|
US6852988B2
(en)
*
|
2000-11-28 |
2005-02-08 |
Sumitomo Heavy Industries, Ltd. |
Gap adjustment apparatus and gap adjustment method for adjusting gap between two objects
|
|
DE10136387A1
(de)
|
2001-07-26 |
2003-02-13 |
Zeiss Carl |
Objektiv, insbesondere Objektiv für die Halbleiter-Lithographie
|
|
DE60219871T2
(de)
*
|
2001-11-07 |
2008-01-17 |
Asml Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
|
|
US7813634B2
(en)
|
2005-02-28 |
2010-10-12 |
Tessera MEMS Technologies, Inc. |
Autofocus camera
|
|
US7359130B1
(en)
*
|
2002-02-04 |
2008-04-15 |
Siimpel Corporation |
Lens mount and alignment method
|
|
DE10219514A1
(de)
|
2002-04-30 |
2003-11-13 |
Zeiss Carl Smt Ag |
Beleuchtungssystem, insbesondere für die EUV-Lithographie
|
|
DE10226655A1
(de)
*
|
2002-06-14 |
2004-01-08 |
Carl Zeiss Smt Ag |
Vorrichtung zur Positionierung eines optischen Elements in einer Struktur
|
|
US6873478B2
(en)
*
|
2002-06-21 |
2005-03-29 |
Nikon Corporation |
Kinematic lens mount with reduced clamping force
|
|
JP4565261B2
(ja)
|
2002-06-24 |
2010-10-20 |
株式会社ニコン |
光学素子保持機構、光学系鏡筒及び露光装置
|
|
US6922293B2
(en)
|
2002-07-02 |
2005-07-26 |
Nikon Corporation |
Kinematic optical mounting assembly with flexures
|
|
TW200412617A
(en)
*
|
2002-12-03 |
2004-07-16 |
Nikon Corp |
Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
|
|
EP1457834A3
(de)
*
|
2003-03-14 |
2008-10-29 |
Canon Kabushiki Kaisha |
Vorrichtung zur Positionierung, Belichtungsapparat und Verfahren zur Herstellung eines Artikels
|
|
US7002759B2
(en)
*
|
2003-03-20 |
2006-02-21 |
Pentax Corporation |
Lens unit for multibeam scanning device
|
|
AU2003219097A1
(en)
*
|
2003-03-26 |
2004-10-18 |
Carl Zeiss Smt Ag |
Device for the low-deformation replaceable mounting of an optical element
|
|
EP2157480B1
(de)
|
2003-04-09 |
2015-05-27 |
Nikon Corporation |
Belichtungsverfahren und -vorrichtung sowie Herstellungsverfahren für eine Vorrichtung
|
|
JP2004327529A
(ja)
*
|
2003-04-22 |
2004-11-18 |
Canon Inc |
露光装置
|
|
US7760452B2
(en)
*
|
2003-04-25 |
2010-07-20 |
Canon Kabushiki Kaisha |
Driving apparatus, optical system, exposure apparatus and device fabrication method
|
|
JP4574206B2
(ja)
*
|
2003-04-25 |
2010-11-04 |
キヤノン株式会社 |
駆動装置、それを用いた露光装置、デバイスの製造方法
|
|
DE602004024302D1
(de)
*
|
2003-06-06 |
2010-01-07 |
Nippon Kogaku Kk |
Halteeinrichtung für optische elemente, objektivtubus, belichtungseinrichtung und herstellungsverfahren für bauelemente
|
|
ATE489724T1
(de)
|
2003-07-09 |
2010-12-15 |
Nikon Corp |
Belichtungsvorrichtung und verfahren zur bauelementherstellung
|
|
JP4835155B2
(ja)
*
|
2003-07-09 |
2011-12-14 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
|
CN101470361A
(zh)
*
|
2003-07-09 |
2009-07-01 |
株式会社尼康 |
曝光装置以及器件制造方法
|
|
AU2003254364A1
