JP4364806B2 - 層上にスポットを照射する方法及び装置 - Google Patents
層上にスポットを照射する方法及び装置 Download PDFInfo
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- JP4364806B2 JP4364806B2 JP2004561792A JP2004561792A JP4364806B2 JP 4364806 B2 JP4364806 B2 JP 4364806B2 JP 2004561792 A JP2004561792 A JP 2004561792A JP 2004561792 A JP2004561792 A JP 2004561792A JP 4364806 B2 JP4364806 B2 JP 4364806B2
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
- G11B7/135—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
- G11B7/1381—Non-lens elements for altering the properties of the beam, e.g. knife edges, slits, filters or stops
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
- G11B7/122—Flying-type heads, e.g. analogous to Winchester type in magnetic recording
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
- G11B7/135—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
- G11B7/1372—Lenses
- G11B7/1374—Objective lenses
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
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- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Optical Head (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
- Recrystallisation Techniques (AREA)
Description
レンズ14に関連するウエハ15の変位後ウエハ15の表面への照射を再開できるようにすべく(即ち、レンズ又はレンズとウエハが動かされる)、動きの完了後に放射が通過するレンズ14とウエハ15の表面との間の空間中の液容積が直ぐに液体で満たされると、当該空間は放射が再開される前に合理的に液浸される。
Claims (12)
- 少なくとも1つの光学素子によって放射ビームを層上のスポットに向けて焦点を合わせ、
前記少なくとも1つの光学素子と関連する層の相対的動きを引き起こし、連続的に前記層の異なる部分が照射され、前記層に最も近い前記少なくとも1つの光学素子の表面の間の空間が維持され、
前記層上の前記スポットに前記放射が照射される際に通過する前記空間の少なくとも一部を液体で満たして維持し、前記液体は、供給管を介して供給され流出口から流出する工程を含み、
前記液体が流出する際に通る少なくとも一つの流出口が、少なくとも一つの流路が前記層に向けて開口している状態で設けられ、前記流路は、前記層に面している面中の前記空間の回りを線状に延びるように形成されており、前記流路は、前記流路に沿って長手方向に前記液体を供給し、前記供給された液体を前記層に向けて供給し、
前記液体の少なくとも一部が、前記放射が前記スポットに照射される際に通るリセスを満たし、
前記リセスは、前記層に最も近い前記少なくとも一つの光学素子の前記表面の凹部を含む、ことを特徴とする、層の照射方法。 - 前記流路は、前記放射が前記スポットに照射される際に通る前記空間の回りに設けられ、
前記流路は、前記放射が前記スポットに照射される際に通る前記空間内に中心を有する環状の平面形状を有することを特徴とする請求項1記載の方法。 - 前記流路は、前記放射が前記スポットに照射される際に通る前記空間の回りに設けられ、
前記流路は、前記放射が前記スポットに照射される際に通る前記空間内に中心を有する矩形形状の平面形状を有することを特徴とする請求項1記載の方法。 - 前記空間の最も小さな厚さは、3−1500μmに維持されることを特徴とする請求項1乃至3いずれか一項記載の方法。
- 前記リセスは、前記層に最も近い前記通路の端部を形成するリム部であって、前記スポットを照射する前記放射の周りに延びているリム部を有することを特徴とする請求項1記載の方法。
- 前記リセスは、前記層に最も近い前記少なくとも1つの光学素子の表面との間の壁の中に形成され、前記液体が流れる通路と、前記層に最も近い前記少なくとも1つの光学素子と、によって境が限られていることを特徴とする請求項1乃至5いずれか一項記載の方法。
- 放射線源から発せられた放射ビームを、層上のスポットに焦点を合わせる少なくとも1つの光学素子と、
連続的に前記層の異なる部分が照射され、前記層と前記スポットに最も近い前記少なくとも1つの光学素子の表面との間の空間が維持されるよう、前記少なくとも1つの光学素子に関連する前記層の相対的動きを引き起こす変位構造と、
前記層上の前記スポットに前記放射が照射される際に通過する前記空間の少なくとも一部に液体を供給する流出口で、前記流出口は、前記放射ビームの軸と垂直な面に断面を有し、
前記少なくとも一つの流出口が、少なくとも一つの流路が前記層に向けて開口している状態で設けられ、前記流路は、前記層に面している面中の前記空間の回りを線状に延びるように形成されており、前記流路は、前記流路に沿って長手方向に前記液体を供給し、前記供給された液体を前記層に向けて供給し、
リセスが、前記スポットに対向する表面中に設けられ、
前記リセスの内面は、前記放射が前記スポットを照射する際に通る前記空間の少なくとも前記部分の境を限り、
前記リセスは、前記スポットに最も近い前記少なくとも1つの光学素子の前記表面の凹部を含む、ことを特徴とする、層へ放射を向けさせる装置。 - 前記流路は、前記放射が前記スポットに照射される際に通る前記空間の回りに設けられ、
