JP5511818B2 - リソグラフィ装置用の光学素子、かかる光学素子を含むリソグラフィ装置、およびかかる光学素子を製造する方法 - Google Patents
リソグラフィ装置用の光学素子、かかる光学素子を含むリソグラフィ装置、およびかかる光学素子を製造する方法 Download PDFInfo
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Description
[0001] 本願は、2008年8月6日に出願した米国特許出願第61/136,010号の優先権を主張し、その全体を本明細書に参考として組み込む。
a.ステップモードでは、マスクテーブルMTおよび基板テーブルWTを基本的に静止状態に保ちつつ、放射ビームに付けられたパターン全体を一度にターゲット部分C上に投影する(すなわち、単一静的露光)。その後、基板テーブルWTは、Xおよび/またはY方向に移動され、それによって別のターゲット部分Cを露光することができる。ステップモードでは、露光フィールドの最大サイズによって、単一静的露光時に結像されるターゲット部分Cのサイズが限定される。
b.スキャンモードでは、マスクテーブルMTおよび基板テーブルWTを同期的にスキャンする一方で、放射ビームに付けられたパターンをターゲット部分C上に投影する(すなわち、単一動的露光)。マスクテーブルMTに対する基板テーブルWTの速度および方向は、投影システムPSの(縮小)拡大率および像反転特性によって決めることができる。スキャンモードでは、露光フィールドの最大サイズによって、単一動的露光時のターゲット部分の幅(非スキャン方向)が限定される一方、スキャン動作の長さによって、ターゲット部分の高さ(スキャン方向)が決まる。
c.別のモードでは、プログラマブルパターニングデバイスを保持した状態で、マスクテーブルMTを基本的に静止状態に保ち、また基板テーブルWTを動かす、またはスキャンする一方で、放射ビームに付けられているパターンをターゲット部分C上に投影する。このモードでは、通常、パルス放射源が採用されており、さらにプログラマブルパターニングデバイスは、基板テーブルWTの移動後ごとに、またはスキャン中の連続する放射パルスと放射パルスとの間に、必要に応じて更新される。この動作モードは、前述の型のプログラマブルミラーアレイといったプログラマブルパターニングデバイスを利用するマスクレスリソグラフィに容易に適用することができる。
Claims (12)
- 光学素子を含むリソグラフィ装置であって、前記光学素子は配向カーボンナノチューブシートを含み、前記光学素子は約20〜500nmの範囲内の素子厚さを有し、かつ、1〜20nmの範囲内の波長を有するEUV放射に対して、前記EUV放射による垂直照射下で少なくとも20%の透過を有し、前記光学素子はEUV透明材料粒子をさらに含み、前記EUV透明材料粒子は前記ナノチューブシート内に分散される、リソグラフィ装置。
- 前記光学素子はEUV透明材料層をさらに含み、前記EUV透明材料層および前記ナノチューブシートはラミネートを形成する、請求項1に記載のリソグラフィ装置。
- 前記光学素子の前記EUV透明材料層は、Be、B、C、Si、P、S、K、Ca、Sc、Sr、Rb、Y、Zr、Nb、Mo、Ru、Rh、Ag、Ba、La、Ce、Pr、Ir、Au、Pa、およびUからなる群から選択される1つ以上の元素を含む、請求項2に記載のリソグラフィ装置。
- 前記光学素子の前記EUV透明材料層は、Be、B、C、Si、P、S、K、Ca、Sc、Sr、Rb、Y、Zr、Nb、Mo、Ru、Rh、Ag、Ba、La、Ce、Pr、Ir、Au、Pa、およびUからなる群から選択される前記1つ以上の元素の、室温において固体である酸化物、ホウ化物、および窒化物からなる群から選択される1つ以上の材料を含む、請求項2に記載のリソグラフィ装置。
- 前記光学素子の前記EUV透明材料層は、SiC、B4C、およびSi3N4からなる群から選択される1つ以上の材料を含む、請求項2に記載のリソグラフィ装置。
- 前記光学素子の前記EUV透明材料粒子は、Be、B、C、Si、P、S、K、Ca、Sc、Sr、Rb、Y、Zr、Nb、Mo、Ru、Rh、Ag、Ba、La、Ce、Pr、Ir、Au、Pa、およびUからなる群から選択される1つ以上の元素を含む、請求項1〜5のいずれかに記載のリソグラフィ装置。
- 前記光学素子の前記EUV透明材料粒子は、Be、B、C、Si、P、S、K、Ca、Sc、Sr、Rb、Y、Zr、Nb、Mo、Ru、Rh、Ag、Ba、La、Ce、Pr、Ir、Au、Pa、およびUからなる群から選択される前記1つ以上の元素の、室温において固体である酸化物、ホウ化物、および窒化物からなる群から選択される1つ以上の材料を含む、請求項1〜5のいずれかに記載のリソグラフィ装置。
- 前記光学素子の前記EUV透明材料粒子は、SiC、B4C、およびSi3N4からなる群から選択される1つ以上の材料、特にB4Cを含む、請求項1〜5のいずれかに記載のリソグラフィ装置。
- 配向カーボンナノチューブシートを含む光学素子であって、約20〜500nmの範囲内の素子厚さを有し、かつ、約1〜20nmの範囲内の波長を有するEUV放射に対して、前記EUV放射による垂直照射下で少なくとも約20%の透過を有し、前記光学素子はEUV透明材料粒子をさらに含み、前記EUV透明材料粒子は前記ナノチューブシート内に分散される、光学素子。