(en)
*
|
2003-07-17 |
2005-03-07 |
Carl Zeiss Smt Ag |
Device for mounting an optical element, particularly a lens in an objective
|
|
WO2005010963A1
(ja)
*
|
2003-07-24 |
2005-02-03 |
Nikon Corporation |
照明光学装置、露光装置および露光方法
|
|
WO2005026801A2
(en)
|
2003-09-12 |
2005-03-24 |
Carl Zeiss Smt Ag |
Apparatus for manipulation of an optical element
|
|
DE60333600D1
(de)
*
|
2003-10-02 |
2010-09-09 |
Zeiss Carl Smt Ag |
Projektionsobjektiv für die halbleiter-lithographie
|
|
US7760327B2
(en)
|
2003-10-02 |
2010-07-20 |
Carl Zeiss Smt Ag |
Reflecting optical element with eccentric optical passageway
|
|
DE102004025832A1
(de)
|
2004-05-24 |
2005-12-22 |
Carl Zeiss Smt Ag |
Optikmodul für ein Objektiv
|
|
TWI609409B
(zh)
|
2003-10-28 |
2017-12-21 |
尼康股份有限公司 |
照明光學裝置、曝光裝置、曝光方法以及元件製造方法
|
|
TWI519819B
(zh)
|
2003-11-20 |
2016-02-01 |
尼康股份有限公司 |
光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
|
|
KR100577696B1
(ko)
*
|
2003-12-15 |
2006-05-10 |
삼성전자주식회사 |
균일한 셀갭을 가질 수 있는 화상액정표시장치
|
|
US7265917B2
(en)
*
|
2003-12-23 |
2007-09-04 |
Carl Zeiss Smt Ag |
Replacement apparatus for an optical element
|
|
US7697222B2
(en)
*
|
2003-12-25 |
2010-04-13 |
Nikon Corporation |
Apparatus for holding optical element, barrel, exposure apparatus, and device producing method
|
|
TWI494972B
(zh)
|
2004-02-06 |
2015-08-01 |
尼康股份有限公司 |
偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
|
|
EP1725910A2
(de)
|
2004-02-25 |
2006-11-29 |
Carl Zeiss SMT AG |
Vorrichtung, die aus mindestens einem optischen element besteht
|
|
WO2005083487A1
(en)
*
|
2004-02-26 |
2005-09-09 |
Carl Zeiss Smt Ag |
Housing structure
|
|
US7581305B2
(en)
*
|
2004-04-12 |
2009-09-01 |
Carl Zeiss Smt Ag |
Method of manufacturing an optical component
|
|
DE102004018656A1
(de)
*
|
2004-04-13 |
2005-11-03 |
Carl Zeiss Smt Ag |
Optisches Element
|
|
DE102004018659A1
(de)
*
|
2004-04-13 |
2005-11-03 |
Carl Zeiss Smt Ag |
Abschlussmodul für eine optische Anordnung
|
|
US7515359B2
(en)
*
|
2004-04-14 |
2009-04-07 |
Carl Zeiss Smt Ag |
Support device for positioning an optical element
|
|
DE102004018228B4
(de)
*
|
2004-04-15 |
2006-02-16 |
Forschungszentrum Karlsruhe Gmbh |
Justageplattform
|
|
US7633691B2
(en)
*
|
2004-06-07 |
2009-12-15 |
Raytheon Company |
Optical mounting for high-g environment
|
|
US7738193B2
(en)
|
2004-06-29 |
2010-06-15 |
Carl Zeiss Smt Ag |
Positioning unit and alignment device for an optical element
|
|
JP2006023359A
(ja)
*
|
2004-07-06 |
2006-01-26 |
Fujinon Corp |
レンズ装置のレンズ支持枠、及びレンズ装置の製造方法
|
|
WO2006016469A1
(ja)
*
|
2004-08-10 |
2006-02-16 |
Nikon Corporation |
照明光学装置、露光装置、および露光方法
|
|
US20060077572A1
(en)
*
|
2004-10-13 |
2006-04-13 |
3M Innovative Properties Company |
Split optic support structure and optical system using split optic support structure
