JPWO2024203080A1 - - Google Patents
Info
- Publication number
- JPWO2024203080A1 JPWO2024203080A1 JP2025510149A JP2025510149A JPWO2024203080A1 JP WO2024203080 A1 JPWO2024203080 A1 JP WO2024203080A1 JP 2025510149 A JP2025510149 A JP 2025510149A JP 2025510149 A JP2025510149 A JP 2025510149A JP WO2024203080 A1 JPWO2024203080 A1 JP WO2024203080A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Detergent Compositions (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023057642 | 2023-03-31 | ||
| PCT/JP2024/008537 WO2024203080A1 (ja) | 2023-03-31 | 2024-03-06 | 薬液、パターン形成方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024203080A1 true JPWO2024203080A1 (https=) | 2024-10-03 |
Family
ID=92904402
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025510149A Pending JPWO2024203080A1 (https=) | 2023-03-31 | 2024-03-06 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20250390021A1 (https=) |
| EP (1) | EP4692947A1 (https=) |
| JP (1) | JPWO2024203080A1 (https=) |
| TW (1) | TW202440895A (https=) |
| WO (1) | WO2024203080A1 (https=) |
Family Cites Families (59)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06273940A (ja) * | 1993-03-23 | 1994-09-30 | Tokyo Ohka Kogyo Co Ltd | リソグラフィー用リンス液 |
| US5977041A (en) * | 1997-09-23 | 1999-11-02 | Olin Microelectronic Chemicals | Aqueous rinsing composition |
| SG77689A1 (en) | 1998-06-26 | 2001-01-16 | Ciba Sc Holding Ag | New o-acyloxime photoinitiators |
| DK199901098A (da) | 1998-08-18 | 2000-02-19 | Ciba Sc Holding Ag | Sylfonyloximer til i-linie-fotoresists med høj følsomhed og høj resisttykkelse |
| US7129199B2 (en) * | 2002-08-12 | 2006-10-31 | Air Products And Chemicals, Inc. | Process solutions containing surfactants |
| NL1016815C2 (nl) | 1999-12-15 | 2002-05-14 | Ciba Sc Holding Ag | Oximester-fotoinitiatoren. |
| EP1395615B1 (en) | 2001-06-11 | 2009-10-21 | Basf Se | Oxime ester photoinitiators having a combined structure |
| KR101474900B1 (ko) | 2006-09-27 | 2014-12-19 | 후지필름 가부시키가이샤 | 화합물 또는 이것의 토토머, 금속착체 화합물, 착색 감광성경화 조성물, 컬러필터, 및 제조 |
| JP4223071B2 (ja) | 2006-12-27 | 2009-02-12 | 株式会社Ａｄｅｋａ | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
| JP5136139B2 (ja) | 2007-03-20 | 2013-02-06 | 東レ株式会社 | 樹脂ブラックマトリクス用黒色樹脂組成物、樹脂ブラックマトリクス、カラーフィルターおよび液晶表示装置 |
| JP5535065B2 (ja) | 2007-05-11 | 2014-07-02 | ビーエーエスエフ ソシエタス・ヨーロピア | オキシムエステル光重合開始剤 |
| CN102112497B (zh) | 2008-06-06 | 2013-04-10 | 巴斯夫欧洲公司 | 光引发剂混合物 |
| JP5371313B2 (ja) | 2008-07-28 | 2013-12-18 | 富士フイルム株式会社 | カラーフィルタ用着色硬化性組成物、カラーフィルタ、カラーフィルタの製造方法、及び液晶表示素子 |
