JP6803842B2 - オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング - Google Patents
オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング Download PDFInfo
- Publication number
- JP6803842B2 JP6803842B2 JP2017536545A JP2017536545A JP6803842B2 JP 6803842 B2 JP6803842 B2 JP 6803842B2 JP 2017536545 A JP2017536545 A JP 2017536545A JP 2017536545 A JP2017536545 A JP 2017536545A JP 6803842 B2 JP6803842 B2 JP 6803842B2
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- Prior art keywords
- formulation
- amu
- silicon
- weight
- coating
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J3/00—Processes of treating or compounding macromolecular substances
- C08J3/24—Crosslinking, e.g. vulcanising, of macromolecules
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/80—Siloxanes having aromatic substituents, e.g. phenyl side groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2383/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
- C08J2383/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
- C08J2483/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
- C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Paints Or Removers (AREA)
- Manufacturing & Machinery (AREA)
- Silicon Polymers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201562146593P | 2015-04-13 | 2015-04-13 | |
| US62/146,593 | 2015-04-13 | ||
| PCT/US2016/020373 WO2016167892A1 (en) | 2015-04-13 | 2016-03-02 | Polysiloxane formulations and coatings for optoelectronic applications |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2018516998A JP2018516998A (ja) | 2018-06-28 |
| JP2018516998A5 JP2018516998A5 (https=) | 2019-03-14 |
| JP6803842B2 true JP6803842B2 (ja) | 2020-12-23 |
Family
ID=57126335
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2017536545A Active JP6803842B2 (ja) | 2015-04-13 | 2016-03-02 | オプトエレクトロニクス用途のためのポリシロキサン製剤及びコーティング |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10544329B2 (https=) |
| EP (1) | EP3194502A4 (https=) |
| JP (1) | JP6803842B2 (https=) |
| KR (1) | KR102595033B1 (https=) |
| CN (1) | CN106065278B (https=) |
| TW (1) | TWI716384B (https=) |
| WO (1) | WO2016167892A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11015082B2 (en) * | 2017-12-19 | 2021-05-25 | Honeywell International Inc. | Crack-resistant polysiloxane dielectric planarizing compositions, methods and films |
| US10947412B2 (en) | 2017-12-19 | 2021-03-16 | Honeywell International Inc. | Crack-resistant silicon-based planarizing compositions, methods and films |
| JP7319588B2 (ja) * | 2018-09-21 | 2023-08-02 | 日産化学株式会社 | 固体撮像素子用平坦化膜形成樹脂組成物 |
| CN117043276A (zh) | 2021-03-25 | 2023-11-10 | 株式会社日本触媒 | 聚倍半硅氧烷组合物和固化物 |
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-
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- 2016-03-02 JP JP2017536545A patent/JP6803842B2/ja active Active
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- 2016-03-02 EP EP16780418.6A patent/EP3194502A4/en not_active Withdrawn
- 2016-03-04 KR KR1020160026610A patent/KR102595033B1/ko active Active
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Also Published As
| Publication number | Publication date |
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| CN106065278A (zh) | 2016-11-02 |
| TW201704346A (zh) | 2017-02-01 |
| EP3194502A1 (en) | 2017-07-26 |
| CN106065278B (zh) | 2021-08-10 |
| TWI716384B (zh) | 2021-01-21 |
| US20180022957A1 (en) | 2018-01-25 |
| KR20160122056A (ko) | 2016-10-21 |
| EP3194502A4 (en) | 2018-05-16 |
| JP2018516998A (ja) | 2018-06-28 |
| WO2016167892A1 (en) | 2016-10-20 |
| KR102595033B1 (ko) | 2023-10-26 |
| US10544329B2 (en) | 2020-01-28 |
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