TW593357B - Oxime ester photoinitiators having a combined structure - Google Patents

Oxime ester photoinitiators having a combined structure Download PDF

Info

Publication number
TW593357B
TW593357B TW091112531A TW91112531A TW593357B TW 593357 B TW593357 B TW 593357B TW 091112531 A TW091112531 A TW 091112531A TW 91112531 A TW91112531 A TW 91112531A TW 593357 B TW593357 B TW 593357B
Authority
TW
Taiwan
Prior art keywords
alkyl
phenyl
substituted
nr5r6
halogen
Prior art date
Application number
TW091112531A
Other languages
Chinese (zh)
Inventor
Kazuhiko Kunimoto
Junichi Tanabe
Hisatoshi Kura
Hidetaka Oka
Masaki Ohwa
Original Assignee
Ciba Sc Holding Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Sc Holding Ag filed Critical Ciba Sc Holding Ag
Application granted granted Critical
Publication of TW593357B publication Critical patent/TW593357B/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C251/00Compounds containing nitrogen atoms doubly-bound to a carbon skeleton
    • C07C251/32Oximes
    • C07C251/62Oximes having oxygen atoms of oxyimino groups esterified
    • C07C251/64Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids
    • C07C251/66Oximes having oxygen atoms of oxyimino groups esterified by carboxylic acids with the esterifying carboxyl groups bound to hydrogen atoms, to acyclic carbon atoms or to carbon atoms of rings other than six-membered aromatic rings
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Indole Compounds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Holo Graphy (AREA)
  • Pyrane Compounds (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)

Abstract

Compounds of the formulae I, II, and III, wherein R1 is for example hydrogen, C3-C8cycloalkyl, C1-C12alkyl, phenyl unsubstituted or substituted; R2 and R2' for example are hydrogen, C1-C20alkyl, C3-C8cycloalkyl or phenyl, unsubstituted or substituted, or are formulae (A), (B), (C); Ar1 is for example phenyl, optionally substituted by e.g. formulae (D), (E) and/or (F); Ar2 is for example phenylene, optionally substituted e.g. by -(CO)R7, (D), (E) or (F); Ar3 is for example phenyl; M1, M2 and M3 are, for example, C1-C20alkylene; M4 is for example direct bond, -O-, -S-, -Y-(C1-C10alkylene)-Y'-, optionally substituted; Y and Y' are for example a direct bond or -O-; R7 is for example hydrogen, C1-C20alkyl or phenyl, optionally substituted; R8, R9, R8' and R9' are example hydrogen or C1-C12alkyl, exhibit an unexpectedly good performance in photopolymerization reactions.

Description

593357 A7 £7____ 五、發明説明(1 ) 本發明係有關具有含烷基芳基酮、二芳基酮或氧代香 豆素之組合結構之新穎肟酯,及其作為可光聚合組成物之 光引發劑。 由美國專利第3558309號案得知某些肟酯衍生物係光 引發劑。於美國專利第4255513號案,肟酯化合物被揭示。 EP 810595號案描述某些具有供電子基之肟酯。美國專利 第4202697號案揭示芳基胺基取代之肟酯。於JP 7-140658 A 號案、Bull· Chem· Soc· Jpn· 1969, 42(U)),2981-3、BUU· Chem· Soc. Jpn. 1975, 48(8), 2393-4 > Han9guk Somyu Konghakhoechi 1990, 27(9), 672-85 、巨分子593357 A7 £ 7 ____ 5. Description of the invention (1) The present invention relates to a novel oxime ester having a combined structure containing an alkylaryl ketone, a diaryl ketone or an oxocoumarin, and its photopolymerizable composition Photoinitiator. From U.S. Patent No. 3558309, certain oxime ester derivatives are known as photoinitiators. In U.S. Patent No. 4,255,513, oxime ester compounds are disclosed. EP 810595 describes certain oxime esters having an electron-donating group. U.S. Patent No. 4,202,697 discloses arylamino substituted oxime esters. In JP 7-140658 A, Bull · Chem · Soc · Jpn · 1969, 42 (U)), 2981-3, BUU · Chem · Soc. Jpn. 1975, 48 (8), 2393-4 > Han9guk Somyu Konghakhoechi 1990, 27 (9), 672-85, macromolecule

{Macromolecules),\99\, dl-Ί 反歐洲聚合物期子/J (European Polymer Journal), 1970, 933-943 ^ ,某些® 酯化合物被描述。於美國專利第4590145號案及JP 61-24558-A,數種苯醯苯肟酯化合物被揭示。於化學摘要 (Chemical Abstract), No· 96:52526c ^ J. Chem. Eng. Data 9(3),403-4(1964)、J. Chin. Chem. Soc.(台北)41 (5) 573-8,(1994)、JP 62-273259·Α(=化學摘要 lM:83463w)、JP 62-286961-A(=Derwent No. 88-025703/04)、JP 62-201859-A (=Derwent No. 87-288481/41)、JP 62-184056-A (=Derwent No· 87-266739/38)、US 5019482 及光化學及光 生物學期刊(J· of Photochemistry and Photobiology) A 107, 261-269 (1997),某些對-烷氧基-苯基肟酯化合物被描述。 於光聚合反應技術,仍存在對高反應性、易於製備及 易於處理之光引發劑之需求。此外,此新穎之光引發劑需 4 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593357 A7{Macromolecules), \ 99 \, dl-Ί Anti-European Polymer Journal / J (European Polymer Journal), 1970, 933-943 ^, some ® ester compounds are described. In U.S. Patent No. 4,590,145 and JP 61-24558-A, several benzamoxifen compounds are disclosed. In Chemical Abstract, No. 96: 52526c ^ J. Chem. Eng. Data 9 (3), 403-4 (1964), J. Chin. Chem. Soc. (Taipei) 41 (5) 573- 8, (1994), JP 62-273259 · A (= Chemical Abstract 1: 83463w), JP 62-286961-A (= Derwent No. 88-025703 / 04), JP 62-201859-A (= Derwent No. 87-288481 / 41), JP 62-184056-A (= Derwent No 87-266739 / 38), US 5019482 and J. of Photochemistry and Photobiology A 107, 261-269 ( 1997), certain p-alkoxy-phenyloxime ester compounds are described. In the photopolymerization technology, there is still a need for photoinitiators that are highly reactive, easy to prepare, and easy to handle. In addition, this novel photoinitiator requires 4 (Please read the precautions on the back before filling out this page) This paper size applies to China National Standard (CNS) A4 (210X297 mm) 593357 A7

符合產業有關性質之高度要件,諸如,熱安定性及儲存安 定性。 驚人地發現化學式I、II及III之化合物It meets the high requirements of the relevant properties of the industry, such as thermal stability and storage stability. Surprisingly discover compounds of formulae I, II and III

其中 Ri係氫、cvc:8環烧基或crc12烧基,其係未被取代或以 一或更多之鹵素、苯基及/或CN取代;或h係C2-C5烯 基;或Ri係苯基,其係未被取代或以一或更多之Ci_C6 烷基、鹵素、CN、0R3、SR4及/或NR5R6取代;或Rl係 q-C8烷氧基、苯甲基氧;或苯氧基,其係未被取代或以 一或更多之Ci-Q烷基及/或鹵素取代; R2及R2’彼此個別係氫;未被取代之烷基或以一或 更多之鹵素、OR3、苯基及/或以or3、sr4及/或NR5R6取 代之苯基取代之Ci-C2。烷基;或r2及r2,係(:^匕環烷基; 或係C^-C2。烧基,其係以一或更多·〇-間斷及/或選擇性以 一或更多之鹵素、OR3、苯基及/或以〇r3、sr4及/或nr5r6 取代之苯基取代;或R2及R2’係苯基,其係未被取代或以 一或更多之C「c6烧基、苯基、函素、0R3、sr4及/或NR5R6 取代;或R2及R2’係烧醯基或苯甲醯基,其係未 被取代或以一或更多之Ci-C:6烷基、苯基、〇r3、sr4及/ 或NR5R6取代;R2及R2’係q-Cu烷氧基羰基,其選擇性 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) .訂· ·線- 593357 A7 _____ B7 五、發明説明(3 ) 地以一或更多之-0-間斷及/或選擇性以一或更多之羥基取 代;或r2及r2’係苯氧基羰基,其係未被取代或以crc6 烷基、鹵素、苯基、or3、sr4及/或nr5r6取代;或R2 及 r2,係 CN、-conr5r6、no2、CrC4 _ 烷基、s(0)m-cv C6烷基;s(0)m•苯基,其選擇性地以Cl-C12烷基或so2-cvq烷基取代;或係so2o-苯基,其選擇性地以〇vc12 烷基取代;或係二苯基膦醯基或二-((^<4烷氧基)-膦醯 基;或R2及R2’係如下之基 (請先閲讀背面之注意事項再填寫本頁)Wherein Ri is hydrogen, cvc: 8 ring alkyl or crc12 alkyl, which is unsubstituted or substituted with one or more halogen, phenyl and / or CN; or h is C2-C5 alkenyl; Phenyl, which is unsubstituted or substituted with one or more Ci_C6 alkyl, halogen, CN, OR3, SR4, and / or NR5R6; or R1 is q-C8 alkoxy, benzyloxy; or phenoxy Group, which is unsubstituted or substituted with one or more Ci-Q alkyl and / or halogen; R2 and R2 'are each independently hydrogen; unsubstituted alkyl or with one or more halogen, OR3 , Phenyl and / or Ci-C2 substituted with phenyl substituted with or3, sr4 and / or NR5R6. Alkyl; or r2 and r2, is (^^ cycloalkyl; or C ^ -C2. Alkyl, which is based on one or more ·-interrupted and / or optionally with one or more halogen OR3, phenyl, and / or phenyl substituted with 0r3, sr4, and / or nr5r6; or R2 and R2 'are phenyl, which are unsubstituted or substituted with one or more C, c6 alkyl, Substituted with phenyl, functional element, OR3, sr4, and / or NR5R6; or R2 and R2 'are alkyl or benzyl, which are unsubstituted or substituted with one or more Ci-C: 6 alkyl, Phenyl, 0r3, sr4 and / or NR5R6 substitution; R2 and R2 'are q-Cu alkoxycarbonyl groups, the selectivity of this paper applies Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read first Note on the back, please fill in this page again.) Order · · Line-593357 A7 _____ B7 V. Description of the invention (3) Replace with one or more -0- intermittent and / or optionally replace with one or more hydroxyl groups ; Or r2 and r2 'are phenoxycarbonyl groups, which are unsubstituted or substituted with crc6 alkyl, halogen, phenyl, or3, sr4, and / or nr5r6; or R2 and r2, which are CN, -conr5r6, no2 CrC4 _ alkyl, s (0) m-cv C6 alkyl; s (0) m • Phenyl, which is optionally substituted with Cl-C12 alkyl or so2-cvq alkyl; or so2o-phenyl, which is optionally substituted with 0vc12 alkyl; or diphenylphosphinofluorenyl or ((^ < 4alkoxy) -phosphinofluorenyl; or R2 and R2 'are as follows (please read the precautions on the back before filling this page)

ΑΓι係苯基、萘基、苯甲醯基或萘醯基,每一者係以自素、 Ci-C^烷基、C3-C8環烷基、苯甲基及/或苯氧基羰基取代 1至7次;或其每一者係以苯基或以藉由一或更多之〇r3、 SR4及/或NR5R6取代之苯基取代;或其每一者係以c2_Ci2 烧氧基魏基(其選擇性地係一或更多之間斷及/或選擇 性地以一或更多之羥基取代)取代;或其每一者係以〇R3、 SR4、SOR4、S02R4及/或NR5R6取代,其中取代基〇R3、 SR4或NR#6選擇性地經由、R4、Rs及/或汉6與苯基或 萘基環上之進一步取代基形成5-或6-元環;或其每一者 係以如下之基取代 6 本紙張尺度適用中國國家標準(⑽〉A4規格(21〇><297公爱) 593357 A7 B7 五、發明説明(4 ) •(CO}R7, 嫌 Μ「(%Ι〇-ΑΓ3 (D),ΑΓι is phenyl, naphthyl, benzamyl, or naphthyl, each of which is substituted with a prime, Ci-C ^ alkyl, C3-C8 cycloalkyl, benzyl, and / or phenoxycarbonyl 1 to 7 times; or each of them is substituted with phenyl or phenyl substituted with one or more 0r3, SR4 and / or NR5R6; or each of them is c2_Ci2 (Which is optionally substituted by one or more interruptions and / or optionally substituted by one or more hydroxyl groups); or each of them is substituted by OR3, SR4, SOR4, S02R4, and / or NR5R6, Wherein the substituent OR3, SR4, or NR # 6 optionally forms a 5- or 6-membered ring via, R4, Rs, and / or Han 6 and a further substituent on the phenyl or naphthyl ring; or each of them This paper replaces 6 paper standards with the following national standards (⑽> A4 size (21〇 < 297 public love) 593357 A7 B7 V. Description of the invention (4) • (CO) R7, suspected " % Ι〇-ΑΓ3 (D),

(¾ 及/或(¾ and / or

‘、 '·, / m 但 若R2非(八)、(B)或(C)基,貝ij ΑΓι係苯基、萘基、苯甲醯 基或萘醯基,其每一者係以至少一-(CO)R7、(D)、(Ε)或(F) 基取代;',' ·, / M except that if R2 is not an (eight), (B) or (C) group, ij ΑΓι is phenyl, naphthyl, benzyl, or naphthyl, each of which is at least Mono- (CO) R7, (D), (E) or (F) group substitution;

Ar2係伸苯基、伸萘基、伸苯基二羰基或伸萘基二羰基, 每一者係以鹵素、CrC12烷基、C3_C8環烷基、苯曱基、0R3、 SR4、SOR4、S02R4及/或NR5R6取代1至4次;或每一者 係以-(CO)R7、(D)、(E)或(F)基取代; 但 若R2或R2’非(A)、(B)或(C)基且Ar2係伸苯基、伸萘基、 伸苯基二羰基或伸萘基二羰基,則Ar2係以·(CO)R7、(D)、 (E)或(F)基之至少一者取代; 若R2非氫或(A)、(B)或(C)基,每一者係以-(CO)R7、(D)、 (E)或(F)基之至少一者取代, (請先閲讀背面之注意事項再填寫本頁)Ar2 is phenylene, naphthyl, phenylene dicarbonyl or arylene dicarbonyl, each of which is halogen, CrC12 alkyl, C3-C8 cycloalkyl, phenylfluorenyl, OR3, SR4, SOR4, S02R4 and / Or NR5R6 is substituted 1 to 4 times; or each is substituted with-(CO) R7, (D), (E) or (F) group; but if R2 or R2 'is not (A), (B) or (C) group and Ar2 is a phenylene, a naphthyl, a phenylene dicarbonyl, or a naphthyldicarbonyl group, then Ar2 is a group of (CO) R7, (D), (E) or (F) At least one substitution; if R2 is not hydrogen or (A), (B) or (C) radical, each is at least one of-(CO) R7, (D), (E) or (F) radical Replace, (Please read the notes on the back before filling this page)

Ar2另外係 0 0 或"0,,0",每 一者係未被取代或以鹵素、crc12烷基、苯甲基、or3、 SR4及/或NR5R6取代1至4次;或每一者係以-(CO)R7、 7 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593357 A7 B7 五、發明説明(5 ) (D)、(E)或(F)基取代; 若 R2 係(A)、(B)或(C)基, 〇 0Ar2 is additionally 0 0 or " 0,, 0 ", each of which is unsubstituted or substituted 1 to 4 times with halogen, crc12 alkyl, benzyl, or3, SR4 and / or NR5R6; or each It is replaced by-(CO) R7, 7 paper standards applicable to Chinese National Standard (CNS) A4 specifications (210X297 mm) 593357 A7 B7 V. Description of invention (5) (D), (E) or (F) group; If R2 is (A), (B) or (C) group, 〇 0

Ar2另外係 或Ar2 is otherwise

CXX ,每一者係未被取代或以函素、 Crcl2烷基、苯甲基、〇R3、SR4及/或NR5R6取代1至4 次;或每一者係以_(CO)R7、(D)、(E)或(F)基取代; 或Ar2係 (請先閱讀背面之注意事項再填寫本頁)CXX, each of which is unsubstituted or substituted 1 to 4 times with functin, Crcl2 alkyl, benzyl, OR3, SR4, and / or NR5R6; or each with _ (CO) R7, (D ), (E) or (F) group substitution; or Ar2 series (please read the precautions on the back before filling this page)

or

每一者係未被取代或以鹵素、CrCu烧基、苯甲基、〇r3、 SR4及/或NR5R6取代1至6次;其中取代基〇R3、Sr4或 NRsR6選擇性地經由R3、R4、及/或R0與苯基或萘基環 之碳原子之一形成5-或6-元環,或每一者係w_(cq)r7、 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593357 A7 ___B7 五、發明説明(6 ) (D)、(E)或(F)基取代;Each is unsubstituted or substituted 1 to 6 times with halogen, CrCu alkyl, benzyl, or3, SR4, and / or NR5R6; wherein the substituents OR3, Sr4, or NRsR6 are selectively via R3, R4, And / or R0 forms a 5- or 6-membered ring with one of the carbon atoms of the phenyl or naphthyl ring, or each of them is w_ (cq) r7. The size of this paper applies to the Chinese National Standard (CNS) A4 specification (210X297 (Mm) 593357 A7 ___B7 5. Description of the invention (6) (D), (E) or (F) group substitution;

Ar3係苯基、萘基或香豆素基,每一者係以鹵素、crC12 烷基、C3-C8環烷基、苯曱基及/或苯氧基羰基取代1至7 次;或每一者係以苯基或以藉由一或更多之〇r3、SR4&/ 或NR5R6取代之苯基取代;或每一者係以c2_Ci2烷氧基 羰基(其選擇性地以一或更多之-0-間斷及/或選擇性以一 或更多之羥基取代)取代;或每一者係以〇R3、SR4、S0R4、 S02R4及/或NR5R6取代; Μ!係C^-C2。伸烧基,其選擇性地以一或更多之_〇_間斷及 /或選擇性以一或更多之鹵素、〇R3、苯基或以〇r3、SR4 及/或NRSR0取代之苯基取代;或係伸苯基或伸萘基, 每一者係未被取代或以一或更多之烷基、苯基、鹵 素、〇R3、SR4&/或NR5R6取代;或%係如下之基 (請先閱讀背面之注意事項再填寫本頁)Ar3 is phenyl, naphthyl or coumarin, each of which is substituted 1 to 7 times with halogen, crC12 alkyl, C3-C8 cycloalkyl, phenylfluorenyl, and / or phenoxycarbonyl; or each It is substituted with phenyl or with a phenyl substituted with one or more 0r3, SR4 & / or NR5R6; or each is c2_Ci2 alkoxycarbonyl (which is optionally substituted with one or more -0- is discontinuous and / or optionally substituted with one or more hydroxy groups); or each is substituted with OR3, SR4, SOR4, SO2R4, and / or NR5R6; M! Is C ^ -C2. Dextrinyl, optionally with one or more _〇_ discontinuities and / or optionally with one or more halogen, OR3, phenyl, or phenyl substituted with OR3, SR4, and / or NRSR0 Substitution; or phenylene or naphthyl, each of which is unsubstituted or substituted with one or more alkyl, phenyl, halogen, OR3, SR4 & or NR5R6; or% is a base as follows (Please read the notes on the back before filling this page)

其選擇性以鹵素、CVC12烷基、苯甲基、〇r3、Sr4、s〇R4、 S〇2R4及/或NRsR6取代1至4次;其中取代基〇R3、Sr4 或NRSR0選擇性地經由、R4、及/或h與其它苯基 環之碳原子之一形成5-或6-元環; 但 若Ar〗係苯基、萘基、苯甲醯基或萘醯基,每一者係未以 -(C0)-R7、⑼、(Ε)或(F)基取代,則Μι係⑼或出)基, 其選擇性地以鹵素、CVC12烷基、苯曱基、〇R3、SR4、s〇R4、 9 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593357 A7 一__B7 五、發明説明(7 ) S〇2R4及/或NR5R6取代1至4次;其中取代基〇R3、SR4 或NR5R6選擇性地經由R3、r4、r5及/或&與其它苯基 環之碳原子之一形成5-或6-元環; Μ:係直接鍵、crC1()伸烷基或伸環己基;或m2係 伸烧基或伸烷基-X_,其每一者係選擇性地以一或 更多之-0-間斷及/或選擇性以一或更多之鹵素、0R3、苯 基或以0R3、SR4及/或NR5R6取代之苯基取代;或m2係 伸本基或伸萘基或伸苯基-X- ’每一者係未被取代或以一 或更多之crc6烷基、苯基、齒素、or3、sr4&/或nr5r6 取代;或m2係CrC1()伸烷基-C(0)-X-、CVCi。伸烷基-X--C(0)-、伸苯基-c(0)-x-或CrC1Q伸烷基-伸苯基-X-; 及M3’彼此個別為直接鍵、Ci-C^伸烷基或伸環己基; 或m3及M3,係CrC1G伸烷基或CVC1()伸烷基-X-,其每一 者係選擇性地以一或更多之-0-間斷及/或選擇性以一或更 多之i素、0R3、苯基或以0R3、SR4及/或NR5R6取代之 苯基取代;或M3及m3’係伸苯基、伸萘基或伸苯基-X-, 每一者係未被取代或以一或更多之Q-C6烷基、苯基、鹵 素、〇R3、SR4 及/或 NR5R6 取代;或 m3 及 M3,係 CVC10 伸烷基-C(0)-X-、(VC1()伸烷基-X-C(O)-、伸苯基-c(0)-χ-、C「c1()伸烷基-伸苯基-X-或伸苯基-c(o)-伸苯基; 但 右Ari係萘基、萘醯基或2-R30-苯基’其每一者係未以_ (C0)R7、(D)、(E)或(F)基取代,則 M3 及 M3’非 CVC10 伸 烧基-X-、伸苯基-X-或Cj-C^o伸烧基-伸苯基-X-; 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 10 (請先閲讀背面之注意事項再填寫本頁)It is optionally substituted 1 to 4 times with halogen, CVC12 alkyl, benzyl, or3, Sr4, soR4, So2R4, and / or NRsR6; wherein the substituents OR3, Sr4, or NRSR0 are selectively passed through, R4, and / or h form a 5- or 6-membered ring with one of the other carbon atoms of the phenyl ring; however, if Ar is phenyl, naphthyl, benzyl or naphthyl, each is Substituted by-(C0) -R7, fluorene, (E) or (F) group, then Mm is fluorene or fluorene, which is optionally substituted with halogen, CVC12 alkyl, phenylfluorenyl, OR3, SR4, s 〇R4, 9 This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 593357 A7 __B7 5. Description of the invention (7) S〇2R4 and / or NR5R6 substituted 1 to 4 times; among them the substituents. R3, SR4, or NR5R6 optionally forms a 5- or 6-membered ring with one of the carbon atoms of other phenyl rings via R3, r4, r5, and / or &; M: a direct bond, crC1 () alkylene Or cyclohexyl; or m2 is alkynyl or alkylene-X_, each of which is optionally with one or more -0- interrupts and / or optionally with one or more halogen, OR3 , Phenyl or phenyl substituted with 0R3, SR4 and / or NR5R6 Generation; or m2 is extrinyl or naphthyl or phenyl-X- 'each is unsubstituted or with one or more crc6 alkyl, phenyl, halide, or3, sr4 & / or nr5r6 substitution; or m2 is CrC1 () alkylene-C (0) -X-, CVCi. Alkylene-X--C (0)-, phenylene-c (0) -x-, or CrC1Q alkylene-phenylene-X-; and M3 'are each a direct bond, Ci-C ^ Alkylene or cyclohexyl; or m3 and M3, are CrC1G alkylene or CVC1 () alkylene-X-, each of which is optionally interrupted by one or more -0- and / or Optionally substituted with one or more i-prime, OR3, phenyl or phenyl substituted with OR3, SR4 and / or NR5R6; or M3 and m3 'are phenylene, naphthyl or phenylene-X- , Each of which is unsubstituted or substituted with one or more Q-C6 alkyl, phenyl, halogen, OR3, SR4, and / or NR5R6; or m3 and M3, which are CVC10 alkylene-C (0 ) -X-, (VC1 () alkylene-XC (O)-, phenylene-c (0) -χ-, C1 () alkylene-phenylene-X- or phenylene -c (o) -phenylene; but each of the right Ari naphthyl, naphthyl or 2-R30-phenyl 'is not (C0) R7, (D), (E) or ( F) group substitution, then M3 and M3 'are not CVC10 Dendenyl-X-, Dendenyl-X- or Cj-C ^ o Dendenyl-Dendenyl-X-; This paper size applies to Chinese national standards ( CNS) A4 size (210X297mm) 10 (Please read the notes on the back before filling in this )

593357 A7 _B7_ 五、發明説明(8 ) M4及M4’彼此個別為直接鍵、-〇-、-S-、-NR5’-或-C0-; 或M4及M4’係-Υ-(〇ν〇:10伸烷基)-γ’_,其選擇性地以一 或更多之-〇-間斷及/或選擇性以一或更多之鹵素、or3、 苯基或以〇R3、SR4及/或NR5R6取代之苯基取代;或]νι4 及M4’係-Y-伸苯基-Y’-或-Y-伸秦基-Y’·,其每一者係未 被取代或以一或更多之C「C6烧基、苯基、鹵素、〇r3、SR4 及/或nr5r6取代;或m4及m4’係-Y-(C「C4伸烷基)-0-伸 苯基伸烧基)-Y’-或-Y-CC^-C^伸烧基)-〇-伸萘基-伸烧基)-Y’-;或 M4 及 M4’係伸烧基-X-C(o)-,其選擇性地以一或更多之-0-間斷;或M4及M/ 係 基,其選擇性地以鹵素、crc12烧 基、苯甲基、OR3、SR4、sor4、S02R4 及/或 NR5R6 取代 1至4次;其中取代基〇R3、SR4或NR5R6選擇性地經由 R3、R4、R5及/或心基與其它苯基環之碳原子之一或附接 至此基之苯基或萘基者形成5-或6_元環; M4”係直接鍵、-0-、-S-、-NR5’_ 或-C0-;或 M4”係-YJCVCio 伸烷基)-Y’-,其選擇性地以一或更多之-〇-間斷及/或選擇 性以一或更多之鹵素、〇R3、苯基或以〇r3、SR4&/或NR5R6 取代之苯基取代;或伸苯基-Y,-或-Y-伸萘基-Y’-,其每一者係未被取代或以一或更多之CrC6烷基、 苯基、鹵素、OR3、SR4&/或 NR5R6 取代;或 M4,,係-x-crc1() 伸烷基-X-C(O)-,其選擇性地以一或更多之_〇_間斷; 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公爱) (請先閱讀背面之注意事項再填寫本頁)593357 A7 _B7_ V. Description of the invention (8) M4 and M4 'are each a direct bond, -〇-, -S-, -NR5'-, or -C0-; or M4 and M4' are -Υ- (〇ν〇 : 10 alkylene) -γ'_, which is optionally interrupted by one or more -0- and / or optionally by one or more halogen, or3, phenyl or OR3, SR4 and / Or NR5R6 substituted phenyl; or νι4 and M4 'are -Y-phenylene-Y'- or -Y-phenylene-Y' ·, each of which is unsubstituted or substituted by one or more Many of C "C6 alkyl, phenyl, halogen, 0r3, SR4 and / or nr5r6 substitution; or m4 and m4 'series -Y- (C" C4 alkylene) -0-phenylene alkyl)- Y'-or -Y-CC ^ -C ^ endenyl) -〇-naphthyl-endenyl) -Y'-; or M4 and M4'-endinyl-XC (o)-, the choice With one or more -0-discontinuities; or M4 and M / series, which optionally replace 1 to 1 with halogen, crc12 alkyl, benzyl, OR3, SR4, sor4, S02R4 and / or NR5R6 4 times; wherein the substituents OR3, SR4, or NR5R6 are optionally formed via R3, R4, R5, and / or cardiyl group with one of the other phenyl ring carbon atoms or a phenyl or naphthyl group attached to this group - Or 6-membered ring; M4 "is a direct bond, -0-, -S-, -NR5'_ or -C0-; or M4" is -YJCVCio (alkylene) -Y'-, which is optionally Or more -0- intermittent and / or optionally substituted with one or more halogen, OR3, phenyl or phenyl substituted with OR3, SR4 & or NR5R6; or phenylene -Y,- Or -Y-naphthyl-Y'-, each of which is unsubstituted or substituted with one or more CrC6 alkyl, phenyl, halogen, OR3, SR4 & / or NR5R6; or M4, -x-crc1 () Alkyl-XC (O)-, which is optionally interrupted by one or more _〇_; This paper size applies Chinese National Standard (CNS) A4 (210X297 public love) (Please (Read the notes on the back before filling out this page)

593357 A7 ______B7___ 五、發明説明(9 ) X及X’彼此個別為-0-、-S-或-NR5-; Y及Y’彼此個別為直接鍵、-ο-、-s-或-NR5-; R3係氫、CVC2()烷基或苯基-CVC3烷基;或R3係(^-(:8烷 基,其係以 _〇H、-SH、-CN、C3-C6 烯氧基、_0CH2CH2CN、 -OCI^CHdCCOCKCVQ 烷基)、-O(CO)- (CVC4 烷基)、-0(C0)-苯基、-(CO)OH及/或-(CCOCKCVQ烷基)取代;或 R3係c2-c12烷基,其係以一或更多之-0-間斷;或R3係- (CH2CH20)n+1H、-((:Η2(:Η20)η((:〇Η(νί:8 烷基)、C「C8 烧酿基、C2-C12稀基、C3-C6稀酿基、C3-Cg環烧基;或 係苯甲醯基,其係未被取代或以一或更多之crc6烷基、 鹵素、-0H及/或Ci-C^烷氧基取代;或R3係苯基或萘基, 每一者係未被取代或以鹵素、-OH、CrC12烷基、C「C12 烷氧基、苯氧基、crc12烷基硫烷基、苯基硫烷基、 烷基)2及/或二苯基胺基取代; η 係 1-20 ; R4係氫、烧基、C2-C12稀基、C3-C8環烧基、苯基-C「C3烷基;或R4係CVC8烷基,其係以-OH、-SH、-CN、 c3-c6 烯氧基、-OCH2CH2CN、-OCi^CHXCCOCKCVC^ 烷 基)、_o(co)_(cvc4 烷基)、-O(CO)-苯基、-(CO)OH 或-(C0)0(CVC4烷基)取代;或r4係c2-c12烷基,其係以一 或更多之-0-或-S-間斷;或R4係(CH2CH20)n+1H、-(CH2CH20)n(C〇HCrC8 烷基)、CVC8 烷醯基、c2-c12 烯 基、c3-c6烯醯基;或r4係苯曱醯基,其係未被取代或以 一或更多之CVC6烷基、鹵素、-OH、CVC4烷氧基或Cr 12 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593357 A7 B7 五、發明説明(10 C4烷基硫烷基取代;或R4係苯基或萘基,每一者係未被 取代或以鹵素、(Vc12烷基、cvc12烷氧基、苯基-cvc3 烷氧基、苯氧基、q-Cu烷基硫烷基、苯基硫烷基、 烷基)2、二苯基胺基、-(C0)0(CrC8 烷基)、-(CO)-CVC8 烷基或(CO)N(C「C8烷基)2取代; R5及R6彼此個別係氫、q-CM烷基、c2-c4羥基烷基、c2-c10 烷氧基烷基、C2-C5烯基、C3-C8環烷基、苯基-Ci-Cs烷基、 crc8烷醯基、c3-c12·烯醯基、苯甲醯基;或R5及R6係 苯基或萘基,其每一者係未被取代或以crc12烷基、苯 甲醯基或(^-(:12烷氧基取代;或心及r6—起係c2-c6# 烷基,其選擇性地以-〇-或-NR3·間斷及/或選擇性地以羥 基、烷氧基、(:2-0:4烷醯基氧或苯甲醯基氧取代; R5’係氫、CVC2。烷基、c2-c4羥基烷基、C2-C1G烷氧基烷 基、c2-c5烯基、c3-C8環烷基、苯基-CVC3烷基、CVC8 烧醯基、C3-C12-烯醯基、苯甲醯基;或r5,係苯基或萘基, 其每一者係未被取代或以q-Cu烷基或(^-(:12烷氧基取593357 A7 ______B7___ V. Description of the invention (9) X and X 'are each -0-, -S- or -NR5-; Y and Y' are each a direct bond, -ο-, -s- or -NR5- ; R3 is hydrogen, CVC2 () alkyl or phenyl-CVC3 alkyl; or R3 is (^-(: 8 alkyl, which is _〇H, -SH, -CN, C3-C6 alkoxy, _0CH2CH2CN, -OCI ^ CHdCCOCKCVQ alkyl), -O (CO)-(CVC4 alkyl), -0 (C0) -phenyl,-(CO) OH, and / or-(CCOCKCVQ alkyl) substitution; or R3 series c2-c12 alkyl, which is interrupted by one or more -0-; or R3--(CH2CH20) n + 1H,-((: Η2 (: Η20) η ((: 〇Η (νί: 8 alkane Base), C8 C8 base, C2-C12 base, C3-C6 base, C3-Cg ring base; or benzamidine, which is unsubstituted or one or more crc6 Alkyl, halogen, -0H and / or Ci-C ^ alkoxy substituted; or R3 is phenyl or naphthyl, each of which is unsubstituted or substituted with halogen, -OH, CrC12 alkyl, C "C12 alkyl Oxy, phenoxy, crc12 alkylsulfanyl, phenylsulfanyl, alkyl) 2 and / or diphenylamino; η is 1-20; R4 is hydrogen, alkyl, C2-C12 Diluted, C3-C8 cycloalkyl, phenyl-C, C3 alkane Or R4 is CVC8 alkyl, which is -OH, -SH, -CN, c3-c6 alkenyloxy, -OCH2CH2CN, -OCi ^ CHXCCOCKCVC ^ alkyl), _o (co) _ (cvc4 alkyl) , -O (CO) -phenyl,-(CO) OH, or-(C0) 0 (CVC4 alkyl); or r4 is c2-c12 alkyl, which is substituted by one or more -0- or- S-discontinued; or R4 (CH2CH20) n + 1H,-(CH2CH20) n (COHCrC8 alkyl), CVC8 alkylfluorenyl, c2-c12 alkenyl, c3-c6 alkenyl; or r4 phenylfluorene Fluorenyl, which is unsubstituted or substituted with one or more CVC6 alkyl, halogen, -OH, CVC4 alkoxy, or Cr 12 (Please read the precautions on the back before filling this page) This paper size applies to China Standard (CNS) A4 specification (210X297 mm) 593357 A7 B7 V. Description of the invention (10 C4 alkylsulfanyl substituted; or R4 is phenyl or naphthyl, each of which is unsubstituted or halogen, (Vc12 Alkyl, cvc12 alkoxy, phenyl-cvc3 alkoxy, phenoxy, q-Cu alkylsulfanyl, phenylsulfanyl, alkyl) 2, diphenylamino,-(C0) 0 (CrC8 alkyl),-(CO) -CVC8 alkyl or (CO) N (C "C8 alkyl) 2 substituted; R5 and R6 are each hydrogen, q-CM alkyl , C2-c4 hydroxyalkyl, c2-c10 alkoxyalkyl, C2-C5 alkenyl, C3-C8 cycloalkyl, phenyl-Ci-Cs alkyl, crc8 alkyl, c3-c12 · ene R5 and R6 are phenyl or naphthyl, each of which is unsubstituted or substituted with crc12 alkyl, benzyl, or (^-(: 12 alkoxy); or And r6—from c2-c6 # alkyl, which is optionally interrupted with -0- or -NR3 · and / or selectively with hydroxyl, alkoxy, (: 2-0: 4 alkylfluorenyloxy or Benzamidine oxygen substitution; R5 'is hydrogen, CVC2. Alkyl, c2-c4 hydroxyalkyl, C2-C1G alkoxyalkyl, c2-c5 alkenyl, c3-C8 cycloalkyl, phenyl-CVC3 alkyl, CVC8 alkyl, C3-C12-ene Group, benzamyl group; or r5, phenyl or naphthyl, each of which is unsubstituted or a q-Cu alkyl group or (^-(: 12 alkoxy group)

代;或R5’係 一 % 基;R7係氫、CrC2Q烷基;cr C8烷基,其係以i素、苯基、-OH、-SH、-CN、C3-C6烯 氧基、-OCH2CH2CN、-0CH2CH2(C0)0(CVC4 院基)、-0(C0)_(C1-C4 烷基)、_〇(c〇)_ 苯基、-(CO)OH 或-(co)o(cvc4烷基)取代;或心係c2_cl2烷基,其係以一 或更多之-0·間斷;或R7係-(CH2CH20)n+1H、- 13 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度朝中關家標準(_ A4規格⑽x297公楚) 593357 A7 ____B7 五、發明説明(11 ) (請先閲讀背面之注意事項再填寫本頁) (CK^CI^OWCOHCVQ 烷基)、C2-C12 烯基或 C3-C8 環烷 基;或R7係苯基、聯苯基或萘基,其每一者選擇性地以 一或更多之(^-ί:6 烧基、鹵素、CN、or3、sr4、sor4、 so2r4或NR5R6取代,其中取代基0R3、SR4或NR5R6選 擇性地經由R3、R4、R5及/或心基與苯基、聯苯基或萘 基環之碳原子之一形成5-或6-元環; R8、R9、R8’及R9’彼此個別係氫、CVCu燒基,其選擇性 以一或更多之鹵素、苯基、CN、-OH、-SH、c「c4烷氧 基、-(CO)OH 或-((:0)0((ν(:4 烷基)取代;或 R8、R9、r8, 及R9’係苯基,其選擇性以一或更多之CrC6烷基、鹵素、 CN、0R3、sr4 或 NR5R6 取代;或 R8、R9、r8,及 r9,係鹵 素、CN、or3、sr4、sor4、so2r4 或 nr5r6 ;其中取代 基or3、sr4或nr5r6選擇性地經由r3、r4、r5及/或r6 基與Aq之苯基、萘基、苯甲醯基或萘醯基之碳原子之一 或取代基R7者或Μ3之伸萘基或伸苯基之碳原子之一形成 5-或6-元環;或R8及R9或R8’及R9’一起係 I10 ?11 I12 ί13 , ΡΗ η —^c=c一c=c—或—c=c一c一ο— 基;Generation; or R5 'is a% group; R7 is hydrogen, CrC2Q alkyl group; cr C8 alkyl group, which is based on i prime, phenyl, -OH, -SH, -CN, C3-C6 alkenyloxy, -OCH2CH2CN , -0CH2CH2 (C0) 0 (CVC4 courtyard), -0 (C0) _ (C1-C4 alkyl), _〇 (c〇) _ phenyl,-(CO) OH or-(co) o (cvc4 Alkyl) substitution; or c2_cl2 alkyl, which is one or more -0 · discontinued; or R7- (CH2CH20) n + 1H,-13 (Please read the precautions on the back before filling this page ) This paper is oriented towards the Zhongguanjia standard (_ A4 size ⑽ x297). 5.93357 A7 ____B7 5. Description of the invention (11) (Please read the precautions on the back before filling this page) (CK ^ CI ^ OWCOHCVQ alkyl), C2-C12 alkenyl or C3-C8 cycloalkyl; or R7-based phenyl, biphenyl, or naphthyl, each of which is optionally one or more (^ -ί: 6 alkyl, halogen, CN, or3, sr4, sor4, so2r4, or NR5R6 substitution, wherein the substituents OR3, SR4, or NR5R6 are selectively substituted via R3, R4, R5, and / or cardio with the carbon atom of the phenyl, biphenyl, or naphthyl ring One forms a 5- or 6-membered ring; R8, R9, R8 ′ and R9 ′ are each independently hydrogen, CVCu alkyl, and their selection Substituted with one or more halogen, phenyl, CN, -OH, -SH, c "c4 alkoxy,-(CO) OH or-((: 0) 0 ((ν (: 4 alkyl) ; Or R8, R9, r8, and R9 'are phenyl groups, which are optionally substituted with one or more CrC6 alkyl, halogen, CN, OR3, sr4, or NR5R6; or R8, R9, r8, and r9, are Halogen, CN, or3, sr4, sor4, so2r4 or nr5r6; wherein the substituents or3, sr4 or nr5r6 are optionally via the r3, r4, r5 and / or r6 group with the phenyl, naphthyl, benzyl or One of the carbon atoms of the naphthyl group or the substituent R7 or one of the carbon atoms of the naphthyl or phenyl group of M3 forms a 5- or 6-membered ring; or R8 and R9 or R8 'and R9' together are I10 ? 11 I12 ί13, ΡΗ η — ^ c = c—c = c—or —c = c—c—ο—group;

Rio、Rii、Ri2及Ri3彼此個別係氫、Ci-Cu烧基’其選擇 性地以一或更多之鹵素、苯基、CN、-〇H、-SH、CrC4 烷氧基、-(CO)OH或-(C0)0(CrC4烷基)取代;或ho'Rn、 R12及R13係苯基,其選擇性地以一或更多之C1_C6烷基、 鹵素、CN、0R3、SR4 或 NR5R6 取代;或 Rio、Ru、Ru 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 14 593357 A7 B7 五、發明説明(12 (請先閲讀背面之注意事項再填寫本頁) 及R13係鹵素、CN、0R3、SR4或NR5R6取代;及 Rm及R15彼此個別係氫、CrC12烷基,其選擇性地以一 或更多之鹵素、苯基、〇化-011、-811、(:1-(:4烷氧基、-((:0)011 或-(co)o(crc4烷基)取代;或R14及R15係苯基,選擇性 地以一或更多之crc6烷基、齒素、cn、or3、sr4或nr5r6 取代; 但 ⑴若Aq係苯基,其係以(E)基取代且未額外以(D)或(F)基 取代且R2係氫,則M4非直接建、S或NR5 ; (ii)若ΑΓι係萘基,其係以(E)基取代且未額外以(D)或(F) 基取代,則Μ4非直接建、S、0或NR5 ; -、^τ· (in)若Μ*係0且&係氫,則Aq非以(E)基取代且未額外 以(D)或(F)基取代且於鄰位同時以〇r3取代或以sr4、 nr5r6、苯基、-(co)r7或so2r7取代之苯基; (iv) 若Aq係苯基,其係以_(CO)R7取代且未額外以(D)或(F) 基取代,則R2非氫; (v) 若Aq係苯基’其係以_(c〇)R7取代且未額外以(D)或(F) 基取代且&非氫,則R7非苯基或Ci_Cu烷基; (vi) 若Aq係萘基,其係以_(c〇)R7取代且未額外以(D)或(F) 基取代,則R7非苯基或GVCn烷基; 相較於光引發劑個別結構或以其為主之混合物,於光聚合 反應展現不可預期之良好性能。 被取代之芳基ΑΓι、Ar2、Ar3、、M4或M4,個別被 取代1至7、1至6或1至4次。明顯地,界定之芳基不Rio, Rii, Ri2, and Ri3 are each independently hydrogen, Ci-Cu alkyl, which are optionally selected from one or more halogen, phenyl, CN, -OH, -SH, CrC4 alkoxy,-(CO ) OH or-(C0) 0 (CrC4 alkyl); or ho'Rn, R12 and R13 are phenyl groups, optionally with one or more C1_C6 alkyl, halogen, CN, OR3, SR4 or NR5R6 Replace; or Rio, Ru, Ru This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 14 593357 A7 B7 V. Description of the invention (12 (Please read the precautions on the back before filling this page) and R13 Halogen, CN, OR3, SR4, or NR5R6; and Rm and R15 are each independently hydrogen, CrC12 alkyl, which is optionally substituted with one or more halogen, phenyl, sulfide-011, -811, (: 1-(: 4 alkoxy,-((: 0) 011 or-(co) o (crc4 alkyl)); or R14 and R15 are phenyl, optionally with one or more crc6 alkyl, Dentin, cn, or3, sr4, or nr5r6 are substituted; however, if Aq is phenyl, it is substituted with (E) and not additionally substituted with (D) or (F) and R2 is hydrogen, then M4 is not directly (Ii) if Al is naphthyl, it is E) is substituted without additional (D) or (F) groups, then M4 is not directly constructed, S, 0 or NR5;-, ^ τ · (in) if M * is 0 and & is hydrogen, then Aq is a phenyl group that is not substituted with (E) group and is not additionally substituted with (D) or (F) group and at the same time is substituted with 0r3 or sr4, nr5r6, phenyl,-(co) r7 or so2r7 (Iv) if Aq is phenyl, which is substituted with-(CO) R7 and is not additionally substituted with (D) or (F), then R2 is non-hydrogen; (v) if Aq is phenyl, it is _ (c〇) R7 is substituted without additional (D) or (F) groups and & non-hydrogen, then R7 is not phenyl or Ci_Cu alkyl; (vi) if Aq is naphthyl, it is _ ( c) R7 is substituted without additional (D) or (F) groups, then R7 is not a phenyl group or a GVCn alkyl group; compared to the individual structure of the photoinitiator or its predominant mixture, it exhibits in photopolymerization reactions Unexpectedly good performance. Substituted aryl groups ΑΓι, Ar2, Ar3, M4 or M4 are individually substituted 1 to 7, 1 to 6 or 1 to 4 times. Obviously, the defined aryl groups are not

15 593357 A7 _______B7_ 五、發明説明(l3 ) 能具有比芳基環之自由位置更多之取代基。此等基被取代 1至7次,例如,1至6次或1至4次,特別是一、二或 三次。 被取代之苯基被取代1至4次,例如,一、二或三次, 特別是二次。苯基環上之取代基較佳係於位置4,或於苯 基環上之 3,4-、3,4,5-、2,4·或 2,4,6-結構。 萘基係1-萘基或2-萘基。 秦醯基係1-萘酿基或2-萘醯基。 香豆素基係15 593357 A7 _______B7_ 5. Description of the Invention (l3) It can have more substituents than the free position of the aryl ring. These groups are substituted 1 to 7 times, for example, 1 to 6 times or 1 to 4 times, especially one, two or three times. The substituted phenyl group is substituted 1 to 4 times, for example, one, two or three times, and especially two times. The substituent on the phenyl ring is preferably at position 4, or a 3,4-, 3,4,5-, 2,4 ·, or 2,4,6- structure on the phenyl ring. Naphthyl is 1-naphthyl or 2-naphthyl. Qinyi is 1-naphthyl or 2-naphthyl. Coumarin-based

,較佳係1-香豆素基、4-香豆素 基或5·香豆素基。 伸本基係1,2-伸苯基、l,3-伸苯基或ι,4-伸苯基,較 佳係1,4-伸苯基。 伸茶基係’例如,1,2-、1,3-、1,4-、1,5-、1,6_、l,8-、 2,3-、2,6-或 2,7-伸萘基。 伸苯基二氧係指以二〇_原子取代之伸苯基。例子係 伸苯基二氧、丨,3-伸苯基二氧或1,4-伸苯基二氧,較 佳係1,4-伸苯基二氧。伸萘基二氧係指以二〇_原子取代 之伸萘基。例子係 i,2_、i,;^、14_、15_、16、U、2,3、 2,6-或2,7-伸萘基二氧。 ’ (請先閱讀背面之注意事項再填寫本頁)Preferably, it is a 1-coumarin group, a 4-coumarin group or a 5 · coumarin group. The phenylene group is 1,2-phenylene, 1,3-phenylene or ι, 4-phenylene, and more preferably 1,4-phenylene. Dextrin-based 'for example, 1,2-, 1,3-, 1,4-, 1,5-, 1,6_, 1,8-, 2,3-, 2,6-, or 2,7- Naphthyl. The phenylene dioxy group refers to a phenylene group substituted with a 20 atom. Examples are phenylenedioxy, 1,3-phenylenedioxy or 1,4-phenylenedioxy, and more preferred is 1,4-phenylenedioxy. A naphthyldioxy group means a naphthyl group substituted with a 20 atom. Examples are i, 2_, i ,; ^, 14_, 15_, 16, U, 2, 3, 2, 6 or 2,7-naphthyldioxy. ’(Please read the notes on the back before filling out this page)

593357 A7 _______B7_ 五、發明説明(14 ) (請先閱讀背面之注意事項再填寫本頁) CVCm院基係呈線性或分支且係,例如,、 CVCu-'CrCu-'Ci-CV'CVCV或(VCV貌基或 c4-C12-或C4-C8_烧基。例子係甲基、乙基、丙基、異丙基、正丁 基、第二丁基、異丁基、第三丁基、戊基、己基、庚基、 2,4,4-三甲基戊基、2-乙基己基、辛基、壬基、癸基、十 二炫基、十四烧基、十五烧基、十六烧基、十八烧基及二 十烷基。Crc12烧基、c2-c12烧基、c〗_cn烧基、crc8燒 基及CrC6烧基具有如上對CVC2。烧基所示相同定義,最 高達相對應之碳原子數。 以一或更多-0-間斷之CVCm烧基係,例如,以·〇_間 斷1-9,1-5,1-3次或一次或二次。二0原子係至少以二 伸甲基(即,伸乙基)分隔。烷基係線性或分支。例如,丁 列結構單元會發生,-CH2-CH2-0-CH2CH3、-[CH2CH20]y- CH3,其中 y=l-9,-(ch2-ch2o)7-ch2ch3、-CH2-ch(ch3)-o-ch2-ch2ch3 或·ch2-ch(ch3)-0-ch2-ch3 〇 CVC^o伸烧基係線性或分支且係,例如,、 (VCu-、cvCi。-、cvcv、cvcv或 cvc4-伸烧基或 c4-c12-或C4_C8伸烧基。例子係伸甲基、伸乙基、伸丙基、甲基 伸乙基、伸丁基、甲基伸丙基、乙基伸乙基、1,1_二曱基 伸乙基、1,2-二甲基伸乙基、伸戊基、伸己基、伸庚基、 2-乙基伸己基、伸辛基、伸壬基、伸癸基、伸十二烧基、 伸十四烧基、伸十五烧基、伸十六烧基、伸十八烧基及伸 二十烧基。伸烷基具有如上對Cl_c2G伸烷基所示相 同意義,最高達相對應之碳原子數。 本紙張尺度翻中國國家標準(⑽A4規格⑵⑽撕公幻 - 17 - 593357 A7 ___B7_ 五、發明説明(15 ) 伸環己基係1,2-、1,3·或1,4-伸環己基。 C^-C4經基烧基係指以一或二個〇_原子取代之c2_c4 烷基。烷基係直線或分支。例子係2-羥基乙基、ι_羥基乙 基、1-經基丙基、2-經基丙基、3·經基丙基、1-經基丁基、 4-羥基丁基、2-羥基丁基、3-羥基丁基、2,3·二羥基丙基 或2,4-二羥基丁基。 C;3-C8環烧基係,例如,環丙基、環丁基、環戊基、 環己基、環辛基,特別是環戊基及環己基。593357 A7 _______B7_ V. Description of the invention (14) (Please read the notes on the back before filling out this page) The CVCm department is linear or branched and department, for example, CVCu-'CrCu-'Ci-CV'CVCV or ( VCV amyl or c4-C12- or C4-C8-alkyl. Examples are methyl, ethyl, propyl, isopropyl, n-butyl, second butyl, isobutyl, third butyl, pentyl Base, hexyl, heptyl, 2,4,4-trimethylpentyl, 2-ethylhexyl, octyl, nonyl, decyl, dodecyl, tetradecyl, pentadecyl, ten Hexyl, octadecyl, and eicosyl. Crc12 alkyl, c2-c12 alkyl, c_cnalkyl, crc8 alkyl, and CrC6 alkyl have the same definitions for CVC2 as above. The alkyl radicals have the same definitions as the highest. Up to the corresponding number of carbon atoms. One or more -0-intermittent CVCm firing system, for example, -0_ interrupted 1-9, 1-5, 1-3 times or once or twice. 2 0 The atomic system is separated by at least dimethyl (ie, ethyl). Alkyl is linear or branched. For example, Dingulene structural units occur, -CH2-CH2-0-CH2CH3,-[CH2CH20] y- CH3, Where y = l-9,-(ch2-ch2o) 7-ch2ch3, -CH2-ch (ch3) -o-ch2-ch 2ch3 or · ch2-ch (ch3) -0-ch2-ch3 〇CVC ^ o sintered base is linear or branched and system, for example, (VCu-, cvCi.-, cvcv, cvcv or cvc4- sintered c4-c12- or C4_C8 alkynyl. Examples are dimethyl, ethyl, propyl, methyl, butyl, methyl, ethyl, 1,1_ Fluorenyl, ethyl, dimethyl, pentyl, pentyl, hexyl, heptyl, 2-ethyl hexanyl, octyl, danyl, decyl, and dodecyl Fourteen alkyl groups, Fiveteen alkyl groups, Sixteen alkyl groups, Eighteen alkyl groups, and Eighteen alkyl groups. The alkyl groups have the same meaning as shown above for Cl_c2G alkyl groups, and the highest correspondence is The number of carbon atoms. This paper is based on the Chinese national standard (⑽A4 size ⑵⑽Tear Fantasy-17-593357 A7 ___B7_ V. Description of the invention (15) Cyclohexyl system 1,2-, 1,3 · or 1,4- Cyclohexyl. C ^ -C4 via alkyl refers to a c2_c4 alkyl group substituted with one or two 0_ atoms. The alkyl group is straight or branched. Examples are 2-hydroxyethyl, ι_hydroxyethyl, 1 -Ethylpropyl, 2-Ethylpropyl, 3.Ethylpropyl , 1-Ethylbutyl, 4-hydroxybutyl, 2-hydroxybutyl, 3-hydroxybutyl, 2,3 · dihydroxypropyl or 2,4-dihydroxybutyl. C; 3-C8 ring The alkyl group is, for example, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclooctyl, especially cyclopentyl and cyclohexyl.

CrCu烷氧基係以一個〇-原子取代之Ci_Ci2烷基。 CrCu烷基具有如上對C^C:2。烷基所示之相同意義,最高 達相對應之C原子數。CrC4烷氧基係線性或分支,例如, 曱氧基、乙氧基、丙氧基、異丙氧基、正丁氧基、第二丁 氧基、異丁氧基、第三丁氧基。CrCu alkoxy is a Ci_Ci2 alkyl substituted with one 0-atom. CrCu alkyl has C ^ C: 2 as above. Alkyl has the same meaning, up to the corresponding number of C atoms. CrC4 alkoxy is linear or branched, for example, fluorenyloxy, ethoxy, propoxy, isopropoxy, n-butoxy, second butoxy, isobutoxy, third butoxy.

Ci-Cu烷基硫烷基係以一個S-原子取代之(^-(:12烷 基。Ci-C〗2烧基具有如上對Cj-C^o烧基所示之相同意義, 最高達相對應之C原子數。crc4烷基硫烷基係線性或分 支,例如,甲基硫烷基、乙基硫烷基、丙基硫烷基、異丙 基硫烷基、正丁基硫烷基、第二丁基硫烷基、異丁基硫烷 基、第三丁基硫烷基。 C2_C1()烷氧基烷基係以一個〇-原子間斷之c2_ci()烷 基。C2_c1()烧基具有如上對cvc^o院基所示之相同意義, 最南達相對應之C原子數。例子係甲氧基曱基、甲氧基 乙基、甲氧基丙基、乙氧基曱基、乙氧基乙基、乙氧基丙 基、丙氧基甲基、丙氧基乙基、丙氧基丙基。 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公爱) '^ " (請先閲讀背面之注意事項再填寫本頁)Ci-Cu alkylsulfanyl is substituted with one S- atom (^-(: 12 alkyl. Ci-C) 2 alkyl has the same meaning as shown above for Cj-C ^ alkyl, up to Corresponding number of C atoms. Crc4 alkylsulfanyl is linear or branched, for example, methylsulfanyl, ethylsulfanyl, propylsulfanyl, isopropylsulfanyl, n-butylsulfanyl Group, second butylsulfanyl group, isobutylsulfanyl group, third butylsulfanyl group. C2_C1 () alkoxyalkyl is a c2_ci () alkyl group interrupted by a 0-atom. C2_c1 () The alkynyl group has the same meaning as shown above for cvc ^ o, and the most corresponding number of C atoms is Nanda. Examples are methoxyfluorenyl, methoxyethyl, methoxypropyl, and ethoxyfluorene Base, ethoxyethyl, ethoxypropyl, propoxymethyl, propoxyethyl, propoxypropyl. This paper size applies to China National Standard (CNS) A4 specifications (210X297 public love) '' ^ " (Please read the notes on the back before filling this page)

593357593357

G-C2。烷醯基係呈線性或分支且係,例如,C2_c^_、 c2-c14-^c2.c12^c2.c8^c2.c6.^ c4-c12. 或C4_C8_烷醯基。例子係乙醯基、丙醯基、丁醯基、異丁 醯基、戊醯基、己酿基、庚醯基、辛醯基、壬醯基、癸醯 基、十二烷醯基、十四烷醯基、十五烷醯基、十六烷醯基、 十八烷醯基及二十烷醯基,較佳係乙醯基。烷醯基 具有如上對烷醯基所示相同定義,最高達相對應 之碳原子數。G-C2. Alkyl groups are linear or branched and are, for example, C2_c ^ _, c2-c14- ^ c2.c12 ^ c2.c8 ^ c2.c6. ^ C4-c12. Or C4_C8_alkanoyl. Examples are ethenyl, propionyl, butylamyl, isobutylamyl, pentamyl, hexyl, heptyl, octyl, nonyl, decyl, dodecyl, tetradecyl, ten Pentadecyl, hexadecyl, octadecyl and eicosylfluorenyl are preferred, and ethyl fluorenyl is preferred. Alkyl groups have the same definition as shown for alkyl groups above, up to the corresponding number of carbon atoms.

CrC:4烷醯基氧係線性或分支,例如,乙醯基氧、丙 醯基氧、丁酿基氧、異丁醯基氧,較佳係乙醯基氧。CrC: 4 Alkyloxy is linear or branched. For example, ethynyloxy, propionyloxy, butyryloxy, isobutyryloxy, and more preferably ethynyloxy.

CrCi2烷氧基羰基係線性或分支且係,例如,甲氧基 Ik基、乙氧基幾基、丙氧基幾基、正丁氧基幾基、異丁氧 基羰基、1,1-二甲基丙氧基羰基、戊氧基羰基、己氧基羰 基、庚氧基羰基、辛氧基羰基、壬氧基羰基、癸氧基羰基 或十二烷氧基羰基,特別是甲氧基羰基、乙氧基羰基、丙 氧基幾基、正丁氧基幾基或異丁氧基魏基,較佳係甲氧基 羰基。 以一或更多-0-間斷之(:2-<:12烷氧基羰基係直線或分 支。二-0-原子係以至少二個伸甲基(即,伸乙基)分隔。 一 苯氧基羰基係 。被取代之苯氧基羰基係 被取代1至4次,例如,1、2或3次,特別是2或3次。 苯基環上之取代基較佳係於苯基環上之4位置,或於 3,4-、3,4,5-、2,6-、2,4-或 2,4,6-位置,特別是 4 或 3,4-位 19 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593357 A7 ------ B7___ 五、發明説明(17 ) ~ —^ 置。 苯基烷基係,例如,苯甲基、苯基乙基、 甲基苯甲基或α,α-二甲基苯曱基,特別是苯甲基。 烯基可為單-或多不飽和且係,例如乙烯基、 烯丙基、曱基烯丙基、1,;μ二甲基烯丙基、卜丁烯基、3· 丁烯基、2-丁烯基、1,3_戊二烯基、5_己烯基、7_辛烯基 或十二烯基,特別是烯丙基。C2-C5烯基具有如上對c2-ci2 烯基所示者相同之意義,且最高達相對應碳數。 q-C6烯氧基可為單_或多不飽和且係,例如,烯丙基 氧基、甲基烯丙基氧基、丁烯基氧基、戊烯基氧基、H 戊一烯基氧基、5 -己烯基氧基。 C3-C12烯醯基可為單-或多不飽和且係,例如,丙婦 醯基、2-甲基_丙烯醯基、丁烯醯基、戊烯醯基、—戊二 烯酿基、5-己烯醯基。C3-C6烯醯基具有與如上對c3_Ci2 烯酿基所示相同意義,最高達相對應碳數。 鹵素係氟、氣、溴或埃,特別是氟、氣及溴,較佳係 氟及氣。 若苯基、萘基或苯甲醯基環上之取代基or3、sr4及 NRsR6經由R3、R4、Rs及/或R0基與苯基或萘基環上之進 一步取代基形成5-或6-元環,包含二或三環(包含苯基環) 之結構被獲得。例子係 本紙張尺度適用中國國家標準(CN5J) A4規格(210χ297公釐) 20 (請先閲讀背面之注意事項再填寫本頁}CrCi2 alkoxycarbonyl is linear or branched and is, for example, methoxy Ik, ethoxychi, propoxychi, n-butoxychi, isobutoxycarbonyl, 1,1-di Methylpropoxycarbonyl, pentoxycarbonyl, hexyloxycarbonyl, heptyloxycarbonyl, octyloxycarbonyl, nonoxycarbonyl, decoxycarbonyl or dodecyloxycarbonyl, especially methoxycarbonyl , Ethoxycarbonyl, propoxychi, n-butoxychi or isobutoxyweiyl, preferably methoxycarbonyl. It is straight or branched with one or more -0-intermittent (: 2- <: 12 alkoxycarbonyl groups. Di-0-atoms are separated by at least two methyl groups (ie, ethyl groups). Phenoxycarbonyl system. The substituted phenoxycarbonyl system is substituted 1 to 4 times, for example, 1, 2 or 3 times, especially 2 or 3 times. The substituent on the phenyl ring is preferably a phenyl group. 4 position on the ring, or 3,4-, 3,4,5-, 2,6-, 2,4-, or 2,4,6- position, especially 4 or 3,4-position 19 (please Please read the notes on the back before filling this page.) This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 593357 A7 ------ B7___ 5. Description of the invention (17) ~-^. Benzene Alkyl systems are, for example, benzyl, phenylethyl, methylbenzyl or α, α-dimethylbenzyl, especially benzyl. Alkenyl may be mono- or polyunsaturated and System, such as vinyl, allyl, fluorenylallyl, 1 ,; μ dimethylallyl, butenyl, 3 · butenyl, 2-butenyl, 1,3-pentane Alkenyl, 5-hexenyl, 7-octenyl or dodecenyl, especially allyl. C2-C5 alkenyl has the above It has the same meaning for the c2-ci2 alkenyl group, and up to the corresponding carbon number. The q-C6 alkenyl group can be mono- or polyunsaturated and is, for example, allyloxy, methallyl Alkyloxy, butenyloxy, pentenyloxy, H pentenyloxy, 5-hexenyloxy. C3-C12 alkenyl may be mono- or polyunsaturated and is, for example, , Propynyl, 2-methyl-propenyl, butenyl, pentenyl, -pentadienyl, 5-hexenyl. C3-C6 alkenyl has the same properties as above for c3_Ci2 Alkenyl has the same meaning, up to the corresponding carbon number. Halogen is fluorine, gas, bromine or ethene, especially fluorine, gas and bromine, preferably fluorine and gas. If phenyl, naphthyl or benzamidine The substituents or3, sr4, and NRsR6 on the basic ring form a 5- or 6-membered ring through the R3, R4, Rs, and / or R0 group and further substituents on the phenyl or naphthyl ring, including bi- or tri-ring (including The structure of phenyl ring) was obtained. The example is that the paper size applies the Chinese national standard (CN5J) A4 specification (210x297 mm) 20 (Please read the precautions on the back before filling this page}

593357 A7 B7593357 A7 B7

五、發明説明(IS5. Description of the invention

COO 货.Ος^ ,ΟςΧ> . .例如 〇g^ C,C12·烷基 GH3ΟςζΚΟ^Ο·· c,h7 c4h9COO goods. Ος ^, Οςχ >

C2H5 若作為M4或M4’之C2H5 if used as M4 or M4 ’

~X~ X

基上之取代基 OR3、SR4或nr5r6經由r3、R4、R5及/或r6與附接至此 基之其它苯基環之碳原子之一或苯基或萘基環者選擇性地 形成5-或6-元環,包含二或三環(包含苯基環)之結構被獲 得。例子係The substituent OR3, SR4 or nr5r6 on the group optionally forms a 5- or- A 6-membered ring, a structure containing a bi- or tri-ring (including a phenyl ring) is obtained. Example department

若,例如尺8、以9、尺8,及心1』115尺6,其中取代基顺5116 經由R5及/或R6經與ΑΓι之苯基、萘基、苯甲醯基或萘醯 (請先閲讀背面之注意事項再填寫本頁) 、盯| 基之碳原子之一形成5-或6-元環,下列結構係較佳具體 例 0^Χ>·,例如 ΟζΧ> , , 〇φ3·,If, for example, ruler 8, ruler 9, ruler 8 and ruler 115, ruler 6 and 6, the substituent cis 5116 via R5 and / or R6 via phenyl, naphthyl, benzyl or naphthyl fluorene (Please Read the precautions on the back before filling in this page), one of the carbon atoms of the | group forms a 5- or 6-membered ring, the following structures are preferred specific examples 0 ^ χ > ·, such as Οζχ >, 〇φ3 · ,

Crc12•炫基 0H3 c2h5 63η7 °^9 。清楚地,於本發明定義前後文中及基於範 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐) 593357 發明説明(i9 例所示,此等基可載負進一步之取代基。 若作為I及/或&amp;之笨基上之取代基〇r3、SR4或 NR5R6經由r3、r4、R5及/或心與ΑΓι之苯基、萘基、苯 甲醯基或萘醯基之奴原子之一或取代基者選擇性地形 成5_或6-元環,包含二或三環(包含苯基環)之結構被獲 得。例子係 〇0〇,&lt;X;X)Crc12 • Hyunji 0H3 c2h5 63η7 ° ^ 9. Clearly, the Chinese National Standard (CNS) A4 specification (210X297 mm) is applied in the context of the definition of the present invention and based on the template paper size. 593357 Description of the invention (as shown in the example of i9, these bases can carry further substituents. If used as I and / or &amp; The mono- or substituents selectively form a 5- or 6-membered ring, and a structure containing a bi- or tri-ring (including a phenyl ring) is obtained. Examples are 00, <X; X)

車乂佳係化學式i、II及之化合物,其中 Ri係C3_C:6環烷基或C^C:6烷基,其係未被取代或以一或 更多之齒素或苯基取代;或I係苯基,其係未被取代或 以一或更多之C「C6烷基、鹵素、〇r3、sr4及/或NR5R6 取代;或Ri係Ci-C^烷氧基或苯甲基氧; R2及R2 ’彼此個別係氫;選擇性以一或更多之鹵素、、 苯基及/或以OR3、SR*及/或NR5R6取代之苯基取代之Cr C2〇烷基;或係Cs-C:6環烷基;或係C2-C2G烷基,其係以 一或更多-0-間斷及/或選擇性以一或更多之鹵素、〇r3、 苯基及/或以OR3、SR*及/或NR5R6取代之苯基取代; R2及R/係苯基,其係未被取代或以一或更多之Ci-C6 基、苯基、鹵素、0R3、SR4及/或NR5R6取代;或r2 R2’係C2-C12统醢基、C2-C12烧氧基羰基或(a)、(B)或(C) 或 烷 及 (請先閲讀背面之注意事項再填寫本頁) 、?τ— 本紙張尺度適用中國國家標準(CNS〉Α4規格(210 X 297公釐) 22Che Xiajia is a compound of chemical formulas i, II and Ri, wherein Ri is C3_C: 6 cycloalkyl or C ^ C: 6 alkyl, which is unsubstituted or substituted with one or more halides or phenyl groups; or I is phenyl, which is unsubstituted or substituted with one or more C, C6 alkyl, halogen, 0r3, sr4, and / or NR5R6; or Ri is Ci-C ^ alkoxy or benzyloxy R2 and R2 'are each independently hydrogen; Cr C20 alkyl optionally substituted with one or more halogen, phenyl, and / or phenyl substituted with OR3, SR * and / or NR5R6; or Cs -C: 6 cycloalkyl; or C2-C2G alkyl, which is interrupted by one or more -0- and / or optionally by one or more halogens, 0r3, phenyl and / or OR3 , SR * and / or NR5R6 substituted phenyl; R2 and R / is phenyl, which is unsubstituted or substituted with one or more Ci-C6, phenyl, halogen, OR3, SR4 and / or NR5R6 Substitution; or r2 R2 'is C2-C12 hydrazone, C2-C12 alkoxycarbonyl or (a), (B) or (C) or alkane and (Please read the precautions on the back before filling this page), ? τ— This paper size applies to Chinese national standards (CNS> Α4 size (210 X 297 mm) twenty two

593357 A7 ____ B7____ 五、發明説明(20 ) 基;593357 A7 ____ B7____ V. Description of invention (20) basis;

Ar〗係本基、萘基或苯甲酿基,每一者係以鹵素、Ci_C6 烷基、0R3、SR4及/或NR5R6取代1至7次;或其每一者 係以苯基或以藉由一或更多之0R3、SR4或NR5R6取代之 苯基取代;或其每一者係以_(CO)R7、(D)、(E)及/或(F)基 取代;Ar〗 is a base, naphthyl or benzyl group, each of which is substituted 1 to 7 times with halogen, Ci_C6 alkyl, OR3, SR4, and / or NR5R6; or each of them is substituted with phenyl or Substituted with one or more phenyl groups substituted with OR3, SR4 or NR5R6; or each of them is substituted with a (CO) R7, (D), (E) and / or (F) group;

Ar2係伸苯基或伸苯基二幾基,每一者係以鹵素、CrC6 烷基、0R3、SR4&amp;/或NR5R6取代1至4次;Ar2 is phenylene or phenylphenylene, each of which is substituted 1 to 4 times with halogen, CrC6 alkyl, OR3, SR4 &amp; or NR5R6;

每一者係未被取代或以鹵素、烷基、0R3、SR4及/ 或NR5R6取代1至4次;或每一者係以-(c〇)R7、(D)、(E) 或(F)基取代; 或Αγ2係 ’其每一者係未被取代或以_素、 C「C6烧基、OR3、SR4及/或NRSR6取代1至6次,其中 取代基〇R3、SR4或NR5R6選擇性地經由、r4、心及/ 或R0基與苯基環之碳原子之一形成5-或卜元環;或其每 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公董) &quot;一&quot;&quot;-23二 &quot;一&quot;'—' (請先閲讀背面之注意事項再填寫本頁)Each is unsubstituted or substituted 1 to 4 times with halogen, alkyl, OR3, SR4, and / or NR5R6; or each is-(c〇) R7, (D), (E) or (F ) Group substitution; or each of Aγ2's is unsubstituted or substituted 1 to 6 times with oxine, C, C6 alkyl, OR3, SR4 and / or NRSR6, wherein the substituents OR3, SR4 or NR5R6 are selected To form a 5- or Bu ring through one of the carbon atoms of the phenyl ring via the R4, R4, and R0 groups and / or R0 groups; or each paper size applies the Chinese National Standard (CNS) A4 specification (210X297 public director) &quot; a &quot; &quot; -23 二 &quot; 一 &quot; '—' (Please read the notes on the back before filling this page)

593357 A7 _B7 _ 五、發明説明(21 ) 一者係以-(CO)R7、(D)、(E)或(F)基取代;593357 A7 _B7 _ 5. Description of the invention (21) One is substituted with-(CO) R7, (D), (E) or (F) group;

Ar3係苯基、萘基或香豆素基,每一者係以鹵素、 烷基、苯基或以一或更多之〇R3、SR4&amp;/或NR5R6取代之 苯基取代1至7次;或每一者係以0R3、SR4及/或NR5R6 取代; 係Ci-Ca伸烷基,其選擇性地以一或更多之-0-間斷; 或Μ1係伸苯基或伸萘基,每一者係未被取代或以一或更 多之CVC6烷基、苯基、鹵素、0R3、SR4及/或NR5R6取 代;或%係出)基,其選擇性地以鹵素、C「C6烷基、0R3、 SR4及/或NR5R6取代1至4次,其中取代基〇R3、SR4或 NR5R6選擇性地經由R3、R4、R5及/或心基與其它苯基環 之碳原子之一形成5-或6_元環; M2係直接鍵、CVCw伸烷基或CrC1()伸烷基-〇-,其每一 者係選擇性地以一或更多之-0-間斷;或M2係伸苯基-〇-, 其係未被取代或以一或更多之CrC6烷基、苯基、鹵素、 0R3、SR4及/或NR5R6取代;或m2係cvc1()伸烷基-伸苯 基-0-;Ar3 is phenyl, naphthyl or coumarin, each of which is substituted 1 to 7 times with halogen, alkyl, phenyl or phenyl substituted with one or more OR3, SR4 &amp; or NR5R6; Or each is substituted with OR3, SR4, and / or NR5R6; is Ci-Ca alkylene, which is optionally interrupted by one or more -0-; or M1 is phenylene or naphthyl, each One is unsubstituted or substituted with one or more CVC6 alkyl, phenyl, halogen, OR3, SR4, and / or NR5R6; or%) groups, which are optionally substituted with halogen, C, C6 alkyl , OR3, SR4, and / or NR5R6 are substituted 1 to 4 times, wherein the substituent OR3, SR4, or NR5R6 optionally forms 5- through R3, R4, R5, and / or cardiyl with one of the other phenyl ring carbon atoms Or 6-membered ring; M2 is a direct bond, CVCw alkylene or CrC1 () alkylene-0-, each of which is optionally interrupted by one or more -0-; or M2 is benzene -0-, which is unsubstituted or substituted with one or more CrC6 alkyl, phenyl, halogen, OR3, SR4, and / or NR5R6; or m2 is cvc1 () alkylene-phenylene-0 -;

Mg及Μ/彼此個別為直接鍵,或係CrCw伸烧基或 伸烧基-X- ’其每一者係選擇性地以一或更多之_〇_間斷; 或M3及Μ/係伸苯基或伸苯基-X-,每一者係未被取代或 以一或更多之CVC0烷基、苯基、鹵素、OR3、Sr4及/或 NR5R6 取代;或 M3 及 m3’係 crc1()伸烷基-C(0)-X-、 c10伸烷基-X-C(o)·、伸苯基-C(0)-X-、CVCi。伸烷基_伸 苯基-X-或伸苯基-C(0)-伸苯基; 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 24 (請先閲讀背面之注意事項再填寫本頁)Mg and Μ / are each a direct bond to each other, or are CrCw sintered or sintered -X- 'each of which is selectively interrupted by one or more _〇_; or M3 and Μ / Phenyl or phenylene-X-, each of which is unsubstituted or substituted with one or more CVC0 alkyl, phenyl, halogen, OR3, Sr4, and / or NR5R6; or M3 and m3 'are crc1 ( ) Alkylene-C (0) -X-, c10 alkylene-XC (o) ·, phenylene-C (0) -X-, CVCi. Alkylene_Xylenyl-X- or Xylenyl-C (0) -Xylenyl; This paper size applies to China National Standard (CNS) A4 (210X297 mm) 24 (Please read the notes on the back first (Fill in this page again)

593357 A7 _ B7__ 五、發明説明(22 ) M4及Μ/彼此個別為直接鍵、-〇-、_s-、-NR5’-或-CO-; 或M4及M4’係-Y-(CrC1()伸烷基)-Y’-,其選擇性地以一 或更多之-0-間斷;或μ4及Μ4’係-Υ-伸苯基-Υ’-,其每一 者係未被取代或以一或更多之C^-C^烧基、苯基、鹵素、 〇R3、SR4 及/或 NR5R6 取代;或 M4 及 M4’係-Y-(CrC4 伸 烷基)-0-伸苯基-〇-(CVC4伸烷基)-Y’-或-Y-(CVC4伸烷 基)-〇-伸萘基-CKCVQ伸烷基)-Y’-;或M4及M4’係-X-CkC!。伸烷基-x-c(o)-,其選擇性地以一或更多之0間593357 A7 _ B7__ V. Description of the invention (22) M4 and M / are each a direct bond, -0-, _s-, -NR5'- or -CO-; or M4 and M4 'are -Y- (CrC1 () (Alkylene) -Y'-, which is optionally interrupted by one or more -0-; or μ4 and M4 'are -fluorene-phenylene-fluorene'-, each of which is unsubstituted or Substituted with one or more C ^ -C ^ alkyl, phenyl, halogen, OR3, SR4, and / or NR5R6; or M4 and M4'-Y- (CrC4 alkylene) -0-phenylene -〇- (CVC4alkylene) -Y'- or -Y- (CVC4alkylene) -〇-alkylene-CKCVQ alkylene) -Y'-; or M4 and M4'-X-CkC !. Alkylene-x-c (o)-, optionally between one or more zeros

Cj -- 斷;或M4&amp; M4’係 U U 基,其選擇性地以齒素、 CVC12烷基、0R3、SR4及/或NR5R6取代1至4次;其中 取代基0R3、SR4或NR5R6選擇性地經由R3、R4、R5及/ 或心基與其它苯基環之碳原子之一或附接至此基之苯基 者形成5-或6-元環; 以4”係直接鍵、-〇-、-3-、-\115’-或-(:〇-;或%4’’係-丫-((:1-(:10 伸烷基)-Y’-,其選擇性地以一或更多之-0-間斷;或m4” 係-Y-伸苯基-Y’-,其係未被取代或以一或更多之(^-(^烷 基、苯基、函素、〇R3、SR4及/或NR5R6取代;或m4”係-X-CVC1()伸烷基-X-C(O)-,其選擇性地以一或更多之-0-間斷; R3係氫、烧基或苯基-C^-C^烧基;或尺3係 基,其係以c3-c6烯氧基、-ckcomcvg烷基)、_〇(co)_ 苯基取代;或r3係c2-c12烷基,其係以一或更多之-ο-間 斷;或r3係CVC8烷醯基;或苯曱醯基,其係未被取代 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 25 (請先閲讀背面之注意事項再填寫本頁) .訂· ♦ 593357 A7 ______ B7 五、發明説明(23 ) 或以一或更多之Crc0烷基、鹵素及/或Ci_c4烷氧基取代; 或R3係苯基或萘基,每一者係未被取代或以鹵素、 (請先閲讀背面之注意事項再填寫本頁) 烷基、CrC4烧氧基、Ci-Cu烷基硫烷基、苯基硫烷基、_ NCCVCu烷基h及/或二苯基胺基取代; .、tr— &amp;係氫、CVC2。烧基或苯基_Cl_c3烷基;或心係烷 基,其係以(33-&lt;:6烯氧基、-CKCOXCi-C^烷基)或-O(CO)-苯基取代;R4係CVC^2烧基,其係以一或更多之 間斷;或R4係C「C8烷醯基;或苯甲醯基,其係未被取 代或以一或更多之CrC6烷基、鹵素、烷氧基或C!-C4烧基硫烧基取代,或R4係苯基或萘基,每一者係未被 取代或以鹵素、C〗_c12烷基、CrCu烷氧基、苯氧基、cr C12烧基疏烧基、苯基硫烧基、-N(CrC12烧基)2、二苯基 胺基或-(CC^CKCVCs烷基)取代; 線 尺5及心彼此個別係氫、crc2G烷基、c2-c1G烷氧基烷基、 苯基-crc3烷基、CrC8烷醯基或苯甲醯基;或心及R6 係苯基或萘基,其每一者係未被取代或以苯甲醯基、cvc12 烷基或crc12烷氧基取代;或尺5及r6—起係c2-c6伸烷 基,其選擇性地以-0-或-NR3-間斷及/或選擇性地以CVC4 烷氧基、c2-c4烷醢基氧或苯甲醯基氧取代; R5’係氫、CVCi。烷基或C2-C4羥基烷基;或R5’係苯基或 萘基,其每一者係未被取代或以C「C6烷基或Ci-Q烷氧Cj-broken; or M4 &amp; M4 'is a UU group, which is optionally substituted 1 to 4 times with dentin, CVC12 alkyl, OR3, SR4 and / or NR5R6; wherein the substituents OR3, SR4 or NR5R6 are selectively Form a 5- or 6-membered ring via R3, R4, R5 and / or a heart group with one of the carbon atoms of another phenyl ring or a phenyl group attached to this group; with a 4 "system direct bond, -0-, -3-,-\ 115'- or-(: 〇-; or% 4 '' is -Ya-((: 1-(: 10 alkylene) -Y'-, which is optionally one or more More than -0-discontinued; or m4 "is -Y-phenylene-Y'-, which is unsubstituted or substituted with one or more (^-(^ alkyl, phenyl, functional element, 〇R3 , SR4 and / or NR5R6; or m4 "is -X-CVC1 () alkylene-XC (O)-, which is optionally interrupted by one or more -0-; R3 is hydrogen, alkyl or Phenyl-C ^ -C ^ alkyl; or squaryl, which is substituted with c3-c6 alkenyloxy, -ckcomcvg alkyl), _〇 (co) _phenyl; or r3 is c2-c12 alkane Based on one or more -ο-interruptions; or r3 based on CVC8 alkyl fluorenyl; or phenyl fluorenyl based on unsubstituted paper This paper applies Chinese National Standard (CNS) A4 (210 X 297) Mm 25 (Please read the notes on the back before filling out this page). Order · ♦ 593357 A7 ______ B7 V. Description of the invention (23) or substituted with one or more Crc0 alkyl, halogen and / or Ci_c4 alkoxy; Or R3 is phenyl or naphthyl, each of which is unsubstituted or halogen, (please read the notes on the back before filling this page) alkyl, CrC4 alkoxy, Ci-Cu alkylsulfanyl, Phenylsulfanyl, NCCVCu alkylh and / or diphenylamino substitution;., Tr- &amp; hydrogen, CVC2. Alkyl or phenyl_Cl_c3 alkyl; or heart alkyl, which is Substituted with (33- &lt;: 6 alkenyloxy, -CKCOXCi-C ^ alkyl) or -O (CO) -phenyl; R4 is a CVC ^ 2 alkyl group, which is interrupted by one or more; or R4 is a C "C8 alkylfluorenyl group; or a benzamidine group, which is unsubstituted or substituted with one or more CrC6 alkyl, halogen, alkoxy, or C! -C4 alkylsulfanyl, or R4 Are phenyl or naphthyl, each of which is unsubstituted or halogen, C? _C12 alkyl, CrCu alkoxy, phenoxy, cr C12 alkyl, phenylthio, -N ( CrC12 alkyl) 2, diphenylamino or-(CC ^ CKCVCs alkyl) substituted; 5 and X are each independently hydrogen, crc2G alkyl, c2-c1G alkoxyalkyl, phenyl-crc3 alkyl, CrC8 alkyl or benzamyl; or X and R6 are phenyl or naphthyl, which Each is unsubstituted or substituted with benzamyl, cvc12 alkyl or crc12 alkoxy; or chi 5 and r6—from c2-c6 alkylene, optionally with -0 or -NR3 -Intermittent and / or optionally substituted with CVC4 alkoxy, c2-c4 alkylfluorenyloxy or benzamyloxy; R5 'is hydrogen, CVCi. Alkyl or C2-C4 hydroxyalkyl; or R5 'is phenyl or naphthyl, each of which is unsubstituted or C, C6 alkyl or Ci-Q alkoxy

基取代;或r5’係 R® 基; 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 26 593357 A7 __ B7 五、發明説明(24 ) R7係氫、CVC2〇烷基;Crc8烷基,其係以苯基、-0H、-〇(C〇)-(crC4烷基)或-O(CO)-笨基取代;或心係c2-c5烯 基或C3-C8環烷基;或r7係苯基、聯苯基或萘基,其每 一者選擇性地以一或更多之CVC6烷基、鹵素、CN、0R3、 SR4或NR5R6取代; R8、R9、R8,及R9,彼此個別係氫、CVC6烷基;苯基,其 選擇性以一或更多之CVC6烷基、鹵素、or3、sr4* nr5r6 取代;或 r8、r9、r8,及 r9,係鹵素、or3、sr4 或 nr5r6 ; 其中取代基or3、sr4或NR5R6選擇性地經由R3、r4、R5 及/或R6基與Aq之苯基、萘基或苯甲醯基之碳原子之— 或取代基R7者形成5 -或6·元環,或R8及R9或’及R9, ^10 ^11 ^12 ^13 一起係基;且Radical substitution; or r5 'is R® radical; this paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) 26 593357 A7 __ B7 V. Description of the invention (24) R7 hydrogen, CVC2 alkyl; Crc8 Alkyl, which is substituted with phenyl, -0H, -0 (C〇)-(crC4alkyl) or -O (CO) -benzyl; or C2-C5 alkenyl or C3-C8 cycloalkyl ; Or r7 is phenyl, biphenyl, or naphthyl, each of which is optionally substituted with one or more CVC6 alkyl, halogen, CN, OR3, SR4, or NR5R6; R8, R9, R8, and R9 , Each independently hydrogen, CVC6 alkyl; phenyl, which is optionally substituted with one or more CVC6 alkyl, halogen, or3, sr4 * nr5r6; or r8, r9, r8, and r9, which are halogen, or3, sr4 or nr5r6; wherein the substituents or3, sr4 or NR5R6 are optionally formed via the R3, r4, R5 and / or R6 group with the carbon atom of the phenyl, naphthyl or benzamidine group of Aq—or the substituent R7 5-or 6 · membered ring, or R8 and R9 or 'and R9, ^ 10 ^ 11 ^ 12 ^ 13 together are a group; and

RlO、Rll、Rl2及Rl3彼此個別係氫、烧基、苯基、 鹵素、OR3、SR4 或 NR5R6 〇 特別佳係化學式I或III之化合物,其中 Ri係C「C6烧基、C^-C6烧氧基或苯基’其係未被取代或 以一或更多之C「C4烷基、鹵素或0R3取代; 112及R2’彼此個別係氫或CrCw烷基;RlO, Rll, Rl2, and Rl3 are each independently hydrogen, alkyl, phenyl, halogen, OR3, SR4, or NR5R6. Particularly preferred are compounds of formula I or III, wherein Ri is C, C6, C6, Oxy or phenyl 'is unsubstituted or substituted with one or more C "C4 alkyl, halogen or OR3; 112 and R2' are each independently hydrogen or CrCw alkyl;

An係苯基、萘基或苯甲醯基,每一者係以鹵素、 炫基、OR3、SR4、NR5R6、苯基或以藉由一或更多之、 SR4或NRSR6取代之苯基取代1至7次;或其每一者係以 下列之基取代: 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) .裝· 、盯丨 i ----線丨 593357 A7 B7 五、發明説明(25 •Μ 厂 〇ΗΓϋ—An is phenyl, naphthyl or benzamidine, each of which is substituted with halogen, halo, OR3, SR4, NR5R6, phenyl or phenyl substituted with one or more of SR4 or NRSR6 To 7 times; or each of them is replaced by the following: This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) (Please read the precautions on the back before filling this page). Watching 丨 i ---- line 丨 593357 A7 B7 V. Description of the invention (25 • Μ 厂 〇ΗΓϋ—

but

Aq係苯基、萘基或苯甲醯基,其每一者係以c(〇)r7、(D) 基、(E)基或(F)基之至少一者取代; 且 ⑴若ΑΓι係苯基,其係未以(D)基或(F)基取代但以(E)基取 代且r2係氫,則μ4非直接建、S或NR5 ; (ii) 若ΑΓι係萘基,其係未以(D)基或(F)基取代但以(E)基 取代,則Μ4非直接建、S、0或NR5 ; (iii) 若M4係〇且R2係氫,則Ar!非以(E)基取代且同時於 鄰位同時以〇R3取代或以SR4、NR5R6、苯基、-COR7 或S02R7取代之苯基; (iv) 若ΑΓι係苯基,其係未以(D)基或(F)基取代但以COR7 基取代,則R2非氫; (v) 若Aq係苯基,其係未以(D)基或(F)基取代但以COR7 基取代且R2非氫,則R7非苯基或Ci-Cu烷基; (vi) 若ΑΓι係萘基,其係未以(D)基或(F)基取代但以COR7 基取代’則R7非苯基或Ci_Cn烧基, 本紙張尺度適用中國國家標準(〇^) A4規格(21〇&gt;&lt;297公釐) 28 (請先閲讀背面之注意事項再填寫本頁)Aq is phenyl, naphthyl or benzamidine, each of which is substituted with at least one of c (〇) r7, (D), (E) or (F) group; Phenyl, which is not substituted with (D) or (F), but substituted with (E), and r2 is hydrogen, then μ4 is not directly formed, S or NR5; (ii) if ΑΓι is naphthyl, it is Not substituted with (D) or (F) but substituted with (E), then M4 is not directly constructed, S, 0 or NR5; (iii) If M4 is 0 and R2 is hydrogen, then Ar! Is not ( E) a phenyl group substituted with ortho or SR4, NR5R6, phenyl, -COR7, or S02R7 in the ortho position; (iv) if ΑΓι is phenyl, it is not (F) group substituted but substituted with COR7 group, then R2 is non-hydrogen; (v) if Aq is phenyl group, which is not substituted with (D) group or (F) group but substituted with COR7 group and R2 is not hydrogen, then R7 is not phenyl or Ci-Cu alkyl; (vi) if AΓι is naphthyl, which is not substituted with (D) or (F) but substituted with COR7, then R7 is not phenyl or Ci_Cn alkyl; This paper size applies the Chinese national standard (〇 ^) A4 specification (21〇 &gt; &lt; 297mm) 28 (Please read the notes on the back first Complete this page)

593357 A7 B7 五 、發明説明(26593357 A7 B7 V. Description of the invention (26

Ar2係 0 〇Ar2 series 0 〇

M4”M4 "

, 其每一者係未被取代或 以鹵素、CrC6烷基、〇R3、sr4或NR5R6取代1至4次; Ar3係苯基或萘基,每一者係以鹵素、C「C6烧基、〇R3、 sr4、NR5R6、苯基或以一或更多之〇R3、SR4或NR5R6取 代之苯基取代1至7次; M4及M4’彼此個別為直接鍵、-〇-、-S-、-NR5,-或-C0-; 或M4及M4’係-YJCi-CiQ伸院基)-Y’- ’其選擇性地以一 (請先閲讀背面之注意事項再填寫本頁) •訂—, Each of which is unsubstituted or substituted 1 to 4 times with halogen, CrC6 alkyl, OR3, sr4, or NR5R6; Ar3 is phenyl or naphthyl, each of which is halogen, C, C6 alkyl, 〇R3, sr4, NR5R6, phenyl or phenyl substituted with one or more 〇R3, SR4 or NR5R6 substituted 1 to 7 times; M4 and M4 'are each a direct bond, -0-, -S-, -NR5,-or -C0-; or M4 and M4 'Department -YJCi-CiQ Extend the base) -Y'-' It is optional to one (Please read the precautions on the back before filling this page) • Order —

或更多之-0-間斷;或Μ4及Μ4’係 基 其選擇性地以鹵素、(VC6烷基、0R3、SR4* NR5R6取代 1至4次; X及X’彼此個別係-0-、-S-或-NR5-; 义3係q-CM烷基、苯曱基、苯基或萘基; R4係C^C^o烷基、苯甲基、苯基或萘基; R5及R6彼此個別係氫、CrC20烷基、苯甲基、Cl-c8烷醯 基、本甲酿基、本基或秦基,或1及R6 一起係C2-C6伸 烷基,其選擇性地以-〇-或-NR3-間斷; R7係氫或C^-C^q烧基;R7係苯基或萘基,其每一者選擇 29 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 593357 A7 B7 五、發明説明(27 性地以一或更多之CVC6烷基、鹵素、〇r3、sr4或NR5R6 取代;Or more -0-discontinued; or M4 and M4 'groups which are optionally substituted 1 to 4 times with halogen, (VC6 alkyl, OR3, SR4 * NR5R6; X and X' are each -0-, -S- or -NR5-; meaning 3 is q-CM alkyl, phenylfluorenyl, phenyl or naphthyl; R4 is C ^ C ^ o alkyl, benzyl, phenyl or naphthyl; R5 and R6 Each of them is hydrogen, CrC20 alkyl, benzyl, Cl-c8 alkyl, methylbenzyl, methyl or qynyl, or 1 and R6 together are C2-C6 alkylene, which are optionally- 〇-or-NR3-discontinued; R7 is hydrogen or C ^ -C ^ q alkyl; R7 is phenyl or naphthyl, each of which is 29 This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) 593357 A7 B7 V. Description of the invention (27 Nature substituted with one or more CVC6 alkyl, halogen, 0r3, sr4 or NR5R6;

Rs及R9彼此個別係氫、烧基、選擇性以一或更多 之C「C6烷基、鹵素、〇R3、SR4或NR5R6取代之苯基;R8 及r9係_素、or3、sr4或nr5r6 ;其中取代基〇r3、sr4 或NRsR6選擇性地經由R3、R4、r5及/或r6基與之苯 基、萘基或苯甲醯基之碳原子之一或取代基r7者形成5- ^10 ^11 ^12 ^13 -C=C—C=C- f (請先閲讀背面之注意事項再填寫本頁) 或6-元環;或R8及R9 —起係—一一基,其中 R10、Rn、R12及R13彼此個別係氫、CrC6烷基、苯基、 鹵素、OR3、SR4 或 NR5R6 〇 ·、?!1 進一步感興趣之化合物係化學式I或III之化合物, 其中 R!係CVC12烷基或苯基; 尺2及r2’係氫或cvc12烷基;Rs and R9 are each hydrogen, alkynyl, or phenyl optionally substituted with one or more C, C6 alkyl, halogen, OR3, SR4, or NR5R6; R8 and r9 are prime, or3, sr4, or nr5r6 ; Wherein the substituents OR3, sr4, or NRsR6 optionally form 5- ^ via one of the carbon atoms of the phenyl, naphthyl, or benzamyl group with the R3, R4, r5, and / or r6 group or the substituent r7 10 ^ 11 ^ 12 ^ 13 -C = C—C = C- f (Please read the precautions on the back before filling out this page) or 6-membered ring; or R8 and R9 — starting line — one base, where R10 , Rn, R12 and R13 are each independently hydrogen, CrC6 alkyl, phenyl, halogen, OR3, SR4 or NR5R6 〇,?! 1 Compounds of further interest are compounds of formula I or III, where R! Is CVC12 alkyl Radical or phenyl radical; 2 and r2 'are hydrogen or cvc12 alkyl;

Aq係苯基、萘基或苯甲醯基,每一者係以〇r3或NR5R6 取代;其中取代基NR5R6選擇性地經由r5或尺6基與苯基 或萘基環上之進一步取代基形成5-或6-元環;或其每一 者係以-(CO)R7、(D)、(E)或(F)基取代; W W W V ;Αγ3 係萘基; m4及M4’彼此個別為直接鍵、-s-或-Y-(CrC1()伸烷基)_ Y’- ; Y及Y’彼此個別係直接鍵或; 30 本紙張尺度適用中國國家標準(CNS) A4規格(21〇x297公爱) 593357 A7 B7 五、發明説明(28 R3係烷基; R4係苯基,其係未被取代或以兴烷基)取代; R5及R6彼此個別係Ci_Ci2烷基或苯基; R7係苯基、聯苯基或萘基,其每一者選擇性地以一或更 多之CVC6烧基、鹵素、〇R3、%或抓乂取代;且 R8及R9係氫。 特別感興趣者係化學式I及ΙΠ之化合物,其中 心係烧基或苯基; R2及R2’係氫、CVC12烷基、苯基或c2_Ci2烷氧基羰基; Aq係苯基、萘基或苯甲醯基,每一者係以〇r3或Nr5r6 取代;其中取代基NR5R6選擇性地經由r5或尺6基與苯基 或萘基環上之進一步取代基形成5_或6_元環;或其每一 者係以-(CO)R7、(D)、(E)或(F)基取代;Aq is a phenyl, naphthyl or benzamidine group, each of which is substituted with 0r3 or NR5R6; wherein the substituent NR5R6 is optionally formed via a r5 or a 6-base group with a further substituent on the phenyl or naphthyl ring 5- or 6-membered ring; or each of them is substituted with-(CO) R7, (D), (E) or (F) group; WWWV; Aγ3 is naphthyl; m4 and M4 'are each directly Bond, -s- or -Y- (CrC1 () alkylene) _ Y'-; Y and Y 'are each a direct bond or; 30 This paper size applies Chinese National Standard (CNS) A4 specification (21〇x297 Public love) 593357 A7 B7 V. Description of the invention (28 R3 series alkyl group; R4 series phenyl group, which is unsubstituted or substituted with Xing alkyl group); R5 and R6 are each Ci_Ci2 alkyl group or phenyl group; R7 series Phenyl, biphenyl, or naphthyl, each of which is optionally substituted with one or more CVC6 alkyl, halogen, OR3,%, or pyrene; and R8 and R9 are hydrogen. Of particular interest are compounds of formulae I and III, the center of which is alkyl or phenyl; R2 and R2 'are hydrogen, CVC12 alkyl, phenyl or c2_Ci2 alkoxycarbonyl; Aq is phenyl, naphthyl or benzene Formamyl groups, each of which is substituted with 0r3 or Nr5r6; wherein the substituent NR5R6 optionally forms a 5- or 6-membered ring via a r5 or a 6-base and a further substituent on a phenyl or naphthyl ring; or Each of them is substituted with-(CO) R7, (D), (E) or (F) group;

Ar2係 y v ν ν ;Αγ3係萘基; Μ4及Μ4’彼此個別為直接鍵、Se^-Y-(crc1()伸烧 基)-Y’-或-Y-(CrC4伸烷基)-〇-伸苯基_〇_(crC4伸烷基)-Y,_ ; Υ及Υ’彼此個別係直接鍵或; R3係cvc12烷基; R4係苯基,其係未被取代或以-(COXCi-Cs烷基)取代; 心及R6彼此個別係烷基;或未被取代或以苯甲醯 基或C1-C12烷基取代之苯基; 本紙張尺度適用中國國家標準(OiS) A4規格(21〇χ297公釐) 31 (請先閱讀背面之注意事項再填寫本頁) 訂— 593357 A7 B7 五、發明説明(29 ) R7係本基、聯苯基或萘基,其每一者選擇性地以一或更 多之CrC6烷基、鹵素、〇r3、sr4或NR5R6取代;且 Rs及&amp;係氫或NR^R6,其中取代基NR5R6選擇性地經由 R5或R6基與ΑΓι之苯基、萘基或苯甲醯基之碳原子之一 形成5-或6-元環。 依據本發明之特別佳之化合物係1-[4-(4-苯甲醯基-苯 基硫烷基)-苯基]-辛-1-酮肟-〇_乙酸酯、1β(6_苯甲醯基-9- 乙基·9·Η·-咔唑-3-基)-辛-1-酮肟乙酸酯、^(4-(444-(4-丁醯基_苯基硫烷基)_苯甲醯基]_苯基硫烷基卜苯基&gt;丁 q-酮肟-0-乙酸酯、1-[4·(4-{4-[4-(1-乙氧基亞胺基-丁基)-苯 基硫院基]-苯甲醯基}-苯基硫烷基&gt;苯基酮肟乙 酸S旨。 化學式I、II及III之較佳化合物之特徵在於至少一 將酯部份及至少一烷基芳基酮、二芳基酮、醯基香豆素或 芳醯基香豆素部份於一分子内不以或以短間隔基結合。 化學式I、II及III之肟酯係以文獻中所述方法製備, 例如,藉由於惰性溶劑(例如,第三丁基甲基醚、四氫呋 喃(THF)或二甲基甲醯胺)内且於鹼(例如,三乙基胺或咄 咬)存在中或於鹼性溶劑(諸如,σ比啶)中使相對應肟與醯 基氣化物或酐反應。 ---------------------费…: (請先閲讀背面之注意事項再填寫本頁) -、\t— CHR1 或 R~〇-R1 鹼 ? 一 Η Ν II Art—C—R2 ?-Ri N II Art—C 一 R2 (I) 32 本紙張尺度適财關家標準(⑽A4規格⑽χ297公爱) 5193357 A7 ___ B7_ 五、發明説明(30 ) 此反應係熟習此項技藝者已知,且一般係於-15至+50 °C(較佳係0至25°C)之溫度完成。 化學式II及III之化合物相似地藉由使用適當肟作為 起始材料而獲得: Η—ΟI ΝII Ar1—C Aq、Ar2、、R2及R2’具有如上所示之意義。 作為起始材料所需之肟可藉由於標準化學教科書(例 如,J. March,進階有機化學(Advanced Organic Chemistry),第 4 版,Wiley Interscience,1992)或特定專 文(例如,S.R. Sandler &amp; W. Karo,有機官能基之製備 (Organic functional group preparations),第 3 冊,Academic Press)中所述各種方法獲得。最方便方法之一係,例如, 於諸如乙醇或乙醇水溶液之極性溶劑内使醛或酮與羥基胺 反應。於此情況中,諸如乙酸鈉或吡啶之鹼被添加以控制 反應混合物之pH®已知反應速率係依pH而定,且驗係 於開始時或反應期間連續添加。鹼性溶劑(諸如,咣啶)亦 可作為鹼及/或溶劑或共溶劑。反應溫度一般係混合物之 迴流溫度,一般係約60-120°C。另一便利之肟合成方式 係”活性”伸甲基與亞硝酸或烷基亞硝酸鹽之亞硝化作用。 驗性條件(例如,於 Organic Syntheses coll·第 VI 冊(J. Wiley &amp; Sons, New York,1988),第199及840頁所述)及酸性條 -M12 或 Η—(j) (j) 一 Ηίί II •C一Ar厂 C一R2’ (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 33 593357 A7 __B7_ 五、發明説明(31 ) 件(例如,於 Organic Synthesis coll·第 V 冊,第 32 及 373 頁,coll.III 冊,第 191 及 513 頁,coll.第 II 冊,第 202、 204及363頁所述)係適於製備作為本發明起始材料之砖。 亞硝酸一般係自亞硝酸鈉產生。烷基亞硝酸鹽可為甲基亞 硝酸鹽、乙基亞硝酸鹽、異丙基亞硝酸鹽、丁基亞硝酸鹽 或異戊基亞硝酸鹽。 每一肟酯基可以二結構((Z)或(E))存在。其可藉由傳 統方法分離此等異構物,但亦可使用異構物混合物作為光 引發物種。因此,本發明亦有關於化學式I、II及III之 化合物之結構異構物之混合物。 依據本發明,化學式I、II及III之化合物可作為乙 稀不飽和化合物或包含此等化合物之混合物之光聚合反應 之光引發劑。 因此’本發明之另一標的係可光聚合之組成物,包含: (a) 至少一乙烯不飽和之光可聚合化合物;及 (b) 作為光引發劑之至少一如上定義之化學式I、η及 /或III之化合物。 此組成物除光引發劑(b)外可另包含至少一進一步之 光引發劑(c)及/或其它添加劑(句。 不飽和化合物(a)可包含一或更多之烯烴雙鍵。其可 為低(單體)或高(寡聚物)分子質量。含有雙鍵之單體之例 子係烷基、羥基烷基或胺基之丙烯酸酯,或烷基、羥基烧 基或胺基之甲基丙稀酸,例如,甲基、乙基、丁基、2-乙 基己基或2-羥基乙基之丙烯酸酯、丙烯酸異冰片酯、甲 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) '34 _ (請先閲讀背面之注意事項再填寫本頁)Ar2 is yv ν ν; Aγ3 is naphthyl; M4 and M4 'are each a direct bond, and Se ^ -Y- (crc1 () arsenyl) -Y'- or -Y- (CrC4alkylene)-. -Phenylene_〇_ (crC4alkylene) -Y, _; Υ and Υ 'are each a direct bond or; R3 is cvc12 alkyl; R4 is phenyl, which is unsubstituted or with-(COXCi -Cs alkyl) substitution; Heart and R6 are each an alkyl group; or phenyl group which is unsubstituted or substituted with benzamyl or C1-C12 alkyl; This paper size applies Chinese National Standard (OiS) A4 specifications ( 21〇χ297mm) 31 (Please read the notes on the back before filling out this page) Order — 593357 A7 B7 V. Description of the invention (29) R7 is base, biphenyl or naphthyl, each of which is selective Is substituted with one or more CrC6 alkyl, halogen, 0r3, sr4 or NR5R6; and Rs and &amp; are hydrogen or NR ^ R6, wherein the substituent NR5R6 is optionally via the R5 or R6 group and the phenyl group of A One of the carbon atoms of the naphthyl or benzamidine group forms a 5- or 6-membered ring. Particularly preferred compounds according to the present invention are 1- [4- (4-benzylidene-phenylsulfanyl) -phenyl] -oct-1-oneoxime-〇_acetate, 1β (6-benzene Formamidine-9-ethyl · 9 · Η · -carbazol-3-yl) -oct-1-oneoxime acetate, ^ (4- (444- (4-butamyl_phenylsulfanyl)) _Benzylsulfanyl] _phenylsulfanylphenyl, &gt; butanyl q-ketooxime-0-acetate, 1- [4 · (4- {4- [4- (1-ethoxyl Amine-butyl) -phenylsulfanyl] -benzylidene} -phenylsulfanyl> Phenylketoxime acetate S. Preferred compounds of formulae I, II and III are characterized by at least one The ester portion and at least one alkylaryl ketone, diaryl ketone, fluorenyl coumarin or aryl coumarin portion are not combined in one molecule with a short spacer. Chemical formulas I, II and The oxime esters of III are prepared by methods described in the literature, for example, by inert solvents (e.g., tertiary butyl methyl ether, tetrahydrofuran (THF), or dimethylformamide) and by bases (e.g., triethyl) Amine or sting) to react the corresponding oxime with a fluorenyl gas or anhydride in a basic solvent such as σ-pyridine. ----------------- ----fee : (Please read the precautions on the back before filling this page)-, \ t— CHR1 or R ~ 〇-R1 base? Η Ⅱ II Art—C—R2? -Ri N II Art—C—R2 (I) 32 This paper is suitable for financial standards (⑽A4 size⑽χ297 public love) 5193357 A7 ___ B7_ V. Description of the invention (30) This reaction is known to those skilled in the art, and is generally between -15 and +50 ° C ( It is preferably performed at a temperature of 0 to 25 ° C. The compounds of Chemical Formulae II and III are similarly obtained by using an appropriate oxime as a starting material: Η—ΟI ΝII Ar1-C Aq, Ar2, R2 and R2 ′ have The meaning is shown above. The oxime required as a starting material can be obtained by standard chemistry textbooks (for example, J. March, Advanced Organic Chemistry, 4th Edition, Wiley Interscience, 1992) or specific monographs ( For example, SR Sandler &amp; W. Karo, Organic functional group preparations, Volume 3, Academic Press). One of the most convenient methods is, for example, in ethanol or ethanol Aldehyde or ketone and hydroxyl Amine. In this case, a base such as sodium acetate or pyridine is added to control the reaction mixture was pH® known reaction rate of the system by pH dependent, and based on experience at the start or continuously during the reaction. Basic solvents (such as pyridine) can also be used as bases and / or solvents or co-solvents. The reaction temperature is generally the reflux temperature of the mixture, and is generally about 60-120 ° C. Another convenient way to synthesize oxime is the "active" nitrosation of methylene with nitrite or alkyl nitrite. Test conditions (eg, as described in Organic Syntheses coll. Book VI (J. Wiley &amp; Sons, New York, 1988), pages 199 and 840) and acid strips -M12 or Η— (j) (j)一 Ηίί II • C-Ar Factory C-R2 '(Please read the notes on the back before filling this page) This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm) 33 593357 A7 __B7_ V. Description of the invention (31) (eg, as described in Organic Synthesis coll. Book V, pages 32 and 373, coll. III book, pages 191 and 513, coll. Book II, pages 202, 204 and 363) Suitable for making bricks as starting materials for the present invention. Nitrite is generally produced from sodium nitrite. The alkyl nitrite may be methyl nitrite, ethyl nitrite, isopropyl nitrite, butyl nitrite or isoamyl nitrite. Each oxime ester group may exist in a two structure ((Z) or (E)). It is possible to separate these isomers by conventional methods, but it is also possible to use mixtures of isomers as photo-initiated species. Accordingly, the present invention also relates to mixtures of structural isomers of compounds of formulae I, II and III. According to the present invention, the compounds of the formulae I, II and III can be used as photoinitiators for photopolymerization of ethylenically unsaturated compounds or mixtures containing these compounds. Therefore 'another subject of the present invention is a photopolymerizable composition comprising: (a) at least one ethylenically unsaturated photopolymerizable compound; and (b) at least one of the chemical formulae I, η as defined above as a photoinitiator And / or III compounds. This composition may contain at least one further photoinitiator (c) and / or other additives in addition to the photoinitiator (b). The unsaturated compound (a) may contain one or more olefinic double bonds. It It can be low (monomer) or high (oligomer) molecular weight. Examples of monomers containing double bonds are alkyl, hydroxyalkyl or amine acrylates, or alkyl, hydroxyalkyl or amine groups Methyl acrylic acid, for example, methyl, ethyl, butyl, 2-ethylhexyl, or 2-hydroxyethyl acrylate, isobornyl acrylate, or methyl formaldehyde. Applicable to China National Standard (CNS) A4. (210X297mm) '34 _ (Please read the notes on the back before filling this page)

593357 A7 _____B7 _,_ 五、發明説明(32 ) (請先閲讀背面之注意事項再填寫本頁) 基丙稀酸甲酯或甲基丙稀酸乙酯。石夕_丙烯酸酯亦有利。 其它例子係丙嫦睛、丙烯醯胺、甲基丙嫦,醯胺、N-取代 之(曱基)丙烯醯胺、乙烯基酯(諸如,乙酸乙稀酯)、乙稀 基醚(諸如,異丁基乙烯基醚)、苯乙烯、烷基-及鹵基之 苯乙烯、N-乙烯基吡咯烷酮、氯乙烯或-二氣乙烯。 含有二或更多雙鍵之單體之例子係乙二醇、丙二醇、 新戊二醇、六伸甲基二醇或雙酚A及4,4,-雙(2-丙烯-醯 基氧乙氧基)二苯基丙烧之二丙稀酸酯、三曱基醇丙烧三 丙烯酸酯、季戊四醇之三丙烯酸酯或四丙烯酸酯、丙烯酸 乙稀醋、一乙婦基苯、二乙婦基坡轴酸g旨、二婦丙基醜酸 酯、三烯丙基磷酸酯、三烯丙基莫氰脲酸酯或三(2•丙烯 醯基乙基)異氰脲酸酯。: 相對較高分子質量(募聚物)之多不飽和化合物之例子 係丙稀化環氧樹脂、含有丙晞酸酯-、乙稀基__或環氧_ 基之聚酯,及聚胺基甲酸酯及聚醚。不飽和募聚物之進一 步例子係不飽和聚酯樹脂,其一般係自馬來酸、醜酸及一 或更多之二醇製得,且具有約500至3000之分子量。此 外,亦可使用乙烯基醚單體及寡聚物,及具有聚醋、聚胺 基甲酸酯、聚醚、聚乙烯基醚及環氧主鏈之馬來酸醋終結 之寡聚物。特別適合係如WO 90/01512所述之帶有乙稀 基醚基之募聚物及聚合物之混合物。但是,乙烯基喊及馬 來酸官能化單體之共聚物亦適合。此類之不飽和募聚物亦 可稱為預聚物。 特別適合之例子係乙婦不飽和魏酸及多元醇或聚環氧 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) &quot;~^ 35I 一 593357 A7 _B7_ 五、發明説明(33 ) 化物之酯,及於鏈内或側基内具有乙烯不飽和基之聚合 物,例如,不飽和聚酯、聚醯胺及聚胺基曱酸酯及其共聚 物,於側鏈内含有(甲基)丙烯基之聚合物及共聚物,及一 或更多之此等聚合物之混合物。 不飽和羧酸之例子係丙烯酸、曱基丙烯酸、丁烯酸、 衣康酸、肉桂酸及不飽和脂肪酸,諸如,亞麻酸或油酸。 丙烯酸及甲基丙烯酸係較佳。 適當聚合物係芳香族及特別係脂族及環脂族之多元 醇。芳香族多元醇之例子係氫醌、4,4’-二羥基聯苯、2,2-二(4-經基糧)丙烧及齡酸清漆及紛酿樹脂a。聚環氧化物 之例子係以上述多元醇為主者,特別是芳香族多元醇及表 氣醇。其它適當多元醇係於聚合物鏈内或側基内含有經基 之聚合物及共聚物,特別是聚乙烯基醇及其共聚物或聚羥 基烷基甲基丙烯酸酯或其共聚物。適合之進一步多元醇係 具有經基端基之寡聚酯。 脂族及環脂族之多元醇之例子係較佳具有2至12個 碳原子之伸烷基二醇,諸如,乙二醇、丨,2_或丨,3_丙二醇、 1,2-、1,3-或1,4-丁二醇、戊二醇、己二醇、辛二醇、十 二烷二醇、二乙二醇、三乙醇、具有較佳為2〇〇至15〇〇 分子量之聚乙二醇、U-環戊二醇、…u或環己 二醇、1,4-二經基甲基環己烧、甘油、三(卜經基乙基)胺、 三甲基醇乙院、三甲基醇丙烧、季戊四醇、二季戊四醇及 山梨糖醇。 多元醇可以-叛酸或以不同之不飽和叛酸部份或完全 Ϊ紙張尺度^?^標準_ A4規格(職 ~--Γ-36 - (請先閲讀背面之注意事項再填寫本頁)593357 A7 _____B7 _, _ V. Description of the invention (32) (Please read the notes on the back before filling out this page) Methyl methyl acrylate or ethyl methacrylate. Shi Xi_acrylate is also advantageous. Other examples are propionate, acrylamide, methacrylamide, ammonium, N-substituted (fluorenyl) acrylamide, vinyl esters (such as ethyl acetate), ethylene ethers (such as Isobutyl vinyl ether), styrene, alkyl- and halo-based styrene, N-vinylpyrrolidone, vinyl chloride or digas ethylene. Examples of monomers containing two or more double bonds are ethylene glycol, propylene glycol, neopentyl glycol, hexamethylene glycol or bisphenol A and 4,4, -bis (2-propylene-fluorenyloxyethyl) (Oxy) diphenyl propane dipropionate, trisyl alcohol propionate triacrylate, pentaerythritol triacrylate or tetraacrylate, ethyl acrylate, monoethynylbenzene, diethynyl Polanic acid, glyme, diallyl phosphate, triallyl phosphate, triallyl mocyanurate or tris (2 • propenylethyl) isocyanurate. : Examples of relatively high molecular weight (aggregate) polyunsaturated compounds are acrylic epoxy resins, polyesters containing propionate-, ethylene- or epoxy-groups, and polyamines Carbamates and polyethers. Further examples of unsaturated polymerizers are unsaturated polyester resins, which are generally made from maleic acid, ugly acid, and one or more glycols, and have a molecular weight of about 500 to 3,000. In addition, vinyl ether monomers and oligomers, and maleic acid-terminated oligomers having polyacetate, polyurethane, polyether, polyvinyl ether, and epoxy backbones can also be used. It is particularly suitable as a polymer and a mixture of polymers with an ethylene ether group as described in WO 90/01512. However, copolymers of vinyl- and maleic-functional monomers are also suitable. Such unsaturated polymers can also be referred to as prepolymers. A particularly suitable example is Ethyl-Unsaturated Weak Acid and Polyols or Polyepoxy. This paper applies Chinese National Standard (CNS) A4 (210X297 mm). &Quot; ~ ^ 35I -593357 A7 _B7_ V. Description of the Invention ), And polymers with ethylene unsaturated groups in the chain or in the side groups, such as unsaturated polyesters, polyamines, and polyamines and their copolymers, containing ( (Meth) propylene-based polymers and copolymers, and mixtures of one or more of these polymers. Examples of unsaturated carboxylic acids are acrylic acid, methacrylic acid, butenoic acid, itaconic acid, cinnamic acid, and unsaturated fatty acids such as linolenic acid or oleic acid. Acrylic and methacrylic are preferred. Suitable polymers are aromatic and particularly aliphatic and cycloaliphatic polyols. Examples of the aromatic polyols are hydroquinone, 4,4'-dihydroxybiphenyl, 2,2-bis (4-based grain) propane, aging acid varnish and brewing resin a. Examples of polyepoxides are the above-mentioned polyols, especially aromatic polyols and epihydric alcohols. Other suitable polyols are polymers and copolymers containing a warp group in the polymer chain or in the side groups, especially polyvinyl alcohol and its copolymers or polyhydroxyalkyl methacrylate or its copolymers. A suitable further polyol is an oligoester having a base end group. Examples of aliphatic and cycloaliphatic polyols are preferably alkylene glycols having 2 to 12 carbon atoms, such as ethylene glycol, 丨, 2_ or 丨, 3_ propylene glycol, 1, 2-, 1,3- or 1,4-butanediol, pentanediol, hexanediol, octanediol, dodecanediol, diethylene glycol, triethanol, preferably from 200 to 150,000. Molecular weight of polyethylene glycol, U-cyclopentanediol, ... u or cyclohexanediol, 1,4-dimerylmethylcyclohexane, glycerol, tris (butylethyl) amine, trimethyl alcohol ethyl Hospital, trimethyl alcohol propane, pentaerythritol, dipentaerythritol and sorbitol. Polyols can be-acid or partially or completely with different unsaturated acid

.、訂丨 1·, 593357 A7 _____B7_ 五、發明説明(34 ) 醋化,且於部份酯中,自由羥基可被改質,例如,以其它 叛酸鍵化或§旨化。 酯之例子係: 二曱基醇丙烧三丙烯酸酯、三甲基醇乙烧三丙烯酸 醋、三甲基醇丙烷三甲基丙烯酸酯、三甲基醇乙烧三甲基 丙烯酸酯、四伸甲基二醇二曱基丙烯酸酯、三伸乙基二醇 二甲基丙烯酸酯、四伸乙基二醇二丙烯酸酯、季戊四醇二 丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、 二季戊四醇二丙烯酸酯、二季戊四醇三丙烯酸酯、二季戊 四醇四丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇六 丙稀酸酯、三季戊四醇八丙稀酸酯、季戊四醇二甲基丙烯 酸酯、季戊四醇三甲基丙烯酸酯、二季戊四醇二甲基丙烯 酸酯、二季戊四醇四甲基丙烯酸酯、三季戊四醇八甲基丙 烯酸酯、季戊四醇二衣康酸酯、二季戊四醇三衣康酸酯、 二季戊四醇五衣康酸酯、二季戊四醇六衣康酸酯、乙二醇 二丙烯酸酯、1,3-丁二醇二丙烯酸酯、13 —丁二醇二甲基 丙稀Isl S曰、1,4- 丁二醇二衣康酸酯、山梨糖醇三丙稀酸酯、 山梨糖醇四丙烯酸酯、季戊四醇改質之三丙烯酸酯、山梨 糖醇四甲基丙烯酸酯、山梨糖醇五丙烯酸酯、山梨糖醇六 丙烯酸酯、寡聚物丙烯酸酯及曱基丙烯酸酯、甘油二丙烯 酸酯及三丙烯酸酯、1,4-環己烷二丙烯酸酯、具2〇〇至15〇〇 刀子1之聚乙一醇之雙丙稀酸酯及雙甲基丙稀酸酯,或其 混合物。 亦適於作為組份(a)者係相同或相異之不飽和羧酸與 本紙張尺度適用中國國家標準(CNS) A4規格(21〇&gt;&lt;297公楚) 37 (請先閲讀背面之注意事項再填寫本頁) •、可| ,0m, A7 五、發明説明(35 ) 較佳具2至6(特別是2至4)個胺基之芳香族、環脂族及 脂族聚胺之醯胺。此等聚胺之例子係乙二胺、丨,孓或 丙一胺、1,2_、1,3-或I; 丁二胺、μ-戊二胺、己二 胺、辛二胺、十二烷二胺、1,4-二胺基環己烷、異佛爾酮 一胺、伸苯基二胺、二伸苯基二胺、二胺基乙基醚、 一伸乙基三胺、三伸乙基四胺、二(/5-胺基乙氧基)-或二(冷 -胺基丙氧基)乙烧。其它適當之聚胺係較佳於側鏈具額外 胺基之聚合物及共聚物,及具胺端基之寡聚醯胺。此等不 飽和醯胺之例子係伸曱基雙丙烯醯胺、1,6-六伸甲基雙丙 烯醯胺、二伸乙基三胺三甲基丙烯醯胺、雙(甲基丙烯醯 胺基丙氧基)乙烷、y3-甲基丙烯醯胺基乙基甲基丙烯酸酯 及Ν[(β -羥基-乙氧基)乙基]丙烯醯胺。 適當不飽和聚酯及聚醯胺係自,例如,馬來酸及自二 元醇或二胺衍生。某些馬來酸可以其它二羧酸取代。其可 與乙烯不飽和共單體(例如,苯乙烯)一起使用。聚酯及聚 醯胺亦可自二羧酸及自乙烯不飽和二元醇或二胺(特別是 自具相對較長鏈者,例如,6至20個碳原子)衍生。聚胺 基曱酸醋之例子係由飽和或不飽和二異氰酸酯及不飽和 或’個別地,飽和之二元醇所組成。 於側鏈位置具有(甲基)丙烯酸酯基之聚合物同樣地係 已知。其可為,例如,以酚醛清漆為主之環氧樹脂與(甲 基)丙烯酸之反應產物,或可為乙烯基醇或其羥基烷基衍 生物(其可以(曱基)内烯酸酯化)之同聚物或共聚物,或可 為(曱基)丙烯酸酯(其可以羥基烷基(甲基)丙烯酸酯酯化) 38 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐) 593357 A7 B7 五、發明説明(36 ) 之同聚物及共聚物。 於側鏈具丙烯酸酯或甲基丙烯酸酯基之其它適合聚合 物係,例如,溶劑可溶或驗可溶之聚醯亞胺先質,例如, 聚(醯胺酸酯)化合物,其具有附接至分子内之主幹或酯基 之可光聚合之側基。此等寡聚物或聚合物可以新穎之光引 發劑及選擇性之反應性稀釋劑(如多官能性(甲基)丙稀酸 酯)組成,以製備高度敏感性之聚醯亞胺先質阻劑。 光可聚合化合物可單獨或以任何所欲混合物使用。較 佳係使用多元醇(甲基)丙烯酸酯之混合物。 組份(a)之例子亦係於分子結構内具有至少二乙烯基 不飽和基及至少一羧基官能基之聚合物或寡聚物,諸如, 藉由飽和或不飽和多鹼性酸酐與環氧化合物及不飽和單羧 酸反應之產物反應而獲得,例如,JP 6-1638及JP 10301276 所述之光敏性化合物及諸如EB9696,UCB Chemicals; KAYARAD TCR1025m Nippon Kayaku Co·,LTD 之可購得 產物,或含羧基樹脂與具α,/5-不飽和雙鍵及環氧基之不 飽和化合物間形成之加成產物(例如,ACA200M,Daicel Industries,Ltd·) 0 作為稀釋劑,單-或多-官能性之乙烯不飽和化合物或 數種此化合物之混合物可被包含於上述組成物,最高達70 重量%(其係以組成物之固體部份為基準計)。 不飽和化合物(a)亦可以與不可光聚合之形成膜之組 份所成之混合物使用。此等可為,例如,物理性乾燥聚合 物或其於有機溶劑内之溶液,例如,硝基纖維素或纖維素 39 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593357 A7 B7 五、發明説明(37 ) (請先閱讀背面之注意事項再填寫本頁) 乙醯丁酸酯。但,其亦可為化學及/或熱可固化樹脂,例 如,聚異氰酸酯、聚環氧化物及蜜胺樹脂,及聚醯亞胺先 質。熱可固化樹脂之同時使用對於用於稱為混雜系統之系 統係重要,於第一階段係光聚合反應,且於第二階段係藉 由熱後處理交聯。 •、^τ— 本發明亦提供包含作為組份(a)之至少一乙烯不飽和 可光聚合化合物(其係於水中乳化或溶解)之組成物。此等 輻射可固化之水性預聚物分散液之許多變化物可購得。預 聚物分散液被暸解係水及分散於其内之至少一預聚物之分 散液。此系統中之水濃度係,例如,5至80重量%,特 別是30至60重量%。輻射可固化之預聚物或預聚物混合 物之濃度係,例如,95至20重量%,特別是7〇至4〇重 量%。於此等組成物,對水及預聚物所示之百分率總和於 每一情況係100 ’且輔劑及添加劑可以依所欲用途而定之 變化量添加。分散於水中且一般亦被溶解之輻射可固化之 形成膜之預聚物係單-或多官能性乙烯不飽和預聚物之水 性預聚物分散液,其本身係已知,可藉由自由基引發及具 有,例如,每100克預聚物係0·01至10莫耳之可聚合 雙鍵之含量及,例如,至少400(特別是5〇〇至1〇,〇〇〇)之 平均分子量。但是,具更高分子量之預聚物依所欲應用而 定亦可被考量。使用,例如,含有可聚合c_c雙鍵及具 有不多於10之酸數之聚酯,含有可聚合c-c雙鍵之聚驗, 每分子含有至少二環氧化物基之聚環氧化物與至少一 α, 占-乙烯不飽和竣酸之含經基反應產物,聚胺基曱酸醋(甲 發明説明(38 ) 基)丙烯酸酯及含有α,/5 -乙稀不飽和丙稀基之丙稀共聚 物,如ΕΡ 12339中所述。此等預聚物之混合物可同樣地 被使用。亦適合者係ΕΡ 33896所述之可聚合預聚物,其 係具有至少600之平均分子量、〇·2至15%之羧基含量及 每1〇〇克預聚物係0.01至0.8莫耳之可聚合c-c雙鍵含 1之可1合預聚物之硫代_加成物。其它適合之水性分散 液(其係以特殊烷基(甲基)丙烯酸酯聚合物為主)係描述於 EP 41125,且適當之水可分散之可輻射固化之胺基甲酸酯 丙烯酸酯預聚物可於DE 2936039中發現。可被包含於此 等可輻射固化之水性預聚物分散液之進一步添加劑係分散 液輔劑、乳化劑、抗氧化劑(例如,2,孓硫代雙(4_甲基_6_ 第三丁基酚)或2,6-二第三丁基酚)、光安定劑、染料、色 料、填料,諸如,玻璃或氧化鋁,例如,滑石、石膏、矽 酸、金紅石、碳黑、氧化鋅、氧化鐵、反應加速劑、均化 劑、濕化劑、增稠劑、平化劑、抗發泡劑及其它於塗料技 術中慣用之輔劑。冑當之分散液輔劑係具高分子質量且含 有極性基之水可溶解之有機化合物,例子係聚乙烯基醇、 聚乙烯基料細或纖維⑽。可被使用之乳化劑係非離 子性乳化劑,且若要的話,亦可為離子性乳化劑。 於某些情況中,有利地係使用二或更多之新顆光引發 劑之混合物。當然亦可使用與已知光引發劑⑷所成之混 ^物,例如與下述者之混合物:樟腦醒、苯醯苯、苯酿苯 竹生物。乙醯苯、乙醯苯衍生物,例如,I羥基環烷基 苯基嗣或2·經基-2-甲基.苯基-丙綱、二烧氧基乙酿苯、 593357 A7 ________B7_ 五、發明説明(39 ) α -羥基-或α -胺基乙醯苯,例如,(4·曱基硫代苯甲醯基)-1-曱基-1-嗎啉基乙烷)、4-嗎啉基苯甲醯基)-i-苯甲基-1-二 甲基胺基丙烷、4-芳醯基-1,二噁茂烷、安息香烷基醚及 苯偶醯縮酮,例如,二甲基苯偶醯縮酮、苯基乙醛酸酯及 其衍生物、二聚物苯基乙醛酸酯、二乙醯基過酯,例如, EP 126541所述之苯醯苯四羧酸過酯,單醯基膦氧化物, 例如,(2,4,6·三甲基苯甲醯基)二苯基膦氧化物、雙醯基 膦氧化物、雙(2,6-二曱氧基·苯甲醯基)-(2,4,4-三甲基-苯 基)-膦氧化物、雙(2,4,6-三甲基苯甲醯基)·苯基膦氧化物、 雙(2,4,6-三甲基苯甲醯基)-2,4-二五氧苯基膦氧化物、三 醯基膦氧化物、鹵基甲基三嗪,例如,2-[2-(4-曱氧基-苯 基)-乙烯基]-4,6-雙-三氣甲基-[1,3,5]三嗪、2-(4-甲氧基· 苯基)-4,6-雙-三氣甲基-[1,3,5]三嗪、2-(3,4-二甲氧基-苯 基)-4,6-雙-三氣曱基-[1,3,5]三嗪、2-甲基-4,6-雙-三氯甲 基-[1,3,5]三嗔、2-(4-N,N-二(乙氧基羰基曱基)胺基苯基)-4,6-雙(三氣甲基)-[1,3,5]三嗪、2-(4-曱氧基·萘基)-4,6-雙-三氯甲基-[1,3,5]三嗪、2-(1,3-苯并二噁茂烷_5_基)-4,6-雙-三氯甲基-[1,3,5]三嗪、2-[2-[4-(苯基氧)苯基]乙烯基]-4,6· 雙-三氣甲基·Π,3,5]三嗪、2-[2-(3-甲基-2-呋喃基)-乙烯 基]-4,6_雙-三氣甲基-[1,3,5]三嗪、2-[2-(5-曱基-2-呋喃基)-乙烯基]-4,6-雙-三氯甲基-[1,3,5]三嗪、2-[2-(2,4-二甲氧基 -苯基)-乙烯基]-4,6-雙-三氯甲基-[1,3,5]三嗪、2-[2-(2-甲 氧基-苯基)乙烯基]-4,6-雙-三氯曱基-[1,3,5]三嗪、2-[2-[4-異丙氧基-苯基]-乙烯基]-4,6-雙-三氣甲基-[1,3,5]三嗪、2- 42 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐) 593357 A7 ____B7_ 五、發明説明(40 ) [2-(3-氯-4-甲氧基-苯基)乙烯基]-4,6-雙-三氣甲烷-[1,3,5] 三嗪、2-[2·漠-4-N,N-:(乙氧基羰基甲基)胺基-苯基]-4,6-雙-三氯甲基-[1,3,5]三嗪、2-[2-氣-4-N,N-二(乙氧基-羰基 甲基)胺基-苯基-4,6-雙-三氯甲基_[1,3,5]三嗪、2-[3-溴-4,-N,N-«—(乙氧基 &gt;厌基甲基)胺基-苯基]-4,6-雙-三氣甲基_ [1,3,5]三唤、2-[3-氣-4-N,N-二(乙氧基羰基曱基)胺基-苯 基]-4,6-雙-二乳甲基-[1,3,5]三嘻或例如G. Buhr,R.., Order 丨 1 ·, 593357 A7 _____B7_ V. Description of the invention (34) The acetic acid is esterified, and in some esters, free hydroxyl groups can be modified, for example, by other acid bonding or § intent. Examples of esters are: dimethyl alcohol propane triacrylate, trimethyl alcohol propane triacrylate, trimethyl alcohol propane trimethacrylate, trimethyl alcohol propane trimethacrylate, tetrasex Methyl glycol difluorenyl acrylate, triethylene glycol dimethacrylate, tetraethylene glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol diacrylate Acrylate, dipentaerythritol triacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, tripentaerythritol octapropionate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate , Dipentaerythritol dimethacrylate, dipentaerythritol tetramethacrylate, tripentaerythritol octamethacrylate, pentaerythritol diitaconate, dipentaerythritol triitaconate, dipentaerythritol pentaconate, dipentaerythritol Liuitaconate, ethylene glycol diacrylate, 1,3-butanediol diacrylate, 13-butanediol dimethylpropane Isl S, 1,4-butanediol diitaconate, sorbitol triacrylate, sorbitol tetraacrylate, pentaerythritol modified triacrylate, sorbitol tetramethacrylate, Sorbitol pentaacrylate, sorbitol hexaacrylate, oligomeric acrylates and fluorenyl acrylates, glyceryl diacrylates and triacrylates, 1,4-cyclohexane diacrylate, with 200 to 1 500 bis-acrylic acid and bis-methyl acrylic acid of knife 1 or a mixture thereof. Also suitable as component (a) is the same or different unsaturated carboxylic acid and this paper size applies Chinese National Standard (CNS) A4 specification (21〇 &gt; &lt; 297gongchu) 37 (Please read the back first (Please note this page and fill in this page again) • 、 可 |, 0m, A7 V. Description of the invention (35) Aromatic, cycloaliphatic and aliphatic polymers with 2 to 6 (especially 2 to 4) amino groups are preferred Amines of amines. Examples of these polyamines are ethylenediamine, stilbene, or propanediamine, 1,2_, 1,3-, or I; succindiamine, μ-pentanediamine, hexamethylenediamine, octanediamine, twelve Alkanediamine, 1,4-diaminocyclohexane, isophorone monoamine, phenylenediamine, bisphenylenediamine, diaminoethyl ether, dimethyltriamine, triphenylene Ethyltetramine, bis (/ 5-aminoethoxy)-or bis (cold-aminopropoxy) ethene. Other suitable polyamines are preferred to polymers and copolymers having additional amine groups in the side chain, and oligomeric amines having amine end groups. Examples of such unsaturated fluorenamines are fluorenyl bispropenamide, 1,6-hexamethylene bispropenamide, diethylene triamine trimethacrylamide, bis (methacrylamide) Propylpropoxy) ethane, y3-methacrylaminoethyl methacrylate, and N [(β-hydroxy-ethoxy) ethyl] acrylamido. Suitable unsaturated polyesters and polyamides are derived from, for example, maleic acid and derived from glycols or diamines. Some maleic acids can be substituted with other dicarboxylic acids. It can be used with ethylene unsaturated comonomers such as styrene. Polyesters and polyamides can also be derived from dicarboxylic acids and from ethylene unsaturated diols or diamines (especially those with relatively long chains, for example, 6 to 20 carbon atoms). Examples of the polyaminoacetic acid esters are composed of a saturated or unsaturated diisocyanate and an unsaturated or 'individually, saturated glycol. Polymers having (meth) acrylate groups at the side chain positions are also known. It may be, for example, the reaction product of a novolac-based epoxy resin with (meth) acrylic acid, or it may be a vinyl alcohol or its hydroxyalkyl derivative (which may be (enyl) endenoic acidified ) Homopolymer or copolymer, or may be (fluorenyl) acrylate (which can be esterified with hydroxyalkyl (meth) acrylate) 38 (Please read the precautions on the back before filling this page) This paper size Applicable to China National Standard (CNS) A4 specification (210X297 mm) 593357 A7 B7 5. Homopolymer and copolymer of invention description (36). Other suitable polymer systems with acrylate or methacrylate groups in the side chain, for example, solvent-soluble or test-soluble polyimide precursors, for example, poly (fluorenate) compounds, which have Photopolymerizable side groups attached to the backbone or ester group in the molecule. These oligomers or polymers can be composed of novel photoinitiators and selective reactive diluents (such as polyfunctional (meth) acrylic acid esters) to prepare highly sensitive polyimide precursors Retardant. The photopolymerizable compound can be used alone or in any desired mixture. More preferably, a mixture of polyol (meth) acrylates is used. Examples of component (a) are also polymers or oligomers having at least divinyl unsaturated groups and at least one carboxyl functional group in the molecular structure, such as by using saturated or unsaturated polybasic anhydride and epoxy Compounds are obtained by reacting with the reaction products of unsaturated monocarboxylic acids, for example, photosensitive compounds described in JP 6-1638 and JP 10301276 and commercially available products such as EB9696, UCB Chemicals; KAYARAD TCR1025m Nippon Kayaku Co., LTD, Or an addition product formed between a carboxyl-containing resin and an unsaturated compound having an α, / 5-unsaturated double bond and an epoxy group (for example, ACA200M, Daicel Industries, Ltd.) 0 as a diluent, mono- or poly- A functional ethylenically unsaturated compound or a mixture of several of these compounds can be included in the above composition up to 70% by weight (based on the solid portion of the composition). The unsaturated compound (a) can also be used as a mixture with a non-photopolymerizable film-forming component. These can be, for example, physically dry polymers or their solutions in organic solvents, such as nitrocellulose or cellulose 39 (please read the precautions on the back before filling this page) This paper size applies to China Standard (CNS) A4 specification (210X297 mm) 593357 A7 B7 V. Description of the invention (37) (Please read the precautions on the back before filling this page) Acetyl butyrate. However, it may also be a chemical and / or thermally curable resin, such as polyisocyanate, polyepoxide, and melamine resins, and polyimide precursors. The simultaneous use of thermally curable resins is important for systems called hybrid systems, which are photopolymerized in the first stage and crosslinked by thermal post-treatment in the second stage. •, ^ τ— The present invention also provides a composition comprising at least one ethylenically unsaturated photopolymerizable compound as component (a), which is emulsified or dissolved in water. Many variations of these radiation-curable aqueous prepolymer dispersions are commercially available. The prepolymer dispersion is understood to be water and a dispersion of at least one prepolymer dispersed therein. The water concentration in this system is, for example, 5 to 80% by weight, particularly 30 to 60% by weight. The concentration of the radiation-curable prepolymer or prepolymer mixture is, for example, 95 to 20% by weight, particularly 70 to 40% by weight. In these compositions, the sum of the percentages shown for water and prepolymer is 100 'in each case, and adjuvants and additives can be added in varying amounts depending on the intended use. The radiation-curable, film-forming prepolymer dispersed in water and generally also dissolved is an aqueous prepolymer dispersion of a mono- or polyfunctional ethylene unsaturated prepolymer, which is known per se and can be obtained by free Radical initiation and having, for example, a content of polymerizable double bonds of 0.01 to 10 mol per 100 grams of the prepolymer system and, for example, an average of at least 400 (particularly 500 to 10,000) Molecular weight. However, higher molecular weight prepolymers can also be considered depending on the intended application. Use, for example, a polymer containing a polymerizable c_c double bond and an acid number of not more than 10, a polymer containing a polymerizable cc double bond, a polyepoxide containing at least two epoxide groups per molecule and at least one α, the radical-containing reaction product of chloro-ethylene unsaturated carboxylic acid, polyaminoacetic acid (former description (38)) acrylic acid ester and acrylic acid containing α, / 5-ethylenically unsaturated acrylic group Copolymer, as described in EP 12339. Mixtures of these prepolymers can be used similarly. Also suitable are the polymerizable prepolymers described in EP 33896, which have an average molecular weight of at least 600, a carboxyl content of 0.2 to 15%, and a range of 0.01 to 0.8 moles per 100 grams of prepolymer. Polymerization of thio-adducts of 1-in-1 prepolymers with double cc double bonds. Other suitable aqueous dispersions (mainly based on special alkyl (meth) acrylate polymers) are described in EP 41125, and suitable water-dispersible radiation-curable urethane acrylate prepolymers The substance can be found in DE 2936039. Further additives that can be included in these radiation-curable aqueous prepolymer dispersions are dispersion adjuvants, emulsifiers, antioxidants (eg, 2, thiothiobis (4_methyl_6_ tert-butyl) Phenol) or 2,6-di-tert-butylphenol), light stabilizers, dyes, pigments, fillers, such as glass or alumina, for example, talc, gypsum, silicic acid, rutile, carbon black, zinc oxide , Iron oxide, reaction accelerator, leveling agent, wetting agent, thickener, leveling agent, anti-foaming agent and other auxiliary agents commonly used in coating technology. A suitable dispersion adjuvant is a water-soluble organic compound having a high molecular weight and containing a polar group. Examples are polyvinyl alcohol, polyethylene-based fines, or cellulose fibers. Emulsifiers that can be used are nonionic emulsifiers, and if desired, ionic emulsifiers. In some cases, it is advantageous to use a mixture of two or more new photoinitiators. Of course, it is also possible to use a mixture with a known photoinitiator, such as a mixture with camphor, benzene, benzene, and benzene. Acetophenone, acetophenone derivatives, for example, 1-hydroxycycloalkylphenyl hydrazone or 2. meridyl-2-methyl. Phenyl-propanone, dioxoyl ethyl benzene, 593357 A7 ________B7_ V. Invention Explanation (39) α-Hydroxy- or α-aminoethylacetophenone, for example, (4 · fluorenylthiobenzyl) -1-amidino-1-morpholinylethane), 4-morpholine Benzamidine) -i-benzyl-1-dimethylaminopropane, 4-arylfluorenyl-1, dioxane, benzoin alkyl ether, and benzoyl ketal, such as dimethyl Benzophenone ketals, phenylglyoxylates and their derivatives, dimer phenylglyoxylates, diethylfluorenyl peresters, for example, benzophenone tetracarboxylic acid peresters as described in EP 126541 , Monofluorenylphosphine oxide, for example, (2,4,6 · trimethylbenzyl) diphenylphosphine oxide, bisfluorenylphosphine oxide, bis (2,6-difluorenyloxy) Benzamidine)-(2,4,4-trimethyl-phenyl) -phosphine oxide, bis (2,4,6-trimethylbenzyl) · phenylphosphine oxide, bis ( 2,4,6-trimethylbenzylidene) -2,4-dipentaoxophenylphosphine oxide, trimethylphosphine oxide, halomethyltriazine, for example, 2- [2- ( 4- Ethoxy-phenyl) -vinyl] -4,6-bis-trifluoromethyl- [1,3,5] triazine, 2- (4-methoxy · phenyl) -4,6- Bis-trifluoromethyl- [1,3,5] triazine, 2- (3,4-dimethoxy-phenyl) -4,6-bis-trifluoromethyl- [1,3,5 ] Triazine, 2-methyl-4,6-bis-trichloromethyl- [1,3,5] trifluorene, 2- (4-N, N-bis (ethoxycarbonylfluorenyl) amino) Phenyl) -4,6-bis (trifluoromethyl)-[1,3,5] triazine, 2- (4-fluorenyloxynaphthyl) -4,6-bis-trichloromethyl- [1,3,5] triazine, 2- (1,3-benzodioxane-5-yl) -4,6-bis-trichloromethyl- [1,3,5] triazine, 2- [2- [4- (phenyloxy) phenyl] vinyl] -4,6 · bis-trifluoromethyl · Π, 3,5] triazine, 2- [2- (3-methyl -2-furyl) -vinyl] -4,6_bis-trifluoromethyl- [1,3,5] triazine, 2- [2- (5-fluorenyl-2-furyl) -ethylene Group] -4,6-bis-trichloromethyl- [1,3,5] triazine, 2- [2- (2,4-dimethoxy-phenyl) -vinyl] -4,6 -Bis-trichloromethyl- [1,3,5] triazine, 2- [2- (2-methoxy-phenyl) vinyl] -4,6-bis-trichlorofluorenyl- [1 , 3,5] triazine, 2- [2- [4-isopropoxy-phenyl] -vinyl] -4,6-bis-trigasmethyl- [1,3,5] triazine, 2- 42 (Please read Note on the back, please fill out this page again) This paper size applies to Chinese National Standard (CNS) A4 specification (210X297 mm) 593357 A7 ____B7_ V. Description of the invention (40) [2- (3-chloro-4-methoxy- Phenyl) vinyl] -4,6-bis-trigasmethane- [1,3,5] triazine, 2- [2 · Mo-4-N, N-:( ethoxycarbonylmethyl) amine -Phenyl] -4,6-bis-trichloromethyl- [1,3,5] triazine, 2- [2-Ga-4-N, N-bis (ethoxy-carbonylmethyl) Amino-phenyl-4,6-bis-trichloromethyl_ [1,3,5] triazine, 2- [3-bromo-4, -N, N-«— (ethoxy &gt; Methyl) amino-phenyl] -4,6-bis-trifluoromethyl_ [1,3,5] trimethyl, 2- [3-Ga-4-N, N-di (ethoxy) Carbonylfluorenyl) amino-phenyl] -4,6-bis-dilactymethyl- [1,3,5] trione or, for example, G. Buhr, R.

Dammel 及 C· Lindley Polym. Mater· Sci· Eng· 61,269 (1989) 及EP 0262788所述之其它鹵基甲基_三嗪;鹵基甲基噁唑 光引發劑,諸如,US 4371606及US 4371607所述;1,2-二楓,諸如 Ε·Α· Bartmann,Synthesis 5, 490 (1993)所述; 六芳基雙咪唑及六芳基雙咪唑/共引發劑系統,例如,與 2-M基苯并噻唑結合之鄰-氣六苯基-雙咪唑,二茂鐵陽離 子化合物或二茂鈦,例如,雙(環戊二烯基)_雙(2,6-二氟-3-处咯基-苯基)鈦。雖然新穎光引發劑以混雜系統使用,除 新穎自由基硬化劑外,亦可使用陽離子光引發劑,過氧化 物化合物,諸如苯甲醯基過氧化物(其它適合之過氧化物 係描述於美國專利第4950581號案第19攔第17-25行), 芳香族銕-、鱗·或碘鏺鹽,如美國專利第5950581號案第 18攔第60行至第19攔第1〇行所述,或環戊二烯基-芳 烴-鐵(II)錯合物鹽,例如,異丙基苯)(β 5_環戊二烯 基)-鐵(II)六氟罐酸鹽,及肟磺酸酯,例如於ΕΡ 780729 中描述者。再者,例如ΕΡ 497531及ΕΡ 441232所述之吡 唆繙及(異)喹啉鏺鹽可與新穎光引發劑結合使用。 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐) -43 - J 、町......... (請先閲讀背面之注意事項再填寫本頁) 五、發明説明(41 ) 新穎之光引發劑(單獨或與其它已知光引發劑及光敏 感劑而成之混合物)亦可以於水中所成之分散液或乳化液 或水溶液之形式使用。 本發明之標的係除化學式I、II、in、iv或v之化合 物外另包含至少一 胺基酮(特別是(‘甲基硫代苯甲醯 基)-1-曱基-1-嗎琳基乙烧)之組成物。 可光聚合之組成物一般包含〇 〇5至25重量%(較佳係 〇·〇1至10重量%,特別是〇·01至5重量%)之光引發劑(其 係以固態組成物為基準計)。若引發劑混合物被使用,此 含量係指所有添加之光引發劑之總和。因此,此含量係指 光引發劑(b)或光引發劑(b)+(c)。 除光引發劑外,可光聚合之混合物可包含各種添加劑 (d)。其例子係熱抑制劑,其係用以防止過早聚合反應, 例子係氫醌、氫醌衍生物、對-甲氧基酚、石-萘酚或位阻 性酚,諸如,2,6_二-第三丁基·對·甲酚。為增加於黑暗中 之儲存安定性,其可,例如,使用銅化合物(例如,環烷 酸銅、硬脂酸銅或辛酸銅)、磷化合物(例如,三苯基膦、 二丁基膦、三乙基亞磷酸鹽、三苯基亞磷酸鹽或三苯甲基 亞碌酸鹽)、四級錢化合物(例如,四甲基氯化錢或三甲基 苯甲基氣化銨或羥基胺衍生物(例如,二乙基羥基胺)。 為排除聚合反應期間之大氣氧,可添加石蠟或相似之蠟狀 物質’其於聚合物中具不適當之可溶性,而於聚合反應開 台時泳移至表面且形成透明表面層,避免空氣進入。亦可 於塗覆物頂部上塗敷氧不可滲透層,例如,聚(乙烯基醇_ 本紙張尺度適用中國國家標準(挪)A4規格(21〇χ297公爱) 593357 A7 _ B7 丨’ 丨丨丨丨·丨… . 五、發明説明(42 ) 共-乙酸乙烯酯)。可以小量添加之光安定劑係紫外線吸收 劑,例如,羥基笨基苯并三唑、羥基苯基_苯醯苯、草酸 醢胺或經基本基-s-二唾型式者。此等化合物可個別地或 以混合物使用,且可具有或不具有位阻胺(HALS)。 此等紫外線吸收劑及光安定劑之例子係 1· 2-(2’-經基苯基)-笨并三4,例如,2-(2’-經基-5’-甲基 苯基)苯并三唑、2-(3’,5,-二-第三丁基_2,·羥基苯基)苯并 二峻、2-(5 ·第二丁基-2’-經基苯基)苯并三a坐、2-(2,-經基 -5 -(1,1,3,3 -四甲基丁基)苯基)苯并三n坐、2-(3’,5’-二-第三 丁基-2’-經基苯基)-5-氯苯并三嗤、2-(3 -第三丁基-2,-經基 -5’ -曱基苯基)-5-氣苯并三嗤、2-(3’ -第二丁基- 5,-第三丁 基-2’-經基苯基)苯并三唾、2-(2’-經基-4,-辛基氧苯基)苯 并三唑、2-(3,,5,-二-第三戊基-2,·羥基苯基)苯并三唑、2-(3’,5’_雙(α,α-二甲基苯甲基)-2’·羥基苯基)苯并三唑、2· (3’-第三丁基-2’-羥基-5,-(2-辛基氧羰基乙基)苯基)_5_氯_ 苯并三唑、2-(3,-第三丁基-5,-[2-(2_乙基-己氧基)-羰基乙 基]-2’-羥基苯基)-5-氣苯并三唑、2-(3,-第三丁基-2,·羥基-5’·(2-甲氧基羰基乙基)苯基)-5-氯苯并三唑、2(3,-第三丁 基-2’-羥基-5’-(2-曱氧基羰基乙基)苯基)·苯并三唑、2_(3,_ 第三丁基-2,-羥基-5,-(2-辛氧基-羰基乙基)苯基)苯并三 唑、2-(3,-第三丁基-5,-[2-(2-乙基己氧基)羰基乙基]-2,-羥 基苯基)苯并三唑、2-(3,-十二烷基-2,-羥基_5,-甲基苯基) 苯并三唑及2-(3,-第三丁基-2,-羥基-5,-(2-異辛基氧羰基 乙基)苯基苯并三唑之混合物、2,2,-伸曱基-雙[4-(1,1,3,3- 45 (請先閱讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準A4規格(21〇&gt;&lt;297公釐) 593357 A7 __ _B7 五、發明説明(43 ) 四曱基丁基)-6-苯并三唑-2-基-酚];2-[3、第三丁基-5,-(2-曱氧基幾基乙基)-2’-經基-苯基]-苯并三嗤與聚乙二醇300 之轉酯化產物;[R_CH2CH2-COO(CH2)3]2-其中R係3,-第 三丁基-4’-羥基·5,-2Η-苯并三唑-2-基-苯基。 2. 2-經基笨醯笨,諸如,4-經基、4-甲氧基、4-辛氧基、 4-癸氧基、4-十二烷氧基、4-苯甲氧基、4,2,,4,-三羥基及 2’-羥基-4,4’-二甲氧基之衍生物。 1·未被取代或被取代之茉甲酸之酯,諸如,4-第三丁基 苯基水楊酸酯、苯基水揚酸酯、辛基苯基水楊酸酯、二苯 甲醯基間苯二酚、雙(4-第三丁基苯曱醯基)間苯二酚、苯 甲酿基間本二紛、2,4-二-第三丁基苯基3,5-二-第三丁基-4·羥基苯甲酸酯、十六烷基3,5-二-第三丁基-4-羥基苯甲 酸酯、十八烷基3,5-二-第三丁基-4-羥基苯曱酸酯及2-甲 基-4,6_二-第三丁基苯基3,5-二-第三丁基-4-羥基苯甲酸 酯。 .丙烯酸酯,諸如,α-氰基-/3,/3-二苯基丙烯酸異辛酯 或乙酯、α -碳甲氧基桂皮酸甲酯、α-氰基-冷-甲基_對_ 甲氧基桂皮酸丁酯或甲酯、α-羧基甲氧基-對-甲氧基桂 皮酸甲酯及Ν-(冷·碳曱氧基-召-氰基乙烯基)_2_甲基·。弓丨嘌 滿。 ^ j立1¾胺’例如,雙(2,2,6,6-四甲基-旅唆基)癸二酸酯、 雙(2,2,6,6-四甲基-哌啶基)琥珀酸酯、雙(1,2,2,6,6_五甲基 派咬基)癸二酸酯、雙(1,2,2,6,6-五甲基哌啶基)正丁基-3,5-一-第二丁基經基苯甲基丙二酸酯、1-經基乙基_2,2,6,6- 本紙張尺度適用中國國家標準(CNS) A4規格(21〇&gt;&lt;297公楚) 46 (請先閱讀背面之注意事項再琪寫本頁)Dammel and C. Lindley Polym. Mater. Sci. Eng. 61,269 (1989) and other halomethyl-triazines described in EP 0262788; halomethyloxazole photoinitiators such as US 4371606 and US As described in 4371607; 1,2-dimaple, such as described by EA Bartmann, Synthesis 5, 490 (1993); hexaarylbisimidazole and hexaarylbisimidazole / co-initiator systems, for example, with 2- M-benzobenzothiazole-bound o-hexahexaphenyl-bisimidazole, ferrocene cation compounds or titanocene, for example, bis (cyclopentadienyl) _bis (2,6-difluoro-3- Rotyl-phenyl) titanium. Although novel photoinitiators are used in hybrid systems, in addition to novel free radical hardeners, cationic photoinitiators, peroxide compounds, such as benzamyl peroxide (other suitable peroxides are described in the United States) Patent No. 4950581, 19th, 19th, 17-25), aromatic rhenium-, scale, or iodonium salt, as described in US Patent No. 5955581, 18th, 60th to 19th, 10th , Or a cyclopentadienyl-arene-iron (II) complex salt, for example, cumene) (β 5-cyclopentadienyl) -iron (II) hexafluorotannate, and oxime sulfonate Acid esters, such as those described in EP 780729. Furthermore, for example, pyridoxine and (iso) quinolinesulfonium salts described in EP 497531 and EP 441232 can be used in combination with novel photoinitiators. This paper size applies Chinese National Standard (CNS) Α4 specification (210X297 mm) -43-J, M ......... (Please read the precautions on the back before filling this page) 5. Description of the invention ( 41) The novel photoinitiator (either alone or in combination with other known photoinitiators and photosensitizers) can also be used in the form of a dispersion or emulsion or aqueous solution made in water. The subject matter of the present invention is that the compound of formula I, II, in, iv or v contains at least one amino ketone (especially ('methylthiobenzyl) -1-amidino-1-morphine). Base). The photopolymerizable composition generally contains from 0.05 to 25% by weight (preferably from 0.001 to 10% by weight, especially from 0.01 to 5% by weight) of a photoinitiator (which is based on a solid composition as Benchmark meter). If an initiator mixture is used, this content is the sum of all photoinitiators added. Therefore, this content refers to the photoinitiator (b) or the photoinitiator (b) + (c). In addition to the photoinitiator, the photopolymerizable mixture may contain various additives (d). Examples are heat inhibitors, which are used to prevent premature polymerization, and examples are hydroquinones, hydroquinone derivatives, p-methoxyphenol, stone-naphthol, or sterically hindered phenols, such as 2,6_ Di-tertiary butyl · p-cresol. To increase storage stability in the dark, it may, for example, use copper compounds (for example, copper naphthenate, copper stearate or copper octoate), phosphorus compounds (for example, triphenylphosphine, dibutylphosphine, Triethylphosphite, triphenylphosphite, or tritylphosphite), quaternary compounds (e.g., tetramethylchloro chloride or trimethylbenzyl ammonium vapor or hydroxylamine Derivatives (eg, diethylhydroxylamine). To exclude atmospheric oxygen during the polymerization reaction, paraffin or similar wax-like substances can be added, which are inappropriately soluble in the polymer, and swim at the start of the polymerization reaction. Move to the surface and form a transparent surface layer to prevent air from entering. It is also possible to apply an oxygen-impermeable layer on the top of the coating, for example, poly (vinyl alcohol_) This paper size applies the Chinese national standard (Norway) A4 specification (21〇 χ297 public love) 593357 A7 _ B7 丨 '丨 丨 丨 丨 · 丨 .... V. Description of the invention (42) Co-vinyl acetate). Light stabilizers that can be added in small amounts are UV absorbers, such as hydroxybenzyl Benzotriazole, hydroxyphenyl_benzene Benzene, ammonium oxalate, or basic-s-disial type. These compounds can be used individually or in mixtures, and may or may not have hindered amines (HALS). These ultraviolet absorbers and light stabilizers Examples are 1. 2- (2'-Cyclophenyl) -benzyltriazole 4, for example, 2- (2'-Cyclo-5'-methylphenyl) benzotriazole, 2- (3 ', 5, -Di-Third-butyl_2, · hydroxyphenyl) benzobiazine, 2- (5 · Second-butyl-2'-acylphenyl) benzotria, 2- (2, -Ethyl-5-(1,1,3,3-tetramethylbutyl) phenyl) benzotrisine, 2- (3 ', 5'-di-third-butyl-2 '-Ethylphenyl) -5-chlorobenzotrifluorene, 2- (3-tertiarybutyl-2, -Ethyl-5'-fluorenylphenyl) -5-gasbenzotrifluorene, 2 -(3'-Second-butyl-5, -Third-butyl-2'-Ethylphenyl) benzotrisalazine, 2- (2'-Ethyl-4, -octyloxyphenyl) benzene Benzotriazole, 2- (3,5, -di-tertiarypentyl-2, · hydroxyphenyl) benzotriazole, 2- (3 ', 5'_bis (α, α-dimethyl) Benzyl) -2 '· hydroxyphenyl) benzotriazole, 2 · (3'-third butyl-2'-hydroxy-5,-(2-octyloxycarbonylethyl Group) phenyl) _5_chloro_benzotriazole, 2- (3, -third butyl-5,-[2- (2_ethyl-hexyloxy) -carbonylethyl] -2'- Hydroxyphenyl) -5-gas benzotriazole, 2- (3, -third butyl-2, · hydroxy-5 '· (2-methoxycarbonylethyl) phenyl) -5-chlorobenzene Benzotriazole, 2 (3, -Third-butyl-2'-hydroxy-5 '-(2-Methoxycarbonylethyl) phenyl) · benzotriazole, 2- (3, _Third-butyl -2, -hydroxy-5,-(2-octyloxy-carbonylethyl) phenyl) benzotriazole, 2- (3, -third butyl-5,-[2- (2-ethyl Hexyloxy) carbonylethyl] -2, -hydroxyphenyl) benzotriazole, 2- (3, -dodecyl-2, -hydroxy-5, -methylphenyl) benzotriazole and 2- (3, -Third-butyl-2, -hydroxy-5,-(2-isooctyloxycarbonylethyl) phenylbenzotriazole mixture, 2,2, -arylene-bis [ 4- (1,1,3,3-45 (Please read the notes on the back before filling in this page) This paper size is applicable to Chinese National Standard A4 (21〇 &gt; &lt; 297 mm) 593357 A7 __ _B7 5 2. Description of the invention (43) Tetrafluorenylbutyl) -6-benzotriazol-2-yl-phenol]; 2- [3, third butyl-5,-(2-fluorenyloxyethyl) ) -2'-Transyl-phenyl] -benzotrifluorene and transesterification product of polyethylene glycol 300; [R_CH2CH2-COO (CH2) 3] 2- where R is 3, -third butyl- 4'-Hydroxy-5, -2H-benzotriazol-2-yl-phenyl. 2. 2-Chrysene, such as 4-Chrysyl, 4-methoxy, 4-octyloxy, 4-decyloxy, 4-dodecyloxy, 4-benzyloxy, Derivatives of 4,2,4, -trihydroxy and 2'-hydroxy-4,4'-dimethoxy. 1. Unsubstituted or substituted esters of jasmonic acid, such as 4-tert-butylphenylsalicylate, phenylsalicylate, octylphenylsalicylate, dibenzoyl Resorcinol, bis (4-tert-butylphenylfluorenyl) resorcinol, benzoic acid, metabenzyl, 2,4-di-tert-butylphenyl 3,5-di- Tert-butyl-4 · hydroxybenzoate, cetyl 3,5-di-tert-butyl-4-hydroxybenzoate, stearyl 3,5-di-tert-butyl 4-hydroxybenzoate and 2-methyl-4,6-di-third-butylphenyl 3,5-di-third-butyl-4-hydroxybenzoate. Acrylates such as alpha-cyano- / 3, / 3-diphenyl isooctyl or ethyl ester, alpha-carbomethoxymethyl cinnamate, alpha-cyano-cold-methyl _ Butyl methoxycinnamate or methyl ester, α-carboxymethoxy-p-methoxycinnamate methyl ester and N- (Cold · Carbonoxy-Call-Cyanovinyl) _2_methyl ·. The bow is full. ^ ^ 1¾ amine 'for example, bis (2,2,6,6-tetramethyl-bromomethyl) sebacate, bis (2,2,6,6-tetramethyl-piperidyl) amber Acid ester, bis (1,2,2,6,6-pentamethylpyridyl) sebacate, bis (1,2,2,6,6-pentamethylpiperidinyl) n-butyl- 3,5-mono-second butyl mesityl benzylmalonate, 1- mesityl_2,2,6,6- This paper size applies Chinese National Standard (CNS) A4 specification (21〇 &gt; &lt; 297 Gongchu) 46 (Please read the notes on the back before writing this page)

593357593357

四曱基-4-羥基哌啶及琥珀酸之縮合產物、N,N、雙(2,2,6,6_ 四甲基-4-哌啶基)六-伸甲基二胺與‘第三辛基胺基_2,6· 二氯-l,3,5-s-二嗪之縮合產物、三(2,2,6,6-四甲基哌啶 基)氮川三乙酸酯、四(2,2,6,6-四曱基)_4_哌啶基)-12,3,4-丁烷四酯、1,1’-(1,2_乙烷二基)_雙(3,3,5,5_四曱基_哌嗪 酮)、4-苯曱醯基-2,2,6,6_四甲基哌啶、4·硬脂氧基_2,2,6,6_ 四甲基哌啶、雙(1,2,2,6,6-五甲基哌啶基)-2_正甲基_2_(2· 羥基-3,5-二-第三丁基苯甲基)丙二酸酯、3_正辛基_7,7,9,9_ 四甲基-1,3,8-二氮雜螺旋[4,5]癸燒_2,4-二酮、雙(1-辛氧 基-2,2,6,6-四甲基哌啶基)癸二酸酯 '雙(卜辛氧基_2,2,6,6_ 四甲基哌啶基)琥珀酸酯、;^&quot;,_雙(2,2,6,6_四曱基-4_哌啶 基)六伸曱基二胺與4_嗎啉基-2,6_二氣qj,%三嗪之縮合 產物、2-氣-4,6-二(4-正丁基胺基_2,2,6,6-四甲基哌啶基)_ 1,3,5-二嗪與1,2-雙(3-胺基丙基胺基)乙烷之縮合產物、2_ 氯-4,6_二(4_正丁基胺基-1,2,2,6'-五曱基哌啶基)-1,3,5-三 嗪與1,2-雙(3-胺基丙基)乙烷之縮合產物、8_乙醯基_3_十 二烷基-7,7,9,9-四甲基-i,3,8-三氮雜螺旋[4.5]癸烷-2,4-二 酮、3-十二烷基-ΐ-(2,2,6,6·四曱基-4-哌啶基)吡咯烷酮-2,5-二酮及3-十二烷基-1—(1,2,2,6,6-五_甲基_4-哌啶基)-吡咯 烧-2,5·二嗣。 草醯胺,例如,4,4,-二辛氧基草醯替苯胺、2,2,-二乙 氧基草醯替苯胺、2,2,-二-辛氧基_5,5,-二-第三丁基草醯 替苯胺、2,2’-二(十二烷氧基)-5,5,_二-第三丁基草醯替苯 胺、2-乙氧基-2’-乙基-草醯替苯胺、n,n,-雙(3-二甲基胺 47 ...........ί:」…·费…: (請先閲讀背面之注意事項再填寫本頁) .、可| ,0m, 本紙張尺度適用中國國家標準(CNS;) A4規格(21〇&gt;&lt;297公爱) 593357 A7 ___ B7 五、發明説明(45 ) 基丙基)草醯胺、2-乙氧基-5-第三丁基-2,-乙基草醯替苯 胺及其與2-乙氧基-2’-乙基_5,4,-二-第三丁基草醯替苯胺 之混合物、鄰-及對-曱氧基-與鄰-及對-乙氧基-二取代草 醯替苯胺之混合物。 7· 2-(2-經_基苯基)-l,U-三嘻,諸如,2,4,6-三(2-羥基-4-辛氧基苯基_1,3,5_三嗪、2-(2-羥基-4-辛氧基苯基)-4,6-雙 (2,4-二甲基苯基)-1,3,5-三嗪、2-(2,4-二羥基苯基)-4,6-雙 (2,4-二甲基)-1,3,5·三嗪、2,4-雙(2-羥基-4·丙氧基_苯基)-6-(2,4-二曱基苯基)·1,3,5-三嘻、2-(2-經基-4-辛氧基苯 基)-4,6_(4-甲基·苯基)-i,3,5-三嗪、2-(2-羥基_4_十二烷氧 基笨基)-4,6-雙(2,4-二甲基苯基)_1,3,5_三嗪、2-[2_羥基 (2-羥基-3-丁氧基-丙氧基)苯基卜4,6_雙(2,4_二甲基苯基)_ 1,3,5-三嗪、2-[2-羥基-4-(2-羥基-3-辛氧基-丙氧基)苯基]_ 4,6-雙(2,4-二甲基苯基)-i,3,夂三嚓、2_[4_十二烷基_/十三 烷基-氧-(2_羥基丙基)氧_2-羥基-苯基]_4,6_雙(2,4_二甲基 苯基)-1,3,5 -三嘻。 i·亞鱗酸鹽及亞膦_』|^,諸如,三苯基亞磷酸鹽、二苯 基烷基亞磷酸鹽、苯基二烷基亞磷酸鹽、三(壬基苯基)亞 磷酸鹽、二月桂基亞磷酸鹽、三(十八烷基)亞磷酸鹽、二 硬脂基-季戊四醇亞磷酸鹽、三(2,4-二_第三丁基苯基〉亞 磷酸鹽、二異癸基季戊四醇二亞磷酸鹽、雙(2,4-二-第三 丁基苯基)季戊四醇二亞磷酸鹽、雙(2,6-二_第三丁基_4_甲 基苯基)季戊四醇二亞磷酸鹽、雙(異癸基氧-季戊四醇二 亞碌酸鹽、雙(2,4-二第三丁基冬甲基苯基)季戊四醇二亞 (請先閲讀背面之注意事項再填寫本頁)Condensation products of tetramethyl-4-hydroxypiperidine and succinic acid, N, N, bis (2,2,6,6_tetramethyl-4-piperidinyl) hexamethylene diamine and 'third Condensation products of octylamino_2,6 · dichloro-1,3,5-s-diazine, tris (2,2,6,6-tetramethylpiperidinyl) azepine triacetate, Tetrakis (2,2,6,6-tetrafluorenyl) _4-piperidinyl) -12,3,4-butane tetraester, 1,1 '-(1,2_ethanediyl) _bis ( 3,3,5,5_tetrafluorenyl_piperazinone), 4-phenylfluorenyl-2,2,6,6_tetramethylpiperidine, 4 · stearyloxy_2,2,6 , 6_ tetramethylpiperidine, bis (1,2,2,6,6-pentamethylpiperidinyl) -2_n-methyl_2_ (2 · hydroxy-3,5-di-third-butyl Benzyl) malonate, 3-n-octyl_7,7,9,9_tetramethyl-1,3,8-diazaspiro [4,5] decane_2,4-dione Bis (1-octyloxy-2,2,6,6-tetramethylpiperidinyl) sebacate'bis (buoctyloxy_2,2,6,6_tetramethylpiperidinyl) Succinate, ^ &quot;, bis (2,2,6,6_tetrafluorenyl-4_piperidinyl) hexamethylene diamine and 4_morpholinyl-2,6_digas qj ,% Triazine condensation product, 2-gas-4,6-bis (4-n-butylamino group_2,2,6,6-tetramethylpiperidinyl) _ 1,3,5-diazine With 1 Condensation product of 2-bis (3-aminopropylamino) ethane, 2-chloro-4,6_bis (4-n-butylamino-1,2,2,6'-pentafluorenylpiperidine Group) condensation product of -1,3,5-triazine and 1,2-bis (3-aminopropyl) ethane, 8-ethenyl_3-dodecyl-7,7,9, 9-tetramethyl-i, 3,8-triazaspiro [4.5] decane-2,4-dione, 3-dodecyl-fluorene- (2,2,6,6 · tetrafluorenyl -4-piperidinyl) pyrrolidone-2,5-dione and 3-dodecyl-1— (1,2,2,6,6-penta-methyl_4-piperidinyl) -pyrrole -2,5 · 2. Acetochlor, for example, 4,4, -dioctyloxypyrrolidine, 2,2, -diethoxypyrrolidine, 2,2, -di-octyloxy 5,5,- Di-Third-Butyloxadibenzidine, 2,2'-bis (dodecyloxy) -5,5, _Di-Third-Butyloxadibenzidine, 2-ethoxy-2'- Ethyl-acetoline, aniline, n, n, -bis (3-dimethylamine 47 ........... ί: "... · Fees: (Please read the precautions on the back before (Fill in this page)., May |, 0m, this paper size is applicable to Chinese national standard (CNS;) A4 specification (21〇 &gt; &lt; 297 public love) 593357 A7 ___ B7 5. Description of the invention (45) propyl propyl) Scopolamine, 2-ethoxy-5-tert-butyl-2, -ethylcuroxetidine and its relationship with 2-ethoxy-2'-ethyl-5,4, -di-third Mixtures of butylgrabentifen, mixtures of ortho- and para-fluorenoxy- and ortho- and para-ethoxy-disubstituted oxalopidine. 7.2- (2-Cycloylphenyl) -l, U-tris, such as 2,4,6-tris (2-hydroxy-4-octyloxyphenyl_1,3,5_tris Azine, 2- (2-hydroxy-4-octyloxyphenyl) -4,6-bis (2,4-dimethylphenyl) -1,3,5-triazine, 2- (2,4 -Dihydroxyphenyl) -4,6-bis (2,4-dimethyl) -1,3,5 · triazine, 2,4-bis (2-hydroxy-4 · propoxy_phenyl) -6- (2,4-Difluorenylphenyl) · 1,3,5-trihexyl, 2- (2-Cycloyl-4-octyloxyphenyl) -4,6_ (4-methyl · · Phenyl) -i, 3,5-triazine, 2- (2-hydroxy_4-dodecyloxybenzyl) -4,6-bis (2,4-dimethylphenyl) _1,3 , 5-triazine, 2- [2_hydroxy (2-hydroxy-3-butoxy-propoxy) phenyl, 4,6_bis (2,4_dimethylphenyl) _ 1,3 , 5-triazine, 2- [2-hydroxy-4- (2-hydroxy-3-octyloxy-propoxy) phenyl] _ 4,6-bis (2,4-dimethylphenyl) -i, 3, fluorenetrifluorene, 2_ [4_dodecyl_ / tridecyl-oxy- (2_hydroxypropyl) oxy_2-hydroxy-phenyl] _4,6_bis (2, 4-Dimethylphenyl) -1,3,5-trihexyl. I · Linosinites and phosphines_ "| ^, such as triphenylphosphite, diphenylalkylphosphite, Phenyldialkylphosphite, tris (nonylphenyl) Phosphite, dilaurylphosphite, tris (octadecyl) phosphite, distearyl-pentaerythritol phosphite, tris (2,4-di-tert-butylphenyl) phosphite , Diisodecyl pentaerythritol diphosphite, bis (2,4-di-third-butylphenyl) pentaerythritol diphosphite, bis (2,6-di_third-butyl_4_methylbenzene Based) pentaerythritol diphosphite, bis (isodecyloxy-pentaerythritol diphosphite), bis (2,4-di-tert-butyl winter methylphenyl) pentaerythritol diphosphine (please read the notes on the back first) (Fill in this page again)

本紙張尺度適用令國國家標準(CNS) A4規格(21〇χ297公董) 48 593357 A7 ___ _ B7 五、發明説明(46 ) 填酸鹽、雙-(2,4,6-三-第三丁基苯基)季戊四醇二亞碟酸 鹽、三硬脂基-山梨糖醇三亞磷酸鹽、四(2,4-二·第三丁基 苯基)-4,4’-雙伸苯基二亞磷酸鹽、6_異辛氧基_2,4,8,1〇_四 -第三丁基_12H-二苯并[d,g]-l,3,2-二噁磷雜環 (dioxaphosphocine)、6-氟-2,4,8,10-四-第三丁基-12-甲基. 二苯并[(1冶]-1,3,2-二噁磷雜環、雙(2,4-二-第三丁基-6-甲 基苯基)甲基亞磷酸鹽及雙(2,4-二-第三丁基-6-曱基苯基) 乙基亞磷酸鹽。 為加速聚合反應,可添加胺作為組份(d),例如,三 乙醇胺、N-甲基二乙醇胺、乙基_對_二甲基胺基苯曱酸酯、 2-(' —甲基胺基)乙基本甲酸酯、2-乙基己基-對-二甲基胺 基苯甲酸酯、辛基-對-N,N-二甲基胺基苯甲酸酯、NJ2-羥基乙基)-N-甲基-對·曱苯胺或米希勒(Michler)酮。胺之 作用可藉由添加苯醯苯型式之芳香族酮而強化。可作為氧 清除劑之胺之例子係被取代之N,N-二烷基苯胺,如EP 339841所述。其它加速劑、共引發劑及輔劑係硫醇、硫 醚、二硫化物、鱗鹽、膦氧化物或膦,例如,於EP 438123、 GB 2180358 及 JP Kokai Hei 6-68309 中所述。 進一步可添加此項技藝中慣用之鏈轉移劑至依據本發 明之組成物作為組份(d)。例子係硫醇、胺及苯并噻唑。 光聚合反應亦可藉由添加進一步之光敏感劑或共引發 劑(作為組份(d),其使光譜敏感性位移或變寬)而加速。特 別是芳香族化合物,例如,苯醯苯及其衍生物、噻噸酮及 其衍生物、蒽醌及其衍生物、香豆素及吩噻嗪及其衍生物, 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 49 (請先閲讀背面之注意事項再填寫本頁) .訂· -豢- 593357 A7 ______ B7 五、發明説明(47 ) &quot;~— — 及3-(芳醯基伸甲基)嘆唾琳、繞丹寧、棒腦酸,及曙紅、 若丹明、赤蘚紅鈉鹽、咕噸、噻咕噸、吖啶,例如,9-苯 基口丫唆、1,7-雙(9K基)庚烧、W雙(9m)戊烷、塞 安林(cyanine)及份菁染料。 此等化合物之特殊例子係 1 · 口塞嘲_ 噻噸酮、2-異丙基噻噸嗣、2-氯噻噸酮、丨-氯-心丙氧 基噻噸酮、2-十二烷基噻噸酮、2,‘二乙基噻噸酮、2,‘二 甲基噻噸酮、1-甲氧基_羰基噻噸酮、2-乙氧基羰基噻噸 酮、3-(2-甲氧基乙氧基羰基&gt;噻噸酮、‘丁氧基羰基噻噸 _、3-丁氧基羰基-7-甲基噻噸酮、卜氰基_3_氣噻噸酮、卜 乙氧基羰基-3-氯噻噸酮、丨_乙氧基羰基-3_乙氧基噻噸酮、 1-乙氧基羰基-3-胺基噻噸_、丨-乙氧基羰基苯基硫醯基 噻噸酮、3,4-二-[2-(2-甲氧基乙氧基)乙氧基羰基噻噸 酮、1,3-二甲基-2-經基-9HH9-酮2-乙基己基醚、1-乙 氧基羰基-3-(1-甲基_1_嗎啉基乙基&gt;噻噸酮、2·甲基_6_二甲 氧基甲基-噻噸酮、2-甲基-6-(1,1-二甲氧基苯甲基噻噸 酮、2_嗎啉基甲基噻噸_、2-甲基_6_嗎啉基甲基噻噸酮、 Ν-烯丙基噻噸酮-3,4-二羧醯亞胺、Ν_辛基噻噸酮_3,4_二羧 醯亞胺、N-(l,l,3,3-四甲基丁基噻噸酮-3,4ι_二羧醯亞胺、 1-苯氧基噻噸酮、6-乙氧基羰基_2_甲氧基噻噸酮、6_乙氧 基羰基-2_甲基噻噸酮、噻噸嗣羧酸聚乙二醇酯、2-羥基 -3-(3,4-二甲基_9_氧·9H-噻噸酮-2-基氧)-N,N,N-三甲基-1-丙炫錢氯化物。 ------- - 本紙張尺度適用中國國家標準(⑽)A4規格(21〇&gt;&lt;297公爱) -50 -The size of this paper is applicable to the national standard (CNS) A4 specification (21〇χ297 public directors) 48 593357 A7 ___ _ B7 V. Description of the invention (46) Salt filling, double- (2,4,6-three-third Butylphenyl) pentaerythritol diphosphite, tristearyl-sorbitol triphosphite, tetrakis (2,4-di · tertiary butylphenyl) -4,4'-bisphenylphenyl di Phosphite, 6-isooctyloxy_2,4,8,10_tetra-tert-butyl-12H-dibenzo [d, g] -1,3,2-dioxocyclic ring ( dioxaphosphocine), 6-fluoro-2,4,8,10-tetra-tert-butyl-12-methyl. dibenzo [(11] -1,3,2-dioxophosphate heterocyclic ring, bis ( 2,4-di-tertiary-butyl-6-methylphenyl) methyl phosphite and bis (2,4-di-tertiary-butyl-6-fluorenylphenyl) ethyl phosphite. To accelerate the polymerization reaction, amines can be added as component (d), for example, triethanolamine, N-methyldiethanolamine, ethyl-p-dimethylaminophenylbenzoate, 2-('-methylamine ) Ethylbenzate, 2-ethylhexyl-p-dimethylaminobenzoate, octyl-p-N, N-dimethylaminobenzoate, NJ2-hydroxyethyl ) -N-methyl-p-toluidine or Michler Michler) ketone. The effect of amines can be enhanced by the addition of aromatic ketones of the benzophenone type. Examples of amines which can be used as oxygen scavengers are substituted N, N-dialkylanilines as described in EP 339841. Other accelerators, co-initiators and adjuvants are thiols, thioethers, disulfides, scale salts, phosphine oxides or phosphines, for example as described in EP 438123, GB 2180358 and JP Kokai Hei 6-68309. It is further possible to add a conventional chain transfer agent in the art to the composition according to the present invention as component (d). Examples are thiols, amines and benzothiazoles. The photopolymerization reaction can also be accelerated by adding further photosensitizers or co-initiators (as component (d), which shifts or broadens the spectral sensitivity). Especially aromatic compounds, such as benzophenone and its derivatives, thioxanthone and its derivatives, anthraquinone and its derivatives, coumarin and phenothiazine and its derivatives, this paper size applies to Chinese national standards (CNS) A4 specifications (210 X 297 mm) 49 (Please read the precautions on the back before filling out this page). Order ·-豢-593357 A7 ______ B7 V. Description of the invention (47) &quot; ~ — — and 3 -(Arylmethyl) sialylline, rhodanine, clavulanic acid, and eosin, rhodamine, erythrosine sodium salt, glutathione, thioxanthin, acridine, for example, 9-phenyl Mouth yam, 1,7-bis (9K-based) heptyl, W-bis (9m) pentane, cyanine and cyanine dye. Specific examples of these compounds are: 1. Oral ketone_ thioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone, chloro-cardiopropoxythioxanthone, 2-dodecane Thiothioxanthone, 2, 'diethylthioxanthone, 2,' dimethylthioxanthone, 1-methoxy-carbonylthioxanthone, 2-ethoxycarbonylthioxanthone, 3- (2 -Methoxyethoxycarbonyl &gt; thioxanthone, 'butoxycarbonylthioxanthone_, 3-butoxycarbonyl-7-methylthioxanthone, cyano-3_airthioxanthone, Ethoxycarbonyl-3-chlorothioxanthone, 丨 _ethoxycarbonyl-3_ethoxythioxanthone, 1-ethoxycarbonyl-3-aminothioxanthone_, 丨 -ethoxycarbonylbenzene Thiothioxanthone, 3,4-di- [2- (2-methoxyethoxy) ethoxycarbonylthioxanthone, 1,3-dimethyl-2-meryl-9HH9- Ketone 2-ethylhexyl ether, 1-ethoxycarbonyl-3- (1-methyl_1_morpholinylethyl) &gt; thioxanthone, 2.methyl-6-dimethoxymethyl- Thioxanthone, 2-methyl-6- (1,1-dimethoxybenzylthioxanthone, 2-morpholinylmethylthioxanthone, 2-methyl-6-morpholinylmethyl Thioxanthone, N-allyl thioxanthone-3,4-dicarboxyfluorenimine, N_octyl thioxanthone_3,4_dicarboxylic acid Imine, N- (l, l, 3,3-tetramethylbutylthioxanthone-3,4ι_dicarboxyfluorenimine, 1-phenoxythioxanthone, 6-ethoxycarbonyl_2 _Methoxythioxanthone, 6_ethoxycarbonyl-2_methylthioxanthone, thioxanthene carboxylic acid polyethylene glycol ester, 2-hydroxy-3- (3,4-dimethyl_9 _Oxygen · 9H-thioxanthone-2-yloxy) -N, N, N-trimethyl-1-propanyl chloride. --------This paper size applies to Chinese national standards (⑽ ) A4 specifications (21〇 &lt; 297 public love) -50-

、一t— :線丨 (請先閲讀背面之注意事項再填寫本頁) 593357 A7 _____B7_ 五、發明説明(48 ) 2. 笨醯笨 本醯苯、4-苯基苯醯苯、4-甲氧基苯醯苯、4,4,-二甲 氧基苯醯苯、4,4’-二曱基苯醯苯、4,4、二氣苯醯苯、4,4,-雙(二曱基胺基)苯醯苯、4,4’-雙(二乙基胺基)苯醯苯、4,4,-雙(甲基乙基胺基)苯醯苯、4,4,-雙(對-異丙基苯氧基)苯醯 苯、4-曱基苯醯苯、2,4,6-三甲基-苯醯笨、4-(4-甲基硫代 苯基)-苯醯苯、3,3’-二曱基-4-甲氧基苯醯苯、曱基_2-苯 曱醯基苯甲酸酯、4-(2-羥基乙基硫基)-苯醯苯、4_(4_曱苯 基硫基)-苯醯苯、1-[4-(4-苯甲醯基-苯基硫烷基)_苯基卜2-曱基-2-(曱苯-4-石黃酿基)丙-1-酿|、4-苯曱醯基-N,N,N-三曱 基苯曱烷錢氯化物、2-羥基-3_(苯甲醯基苯氧基)-N,N,N-三甲基-1-丙烷銨氣化物單水合物、4-(13-丙烯醯基- 1,4,7,10,13-五噁十三烧基)-苯醯苯、4-苯甲醯基-队1^-二曱 基-Ν-[2·(1-氧-2-丙烯基)氧]乙基-苯曱烷銨氣化物; 3. 香豆素 香豆素卜香豆素2、香豆素6、香豆素7、香豆素30、 香豆素102、香豆素106、香豆素138、香豆素152、香豆 素153、香豆素307、香豆素314、香豆素314Τ、香豆素 334、香豆素337、香豆素500、3-苯曱醯基香豆素、3-苯 曱醯基-7_甲氧基香豆素1、3-苯曱醯基-5,7-二甲氧基香豆 素、3-苯曱醯基-5,7-二丙氧基香豆素、3-苯甲醯基-6,8-二 氯香豆素1、3-苯曱醯基-6-氯-香豆素、3,3’-羰基-雙[5,7-二(丙氧基)-香豆素]、3,3’-羰基-雙(7-甲氧基香豆素)、3,3’-羰基-雙(7-二乙基胺基-香豆素)、3-異丁醯基香豆素、3- 本紙張尺度適用中國國家標準(CNS〉Α4規格(210X297公釐) 51 (請先閲讀背面之注意事項再填寫本頁) 、可| 593357 A7、 一 t—: line 丨 (Please read the precautions on the back before filling this page) 593357 A7 _____B7_ V. Description of the invention (48) Oxybenzylbenzene, 4,4, -dimethoxybenzylbenzene, 4,4'-dimethylbenzylbenzene, 4,4, digas benzylbenzene, 4,4, -bis (difluorene) Aminoamino) phenylbenzene, 4,4'-bis (diethylamino) phenylbenzene, 4,4, -bis (methylethylamino) phenylbenzene, 4,4, -bis ( P-Isopropylphenoxy) phenylbenzene, 4-fluorenylbenzene, benzene, 2,4,6-trimethyl-benzene, benzene, 4- (4-methylthiophenyl) -benzene, Benzene, 3,3'-difluorenyl-4-methoxyphenylhydrazine, fluorenyl_2-phenylfluorenylbenzoate, 4- (2-hydroxyethylthio) -phenylhydrazine, 4_ (4_fluorenylthio) -phenylhydrazine, 1- [4- (4-benzylfluorenyl-phenylsulfanyl) _phenylbenzene 2-fluorenyl-2- (fluorenyl-4 -Shi Huanghuangji) propan-1-vinyl |, 4-phenylfluorenyl-N, N, N-trimethylphenylbenzyl chloride, 2-hydroxy-3_ (benzylidenephenoxy) -N, N, N-trimethyl-1-propaneammonium gaseous monohydrate, 4- (13-propenyl- 1,4-, 7,10,13-pentatridecyl)- Phenylbenzene, 4-benzylamino- 1 ^ -diamidyl-N- [2 · (1-oxo-2-propenyl) oxy] ethyl-phenylphosphonium ammonium gasification; 3. Coumarin Coumarin, Coumarin 2, Coumarin 6, Coumarin 7, Coumarin 30, Coumarin 102, Coumarin 106, Coumarin 138, Coumarin 152, Coumarin 153, Coumarin 307, Coumarin 314, Coumarin 314T, Coumarin 334, Coumarin 337, Coumarin 500, 3-Phenylcoumarin, 3-Phenyl-7-methyl Oxycoumarin 1, 3-phenylfluorenyl-5,7-dimethoxycoumarin, 3-phenylfluorenyl-5,7-dipropoxycoumarin, 3-benzidine 6-6,8-dichlorocoumarin 1, 3-phenylfluorenyl-6-chloro-coumarin, 3,3'-carbonyl-bis [5,7-bis (propoxy) -coumarin ], 3,3'-carbonyl-bis (7-methoxycoumarin), 3,3'-carbonyl-bis (7-diethylamino-coumarin), 3-isobutylammonium coumarin Plain, 3- This paper size applies to Chinese national standards (CNS> Α4 size (210X297 mm) 51 (Please read the precautions on the back before filling this page), OK | 593357 A7

