KR970012986A - 기판처리장치 - Google Patents

기판처리장치 Download PDF

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KR970012986A
KR970012986A KR1019960032496A KR19960032496A KR970012986A KR 970012986 A KR970012986 A KR 970012986A KR 1019960032496 A KR1019960032496 A KR 1019960032496A KR 19960032496 A KR19960032496 A KR 19960032496A KR 970012986 A KR970012986 A KR 970012986A
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South Korea
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substrate
chamber
transfer chamber
processing apparatus
substrate transfer
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KR1019960032496A
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KR100244041B1 (ko
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슈지 요네미츠
토시카즈 카리노
히사시 요시다
신이치로 와타히키
유지 요시다
히데오 시무라
타케시 스기모토
유키노리 아부라타니
카즈히토 이케다
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시바타 쇼타로
고쿠사이덴키 가부시키가이샤
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Publication of KR970012986A publication Critical patent/KR970012986A/ko
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Publication of KR100244041B1 publication Critical patent/KR100244041B1/ko

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    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/06—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising selenium or tellurium in uncombined form other than as impurities in semiconductor bodies of other materials
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    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract

본 발명은 승강기등에 의해 장치내를 오염되는 것을 방지할 수 있는 기판처리장치를 제공하는 것을 목적으로 하며, 웨이퍼 반송실(50)의 벽(53)에 다수의 반응실 (70)을 적층하여 설치한다. 웨이퍼 반송실(50)의 벽(54)에 웨이퍼 수용실(30)을 설치한다. 카셋(10)을 지지하는 카셋선반(11)을 설치한다. 웨이퍼 반송실(50)을 진공이 형성할 수 있도록, 그내부에는 웨이퍼 반송 진공 로보트(60)를 설치한다. 웨이퍼 반송실(50)의 저면(56)에 관통구멍(57)을 설치한다. 웨이퍼 반송실(50)의 외부의 하측에는 볼 나사(나사축561), 너트(565)를 설치한다. 저트(565)에 승강대(564)를 고정하고, 승강대(564)에 웨이퍼 반송 진공 로보트 지지봉(563)의 일단부를 고정하고, 그 타단부는 웨이퍼 반송 진공 로보트(60)에 고정한다. 벨로우즈(562)의 양단부를 기밀하게 고정한다.

Description

기판처리장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
도2는 도1의 XX선 단면도이다

Claims (26)

