ES2060579T3 - Material de impresion a base de resina fotosensible. - Google Patents
Material de impresion a base de resina fotosensible.Info
- Publication number
- ES2060579T3 ES2060579T3 ES86202205T ES86202205T ES2060579T3 ES 2060579 T3 ES2060579 T3 ES 2060579T3 ES 86202205 T ES86202205 T ES 86202205T ES 86202205 T ES86202205 T ES 86202205T ES 2060579 T3 ES2060579 T3 ES 2060579T3
- Authority
- ES
- Spain
- Prior art keywords
- photosensitive resin
- printing material
- material based
- layer
- substance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Conversion Of X-Rays Into Visible Images (AREA)
- Laminated Bodies (AREA)
Abstract
UN MATERIAL DE IMPRENTA A BASE DE RESINA FOTOSENSIBLE EN FORMA DE LAMINA, QUE COMPRENDE, EN ORDEN SUCESIVO, UN SOPORTE, UNA CAPA DE RESINA FOTOSENSIBLE, UNA DELGADA CAPA DE UNA SUSTANCIA DE PESO MOLECULAR ELEVADO, QUE ES SOLUBLE O SUMERGIBLE EN UN DESARROLLANTE, UNA CAPA DE EMISION OPCIONAL, Y UNA HOJA O PELICULA DE LECHO PROTECTOR, QUE SE CARACTERIZA POR QUE SE INCLUYE EN DICHA CAPA DELGADA UN COLORANTE, EN UNA CANTIDAD DE 0,02 A 20% EN PESO DE LA SUSTANCIA DE PESO MOLECULAR ELEVADO. EL PRESENTE MATERIAL DE IMPRENTA ES ESPECIFICAMENTE EXCELENTE PARA RESOLUCION Y MUY MEJORADO CUANDO SE COMPARA CON EL MATERIAL DE IMPRENTA PROPUESTO HASTA AHORA RESPECTO DE LA MANIPULACION Y DE LAS PROPIEDADES DE INSPECCION VISUAL.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27653185 | 1985-12-09 | ||
JP24683586A JPS62229127A (ja) | 1985-12-09 | 1986-10-16 | 感光性樹脂版材 |
Publications (1)
Publication Number | Publication Date |
---|---|
ES2060579T3 true ES2060579T3 (es) | 1994-12-01 |
Family
ID=26537931
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES86202205T Expired - Lifetime ES2060579T3 (es) | 1985-12-09 | 1986-12-08 | Material de impresion a base de resina fotosensible. |
Country Status (6)
Country | Link |
---|---|
US (1) | US5039592A (es) |
EP (1) | EP0225676B1 (es) |
AU (1) | AU593046B2 (es) |
CA (1) | CA1325354C (es) |
DE (1) | DE3689949T2 (es) |
ES (1) | ES2060579T3 (es) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1314752C (en) * | 1988-04-13 | 1993-03-23 | Hisao Satoh | Photosensitive resin plate for flexography |
DE68928789T2 (de) * | 1988-05-18 | 1998-12-24 | Toray Industries, Inc., Tokio/Tokyo | Druckplatte |
US6040116A (en) * | 1989-03-17 | 2000-03-21 | Basf Aktiengesellschaft | Photosensitive recording element having a recording layer and a top layer possessing different solubility properties, and its development in one operation |
US5258261A (en) * | 1991-08-30 | 1993-11-02 | Minnesota Mining And Manufacturing Company | Anti-blocking, water soluble top coat for color proofing films |
US6916596B2 (en) | 1993-06-25 | 2005-07-12 | Michael Wen-Chein Yang | Laser imaged printing plates |
DE4339010C2 (de) * | 1993-06-25 | 2000-05-18 | Pt Sub Inc | Photohärtbares Erzeugnis für Druckplatten |
US6756181B2 (en) | 1993-06-25 | 2004-06-29 | Polyfibron Technologies, Inc. | Laser imaged printing plates |
US5496685A (en) * | 1993-09-17 | 1996-03-05 | Chase Elastomer Corporation | Photosensitive compositions and elements for flexographic printing |
US5830620A (en) * | 1995-09-12 | 1998-11-03 | Nippon Paint Co., Ltd. | Water developable flexographic printing plate |
DE19711696C1 (de) * | 1997-03-20 | 1998-11-12 | Basf Drucksysteme Gmbh | Verfahren zum Herstellen eines photopolymerisierbaren Aufzeichungsmaterials |
US6010822A (en) * | 1997-12-02 | 2000-01-04 | Macdermid, Incorporated | Process for preparing a nitrocellulose coated polypropylene film |
CA2374944A1 (en) | 1999-06-10 | 2000-12-21 | Nigel Hacker | Spin-on-glass anti-reflective coatings for photolithography |
US6824879B2 (en) | 1999-06-10 | 2004-11-30 | Honeywell International Inc. | Spin-on-glass anti-reflective coatings for photolithography |
