DE602004030247D1 - Belichtungsvorrichtung und verfahren zur bauelementherstellung - Google Patents

Belichtungsvorrichtung und verfahren zur bauelementherstellung

Info

Publication number
DE602004030247D1
DE602004030247D1 DE602004030247T DE602004030247T DE602004030247D1 DE 602004030247 D1 DE602004030247 D1 DE 602004030247D1 DE 602004030247 T DE602004030247 T DE 602004030247T DE 602004030247 T DE602004030247 T DE 602004030247T DE 602004030247 D1 DE602004030247 D1 DE 602004030247D1
Authority
DE
Germany
Prior art keywords
group
construction
manufacturing
exposure device
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE602004030247T
Other languages
English (en)
Inventor
Kazuya Ono
Yuichi Shibazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=34067374&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE602004030247(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Publication of DE602004030247D1 publication Critical patent/DE602004030247D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Control Of Vending Devices And Auxiliary Devices For Vending Devices (AREA)
  • Sewage (AREA)
  • Conveying And Assembling Of Building Elements In Situ (AREA)
DE602004030247T 2003-07-09 2004-07-08 Belichtungsvorrichtung und verfahren zur bauelementherstellung Expired - Lifetime DE602004030247D1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003272615 2003-07-09
JP2003281182 2003-07-28
PCT/JP2004/010059 WO2005006416A1 (ja) 2003-07-09 2004-07-08 結合装置、露光装置、及びデバイス製造方法

Publications (1)

Publication Number Publication Date
DE602004030247D1 true DE602004030247D1 (de) 2011-01-05

Family

ID=34067374

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602004030247T Expired - Lifetime DE602004030247D1 (de) 2003-07-09 2004-07-08 Belichtungsvorrichtung und verfahren zur bauelementherstellung

Country Status (10)

Country Link
US (5) US7619715B2 (de)
EP (1) EP1643543B1 (de)
JP (2) JP4844123B2 (de)
KR (1) KR20060026883A (de)
CN (1) CN102944981A (de)
AT (1) ATE489724T1 (de)
DE (1) DE602004030247D1 (de)
HK (2) HK1097103A1 (de)
TW (1) TW200507063A (de)
WO (1) WO2005006416A1 (de)

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WO2014013733A1 (ja) * 2012-07-18 2014-01-23 株式会社ニコン 支持装置、移動体装置、露光装置、及びデバイス製造方法
TW201435410A (zh) * 2013-03-07 2014-09-16 Hon Hai Prec Ind Co Ltd 光通訊模組組裝裝置
CN104049314A (zh) * 2013-03-11 2014-09-17 鸿富锦精密工业（深圳）有限公司 光通讯模组组装装置
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JP2023013737A (ja) * 2021-07-16 2023-01-26 キヤノン株式会社 処理装置および物品製造方法

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EP1643543B1 (de) 2010-11-24
US8120751B2 (en) 2012-02-21
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CN102944981A (zh) 2013-02-27
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JP4844123B2 (ja) 2011-12-28
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