NL2003256A1 - Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element. - Google Patents

Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element. Download PDF

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Publication number
NL2003256A1
NL2003256A1 NL2003256A NL2003256A NL2003256A1 NL 2003256 A1 NL2003256 A1 NL 2003256A1 NL 2003256 A NL2003256 A NL 2003256A NL 2003256 A NL2003256 A NL 2003256A NL 2003256 A1 NL2003256 A1 NL 2003256A1
Authority
NL
Netherlands
Prior art keywords
optical element
lithographic apparatus
making
apparatus including
lithographic
Prior art date
Application number
NL2003256A
Other languages
English (en)
Inventor
Leonid Sjmaenok
Vadim Banine
Roel Moors
Denis Glushkov
Andrey Yakunin
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2003256A1 publication Critical patent/NL2003256A1/nl

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
NL2003256A 2008-08-06 2009-07-22 Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element. NL2003256A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13601008P 2008-08-06 2008-08-06

Publications (1)

Publication Number Publication Date
NL2003256A1 true NL2003256A1 (nl) 2010-02-09

Family

ID=41417456

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2003256A NL2003256A1 (nl) 2008-08-06 2009-07-22 Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element.

Country Status (8)

Country Link
US (1) US9897930B2 (nl)
EP (1) EP2321703B1 (nl)
JP (1) JP5511818B2 (nl)
KR (2) KR20110055601A (nl)
CN (1) CN102089713B (nl)
NL (1) NL2003256A1 (nl)
TW (1) TWI400580B (nl)
WO (1) WO2010015508A2 (nl)

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JP5744879B2 (ja) * 2009-09-18 2015-07-08 コーニンクレッカ フィリップス エヌ ヴェ 改善された耐熱性を持つホイルトラップ装置
JP5727590B2 (ja) * 2010-04-27 2015-06-03 エーエスエムエル ネザーランズ ビー．ブイ． スペクトル純度フィルタ
KR101853008B1 (ko) 2010-06-25 2018-04-30 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 방법
KR102258969B1 (ko) * 2012-01-19 2021-06-02 수프리야 자이스왈 리소그래피 및 다른 적용분야에서 극자외 방사선을 이용하는 재료, 성분 및 사용을 위한 방법
WO2014020003A1 (en) * 2012-08-03 2014-02-06 Asml Netherlands B.V. Lithographic apparatus and method of manufacturing a device
DE102013201857A1 (de) * 2013-02-05 2014-01-23 Carl Zeiss Smt Gmbh Optisches System
NL2013700A (en) * 2013-11-25 2015-05-27 Asml Netherlands Bv An apparatus, a device and a device manufacturing method.
JP6492511B2 (ja) * 2014-10-08 2019-04-03 ウシオ電機株式会社 パターン形成体の製造方法及び光照射装置
JP6520041B2 (ja) * 2014-10-21 2019-05-29 凸版印刷株式会社 ペリクル
GB2534404A (en) 2015-01-23 2016-07-27 Cnm Tech Gmbh Pellicle
KR102345543B1 (ko) * 2015-08-03 2021-12-30 삼성전자주식회사 펠리클 및 이를 포함하는 포토마스크 조립체
DE102015225509A1 (de) * 2015-12-16 2017-06-22 Carl Zeiss Smt Gmbh Reflektives optisches Element
CN116609996A (zh) * 2016-07-05 2023-08-18 三井化学株式会社 防护膜及其组件和组件框体、组件制造方法、曝光原版、曝光装置、半导体装置的制造方法
CN108731823B (zh) * 2017-04-20 2020-02-07 清华大学 一种太赫兹波通讯方法
EP3404487B1 (en) * 2017-05-15 2021-12-01 IMEC vzw Method for forming a carbon nanotube pellicle membrane
JP7258017B2 (ja) 2017-11-10 2023-04-14 エーエスエムエル ネザーランズ ビー．ブイ． Ｅｕｖペリクル
US10887973B2 (en) 2018-08-14 2021-01-05 Isteq B.V. High brightness laser-produced plasma light source
RU2706713C1 (ru) * 2019-04-26 2019-11-20 Общество С Ограниченной Ответственностью "Эуф Лабс" Источник коротковолнового излучения высокой яркости
RU2709183C1 (ru) * 2019-04-26 2019-12-17 Общество С Ограниченной Ответственностью "Эуф Лабс" Источник рентгеновского излучения с жидкометаллической мишенью и способ генерации излучения
WO2019228784A1 (en) * 2018-05-31 2019-12-05 Asml Netherlands B.V. Lithographic apparatus
EP3674797B1 (en) * 2018-12-28 2021-05-05 IMEC vzw An euvl scanner
EP3764163B1 (en) * 2019-07-11 2023-04-12 IMEC vzw An extreme ultraviolet lithography device
EP4022392A1 (en) * 2019-08-26 2022-07-06 ASML Netherlands B.V. Pellicle membrane for a lithographic apparatus
NL2027098B1 (en) * 2020-01-16 2021-10-14 Asml Netherlands Bv Pellicle membrane for a lithographic apparatus
US20230333462A1 (en) * 2020-09-03 2023-10-19 Asml Netherlands B. V. Pellicle membrane for a lithographic apparatus

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Also Published As

Publication number Publication date
KR101753212B1 (ko) 2017-07-04
TWI400580B (zh) 2013-07-01
CN102089713A (zh) 2011-06-08
TW201007385A (en) 2010-02-16
EP2321703A2 (en) 2011-05-18
JP2011530184A (ja) 2011-12-15
US9897930B2 (en) 2018-02-20
WO2010015508A2 (en) 2010-02-11
KR20160093111A (ko) 2016-08-05
US20110249243A1 (en) 2011-10-13
WO2010015508A3 (en) 2010-04-01
EP2321703B1 (en) 2013-01-16
JP5511818B2 (ja) 2014-06-04
CN102089713B (zh) 2013-06-12
KR20110055601A (ko) 2011-05-25

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Effective date: 20100708