  1. 감압가능한 기판반송실과, 상기 기판반송실의 제1측벽에 수직방향으로 적층되어 형성된 다수의 기판처리실과, 상기 다수의 기판처리실과 상기 기판반송실과의 사이에 각각 설치되며, 닫힌 경우에는 상기 기판처리실과 상기 기판반송실과의 사이를 진공적으로 기밀하게 할 수 있고, 열린 경우에는 기판이 그 내부를 통하여 이동가능한 다수의 제1밸브와, 상기 기판반송실의 제2측벽에 형성된 기판수용실과, 상기 기판반송실내에 설치되며, 상기 기판처리실과 상기 기판수용실과의 사이에서 상기 기판을 감압하에서 반송 가능한 기판반송기와, 상기 기판 반송실의 외부에 설치되며, 고정부와 상기 고정부에 대해 승강 가능한 승강부를 가지는 승강수단과, 상기 기판 반송실의 소정면에 형성된 관통구멍내를 이동가능한 강체이며, 상기 승강부와 상기 기판반송기를 상기 관통구멍을 통하여 기계적으로 접속하는 접속부재와, 상기 소정면과 상기 소정면에 형성된 상기 관통구멍을 관통하는 상기 접속부재와의 사이를 진공적으로 기밀하게 유지하는 기밀부재를 구비하는 것을 특징으로 하는 기판처리장치.
  2. 제1항에 있어서, 상기 기판반송기가 상기 기판을 실질적으로 수평방향을 반송가능한 기판반송기인 것을 특징으로 하는 기판처리장치.
  3. 제1항 또는 제2항에 있어서, 상기 기밀부재가 탄성체로 구성되어 있고, 상기 접속부재가 상기 기밀부재에 의해 피복되어 있고, 상기 접속부재가 상기 기밀부재내를 이동가능하고, 상기 기밀부재의 일단부가 상기 소정면과 진공적으로 기밀하게 접속되어 있고, 상기 기밀부재의 타단부가 상기 접속부재와 진공적으로 기밀하게 접속되어 있는 것을 특징으로 하는 기판처리장치.
  4. 제3항에 있어서, 상기 기밀부재가 벨로우즈인 것을 특징으로 하는 기판처리장치.
  5. 청구항1 내지 청구항4항의 어느 한항에 있어서, 상기 고정부가 나사축이고, 상기 승강부는 너트를 구비하고, 사기 나사축과 상기 너트에 의해 볼 나사를 구성하고 있는 것을 특징으로 하는 기판처리장치.
  6. 제5항에 있어서, 상기 기판반송실의 소정면에 상기 기판반송실의 저면이고, 상기 볼 나사가 상기 기판방송실의 하측에 설치되어 있는 것을 특징으로 하는 기판처리장치.
  7. 제5항에 있어서, 상기 기판반송실의 상기 소정면이 상기 기판반송실의 상부면이고, 상기 볼 나사가 상기 기판반송실의 상측에 설치되어 있는 것을 특징으로 하는 기판처리장치.
  8. 제1항 내지 제7항의 어느 한 항에 있어서, 상기 기판반송기가 구동부와 상기 구동부에 의해 실질적으로 수평방향으로 이동가능한 기판반송부와 진공적으로 기밀성의 구동부 수용 용기를 구비하고 있고, 상기 구동부가 상기 구동부 수용 용기내에 수용되어 있는 것을 특징으로 하는 기판처리장치.
  9. 제8항에 있어서, 상기 강체의 접속부재의 일단부와 상기 구동부 수용 용기의 상기 기판반송부측의 단부근방이 접속되어 있는 것을 특징으로 하는 기판처리장치.
  10. 제8항 또는 제9항에 있어서, 상기 기판반송실의 상기 소정면이 상기 기판반송실의 저면 및 상부면의 어느 한족이고, 상기 기판반송실의 상기 소정면이 상기 기판반송실의 저면인 경우에는 상기 저면에 상기 구동부 수용 용기의 외형에 맞춘 볼록부를 형성하고, 상기 기판반송실의 상기 소정면이 상기 기판반송실의 상부면인 경우에는 상기 상면부에 상기 구동부 수용 용기의 외형에 맞춘 볼록부를 형성하고, 상기 볼록부내에 상기 구동부 수용 용기를 수용 가능하게 한 것을 특징으로 하는 기판처리장치.
  11. 제10항에 있어서, 상기 기판반송실의 상기 소정면이 상기 기판반송실의 저면인 것을 특징으로 하는 기판처리장치.
  12. 청구항 1 내지 청구항 11항의 어느 한 항에 있어서, 상기 기판수용실과 상기 기판반송실과의 사이에는 닫힌 경우에 상기 기판반송실과 상기 기판반송실과의 사이를 진공적으로 기밀하게 할 수 있고, 열린 경우에는 상기 기판이 그 내부를 통하여 이동 가능한 제2밸브가 설치되어 있고, 상기 기판 수용실이 상기 기판반송실과 독립하여 감압 가능한 것을 특징으로 하는 기판처리장치.
  13. 제12항에 있어서, 상기 기판수용실의 상기 기판반송실이 설치된 쪽과는 다른 쪽에 배치된 대기압부와, 상기 기판수용실과 상기 대기압부와의 사이에 설치되며 닫힌 경우에는 상기 기판 수용실과 상기 대기압부와의 사이를 진공적으로 기밀하게 할 수 있고, 열린 경우에는 상기 기판이 그 내부를 통하여 이동 가능한 제3밸브를 추가로 구비하는 것을 특징으로 하는 기판처리장치.
