JP6549014B2 - 光デバイスウエーハの加工方法 - Google Patents
光デバイスウエーハの加工方法 Download PDFInfo
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- JP6549014B2 JP6549014B2 JP2015202320A JP2015202320A JP6549014B2 JP 6549014 B2 JP6549014 B2 JP 6549014B2 JP 2015202320 A JP2015202320 A JP 2015202320A JP 2015202320 A JP2015202320 A JP 2015202320A JP 6549014 B2 JP6549014 B2 JP 6549014B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
- B23K26/364—Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0005—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing
- B28D5/0011—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by breaking, e.g. dicing with preliminary treatment, e.g. weakening by scoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
- H01L21/2003—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy characterised by the substrate
- H01L21/2011—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy characterised by the substrate the substrate being of crystalline insulating material, e.g. sapphire
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
- H01L33/0066—Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
- H01L33/0075—Processes for devices with an active region comprising only III-V compounds comprising nitride compounds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0095—Post-treatment of devices, e.g. annealing, recrystallisation or short-circuit elimination
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/483—Containers
- H01L33/486—Containers adapted for surface mounting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0008—Processes
- H01L2933/0033—Processes relating to semiconductor body packages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/005—Processes
- H01L33/0062—Processes for devices with an active region comprising only III-V compounds
- H01L33/0066—Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound
- H01L33/007—Processes for devices with an active region comprising only III-V compounds with a substrate not being a III-V compound comprising nitride compounds
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- Engineering & Computer Science (AREA)
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- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
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- Crystallography & Structural Chemistry (AREA)
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- Oil, Petroleum & Natural Gas (AREA)
- Dicing (AREA)
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Description
しかるに、上記特許文献3に記載されたレーザー加工方法によって光デバイスウエーハを構成するサファイア基板に分割予定ラインに沿ってレーザー加工を施しシールドトンネルを形成すると、図8に示すようにサファイア基板の厚み方向中間部に抉れ(エグレ)が生じて、分割された光デバイスの側面に凹凸が形成されるという新たな問題が生じた。
サファイア基板に対して透過性を有する波長のパルスレーザー光線の集光点をサファイア基板の裏面側から内部に位置付けて分割予定ラインに対応する領域に沿って照射し、細孔と該細孔をシールドする非晶質とを成長させてシールドトンネルを分割予定ラインに沿って形成するシールドトンネル形成工程と、
該シールドトンネル形成工程が実施された光デバイスウエーハに外力を付与し、光デバイスウエーハを分割予定ラインに沿って個々の光デバイスに分割する分割工程と、を含み、