| JP5577659B2 (ja) | 2008-09-18 | 2014-08-27 | 東レ株式会社 | 感光性黒色樹脂組成物、樹脂ブラックマトリクス基板、カラーフィルター基板および液晶表示装置 |
| JP2010164965A (ja) | 2008-12-19 | 2010-07-29 | Mitsubishi Chemicals Corp | カラーフィルタ画素形成用組成物、カラーフィルタ、液晶表示装置及び有機ｅｌディスプレイ |
| JP5702925B2 (ja) | 2008-12-26 | 2015-04-15 | 株式会社日本触媒 | α−アリルオキシメチルアクリル酸系重合体及びその製造方法 |
| JP2010262028A (ja) | 2009-04-30 | 2010-11-18 | Nippon Steel Chem Co Ltd | ブラックマトリックス用感光性樹脂組成物 |
| TWI605063B (zh) | 2009-11-25 | 2017-11-11 | 住友化學股份有限公司 | Resin composition and display device |
| CN102770465B (zh) | 2010-03-22 | 2015-04-22 | 汉高美国知识产权有限责任公司 | 大分子光引发剂及其可固化组合物 |
| JP2012014052A (ja) | 2010-07-02 | 2012-01-19 | Fujifilm Corp | 着色感光性樹脂組成物、カラーフィルタ、カラーフィルタの製造方法、及び液晶表示装置 |
| WO2012045736A1 (en) | 2010-10-05 | 2012-04-12 | Basf Se | Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions |
| JP5851141B2 (ja) | 2011-07-29 | 2016-02-03 | 富士フイルム株式会社 | 着色硬化性組成物、着色硬化膜、カラーフィルタ、パターン形成方法、カラーフィルタの製造方法、固体撮像素子及び画像表示装置 |
| JP2013114249A (ja) | 2011-12-01 | 2013-06-10 | Toppan Printing Co Ltd | 黒色感光性樹脂組成物およびカラーフィルタ |
| US9365515B2 (en) | 2011-12-07 | 2016-06-14 | Basf Se | Oxime ester photoinitiators |
| JP5772642B2 (ja) | 2012-02-09 | 2015-09-02 | Jsr株式会社 | 硬化性樹脂組成物、表示素子用硬化膜、表示素子用硬化膜の形成方法及び表示素子 |
| JP6026757B2 (ja) | 2012-03-12 | 2016-11-16 | 東京応化工業株式会社 | 感光性樹脂組成物、カラーフィルタ、表示装置、光重合開始剤、及び化合物 |
| KR101968462B1 (ko) | 2012-05-09 | 2019-04-11 | 바스프 에스이 | 옥심 에스테르 광개시제 |
| JP5946389B2 (ja) | 2012-07-27 | 2016-07-06 | 富士フイルム株式会社 | 近赤外線吸収性組成物、これを用いた近赤外線カットフィルタ及びその製造方法、並びに、カメラモジュール及びその製造方法 |
| JP6170673B2 (ja) | 2012-12-27 | 2017-07-26 | 富士フイルム株式会社 | カラーフィルタ用組成物、赤外線透過フィルタ及びその製造方法、並びに赤外線センサー |
| JP6065596B2 (ja) | 2013-01-16 | 2017-01-25 | Jsr株式会社 | 感放射線性着色組成物、着色硬化膜及び表示素子 |
| JP5923557B2 (ja) | 2013-06-24 | 2016-05-24 | 富士フイルム株式会社 | 磁気記録媒体および磁気記録媒体用塗料組成物 |
| JP6469669B2 (ja) | 2013-07-08 | 2019-02-13 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | オキシムエステル光開始剤 |
| JP6530410B2 (ja) | 2013-09-10 | 2019-06-12 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | オキシムエステル光開始剤 |
| JP2015068893A (ja) | 2013-09-27 | 2015-04-13 | 東レ株式会社 | 樹脂ブラックマトリクス基板 |
| JP6198058B2 (ja) | 2013-12-19 | 2017-09-20 | Dic株式会社 | 界面活性剤組成物、コーティング組成物及びレジスト組成物 |
| CN103819583B (zh) | 2014-03-18 | 2016-05-18 | 常州强力电子新材料股份有限公司 | 一种含硝基双肟酯类光引发剂及其制备方法和应用 |
| JP6595983B2 (ja) | 2014-04-04 | 2019-10-23 | 株式会社Ａｄｅｋａ | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
| KR101966125B1 (ko) | 2014-05-01 | 2019-04-05 | 후지필름 가부시키가이샤 | 착색 조성물, 막, 컬러 필터, 패턴 형성 방법, 컬러 필터의 제조 방법, 고체 촬상 소자 및 적외선 센서 |
| CN104076606B (zh) | 2014-07-15 | 2019-12-03 | 常州强力电子新材料股份有限公司 | 一种含肟酯类光引发剂的感光性组合物及其应用 |
