KR970013175A - 기판처리장치 - Google Patents

기판처리장치 Download PDF

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KR970013175A
KR970013175A KR1019960032495A KR19960032495A KR970013175A KR 970013175 A KR970013175 A KR 970013175A KR 1019960032495 A KR1019960032495 A KR 1019960032495A KR 19960032495 A KR19960032495 A KR 19960032495A KR 970013175 A KR970013175 A KR 970013175A
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South Korea
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substrate
chamber
transfer chamber
processing apparatus
substrate processing
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KR1019960032495A
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KR100310249B1 (ko
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슈지 요네미츠
토시카즈 카리노
히사시 요시다
신이치로 와타히키
유지 요시다
히데오 시무라
타케시 스기모토
아부라타니유키노리
카즈히토 이케다
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시바타 쇼타로
고쿠사이덴키 가부시키가이샤
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Publication of KR970013175A publication Critical patent/KR970013175A/ko
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Publication of KR100310249B1 publication Critical patent/KR100310249B1/ko

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Abstract

본 발명은 전용면적이 작은 기판처리장치를 제공하는 것을 목적으로 하며, 웨이퍼 반송실(50)의 웨이퍼 반송실 벽(53)에 다수의 반응실(70)을 적층하여 설치하고, 웨이퍼 반송실(50)의 웨이퍼 반송실 벽(54)에 웨이퍼 수수실(30)을 설치한다. 웨이퍼 수수실(50)내에는 석영제 웨이퍼 지지구(40)를 설치한다. 웨이퍼 반송실(50), 다수의 반응실(70) 및 웨이퍼 수수실(30)을 각각 독립하여 감압가능하게 한다. 웨이퍼 반송실(50)의 내부에 웨이퍼 반송 진공로보트(60)를 설치한다. 반도체 웨이퍼 처리장치(1) 전체를 하우징(900)의 내부에는 카셋(10)을 제시하는 카셋선반(11)을 설치한다. 웨이퍼 수수실(30)과 카셋선반(11)과의 사이에 카셋 반송겸 카셋 반송기(20)를 설치한다.

Description

기판처리장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제2도는 제1도의 XX선 단면도이다.

Claims (33)