該シールドトンネル形成工程は、集光点を生成する集光レンズにパルスレーザー光線を拡がり角を持って入光させることにより球面収差を生成せしめる、
ことを特徴とする光デバイスウエーハの加工方法が提供される。
また、上記凹レンズの焦点距離は、−0.1〜−5mに設定されている。
図1の(a)および(b)に示す光デバイスウエーハ2は、厚みが500μmのサファイア(Al2O3)基板20の表面20aにn型窒化ガリウム半導体層およびp型窒化ガリウム半導体層からなる発光層21がエピタキシャル成長法によって10μmの厚みで積層して形成されている。なお、発光層21には、格子状に形成された複数の分割予定ライン211によって区画された複数の領域に光デバイス212が形成されている。
図4に示すように集光レンズ424bによって集光されるパルスレーザー光線にはP1からP2の範囲で球面収差が生成される。なお、球面収差の範囲は凹レンズ424cの焦点距離(f)によって調整することができ、凹レンズ424cの焦点距離(f)は−0.1〜−5mに設定することが望ましい。
波長 :1030nm
繰り返し周波数 :40kHz
パルス幅 :10ps
平均出力 :0.5W
スポット径 :φ5μm
加工送り速度 :400mm/秒
集光レンズの開口数 :0.25
なお、上記分割の起点となるサファイア基板20に形成されたシールドトンネル23は、上述した図5に示すシールドトンネル形成工程において集光レンズ424bから照射されるパルスレーザー光線LBが上述したように球面収差が生成された状態でサファイア基板20に照射されるので、サファイア基板20の裏面から表面に亘って均一に形成されるため、厚み方向中間部に抉れ(エグレ)が生じることがなく、図7の(c)に示すように分割された光デバイス212の側面に上記図8に示す従来の加工方法のように抉れ(エグレ)に基づく凹凸が形成されることはない。
20:サファイア基板
21:発光層(エピ層)
211:分割予定ライン
212:光デバイス
23:シールドトンネル
3:保護テープ
4:レーザー加工装置
41:レーザー加工装置のチャックテーブル
42:レーザー光線照射手段
424:集光器
424b:集光レンズ
424c:凹レンズ
7:分割装置
Claims (3)
- サファイア基板の表面に発光層が形成され格子状の複数の分割予定ラインによって区画された複数の領域に光デバイスが形成された光デバイスウエーハを個々の光デバイスに分割する光デバイスウエーハの加工方法であって、
サファイア基板に対して透過性を有する波長のパルスレーザー光線の集光点をサファイア基板の裏面側から内部に位置付けて分割予定ラインに対応する領域に沿って照射し、細孔と該細孔をシールドする非晶質とを成長させてシールドトンネルを分割予定ラインに沿って形成するシールドトンネル形成工程と、
該シールドトンネル形成工程が実施された光デバイスウエーハに外力を付与し、光デバイスウエーハを分割予定ラインに沿って個々の光デバイスに分割する分割工程と、を含み、
該シールドトンネル形成工程は、集光点を生成する集光レンズにパルスレーザー光線を拡がり角を持って入光させることにより球面収差を生成せしめる、
ことを特徴とする光デバイスウエーハの加工方法。 - 該シールドトンネル形成工程は、該集光レンズの上流側に配設された凹レンズによってパルスレーザー光線に拡がり角を持たせる、請求項1記載の光デバイスウエーハの加工方法。
- 該凹レンズの焦点距離は、−0.1〜−5mに設定されている、請求項2記載の光デバイスウエーハの加工方法。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015202320A JP6549014B2 (ja) | 2015-10-13 | 2015-10-13 | 光デバイスウエーハの加工方法 |
TW105127518A TWI697041B (zh) | 2015-10-13 | 2016-08-26 | 光元件晶圓的加工方法 |
KR1020160121293A KR20170043443A (ko) | 2015-10-13 | 2016-09-22 | 광 디바이스 웨이퍼의 가공 방법 |
CN201610883854.8A CN106914704A (zh) | 2015-10-13 | 2016-10-10 | 光器件晶片的加工方法 |
US15/291,746 US9761492B2 (en) | 2015-10-13 | 2016-10-12 | Processing method of optical device wafer |
Applications Claiming Priority (1)
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JP2015202320A JP6549014B2 (ja) | 2015-10-13 | 2015-10-13 | 光デバイスウエーハの加工方法 |
Publications (2)
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JP2017076666A JP2017076666A (ja) | 2017-04-20 |
JP6549014B2 true JP6549014B2 (ja) | 2019-07-24 |
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US (1) | US9761492B2 (ja) |
JP (1) | JP6549014B2 (ja) |
KR (1) | KR20170043443A (ja) |
CN (1) | CN106914704A (ja) |
TW (1) | TWI697041B (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
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JP6549014B2 (ja) * | 2015-10-13 | 2019-07-24 | 株式会社ディスコ | 光デバイスウエーハの加工方法 |
JP6755705B2 (ja) | 2016-05-09 | 2020-09-16 | 株式会社ディスコ | レーザー加工装置 |
JP6888808B2 (ja) * | 2017-03-30 | 2021-06-16 | 三星ダイヤモンド工業株式会社 | 樹脂層付き脆性材料基板の分断方法並びに分断装置 |