前記流路は、前記放射が前記スポットに照射される際に通る前記空間内に中心を有する環状の平面形状を有することを特徴とする請求項7記載の装置。 - 前記流路は、前記放射が前記スポットに照射される際に通る前記空間の回りに設けられ、
前記流路は、前記放射が前記スポットに照射される際に通る前記空間内に中心を有する矩形形状の平面形状を有することを特徴とする請求項7記載の装置。 - 前記空間の最も小さな厚さは、3−1500μmに維持されるように、前記変位構造及び前記リセスは位置づけられていることを特徴とする請求項7乃至9いずれか一項記載の装置。
- 前記リセスは、前記層に最も近い前記通路の端部を形成するリム部であって、記放射が前記スポットを照射する際に通過する前記空間の周りに延びているリム部を有することを特徴とする請求項7記載の装置。
- 前記リセスは、前記層に最も近い前記少なくとも1つの光学素子の表面との間の壁の中に形成され、前記液体が流れる通路と、前記層に最も近い前記少なくとも1つの光学素子と、によって境が限られていることを特徴とする請求項7乃至11いずれか一項記載の装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02080376 | 2002-12-19 | ||
PCT/IB2003/005708 WO2004057590A1 (en) | 2002-12-19 | 2003-11-20 | Method and device for irradiating spots on a layer |
Publications (2)
Publication Number | Publication Date |
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JP2006511021A JP2006511021A (ja) | 2006-03-30 |
JP4364806B2 true JP4364806B2 (ja) | 2009-11-18 |
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JP2004561792A Expired - Fee Related JP4364806B2 (ja) | 2002-12-19 | 2003-11-20 | 層上にスポットを照射する方法及び装置 |
Country Status (11)
Country | Link |
---|---|
US (1) | US7399978B2 (ja) |
EP (2) | EP1584089B1 (ja) |
JP (1) | JP4364806B2 (ja) |
KR (1) | KR100971441B1 (ja) |
CN (1) | CN100385535C (ja) |
AT (1) | ATE335272T1 (ja) |
AU (1) | AU2003283717A1 (ja) |
DE (1) | DE60307322T2 (ja) |
ES (1) | ES2268450T3 (ja) |
TW (1) | TWI288403B (ja) |
WO (1) | WO2004057590A1 (ja) |
Families Citing this family (248)
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JPS57153433A (en) * | 1981-03-18 | 1982-09-22 | Hitachi Ltd | Manufacturing device for semiconductor |
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WO1998009278A1 (en) * | 1996-08-26 | 1998-03-05 | Digital Papyrus Technologies | Method and apparatus for coupling an optical lens to a disk through a coupling medium having a relatively high index of refraction |
JPH10255319A (ja) | 1997-03-12 | 1998-09-25 | Hitachi Maxell Ltd | 原盤露光装置及び方法 |
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TW591653B (en) * | 2000-08-08 | 2004-06-11 | Koninkl Philips Electronics Nv | Method of manufacturing an optically scannable information carrier |
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EP1732075A2 (en) | 2006-12-13 |
US7399978B2 (en) | 2008-07-15 |
EP1584089B1 (en) | 2006-08-02 |
WO2004057590A1 (en) | 2004-07-08 |
EP1584089A1 (en) | 2005-10-12 |
AU2003283717A1 (en) | 2004-07-14 |
DE60307322D1 (de) | 2006-09-14 |
TW200423076A (en) | 2004-11-01 |
KR20050095588A (ko) | 2005-09-29 |
JP2006511021A (ja) | 2006-03-30 |
TWI288403B (en) | 2007-10-11 |
CN100385535C (zh) | 2008-04-30 |
DE60307322T2 (de) | 2007-10-18 |
EP1732075A3 (en) | 2007-02-21 |
CN1729522A (zh) | 2006-02-01 |
ES2268450T3 (es) | 2007-03-16 |
KR100971441B1 (ko) | 2010-07-21 |
US20060209414A1 (en) | 2006-09-21 |
ATE335272T1 (de) | 2006-08-15 |
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