AU2002213123A1 - Reticle storage system - Google Patents

Reticle storage system

Info

Publication number
AU2002213123A1
AU2002213123A1 AU2002213123A AU1312302A AU2002213123A1 AU 2002213123 A1 AU2002213123 A1 AU 2002213123A1 AU 2002213123 A AU2002213123 A AU 2002213123A AU 1312302 A AU1312302 A AU 1312302A AU 2002213123 A1 AU2002213123 A1 AU 2002213123A1
Authority
AU
Australia
Prior art keywords
storage system
reticle storage
reticle
storage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002213123A
Inventor
Richard F. Foulke
Takman Lui
Cord W. Ohlenbusch
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
R FOULKE DEVELOPMENT COMPANY LLC
Original Assignee
FOULKE DEV Co R LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FOULKE DEV Co R LLC filed Critical FOULKE DEV Co R LLC
Publication of AU2002213123A1 publication Critical patent/AU2002213123A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/137—Associated with semiconductor wafer handling including means for charging or discharging wafer cassette
    • Y10S414/138—Wafers positioned vertically within cassette
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber

Landscapes

  • Health & Medical Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Library & Information Science (AREA)
  • Toxicology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2002213123A 2000-10-12 2001-10-12 Reticle storage system Abandoned AU2002213123A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US23965400P 2000-10-12 2000-10-12
US60239654 2000-10-12
US09/892,945 US6690993B2 (en) 2000-10-12 2001-06-27 Reticle storage system
US09892945 2001-06-27
PCT/US2001/031818 WO2002031597A1 (en) 2000-10-12 2001-10-12 Reticle storage system

Publications (1)

Publication Number Publication Date
AU2002213123A1 true AU2002213123A1 (en) 2002-04-22

Family

ID=26932739

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002213123A Abandoned AU2002213123A1 (en) 2000-10-12 2001-10-12 Reticle storage system

Country Status (4)

Country Link
US (2) US6690993B2 (en)
AU (1) AU2002213123A1 (en)
TW (1) TW538454B (en)
WO (1) WO2002031597A1 (en)

