NL1036253A1 - Lithographic apparatus and device manufacturing method. - Google Patents

Lithographic apparatus and device manufacturing method. Download PDF

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Publication number
NL1036253A1
NL1036253A1 NL1036253A NL1036253A NL1036253A1 NL 1036253 A1 NL1036253 A1 NL 1036253A1 NL 1036253 A NL1036253 A NL 1036253A NL 1036253 A NL1036253 A NL 1036253A NL 1036253 A1 NL1036253 A1 NL 1036253A1
Authority
NL
Netherlands
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
NL1036253A
Other languages
English (en)
Inventor
Koen Steffens
Paulus Martinus Maria Liebregts
Ronald Van Der Ham
Daniel Jozef Maria Direcks
Gert-Jan Gerardus Johan Brands
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL1036253A1 publication Critical patent/NL1036253A1/nl

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
NL1036253A 2007-12-10 2008-11-28 Lithographic apparatus and device manufacturing method. NL1036253A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US99687807P 2007-12-10 2007-12-10

Publications (1)

Publication Number Publication Date
NL1036253A1 true NL1036253A1 (nl) 2009-06-11

Family

ID=40721292

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1036253A NL1036253A1 (nl) 2007-12-10 2008-11-28 Lithographic apparatus and device manufacturing method.

Country Status (3)

Country Link
US (1) US8218126B2 (nl)
JP (1) JP2009141359A (nl)
NL (1) NL1036253A1 (nl)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1036631A1 (nl) * 2008-03-24 2009-09-25 Asml Netherlands Bv Immersion Lithographic Apparatus and Device Manufacturing Method.
EP2131241B1 (en) * 2008-05-08 2019-07-31 ASML Netherlands B.V. Fluid handling structure, lithographic apparatus and device manufacturing method
EP2381310B1 (en) * 2010-04-22 2015-05-06 ASML Netherlands BV Fluid handling structure and lithographic apparatus
NL2009271A (en) * 2011-09-15 2013-03-18 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
EP3510446B1 (en) * 2016-09-12 2022-10-05 ASML Netherlands B.V. Fluid handling structure for lithographic apparatus

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4509852A (en) 1980-10-06 1985-04-09 Werner Tabarelli Apparatus for the photolithographic manufacture of integrated circuit elements
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
EP1420300B1 (en) 2002-11-12 2015-07-29 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP3977324B2 (ja) 2002-11-12 2007-09-19 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
USRE46433E1 (en) 2002-12-19 2017-06-13 Asml Netherlands B.V. Method and device for irradiating spots on a layer
JP4604452B2 (ja) 2003-02-26 2011-01-05 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
JP4428115B2 (ja) 2003-04-11 2010-03-10 株式会社ニコン 液浸リソグラフィシステム
WO2004092830A2 (en) 2003-04-11 2004-10-28 Nikon Corporation Liquid jet and recovery system for immersion lithography
JP4515335B2 (ja) 2004-06-10 2010-07-28 株式会社ニコン 露光装置、ノズル部材、及びデバイス製造方法
EP2624282B1 (en) 2004-06-10 2017-02-08 Nikon Corporation Immersion exposure apparatus and method, and methods for producing a device
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7423720B2 (en) 2004-11-12 2008-09-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7161654B2 (en) 2004-12-02 2007-01-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
SG124351A1 (en) 2005-01-14 2006-08-30 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7474379B2 (en) * 2005-06-28 2009-01-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7804577B2 (en) 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
US8144305B2 (en) 2006-05-18 2012-03-27 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8634053B2 (en) 2006-12-07 2014-01-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4902505B2 (ja) 2006-12-07 2012-03-21 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置およびデバイス製造方法

Also Published As

Publication number Publication date
US8218126B2 (en) 2012-07-10
JP2009141359A (ja) 2009-06-25
US20090147227A1 (en) 2009-06-11

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