AU2001259151A1 - Reticle management system - Google Patents

Reticle management system

Info

Publication number
AU2001259151A1
AU2001259151A1 AU2001259151A AU5915101A AU2001259151A1 AU 2001259151 A1 AU2001259151 A1 AU 2001259151A1 AU 2001259151 A AU2001259151 A AU 2001259151A AU 5915101 A AU5915101 A AU 5915101A AU 2001259151 A1 AU2001259151 A1 AU 2001259151A1
Authority
AU
Australia
Prior art keywords
management system
reticle management
reticle
management
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001259151A
Inventor
Thomas Mariano
Oren Wiesler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Azenta Inc
Original Assignee
PRI Automation Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PRI Automation Inc filed Critical PRI Automation Inc
Publication of AU2001259151A1 publication Critical patent/AU2001259151A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67276—Production flow monitoring, e.g. for increasing throughput
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70541—Tagging, i.e. hardware or software tagging of features or components, e.g. using tagging scripts or tagging identifier codes for identification of chips, shots or wafers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S707/00—Data processing: database and file management or data structures
    • Y10S707/99931—Database or file accessing
    • Y10S707/99933—Query processing, i.e. searching
    • Y10S707/99935—Query augmenting and refining, e.g. inexact access
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S707/00—Data processing: database and file management or data structures
    • Y10S707/99941—Database schema or data structure
    • Y10S707/99943—Generating database or data structure, e.g. via user interface
AU2001259151A 2000-04-25 2001-04-25 Reticle management system Abandoned AU2001259151A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US19945300P 2000-04-25 2000-04-25
US60199453 2000-04-25
PCT/US2001/013349 WO2001082055A1 (en) 2000-04-25 2001-04-25 Reticle management system

Publications (1)

Publication Number Publication Date
AU2001259151A1 true AU2001259151A1 (en) 2001-11-07

Family

ID=22737567

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001259151A Abandoned AU2001259151A1 (en) 2000-04-25 2001-04-25 Reticle management system

Country Status (3)

Country Link
US (1) US7058627B2 (en)
AU (1) AU2001259151A1 (en)
WO (1) WO2001082055A1 (en)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6604233B1 (en) * 1999-06-28 2003-08-05 Texas Instruments Incorporated Method for optimizing the integrated circuit chip size for efficient manufacturing
US6351684B1 (en) * 2000-09-19 2002-02-26 Advanced Micro Devices, Inc. Mask identification database server
DE10143711A1 (en) * 2001-08-30 2003-06-26 Infineon Technologies Ag Method and device for controlling the data flow when using reticles of a semiconductor component production
SG102718A1 (en) * 2002-07-29 2004-03-26 Asml Holding Nv Lithography tool having a vacuum reticle library coupled to a vacuum chamber
US8195714B2 (en) 2002-12-11 2012-06-05 Leaper Technologies, Inc. Context instantiated application protocol
US7925246B2 (en) 2002-12-11 2011-04-12 Leader Technologies, Inc. Radio/telephony interoperability system
US6928334B2 (en) * 2003-07-23 2005-08-09 Taiwan Semiconductor Manufacturing Company, Ltd. Mechanism for inter-fab mask process management
JP3975360B2 (en) * 2003-10-31 2007-09-12 セイコーエプソン株式会社 Supply control system and method, program, and information storage medium
US7660646B2 (en) * 2004-03-26 2010-02-09 Taiwan Semiconductor Manufacturing Co., Ltd. System and method providing control of reticle stocking and sorting
US7206652B2 (en) * 2004-08-20 2007-04-17 International Business Machines Corporation Method and system for intelligent automated reticle management
US7194328B1 (en) * 2006-04-04 2007-03-20 Advanced Micro Devices, Inc. Method and apparatus for tracking reticle history
US8050793B1 (en) 2006-04-04 2011-11-01 Advanced Micro Devices, Inc. Method and apparatus for linking reticle manufacturing data
US7679722B2 (en) * 2006-10-30 2010-03-16 Taiwan Semiconductor Manufacturing Co., Ltd. Reticle management systems and methods
US20080201003A1 (en) * 2007-02-20 2008-08-21 Tech Semiconductor Singapore Pte Ltd Method and system for reticle scheduling
JP2009087138A (en) * 2007-10-01 2009-04-23 Elpida Memory Inc Transport system, transport vehicle management device, and transport control method
JP2011040460A (en) * 2009-08-07 2011-02-24 Toshiba Corp Exposure apparatus and method for manufacturing semiconductor device
US8837739B1 (en) * 2012-05-13 2014-09-16 Identillect Technologies, Inc. Encryption messaging system

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW276353B (en) 1993-07-15 1996-05-21 Hitachi Seisakusyo Kk
US5625816A (en) * 1994-04-05 1997-04-29 Advanced Micro Devices, Inc. Method and system for generating product performance history
JPH0936198A (en) * 1995-07-19 1997-02-07 Hitachi Ltd Vacuum processor and semiconductor production line using the processor
CN1091258C (en) * 1995-09-04 2002-09-18 株式会社爱德万测试 Semiconductor device transferring apparatus
US5761064A (en) * 1995-10-06 1998-06-02 Advanced Micro Devices, Inc. Defect management system for productivity and yield improvement
US6108585A (en) * 1997-12-12 2000-08-22 Advanced Micro Devices, Inc. Probabilistic dispatching method and arrangement
JPH11184903A (en) * 1997-12-19 1999-07-09 Fujitsu Ltd System and method for support system development and computer readable recording medium
KR100297371B1 (en) * 1998-02-03 2001-10-25 윤종용 Method for integrally managing data of semiconductor process
US6035245A (en) * 1998-03-24 2000-03-07 Advanced Micro Devices, Inc. Automated material handling system method and arrangement
US6466945B1 (en) * 1999-12-20 2002-10-15 Chartered Semiconductor Manufacturing Ltd Accurate processing through procedure validation in software controlled environment
US6403905B1 (en) * 2000-02-02 2002-06-11 Advanced Micro Devices, Inc. Reticle stocking and sorting management system
US6606582B1 (en) * 2000-03-27 2003-08-12 Seh America, Inc. Universal system, method and computer program product for collecting and processing process data including particle measurement data

Also Published As

Publication number Publication date
US7058627B2 (en) 2006-06-06
US20010047222A1 (en) 2001-11-29
WO2001082055A1 (en) 2001-11-01

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