Families Citing this family (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8412377B2 (en) 2000-01-24 2013-04-02 Irobot Corporation Obstacle following sensor scheme for a mobile robot
US8788092B2 (en) 2000-01-24 2014-07-22 Irobot Corporation Obstacle following sensor scheme for a mobile robot
US6956348B2 (en) 2004-01-28 2005-10-18 Irobot Corporation Debris sensor for cleaning apparatus
US6690993B2 (en) * 2000-10-12 2004-02-10 R. Foulke Development Company, Llc Reticle storage system
US6690134B1 (en) 2001-01-24 2004-02-10 Irobot Corporation Method and system for robot localization and confinement
US7571511B2 (en) * 2002-01-03 2009-08-11 Irobot Corporation Autonomous floor-cleaning robot
JP4696373B2 (en) * 2001-02-20 2011-06-08 東京エレクトロン株式会社 Processing system and method of conveying object
KR100383260B1 (en) * 2001-03-08 2003-05-09 삼성전자주식회사 Reticle Sending Apparatus with Fork Arm having Reticle Position Sensing Ability
US7663333B2 (en) * 2001-06-12 2010-02-16 Irobot Corporation Method and system for multi-mode coverage for an autonomous robot
US8396592B2 (en) 2001-06-12 2013-03-12 Irobot Corporation Method and system for multi-mode coverage for an autonomous robot
US6760641B2 (en) * 2001-08-08 2004-07-06 Asml Holding N.V. Discrete time trajectory planner for lithography system
US9128486B2 (en) 2002-01-24 2015-09-08 Irobot Corporation Navigational control system for a robotic device
CH695872A5 (en) * 2002-07-29 2006-09-29 Brooks Pri Automation Switzerl Reticle handling device.
US8386081B2 (en) 2002-09-13 2013-02-26 Irobot Corporation Navigational control system for a robotic device
US8428778B2 (en) 2002-09-13 2013-04-23 Irobot Corporation Navigational control system for a robotic device
TWI286674B (en) * 2002-12-27 2007-09-11 Asml Netherlands Bv Container for a mask, method of transferring lithographic masks therein and method of scanning a mask in a container
US7016019B2 (en) 2003-12-16 2006-03-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7332890B2 (en) 2004-01-21 2008-02-19 Irobot Corporation Autonomous robot auto-docking and energy management systems and methods
US7720554B2 (en) 2004-03-29 2010-05-18 Evolution Robotics, Inc. Methods and apparatus for position estimation using reflected light sources
EP1776623B1 (en) 2004-06-24 2011-12-07 iRobot Corporation Remote control scheduler and method for autonomous robotic device
US7706917B1 (en) 2004-07-07 2010-04-27 Irobot Corporation Celestial navigation system for an autonomous robot
US8972052B2 (en) 2004-07-07 2015-03-03 Irobot Corporation Celestial navigation system for an autonomous vehicle
US20060182556A1 (en) * 2005-01-10 2006-08-17 Au Optronics Corporation Substrate transportation device (wire)
AU2006214016B2 (en) * 2005-02-18 2011-11-10 Irobot Corporation Autonomous surface cleaning robot for wet and dry cleaning
US8392021B2 (en) * 2005-02-18 2013-03-05 Irobot Corporation Autonomous surface cleaning robot for wet cleaning
US7620476B2 (en) 2005-02-18 2009-11-17 Irobot Corporation Autonomous surface cleaning robot for dry cleaning
US8930023B2 (en) 2009-11-06 2015-01-06 Irobot Corporation Localization by learning of wave-signal distributions
US7400383B2 (en) * 2005-04-04 2008-07-15 Entegris, Inc. Environmental control in a reticle SMIF pod
KR101300492B1 (en) 2005-12-02 2013-09-02 아이로보트 코퍼레이션 Coverage robot mobility
EP2816434A3 (en) 2005-12-02 2015-01-28 iRobot Corporation Autonomous coverage robot
ES2718831T3 (en) 2005-12-02 2019-07-04 Irobot Corp Robot system
ES2423296T3 (en) 2005-12-02 2013-09-19 Irobot Corporation Modular robot
EP2544066B1 (en) * 2005-12-02 2018-10-17 iRobot Corporation Robot system
US20090044370A1 (en) 2006-05-19 2009-02-19 Irobot Corporation Removing debris from cleaning robots
US8417383B2 (en) 2006-05-31 2013-04-09 Irobot Corporation Detecting robot stasis
US7896602B2 (en) 2006-06-09 2011-03-01 Lutz Rebstock Workpiece stocker with circular configuration
WO2007149513A2 (en) * 2006-06-19 2007-12-27 Entegris, Inc. System for purging reticle storage
US20080112787A1 (en) 2006-11-15 2008-05-15 Dynamic Micro Systems Removable compartments for workpiece stocker
US20090028669A1 (en) * 2007-07-25 2009-01-29 Dynamic Micro Systems Removable compartments for workpiece stocker
JP4670808B2 (en) * 2006-12-22 2011-04-13 ムラテックオートメーション株式会社 Container transport system and measuring container
KR101494024B1 (en) * 2007-02-28 2015-02-16 엔테그리스, 아이엔씨. Purge system for a substrate container
WO2008141186A2 (en) 2007-05-09 2008-11-20 Irobot Corporation Autonomous coverage robot
US8492283B2 (en) * 2007-08-28 2013-07-23 Taiwan Semiconductor Manufacturing Co., Ltd. Method and structure for automated inert gas charging in a reticle stocker
WO2009114193A2 (en) * 2008-03-13 2009-09-17 Fortrend Engineering Corporation Bare reticle storage chamber and stocker
US20090314609A1 (en) * 2008-06-18 2009-12-24 Krakosh Iii Frank Item-conveying device
KR101541538B1 (en) * 2008-12-19 2015-08-04 세메스 주식회사 Unit for transferring a wafer and probe station including the same
US8886354B2 (en) * 2009-01-11 2014-11-11 Applied Materials, Inc. Methods, systems and apparatus for rapid exchange of work material
US8127562B2 (en) * 2009-03-11 2012-03-06 Verizon Patent And Licensing Inc. Cover assembly for air conditioner opening
US8759084B2 (en) 2010-01-22 2014-06-24 Michael J. Nichols Self-sterilizing automated incubator
JP5647269B2 (en) 2010-02-16 2014-12-24 アイロボット コーポレイション Vacuum cleaner brush
TWI454348B (en) * 2010-03-25 2014-10-01 Hon Hai Prec Ind Co Ltd Sucking device
US9436185B2 (en) 2010-12-30 2016-09-06 Irobot Corporation Coverage robot navigating
US20130251493A1 (en) * 2012-03-26 2013-09-26 Shenzhen China Star Optoelectronics Technology Co., Ltd. Stacking device and air purification system thereof
JP6526660B6 (en) 2013-08-12 2019-06-26 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ System, apparatus, and method for substrate processing with environmental control of factory interface
US9669432B2 (en) * 2013-08-27 2017-06-06 Te Connectivity Corporation Component feeding system
WO2016085622A1 (en) 2014-11-25 2016-06-02 Applied Materials, Inc. Substrate processing systems, apparatus, and methods with substrate carrier and purge chamber environmental controls
CN108093649A (en) * 2015-03-16 2018-05-29 精工爱普生株式会社 Electronic component handling apparatus and electronic component inspection device
CN107664921B (en) 2016-07-29 2019-12-24 上海微电子装备（集团）股份有限公司 Leveling type plate library equipment

