DE69802185D1 - Vorrichtung mit zwei spiegeln für einen interferometrisch kontrollierten positioniertisch - Google Patents

Vorrichtung mit zwei spiegeln für einen interferometrisch kontrollierten positioniertisch

Info

Publication number
DE69802185D1
DE69802185D1 DE69802185T DE69802185T DE69802185D1 DE 69802185 D1 DE69802185 D1 DE 69802185D1 DE 69802185 T DE69802185 T DE 69802185T DE 69802185 T DE69802185 T DE 69802185T DE 69802185 D1 DE69802185 D1 DE 69802185D1
Authority
DE
Germany
Prior art keywords
mirrors
positioning table
controlled positioning
interferometrically controlled
interferometrically
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69802185T
Other languages
English (en)
Other versions
DE69802185T2 (de
Inventor
Shi-Kay Yao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Etec Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Etec Systems Inc filed Critical Etec Systems Inc
Publication of DE69802185D1 publication Critical patent/DE69802185D1/de
Application granted granted Critical
Publication of DE69802185T2 publication Critical patent/DE69802185T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/002—Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates
    • G01B11/005—Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates coordinate measuring machines
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
DE69802185T 1997-07-08 1998-07-01 Vorrichtung mit zwei spiegeln für einen interferometrisch kontrollierten positioniertisch Expired - Fee Related DE69802185T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US5278997P 1997-07-08 1997-07-08
US09/106,917 US6057921A (en) 1997-07-08 1998-06-29 Two piece mirror arrangement for interferometrically controlled stage
PCT/US1998/013434 WO1999002938A2 (en) 1997-07-08 1998-07-01 Two piece mirror arrangement for interferometrically controlled stage

Publications (2)

Publication Number Publication Date
DE69802185D1 true DE69802185D1 (de) 2001-11-29
DE69802185T2 DE69802185T2 (de) 2002-03-14

Family

ID=26731079

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69802185T Expired - Fee Related DE69802185T2 (de) 1997-07-08 1998-07-01 Vorrichtung mit zwei spiegeln für einen interferometrisch kontrollierten positioniertisch

Country Status (9)

Country Link
US (1) US6057921A (de)
EP (1) EP0983481B1 (de)
JP (1) JP2002508079A (de)
KR (1) KR20010014187A (de)
CA (1) CA2296276A1 (de)
DE (1) DE69802185T2 (de)
IL (1) IL133750A0 (de)
TW (1) TW390957B (de)
WO (1) WO1999002938A2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW429414B (en) * 1998-08-11 2001-04-11 Nippon Kogaku Kk Stage apparatus, position detector and exposure device
US6822745B2 (en) 2000-01-25 2004-11-23 Zygo Corporation Optical systems for measuring form and geometric dimensions of precision engineered parts
US6728016B1 (en) 2000-06-05 2004-04-27 Calient Networks, Inc. Safe procedure for moving mirrors in an optical cross-connect switch
US6587611B1 (en) 2000-06-06 2003-07-01 Calient Networks, Inc. Maintaining path integrity in an optical switch
US6842248B1 (en) * 2000-11-28 2005-01-11 Nikon Corporation System and method for calibrating mirrors of a stage assembly
US6823278B1 (en) 2001-01-26 2004-11-23 Ta Instruments-Waters, Llc Method and apparatus for positional calibration of a thermal analysis instrument
US6760679B1 (en) * 2001-01-26 2004-07-06 Ta Instruments-Waters, Llc Method and apparatus for positional calibration of a thermal analysis instrument
JP2005525548A (ja) * 2002-05-13 2005-08-25 ザイゴ　コーポレーション 平面ミラー干渉計におけるビーム・ミスアライメントの幾何学的影響の補償
US7025498B2 (en) * 2003-05-30 2006-04-11 Asml Holding N.V. System and method of measuring thermal expansion
JP2007526450A (ja) * 2003-06-19 2007-09-13 ザイゴ　コーポレーション 平面ミラー干渉計測定システムにおけるビーム・ミスアライメントの幾何学的な影響に対する補償
US7102736B2 (en) * 2004-06-29 2006-09-05 Asml Netherlands B.V. Method of calibration, calibration substrate, and method of device manufacture
US7511816B2 (en) * 2005-06-16 2009-03-31 Kla-Tencor Technologies Corp. Methods and systems for determining drift in a position of a light beam with respect to a chuck
GB2443644B (en) * 2006-11-09 2010-01-20 Vistec Lithography Ltd Component mounting in movement sensitive equipment
US20100020331A1 (en) * 2008-07-25 2010-01-28 Micronic Laser Systems Ab Laser interferometer systems and methods with suppressed error and pattern generators having the same
RU2446380C1 (ru) * 2010-12-23 2012-03-27 Государственное образовательное учреждение высшего профессионального образования "Санкт-Петербургский государственный электротехнический университет "ЛЭТИ" Способ оценивания отклонения от перпендикулярности двух осей
CN105043269B (zh) * 2015-07-08 2017-09-29 上海与德通讯技术有限公司 一种物体尺寸的测量方法及电子设备
KR101694674B1 (ko) 2015-09-14 2017-01-10 주식회사 힘스 검사용 카메라의 캘리브레이션 장치
CN105629678B (zh) * 2016-01-25 2017-09-19 苏州苏大维格光电科技股份有限公司 一种直写系统运动平台的正交性测定方法
CN110345870B (zh) * 2019-08-09 2020-12-04 合肥工业大学 一种精密直线位移台的五自由度误差测量装置
CN112066961B (zh) * 2020-09-15 2021-04-13 山东鑫诚精密机械有限公司 精密测量阿贝误差控制系统

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8730169D0 (en) * 1987-12-24 1988-02-03 Renishaw Plc Optical apparatus for use with interferometric measuring devices
US5151749A (en) * 1989-06-08 1992-09-29 Nikon Corporation Method of and apparatus for measuring coordinate position and positioning an object
US5363196A (en) * 1992-01-10 1994-11-08 Ultratech Stepper, Inc. Apparatus for measuring a departure from flatness or straightness of a nominally-plane mirror for a precision X-Y movable-stage
JP3282233B2 (ja) * 1992-08-18 2002-05-13 株式会社ニコン 距離測定装置、及びそれを用いた投影露光装置

Also Published As

Publication number Publication date
TW390957B (en) 2000-05-21
EP0983481A2 (de) 2000-03-08
IL133750A0 (en) 2001-04-30
JP2002508079A (ja) 2002-03-12
CA2296276A1 (en) 1999-01-21
WO1999002938A2 (en) 1999-01-21
US6057921A (en) 2000-05-02
WO1999002938A3 (en) 1999-04-22
DE69802185T2 (de) 2002-03-14
EP0983481B1 (de) 2001-10-24
KR20010014187A (ko) 2001-02-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee
8327 Change in the person/name/address of the patent owner

Owner name: APPLIED MATERIALS, INC. (N.D.GES.D. STAATES DELAWA