WO2008146655A1 - 光学素子保持装置、鏡筒及び露光装置ならびにデバイスの製造方法 - Google Patents
光学素子保持装置、鏡筒及び露光装置ならびにデバイスの製造方法 Download PDFInfo
- Publication number
- WO2008146655A1 WO2008146655A1 PCT/JP2008/059210 JP2008059210W WO2008146655A1 WO 2008146655 A1 WO2008146655 A1 WO 2008146655A1 JP 2008059210 W JP2008059210 W JP 2008059210W WO 2008146655 A1 WO2008146655 A1 WO 2008146655A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- block
- optical element
- element holding
- connecting block
- lens barrel
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/028—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/021—Mountings, adjusting means, or light-tight connections, for optical elements for lenses for more than one lens
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Lens Barrels (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009516258A JPWO2008146655A1 (ja) | 2007-05-25 | 2008-05-20 | 光学素子保持装置、鏡筒及び露光装置ならびにデバイスの製造方法 |
CN200880100236A CN101772720A (zh) | 2007-05-25 | 2008-05-20 | 光学元件保持装置、镜筒、曝光装置以及器件的制造方法 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-138913 | 2007-05-25 | ||
JP2007138913 | 2007-05-25 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008146655A1 true WO2008146655A1 (ja) | 2008-12-04 |
Family
ID=40072148
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2008/059210 WO2008146655A1 (ja) | 2007-05-25 | 2008-05-20 | 光学素子保持装置、鏡筒及び露光装置ならびにデバイスの製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20080291555A1 (ja) |
JP (1) | JPWO2008146655A1 (ja) |
KR (1) | KR20100018581A (ja) |
CN (1) | CN101772720A (ja) |
WO (1) | WO2008146655A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102004409A (zh) * | 2009-08-28 | 2011-04-06 | 株式会社理光 | 曝光装置以及图像形成装置 |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009024192A1 (en) * | 2007-08-23 | 2009-02-26 | Carl Zeiss Smt Ag | Optical element module with minimized parasitic loads |
JP5317624B2 (ja) * | 2008-10-17 | 2013-10-16 | キヤノン株式会社 | 保持装置、望遠鏡および光学装置 |
JP2011090250A (ja) * | 2009-10-26 | 2011-05-06 | Canon Inc | 光学装置、それを用いた露光装置及びデバイスの製造方法 |
DE102010022934A1 (de) * | 2010-06-04 | 2011-12-08 | Carl Zeiss Ag | Optische Baugruppe |
US9166116B2 (en) * | 2012-05-29 | 2015-10-20 | Formosa Epitaxy Incorporation | Light emitting device |
US20160041361A1 (en) * | 2014-08-06 | 2016-02-11 | Sandia Corporation | Mounting apparatus |
US20180239102A1 (en) * | 2017-02-20 | 2018-08-23 | Corning Incorporated | Optical mount |
JP7093221B2 (ja) * | 2018-04-26 | 2022-06-29 | キヤノン株式会社 | 光学装置の調整方法、光学装置の製造方法、および、物品製造方法 |
CN112068277B (zh) * | 2020-08-31 | 2021-08-20 | 中国科学院长春光学精密机械与物理研究所 | 大口径光学透镜的多级柔性支撑结构 |
CN114679532B (zh) * | 2022-05-27 | 2022-08-02 | 苏州次源科技服务有限公司 | 一种带减震系统的运动图像传感器 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57208516A (en) * | 1981-06-19 | 1982-12-21 | Olympus Optical Co Ltd | Plastic lens whose lens interval varies with temperature and lens holder |
JPH02287308A (ja) * | 1989-04-03 | 1990-11-27 | Mikhailovich Khodosovich Vladimir | 光学ユニットのマウント内のレンズの中心合わせの方法 |
