NL1036313A1 - Device manufacturing method and lithographic apparatus. - Google Patents

Device manufacturing method and lithographic apparatus. Download PDF

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Publication number
NL1036313A1
NL1036313A1 NL1036313A NL1036313A NL1036313A1 NL 1036313 A1 NL1036313 A1 NL 1036313A1 NL 1036313 A NL1036313 A NL 1036313A NL 1036313 A NL1036313 A NL 1036313A NL 1036313 A1 NL1036313 A1 NL 1036313A1
Authority
NL
Netherlands
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
NL1036313A
Other languages
English (en)
Inventor
Haico Victor Kok
Johannes Jacobus Matheus Baselmans
Marcus Adrianus Van De Kerkhof
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of NL1036313A1 publication Critical patent/NL1036313A1/nl

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
NL1036313A 2007-12-27 2008-12-12 Device manufacturing method and lithographic apparatus. NL1036313A1 (nl)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US919407P 2007-12-27 2007-12-27

Publications (1)

Publication Number Publication Date
NL1036313A1 true NL1036313A1 (nl) 2009-06-30

Family

ID=40797839

Family Applications (1)

Application Number Title Priority Date Filing Date
NL1036313A NL1036313A1 (nl) 2007-12-27 2008-12-12 Device manufacturing method and lithographic apparatus.

Country Status (3)

Country Link
US (1) US8049864B2 (nl)
JP (1) JP5060464B2 (nl)
NL (1) NL1036313A1 (nl)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2317386B1 (en) * 2008-12-23 2012-07-11 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
US8164046B2 (en) * 2009-07-16 2012-04-24 Carl Zeiss Smt Gmbh Illumination system for illuminating a mask in a microlithographic projection exposure apparatus
DE102010044969A1 (de) * 2010-09-10 2012-03-15 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer Projektionsbelichtungsanlage sowie Steuervorrichtung
US8823921B2 (en) 2011-08-19 2014-09-02 Ultratech, Inc. Programmable illuminator for a photolithography system
US8823930B2 (en) * 2012-08-07 2014-09-02 Carl Zeiss Industrielle Messtechnik Gmbh Apparatus and method for inspecting an object
US9335206B2 (en) * 2012-08-30 2016-05-10 Kla-Tencor Corporation Wave front aberration metrology of optics of EUV mask inspection system
DE102013217269A1 (de) * 2013-08-29 2015-03-05 Carl Zeiss Smt Gmbh Mikrospiegel-Array
US9739719B2 (en) * 2014-10-31 2017-08-22 Kla-Tencor Corporation Measurement systems having linked field and pupil signal detection

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH113849A (ja) * 1997-06-12 1999-01-06 Sony Corp 可変変形照明フィルタ及び半導体露光装置
US6737662B2 (en) 2001-06-01 2004-05-18 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product
JP3796464B2 (ja) * 2002-04-24 2006-07-12 キヤノン株式会社 投影光学系の収差計測方法
WO2005069079A1 (de) * 2004-01-16 2005-07-28 Carl Zeiss Smt Ag Vorrichtung und verfahren zur wellenfrontvermessung eines optischen abbildungssystems und mikrolithographie-projektionsbelichtungsanlage
US7308368B2 (en) * 2004-09-15 2007-12-11 Asml Netherlands B.V. Method and apparatus for vibration detection, method and apparatus for vibration analysis, lithographic apparatus, device manufacturing method, and computer program
US20070081138A1 (en) * 2005-10-11 2007-04-12 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing methods and mask for use in a device manufacturing method

Also Published As

Publication number Publication date
JP5060464B2 (ja) 2012-10-31
JP2009158959A (ja) 2009-07-16
US8049864B2 (en) 2011-11-01
US20090168039A1 (en) 2009-07-02

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