|
|
WO2006059549A1
(ja)
*
|
2004-12-03 |
2006-06-08 |
Nikon Corporation |
照明光学装置、その製造方法、露光装置、および露光方法
|
|
US20060176460A1
(en)
*
|
2005-02-10 |
2006-08-10 |
Nikon Corporation |
Lithographic optical systems including exchangeable optical-element sets
|
|
US20090002670A1
(en)
*
|
2005-03-04 |
2009-01-01 |
Carl Zeiss Smt Ag |
Apparatus for the manipulation and/or adjustment of an optical element
|
|
JP4994598B2
(ja)
*
|
2005-03-18 |
2012-08-08 |
キヤノン株式会社 |
駆動装置
|
|
WO2006119970A2
(en)
*
|
2005-05-09 |
2006-11-16 |
Carl Zeiss Smt Ag |
Assembly for adjusting an optical element
|
|
EP3232270A3
(de)
|
2005-05-12 |
2017-12-13 |
Nikon Corporation |
Optisches projektionssystem, belichtungsvorrichtung und belichtungsverfahren
|
|
US8693006B2
(en)
*
|
2005-06-28 |
2014-04-08 |
Nikon Corporation |
Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
|
|
EP1899756A2
(de)
|
2005-07-01 |
2008-03-19 |
Carl Zeiss SMT AG |
Anordnung zur lagerung eines optischen bauelements
|
|
EP1981066B1
(de)
*
|
2006-01-30 |
2014-01-22 |
Nikon Corporation |
Haltevorrichtung für ein optisches glied und belichtungsvorrichtung
|
|
US8441747B2
(en)
*
|
2006-09-14 |
2013-05-14 |
Carl Zeiss Smt Gmbh |
Optical module with minimized overrun of the optical element
|
|
EP2444829A1
(de)
*
|
2006-09-14 |
2012-04-25 |
Carl Zeiss SMT GmbH |
Optische Elementeinheit und Verfahren zum Stützen eines optischen Elements
|
|
KR20080038050A
(ko)
*
|
2006-10-27 |
2008-05-02 |
캐논 가부시끼가이샤 |
광학 요소 유지장치 및 노광 장치
|
|
JP2008107667A
(ja)
*
|
2006-10-27 |
2008-05-08 |
Canon Inc |
光学要素の保持装置並びにその調整方法及びそれを備えた露光装置
|
|
JP2008112756A
(ja)
*
|
2006-10-27 |
2008-05-15 |
Canon Inc |
光学素子駆動装置及びその制御方法、露光装置、並びにデバイス製造方法
|
|
JP2008203418A
(ja)
*
|
2007-02-19 |
2008-09-04 |
Alps Electric Co Ltd |
光学レンズ及びその製造方法
|
|
JP5043468B2
(ja)
*
|
2007-02-23 |
2012-10-10 |
キヤノン株式会社 |
保持装置
|
|
JP5013906B2
(ja)
*
|
2007-03-05 |
2012-08-29 |
キヤノン株式会社 |
光学素子保持装置
|
|
US8416386B2
(en)
*
|
2007-03-13 |
2013-04-09 |
Nikon Corporation |
Conforming seats for clamps used in mounting an optical element, and optical systems comprising same
|
|
WO2008133234A1
(ja)
*
|
2007-04-23 |
2008-11-06 |
Nikon Corporation |
光学素子保持装置、鏡筒及び露光装置ならびにデバイスの製造方法
|
|
KR20100018547A
(ko)
*
|
2007-05-11 |
2010-02-17 |
가부시키가이샤 니콘 |
광학 소자 구동 장치, 경통 및 노광 장치 및 디바이스의 제조 방법
|
|
US9371855B2
(en)
*
|
2007-05-21 |
2016-06-21 |
The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration |
Flexure based linear and rotary bearings
|
|
WO2008146655A1
(ja)
*
|
2007-05-25 |
2008-12-04 |
Nikon Corporation |
光学素子保持装置、鏡筒及び露光装置ならびにデバイスの製造方法
|
|
JP2008309903A
(ja)
*
|
2007-06-12 |
2008-12-25 |
Canon Inc |
光学素子保持構造、露光装置及びデバイス製造方法
|
|
DE102008040218A1
(de)
|
2007-07-11 |
2009-01-15 |
Carl Zeiss Smt Ag |
Drehbares optisches Element