| JP6449445B2 (ja) | 2014-09-04 | 2019-01-09 | アイ ジー エム マルタ リミテッド | 多環式光開始剤 |
| KR102047079B1 (ko) | 2015-03-11 | 2019-12-02 | 동우 화인켐 주식회사 | 청색 감광성 수지 조성물, 컬러필터 및 이를 포함하는 액정표시장치 |
| JP6628072B2 (ja) | 2015-05-20 | 2020-01-08 | Dic株式会社 | フッ素系界面活性剤およびこれを含有する組成物 |
| WO2017033680A1 (ja) | 2015-08-26 | 2017-03-02 | パナソニックヘルスケアホールディングス株式会社 | 超低温フリーザ |
| WO2017051680A1 (ja) | 2015-09-25 | 2017-03-30 | 株式会社Adeka | オキシムエステル化合物及び該化合物を含有する重合開始剤 |
| JP6750249B2 (ja) | 2016-02-26 | 2020-09-02 | 東洋インキＳｃホールディングス株式会社 | 感光性着色組成物およびカラーフィルタ |
| JP6762739B2 (ja) | 2016-03-17 | 2020-09-30 | 株式会社Ｄｎｐファインケミカル | カラーフィルタ用感光性着色樹脂組成物、カラーフィルタ、表示装置 |
| JP7006267B2 (ja) | 2016-03-25 | 2022-01-24 | 東レ株式会社 | 着色樹脂組成物、カラーフィルタ基板、および液晶表示装置 |
| JP6860978B2 (ja) | 2016-04-27 | 2021-04-21 | 東京応化工業株式会社 | 感光性組成物 |
| WO2018110179A1 (ja) | 2016-12-13 | 2018-06-21 | 日油株式会社 | ペルオキシシンナメート誘導体、該化合物を含有する重合性組成物 |
| WO2018221177A1 (ja) | 2017-06-01 | 2018-12-06 | 日油株式会社 | トリアジンペルオキシド誘導体、該化合物を含有する重合性組成物 |
| JP6923130B2 (ja) | 2017-08-31 | 2021-08-18 | 学校法人東京理科大学 | ペルオキシエステル基を有するベンゾフェノン誘導体、該化合物を含有する重合性組成物およびその硬化物、当該硬化物の製造方法 |
| JP6995309B2 (ja) | 2017-08-31 | 2022-01-14 | 学校法人東京理科大学 | ペルオキシエステル基を有するチオキサントン誘導体を含有する重合性組成物およびその硬化物、当該硬化物の製造方法 |
| JPWO2019088055A1 (ja) | 2017-10-30 | 2020-12-10 | 株式会社Adeka | 化合物、組成物、硬化物及び硬化物の製造方法 |
| JP6970922B2 (ja) | 2018-03-26 | 2021-11-24 | 日油株式会社 | ペルオキシシンナメート誘導体、該化合物を含有する重合性組成物およびその硬化物、並びに当該硬化物の製造方法 |
| JP6636081B2 (ja) | 2018-05-14 | 2020-01-29 | 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． | 感光性樹脂組成物、感光性樹脂組成物で製造される光硬化パターン、及び光硬化パターンを含む画像表示装置 |
| JP7205089B2 (ja) | 2018-07-04 | 2023-01-17 | 三菱ケミカル株式会社 | 感光性樹脂組成物、隔壁、有機電界発光素子、画像表示装置及び照明 |
| TWI677492B (zh) | 2018-07-17 | 2019-11-21 | 奇鈦科技股份有限公司 | 液態光引發化合物及其應用 |
| WO2020084854A1 (ja) | 2018-10-24 | 2020-04-30 | 三菱マテリアル電子化成株式会社 | 含フッ素イミド塩化合物及び界面活性剤 |
| EP4220859A4 (en) | 2020-09-28 | 2024-03-27 | FUJIFILM Corporation | LAMINATE PRODUCTION PROCESS, ANTENNA-IN-PACKAGE PRODUCTION PROCESS, LAMINATE AND COMPOSITION |
-
2024
- 2024-03-06 WO PCT/JP2024/008537 patent/WO2024203080A1/ja not_active Ceased
- 2024-03-06 JP JP2025510149A patent/JPWO2024203080A1/ja active Pending
- 2024-03-06 EP EP24779215.3A patent/EP4692947A1/en active Pending
- 2024-03-19 TW TW113110029A patent/TW202440895A/zh unknown
-
2025
- 2025-08-29 US US19/315,042 patent/US20250390021A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP4692947A1 (en) | 2026-02-11 |
| WO2024203080A1 (ja) | 2024-10-03 |
| US20250390021A1 (en) | 2025-12-25 |
| TW202440895A (zh) | 2024-10-16 |