SG10201602750RA - Illumination Optical System, Exposure Apparatus, And Device Manufacturing Method - Google Patents

Illumination Optical System, Exposure Apparatus, And Device Manufacturing Method

Info

Publication number
SG10201602750RA
SG10201602750RA SG10201602750RA SG10201602750RA SG10201602750RA SG 10201602750R A SG10201602750R A SG 10201602750RA SG 10201602750R A SG10201602750R A SG 10201602750RA SG 10201602750R A SG10201602750R A SG 10201602750RA SG 10201602750R A SG10201602750R A SG 10201602750RA
Authority
SG
Singapore
Prior art keywords
optical system
manufacturing method
exposure apparatus
illumination optical
device manufacturing
Prior art date
Application number
SG10201602750RA
Inventor
Hirohisa Tanaka
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2007269188 priority Critical
Priority to JP2008173244 priority
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of SG10201602750RA publication Critical patent/SG10201602750RA/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/7085Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70058Mask illumination systems
    • G03F7/70075Homogenization of illumination intensity in the mask plane, by using an integrator, e.g. fly's eye lenses, facet mirrors, glass rods, by using a diffusive optical element or by beam deflection
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70058Mask illumination systems
    • G03F7/70091Illumination settings, i.e. intensity distribution in the pupil plane, angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole, quadrupole; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108Off-axis setting using a light-guiding element
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70058Mask illumination systems
    • G03F7/70091Illumination settings, i.e. intensity distribution in the pupil plane, angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole, quadrupole; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116Off-axis setting using a programmable means, e.g. LCD or DMD
SG10201602750RA 2007-10-16 2008-09-12 Illumination Optical System, Exposure Apparatus, And Device Manufacturing Method SG10201602750RA (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2007269188 2007-10-16
JP2008173244 2008-07-02

Publications (1)

Publication Number Publication Date
SG10201602750RA true SG10201602750RA (en) 2016-05-30

Family

ID=40138389

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201602750RA SG10201602750RA (en) 2007-10-16 2008-09-12 Illumination Optical System, Exposure Apparatus, And Device Manufacturing Method
SG2012077160A SG185313A1 (en) 2007-10-16 2008-09-12 Illumination optical system, exposure apparatus, and device manufacturing method

Family Applications After (1)

Application Number Title Priority Date Filing Date
SG2012077160A SG185313A1 (en) 2007-10-16 2008-09-12 Illumination optical system, exposure apparatus, and device manufacturing method

Country Status (9)

Country Link
US (1) US8520291B2 (en)
EP (1) EP2179329A1 (en)
JP (1) JP5287114B2 (en)
KR (1) KR101546987B1 (en)
CN (1) CN101681125B (en)
HK (1) HK1139745A1 (en)
SG (2) SG10201602750RA (en)
TW (1) TWI456354B (en)
WO (1) WO2009050977A1 (en)

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