JP2019034343A5 - - Google Patents

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JP2019034343A5
JP2019034343A5 JP2018188881A JP2018188881A JP2019034343A5 JP 2019034343 A5 JP2019034343 A5 JP 2019034343A5 JP 2018188881 A JP2018188881 A JP 2018188881A JP 2018188881 A JP2018188881 A JP 2018188881A JP 2019034343 A5 JP2019034343 A5 JP 2019034343A5
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substrate
laser beam
extension
range
induced absorption
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JP2018188881A
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JP2019034343A (ja
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Priority claimed from EP13151296.4A external-priority patent/EP2754524B1/de
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JP2018188881A 2013-01-15 2018-10-04 レーザビーム焦線を用いたシート状基板のレーザベースの機械加工方法及び装置 Pending JP2019034343A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201361752489P 2013-01-15 2013-01-15
US61/752,489 2013-01-15
EP13151296.4A EP2754524B1 (de) 2013-01-15 2013-01-15 Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie
EP13151296.4 2013-01-15

Related Parent Applications (1)

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JP2015553188A Division JP6422033B2 (ja) 2013-01-15 2014-01-14 レーザビーム焦線を用いたシート状基板のレーザベースの機械加工方法及び装置

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JP2019034343A JP2019034343A (ja) 2019-03-07
JP2019034343A5 true JP2019034343A5 (enExample) 2019-05-09

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JP2015553060A Active JP6496248B2 (ja) 2013-01-15 2014-01-14 フラット基板のレーザベースの機械加工方法および装置
JP2015553188A Active JP6422033B2 (ja) 2013-01-15 2014-01-14 レーザビーム焦線を用いたシート状基板のレーザベースの機械加工方法及び装置
JP2018188881A Pending JP2019034343A (ja) 2013-01-15 2018-10-04 レーザビーム焦線を用いたシート状基板のレーザベースの機械加工方法及び装置

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JP2015553060A Active JP6496248B2 (ja) 2013-01-15 2014-01-14 フラット基板のレーザベースの機械加工方法および装置
JP2015553188A Active JP6422033B2 (ja) 2013-01-15 2014-01-14 レーザビーム焦線を用いたシート状基板のレーザベースの機械加工方法及び装置

Country Status (9)

Country Link
US (3) US11028003B2 (enExample)
EP (3) EP2754524B1 (enExample)
JP (3) JP6496248B2 (enExample)
KR (2) KR102165804B1 (enExample)
CN (2) CN106170365A (enExample)
CA (2) CA2898256A1 (enExample)
LT (2) LT2945769T (enExample)
TW (2) TWI639479B (enExample)
WO (2) WO2014111385A1 (enExample)

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