JP6755705B2 - レーザー加工装置 - Google Patents
レーザー加工装置 Download PDFInfo
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- JP6755705B2 JP6755705B2 JP2016093576A JP2016093576A JP6755705B2 JP 6755705 B2 JP6755705 B2 JP 6755705B2 JP 2016093576 A JP2016093576 A JP 2016093576A JP 2016093576 A JP2016093576 A JP 2016093576A JP 6755705 B2 JP6755705 B2 JP 6755705B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
- B23K26/0613—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams having a common axis
- B23K26/0617—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams having a common axis and with spots spaced along the common axis
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
- B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1ns or less
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/0823—Devices involving rotation of the workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
- B23K26/0853—Devices involving movement of the workpiece in at least in two axial directions, e.g. in a plane
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
- B23K26/384—Removing material by boring or cutting by boring of specially shaped holes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
- B23K26/402—Removing material taking account of the properties of the material involved involving non-metallic material, e.g. isolators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/34—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies not provided for in groups H01L21/0405, H01L21/0445, H01L21/06, H01L21/16 and H01L21/18 with or without impurities, e.g. doping materials
- H01L21/44—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/38 - H01L21/428
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/0007—Applications not otherwise provided for
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2101/00—Articles made by soldering, welding or cutting
- B23K2101/36—Electric or electronic devices
- B23K2101/40—Semiconductor devices
Description
波長 :1030nm
平均出力 :3W
繰り返し周波数 :50kHz
パルス幅 :10ps
スポット径 :φ10μm
集光レンズの開口数/ウエーハの屈折率 :0.05〜0.20
X方向加工送り速度 :500mm/秒
シールドトンネル寸法 :φ1μmの細孔、φ10μmの非晶質
12:分割予定ライン
14:デバイス
40:レーザー加工装置
41:基台
42:保持機構
43:移動手段
44:レーザー光線照射手段
44a:集光器
44d、44e:集光レンズ
44g:集光点補正板
45:撮像手段
100:シールドトンネル
102:細孔
104:非晶質
Claims (4)
- ウエーハを保持する保持手段と、該保持手段に保持されたウエーハにレーザー光線を照射するレーザー光線照射手段と、該保持手段と該レーザー光線照射手段とを相対的に加工送りする加工送り手段と、から少なくとも構成されるレーザー加工装置であって、
該レーザー光線照射手段は、パルスレーザー光線を発振する発振器と、該発振器が発振したパルスレーザー光線を集光し、該保持手段に保持されたウエーハに照射する集光器と、から少なくとも構成され、
該集光器は、該集光器の内側を通るレーザー光線によって形成される集光点の位置を、外側を通るレーザー光線によって形成される集光点の位置より該保持手段側に延在するように位置付ける球面収差の機能を備え、
該集光器の最も内側を通るレーザー光線によって形成される集光点が保持手段側のウエーハ裏面近傍に位置付けられ、該集光器の最も外側を通るレーザー光線によって形成される集光点がウエーハの表面近傍に位置付けられて、該集光器によって形成されるレーザー光線によって形成される集光点が、ウエーハの裏面から表面まで延在するようにウエーハの内部に位置付けられて細孔と、該細孔を囲繞する非晶質とからなるシールドトンネルを形成するレーザー加工装置。 - 該球面収差の機能は、集光レンズにより備えられる請求項1に記載のレーザー加工装置。
- 該球面収差の機能は、集光レンズと、該集光レンズに対して保持手段側に配置され該集光レンズによって集光されるレーザー光線の集光点位置を補正する集光点補正板とで備えられる請求項1に記載のレーザー加工装置。
- 該外側のレーザー光線によって形成される集光点から該内側のレーザー光線によって形成される集光点まで延在する長さは50μm〜2000μmである請求項1ないし3のいずれかに記載のレーザー加工装置。
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016093576A JP6755705B2 (ja) | 2016-05-09 | 2016-05-09 | レーザー加工装置 |
TW106110733A TWI706821B (zh) | 2016-05-09 | 2017-03-30 | 雷射加工裝置 |
CN201710276802.9A CN107350641B (zh) | 2016-05-09 | 2017-04-25 | 激光加工装置 |
US15/584,228 US10388508B2 (en) | 2016-05-09 | 2017-05-02 | Wafer processing apparatus |
KR1020170056805A KR102251272B1 (ko) | 2016-05-09 | 2017-05-04 | 레이저 가공 장치 |
DE102017207693.3A DE102017207693A1 (de) | 2016-05-09 | 2017-05-08 | Bearbeitungsvorrichtung für einen Wafer |
US16/392,491 US10658171B2 (en) | 2016-05-09 | 2019-04-23 | Wafer processing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016093576A JP6755705B2 (ja) | 2016-05-09 | 2016-05-09 | レーザー加工装置 |
