AU2002359387A1 - Anti-reflective coatings for photolithography and methods of preparation thereof - Google Patents

Anti-reflective coatings for photolithography and methods of preparation thereof

Info

Publication number
AU2002359387A1
AU2002359387A1 AU2002359387A AU2002359387A AU2002359387A1 AU 2002359387 A1 AU2002359387 A1 AU 2002359387A1 AU 2002359387 A AU2002359387 A AU 2002359387A AU 2002359387 A AU2002359387 A AU 2002359387A AU 2002359387 A1 AU2002359387 A1 AU 2002359387A1
Authority
AU
Australia
Prior art keywords
photolithography
preparation
methods
reflective coatings
coatings
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002359387A
Inventor
Teresa Baldwin
William Bedwell
Mello Hebert
Nancy Iwamoto
Joseph Kennedy
Tadashi Nakano
Jason Stuck
Arlene Suedmeyer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Honeywell International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PCT/US2001/045306 external-priority patent/WO2003044600A1/en
Priority claimed from US10/001,143 external-priority patent/US6824879B2/en
Application filed by Honeywell International Inc filed Critical Honeywell International Inc
Publication of AU2002359387A1 publication Critical patent/AU2002359387A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
AU2002359387A 2001-11-15 2002-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof Abandoned AU2002359387A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10/001,143 2001-11-15
PCT/US2001/045306 WO2003044600A1 (en) 2001-11-15 2001-11-15 Spin-on anti-reflective coatings for photolithography
US10/001,143 US6824879B2 (en) 1999-06-10 2001-11-15 Spin-on-glass anti-reflective coatings for photolithography
AU2002227106 2001-11-15
PCT/US2002/036327 WO2003044078A1 (en) 2001-11-15 2002-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof

Publications (1)

Publication Number Publication Date
AU2002359387A1 true AU2002359387A1 (en) 2003-06-10

Family

ID=26668624

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002359387A Abandoned AU2002359387A1 (en) 2001-11-15 2002-11-12 Anti-reflective coatings for photolithography and methods of preparation thereof

Country Status (3)

Country Link
EP (1) EP1478682A4 (en)
AU (1) AU2002359387A1 (en)
WO (1) WO2003044078A1 (en)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU5600200A (en) 1999-06-10 2001-01-02 Allied-Signal Inc. Spin-on-glass anti-reflective coatings for photolithography
WO2004092840A1 (en) * 2003-04-17 2004-10-28 Nissan Chemical Industries, Ltd. Porous underlayer film and underlayer film forming composition used for forming the same
US7060637B2 (en) 2003-05-12 2006-06-13 Micron Technology, Inc. Methods of forming intermediate semiconductor device structures using spin-on, photopatternable, interlayer dielectric materials
KR101156200B1 (en) 2003-05-23 2012-06-18 다우 코닝 코포레이션 Siloxane resin-based anti-reflective coating composition having high wet etch rate
WO2005041255A2 (en) 2003-08-04 2005-05-06 Honeywell International, Inc. Coating composition optimization for via fill and photolithography applications and methods of preparation thereof
US8101015B2 (en) * 2003-10-07 2012-01-24 Honeywell International Inc. Coatings and hard mask compositions for integrated circuit applications methods of production and uses thereof
KR20050040275A (en) * 2003-10-28 2005-05-03 삼성전자주식회사 Composition for forming dielectric film and method for forming dielectric film or pattern using the same
US8053159B2 (en) * 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US8901268B2 (en) 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
WO2006065321A1 (en) 2004-12-17 2006-06-22 Dow Corning Corporation Method for forming anti-reflective coating
ATE486098T1 (en) 2004-12-17 2010-11-15 Dow Corning SILOXANE RESIN COATING
US20060183055A1 (en) * 2005-02-15 2006-08-17 O'neill Mark L Method for defining a feature on a substrate
WO2007094848A2 (en) 2006-02-13 2007-08-23 Dow Corning Corporation Antireflective coating material
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
JP5587791B2 (en) 2008-01-08 2014-09-10 東レ・ダウコーニング株式会社 Silsesquioxane resin
CN101910253B (en) 2008-01-15 2013-04-10 陶氏康宁公司 Silsesquioxane resins
KR101546222B1 (en) 2008-02-25 2015-08-20 허니웰 인터내셔널 인코포레이티드 Processable inorganic and organic polymer formulations, methods of production and uses thereof
JP5581225B2 (en) 2008-03-04 2014-08-27 ダウ・コーニング・コーポレイション Silsesquioxane resin
KR101541939B1 (en) 2008-03-05 2015-08-04 다우 코닝 코포레이션 Silsesquioxane resins
US7955782B2 (en) 2008-09-22 2011-06-07 Honeywell International Inc. Bottom antireflective coatings exhibiting enhanced wet strip rates, bottom antireflective coating compositions for forming bottom antireflective coatings, and methods for fabricating the same
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US9366964B2 (en) 2011-09-21 2016-06-14 Dow Global Technologies Llc Compositions and antireflective coatings for photolithography
JP6196194B2 (en) 2014-08-19 2017-09-13 信越化学工業株式会社 Ultraviolet absorber, resist underlayer film forming composition, and pattern forming method
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
FI128886B (en) * 2019-02-25 2021-02-26 Pibond Oy Functional hydrogen silsesquioxane resins and the use thereof

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW354392B (en) * 1996-07-03 1999-03-11 Du Pont Photomask blanks
AU5600200A (en) * 1999-06-10 2001-01-02 Allied-Signal Inc. Spin-on-glass anti-reflective coatings for photolithography
CA2401572A1 (en) * 2000-02-28 2001-09-07 Adsil, Lc Silane-based, coating compositions, coated articles obtained therefrom and methods of using same
US6368400B1 (en) * 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
TW538319B (en) * 2000-10-10 2003-06-21 Shipley Co Llc Antireflective composition, method for forming antireflective coating layer, and method for manufacturing electronic device

Also Published As

Publication number Publication date
WO2003044078A1 (en) 2003-05-30
EP1478682A4 (en) 2005-06-15
WO2003044078A9 (en) 2004-01-08
EP1478682A1 (en) 2004-11-24

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase