KR970008334A - 진공처리장치 및 이를 사용한 반도체 생산라인 - Google Patents
진공처리장치 및 이를 사용한 반도체 생산라인 Download PDFInfo
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- KR970008334A KR970008334A KR1019960029009A KR19960029009A KR970008334A KR 970008334 A KR970008334 A KR 970008334A KR 1019960029009 A KR1019960029009 A KR 1019960029009A KR 19960029009 A KR19960029009 A KR 19960029009A KR 970008334 A KR970008334 A KR 970008334A
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Abstract
본 발명은 진공처리장치에 관한 것으로서, 본 발명에 따른 진공처리장치는 카세트블록과 진공처리블록으로 구성되고, 카세트블록은 각각 시료를 수납하는 복수의 카세트를 탑재하는 카세트 테이블과 대기이송수단을 구비하고, 진공처리블록은 시료를 처리하는 복수의 처리실 및 시료를 이송하는 진공이송수단을 구비하고, 카세트 블록과 진공처리블록의 두 평면 형상이 거의 직사각형이고, 카세트블록의 폭이 진공처리블록의 폭보다 크게 설계되고, 진공처리장치의 평면도가 L자형상 또는 T자형상으로 형성된다.
이러한 구성에 의해, 생산비용의 증가를 억제하는 동시에 더욱 양호한 유지보수성을 갖는 것이 가능한 진공처리장치를 제공할 수 있다.
Description
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제1도는 본 발명에 따른 진공처리장치의 일실시예를 나타낸 외부 사시도.
Claims (15)
- 카세트블록과 진공처리블록으로 구성되고, 상기 각각의 카세트블록은 시료를 수납하는 복수의 카세트를 탑재하는 카세트 테이블을 구비하고, 상기 진공처리블록은 상기 시료를 처리하는 복수의 처리실 및 상기 시료를 이송하는 진공이송수단을 구비하는 진공처리장치에 있어서, 상기 카세트블록과 상기 진공처리블록의 두 평면형상이 거의 직사각형이고, W1이 상기 카세트블록의 폭, W2가 상기 진공처리블록의 폭, CW가 상기 카세트의 폭일 때, 관계식 W1-W2≥CW를 만족하는 것을 특징으로 하는 진공처리장치.
- 카세트블록과 진공처리블록으로 구성되고, 상기 각각의 카세트블록은 시료를 수납하는 복수의 카세트를 탑재하는 카세트 테이블을 구비하고, 상기 진공처리블록은 상기 시료를 처리하는 복수의 처리실 및 상기 시료를 이송하는 진공이송수단을 구비하는 진공처리장치에 있어서, 상기 진공처리블록의 폭이 상기 카세트블록의 폭보다 작게 설계되고, 상기 진공처리장치의 평면도가 L자 형상 및 T자 형상 중 하나로 형성되는 것을 특징으로 하는 진공처리장치.
- 카세트블록과 진공처리블록으로 구성되고, 상기 각각의 카세트블록은 시료를 수납하는 복수의 카세트를 탑재하는 카세트 테이블 및 상기 시료를 이송하는 대기이송 수단을 구비하고, 상기 진공처리블록은 상기 시료에 진공처리를 실행하는 복수의 처리실과, 로드측 로드 록 실과, 언로드측 로드 록 실과, 상기 처리실과 상기 로드측 및 언로드측 로드 록 실 사이에서 상기 시료를 이송하는 진공이송수단을 구비하고, 상기 대기이송수단은 상기 카세트와 상기 두 로드 록 실 사이에서 상기 시료를 이송하도록 구성된 진공처리장치에 있어서, 상기 카세트블록과 상기 진공처리블록의 두 평면 형상이 거의 직사각형이고, W1이 상기 카세트블록의 폭, W2가 상기 진공처리블록의 폭, CW가 상기 카세트의 폭일 때, 관계식 W1-W2≥CW를 만족하는 것을 특징으로 하는 진공처리장치.
- 카세트블록과 진공처리블록으로 구성되고, 상기 각각의 카세트블록은 시료를 수납하는 복수의 카세트를 탑재하는 카세트 테이블 및 상기 시료를 이송하는 대기이송 수단을 구비하고, 상기 진공처리블록은 상기 시료에 진공처리를 실행하는 복수의 처리실과, 로드측 로드 록 실과, 언로드측 로드 록 실과, 상기 처리실과 상기 로드측 언로드측 로드 록 실 사이에서 상기 시료를 이송하는 진공이송수단을 구비하고, 상기 대기이송수단은 상기 카세트와 상기 두 로드 록 실 사이에서 상기 시료를 이송하도록 구성된 진공처리장치에 있어서, 상기 카세트블록과 상기 진공처리블록의 두 평면형상이 거의 직사각형이고, 상기 진공처리블록의 폭이 상기 카세트블록의 폭 보다 작게 설계되고, 상기 진공처리장치의 평면도가 L자형상 및 T자형상 중 하나로 형성되는 것을 특징으로 하는 진공처리장치.
- 카세트블록과 진공처리블록 및 두 블록 사이에 시료를 이송하는 대기이송수단으로 구성되고, 상기 각각의 카세트블록은 상기 시료를 수납하는 복수의 카세트를 탑재하는 카세트 테이블을 구비하고, 상기 진공처리블록은 상기 시료에 진공처리를 실행하는 복수의 처리실과, 로드측 로드 록 실과, 언로드측 로드 록 실과, 상기 처리실과 상기 로드측 및 언로드측 로드 록 실 사이에서 상기 시료를 이송하는 진공이송수단을 구비하고, 상기 대기이송수단은 상기 카세트와 상기 두 로드 록 실 사이에서 상기 시료를 이송하도록 구성된 진공처리장치에 있어서, 상기 카세트블록과 상기 진공처리블록의 두 평면 형상이 거의 직사각형이고, W1이 상기 카세트블록의 폭, W2가 상기 진공처리블록의 폭, CW가 상기 카세트의 폭일 때, 관계식 W1-W2≥CW를 만족하는 것을 특징으로 하는 진공처리장치.
- 제1항 내지 제5항 중 어느 한 항에 있어서, 상기 카세트블록과 상기 진공처리블록의 두 평면 형상이 거의 직사각형이고, W1이 상기 카세트블록의 폭, W2가 상기 진공처리블록의 폭, G1이 서로 인접한 카세트블록 사이의 갭, G2가 서로 인접한 진공처리블록 사이의 갭일 때, 관계식 W1〉W2및 G1〈G2가 만족되고 W1-W2=MS가 메인터넌스 공간으로 사용되는 것을 특징으로 하는 진공처리장치.
- 카세트블록과 진공처리블록으로 구성되고, 상기 각각의 카세트블록은 시료를 수납하는 복수의 카세트를 탑재하는 카세트 테이블 및 상기 시료를 이송하는 대기이송 수단을 구비하고, 상기 진공처리블록은 상기 시료에 진공처리를 실행하는 복수의 처리실과, 로드측 로드 록 실과, 언로드측 로드 록 실과, 상기 처리실과 상기 로드측 및 언로드측 로드 록 실 사이에서 상기 시료를 이송하는 진공이송수단을 구비하고, 상기 대기이송수단은 상기 카세트와 상기 두 로드 록 실 사이에서 상기 시료를 이송하도록 구성된 진공처리장치에 있어서, 상기 카세트블록과 상기 진공처리블록의 두 평면 형상이 거의 직사각형이고, W1이 상기 카세트블록의 폭, W2가 상기 진공처리블록의 폭, G1이 서로 인접한 카세트블록 사이의 갭, G2가 서로 인접한 진공처리블록 사이의 갭, CW가 1개의 카세트의 폭일 때, 관계식 W1-W2≥CW및 G1〈G2가 만족되는 것을 특징으로 하는 진공처리장치.
- 제7항에 있어서, d가 처리될 시료의 최대 직경일 때, 관계식 W1≥2d 및 W1-W2-≥d가 만족되는 것을 특징으로 하는 진공처리장치.
- 제1항 내지 제8항 중 어느 한 항에 있어서, 상기 카세트블록이 300㎜보다 작지 않은 직경을 갖는 시료를 수납하도록 설계된 것을 특징으로 하는 진공처리장치.
- 카세트블록과 진공처리블록으로 구성되고, 상기 각각의 카세트블록은 시료를 수납하는 복수의 카세트를 탑재하는 카세트 테이블을 구비하고, 상기 진공처리블록은 상기 시료에 에칭 처리를 실행하는 에칭 처리 장치 및 상기 시료를 이송하는 진공 이송수단을 구비하는 진공처리장치에 있어서, 상기 카세트블록과 상기 진공처리블록의 두 평면 형상이 거의 직사각형이고, W1이 상기 카세트블록의 폭, W2가 상기 진공처리블록의 폭, CW가 1개의 카세트의 폭일 때, 관계식 W1-W2≥CW가 만족되는 것을 특징으로 하는 진공처리장치.
- 카세트블록과 진공처리블록으루 구성된 복수의 진공처리장치가 생산공정의 순서로 배치된 복수의 베이영역을 포함하고, 상기 카세트블록은 시료를 수납하는 카세트를 탑재하는 카세트 테이블을 구비하고, 상기 진공처리블록은 상기 시료에 진공처리를 행하는 복수의 처리실 및 상기 시료를 이송하는 진공이송수단을 구비한는 반도체 생산라인에 있어서, 상기 진공처리장치의 적어도 하나가 상기 카세트블록이 300㎜보다 작지 않은 직경을 갖는 시료를 수납할 수 있도록 설계되고, W1이 상기 카세트블록의 폭, W2가 상기 진공처리블록의 폭, CW가 상기 카세트의 폭일 때, 관계식 W1-W2≥CW가 만족되는 것을 특징으로 하는 반도체 생산라인.