- 請求項9に記載の光学素子の製造方法であって、配向カーボンナノチューブシートを設けることと、EUV透明材料またはその前駆体を前記配向多層カーボンナノチューブシートにスパッタリングすることとを含む方法。
- スパッタリング時に、前記ナノチューブシートは、約100〜1000℃の範囲内の温度において加熱される、請求項10に記載の方法。
- スパッタリングに続いて、前記スパッタリングされたEUV透明材料は、B、C、N、およびOからなる群から選択される1つ以上の元素を含む流体と反応させられる、請求項10に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13601008P | 2008-08-06 | 2008-08-06 | |
US61/136,010 | 2008-08-06 | ||
PCT/EP2009/059398 WO2010015508A2 (en) | 2008-08-06 | 2009-07-22 | Optical element for a lithographic apparatus, lithographic apparatus comprising such optical element and method for making the optical element |
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CN (1) | CN102089713B (ja) |
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WO2011033447A1 (en) | 2009-09-18 | 2011-03-24 | Koninklijke Philips Electronics N.V. | Foil trap device with improved heat resistance |
KR101776829B1 (ko) | 2010-04-27 | 2017-09-08 | 에이에스엠엘 네델란즈 비.브이. | 스펙트럼 퓨리티 필터 |
KR101968675B1 (ko) * | 2010-06-25 | 2019-04-12 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치 및 방법 |
KR101930926B1 (ko) * | 2012-01-19 | 2019-03-11 | 수프리야 자이스왈 | 리소그래피 및 다른 적용분야에서 극자외 방사선을 이용하는 재료, 성분 및 사용을 위한 방법 |
NL2011237A (en) * | 2012-08-03 | 2014-02-04 | Asml Netherlands Bv | Lithographic apparatus and method. |
DE102013201857A1 (de) * | 2013-02-05 | 2014-01-23 | Carl Zeiss Smt Gmbh | Optisches System |
NL2013700A (en) * | 2013-11-25 | 2015-05-27 | Asml Netherlands Bv | An apparatus, a device and a device manufacturing method. |
JP6492511B2 (ja) * | 2014-10-08 | 2019-04-03 | ウシオ電機株式会社 | パターン形成体の製造方法及び光照射装置 |
JP6520041B2 (ja) * | 2014-10-21 | 2019-05-29 | 凸版印刷株式会社 | ペリクル |
GB2534404A (en) | 2015-01-23 | 2016-07-27 | Cnm Tech Gmbh | Pellicle |
KR102345543B1 (ko) | 2015-08-03 | 2021-12-30 | 삼성전자주식회사 | 펠리클 및 이를 포함하는 포토마스크 조립체 |
DE102015225509A1 (de) * | 2015-12-16 | 2017-06-22 | Carl Zeiss Smt Gmbh | Reflektives optisches Element |
JP6781864B2 (ja) | 2016-07-05 | 2020-11-11 | 三井化学株式会社 | ペリクル膜、ペリクル枠体、ペリクル、その製造方法、露光原版、露光装置、半導体装置の製造方法 |
CN108731823B (zh) * | 2017-04-20 | 2020-02-07 | 清华大学 | 一种太赫兹波通讯方法 |
EP3404487B1 (en) * | 2017-05-15 | 2021-12-01 | IMEC vzw | Method for forming a carbon nanotube pellicle membrane |
CN111316163A (zh) * | 2017-11-10 | 2020-06-19 | Asml荷兰有限公司 | Euv表膜 |
RU2706713C1 (ru) * | 2019-04-26 | 2019-11-20 | Общество С Ограниченной Ответственностью "Эуф Лабс" | Источник коротковолнового излучения высокой яркости |