  1. 감압가능한 기판반송실과, 기판을 처리하도록 상기 기판반송실의 제1측벽에 형성된 기판처리실과, 상기 기판반송실의 제2측벽에 형성되며, 상기 기판반송실과는 독립적으로 감압가능한 기판수수실과, 상기 기판을 지지하도록 상기 기판 수수실내에 설치된 제1기판지지수단과, 상기 기판을 지지하도록 상기 기판처리실내에 설치된 제2기판지지수단과, 상기 기판반송실에 설치되어 상기 기판처리실과 상기 기판수수실과의 사이에서 상기기판을 반송가능한 제1기판반송수단돠, 상기 기판처리실과 상기 기판처리실과의 사이에 설치되어, 닫힌 경우에는 상기 기판처리실과 상기 기판반송실과의 사이를 진공적으로 기밀하게 할 수 있고, 열린 경우에는 상기 기판이 그 내부를 통해서 이동가능한 제1밸브와 상기 기판반송실과 상기 기판수수실과의 사이에 설치되어, 닫힌 경우에는 상기 기판반송실과 상기 기판수수실과의 사이를 진공적으로 기밀하게 할 수 있고, 열린 경우에는 상기기판이 그 내부를 통해서 이동가능한 제2밸브와, 상기 기판수수실의 상기 기판반송실이 설치된 쪽과는 다른 쪽에 배치된 대기압부와, 상기 기판수수실과 상기 대기압부와의 사이에 설치되어, 닫힌 경우에는 상기 기판수수실과 상기 대기압부와의 사이를 진공적으로 기밀하게 할 수 있고, 열린 경우에는 상기 기판이 그 내부를 통해서 이동가능한 제3밸브와, 상기 대기압부에 설치된 카셋 지지수단와, 상기 대기압부에 설치되며 상기 카셋지지수단에 지지되는 카셋과 상기 기판수수실과의 사이에서 상기 기판을 반송가능한 제2기판반송수단을 구비하는 것을 특징으로 하는 기판처리장치
  2. 제1항에 있어서, 상기 제1기판지지수단의 내열성의 기판지지수단인 것을 특징으로 하는 기판처리장치
  3. 제2항에 있어서, 상기 제1기판지지수단이 석영, 유리, 세라믹 및 금속으로 이루어지는 군에서 선택되는 어느 하나의 재료로 이루어져 있는 것을특징으로 하는 기판처리장치
  4. 제1항 내지 제3항의 어느 한 항에 있어서, 상기 기판처리실, 상기 기판반송실 및 상기 기판수수실이 각각 독립하여 감압가능한 것을 특징으로 하는 기판처리장치
  5. 제1항 내지 제4항의 어느 한 쌍에 있어서, 상기 기판처리실이 감압하에서 처리를 행하는 기판처리실인 것을 특징으로 하는 기판처리장치
  6. 제1항 내지 제4항의 어느 한 항에 있어서, 상기 기판처리실이 상압하에서 처리를 행항는 기판처리실인 것을 특징으로 하는 기판처리장치
  7. 제1항 내지 제6항의 어느 한 항에 있어서, 상기 기판반송실의 상기 제1측벽에 기판을 각각 처리하는 다수의 기판처리실을 수직방향으로 적층하여 설치한 것을 특징으로 하는 기판처리장치
  8. 제7항에 있어서, 상기 다수의 기판처리실중 적어도 하나의 기판처리실이 상압하에서 처리를 행하는 기판처리실이고, 상기 다수의 기판처리실중의 다른 기판처리실이 감압하에서 처리를 행하는 기판처리실인 것을 특징으로 하는 기판처리장치
  9. 제1항 내지 제 8항의 어느 한 항에 있어서, 상기 제2기판지지수단이 다수매의 기판을 지지가능하고, 상기기판지지수단이 다수매의 기판을 지지가능하며, 상기 제1기판지지수단이의해 지지되는 기판사이의 피치가 상기 제2기판지지수단에 의해 지지되는 기판사이의 피치와 실질적으로 동일한 것을 특징으로 하는 기판처리장치
  10. 제9항에 있어서, 상기 제1기판반송수단이 감압하에서 다수매의 상기 기판을 동시에 반송가능한 것을 특징으로 하는 기판처리장치
  11. 제9항 내지 제10항에 있어서, 상기 제2기판반송수단의 다수매의 상기 기판을 동시에 반송가능하고, 상기 다수매의 기판사이의 피치를 가변으로 하는 것을 특징으로 하는 기판처리장치
  12. 제1항에 내지 제11항의 어느 한 항에 있어서, 상기 기판반송실의 상기 제2측벽에 다수의 기판수수실을 수직방향으로 적충하여 설치한 것을 특징으로 하는 기판처리장치
  13. 제13항에 있어서, 반입용 반출용 2종류의 기판수수실을 별도로 설치하는 것을 특징으로 하는 기판처리장치
  14. 제1항 내지 제13항의 어느 한 항에 있어서, 상기 베1기판지지수단이 상기 기판처리실의 각각에 있어서, 한번에 처리되는 상기 기판의 매수의 적어도 2배이상의 기판을 지지가능한 것을 특징으로 하는 기판처리장치
  15. 제1항 내지 제13항의 어느 한 항에 있어서, 상기 제1기판지지수단이 상기 제2기판지지수단보다도 적어도 2배이상 매수의 기판을 지지가능한 것을 특징으로 하는 기판처리장치
  16. 제1항 내지 제15항의 어느 한 항에 있어서, 상기 기판반송실의 상기 제1측벽과 상기 제2측벽이 서로 대향하고 있고, 상기 기판처리실과, 상기 기판반송실과, 상기 기판수수실이 실질적으로 일직선상에 배치되어 있는 것을 특징으로 하는 기판처지장치
  17. 제16항에 있어서, 상기 기판반송실이 평면도적으로는 장방향 형상인 것을 특징으로 하는 기판처리장치
  18. 제1항 내지 제17항의 어느 한 항에 있어서, 상기 카셋지지수단이 상기 기판수수실에 대해서 상기 기판반송실과는 반대측에 배치되어 있는 것을 특징으로 하는 기판처리장치
  19. 제1항 내지 제18항의 어느 한 항에 있어서, 상기 제2기판반송수단의 상기 기판수수실과 상기 카셋 지지수단과의 사이에 설치되어 있고, 상기 제2기판반송수단이 상기 카셋 지지수단으로 지지되는 상기 카셋과 상기 기판수수실과의 사이에서 상기 기판을 반송가능함과 동시에 상기 카셋을 상기 카셋 지지수단으로 반송할 수 있고 상기 카셋 지지수단으로부터 상기 카셋을 반송할 수 있는 카셋 반송겸 기판반송수단인 것을 특징으로 하는 기판처리장치