Family Cites Families (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4757355A (en) 1985-10-29 1988-07-12 Canon Kabushiki Kaisha Mask storing mechanism
US4999671A (en) * 1986-07-11 1991-03-12 Canon Kabushiki Kaisha Reticle conveying device
US4986715A (en) * 1988-07-13 1991-01-22 Tokyo Electron Limited Stock unit for storing carriers
US5059079A (en) * 1989-05-16 1991-10-22 Proconics International, Inc. Particle-free storage for articles
JPH03155111A (en) * 1989-11-13 1991-07-03 Dan Sangyo Kk Clean stocker
US5181819A (en) * 1990-10-09 1993-01-26 Tokyo Electron Sagami Limited Apparatus for processing semiconductors
KR940006241A (en) * 1992-06-05 1994-03-23 이노우에 아키라 Substrate transfer device and transfer method
KR100221983B1 (en) * 1993-04-13 1999-09-15 히가시 데쓰로 A treating apparatus for semiconductor process
US5565034A (en) * 1993-10-29 1996-10-15 Tokyo Electron Limited Apparatus for processing substrates having a film formed on a surface of the substrate
US6081857A (en) * 1993-12-17 2000-06-27 Storage Technology Corporation System and method for identifying and managing data storage volumes using electromagnetic transducers
US5426581A (en) * 1994-08-15 1995-06-20 International Business Machines Corporation Using a bar code scanner to calibrate positioning of a robotic system
US5655060A (en) * 1995-03-31 1997-08-05 Brooks Automation Time optimal trajectory for cluster tool robots
US6082951A (en) * 1998-01-23 2000-07-04 Applied Materials, Inc. Wafer cassette load station
JPH11214479A (en) * 1998-01-23 1999-08-06 Tokyo Electron Ltd Apparatus and method of treating substrate and apparatus for transporting substrate
US6038490A (en) * 1998-01-29 2000-03-14 International Business Machines Corporation Automated data storage library dual picker interference avoidance
JPH11249286A (en) * 1998-02-26 1999-09-17 Innotech Corp Reticule storage device
EP0940721A3 (en) 1998-03-04 2003-03-12 Agilent Technologies, Inc. (a Delaware corporation) Reticle library apparatus and method
US6035245A (en) * 1998-03-24 2000-03-07 Advanced Micro Devices, Inc. Automated material handling system method and arrangement
KR100646906B1 (en) * 1998-09-22 2006-11-17 동경 엘렉트론 주식회사 Substrate processing apparatus and substrate processing method
JP4365934B2 (en) * 1999-05-10 2009-11-18 キヤノン株式会社 Exposure apparatus, semiconductor manufacturing apparatus, and device manufacturing method
US6213705B1 (en) * 1999-08-24 2001-04-10 Storage Technology Corporation Tape storage library apparatus having integrated camera, proximity sensor, and reach safe sensor
US6308107B1 (en) * 1999-08-31 2001-10-23 Advanced Micro Devices, Inc. Realtime decision making system for reduction of time delays in an automated material handling system
US6351685B1 (en) * 1999-11-05 2002-02-26 International Business Machines Corporation Wireless communication between multiple intelligent pickers and with a central job queue in an automated data storage library
US6301522B1 (en) * 1999-11-08 2001-10-09 Pitney Bowes Inc. Motion control methodology for a high-speed inserting machine or other mailing apparatus
US6520727B1 (en) * 2000-04-12 2003-02-18 Asyt Technologies, Inc. Modular sorter
US6658324B2 (en) * 2000-09-29 2003-12-02 Gpc Biotech Ag Pick and place robot system
US6662067B1 (en) * 2000-10-07 2003-12-09 Ford Motor Company Method of optimizing part transfer motion
US6690993B2 (en) * 2000-10-12 2004-02-10 R. Foulke Development Company, Llc Reticle storage system
WO2003007129A2 (en) * 2001-07-13 2003-01-23 Broks Automation, Inc. Trajectory planning and motion control strategies for a planar three-degree-of-freedom robotic arm

Also Published As

Publication number Publication date
US20040158348A1 (en) 2004-08-12
TW538454B (en) 2003-06-21
WO2002031597A1 (en) 2002-04-18
US6690993B2 (en) 2004-02-10
US20020044856A1 (en) 2002-04-18

Similar Documents

Publication Publication Date Title
AU2002213123A1 (en) Reticle storage system
AU2001239746A1 (en) Group-browsing system
AU2002220270A1 (en) Intracardiovascular access (icvatm) system
AU2001243227A1 (en) Remote-to-remote position locating system
AU2001246442A1 (en) Navigation system
AU3942801A (en) Navigation system
AU2001271592A1 (en) Containment system
AU2001271498A1 (en) Glint-resistant position determination system
AU2002213327A1 (en) Battery system
AU2001259151A1 (en) Reticle management system
AUPQ003699A0 (en) Storage system
AU2002218760A1 (en) Transport system
AU2001284775A1 (en) Anti-balling system
AU4085701A (en) Search systems
AU2001260461A1 (en) Location system
AU2001289885A1 (en) Air-preparation system
AU4868201A (en) Tracking system
AUPQ726700A0 (en) Containment system
AU2001294427A1 (en) Floating storage system
AU2001284194A1 (en) Storage facility
AU2002225510A1 (en) Wall system
AU2002357955A1 (en) Storage system
AU2002222332A1 (en) Storage system
AU2001293667A1 (en) Buckle-fastener system
AUPR222900A0 (en) Line clearance system