Publications (2)
Publication Number | Publication Date |
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JP2017202488A JP2017202488A (ja) | 2017-11-16 |
JP6755705B2 true JP6755705B2 (ja) | 2020-09-16 |
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JP2016093576A Active JP6755705B2 (ja) | 2016-05-09 | 2016-05-09 | レーザー加工装置 |
Country Status (6)
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US (2) | US10388508B2 (ja) |
JP (1) | JP6755705B2 (ja) |
KR (1) | KR102251272B1 (ja) |
CN (1) | CN107350641B (ja) |
DE (1) | DE102017207693A1 (ja) |
TW (1) | TWI706821B (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6755705B2 (ja) * | 2016-05-09 | 2020-09-16 | 株式会社ディスコ | レーザー加工装置 |
JP6882045B2 (ja) * | 2017-04-13 | 2021-06-02 | 株式会社ディスコ | 集光点位置検出方法 |
JP7217585B2 (ja) * | 2017-04-13 | 2023-02-03 | 株式会社ディスコ | 分割方法 |
JP6994852B2 (ja) * | 2017-06-30 | 2022-01-14 | 株式会社ディスコ | レーザー加工装置及びレーザー加工方法 |
JP7407499B2 (ja) | 2017-12-26 | 2024-01-04 | 株式会社ディスコ | 凹部又は貫通孔の形成方法、電極の形成方法 |
USD954567S1 (en) * | 2019-06-25 | 2022-06-14 | Ebara Corporation | Measurement jig |
CN110625267A (zh) * | 2019-08-22 | 2019-12-31 | 大族激光科技产业集团股份有限公司 | 一种加工蓝宝石衬底led晶圆的方法及激光装置 |
US20210107094A1 (en) * | 2019-10-14 | 2021-04-15 | Haesung Ds Co., Ltd. | Apparatus for and method of polishing surface of substrate |
JP2021087967A (ja) * | 2019-12-03 | 2021-06-10 | 株式会社ディスコ | レーザー加工装置の調整方法 |
Family Cites Families (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4917257B1 (ja) * | 1970-10-02 | 1974-04-27 | ||
JP4026201B2 (ja) | 1997-01-24 | 2007-12-26 | 松下電器産業株式会社 | 多方向操作体及びこれを用いた多方向操作装置 |
JPH10305420A (ja) | 1997-03-04 | 1998-11-17 | Ngk Insulators Ltd | 酸化物単結晶からなる母材の加工方法、機能性デバイスの製造方法 |
JP3408805B2 (ja) | 2000-09-13 | 2003-05-19 | 浜松ホトニクス株式会社 | 切断起点領域形成方法及び加工対象物切断方法 |
JP4659300B2 (ja) * | 2000-09-13 | 2011-03-30 | 浜松ホトニクス株式会社 | レーザ加工方法及び半導体チップの製造方法 |
JP4917257B2 (ja) | 2004-11-12 | 2012-04-18 | 浜松ホトニクス株式会社 | レーザ加工方法 |
JP4776994B2 (ja) | 2005-07-04 | 2011-09-21 | 浜松ホトニクス株式会社 | 加工対象物切断方法 |
JP4907984B2 (ja) * | 2005-12-27 | 2012-04-04 | 浜松ホトニクス株式会社 | レーザ加工方法及び半導体チップ |
JP4954653B2 (ja) | 2006-09-19 | 2012-06-20 | 浜松ホトニクス株式会社 | レーザ加工方法 |
JP5307384B2 (ja) * | 2007-12-03 | 2013-10-02 | 株式会社ディスコ | ウエーハの分割方法 |
US8809120B2 (en) * | 2011-02-17 | 2014-08-19 | Infineon Technologies Ag | Method of dicing a wafer |
EP2754524B1 (de) * | 2013-01-15 | 2015-11-25 | Corning Laser Technologies GmbH | Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie |
JP6113529B2 (ja) * | 2013-03-05 | 2017-04-12 | 株式会社ディスコ | ウエーハの加工方法 |
KR102215918B1 (ko) * | 2013-03-27 | 2021-02-16 | 하마마츠 포토닉스 가부시키가이샤 | 레이저 가공 장치 및 레이저 가공 방법 |
JP6151557B2 (ja) * | 2013-05-13 | 2017-06-21 | 株式会社ディスコ | レーザー加工方法 |
US20150034613A1 (en) * | 2013-08-02 | 2015-02-05 | Rofin-Sinar Technologies Inc. | System for performing laser filamentation within transparent materials |
JP6121281B2 (ja) * | 2013-08-06 | 2017-04-26 | 株式会社ディスコ | ウエーハの加工方法 |
US10144088B2 (en) * | 2013-12-03 | 2018-12-04 | Rofin-Sinar Technologies Llc | Method and apparatus for laser processing of silicon by filamentation of burst ultrafast laser pulses |
JP6482184B2 (ja) * | 2014-05-08 | 2019-03-13 | 株式会社ディスコ | レーザー加工装置 |
JP6548944B2 (ja) * | 2015-04-09 | 2019-07-24 | 株式会社ディスコ | レーザー加工装置 |
JP6549014B2 (ja) * | 2015-10-13 | 2019-07-24 | 株式会社ディスコ | 光デバイスウエーハの加工方法 |
JP6755705B2 (ja) * | 2016-05-09 | 2020-09-16 | 株式会社ディスコ | レーザー加工装置 |
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US20170323774A1 (en) | 2017-11-09 |
US10658171B2 (en) | 2020-05-19 |
CN107350641B (zh) | 2021-10-22 |
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KR20170126407A (ko) | 2017-11-17 |
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