FR2288994A1 - Film d'impression lithographique - Google Patents

Film d'impression lithographique

Info

Publication number
FR2288994A1
FR2288994A1 FR7532134A FR7532134A FR2288994A1 FR 2288994 A1 FR2288994 A1 FR 2288994A1 FR 7532134 A FR7532134 A FR 7532134A FR 7532134 A FR7532134 A FR 7532134A FR 2288994 A1 FR2288994 A1 FR 2288994A1
Authority
FR
France
Prior art keywords
print film
lithographic print
lithographic
film
print
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7532134A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Production Printing Holding BV
Original Assignee
Oce Van der Grinten NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oce Van der Grinten NV filed Critical Oce Van der Grinten NV
Publication of FR2288994A1 publication Critical patent/FR2288994A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/56—Organic absorbers, e.g. of photo-resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/795—Photosensitive materials characterised by the base or auxiliary layers the base being of macromolecular substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
FR7532134A 1974-10-23 1975-10-21 Film d'impression lithographique Withdrawn FR2288994A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL7413844A NL7413844A (nl) 1974-10-23 1974-10-23 Lithografische kopieerfilm.

Publications (1)

Publication Number Publication Date
FR2288994A1 true FR2288994A1 (fr) 1976-05-21

Family

ID=19822318

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7532134A Withdrawn FR2288994A1 (fr) 1974-10-23 1975-10-21 Film d'impression lithographique

Country Status (6)

Country Link
JP (1) JPS5166002A (fr)
DE (1) DE2547335A1 (fr)
FR (1) FR2288994A1 (fr)
GB (1) GB1525757A (fr)
NL (1) NL7413844A (fr)
SE (1) SE7511027L (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4472494A (en) * 1980-09-15 1984-09-18 Napp Systems (Usa), Inc. Bilayer photosensitive imaging article
CA1180931A (fr) * 1980-09-15 1985-01-15 Robert W. Hallman Systeme photosensible a deux couches pour la formation d'images avec, dans la couche-image, une copolymere bimodal de styrene et d'anhydride maleique constituant la pellicule
JPS5837639A (ja) * 1981-07-31 1983-03-04 Konishiroku Photo Ind Co Ltd 画像形成材料
US4729935A (en) * 1982-03-18 1988-03-08 Hoechst Celanese Corporation Process for the production of photographic images utilizing a negative working diazo contact film
US4511640A (en) * 1983-08-25 1985-04-16 American Hoechst Corporation Aqueous developable diazo lithographic printing plates with admixture of polyvinyl acetate and styrene maleic acid ester copolymer
EP0151191A1 (fr) * 1984-01-25 1985-08-14 American Hoechst Corporation Matériel photosensible pour la fabrication d'originaux
US4564589A (en) * 1984-02-06 1986-01-14 Advanced Imaging Systems Ltd. Image-forming composite with film
US4618562A (en) * 1984-12-27 1986-10-21 American Hoechst Corporation Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor

Also Published As

Publication number Publication date
GB1525757A (en) 1978-09-20
DE2547335A1 (de) 1976-04-29
NL7413844A (nl) 1976-04-27
SE7511027L (sv) 1976-04-26
JPS5166002A (fr) 1976-06-08

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Legal Events

Date Code Title Description
ST Notification of lapse