- 제11항에 있어서, 상기 각각의 베이영역은 스토커를 구비하고, 상기 시료는 라인 자동이송머신을 사용하여 생산라인을 따라 각각의 베이영역의 스토커로 이송되고, 상기 시료는 베이내 자동이송머신을 사용하여 상기 각각의 베이영역의 스토커와 상기 베이영역 사에어서 이송되는 것을 특징으로 하는 반도체 생산라인.
- 직경이 300㎜보다 작지 않은 시료를 수납할 수 있는 카세트블록 및 상기 시료에 진공처리를 행하는 진공처리블록을 포함하고, 상기 진공처리장치의 적어도 하나가 카세트블록의 폭이 진공처리블록의 폭보다 크고 상기 진공처리장치의 평면도가 L자형상 및 T자형상 중 어느 하나로 형성되도록 설계되고, 메인터넌스 공간이 상기 L자형상 및 T자형상 진공처리장치 중 어느 하나와 인접한 진공처리장치 사이에 제공되는 것을 특징으로 하는 반도체 생산라인 구성방법.
- 제13항에 있어서, 상기 복수의 진공처리 장치를 구비한 복수의 베이영역이 반도체 생산공정의 순으로 배치되고, 라인 자동이송머신과 베이내 자동이송머신이제공되고, 각각의 베이영역이 스토커를 구비하고, 상기시료가 라인 자동이송머신을 사용하여 생상라인을 따라 각각의 베이영역의 스토커로 이송되고, 베이내 자동 이송머신은 상기 베이영역 내에서 상기 스토커와 상기 처리장치 사이에서 시료를 이송하는 것을 특징으로 하는 반도체 생산라인 구성방법.
- 제13항 및 제14항 중 어느 한항에 있어서, 상기 진공처리장치는 상기 시료에 에칭 처리를 행하는 에칭처리 장치를 포함하는 것을 특징으로 하는 반도체 생산라인 구성방법.※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
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1995
- 1995-07-19 JP JP7182921A patent/JPH0936198A/ja not_active Withdrawn
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1996
- 1996-07-04 TW TW085108094A patent/TW391987B/zh active
- 1996-07-08 US US08/677,682 patent/US5855726A/en not_active Expired - Lifetime
- 1996-07-12 DE DE69636872T patent/DE69636872T2/de not_active Expired - Lifetime
- 1996-07-12 DE DE69637878T patent/DE69637878D1/de not_active Expired - Fee Related
- 1996-07-12 DE DE69633487T patent/DE69633487T2/de not_active Expired - Fee Related
- 1996-07-12 EP EP96305154A patent/EP0756316B1/en not_active Expired - Lifetime
- 1996-07-12 EP EP01104775A patent/EP1119022B1/en not_active Expired - Lifetime
- 1996-07-12 EP EP01104776A patent/EP1143488B1/en not_active Expired - Lifetime
- 1996-07-17 SG SG1996010285A patent/SG52824A1/en unknown
- 1996-07-18 KR KR1019960029009A patent/KR100440683B1/ko not_active IP Right Cessation
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1998
- 1998-09-22 US US09/151,795 patent/US6188935B1/en not_active Expired - Lifetime
- 1998-10-30 US US09/182,218 patent/US6253117B1/en not_active Expired - Lifetime
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2000
- 2000-01-19 US US09/487,499 patent/US6519504B1/en not_active Expired - Lifetime
- 2000-12-07 US US09/730,578 patent/US6430469B2/en not_active Expired - Lifetime
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2001
- 2001-01-26 US US09/769,507 patent/US6526330B2/en not_active Expired - Lifetime
- 2001-07-16 KR KR1020010042712A patent/KR100453276B1/ko not_active IP Right Cessation
- 2001-09-20 US US09/956,136 patent/US6962472B2/en not_active Expired - Fee Related
- 2001-09-20 US US09/956,137 patent/US7201551B2/en not_active Expired - Fee Related
- 2001-09-20 US US09/956,135 patent/US6752579B2/en not_active Expired - Lifetime
- 2001-09-20 US US09/956,140 patent/US6752580B2/en not_active Expired - Lifetime
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2002
- 2002-03-01 US US10/085,007 patent/US20020091465A1/en not_active Abandoned
- 2002-03-01 US US10/084,934 patent/US20020082744A1/en not_active Abandoned
- 2002-03-01 US US10/085,008 patent/US20020099469A1/en not_active Abandoned
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2003
- 2003-10-21 US US10/689,035 patent/US6895685B2/en not_active Expired - Fee Related
-
2004
- 2004-04-19 US US10/826,386 patent/US20040197169A1/en not_active Abandoned
-
2005
- 2005-03-09 US US11/074,719 patent/US7347656B2/en not_active Expired - Fee Related
-
2008
- 2008-02-11 US US12/028,915 patent/US20080138180A1/en not_active Abandoned
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2009
- 2009-05-06 US US12/436,166 patent/US20090220322A1/en not_active Abandoned
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