NL2003204A1 - Lithographic apparatus and method. - Google Patents

Lithographic apparatus and method. Download PDF

Info

Publication number
NL2003204A1
NL2003204A1 NL2003204A NL2003204A NL2003204A1 NL 2003204 A1 NL2003204 A1 NL 2003204A1 NL 2003204 A NL2003204 A NL 2003204A NL 2003204 A NL2003204 A NL 2003204A NL 2003204 A1 NL2003204 A1 NL 2003204A1
Authority
NL
Netherlands
Prior art keywords
lithographic apparatus
lithographic
Prior art date
Application number
NL2003204A
Other languages
English (en)
Inventor
Johannes Onvlee
Marcel Dierichs
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL2003204A1 publication Critical patent/NL2003204A1/nl

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL2003204A 2008-08-14 2009-07-15 Lithographic apparatus and method. NL2003204A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US8890908P 2008-08-14 2008-08-14

Publications (1)

Publication Number Publication Date
NL2003204A1 true NL2003204A1 (nl) 2010-02-16

Family

ID=41696077

Family Applications (1)

Application Number Title Priority Date Filing Date
NL2003204A NL2003204A1 (nl) 2008-08-14 2009-07-15 Lithographic apparatus and method.

Country Status (3)

Country Link
US (1) US8345225B2 (nl)
JP (1) JP4990944B2 (nl)
NL (1) NL2003204A1 (nl)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100283978A1 (en) * 2009-05-07 2010-11-11 Ultratech,Inc. LED-based UV illuminators and lithography systems using same
US20120170014A1 (en) * 2011-01-04 2012-07-05 Northwestern University Photolithography system using a solid state light source
US10393964B2 (en) 2012-08-07 2019-08-27 The University Of South Alabama Spectral illumination device and method
US9128387B2 (en) * 2013-05-14 2015-09-08 Taiwan Semiconductor Manufacturing Co., Ltd. Ultraviolet light emitting diode array light source for photolithography and method
JPWO2015015749A1 (ja) * 2013-08-02 2017-03-02 株式会社ニコンエンジニアリング 露光装置
NL2014572B1 (en) * 2015-04-01 2017-01-06 Suss Microtec Lithography Gmbh Method for regulating a light source of a photolithography exposure system and exposure assembly for a photolithography device.
US10881328B2 (en) * 2015-10-30 2021-01-05 Allen Medical Systems, Inc. Systems and methods for determining and tracking subject positioning
NL2023537B1 (en) * 2019-07-19 2021-02-08 Xeikon Prepress Nv Apparatus and method for exposure of relief precursors

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6199173A (ja) * 1984-10-22 1986-05-17 Canon Inc 照明装置及びこれを用いた画像形成装置
JPS62298728A (ja) * 1986-06-18 1987-12-25 Fujitsu Ltd 照度測定装置
US5731874A (en) * 1995-01-24 1998-03-24 The Board Of Trustees Of The Leland Stanford Junior University Discrete wavelength spectrometer
US5838709A (en) * 1995-06-07 1998-11-17 Nikon Corporation Ultraviolet laser source
US6233039B1 (en) * 1997-06-05 2001-05-15 Texas Instruments Incorporated Optical illumination system and associated exposure apparatus
US6229639B1 (en) * 1998-07-09 2001-05-08 Cymer, Inc. Multiplexer for laser lithography
EP1107064A3 (en) * 1999-12-06 2004-12-29 Olympus Optical Co., Ltd. Exposure apparatus
JP4289755B2 (ja) * 2000-02-24 2009-07-01 キヤノン株式会社 露光量制御方法、デバイス製造方法および露光装置
EP1146572A3 (en) * 2000-03-14 2005-03-23 Toyoda Gosei Co., Ltd. Light source device
US6814470B2 (en) * 2000-05-08 2004-11-09 Farlight Llc Highly efficient LED lamp
US6707548B2 (en) * 2001-02-08 2004-03-16 Array Bioscience Corporation Systems and methods for filter based spectrographic analysis
JP4546019B2 (ja) * 2002-07-03 2010-09-15 株式会社日立製作所 露光装置
JP2004335952A (ja) * 2002-12-27 2004-11-25 Nikon Corp 照明光源装置、照明装置、露光装置、及び露光方法
JP2004335826A (ja) * 2003-05-09 2004-11-25 Nikon Corp 光源装置、露光装置及び露光方法
US7061586B2 (en) * 2004-03-02 2006-06-13 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US20060082999A1 (en) * 2004-10-18 2006-04-20 Klein W R Refractive clamp/optic for light emitting diode
JP2006128342A (ja) * 2004-10-28 2006-05-18 Canon Inc 露光装置、光源装置及びデバイス製造方法
TW200625027A (en) * 2005-01-14 2006-07-16 Zeiss Carl Smt Ag Illumination system for a microlithographic projection exposure apparatus
US7868999B2 (en) * 2006-08-10 2011-01-11 Asml Netherlands B.V. Lithographic apparatus, source, source controller and control method
DE102006043402B4 (de) * 2006-09-15 2019-05-09 Osram Gmbh Beleuchtungseinheit mit einem optischen Element
JP5002228B2 (ja) * 2006-10-03 2012-08-15 キヤノン株式会社 画像表示装置
JP2008090017A (ja) * 2006-10-03 2008-04-17 Canon Inc 画像表示装置

Also Published As

Publication number Publication date
JP4990944B2 (ja) 2012-08-01
US20100045954A1 (en) 2010-02-25
US8345225B2 (en) 2013-01-01
JP2010045356A (ja) 2010-02-25

Similar Documents

Publication Publication Date Title
BRPI0910723A2 (pt) aparelho e método de frenagem.
BRPI0912934A2 (pt) aparelho e método
BRPI0817292A2 (pt) Método e aparelho para completação de poços.
BRPI0910713A2 (pt) método e aparelhos
NL2002883A1 (nl) Overlay measurement apparatus, lithographic apparatus, and device manufacturing method using such overlay measurement apparatus.
BRPI0915433A2 (pt) método, e, dispositivo.
NL2003118A1 (nl) Alignment system, lithographic system and method.
BRPI0913227A2 (pt) método, e objeto
BRPI0913752A2 (pt) método, dispositivo, e, estrutura
BRPI0904324A2 (pt) Dispositivo de processamento de imagem, e, método de processamento de imagem
NL2003157A1 (nl) Radiation source, lithographic apparatus, and device manufacturing method.
NL1036306A1 (nl) Lithographic apparatus and in-line cleaning apparatus.
BRPI0814466A2 (pt) Método.
BRPI0905361A2 (pt) Aparelho e método de formação de imagem, e, programa
BRPI0909635A2 (pt) aparelho desumidificador e método
DE602008003068D1 (de) Vorrichtungsanschluss, Anschlussverfahren und Vorrichtung dafür
FI20060955A (fi) Sakeutuslaite ja -menetelmä
NL2003310A1 (nl) Radiation source, lithographic apparatus and device manufacturing method.
BRPI0813569A2 (pt) Método de inspeção.
NL2002999A1 (nl) Lithographic apparatus and device manufacturing method.
NL1036290A1 (nl) Lithographic apparatus.
BRPI1007925A2 (pt) método, e aparelho.
NL2003258A1 (nl) Lithographic apparatus and device manufacturing method.
BRPI0823290A2 (pt) Método e aparelho para configuração de dispositivos.
NL2002016A1 (nl) Exposure apparatus and method for photolithography process.

Legal Events

Date Code Title Description
AD1A A request for search or an international type search has been filed
WDAP Patent application withdrawn

Effective date: 20100831