TWI612557B - - Google Patents

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Publication number
TWI612557B
TWI612557B TW104112367A TW104112367A TWI612557B TW I612557 B TWI612557 B TW I612557B TW 104112367 A TW104112367 A TW 104112367A TW 104112367 A TW104112367 A TW 104112367A TW I612557 B TWI612557 B TW I612557B
Authority
TW
Taiwan
Application number
TW104112367A
Other versions
TW201530616A (en
Inventor
Hiroyuki Nagasaka
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2003146424 priority Critical
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of TW201530616A publication Critical patent/TW201530616A/zh
Application granted granted Critical
Publication of TWI612557B publication Critical patent/TWI612557B/zh

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00Photographic printing apparatus
    • G03B27/32Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2041Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70325Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lens
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • G03F7/70725Stages control
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70775Position control
TW104112367A 2003-05-23 2004-05-21 TWI612557B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003146424 2003-05-23

Publications (2)

Publication Number Publication Date
TW201530616A TW201530616A (en) 2015-08-01
TWI612557B true TWI612557B (zh) 2018-01-21

Family

ID=33475300

Family Applications (9)

Application Number Title Priority Date Filing Date
TW102136490A TWI511181B (zh) 2003-05-23 2004-05-21
TW104112370A TWI614794B (zh) 2003-05-23 2004-05-21
TW104112367A TWI612557B (zh) 2003-05-23 2004-05-21
TW102142613A TW201415536A (en) 2003-05-23 2004-05-21 Exposure method, exposure device, and device manufacturing method
TW093114402A TWI421906B (zh) 2003-05-23 2004-05-21
TW100126336A TWI421911B (zh) 2003-05-23 2004-05-21
TW103146232A TW201515064A (en) 2003-05-23 2004-05-21 Exposure device, exposure method, and device manufacturing method
TW102126874A TWI463533B (zh) 2003-05-23 2004-05-21
TW102126875A TWI470671B (zh) 2003-05-23 2004-05-21

Family Applications Before (2)

Application Number Title Priority Date Filing Date
TW102136490A TWI511181B (zh) 2003-05-23 2004-05-21
TW104112370A TWI614794B (zh) 2003-05-23 2004-05-21

Family Applications After (6)

Application Number Title Priority Date Filing Date
TW102142613A TW201415536A (en) 2003-05-23 2004-05-21 Exposure method, exposure device, and device manufacturing method
TW093114402A TWI421906B (zh) 2003-05-23 2004-05-21
TW100126336A TWI421911B (zh) 2003-05-23 2004-05-21
TW103146232A TW201515064A (en) 2003-05-23 2004-05-21 Exposure device, exposure method, and device manufacturing method
TW102126874A TWI463533B (zh) 2003-05-23 2004-05-21
TW102126875A TWI470671B (zh) 2003-05-23 2004-05-21

Country Status (7)

Country Link
US (9) US7495744B2 (zh)
EP (6) EP1632991B1 (zh)
JP (10) JP5353811B2 (zh)
KR (12) KR101619724B1 (zh)
HK (3) HK1204092A1 (zh)
TW (9) TWI511181B (zh)
WO (1) WO2004105106A1 (zh)

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KR101597475B1 (ko) 2003-04-11 2016-02-24 가부시키가이샤 니콘 액침 리소그래피에 의한 광학기기의 세정방법
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US7317507B2 (en) * 2005-05-03 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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