CN100528838C - 具有复合结构的肟酯光引发剂 - Google Patents

具有复合结构的肟酯光引发剂 Download PDF

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Publication number
CN100528838C
CN100528838C CNB028116755A CN02811675A CN100528838C CN 100528838 C CN100528838 C CN 100528838C CN B028116755 A CNB028116755 A CN B028116755A CN 02811675 A CN02811675 A CN 02811675A CN 100528838 C CN100528838 C CN 100528838C
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CN
China
Prior art keywords
phenyl
alkyl
group
replace
unsubstituted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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CNB028116755A
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English (en)
Chinese (zh)
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CN1514845A (zh
Inventor
K·库尼莫托
J·塔纳贝
H·库拉
H·奥卡
M·奥瓦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Basf Characteristic Chemicals Holding Co ltd
BASF Schweiz AG
BASF SE
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Ciba Spezialitaetenchemie Holding AG
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Publication of CN1514845A publication Critical patent/CN1514845A/zh
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00—Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32—Oximes
    • C07C251/62—Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66—Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Materials For Photolithography (AREA)
  • Indole Compounds (AREA)
  • Pyrane Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Holo Graphy (AREA)
CNB028116755A 2001-06-11 2002-06-04 具有复合结构的肟酯光引发剂 Expired - Lifetime CN100528838C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP01810559.3 2001-06-11
EP01810559 2001-06-11

Publications (2)

Publication Number Publication Date
CN1514845A CN1514845A (zh) 2004-07-21
CN100528838C true CN100528838C (zh) 2009-08-19

Family

ID=8183958

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB028116755A Expired - Lifetime CN100528838C (zh) 2001-06-11 2002-06-04 具有复合结构的肟酯光引发剂

Country Status (10)

Country Link
US (1) US7189489B2 (https=)
EP (1) EP1395615B1 (https=)
JP (2) JP3860170B2 (https=)
KR (1) KR100801457B1 (https=)
CN (1) CN100528838C (https=)
AT (1) ATE446322T1 (https=)
CA (1) CA2446722A1 (https=)
DE (1) DE60234095D1 (https=)
TW (1) TW593357B (https=)
WO (1) WO2002100903A1 (https=)

Cited By (4)

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CN105541659A (zh) * 2003-02-19 2016-05-04 西巴特殊化学品控股有限公司 卤代肟衍生物和其作为潜在的酸的用途
CN105899502A (zh) * 2013-11-28 2016-08-24 塔科玛技术股份有限公司 光引发剂和包含其的光敏组合物
DE112020002200T5 (de) 2019-06-21 2022-01-20 IGM (Anqing) High Technology Development Co., Ltd. Photoinitiatorzusammensetzung, die Acylcarbazolderivat und Carbazoyloximester enthält, und Verwendung derselben in einer lichthärtenden Zusammensetzung
DE112020002202T5 (de) 2019-06-21 2022-01-20 IGM (Anqing) High Technology Development Co., Ltd. Neuartige Diaroylcarbazolverbindung und Verwendung derselben als Sensibilisierungsmittel

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US20040170924A1 (en) 2004-09-02
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US7189489B2 (en) 2007-03-13
JP2004534797A (ja) 2004-11-18
TW593357B (en) 2004-06-21
CN1514845A (zh) 2004-07-21
CA2446722A1 (en) 2002-12-19
JP3860170B2 (ja) 2006-12-20
KR20040007700A (ko) 2004-01-24
ATE446322T1 (de) 2009-11-15
JP2006342166A (ja) 2006-12-21
EP1395615B1 (en) 2009-10-21
EP1395615A1 (en) 2004-03-10

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