苯甲醯基·5,7-二甲氧基-香豆素、3-苯甲醯基·5,7_二乙氧 基-香豆素、3-苯甲醯基-5,7-二丁氧基香豆素、3_苯甲醯 基_5,7-二(甲氧基乙氧基)-香豆素、3-苯甲醯基)_5,7-二(烯 丙基氧)香豆素、3-苯甲醯基-7-二甲基胺基香豆素、3_苯 甲醯基-7-二乙基胺基香豆素、弘異丁醯基二甲基胺基 香豆素、5,7-二甲氧基-3-(1-萘醯基)_香豆素、5,7•二乙氧 基-3-(1-萘醯基)-香豆素、3-苯甲醯基苯并[f]香豆素、7_二 乙基胺基-3-噻嗯醯基香豆素、3-(4-氰基苯曱醯基&gt;5,7_二 甲氧基香豆素、3-(4-氰基苯甲醯基)_5,7_二丙氧基香豆素、 7- 二曱基胺基·3-苯基香豆素、7-二乙基胺基-3-苯基香豆 素、於JP 09-179299-Α及JP 09-325209-Α所揭示之香豆 素衍生物,例如,7-[{4-氯-6-(二乙基胺基)-S-三嗪-2-基} 胺基]-3-苯基香豆素; 4. 3-(芳醯基伸甲基V噗唑啾 3- 甲基-2-苯甲醯基伸甲基-萘喧ϋ坐琳、3-甲基_2-苯 甲醯基伸曱基-苯弁嗟嗤琳、3 -乙基-2 -丙醯基伸甲基_石_ 萘噻唑啉; 5. 繞丹寧 4- 二甲基胺基苯叉基繞丹寧、4-二乙基胺基笨叉基繞 丹争、3 -乙基- 5-(3 -辛基-2-苯并喧峻琳叉基)-繞丹寧、jp 08- 305019A所揭示之繞丹寧衍生物,化學式[1]、[2]、; 6. 其它化合物 乙醯苯、3-甲氧基乙醯苯、4-苯基乙醯苯、苯偶醯、 4,4’-雙(二甲基胺基)苯偶醯、2-乙醯基萘、2-萘醛、丹醯 52 (請先閲讀背面之注意事項再填寫本頁) •、tr— 费- 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 發明説明(50 ) 酸竹生物、9,10-蒽酸、蒽、祐、胺基祐、菲、菲酸、9· 芴國、9-苯并環庚酮、薑黃素、咕噸酮、硫代米希勒酮、 α -(4-二曱基胺基苯叉基)酮,例如,2,5_雙(4_二乙基胺基 苯叉基)環戊酮、2-(4-二甲基胺基-苯叉基)_茚滿_丨_酮、3_(心 二甲基胺基-苯基)-1-茚滿-5-基-丙烯酮、3_苯基硫代酞醯 亞胺、N-曱基-3,5-二(乙基硫基)_醜酿亞胺、N-曱基_3 5_ 二(乙基硫基)-酞醯亞胺、吩噻嗪、甲基吩噻嗪、胺基, 例如,N-苯基甘氨酸、乙基4-二曱基胺基苯甲酸酯、丁 氧基乙基4-二甲基胺基苯甲酸酯、乒二甲基胺基乙醯苯、 三乙醇胺、甲基二乙醇胺、二甲基胺基乙醇、2_(二甲基 胺基)乙基苯甲酸酯、聚(丙二醇)_4_(二曱基胺基)苯甲酸 酯。 包含作為進一步添加劑(d)之選自苯醯苯及其衍生 物、噻噸酮及其衍生物、蒽醌及其衍生物或香豆素衍生物 所組成之族群之光敏感劑化合物之可光聚合組成物係較 佳。 固化方法可藉由添加光敏感劑而辅助,特別是於被著 色(例如,以二氧化鈦)之組成物,且亦可藉由添加於熱條 件下形成自由基之組份(例如,偶氮化合物,諸如,2,2,_ 偶氮雙(4_甲氧基-2,4-二甲基戊腈)、三氮烯、重氮硫化物、 五氮二烯或過氧化物,例如,過氧化氫或過氧碳酸鹽,例 如,第三丁基過氧化氫,例如EP 245639所述)而辅助。 依據本發明之組成物可包含作為進一步添加劑(句之 可光還原染料,例如,咕噸_、苯并咕噸…苯并噻咕噸_、 593357 A7 _ B7 五、發明説明(51 ) 噻嗪_、派羅寧_、卟啉-或吖啶染料及/或三函素甲基化合 物,其可藉由輻射裂解。相似組成物係,例如,描述於Ep 445624 〇 此項技藝已知之進一步添加劑可作為組份(d)添加,例 如,流動改良劑、黏著促進劑,諸如,乙烯基三甲氧基矽 烷、乙烯基三乙氧基矽烷、乙烯基三(2-甲氧基乙氧基)矽 烷、N-(2-胺基乙基)_3_胺基丙基甲基二甲氧基矽烷、n_(2_ 胺基乙基)-3-胺基丙基三甲氧基矽烷、3·胺基丙基三乙氧基 矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3_環氧丙氧基丙 基甲基二甲氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽 烷、3-氯丙基甲基甲基二甲氧基矽烷、弘氯丙基三甲氧基 矽烷、3-甲基丙烯氧基丙基三甲氧基矽烷及弘酼基丙基三 甲氧基石夕烧。表面活性劑、光增絶劑、色料、染料、濕化 劑、均化助料、分散劑、聚結防止劑、抗氧化劑或填料進 作為添加劑(d)之進一步例子。為固化厚且著色之塗覆物, 適當地係添加玻璃微球或碎化玻璃纖維,例如US 5013768 所述。 添加劑(d)之選擇係依應用領域及此領域所需性質為 之。上述添加劑係此項技藝中慣用,因此,係以個別應用 中一般含量添加。 ‘著W]亦可添加至此新穎組成物。此於可光聚合化合 物係液體或黏稠物質時係特別有利。黏著劑之量係,例如, 2-98重量%(較佳係5_95重量%,且特別是2〇_9〇重量%, 其係相對於整體固體含量而計)。黏著劑之選擇係依應用 本紙張尺度適用中國A4規格χ297公楚~ ?54 _-Benzamyl, 5,7-dimethoxy-coumarin, 3-benzyl, 5,7_diethoxy-coumarin, 3-benzyl-5,7-di Butoxycoumarin, 3-benzylidene-5,7-bis (methoxyethoxy) -coumarin, 3-benzylidene) _5,7-bis (allyloxy) Coumarin, 3-benzylidene-7-dimethylaminocoumarin, 3-benzylidene-7-diethylaminocoumarin, isobutyryldimethylaminocoumarin , 5,7-dimethoxy-3- (1-naphthyl) -coumarin, 5,7 • diethoxy-3- (1-naphthyl) -coumarin, 3- Benzamylbenzo [f] coumarin, 7_diethylamino-3-thienylcoumarin, 3- (4-cyanobenzyl) &gt; 5,7_dimethyl Oxycoumarin, 3- (4-cyanobenzyl) _5,7_dipropoxycoumarin, 7-difluorenylamino · 3-phenylcoumarin, 7-diethyl Aminoamino-3-phenylcoumarin, coumarin derivatives disclosed in JP 09-179299-A and JP 09-325209-A, for example, 7-[{4-chloro-6- (diethyl Methylamino) -S-triazin-2-yl} amino] -3-phenylcoumarin; 4. 3- (arylfluorenylmethyloxazolyl 3-methyl-2-benzidine Methylendaline-naphthalene -Benzylidene-methylphenyl-benzylidene, 3-ethyl-2 -propylidenemethylidene_stone_naphthothiazoline; 5. rhodanine 4-dimethylaminophenylidene rhodanyl Ning, 4-diethylaminobenzylidene rhodanine, 3 -ethyl-5 (3-octyl-2-benzoxanthenylidene)-rhodanine, jp 08-305019A Rotanin derivatives, chemical formulas [1], [2] ,; 6. Other compounds acetophenone, 3-methoxyacetophenone, 4-phenylacetophenone, benzoin, 4,4 ' -Bis (dimethylamino) benzidine, 2-ethenylnaphthalene, 2-naphthaldehyde, danshen 52 (Please read the notes on the back before filling this page) •, tr — fee-paper size Applicable to China National Standard (CNS) A4 specification (210X297 mm) Description of the invention (50) Sour bamboo bio, 9,10-anthracene, anthracene, you, amine, phenanthrene, phenanthrene, phenanthrene, 9-benzene, 9-benzene Acylcycloheptanone, curcumin, glutanone, thiomichelone, α- (4-diamidoaminophenylidene) ketone, for example, 2,5-bis (4-diethylamino) Phenylidene) cyclopentanone, 2- (4-dimethylamino-phenylidene) _indane_ 丨 _one, 3_ (cardiodimethylamino-phenyl) -1-indane-5 -Base-C Enone, 3-phenylthiophthalimide, imine, N-fluorenyl-3,5-bis (ethylthio) _ugenimine, N-fluorenyl_3 5_bis (ethylthio) -Phthalimide, phenothiazine, methylphenothiazine, amino groups, for example, N-phenylglycine, ethyl 4-diamidinoaminobenzoate, butoxyethyl 4-dimethyl Aminoamino benzoate, p-dimethylaminoacetanilide, triethanolamine, methyldiethanolamine, dimethylaminoethanol, 2- (dimethylamino) ethylbenzoate, poly ( Propylene glycol) 4- (difluorenylamino) benzoate. Photosensitive compounds containing as further additives (d) a group selected from the group consisting of benzophenone and its derivatives, thioxanthone and its derivatives, anthraquinone and its derivatives or coumarin derivatives The polymerization composition is preferred. The curing method can be assisted by the addition of photosensitizers, especially for compositions that are colored (for example, titanium dioxide), and can also be added by components that form free radicals under thermal conditions (for example, azo compounds, Such as 2,2, _Azobis (4-methoxy-2,4-dimethylvaleronitrile), triazene, diazosulfide, pentaazadiene or peroxide, for example, peroxide Hydrogen or peroxycarbonate, for example, tert-butyl hydroperoxide, for example as described in EP 245639). The composition according to the present invention may contain as a further additive (for example, photoreducible dyes, for example, gutton, benzoxanthan ... benzothiaxanthen, 593357 A7 _ B7 5. Description of the invention (51) thiazine _, Paronin_, porphyrin- or acridine dyes and / or trichonyl methyl compounds, which can be cleaved by radiation. Similar composition systems, for example, are described in Ep 445624. Further additives known in the art Can be added as component (d), for example, flow improver, adhesion promoter, such as vinyltrimethoxysilane, vinyltriethoxysilane, vinyltri (2-methoxyethoxy) silane , N- (2-aminoethyl) _3-aminopropylmethyldimethoxysilane, n_ (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3.aminopropyl Triethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclohexyl) Ethyltrimethoxysilane, 3-chloropropylmethylmethyldimethoxysilane, chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxy Alkanes and sulfonyl propyltrimethoxy stone sintered. Surfactants, photointensifiers, colorants, dyes, wetting agents, leveling aids, dispersants, coalescence preventers, antioxidants or fillers Further examples of additives (d). For curing thick and colored coatings, glass microspheres or broken glass fibers are suitably added, as described in US 5013768. The choice of additives (d) depends on the application field and this field The required properties are this. The above additives are commonly used in this technology, so they are added at the usual levels in individual applications. '着 W] can also be added to this novel composition. This is when the photopolymerizable compound is a liquid or viscous substance Is particularly advantageous. The amount of the adhesive is, for example, 2 to 98% by weight (preferably 5 to 95% by weight, and particularly 20 to 90% by weight, which is relative to the overall solids content). The selection is based on the application of this paper. The size of the Chinese A4 standard is 297 mm.

— (請先閲讀背面之注意事項再填寫本頁) tr丨 593357 A7 B7 五、發明説明(52 ) 領域及此領域所需性質為之’諸如,於水性及有機溶劑系 統内之顯影能力、對基材之附著性及對氧之敏感性。 適合黏著劑之例子係具有約2,000至2,0〇〇,〇〇〇(較佳 係5,000至1,〇〇〇,〇〇〇)之分子量之聚合物。鹼性可顯影黏 著劑之例子係具作為侧基之羧酸官能性之丙烯聚合物,諸 如,傳統上已知之藉由乙烯不飽和羧酸(諸如,(甲基)丙 烯酸、2-羧乙基(甲基)丙烯酸、2-羧丙基(甲基)丙烯酸、 衣康酸、丁烯酸、馬來酸、福馬酸及ω-羧基聚己内醋單(甲 基丙烯酸酯))與一或更多之選自(甲基)丙烯酸之酯類(諸 如,(甲基)丙烯酸甲酯、(曱基)丙烯酸乙酯、(甲基)丙婦 酸丙酯、(曱基)丙烯酸丁酯、(甲基)丙烯酸苯甲酯、(甲基) 丙烯酸2-乙基己酯、(甲基)丙烯酸羥基乙酯、(甲基)丙稀 酸羥基丙酯、甘油單(曱基)丙烯酸酯、三環[5·2·1·〇2.6]之 癸-8基(甲基)丙烯酸酯、縮水甘油基(甲基)丙烯酸酯、2_ 甲基縮水甘油基(甲基)丙稀酸酯、3,4_環氧丁基(甲基)丙 烯酸酯、6,7-環氧庚其(曱基)丙烯酸酯);乙烯基芳香族化 合物(諸如’苯乙稀、α -甲基苯乙晞、乙稀基曱苯、對一 氯苯乙婦、乙烯基苯甲基縮水甘油基醚);醢胺型不飽和 化合物、(甲基)丙烯醯胺二丙酮丙烯醯胺、Ν-甲基醇丙婦 醯胺、Ν-丁氧基甲基丙烯醯胺;及聚烯烴型化合物(諸如, 丁^一婦、異戍間一婦、:SL 丁二婦等);甲基丙婦勝、甲基 異丙烯基酮、單-2-[(曱基)丙烯醯基氧]乙基琥珀酸酯、 苯基馬來醯亞胺、馬來酸Sf、乙酸乙稀酯、丙酸乙稀g旨、 戊酸乙烯酯、聚苯乙烯巨單體或聚(甲基)丙烯酸甲酯巨單 55 m I .......................4IW— (請先閲讀背面之注意事項再填寫本頁) .訂— -蒙- 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593357 A7 _— _B7_ 五、發明説明(53 ) 體之單體之共聚合反應而獲得之共聚物。共聚物之例子係 丙烯酸醋及甲基丙烯酸酯與丙烯酸或甲基丙烯酸及與苯乙 烯或被取代之苯乙烯、酚醛樹脂(例如,酚醛清漆)、(聚) 經基苯乙烯之共聚物,及羥基苯乙烯與烷基丙烯酸酯、丙 烯酸及/或甲基丙烯酸之共聚物。共聚物之較佳例子係甲 基丙烯酸甲酯/甲基丙烯酸之共聚物、甲基丙烯酸苯甲酯/ 甲基丙烯酸之共聚物、曱基丙烯酸甲酯/丙烯酸乙酯/甲基 丙烯酸之共聚物、甲基丙烯酸苯曱酯/甲基丙烯酸酯/苯乙 烯之共聚物、甲基丙烯酸苯甲酯/甲基丙烯酸/甲基丙烯酸 羥基乙酯之共聚物、曱基丙烯酸甲酯/甲基丙烯酸丁酯/甲 基丙婦酸/苯乙稀之共聚物、甲基丙稀酸甲醋/甲基丙稀酸 苯甲酯/甲基丙烯酸/曱基丙烯酸羥基苯酯之共聚物。溶劑 可顯影黏著劑聚合物之例子係聚(烷基曱基丙烯酸酯)、聚 (烷基丙烯酸酯)、聚(甲基丙烯酸苯甲酯_共_曱基丙烯酸羥 基乙酯·共-甲基丙烯酸)、聚(曱基丙烯酸苯甲酯-共-甲基 丙烯酸);纖維素酯及纖維素醚(諸如,纖維素乙酸酯、纖 維素乙醯丁酸酯、曱基纖維素、乙基纖維素);聚乙烯基 丁縮醛、聚乙烯基甲縮醛、環化橡膠;聚醚(諸如,聚環 氧乙烷、聚環氧丙烷及聚四氫呋喃);聚苯乙烯、聚碳酸 酯、聚胺基甲酸酯、聚化聚烯烴、聚烯烴、聚氣乙烯、氯 乙烯/偏乙烯共聚物、偏氣乙烯與丙烯賸、曱基丙烯酸曱 酯及乙酸乙烯酯之共聚物、聚乙酸乙烯酯、共聚(乙烯/乙 酸乙烯酯)、諸如聚己内醯胺及聚(六伸甲基己二醯胺)之 聚合物,及諸如聚(乙二醇對苯二甲酸酯)及聚(六伸曱基 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 56 (請先閲讀背面之注意事項再填寫本頁) 訂· -费- 593357 A7 I—------!Z_____ 五、發明説明(54 ) &quot;~'~' 一 二醇琥珀酸酯)之聚合物及聚醯亞胺黏著劑樹脂。本發明 中之聚醯亞胺黏著劑樹脂可為溶劑適合之聚醯亞胺或聚醯 亞胺先質,例如,聚(醢胺酸)。 I 較佳者係包含作為黏著劑聚合物(e)之甲基丙烯酸酯 及甲基丙烯酸之共聚物之光可聚合組成物。進一步感興趣 者係,例如,JP 1(M7111、A所述之聚合物黏著劑組份, 特別是用於濾色器。 可光聚合之組成物可用於各種不同目的,例如,作為 印刷墨水(例如,網版印刷墨水、膠版印刷或橡皮版印刷 之墨水),作為光潔整理,作為白色或顏色之整理(例如, 用於木材或金屬),作為粉末塗覆物,作為塗覆材料(用於 紙張、金屬或塑膠等),作為建築物標記及道路標記之曰 光可固化之塗覆物,用於照相複製技術,用於全息照相記 錄材料,用於影像記錄技術,或製造印刷板(其可以有機 溶劑或以鹼水溶液顯影),用以製備網版印刷之遮罩,作 為齒科填充組成物,作為黏著劑,作為壓敏性黏著劑,作 為層合樹脂,作為蝕刻阻劑,焊料阻劑、電鍍阻劑,或永 久性阻劑(液體及乾燥膜),作為可光建構之介電質(例如, 印刷電路版及電子電路),作為製備用於各種不同顯示器 應用之濾色器或於電漿·顯示面板及電致發光顯示器之製 備方法中產生結構物之阻劑(例如,US 5853446、EP 863534、JP 09-244230-A、JP ι〇·62980·Α、jP 08_171863_ A、US 5840465、ΕΡ 855731、jp 〇5_271576-A、JP 05-67405-Α 所述),用以製備光學開關、光學晶格(干擾晶格)、光電 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公爱了 -~57—&quot;- ---— (Please read the notes on the back before filling this page) tr 丨 593357 A7 B7 V. Description of the invention (52) The field and the properties required in this field are 'such as developing ability in aqueous and organic solvent systems, Substrate adhesion and sensitivity to oxygen. Examples of suitable adhesives are polymers having a molecular weight of about 2,000 to 2,000,000 (preferably 5,000 to 1,000,000). Examples of alkaline developable adhesives are propylene polymers having carboxylic acid functionality as a pendant group, such as conventionally known by ethylene unsaturated carboxylic acids such as (meth) acrylic acid, 2-carboxyethyl (Meth) acrylic acid, 2-carboxypropyl (meth) acrylic acid, itaconic acid, butenoic acid, maleic acid, fumaric acid, and ω-carboxy polycaprolactone mono (methacrylate)) and one or More selected from esters of (meth) acrylic acid (such as methyl (meth) acrylate, ethyl (meth) acrylate, propyl (meth) propionate, butyl (meth) acrylate, Benzyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, glycerol mono (fluorenyl) acrylate, Tricyclic [5 · 2 · 1 · 〇2.6] dec-8-based (meth) acrylate, glycidyl (meth) acrylate, 2-methylglycidyl (meth) acrylate, 3 , 4-epoxybutyl (meth) acrylate, 6,7-epoxyheptyl (fluorenyl) acrylate); vinyl aromatic compounds (E.g., styrene, α-methylphenethylhydrazone, ethyl acetophenone, p-chloroacetophenone, vinylbenzyl glycidyl ether); ethylamine unsaturated compounds, (meth) propylene Diamine diacetone acrylamide, N-methyl alcohol propylamidine, N-butoxy methacrylamide; and polyolefin-based compounds (such as butyl butyrate, isoamidine, SL Dingfu etc.); Meprofen, methylisopropenone, mono-2-[(fluorenyl) propenyloxy] ethyl succinate, phenylmaleimide, maleic acid Sf, ethyl acetate, ethyl propionate, vinyl valerate, polystyrene macromonomer, or poly (meth) acrylate giant mono 55 m I ........... ............ 4IW— (Please read the precautions on the back before filling this page). Order — — Mongolia — This paper size is applicable to China National Standard (CNS) A4 (210X297 mm) 593357 A7 _— _B7_ V. Copolymer obtained by copolymerization of monomers of the invention (53). Examples of copolymers are copolymers of acrylic acid vinegar and methacrylic acid esters with acrylic acid or methacrylic acid and with styrene or substituted styrene, phenolic resins (for example, novolac), (poly) warp-based styrene, and Copolymer of hydroxystyrene with alkyl acrylate, acrylic acid and / or methacrylic acid. Preferred examples of the copolymer are a copolymer of methyl methacrylate / methacrylic acid, a copolymer of benzyl methacrylate / methacrylic acid, a copolymer of methyl methacrylate / ethyl acrylate / methacrylic acid Copolymer of phenylmethyl methacrylate / methacrylate / styrene, copolymer of benzyl methacrylate / methacrylic acid / hydroxyethyl methacrylate, methyl methacrylate / butyl methacrylate Ester / Methylpropionic Acid / Styrene Copolymer, Methacrylic Acid Methyl Acetate / Methyl Acrylate Methyl Acrylate / Methacrylic Acid / Hydroxyphenyl Acrylic Acid Copolymer. Examples of solvent developable adhesive polymers are poly (alkyl fluorenyl acrylate), poly (alkyl acrylate), poly (benzyl methacrylate_co-fluorenyl hydroxyethyl acrylate · co-methyl Acrylic acid), poly (benzyl acrylate-co-methacrylic acid); cellulose esters and cellulose ethers (such as cellulose acetate, cellulose acetobutyrate, ethyl cellulose, ethyl Cellulose); polyvinyl butyral, polyvinyl methylal, cyclized rubber; polyethers (such as polyethylene oxide, polypropylene oxide, and polytetrahydrofuran); polystyrene, polycarbonate, Polyurethanes, Polyolefins, Polyolefins, Polyethylene, Polyvinyl Chloride / Vinylidene Copolymer, Vinylidene Vinyl and Propylene Resin, Copolymers of Ethyl Acrylate and Vinyl Acetate, Polyvinyl Acetate Esters, copolymers (ethylene / vinyl acetate), polymers such as polycaprolactam and poly (hexamethylene adipamide), and poly (ethylene glycol terephthalate) and poly ( Six basic dimensions of the paper are applicable to China National Standard (CNS) A4 (210X297 Mm) 56 (Please read the notes on the back before filling out this page) Order ·-Fees-593357 A7 I —--------! Z_____ V. Description of the Invention (54) &quot; ~ '~' Monodiol Succinate) polymer and polyimide adhesive resin. The polyimide adhesive resin in the present invention may be a polyimide or a polyimide precursor suitable for a solvent, for example, poly (amidate). I is preferably a photopolymerizable composition comprising a methacrylic acid ester as a binder polymer (e) and a copolymer of methacrylic acid. Further interested parties are, for example, the polymer adhesive component described in JP 1 (M7111, A, especially for color filters. The photopolymerizable composition can be used for various purposes, for example, as a printing ink ( For example, screen printing inks, offset printing or offset printing inks), as a smooth finish, as a white or color finish (for example, for wood or metal), as a powder coating, as a coating material (for Paper, metal or plastic, etc.), as light-curable coatings for building markings and road markings, for photocopying technology, for holographic recording materials, for image recording technology, or for making printing plates (which It can be developed with organic solvents or alkaline aqueous solution), used as a mask for screen printing, as a dental filling composition, as an adhesive, as a pressure-sensitive adhesive, as a laminating resin, as an etching resist, as a solder resist. Agents, plating resists, or permanent resists (liquid and dry film) as photo-constructible dielectrics (eg, printed circuit boards and electronic circuits) as Preparation of color filters for various display applications or resists that produce structures in the production methods of plasma · display panels and electroluminescent displays (eg, US 5853446, EP 863534, JP 09-244230-A, JP ι〇 · 62980 · Α, jP 08_171863_ A, US 5840465, EP 855731, jp 〇5_271576-A, JP 05-67405-A), used to prepare optical switches, optical lattices (interference lattices), photoelectric books The paper size applies the Chinese National Standard (CNS) A4 specification (210X297)-~ 57— &quot;----

