority
- NL
- Netherlands
- Prior art keywords
- exposure apparatus
- photolithography process
- photolithography
- exposure
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70641—Focus
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US87547107 | 2007-10-19 | ||
US11/875,471 US8098364B2 (en) | 2007-10-19 | 2007-10-19 | Exposure apparatus and method for photolithography process |
Publications (2)
Publication Number | Publication Date |
---|---|
NL2002016A1 true NL2002016A1 (nl) | 2009-04-21 |
NL2002016C2 NL2002016C2 (en) | 2011-03-01 |
Family
ID=40563170
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
NL2002016A NL2002016C2 (en) | 2007-10-19 | 2008-09-25 | Exposure apparatus and method for photolithography process. |
Country Status (3)
Country | Link |
---|---|
US (2) | US8098364B2 (nl) |
CN (1) | CN101414131B (nl) |
NL (1) | NL2002016C2 (nl) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9793247B2 (en) * | 2005-01-10 | 2017-10-17 | Cree, Inc. | Solid state lighting component |
US7821023B2 (en) * | 2005-01-10 | 2010-10-26 | Cree, Inc. | Solid state lighting component |
US9070850B2 (en) | 2007-10-31 | 2015-06-30 | Cree, Inc. | Light emitting diode package and method for fabricating same |
US9335006B2 (en) * | 2006-04-18 | 2016-05-10 | Cree, Inc. | Saturated yellow phosphor converted LED and blue converted red LED |
US10295147B2 (en) * | 2006-11-09 | 2019-05-21 | Cree, Inc. | LED array and method for fabricating same |
US8098364B2 (en) * | 2007-10-19 | 2012-01-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Exposure apparatus and method for photolithography process |
US9425172B2 (en) * | 2008-10-24 | 2016-08-23 | Cree, Inc. | Light emitter array |
US9786811B2 (en) | 2011-02-04 | 2017-10-10 | Cree, Inc. | Tilted emission LED array |
US10842016B2 (en) | 2011-07-06 | 2020-11-17 | Cree, Inc. | Compact optically efficient solid state light source with integrated thermal management |
WO2016061098A1 (en) * | 2014-10-14 | 2016-04-21 | Covaris, Inc. | Acoustic energy mediation of genetic fragmentation |
US10274830B2 (en) | 2016-01-27 | 2019-04-30 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method and apparatus for dynamic lithographic exposure |
DE102017100340B4 (de) | 2016-01-27 | 2021-04-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | Verfahren zum Entwickeln eines lichtempfindlichen Materials und Fotolithografiewerkzeug |
SG11201908444RA (en) * | 2017-03-15 | 2019-10-30 | Callaghan Innovation | Apparatus for and method of manufacturing an article using photolithography and a photoresist |
US10775706B2 (en) * | 2018-09-27 | 2020-09-15 | Taiwan Semiconductor Manufacturing Co., Ltd. | Lithography apparatus and method using the same |
DE102020201097B4 (de) * | 2020-01-30 | 2023-02-16 | Carl Zeiss Industrielle Messtechnik Gmbh | Anordnung und Verfahren zur optischen Objektkoordinatenermittlung |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4474463A (en) * | 1982-08-30 | 1984-10-02 | Tre Semiconductor Equipment Corporation | Mixer coupling lens subassembly for photolithographic system |
JPH0740090B2 (ja) * | 1986-12-26 | 1995-05-01 | キヤノン株式会社 | 可変焦点光学素子 |
KR100358422B1 (ko) * | 1993-09-14 | 2003-01-24 | 가부시키가이샤 니콘 | 플래인위치결정장치,주사형노광장치,주사노광방법및소자제조방법 |
JP3162909B2 (ja) * | 1994-04-14 | 2001-05-08 | 株式会社リコー | 光ビーム走査装置 |
US6387597B1 (en) * | 1998-06-05 | 2002-05-14 | Creo Srl | Method for exposing features on non-planar resists |
US6304316B1 (en) * | 1998-10-22 | 2001-10-16 | Anvik Corporation | Microlithography system for high-resolution large-area patterning on curved surfaces |
JP4429447B2 (ja) * | 2000-01-12 | 2010-03-10 | 浜松ホトニクス株式会社 | ストリーク装置 |
JP2002050562A (ja) * | 2000-08-03 | 2002-02-15 | Mitsubishi Electric Corp | 半導体製造装置、半導体装置の製造方法、及び半導体装置 |
JP4089177B2 (ja) * | 2000-10-25 | 2008-05-28 | 株式会社日立製作所 | 光ディスク装置及び層間ジャンプ方法 |
CN100555086C (zh) * | 2003-01-14 | 2009-10-28 | Asml荷兰有限公司 | 用于光刻装置的水平传感器 |
EP1482373A1 (en) * | 2003-05-30 | 2004-12-01 | ASML Netherlands B.V. | Lithographic apparatus and device manufacturing method |
JP2005092175A (ja) * | 2003-08-08 | 2005-04-07 | Olympus Corp | 光学特性可変光学素子 |
US7567340B2 (en) * | 2006-09-29 | 2009-07-28 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8098364B2 (en) * | 2007-10-19 | 2012-01-17 | Taiwan Semiconductor Manufacturing Company, Ltd. | Exposure apparatus and method for photolithography process |
-
2007
- 2007-10-19 US US11/875,471 patent/US8098364B2/en not_active Expired - Fee Related
-
2008
- 2008-09-25 NL NL2002016A patent/NL2002016C2/en active Search and Examination
- 2008-10-17 CN CN2008101705150A patent/CN101414131B/zh not_active Expired - Fee Related
-
2011
- 2011-12-14 US US13/325,199 patent/US20120082940A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
NL2002016C2 (en) | 2011-03-01 |
US20090103068A1 (en) | 2009-04-23 |
CN101414131A (zh) | 2009-04-22 |
CN101414131B (zh) | 2013-01-02 |
US20120082940A1 (en) | 2012-04-05 |
US8098364B2 (en) | 2012-01-17 |
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AD1A | A request for search or an international type search has been filed |