  14. 제1내지 제11항의 어느 한 항에 있어서, 상기 기판반송실의 상기 제2 측벽에 다수의 기판수용실의 수직방향으로 적층되어 설치되어 있고, 상기 다수의 기판수용실과 상기 기판반송실과의 사이가 닫힌 경우에는 상기 다수의 기판수용실과 상기 기판반송실과 사이를 각각 진공적으로 기밀하게 할 수 있고, 열린 경우에는 상기 기판이 그 내부를 통하여 이동 가능한 다수의 제4밸브가 각각 설치되어 있고, 상기 다수의 기판수용실의 각각이 다른 기판수용실과 독립해서 감압 가능하고, 상기 다수의 기판 수용실의 각각과 상기 기판반송실이 상호 독립해서 감압 가능한 것을 특징으로 하는 기판처리장치.
  15. 제1항 내지 제14항에 있어서, 상기 기판수용실의 상기 기판반송실이 형성된 쪽과는 다른쪽에 배치된 대기압부와, 상기 대기압부에 설치된 카셋 지지수단과, 상기 대기압부에 설치되며, 상기 카셋 지지수단에 지지되는 카셋과 상기 기판수용부와의 사이에서 상기 기판을 반송가능한 기판반송수단을 추가로 구비하는 것을 특징으로 하는 기판처리장치.
  16. 제15항에 있어서, 상기 기판처리실과, 상기 기판반송실과, 상기 기판수용실과, 상기 기판반송수단과 상기 카셋 지지수단을 수용하는 하우징를 추가로 구비하는 것을 특징으로 하는 기판처리장치.
  17. 제10항 또는 제11항에 있어서, 적어도 상기 기판반송실과 상기 다수의 기판처리실과 상기 기판수용실을 수용하는 하우징를 추가로 구비하고, 상기 기판반송실의 상기 볼록부, 상기 승강수단 및 상기 접속부재의 적어도 일부가 상기 하우징으로부터 돌출하여 설치된 것을 특징으로 하는 기판처리장치.
  18. 제1항 내지 제17항의 어느 한 항에 있어서, 상기 기판수용실에 설치된 내열성의 제1 기판지지수단을 추가로 가지는 것을 특징으로 하는 기판처리장치.
  19. 제1항 내지 제18항의 어느 한 항에 있어서, 상기 기판을 지지하며 상기 기판수용실내에 설치된 제1 기판지지수단과, 상기 기판을 지지하며 상기 기판처리실내에 설치된 제2 기판지지수단을 추가로 구비하고, 상기 제2 기판지지수단이 다수매의 기판을 지지가능하고, 상기 제1 기판지지수단이 다수매의 기판을 지지가능하고, 상기 제1 기판지지수단에 지지되는 기판 사이의 피치가 상기 제2 기판지지수단에 의해 지지되는 기판 사이의 피치아 실질적으로 같은 것을 특징으로 하는 기판처리장치.
  20. 제15항 또는 제16항에 있어서, 상기 기판을 지지하도록 상기 기판 수용실내에 설치된 제1 기판지지수단과, 상기 기판을 지지하도록 상기 기판처리실내에 설치된 제2 기판지지수단을 추가로 구비하고, 상기 제2 기판지지수단이 다수매의 기판을 지지가능하고, 상기 제1 기판지지수단이 다수매의 기판을 지지가능하며, 상기 제1 기판지지수단에 지지되는 기판사이의 피치가 상기 제2 기판지지수단에 의해 지지되는 기판사이의 피치와 실질적으로 같고, 상기 기판 반송 수단이 다수매의 상기 기판을 동시에 반송 가능하고, 상기 다수매의 기판 사이의 피치가 가변인 것을 특징으로 하는 기판처리장치.
  21. 제19항 또는 제20항에 있어서, 상기 기판반송기가 감압하에서 다수매의 상기 기판을 동시에 반송가능한 것을 특징으로 하는 기판처리장치.
  22. 제18항 내지 제21항의 어느 한 항에 있어서, 상기 제1 기판지지수단이 상기 기판처리실의 각각에서 한번에 처리되는 상기 기판 매수의 적어도 2배 이상 매수의 기판을 지지가능한 것을 특징으로 하는 기판처리장치.
  23. 제19항 내지 제21항의 어느 한 항에 있어서, 상기 제1 기판지지수단이 상기 제2 기판지지수단보다도 적어도 2배 이상 매수의 기판을 지지가능한 것을 특징으로 하는 기판처리장치.
  24. 제1항 내지 제23항의 어느 한 항에 있어서, 상기 기판반송실의 상기 제1측벽과 상기 제2측벽이 상호 대향하고 있고, 상기 기판처리실과, 상기 기판방송실과, 상기 기판수용실이 실질적으로 일직선상에 배치되어 있는 것을 특징으로 하는 기판처리장치.
  25. 제24항에 있어서, 상기 기판반송실이 평면도적으로는 장방형상인 것을 특징으로 하는 기판처리장치.
  26. 제15항 또는 제16항에 있어서, 상기 카셋 지지수단이 상기 기판 수수실에 대해 상기 기판반송실과는 반대측에 배치되어 있는 것을 특징으로 하는 기판처리장치.
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