|
|
WO2009024192A1
(en)
*
|
2007-08-23 |
2009-02-26 |
Carl Zeiss Smt Ag |
Optical element module with minimized parasitic loads
|
|
US7990628B1
(en)
*
|
2007-08-29 |
2011-08-02 |
Tessera MEMS Technologies, Inc. |
Planar flexure system with high pitch stiffness
|
|
US8451427B2
(en)
|
2007-09-14 |
2013-05-28 |
Nikon Corporation |
Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
|
|
DE102007047109A1
(de)
|
2007-10-01 |
2009-04-09 |
Carl Zeiss Smt Ag |
Optisches System, insbesondere Projektionsobjektiv der Mikrolithographie
|
|
JP5267029B2
(ja)
|
2007-10-12 |
2013-08-21 |
株式会社ニコン |
照明光学装置、露光装置及びデバイスの製造方法
|
|
SG10201602750RA
(en)
|
2007-10-16 |
2016-05-30 |
Nikon Corp |
Illumination Optical System, Exposure Apparatus, And Device Manufacturing Method
|
|
KR101562073B1
(ko)
|
2007-10-16 |
2015-10-21 |
가부시키가이샤 니콘 |
조명 광학 시스템, 노광 장치 및 디바이스 제조 방법
|
|
US8379187B2
(en)
|
2007-10-24 |
2013-02-19 |
Nikon Corporation |
Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
|
|
US9116346B2
(en)
|
2007-11-06 |
2015-08-25 |
Nikon Corporation |
Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
|
|
US20090219497A1
(en)
*
|
2008-02-28 |
2009-09-03 |
Carl Zeiss Smt Ag |
Optical device with stiff housing
|
|
DE202008004018U1
(de)
*
|
2008-03-20 |
2008-05-21 |
Oculus Optikgeräte GmbH |
Positioniervorrichtung für ein optisches Element
|
|
DE102008000967B4
(de)
|
2008-04-03 |
2015-04-09 |
Carl Zeiss Smt Gmbh |
Projektionsbelichtungsanlage für die EUV-Mikrolithographie
|
|
JP5324251B2
(ja)
*
|
2008-05-16 |
2013-10-23 |
キヤノンアネルバ株式会社 |
基板保持装置
|
|
KR101695034B1
(ko)
|
2008-05-28 |
2017-01-10 |
가부시키가이샤 니콘 |
공간 광 변조기의 검사 장치, 조명 광학계, 노광 장치, 검사 방법, 조명 광학계의 조정 방법, 조명 방법, 노광 방법, 및 디바이스 제조 방법
|
|
JP2010021526A
(ja)
*
|
2008-06-11 |
2010-01-28 |
Canon Inc |
位置決め装置、位置決め方法、露光装置、デバイス製造方法、並びに、位置決め装置及び露光装置の製造方法
|
|
US8305701B2
(en)
*
|
2008-09-17 |
2012-11-06 |
Carl Zeiss Smt Gmbh |
Connecting arrangement for an optical device
|
|
DE102009044957A1
(de)
*
|
2008-09-30 |
2010-04-08 |
Carl Zeiss Smt Ag |
Stützelemente für ein optisches Element
|
|
JP2010135492A
(ja)
*
|
2008-12-03 |
2010-06-17 |
Canon Inc |
露光装置およびデバイス製造方法
|
|
DE102009054549A1
(de)
|
2008-12-11 |
2010-06-17 |
Carl Zeiss Smt Ag |
Gravitationskompensation für optische Elemente in Projektionsbelichtungsanlagen
|
|
US8294406B2
(en)
*
|
2009-04-06 |
2012-10-23 |
Bhargav Ishwarlal Gajjar |
Parallel kinematics micro-positioning system
|
|
FR2945638B1
(fr)
*
|
2009-05-14 |
2012-01-06 |
Commissariat Energie Atomique |
Dispositif de maintien avec precision d'un composant, notamment optique, et montage comprenant au moins un tel dispositif
|
|
US20110001945A1
(en)
*
|
2009-07-01 |
2011-01-06 |
Masayuki Shiraishi |
Projection optical system, exposure apparatus, and assembly method thereof
