EP1478682A4 - Anti-reflective coatings for photolithography and methods of preparation thereof - Google Patents
Anti-reflective coatings for photolithography and methods of preparation thereofInfo
- Publication number
- EP1478682A4 EP1478682A4 EP02793921A EP02793921A EP1478682A4 EP 1478682 A4 EP1478682 A4 EP 1478682A4 EP 02793921 A EP02793921 A EP 02793921A EP 02793921 A EP02793921 A EP 02793921A EP 1478682 A4 EP1478682 A4 EP 1478682A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- photolithography
- preparation
- methods
- reflective coatings
- coatings
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US2001/045306 WO2003044600A1 (en) | 2001-11-15 | 2001-11-15 | Spin-on anti-reflective coatings for photolithography |
US1143 | 2001-11-15 | ||
US10/001,143 US6824879B2 (en) | 1999-06-10 | 2001-11-15 | Spin-on-glass anti-reflective coatings for photolithography |
WOPCT/US01/45306 | 2001-11-15 | ||
PCT/US2002/036327 WO2003044078A1 (en) | 2001-11-15 | 2002-11-12 | Anti-reflective coatings for photolithography and methods of preparation thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1478682A1 EP1478682A1 (en) | 2004-11-24 |
EP1478682A4 true EP1478682A4 (en) | 2005-06-15 |
Family
ID=26668624
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP02793921A Withdrawn EP1478682A4 (en) | 2001-11-15 | 2002-11-12 | Anti-reflective coatings for photolithography and methods of preparation thereof |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP1478682A4 (en) |
AU (1) | AU2002359387A1 (en) |
WO (1) | WO2003044078A1 (en) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100804873B1 (en) | 1999-06-10 | 2008-02-20 | 얼라이드시그날 인코퍼레이티드 | Spin-on-glass anti-reflective coatings for photolithography |
US7365023B2 (en) * | 2003-04-17 | 2008-04-29 | Nissan Chemical Industries, Ltd. | Porous underlayer coating and underlayer coating forming composition for forming porous underlayer coating |
US7060637B2 (en) | 2003-05-12 | 2006-06-13 | Micron Technology, Inc. | Methods of forming intermediate semiconductor device structures using spin-on, photopatternable, interlayer dielectric materials |
US7368173B2 (en) | 2003-05-23 | 2008-05-06 | Dow Corning Corporation | Siloxane resin-based anti-reflective coating composition having high wet etch rate |
TW200523298A (en) | 2003-08-04 | 2005-07-16 | Honeywell Int Inc | Coating composition optimization for via fill and photolithography applications and methods of preparation thereof |
US8101015B2 (en) * | 2003-10-07 | 2012-01-24 | Honeywell International Inc. | Coatings and hard mask compositions for integrated circuit applications methods of production and uses thereof |
KR20050040275A (en) * | 2003-10-28 | 2005-05-03 | 삼성전자주식회사 | Composition for forming dielectric film and method for forming dielectric film or pattern using the same |
US8053159B2 (en) * | 2003-11-18 | 2011-11-08 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
US8901268B2 (en) | 2004-08-03 | 2014-12-02 | Ahila Krishnamoorthy | Compositions, layers and films for optoelectronic devices, methods of production and uses thereof |
US7838615B2 (en) | 2004-12-17 | 2010-11-23 | Dow Corning Corporation | Siloxane resin coating |
US7833696B2 (en) | 2004-12-17 | 2010-11-16 | Dow Corning Corporation | Method for forming anti-reflective coating |
US20060183055A1 (en) * | 2005-02-15 | 2006-08-17 | O'neill Mark L | Method for defining a feature on a substrate |
JP4881396B2 (en) | 2006-02-13 | 2012-02-22 | ダウ・コーニング・コーポレイション | Anti-reflective coating material |
US8642246B2 (en) * | 2007-02-26 | 2014-02-04 | Honeywell International Inc. | Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof |
US8318258B2 (en) | 2008-01-08 | 2012-11-27 | Dow Corning Toray Co., Ltd. | Silsesquioxane resins |
KR20100114075A (en) | 2008-01-15 | 2010-10-22 | 다우 코닝 코포레이션 | Silsesquioxane resins |
EP2247665A2 (en) | 2008-02-25 | 2010-11-10 | Honeywell International Inc. | Processable inorganic and organic polymer formulations, methods of production and uses thereof |
US8304161B2 (en) | 2008-03-04 | 2012-11-06 | Dow Corning Corporation | Silsesquioxane resins |
WO2009111121A2 (en) | 2008-03-05 | 2009-09-11 | Dow Corning Corporation | Silsesquioxane resins |
US7955782B2 (en) | 2008-09-22 | 2011-06-07 | Honeywell International Inc. | Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
US9366964B2 (en) | 2011-09-21 | 2016-06-14 | Dow Global Technologies Llc | Compositions and antireflective coatings for photolithography |
JP6196194B2 (en) | 2014-08-19 | 2017-09-13 | 信越化学工業株式会社 | Ultraviolet absorber, resist underlayer film forming composition, and pattern forming method |
WO2016167892A1 (en) | 2015-04-13 | 2016-10-20 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
FI128886B (en) * | 2019-02-25 | 2021-02-26 | Pibond Oy | Functional hydrogen silsesquioxane resins and the use thereof |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000077575A1 (en) * | 1999-06-10 | 2000-12-21 | Alliedsignal Inc. | Spin-on-glass anti-reflective coatings for photolithography |
WO2001064804A1 (en) * | 2000-02-28 | 2001-09-07 | Adsil, Lc | Silane-based, coating compositions, coated articles obtained therefrom and methods of using same |
WO2002006402A1 (en) * | 2000-07-17 | 2002-01-24 | Honeywell International Inc. | Absorbing compounds for spin-on glass anti-reflective coatings for photolithography |
EP1197511A1 (en) * | 2000-10-10 | 2002-04-17 | Shipley Company LLC | Antireflective composition |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TW354392B (en) * | 1996-07-03 | 1999-03-11 | Du Pont | Photomask blanks |
-
2002
- 2002-11-12 AU AU2002359387A patent/AU2002359387A1/en not_active Abandoned
- 2002-11-12 WO PCT/US2002/036327 patent/WO2003044078A1/en active Application Filing
- 2002-11-12 EP EP02793921A patent/EP1478682A4/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2000077575A1 (en) * | 1999-06-10 | 2000-12-21 | Alliedsignal Inc. | Spin-on-glass anti-reflective coatings for photolithography |
WO2001064804A1 (en) * | 2000-02-28 | 2001-09-07 | Adsil, Lc | Silane-based, coating compositions, coated articles obtained therefrom and methods of using same |
WO2002006402A1 (en) * | 2000-07-17 | 2002-01-24 | Honeywell International Inc. | Absorbing compounds for spin-on glass anti-reflective coatings for photolithography |
EP1197511A1 (en) * | 2000-10-10 | 2002-04-17 | Shipley Company LLC | Antireflective composition |
Non-Patent Citations (1)
Title |
---|
See also references of WO03044078A1 * |
Also Published As
Publication number | Publication date |
---|---|
EP1478682A1 (en) | 2004-11-24 |
WO2003044078A9 (en) | 2004-01-08 |
WO2003044078A1 (en) | 2003-05-30 |
AU2002359387A1 (en) | 2003-06-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20040527 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR IE IT LI LU MC NL PT SE SK TR |
|
AX | Request for extension of the european patent |
Extension state: AL LT LV MK RO SI |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20050503 |
|
17Q | First examination report despatched |
Effective date: 20081208 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20120601 |