ATE352052T1 - Haltevorrichtung für optisches element - Google Patents

Haltevorrichtung für optisches element

Info

Publication number
ATE352052T1
ATE352052T1 AT01955668T AT01955668T ATE352052T1 AT E352052 T1 ATE352052 T1 AT E352052T1 AT 01955668 T AT01955668 T AT 01955668T AT 01955668 T AT01955668 T AT 01955668T AT E352052 T1 ATE352052 T1 AT E352052T1
Authority
AT
Austria
Prior art keywords
optical element
holding device
held
coordinate axes
holding
Prior art date
Application number
AT01955668T
Other languages
English (en)
Inventor
Yuichi Shibazaki
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of ATE352052T1 publication Critical patent/ATE352052T1/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/022—Mountings, adjusting means, or light-tight connections, for optical elements for lenses lens and mount having complementary engagement means, e.g. screw/thread
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/026—Mountings, adjusting means, or light-tight connections, for optical elements for lenses using retaining rings or springs

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lens Barrels (AREA)
  • Gyroscopes (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Optical Couplings Of Light Guides (AREA)
  • Optical Integrated Circuits (AREA)
AT01955668T 2000-08-18 2001-08-10 Haltevorrichtung für optisches element ATE352052T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000248430 2000-08-18
JP2000248429 2000-08-18

Publications (1)

Publication Number Publication Date
ATE352052T1 true ATE352052T1 (de) 2007-02-15

Family

ID=26598082

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01955668T ATE352052T1 (de) 2000-08-18 2001-08-10 Haltevorrichtung für optisches element

Country Status (8)

Country Link
US (2) US7154684B2 (de)
EP (2) EP1312965B1 (de)
KR (1) KR100775796B1 (de)
AT (1) ATE352052T1 (de)
AU (1) AU2001277758A1 (de)
DE (1) DE60126103T2 (de)
TW (1) TW521317B (de)
WO (1) WO2002016993A1 (de)

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US7154684B2 (en) 2006-12-26
KR20020041822A (ko) 2002-06-03
US20070121224A1 (en) 2007-05-31
EP1312965B1 (de) 2007-01-17
DE60126103T2 (de) 2007-11-15
EP1312965A4 (de) 2003-08-13
EP1312965A1 (de) 2003-05-21
DE60126103D1 (de) 2007-03-08
KR100775796B1 (ko) 2007-11-12
AU2001277758A1 (en) 2002-03-04
US7420752B2 (en) 2008-09-02
US20020163741A1 (en) 2002-11-07
TW521317B (en) 2003-02-21
WO2002016993A1 (fr) 2002-02-28
EP1744193A1 (de) 2007-01-17

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