ATE489724T1 - Belichtungsvorrichtung und verfahren zur bauelementherstellung - Google Patents

Belichtungsvorrichtung und verfahren zur bauelementherstellung

Info

Publication number
ATE489724T1
ATE489724T1 AT04747525T AT04747525T ATE489724T1 AT E489724 T1 ATE489724 T1 AT E489724T1 AT 04747525 T AT04747525 T AT 04747525T AT 04747525 T AT04747525 T AT 04747525T AT E489724 T1 ATE489724 T1 AT E489724T1
Authority
AT
Austria
Prior art keywords
group
exposure device
producing components
liquid
optical system
Prior art date
Application number
AT04747525T
Other languages
English (en)
Inventor
Kazuya Ono
Yuichi Shibazaki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=34067374&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE489724(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of ATE489724T1 publication Critical patent/ATE489724T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Sewage (AREA)
  • Conveying And Assembling Of Building Elements In Situ (AREA)
  • Control Of Vending Devices And Auxiliary Devices For Vending Devices (AREA)
AT04747525T 2003-07-09 2004-07-08 Belichtungsvorrichtung und verfahren zur bauelementherstellung ATE489724T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003272615 2003-07-09
JP2003281182 2003-07-28
PCT/JP2004/010059 WO2005006416A1 (ja) 2003-07-09 2004-07-08 結合装置、露光装置、及びデバイス製造方法

Publications (1)

Publication Number Publication Date
ATE489724T1 true ATE489724T1 (de) 2010-12-15

Family

ID=34067374

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04747525T ATE489724T1 (de) 2003-07-09 2004-07-08 Belichtungsvorrichtung und verfahren zur bauelementherstellung

Country Status (9)

Country Link
US (5) US7619715B2 (de)
EP (1) EP1643543B1 (de)
JP (2) JP4844123B2 (de)
KR (1) KR20060026883A (de)
CN (1) CN102944981A (de)
AT (1) ATE489724T1 (de)
DE (1) DE602004030247D1 (de)
TW (1) TW200507063A (de)
WO (1) WO2005006416A1 (de)

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TWI720053B (zh) * 2016-11-09 2021-03-01 晶元光電股份有限公司 發光元件及其製造方法
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US7619715B2 (en) 2009-11-17
JP2010219558A (ja) 2010-09-30
US20080186465A1 (en) 2008-08-07
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US8120751B2 (en) 2012-02-21
US20060126045A1 (en) 2006-06-15
CN102944981A (zh) 2013-02-27
DE602004030247D1 (de) 2011-01-05
JP5278382B2 (ja) 2013-09-04
JP4844123B2 (ja) 2011-12-28
EP1643543B1 (de) 2010-11-24
WO2005006416A1 (ja) 2005-01-20
HK1097103A1 (zh) 2007-06-15
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US8228484B2 (en) 2012-07-24
TW200507063A (en) 2005-02-16

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