US10887973B2 (en) | 2018-08-14 | 2021-01-05 | Isteq B.V. | High brightness laser-produced plasma light source |
RU2709183C1 (ru) * | 2019-04-26 | 2019-12-17 | Общество С Ограниченной Ответственностью "Эуф Лабс" | Источник рентгеновского излучения с жидкометаллической мишенью и способ генерации излучения |
CN112166382A (zh) * | 2018-05-31 | 2021-01-01 | Asml荷兰有限公司 | 光刻设备 |
EP3674797B1 (en) * | 2018-12-28 | 2021-05-05 | IMEC vzw | An euvl scanner |
EP3764163B1 (en) * | 2019-07-11 | 2023-04-12 | IMEC vzw | An extreme ultraviolet lithography device |
KR20220047581A (ko) * | 2019-08-26 | 2022-04-18 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치용 펠리클 멤브레인 |
NL2027098B1 (en) * | 2020-01-16 | 2021-10-14 | Asml Netherlands Bv | Pellicle membrane for a lithographic apparatus |
NL2028923B1 (en) * | 2020-09-03 | 2024-02-07 | Asml Netherlands Bv | Pellicle membrane for a lithographic apparatus |
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JPH085795A (ja) * | 1994-06-22 | 1996-01-12 | Japan Aviation Electron Ind Ltd | 軟x線多層膜反射鏡 |
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JP2006069165A (ja) * | 2004-09-06 | 2006-03-16 | Japan Science & Technology Agency | カーボンナノチューブ複合シート、およびその製造方法 |
JP2006171577A (ja) * | 2004-12-17 | 2006-06-29 | Nikon Corp | 光学素子及びこれを用いた投影露光装置 |
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JP2006224604A (ja) * | 2005-02-21 | 2006-08-31 | Canon Inc | カーボンナノチューブ保護膜を用いたインクジェットプリントヘッド |
JP2007073217A (ja) * | 2005-09-05 | 2007-03-22 | Mitsubishi Gas Chem Co Inc | 電界放出型冷陰極の製造方法 |
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JP2008169092A (ja) * | 2007-01-12 | 2008-07-24 | National Institute Of Advanced Industrial & Technology | カーボンナノチューブの製造方法 |
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CN102089713B (zh) | 2013-06-12 |
KR101753212B1 (ko) | 2017-07-04 |
JP2011530184A (ja) | 2011-12-15 |
US9897930B2 (en) | 2018-02-20 |
US20110249243A1 (en) | 2011-10-13 |
WO2010015508A3 (en) | 2010-04-01 |
EP2321703B1 (en) | 2013-01-16 |
CN102089713A (zh) | 2011-06-08 |
TW201007385A (en) | 2010-02-16 |
TWI400580B (zh) | 2013-07-01 |
KR20160093111A (ko) | 2016-08-05 |
NL2003256A1 (nl) | 2010-02-09 |
WO2010015508A2 (en) | 2010-02-11 |
KR20110055601A (ko) | 2011-05-25 |
EP2321703A2 (en) | 2011-05-18 |
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