JP2005250495A (ja) * | 2004-02-26 | 2005-09-15 | Carl Zeiss Smt Ag | 少なくとも1つの光学エレメントを備える対物レンズ |
JP2006349946A (ja) * | 2005-06-15 | 2006-12-28 | Nikon Corp | 光学素子保持装置、鏡筒及び露光装置並びにデバイスの製造方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4733945A (en) * | 1986-01-15 | 1988-03-29 | The Perkin-Elmer Corporation | Precision lens mounting |
US4929054A (en) * | 1986-04-28 | 1990-05-29 | The Perkin-Elmer Corporation | Mounting for high resolution projection lenses |
US5986827A (en) * | 1998-06-17 | 1999-11-16 | The Regents Of The University Of California | Precision tip-tilt-piston actuator that provides exact constraint |
US6239924B1 (en) * | 1999-08-31 | 2001-05-29 | Nikon Corporation | Kinematic lens mounting with distributed support and radial flexure |
AUPQ605800A0 (en) * | 2000-03-06 | 2000-03-30 | Silverbrook Research Pty Ltd | Printehead assembly |
JP4809987B2 (ja) * | 2000-03-30 | 2011-11-09 | キヤノン株式会社 | 光学要素の支持構造、それを用いた露光装置及び半導体デバイスの製造方法 |
US6473245B1 (en) * | 2000-08-10 | 2002-10-29 | Nikon Corporation | Catadioptric lens barrel structure having a plurality of support platforms and method of making the same |
US7154684B2 (en) * | 2000-08-18 | 2006-12-26 | Nikon Corporation | Optical element holding apparatus |
JP4310086B2 (ja) * | 2002-08-01 | 2009-08-05 | 株式会社日立製作所 | エンジン用電子機器 |
GB0224044D0 (en) * | 2002-10-16 | 2002-11-27 | Dow Corning | Silicone resins |
JP2004150402A (ja) * | 2002-11-01 | 2004-05-27 | Hitachi High-Technologies Corp | 液体クロマトグラフ用ポンプ |
KR20060048937A (ko) * | 2004-08-03 | 2006-05-18 | 가부시키가이샤 에키쇼센탄 기쥬쓰 가이하쓰센타 | 레이저 결정화 장치 |
-
2008
- 2008-05-20 WO PCT/JP2008/059210 patent/WO2008146655A1/ja active Application Filing
- 2008-05-20 KR KR1020097026843A patent/KR20100018581A/ko not_active Application Discontinuation
- 2008-05-20 CN CN200880100236A patent/CN101772720A/zh active Pending
- 2008-05-20 JP JP2009516258A patent/JPWO2008146655A1/ja active Pending
- 2008-05-23 US US12/126,621 patent/US20080291555A1/en not_active Abandoned
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57208516A (en) * | 1981-06-19 | 1982-12-21 | Olympus Optical Co Ltd | Plastic lens whose lens interval varies with temperature and lens holder |
JPH02287308A (ja) * | 1989-04-03 | 1990-11-27 | Mikhailovich Khodosovich Vladimir | 光学ユニットのマウント内のレンズの中心合わせの方法 |
JP2005250495A (ja) * | 2004-02-26 | 2005-09-15 | Carl Zeiss Smt Ag | 少なくとも1つの光学エレメントを備える対物レンズ |
JP2006349946A (ja) * | 2005-06-15 | 2006-12-28 | Nikon Corp | 光学素子保持装置、鏡筒及び露光装置並びにデバイスの製造方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102004409A (zh) * | 2009-08-28 | 2011-04-06 | 株式会社理光 | 曝光装置以及图像形成装置 |
CN102004409B (zh) * | 2009-08-28 | 2014-02-26 | 株式会社理光 | 曝光装置以及图像形成装置 |
US8760483B2 (en) | 2009-08-28 | 2014-06-24 | Ricoh Company, Limited | Exposure device and image forming apparatus including same |
Also Published As
Publication number | Publication date |
---|---|
CN101772720A (zh) | 2010-07-07 |
JPWO2008146655A1 (ja) | 2010-08-19 |
KR20100018581A (ko) | 2010-02-17 |
US20080291555A1 (en) | 2008-11-27 |
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