SG158745A1 - Exposure apparatus and method for producing device - Google Patents

Exposure apparatus and method for producing device

Info

Publication number
SG158745A1
SG158745A1 SG200704280-7A SG2007042807A SG158745A1 SG 158745 A1 SG158745 A1 SG 158745A1 SG 2007042807 A SG2007042807 A SG 2007042807A SG 158745 A1 SG158745 A1 SG 158745A1
Authority
SG
Singapore
Prior art keywords
method
exposure apparatus
producing device
immersion
liquid
Prior art date
Application number
SG200704280-7A
Inventor
Masahiro Nei
Naoyuki Kobayashi
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2002357958 priority Critical
Priority to JP2003296491 priority
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of SG158745A1 publication Critical patent/SG158745A1/en

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/707Chucks, e.g. chucking or un-chucking operations
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion

Abstract

An immersion lithography device that recovers immersion fluid by a system of take-up tanks for immersion liquid to be reused. The take-up tanks for immersion liquid have level control and a separator for liquid and gas phase.
SG200704280-7A 2002-12-10 2003-12-08 Exposure apparatus and method for producing device SG158745A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002357958 2002-12-10
JP2003296491 2003-08-20

Publications (1)

Publication Number Publication Date
SG158745A1 true SG158745A1 (en) 2010-02-26

Family

ID=32510636

Family Applications (3)

Application Number Title Priority Date Filing Date
SG200704280-7A SG158745A1 (en) 2002-12-10 2003-12-08 Exposure apparatus and method for producing device
SG200704279-9A SG157962A1 (en) 2002-12-10 2003-12-08 Exposure apparatus and method for producing device
SG200704278-1A SG150388A1 (en) 2002-12-10 2003-12-08 Exposure apparatus and method for producing device

Family Applications After (2)

Application Number Title Priority Date Filing Date
SG200704279-9A SG157962A1 (en) 2002-12-10 2003-12-08 Exposure apparatus and method for producing device
SG200704278-1A SG150388A1 (en) 2002-12-10 2003-12-08 Exposure apparatus and method for producing device

Country Status (9)

Country Link
US (3) US20050219488A1 (en)
EP (1) EP1571695A4 (en)
JP (1) JP4596077B2 (en)
KR (2) KR20120127755A (en)
CN (2) CN101852993A (en)
AU (1) AU2003289236A1 (en)
SG (3) SG158745A1 (en)
TW (1) TWI334160B (en)
WO (1) WO2004053953A1 (en)

Families Citing this family (228)

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