DK2496989T3 - Fremgangsmåde og indretning til nanotryknings-litografi - Google Patents

Fremgangsmåde og indretning til nanotryknings-litografi

Info

Publication number
DK2496989T3
DK2496989T3 DK10773564.9T DK10773564T DK2496989T3 DK 2496989 T3 DK2496989 T3 DK 2496989T3 DK 10773564 T DK10773564 T DK 10773564T DK 2496989 T3 DK2496989 T3 DK 2496989T3
Authority
DK
Denmark
Prior art keywords
nanoprint lithography
nanoprint
lithography
Prior art date
Application number
DK10773564.9T
Other languages
English (en)
Inventor
Tobias Hedegaard
Kristian Smistrup
Ole Hansen
Original Assignee
Univ Danmarks Tekniske
Nil Technology Aps
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Danmarks Tekniske, Nil Technology Aps filed Critical Univ Danmarks Tekniske
Application granted granted Critical
Publication of DK2496989T3 publication Critical patent/DK2496989T3/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
DK10773564.9T 2009-11-02 2010-11-02 Fremgangsmåde og indretning til nanotryknings-litografi DK2496989T3 (da)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US25718509P 2009-11-02 2009-11-02
EP09174779 2009-11-02
PCT/DK2010/050294 WO2011050817A1 (en) 2009-11-02 2010-11-02 Method and device for nanoimprint lithography

Publications (1)

Publication Number Publication Date
DK2496989T3 true DK2496989T3 (da) 2014-01-20

Family

ID=41445496

Family Applications (1)

Application Number Title Priority Date Filing Date
DK10773564.9T DK2496989T3 (da) 2009-11-02 2010-11-02 Fremgangsmåde og indretning til nanotryknings-litografi

Country Status (4)

Country Link
US (1) US20120292820A1 (da)
EP (1) EP2496989B1 (da)
DK (1) DK2496989T3 (da)
WO (1) WO2011050817A1 (da)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8741199B2 (en) * 2010-12-22 2014-06-03 Qingdao Technological University Method and device for full wafer nanoimprint lithography
EP2664427A4 (en) * 2011-01-10 2014-12-17 Scivax Corp TEMPERATURE ADJUSTMENT METHOD AND EMBOSSING DEVICE THEREWITH
JP2013074115A (ja) * 2011-09-28 2013-04-22 Fujifilm Corp ナノインプリント装置およびナノインプリント方法、並びに、歪み付与デバイスおよび歪み付与方法
US9561603B2 (en) 2013-01-03 2017-02-07 Elwha, Llc Nanoimprint lithography
US9962863B2 (en) * 2013-01-03 2018-05-08 Elwha Llc Nanoimprint lithography
US9302424B2 (en) 2013-01-03 2016-04-05 Elwha, Llc Nanoimprint lithography
RU2624983C1 (ru) * 2016-04-27 2017-07-11 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Пензенский государственный университет" (ФГБОУ ВПО "Пензенский государственный университет") Способ получения нанолитографических рисунков с фрактальной структурой со сверхразвитой поверхностью
TWI672212B (zh) * 2016-08-25 2019-09-21 國立成功大學 奈米壓印組合體及其壓印方法
RU2655651C1 (ru) * 2017-07-12 2018-05-29 Федеральное государственное бюджетное образовательное учреждение высшего образования "Пензенский государственный университет" (ФГБОУ ВО "Пензенский государственный университет") Способ получения нанолитографических рисунков с кристаллической структурой со сверхразвитой поверхностью
US11152328B2 (en) * 2018-12-13 2021-10-19 eLux, Inc. System and method for uniform pressure gang bonding
EP4189483A1 (en) * 2020-07-31 2023-06-07 Morphotonics Holding B.V. Apparatus and process for replicating a texture
CN112248314B (zh) * 2020-10-30 2024-04-05 滤微科技(上海)有限公司 用于压印纳米孔薄膜的装置和方法
RU2757323C1 (ru) * 2021-03-21 2021-10-13 Федеральное государственное бюджетное образовательное учреждение высшего образования( ФГБОУ ВО «Пензенский государственный университет») Способ получения нанолитографических рисунков с упорядоченной структурой со сверхразвитой поверхностью

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7019819B2 (en) * 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US7090716B2 (en) * 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
EP1594001B1 (en) * 2004-05-07 2015-12-30 Obducat AB Device and method for imprint lithography
CN101198903B (zh) * 2005-06-10 2011-09-07 奥贝达克特公司 利用中间印模的图案复制
EP1958025B1 (en) * 2005-12-08 2011-05-18 Molecular Imprints, Inc. Method for expelling gas positioned between a substrate and a mold
US7830498B2 (en) 2006-10-10 2010-11-09 Hewlett-Packard Development Company, L.P. Hydraulic-facilitated contact lithography apparatus, system and method
JP2008198273A (ja) * 2007-02-09 2008-08-28 Fujifilm Corp 転写方法、転写装置、及び記録媒体
TWI342862B (en) * 2008-01-31 2011-06-01 Univ Nat Taiwan Method of micro/nano imprinting

Also Published As

Publication number Publication date
EP2496989A1 (en) 2012-09-12
EP2496989B1 (en) 2013-10-02
US20120292820A1 (en) 2012-11-22
WO2011050817A1 (en) 2011-05-05

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