US6461794B1 (en) * | 1999-08-11 | 2002-10-08 | Kodak Polychrome Graphics Llc | Lithographic printing forms |
IL133355A (en) * | 1999-12-07 | 2003-10-31 | Creo Il Ltd | Method and plate for digitally-imaged offset printing |
DE60043974D1 (de) | 1999-12-07 | 2010-04-22 | Du Pont | Photoentfärbbare Verbindungen enthaltende, photopolymerisierbare Zusammensetzungen und ihre Verwendung in flexographischen Druckplatten |
EP1257873A2 (en) * | 2000-12-14 | 2002-11-20 | Koninklijke Philips Electronics N.V. | Liquid crystal display laminate and method of manufacturing such |
AU2002227106A1 (en) | 2001-11-15 | 2003-06-10 | Honeywell International Inc. | Spin-on anti-reflective coatings for photolithography |
KR100942485B1 (ko) * | 2002-04-02 | 2010-02-12 | 도요 보세키 가부시키가이샤 | 감광성 인쇄 원판 |
US8053159B2 (en) | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
US7736836B2 (en) * | 2004-09-22 | 2010-06-15 | Jonghan Choi | Slip film compositions containing layered silicates |
US8642246B2 (en) | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
US8530142B2 (en) | 2011-03-15 | 2013-09-10 | Eastman Kodak Company | Flexographic printing plate precursor, imaging assembly, and use |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
US8771926B2 (en) * | 2011-06-27 | 2014-07-08 | Kyle P. Baldwin | Slip film for relief image printing element |
EP3194502A4 (en) | 2015-04-13 | 2018-05-16 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA993709A (en) * | 1971-01-21 | 1976-07-27 | Leo Roos | Composite, mask-forming photohardenable elements |
NL7216227A (es) * | 1972-11-30 | 1974-06-04 | ||
GB2032125A (en) * | 1978-10-20 | 1980-04-30 | Agfa Gevaert Nv | A Method of Providing Contrast Reduction in Image Reproduction with a Diazotype Material and Diazotype Materials Adapted for the Application of said Method |
JPS5734557A (en) * | 1980-08-07 | 1982-02-24 | Toray Ind Inc | Preventing method for sticking of surface of water-developable photosensitive polyamide resin layer |
IT1159073B (it) * | 1981-07-22 | 1987-02-25 | Basf Ag | Metodo per migliorare la preparazione,l'essiccazione e la immagazzinabilita' di elementi pluristrato adatti per la preparazione di stampi per stampaggio a rilievo |
JPS58178348A (ja) * | 1982-04-13 | 1983-10-19 | Nippon Synthetic Chem Ind Co Ltd:The | 画像形成法 |
IE56081B1 (en) * | 1982-11-01 | 1991-04-10 | Microsi Inc | A method of producing images of enhanced contrast in photoresists |
US4677049A (en) * | 1983-09-28 | 1987-06-30 | General Electric Company | Spin castable photobleachable layer forming compositions |
US4663275A (en) * | 1984-09-04 | 1987-05-05 | General Electric Company | Photolithographic method and combination including barrier layer |
US4623611A (en) * | 1985-01-16 | 1986-11-18 | General Electric Company | Photolithographic stripping method for removing contrast enhancement layer |
-
1986
- 1986-12-08 DE DE3689949T patent/DE3689949T2/de not_active Expired - Fee Related
- 1986-12-08 ES ES86202205T patent/ES2060579T3/es not_active Expired - Lifetime
- 1986-12-08 CA CA000524766A patent/CA1325354C/en not_active Expired - Fee Related
- 1986-12-08 EP EP86202205A patent/EP0225676B1/en not_active Expired - Lifetime
- 1986-12-09 AU AU66356/86A patent/AU593046B2/en not_active Ceased
-
1990
- 1990-05-17 US US07/525,116 patent/US5039592A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE3689949D1 (de) | 1994-08-11 |
AU593046B2 (en) | 1990-02-01 |
EP0225676B1 (en) | 1994-07-06 |
EP0225676A3 (en) | 1989-03-15 |
AU6635686A (en) | 1987-06-11 |
DE3689949T2 (de) | 1995-03-16 |
EP0225676A2 (en) | 1987-06-16 |
CA1325354C (en) | 1993-12-21 |
US5039592A (en) | 1991-08-13 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FG2A | Definitive protection |
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