JP6837905B2 (ja) * | 2017-04-25 | 2021-03-03 | 株式会社ディスコ | ウエーハの加工方法 |
JP2019125688A (ja) * | 2018-01-16 | 2019-07-25 | 株式会社ディスコ | 被加工物のレーザー加工方法 |
JP2019139182A (ja) * | 2018-02-15 | 2019-08-22 | 株式会社ディスコ | 液晶パネルの製造方法 |
US11031368B2 (en) * | 2018-05-14 | 2021-06-08 | Panasonic Intellectual Property Management Co., Ltd. | Bonding apparatus |
JP2021010936A (ja) * | 2019-07-09 | 2021-02-04 | 株式会社ディスコ | レーザ加工装置 |
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JPH10305420A (ja) | 1997-03-04 | 1998-11-17 | Ngk Insulators Ltd | 酸化物単結晶からなる母材の加工方法、機能性デバイスの製造方法 |
JP3408805B2 (ja) | 2000-09-13 | 2003-05-19 | 浜松ホトニクス株式会社 | 切断起点領域形成方法及び加工対象物切断方法 |
JP2004337902A (ja) * | 2003-05-14 | 2004-12-02 | Hamamatsu Photonics Kk | レーザ加工装置及びレーザ加工方法 |
JP4527488B2 (ja) * | 2004-10-07 | 2010-08-18 | 株式会社ディスコ | レーザ加工装置 |
JP4692717B2 (ja) * | 2004-11-02 | 2011-06-01 | 澁谷工業株式会社 | 脆性材料の割断装置 |
JP4917382B2 (ja) * | 2006-08-09 | 2012-04-18 | 株式会社ディスコ | レーザー光線照射装置およびレーザー加工機 |
JP2009123835A (ja) * | 2007-11-13 | 2009-06-04 | Disco Abrasive Syst Ltd | 半導体デバイスの製造方法 |
JP5537081B2 (ja) * | 2009-07-28 | 2014-07-02 | 浜松ホトニクス株式会社 | 加工対象物切断方法 |
TW201343296A (zh) * | 2012-03-16 | 2013-11-01 | Ipg Microsystems Llc | 使一工件中具有延伸深度虛飾之雷射切割系統及方法 |
EP2754524B1 (de) * | 2013-01-15 | 2015-11-25 | Corning Laser Technologies GmbH | Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie |
JP6208430B2 (ja) * | 2013-01-25 | 2017-10-04 | 株式会社ディスコ | レーザー加工方法 |
JP6062287B2 (ja) * | 2013-03-01 | 2017-01-18 | 株式会社ディスコ | ウエーハの加工方法 |
JP6113529B2 (ja) * | 2013-03-05 | 2017-04-12 | 株式会社ディスコ | ウエーハの加工方法 |
JP6151557B2 (ja) * | 2013-05-13 | 2017-06-21 | 株式会社ディスコ | レーザー加工方法 |
US9676167B2 (en) * | 2013-12-17 | 2017-06-13 | Corning Incorporated | Laser processing of sapphire substrate and related applications |
JP6262039B2 (ja) * | 2014-03-17 | 2018-01-17 | 株式会社ディスコ | 板状物の加工方法 |
JP6466692B2 (ja) * | 2014-11-05 | 2019-02-06 | 株式会社ディスコ | ウエーハの加工方法 |
JP2016143766A (ja) * | 2015-02-02 | 2016-08-08 | 株式会社ディスコ | 単結晶部材の加工方法 |
JP6549014B2 (ja) * | 2015-10-13 | 2019-07-24 | 株式会社ディスコ | 光デバイスウエーハの加工方法 |
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2015
- 2015-10-13 JP JP2015202320A patent/JP6549014B2/ja active Active
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2016
- 2016-08-26 TW TW105127518A patent/TWI697041B/zh active
- 2016-09-22 KR KR1020160121293A patent/KR20170043443A/ko not_active IP Right Cessation
- 2016-10-10 CN CN201610883854.8A patent/CN106914704A/zh active Pending
- 2016-10-12 US US15/291,746 patent/US9761492B2/en active Active
Also Published As
Publication number | Publication date |
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CN106914704A (zh) | 2017-07-04 |
US9761492B2 (en) | 2017-09-12 |
TWI697041B (zh) | 2020-06-21 |
US20170103921A1 (en) | 2017-04-13 |
KR20170043443A (ko) | 2017-04-21 |
TW201719736A (zh) | 2017-06-01 |
JP2017076666A (ja) | 2017-04-20 |
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