JP2014078728A - 露光装置、露光方法、並びにデバイス製造方法 - Google Patents
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- G03F7/70—Microphotolithographic exposure; Apparatus therefor
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- G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
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Abstract
【解決手段】投影光学系と液体とを介してパターンの像を基板上に投影することにより基板を露光する際、記憶装置に記憶された液浸条件の中から基板上の液体接触面に形成される膜部材に最適なものを選択する。
【選択図】図5
Description
δ=±k2・λ/NA2 … (2)
ここで、λは露光波長、NAは投影光学系の開口数、k1、k2はプロセス係数である。(1)式、(2)式より、解像度Rを高めるために、露光波長λを短くして、開口数NAを大きくすると、焦点深度δが狭くなることが分かる。
置の一実施形態を示す概略構成図である。
して、液体1との親和性をより高めるようにしてもよい。
Claims (22)
- 投影光学系と液体とを介して露光光で基板を露光する露光装置であって、
前記液体の供給口と、前記供給口を介して供給される液体によって前記投影光学系の下に形成される液浸領域から液体を回収する回収口とを有し、前記液浸領域の液体と接する一部が可動な液浸部材と、
前記液浸部材の一部を駆動する駆動装置と、
前記基板を載置し、前記投影光学系と前記基板の一部との間に維持される前記液浸領域に対して前記基板が相対移動されるように、前記投影光学系の下方で移動される基板ステージと、
前記投影光学系の光軸と直交する方向に前記液浸部材の一部が移動されるように前記駆動装置を制御するコントローラ。 - 請求項1に記載の露光装置において、
前記液浸部材は、前記投影光学系の、前記液浸領域の液体と接する光学素子の周囲に配置される。 - 請求項1又は2に記載の露光装置において、
前記液浸部材は、前記投影光学系の下方に配置される前記基板ステージと対向するように前記回収口が設けられる。 - 請求項1〜3のいずれか一項に記載の露光装置において、
前記液浸部材は、前記投影光学系の下方に配置される前記基板ステージと対向するように前記供給口が設けられる。 - 請求項1〜4のいずれか一項に記載の露光装置において、
前記駆動装置によって駆動される、前記液浸部材の一部は、前記供給口及び前記回収口の一方、またはその両方を有する。 - 請求項1〜5のいずれか一項に記載の露光装置において、
前記液浸部材は、その下端側で、前記回収口が前記投影光学系によるパターン像の投影領域に対して前記供給口の外側に配置される。 - 請求項1〜6のいずれか一項に記載の露光装置において、
前記回収口は、前記液浸部材の下端側で、前記投影光学系によるパターン像の投影領域を囲むように配置される。 - 請求項1〜7のいずれか一項に記載の露光装置において、
前記コントローラは、前記液浸領域に対する前記基板の相対移動において、前記基板と前記液浸領域の液体との接触角に関する情報に基づいて決定された速度及び加速度の少なくとも一方によって前記基板ステージが移動されるように前記駆動装置を制御する。 - 請求項1〜8のいずれか一項に記載の露光装置において、
前記基板ステージは、前記液浸領域の液体との接触角が互いに異なる表面を有する複数の基板をそれぞれ載置可能であるとともに、前記液浸領域に対する前記基板の相対移動における速度及び加速度の少なくとも一方が前記複数の基板で異なるように移動される。 - 請求項9に記載の露光装置において、
前記基板ステージは、前記複数の基板のうち前記接触角が小さい基板ほど、前記速度及び加速度の少なくとも一方が高くなるように移動される。
- 投影光学系と液体とを介して露光光で基板を露光する露光方法であって、
前記液体によって前記投影光学系の下に形成される液浸領域に対して前記基板が相対移動されるように、前記液浸領域に液体を供給する供給口と、前記液浸領域から液体を回収する回収口とを有する液浸部材の下方で、前記基板を載置する基板ステージを移動することと、
前記投影光学系の光軸と直交する方向に、前記液浸領域の液体と接する前記液浸部材の一部を移動することと、を含む。 - 請求項11に記載の露光方法において、
前記液浸部材は、前記投影光学系の、前記液浸領域の液体と接する光学素子の周囲に配置される。 - 請求項11又は12に記載の露光方法において、
前記液浸部材は、前記投影光学系の下方に配置される前記基板ステージと対向するように前記回収口が設けられる。 - 請求項11〜13のいずれか一項に記載の露光方法において、
前記液浸部材は、前記投影光学系の下方に配置される前記基板ステージと対向するように前記供給口が設けられる。 - 請求項11〜14のいずれか一項に記載の露光方法において、
前記駆動装置によって駆動される、前記液浸部材の一部は、前記供給口及び前記回収口の一方、またはその両方を有する。 - 請求項11〜15のいずれか一項に記載の露光方法において、
前記液浸部材は、その下端側で、前記回収口が前記投影光学系によるパターン像の投影領域に対して前記供給口の外側に配置される。 - 請求項11〜16のいずれか一項に記載の露光方法において、
前記回収口は、前記液浸部材の下端側で、前記投影光学系によるパターン像の投影領域を囲むように配置される。 - 請求項11〜17のいずれか一項に記載の露光方法において、
前記基板ステージは、前記液浸領域に対する前記基板の相対移動において、前記基板と前記液浸領域の液体との接触角に関する情報に基づいて決定された速度及び加速度の少なくとも一方で移動される。 - 請求項11〜18のいずれか一項に記載の露光方法において、
前記基板ステージは、前記液浸領域の液体との接触角が互いに異なる表面を有する複数の基板をそれぞれ載置可能であるとともに、前記液浸領域に対する前記基板の相対移動における速度及び加速度の少なくとも一方が前記複数の基板で異なるように移動される。 - 請求項19に記載の露光方法において、
前記基板ステージは、前記複数の基板のうち前記接触角が小さい基板ほど、前記速度及び加速度の少なくとも一方が高くなるように移動される。 - デバイス製造方法であって、
露光処理ステップと、
デバイス組立ステップと、を含み、
前記露光処理ステップでは、請求項1〜10のいずれか一項に記載の露光装置を用いて基板を露光する。 - デバイス製造方法であって、
露光処理ステップと、
デバイス組立ステップと、を含み、
前記露光処理ステップでは、請求項11〜20のいずれか一項に記載の露光方法を用いて基板を露光する。
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