|
|
CN102194835A
(zh)
*
|
2010-03-01 |
2011-09-21 |
奇景光电股份有限公司 |
晶圆级镜头模块及其制造方法、晶圆级摄影机
|
|
US20110249176A1
(en)
*
|
2010-04-13 |
2011-10-13 |
Chuan-Ching Hsueh |
Wafer level lens module and related method for forming the same
|
|
DE102010018224A1
(de)
|
2010-04-23 |
2012-02-16 |
Carl Zeiss Smt Gmbh |
Optisches Modul mit einem verstellbaren optischen Element
|
|
DE102010028941B4
(de)
*
|
2010-05-12 |
2012-03-22 |
Carl Zeiss Smt Gmbh |
Vorrichtung für eine optische Anordnung und Verfahren zum Positionieren eines optischen Elements einer optischen Anordnung
|
|
DE102010021539B4
(de)
|
2010-05-19 |
2014-10-09 |
Carl Zeiss Smt Gmbh |
Projektionsobjektiv mit Blenden
|
|
DE102010022934A1
(de)
*
|
2010-06-04 |
2011-12-08 |
Carl Zeiss Ag |
Optische Baugruppe
|
|
CN103064230B
(zh)
*
|
2011-10-19 |
2016-03-09 |
鸿富锦精密工业(深圳)有限公司 |
调焦装置
|
|
JP2013137393A
(ja)
|
2011-12-28 |
2013-07-11 |
Canon Inc |
顕微鏡
|
|
US20140133897A1
(en)
*
|
2012-11-12 |
2014-05-15 |
Micheal Brendan O Ceallaigh |
Flexurally mounted kinematic coupling with improved repeatability
|
|
US20160041361A1
(en)
*
|
2014-08-06 |
2016-02-11 |
Sandia Corporation |
Mounting apparatus
|
|
DE102014113733B3
(de)
*
|
2014-09-23 |
2016-01-14 |
Jenoptik Optical Systems Gmbh |
Optische Linse mit Halteelementen und Fassungsbaugruppe mit optischer Linse
|
|
US9823466B2
(en)
*
|
2015-07-03 |
2017-11-21 |
Panasonic Intellectual Property Management Co., Ltd. |
Optical path changing device and projection image display apparatus
|
|
JP6240142B2
(ja)
*
|
2015-11-26 |
2017-11-29 |
カール・ツァイス・エスエムティー・ゲーエムベーハー |
寄生負荷最小化光学素子モジュール
|
|
JP2017211409A
(ja)
*
|
2016-05-23 |
2017-11-30 |
キヤノン株式会社 |
保持装置、リソグラフィ装置、および物品の製造方法
|
|
WO2017207016A1
(en)
*
|
2016-05-30 |
2017-12-07 |
Carl Zeiss Smt Gmbh |
Optical imaging arrangement with a piezoelectric device
|
|
DE102016215540A1
(de)
*
|
2016-08-18 |
2018-02-22 |
Carl Zeiss Smt Gmbh |
Optisches system, lithographieanlage sowie verfahren
|
|
KR20180068228A
(ko)
|
2016-12-13 |
2018-06-21 |
삼성전자주식회사 |
위치 조정 유닛 및 이를 포함하는 마스크리스 노광 장치
|
|
US10678018B2
(en)
*
|
2017-10-23 |
2020-06-09 |
Magna Electronics Inc. |
Camera for vehicle vision system with replaceable lens
|
|
DE102018203925A1
(de)
*
|
2018-03-15 |
2019-09-19 |
Carl Zeiss Smt Gmbh |
Strahlformungs- und Beleuchtungssystem für eine Lithographieanlage und Verfahren
|
|
GB201804951D0
(en)
|
2018-03-27 |
2018-05-09 |
Pxyl Ltd |
Improved non-linear optical microscope
|
|
US11692816B2
(en)
|
2018-04-27 |
2023-07-04 |
Cognex Corporation |
Mounting arrangement for optical systems
|
|
EP3608627B1
(de)
|
2018-08-09 |
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|
|
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|
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