  20. 제1항 내지 제19항의 어느 한 항에 있어서, 상기 제1기판지지수단에 의해 상기 제1기판지지수단의 전후의 방향으로 개방한 기판재치용 홈을 형성하고, 상기 기판을 상기 기판지지수단의 전후로부터 상기 기판지지수단에 반입할 구 있음과 동시에 상기 기판을 상기 기판수단으로부터 상기 기판지지수단의 전후로 반출할 수 있도록 한 것을 특징으로 하는 기판처리장치
  21. 제1항 내지 제20항의 어느 한 항에 있어서, 상기 기판처리실과, 상기 기판반송실과, 상기 기판수수실와, 상기 제2기판반송수단과, 상기 카셋 지지수단을 수수하는 하우징을 구비한 것을 특징으로 하는 기판처리장치
  22. 제21항에 있어서, 상기 하우징에 상기 카셋을 반입한 후에 상기 하우징내에서 상기 카셋을 지지하든가, 상기 하우징으로부터 사이 카셋을 반출하기 전에 상기 카셋을 지지하든가, 또는 상기 하우징에 상기 카셋을 반입한 후 하우징내에서 상기 카셋을 지지함과 동시에 상기 하우징으로부터 카셋을 반출하기 전에 상기 카셋을 지지하는 카셋 스테이지를 상기 카셋 지지수단 아래의 상기 하우징내에 설치하는 것을 특징으로 하는 기판처리장치
  23. 제22항에 있어서, 상하승강기에 상기 카셋 반송겸 기판반송수단을 설치하고, 상기 카셋 스테이지와 상기 카셋 지지수단의 사이에서 상기 카셋을 반송가능하게 한 것을 특징으로 하는 기판처리장치
  24. 상기 기판처리실과, 상기 기판반송실과, 상기 제1기판반송수단과, 상기 기판수수실을 각각 구비하는 기판처리장치 유닛을 다수 구비하고, 상기 다수의 기판처리장치 유닛 사이를 상기 기판반송실 사이에 설치한 제2기판수수실을 통해서 접속하는 것을 특징으로 하는 기판처리장치
  25. 상기 기판반송실이 평면도적으로 장방향 향상이고, 상기 다수의 기판처리장치 유닛 사이를 기판반송실 사이에 상기 제2기판수수실을 통해서 접속하는 것을 특징으로 하는 기판처리장치
  26. 기판반송실과, 상기 기판반송실의 한쪽벽에 수직방향으로 적층되어져, 서로 이간하여 설치된 다수의 기판처리실과, 상기 기판반송실내에 설치된 기판반송기로서, 기판을 상기 다수의 기판처리실에 반송가능한 기판반송기를 구비하는 것을 특징으로 하는 기판처리장치
  27. 제26항에 있어서, 상기 기판반송실이 감압하에서 기판반송을 행하는 기판반송실인 것을 특징으로 하는 기판처리장치
  28. 제26항 또느 제27항에 있어서, 상기 기판반송실이 감압가능하고, 상기 기판반송기가 감압하에서 기판반송가능한 것을 특징으로 하는 기판처리장치
  29. 제26항 내지 제 28항의 어느 한 항에 있어서, 상기 기판처리실과 상기 기판반송실과의 사이에, 닫힌 경우에는 상기 기판처리실과 상기 기판반송실과의 사이를 기밀하게 할 수 있고, 열린 경우에는 상기 기판처리실과 상기 기판반송실과의 사이를 기밀하게 할 수 있고 열린 경우에는 기판이 그 내부를 통해서 이동가능한 제1밸브와 각각 설치되어 있는 것을 특징으로 하는 기판처리장치
  30. 제26항 내지 제28항의 어느 한 항에 있어서, 상기 다수의 기판처리실과 상기 기판반송실과의 사이에, 닫힌 경우에는 상기 기판처리실과 기판반송실과의 사이를 진공적으로 기밀하게 할 수 있고, 열린 경우에는 기판이 그 내부를 통해서 이동가능한 제1밸브가 각각 설치되어 있는 것을 특징으로 하는 기판처리장치
  31. 제26항 내지 제30항의 어느 한 항에 있어서, 상기 다수의 기판반송실의 상기 한쪽벽과는 다른 다른쪽 벽에 수직방향으로 적층되어, 서로 이간하여 설치된 다수의 기판수용실을 가지는 것을 특징으로 하는 기판처리장치
  32. 제26항 내지 제31항의 어느 한 항에 있어서, 상기 다수의 기판수용실과 상기 기판반송실과의 사이에 닫힌 경우에는 상기 기판수용실과 상기 기판반송실과의 사이를 기밀하게 할 수 있고, 열린 경우에는 기판이 그 내부를 통해서 이동가능한 제2밸브가 각각 설치되어 있는 것을 특징으로 한는 기판처리장치
  33. 제26항 내지 제31항의 어느 한 항에 있어서, 상기 다수의 기판수용실과 상기 기판반송실과의 사이에, 닫힌 경우에는 상기 기판수용실과 상기 기판반송실과의 사이를 진공적으로 기밀하게 할 수 있고, 열린 경우에는 기판이 그 내부를 통해서 이동가능한 제2밸브가 각각 설치되어 있는 것을 특징으로 하는 기판처리장치
KR1019960032495A 1995-08-05 1996-08-03 기판처리장치 KR100310249B1 (ko)

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KR100310249B1 (ko) * 1995-08-05 2001-12-17 엔도 마코토 기판처리장치
US5879459A (en) * 1997-08-29 1999-03-09 Genus, Inc. Vertically-stacked process reactor and cluster tool system for atomic layer deposition

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US5788447A (en) 1998-08-04
US6066210A (en) 2000-05-23
KR100310249B1 (ko) 2001-12-17
KR100244041B1 (ko) 2000-02-01
US6143083A (en) 2000-11-07
KR970012986A (ko) 1997-03-29

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