---- (請先閲讀背面之注意事项再填寫本頁) .、一-T— 费· 593357 A7 _B7_ 五、發明説明(55 ) 路,用以藉由本體固化(透明模具内之紫外線固化)或藉由 立體石版印刷技術製備三維物件,例如US 4575330所述, 製備複合材料(例如,苯乙烯聚酯,若要的話,可含有玻 璃纖維及/或其它纖維及其它輔劑)及其它厚層組成物,用 於塗覆或密封電子組件及積體電路,或作為光纖之塗覆 物,或用於製備光學鏡片,例如,隱形眼鏡或佛瑞奈(Fresnel) 鏡片。依據本發明之組成物係進一步適於製備醫學設備、 輔劑或植入物。再者,依據本發明之組成物係適於製備具 向熱性質之凝膠,例如,DE 19700064及EP 678534所述。 此新穎組成物可另外被作為乳化聚合反應、粒狀聚合 反應或懸浮聚合反應之引發劑,固定液晶單體及寡聚物之 順序態之聚合反應引發劑,或作為有機材料上染料固定之 引發劑。 於塗覆物材料中,一般係使用預聚物與聚不飽合單體 之混合物,其可另外包含單不飽和單體。此間之預聚物主 要係指定塗覆物膜之性質,且藉由使其改變,熟習此項技 藝者能影響固化膜之性質。聚不飽和單體係作為交聯劑, 其使薄膜呈不可溶。單不飽和單體作為反應性稀釋劑,其 被用以降低黏度,而無需使用溶劑。不和聚酯樹脂一般係 與單不飽和單體(較佳係苯乙烯)一起用於二組份系統。對 於光阻劑,特殊之一組份系統一般被使用,例如,聚馬來 醯亞胺、聚芳基丙烯醯芳烴或聚醯亞胺,如DE 2308830 中所述。 新穎光引發劑及其混合物亦可用於輻射可固化之粉末 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐) 58 -------r!0^—— (請先閲讀背面之注意事項再填寫本頁) •、可| 593357 A7 _____B7 _ 五、發明説明(56 ) 塗覆物之聚合反應。粉末塗覆物可以固態樹脂及含有反應 性雙鍵之單體(例如,馬來酸酯、乙烯基醚、丙烯酸酯、 丙烯醯胺及其混合物)為主。自由基紫外線可固化之粉末 塗覆物可藉由使不飽和聚酯樹脂與丙烯醯胺(例如,曱基 曱基丙烯醯胺基二醇鹽酯)及新穎之自由基光引發劑混合 而配製,此等組成物被描述於,例如,論文,,粉末塗覆物 之輻射固化 ”’ Conference Proceedings,Radtech Europe 1993 ’ M. Wittig及Th· Gohmann。粉末塗覆物亦可含有 黏著劑,例如,DE 4228514及EP 636669中所述。自由 基紫外線可固化之粉末塗覆物亦可藉由混合不飽和聚酯與 固態丙烯酸酯、甲基丙烯酸酯或乙烯基醚及新穎光引發劑 (或光引發劑混合物)而配製。粉末塗覆物亦可包含黏著 劑,例如,DE 4228514及EP 636669所述。紫外線可固 化之粉末塗覆物可另外包含白色或彩色之色料。例如,較 佳地,金紅石鈦氧化物可以最高達50重量%之濃度使用, 以產生具良好遮蓋力之固化粉末塗覆物。此程序一般包含 使粉末以靜電或摩擦靜電方式噴灑於基材(例如,金屬或 木材)上,藉由加熱使粉末熔融,及於平滑膜形成後使用, 例如,中度壓力之汞燈、金屬齒化物燈或氙燈且以紫外線 及/或可見光輻射固化此塗覆物。可輻射固化之粉末塗覆 物優於其可熱固化對兆物之特殊優點係使粉末顆粒熔融後 之流動時間可被延遲以確保平滑之高光澤度塗覆物形成。 與可熱固化系統相反,可輻射固化之粉末塗覆物可被配製 成於較低溫度時熔融,且無縮短其壽命之非所欲作用。因 59 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準A4規格(21〇&gt;&lt;297公釐〉 593357 A7 B7 五、發明説明(57 此,其亦適於作為熱敏性基材(例如,木材或塑膠)之塗覆 物。除新穎之光引發劑系統外,此粉末塗覆物組成物亦可 包含紫外線吸收劑。適當例子係於上述段落1_8中列示。 此新穎之可光固化組成物係適於,例如,作為所有種 類之基材(例如,木材、織物、紙張、陶瓷、玻璃、塑膠, 諸如,聚酯、聚對苯二甲酸乙二酯、聚烯烴或纖維素乙酸 醋’特別是薄膜形式,及金屬,諸如,A1、Cu、Ni、Fe、 Mg或Co及GaAs、Si或SiOJ之塗覆材料,此基材上係 欲被塗敷保護性層,或藉由影像式曝光,以產生影像。 新穎之輻射敏感性組成物進一步發現作為負光阻劑之 應用,其對光線具有非常高之敏感性且能於水性鹼介質 顯影且無膨脹。其適於製備用於凸版印刷、平版印刷、 相凹版印刷之印刷模子或網版印刷模子,用於製備凸版印 刷複本,例如,製備盲人點字文字,用於製備郵票,用 化學研磨或作為積體電路製備之微阻劑。此組成物進一 可作為可以光形成圖案之介電層或塗覆物,製備電腦 片、印刷電路板及其它電或電子元件時之包埋材料及隔離 塗覆物。可能之層支撐及塗覆基材之處理條件可改變。 新穎組成物亦有關於光敏熱固性樹脂組成物及藉由其 使用形成焊料阻劑圖案之方法,且更特別係有關於一種作 為用以製備印刷電路板、金屬物件精密製備、玻璃及石頭 物件之蝕刻、塑膠物件之浮凸及製備印刷板之材料之新穎 之光敏熱固性樹脂組成物,特別是作為用於印刷電路板之 焊料阻劑,及藉由使樹脂組成物層選擇性地經由具圖案 中 昭 於步晶 之 ...........……r!0^…… (請先閲讀背面之注意事項再填寫本頁) 、可| .费- 本紙張尺度適用中國國家標準(CNS) A4規格⑵〇χ297公爱) A7 -------- B7_ 五、發明説明(58 ) &quot;~&quot; -— 光罩之光化射線曝光及使此層之未曝光部份顯影等步驟形 成焊料阻劑圖案之方法。 焊料阻劑係一種於使特定部份焊接至印刷電路板期間 使用以避免熔融焊料附著至不相關部份及保護電路之物 質。因此需擁有諸如高黏著劑、抗絕緣性、耐焊接溫度、 耐溶劑性、耐鹼性、耐酸性及耐電鍍性等性質。 因為依據本發明之可光固化組成物具有良好之熱安定 性且對於因氧之抑制作用具充分抗性,其係特別適於製備 濾色器或彩色馬赛克系統,諸如,Ep 32〇264中所述。濾 色器一般係用於製備LCD、投影系統及影像感應器。濾 色器亦可用於,例如,電視接收器、影像監視器或電腦之 顯示器及影像掃瞄器,平面顯示技術等。 遽色器一般係藉由於玻璃基材上形成紅、綠及藍像素 及黑色基質而製得。於此等方法中,依據本發明之可光固 化組成物可被使用。特別佳之使用方法包含添加紅、綠及 藍色之彩色物料、染料及色料至本發明之光敏性樹脂組成 物,以此組成物塗覆基材,以短熱處理使塗覆物乾燥,使 此塗覆物以形成圖案式曝光於光化輻射,且其後於水性驗 顯影劑溶液中使圖案顯影及選擇性之熱處理。因此,藉由 其後以此方法以任意所欲順序使、綠及藍色塗覆物敷於彼 此之頂部上,具紅、綠及藍色像素之濾色層可被製得。 顯影係藉由以適當驗性顯影溶液洗掉未被聚合之區域 而完成。此方法被重複以形成具數種顏色之影像。 於本發明之光敏性樹脂組成物,以一種其間至少一或 61 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 五 發明説明(59 ) 更多之像素於透明基材上形成且其後自透明基材一侧(上 述像素未於其上形成之側)曝光之方法,上述像素可作為 遮光罩。於此情況,例如,於施以整體曝光之情況,遮罩 位置調整不需要且對其位置滑移之考量被移除。且,可固 化所有之其上未形成上述像素之部份。再者,於此情況中, 亦可藉由使用部份遮光罩顯影及移除一部份其上未形成上 述像素之部份。 因於任-情況中前後形成之像素間未形成間隙,本發 明組成物係適用於,例如,濾、色器之形成材料。具體地, 紅、綠及藍色之上色物料、染料及色料被添加至本發明之 光敏性樹脂組錢,且形成影像U法被重複以形成紅、 4及藍色之像素。然後,例如添加黑色之上色材料、染料 及色料之光敏性樹脂組成物被提供於整體面上。整體性曝 光(或經由遮光罩之部份曝光)可於其上提供以於紅、綠 及藍色之像素間之所有空間(或除遮光罩之部份區域外之 全部)上形成黑色像素。 除其間光敏性樹脂組成物被塗覆於基材上並乾燥之方 法外,本發明之光敏性樹脂組成物亦可作為層轉移材料。 即,此光敏性樹脂組成物直接以層狀提供於暫時性撐體 上,較佳係於聚對苯二甲酸乙二酯膜上,或於其上提供遮 氧層及氯離層或剝離層及遮氧層被提供之聚對苯二甲酸乙 二酯膜上。一般,由合成樹脂製成之可移除之覆蓋片材被 層合於其上以於處理時提供保護作用。再者,亦可施用其 間鹼可溶之熱塑性樹脂層及中間層被提供於暫時性撐體上 593357 A7 B7 五、發明説明(6〇 ) 之層結構,且再者,光敏性樹脂組成物層於其上提供(JP 5-173320-A) ° 上述覆蓋片材於使用時被移除且光敏性樹脂組成物被 層合於永久性撐體上。其後,當遮氧層及剝離層被提供時 係於此等層與暫時性撐體間進行剝離作用,當剝離層及遮 氧層被提供時係於剝離層與遮氧層間進行剝離作用,當剝 離層或遮氧層未被提供時暫時性撐體及光敏性樹脂組成物 間進行剝離作用,且暫時性撐體被移除。 金屬撐體、玻璃、陶瓷及合成樹脂膜可作為濾色器之 撐體。透明且具有優異尺寸安定性之玻璃及合成樹脂膜係 特別佳。 光敏性樹脂組成物之厚度一般係0.1至50微米,特 別是0.5至5微米。 若組成物含有鹼可溶樹脂或鹼可溶單體或寡聚物時, 鹼性物質之稀釋水溶液可作為本發明光敏性樹脂組成物之 顯影溶液,再者,藉由添加小量與水可容混之有機溶劑而 製得之顯影劑溶液亦可被包含。---- (Please read the precautions on the back before filling in this page). Ⅰ-T— Fee 593357 A7 _B7_ 5. Description of the invention (55) Road for curing by the body (UV curing in transparent mold) ) Or by using three-dimensional lithography to produce three-dimensional objects, such as described in US 4575330, composite materials (for example, styrenic polyester, if desired, may contain glass fibers and / or other fibers and other adjuvants) and other thick Layer composition for coating or sealing electronic components and integrated circuits, or as a coating for optical fibers, or for making optical lenses, such as contact lenses or Fresnel lenses. The composition according to the invention is further suitable for preparing medical devices, adjuvants or implants. Furthermore, the composition according to the invention is suitable for the preparation of gels with directional thermal properties, for example as described in DE 19700064 and EP 678534. This novel composition can additionally be used as an initiator for emulsion polymerization, granular polymerization or suspension polymerization, a sequential polymerization initiator that fixes liquid crystal monomers and oligomers, or as an initiator for dye fixation on organic materials. Agent. In the coating material, a mixture of a prepolymer and a polyunsaturated monomer is generally used, which may additionally contain a monounsaturated monomer. The prepolymers here mainly specify the properties of the coating film, and by changing them, those skilled in the art can influence the properties of the cured film. The polyunsaturated monosystem acts as a cross-linking agent, which makes the film insoluble. Monounsaturated monomers are used as reactive diluents and are used to reduce viscosity without the use of solvents. Polyester resins are generally used in two-component systems with monounsaturated monomers, preferably styrene. For photoresist, a special one-component system is generally used, for example, polymaleimide, polyarylpropylene, arene or polyimide, as described in DE 2308830. The novel photoinitiator and its mixture can also be used for radiation curable powder. The paper size is applicable to Chinese National Standard (CNS) A4 specification (210X297 mm) 58 ------- r! 0 ^ —— (Please read first Note on the back, please fill out this page again) •, OK | 593357 A7 _____B7 _ V. Description of the invention (56) Polymerization of the coating. The powder coating may be mainly a solid resin and a monomer containing a reactive double bond (for example, maleate, vinyl ether, acrylate, acrylamide, and mixtures thereof). Free radical UV-curable powder coatings can be formulated by mixing an unsaturated polyester resin with acrylamide (eg, amidinofluorenyl propyleneamine aminoglycolate) and a novel free radical photoinitiator. These compositions are described in, for example, thesis, "Radiation Curing of Powder Coatings" "Conference Proceedings, Radtech Europe 1993" M. Wittig and Th. Gohmann. Powder coatings may also contain adhesives, for example, DE 4228514 and EP 636669. Free radical UV curable powder coatings can also be prepared by mixing unsaturated polyesters with solid acrylates, methacrylates or vinyl ethers and novel photoinitiators (or photoinitiators Powder mixture). Powder coatings may also contain adhesives, for example as described in DE 4228514 and EP 636669. UV-curable powder coatings may additionally include white or colored pigments. For example, preferably, Rutile titanium oxide can be used at a concentration of up to 50% by weight to produce a solid powder coating with good hiding power. This procedure generally involves subjecting the powder to static electricity or friction Electrically sprayed on a substrate (for example, metal or wood), melted the powder by heating, and used after the formation of a smooth film, such as a medium-pressure mercury lamp, metal toothed lamp or xenon lamp with UV and / Or visible light radiation to cure this coating. The special advantage of radiation curable powder coating over its thermal curing is that the flow time of powder particles can be delayed to ensure smooth high gloss coating. In contrast to heat-curable systems, radiation-curable powder coatings can be formulated to melt at lower temperatures without undesired effects of shortening their life. Because 59 (please read the note on the back first Please fill in this page for further details.) This paper size applies the Chinese national standard A4 specification (21〇 &lt; 297 mm> 593357 A7 B7. 5. Description of the invention (57 This is also suitable as a heat-sensitive substrate (for example, wood or Plastic) coatings. In addition to the novel photoinitiator system, this powder coating composition can also contain UV absorbers. Suitable examples are listed in paragraphs 1-8 above. This novel photocurable The composition is suitable, for example, as all kinds of substrates (for example, wood, fabric, paper, ceramic, glass, plastic, such as polyester, polyethylene terephthalate, polyolefin, or cellulose acetate 'Especially in the form of thin films, and coating materials such as A1, Cu, Ni, Fe, Mg or Co and GaAs, Si or SiOJ, the substrate is to be coated with a protective layer, or by imaging The new radiation-sensitive composition is further found to be used as a negative photoresist, which has a very high sensitivity to light and can be developed in aqueous alkaline media without expansion. It is suitable for preparation for use in Printing molds or screen printing molds for letterpress, lithography, and gravure printing, for the production of letterpress printing copies, for example, for the preparation of braille characters, for stamps, for chemical resistance, or for micro-resistance for integrated circuits Agent. This composition further serves as a dielectric layer or coating that can be patterned by light, and is used as an embedding material and isolation coating for the production of computer chips, printed circuit boards, and other electrical or electronic components. Possible layer support and coating substrate processing conditions may vary. The novel composition also relates to a photosensitive thermosetting resin composition and a method for forming a solder resist pattern by using the same, and more particularly, it relates to a method for preparing printed circuit boards, precision preparation of metal objects, and etching of glass and stone objects. , A novel photosensitive thermosetting resin composition for embossing of plastic objects and materials for preparing printed boards, especially as a solder resist for printed circuit boards, and by selectively passing the resin composition layer through a patterned substrate Yu Bujingzhi ................. r! 0 ^ …… (Please read the notes on the back before filling out this page), OK |. Fee-This paper size applies Chinese national standards ( CNS) A4 specification ⑵〇χ297 公 爱) A7 -------- B7_ V. Description of the invention (58) &quot; ~ &quot;--Exposure of actinic ray of photomask and unexposed part of this layer A method for forming a solder resist pattern in steps such as development. A solder resist is a substance that is used during soldering of a specific portion to a printed circuit board to prevent molten solder from adhering to irrelevant portions and to protect the circuit. Therefore, it is necessary to possess properties such as high adhesion, insulation resistance, soldering temperature resistance, solvent resistance, alkali resistance, acid resistance, and plating resistance. Since the photocurable composition according to the present invention has good thermal stability and is sufficiently resistant to the inhibition by oxygen, it is particularly suitable for preparing color filters or color mosaic systems, such as those described in Ep 32〇264. Described. Color filters are generally used to prepare LCDs, projection systems, and image sensors. Color filters can also be used, for example, in television receivers, video monitors or computer monitors and image scanners, flat display technology, etc. The decanter is generally made by forming red, green, and blue pixels and a black matrix on a glass substrate. In these methods, the photocurable composition according to the present invention can be used. A particularly preferred method of use includes adding red, green, and blue color materials, dyes, and colorants to the photosensitive resin composition of the present invention, coating the substrate with the composition, and drying the coating with a short heat treatment to make the The coating is exposed to actinic radiation in a patterned manner, and thereafter the pattern is developed and selectively heat treated in an aqueous developer solution. Therefore, by subsequently applying green and blue coatings on top of each other in this order in this method, a color filter layer with red, green, and blue pixels can be produced. Development is accomplished by washing away areas that have not been polymerized with a suitable diagnostic developing solution. This method is repeated to form an image with several colors. In the photosensitive resin composition of the present invention, there is at least one or 61 in between (please read the precautions on the back before filling this page) This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) (59) A method in which more pixels are formed on a transparent substrate and then exposed from one side of the transparent substrate (the side on which the above-mentioned pixels are not formed), and the above-mentioned pixels can be used as a light-shielding mask. In this case, for example, in the case where an overall exposure is applied, the adjustment of the mask position is not required and the consideration of its position slip is removed. And, all the portions on which the above-mentioned pixels are not formed can be cured. Moreover, in this case, it is also possible to develop and remove a part where the above-mentioned pixels are not formed by using a partial hood. Since no gap is formed between the pixels formed before and after in any case, the composition of the present invention is suitable for, for example, forming materials for filters and color filters. Specifically, red, green, and blue color materials, dyes, and color materials are added to the photosensitive resin composition of the present invention, and the image forming U method is repeated to form red, 4, and blue pixels. Then, for example, a photosensitive resin composition to which a black overtone material, a dye, and a colorant are added is provided on the entire surface. Holistic exposure (or partial exposure through a hood) provides black pixels on all spaces (or all except a portion of the hood) between red, green, and blue pixels. In addition to the method in which the photosensitive resin composition is coated on a substrate and dried, the photosensitive resin composition of the present invention can also be used as a layer transfer material. That is, the photosensitive resin composition is directly provided in a layer form on a temporary support, preferably on a polyethylene terephthalate film, or an oxygen shielding layer and a chlorine ionization layer or a release layer are provided thereon. And an oxygen shielding layer is provided on the polyethylene terephthalate film. Generally, a removable cover sheet made of synthetic resin is laminated thereon to provide protection during processing. Furthermore, an alkali-soluble thermoplastic resin layer and an intermediate layer may be applied on the temporary support 593357 A7 B7 5. The layer structure of the invention description (60), and further, a photosensitive resin composition layer Provided thereon (JP 5-173320-A) ° The above cover sheet is removed at the time of use and the photosensitive resin composition is laminated on the permanent support. Thereafter, when the oxygen shielding layer and the peeling layer are provided, the peeling effect is performed between these layers and the temporary support, and when the peeling layer and the oxygen shielding layer are provided, the peeling effect is performed between the peeling layer and the oxygen shielding layer. When the release layer or the oxygen shielding layer is not provided, the peeling effect is performed between the temporary support and the photosensitive resin composition, and the temporary support is removed. Metal supports, glass, ceramics, and synthetic resin films can be used as supports for color filters. Glass and synthetic resin films that are transparent and have excellent dimensional stability are particularly preferred. The thickness of the photosensitive resin composition is generally 0.1 to 50 m, particularly 0.5 to 5 m. If the composition contains an alkali-soluble resin or an alkali-soluble monomer or oligomer, a dilute aqueous solution of an alkaline substance can be used as a developing solution for the photosensitive resin composition of the present invention. A developer solution prepared by mixing organic solvents may also be included.

適當鹼材料之例子包含鹼金屬氫氧化物(例如,氫氧 化納及氫氧化鉀)、驗金屬破酸鹽(例如,碳酸鈉及碳酸 钾)、驗金屬碳酸氫鹽(例如,碳酸氫鈉及碳酸氫钟)、驗 金屬矽酸鹽(例如,矽酸鈉及矽酸鉀)、鹼金屬偏矽酸鹽(例 如,偏矽酸鈉及偏矽酸鉀)、三乙醇胺、二乙醇胺、單乙 醇胺、嗎啉、四烷基氫氧化銨(例如,四甲基氫氧化銨), 或磷酸三鈉。鹼物質之濃度係0.01至30重量%,且pH 63 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 3357 A7 _— —___ B7 五、發明說明(61 ) 較佳係8至14。 可與水容混之適當有機溶劑包含甲醇、乙醇、2_丙醇、 丙醇、丁醇、二丙酮醇、乙二醇單甲基醚、乙二醇單乙 基驗、乙二醇單正丁基醚、二乙二醇二甲基醚、丙二醇單 甲基醚乙酸酯、乙基-3-乙氧基丙酸酯、甲基_3_甲氧基丙 酸酯、正丁基乙酸酯、苯甲基醇、丙酮、甲基乙基鲖、環 戊酮、環己酮、2-庚酮、2-戊酮、ε -己内酯、γ — 丁内g旨、 一甲基甲醯胺、二甲基乙醢胺、六甲基磷醢胺、乙基乳酸 酯、甲基乳酸酯、ε-己内醯胺及N-甲基吡咯烷酮。可與 水容混之有機溶劑之濃度係〇· 1至30重量%。 再者,公共已知之表面活性劑可被添加。表面活性劑 之濃度較佳係0.001至10重量〇/0。 本發明之光敏性樹脂組成物亦可以有機溶劑顯影,包 含一或更多溶劑之摻合物,但不含驗化合物。適當溶劑包 含曱醇、乙醇、2-丙醇、1-丙醇、丁醇、二丙酮醇、乙二 醇單甲基醚、乙二醇單乙基醚、乙二醇單正丁基醚、二乙 二醇二甲基醚、丙二醇單甲基醚乙酸酯、乙基_3_乙氧基 丙酸酯、曱基-3-甲氧基丙酸酯、正丁基乙酸酯、苯甲基 醇、丙酮、甲基乙基酮、環戊酮、環己酮、2_庚酮、2_戊 酮、ε _己内酯、丁内酯、二甲基曱醯胺、二甲基乙醯 胺、六甲基磷醯胺、乙基乳酸酯、曱基乳酸酯、ε _己内 醯胺及Ν-甲基吡咯烷酮。選擇性地,水可被添加至此等 浴劑,最咼達仍可獲得清淅溶液且光敏性組成物未被曝光 區域之足夠可溶性被保持之程度。 64 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國豕^示準(CNS) Α4規格(210X297公爱) 593357 A7 ____B7_ 五、發明説明(62 ) 顯影劑溶液可以熟習此項技藝者所知之所有形式使 用,例如,以批次溶液、攪煉或噴灑溶液形式。為移除光 敏性樹脂組成物之未固化部份,可結合此等方法,諸如擦 拭與旋轉粉刷,及擦拭與濕海棉擦拭。一般,顯影溶液之 溫度較佳係於室溫及其附近至40°C。顯影時間可依特殊種 類之光敏性樹脂組成物、顯影溶液之驗性及溫度及其有機 溶液被添加情況時之有機溶劑之種類及濃度而變化。一般 係10秒至2分鐘。可於顯影處理後施以沖洗步驟。 最後之熱處理較佳係於顯影處理後進行。因此,具有 可藉由曝光而光聚合之層(其後稱為光固化層)之撐體於電 爐及乾燥器内加熱,或光固化層以紅外線燈輻射或於熱板 上加熱。加熱溫度及時間依所用之組成物及形成層之厚度 而定。一般,加熱較佳係於約12(rc至約25〇&lt;t施行约$ 至約60分鐘。 可被包含於依據本發明之組成物(包含著色之濾色阻 劑組成物)内之色料較佳係被加工處理之色料,例如,藉 由使色料細微分散於至少一選自丙婦樹脂、氯乙渗乙酸^ 婦酉旨共聚物、馬來酸樹脂及乙基纖維素樹脂所組成之族群 之树月曰内而製得之粉末狀或糊狀產物。 紅色色料包含,例如,單獨之蒽醌型色料、單獨之茈 型^料,或其至少一者與二重氮型黃色色料或異二氫口引嘴 型更色色料組成之混合物,特別是單獨&lt; c· ι.紅色色料 單獨之C· I.紅色色料155或由c·[紅色色料n c· I·紅色色料155之至少一元與c· J•黃色色料83或c· |· 5 張尺度適 ---- (請先閱讀背面之注意事項再填寫本頁)Examples of suitable alkali materials include alkali metal hydroxides (for example, sodium hydroxide and potassium hydroxide), metal test salts (for example, sodium carbonate and potassium carbonate), metal test bicarbonates (for example, sodium bicarbonate and Bicarbonate clock), metal silicates (for example, sodium and potassium silicate), alkali metal metasilicates (for example, sodium and potassium metasilicate), triethanolamine, diethanolamine, monoethanolamine , Morpholine, tetraalkylammonium hydroxide (for example, tetramethylammonium hydroxide), or trisodium phosphate. The concentration of alkali substances is 0.01 to 30% by weight, and pH 63 (please read the precautions on the back before filling this page) This paper size is applicable to China National Standard (CNS) A4 (210X297 mm) 3357 A7 _ — —___ B7 V. Invention Description (61) Preferably 8 to 14. Suitable organic solvents that can be mixed with water include methanol, ethanol, 2-propanol, propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, and ethylene glycol mono-n-butyl alcohol. Butyl ether, diethylene glycol dimethyl ether, propylene glycol monomethyl ether acetate, ethyl-3-ethoxypropionate, methyl-3-methoxypropionate, n-butylethyl Acid ester, benzyl alcohol, acetone, methyl ethyl hydrazone, cyclopentanone, cyclohexanone, 2-heptanone, 2-pentanone, ε-caprolactone, γ-butyrolactone, monomethyl Formamidine, dimethylacetamide, hexamethylphosphamide, ethyl lactate, methyl lactate, ε-caprolactam and N-methylpyrrolidone. The concentration of the organic solvent miscible with water is from 0.1 to 30% by weight. Furthermore, publicly known surfactants may be added. The concentration of the surfactant is preferably 0.001 to 10% by weight. The photosensitive resin composition of the present invention can also be developed with an organic solvent, and contains a blend of one or more solvents, but does not contain a test compound. Suitable solvents include methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-butyl ether, Diethylene glycol dimethyl ether, propylene glycol monomethyl ether acetate, ethyl-3-ethoxypropionate, fluorenyl-3-methoxypropionate, n-butyl acetate, benzene Methyl alcohol, acetone, methyl ethyl ketone, cyclopentanone, cyclohexanone, 2-heptanone, 2-pentanone, ε-caprolactone, butyrolactone, dimethylphosphonium, dimethyl Acetylamine, hexamethylphosphoramide, ethyl lactate, fluorenyl lactate, ε-caprolactam and N-methylpyrrolidone. Alternatively, water can be added to these baths to the extent that a clear solution can still be obtained and sufficient solubility of the unexposed areas of the photosensitive composition is maintained. 64 (Please read the precautions on the back before filling this page) This paper size is applicable to China National Standards (CNS) A4 specification (210X297 public love) 593357 A7 ____B7_ 5. Description of the invention (62) Developer solution can be familiar with this It is used in all forms known to the skilled person, for example, in the form of a batch solution, a kneading or spraying solution. To remove the uncured portion of the photosensitive resin composition, these methods can be combined, such as wiping and rotating brushing, and wiping with wet sponge. Generally, the temperature of the developing solution is preferably from room temperature and its vicinity to 40 ° C. The development time may vary depending on the specific type of photosensitive resin composition, the testability and temperature of the developing solution, and the type and concentration of the organic solvent when the organic solution is added. It usually takes 10 seconds to 2 minutes. A washing step may be applied after the development process. The final heat treatment is preferably performed after the development treatment. Therefore, a support having a layer that can be photopolymerized by exposure (hereinafter referred to as a photocurable layer) is heated in an electric furnace and a dryer, or the photocurable layer is irradiated with an infrared lamp or heated on a hot plate. The heating temperature and time depend on the composition used and the thickness of the formed layer. Generally, the heating is preferably performed at about 12 (rc to about 25 ° &lt; t for about $ to about 60 minutes. Colors that can be included in the composition according to the present invention (including the color filter composition) The material is preferably a color material to be processed, for example, by finely dispersing the color material in at least one selected from the group consisting of acrylic resin, chloroacetic acid, acetic acid copolymer, maleic acid resin, and ethyl cellulose resin. A powdery or pasty product made by the tree of the group that is formed within a month. Red pigments include, for example, anthraquinone-type pigments alone, fluorene-type pigments alone, or at least one and two of them Nitrogen-based yellow colorant or heterodihydrogen nozzle-colored colorant mixture, especially separately &lt; c · ι. Red colorant alone C. I. Red colorant 155 or by At least one yuan of nc · I · red colorant 155 and c · J · yellow colorant 83 or c · | · 5 scales are suitable (Please read the precautions on the back before filling this page)

、可I 593357Can I 593357

五、發明説明(63 ) 黃色色料139所組成之混合物(“C I•”係指顏色指數,其係 熟習此項技藝者所知且公眾可獲得)。作為色料之進一步 適當例子係 c· I·紅色色料 105、144、149、176、177、185、 202、209、214、222、242、254、255、264、272 及 C. I. 黃色色料 24、31、53、83、93、95、109、110、l2m9、 138、139、166 及 C. I·橙色色料 43。 綠色色料包含,例如,單獨之函化酞菁型色料或其與 二重氮型黃色色料或異二氫吲嘌型黃色色料之混合物,特 別是單獨之C· I·綠色色料7、單獨之c· j•綠色色料36、 單獨之C· I·綠色色料37或由c· I.綠色色料7、c·;[.綠色 色料36、C. I·綠色色料37、C. I·綠色色料136之至少一 元及C. I.黃色色料83或C· I·黃色色料139所組成之混合 物。其它適當之綠色色料係C· I·綠色色料15及25。 適當藍色色料之例子係酞菁型色料,其係單獨或與二 唑啉型紫色色料結合使用,例如,c· I·藍色色料15:3及 C· I·紫色色料23之混合物。藍色色料之進一步例子係c j 藍色15:3、15:4、15:6、16及60,即,酞菁C I藍色色 料15:3 ’或狄菁C.I·藍色色料15:6。其它適合色料係ci 藍色色料 22、28、C.I·紫色色料 14、19、23、29、32、^、 177 及 C.I.橙色 73。 黑色基質光聚合組成物之色料較佳係包含選自石炭、逢太 黑及氧化鐵所組成之族群之至少一元。但是,整體上產生 黑色外觀之其它色料之混合物亦可被使用。例如,c j f 色色料1及7可單獨或結合使用。 66 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593357 A7 -----E_ 五、發明説明(64 ) 對於任何顏色,多於二種色料之結合亦可被使用。特 別適於濾色應用者係藉由使上述色料分散於樹脂内製得之 粉末狀加工處理之色料。 總固體組份(各種顏色之色料及樹脂)内之色料濃度 係,例如,5重量%至80重量%之範圍,特別是20重量 %至45重量%之範圍。 濾色阻劑組成物之色料較佳具有少於可見光波長(4〇〇 nm至700 nm)之平均顆粒直徑。特別佳係&lt;1〇〇 nm之平均 色料直徑。 若需要,可藉由以分散劑預處理色料使色料於光敏性 組成物内安定化,以改良色料於液體組成物内之分散安定 性。較佳地,依據本發明之濾色阻劑組成物另外含有作為 組份(a)之至少一可加成聚合之單體化合物。 例如,下列化合物可單獨或與其它單體結合使用作為 用於本發明之具乙烯不飽和雙鍵之可加成聚合單體。特別 地’其包含第三丁基(甲基)丙烯酸酯、乙二醇二(甲基)丙 烯酸酯、2-經基丙基(曱基)丙稀酸酯、三乙二醇二(甲基) 丙烯酸酯、三曱醇丙烷三(甲基)丙烯酸酯、乙基·2•丁基 丙烷二醇二(甲基)丙烯酸酯、季戊四醇三(曱基)丙烯酸酯、 季戊四醇四(甲基)丙烯酸酯、二季戊四醇六(曱基)丙婦酸 酯、二季戊四醇五(甲基)丙烯酸酯、聚氧乙基化三曱醇丙 烧二(甲基)丙烯酸酯、二(2-(甲基)丙烯醯基氧乙基)異氰 脲酸酯、1,4-二異丙烯基-苯、1,4-二羥基苯(甲基)丙烯酸 酯、十伸曱基二醇二(甲基)丙烯酸酯、苯乙烯、二烯丙基 -______ 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐)~67一&quot; -V. Description of the invention (63) A mixture of yellow pigments 139 ("C I •" refers to the color index, which is known to those skilled in the art and is publicly available). Further suitable examples of the colorant are c · I · red colorant 105, 144, 149, 176, 177, 185, 202, 209, 214, 222, 242, 254, 255, 264, 272, and CI yellow colorant 24 , 31, 53, 83, 93, 95, 109, 110, 12m9, 138, 139, 166 and C.I. Orange Pigment 43. The green colorant includes, for example, a separate phthalocyanine type colorant or a mixture thereof with a diazo-type yellow colorant or an isodihydroindipure-type yellow colorant, especially a C · I · green colorant alone 7. Separate c · j · green color material 36, Separate C · I · green color material 37 or c · I. Green color material 7, c ·; [.Green color material 36, C. I · green color Material 37, a mixture of at least one element of C.I. green colorant 136 and CI yellow colorant 83 or C.I. yellow colorant 139. Other suitable green pigments are C · I · green pigments 15 and 25. Examples of suitable blue colorants are phthalocyanine-type colorants, which are used alone or in combination with diazoline-type purple colorants, for example, c · I · blue color 15: 3 and C · I · purple color 23 mixture. Further examples of the blue pigment are c j blue 15: 3, 15: 4, 15: 6, 16 and 60, that is, phthalocyanine C I blue pigment 15: 3 'or Dicyan C.I. blue pigment 15: 6. Other suitable pigments are ci blue pigment 22, 28, C.I · purple pigment 14, 19, 23, 29, 32, ^, 177, and C.I. orange 73. The colorant of the black matrix photopolymerizable composition preferably contains at least one yuan selected from the group consisting of carbon, phoenix black, and iron oxide. However, mixtures of other colorants which give a black appearance as a whole can also be used. For example, the c j f colorants 1 and 7 may be used alone or in combination. 66 (Please read the precautions on the back before filling this page) This paper size applies to China National Standard (CNS) A4 (210X297 mm) 593357 A7 ----- E_ V. Description of the invention (64) For any color, A combination of more than two colorants can also be used. Particularly suitable for color filter applications is a powdery processed colorant obtained by dispersing the above colorant in a resin. The colorant concentration in the total solids (colorants and resins of various colors) is, for example, in the range of 5% to 80% by weight, particularly in the range of 20% to 45% by weight. The coloring material of the color filter composition preferably has an average particle diameter smaller than a visible light wavelength (400 nm to 700 nm). Particularly preferred is an average colorant diameter of &lt; 100 nm. If necessary, the colorant can be stabilized in the photosensitive composition by pretreating the colorant with a dispersant to improve the dispersion stability of the colorant in the liquid composition. Preferably, the color filter composition according to the present invention further contains at least one addition polymerizable monomer compound as the component (a). For example, the following compounds can be used alone or in combination with other monomers as addition polymerizable monomers having an ethylenically unsaturated double bond for use in the present invention. In particular, it contains a third butyl (meth) acrylate, ethylene glycol di (meth) acrylate, 2-acrylpropyl (fluorenyl) acrylate, triethylene glycol di (methyl) ) Acrylate, Trimethylolpropane tri (meth) acrylate, Ethyl-2 • butylpropanediol di (meth) acrylate, Pentaerythritol tri (fluorenyl) acrylate, Pentaerythritol tetra (meth) acrylic acid Esters, dipentaerythritol hexa (fluorenyl) propionate, dipentaerythritol penta (meth) acrylate, polyoxyethylated trimethylol propane di (meth) acrylate, di (2- (methyl) Acrylic fluorenyloxyethyl) isocyanurate, 1,4-diisopropenyl-benzene, 1,4-dihydroxybenzene (meth) acrylate, decyl diol di (meth) acrylic acid Ester, styrene, diallyl -______ This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm) ~ 67- &quot;-

•、?τ— (請先閲讀背面之注意事項再填寫本頁) 593357 A7 B7 五、發明説明(65 (請先閱讀背面之注意事項再填寫本頁) 福馬酸酯、三烯丙基三苯六甲酸酯、月桂基(甲基)丙稀酸 醋、(曱基)丙烯醯胺及二甲苯雙(甲基)丙烯醯胺。再者, 亦可使用具羥基之化合物(諸如,2-羥基乙基(甲基)丙婦酸 醋、2-羥基丙基(甲基)丙烯酸酯及聚乙二醇單(甲基)丙婦 酸酯)與二異氰酸酯(諸如,六伸甲基二異氰酸酯、甲苯二 異氰酸酯及二甲苯二異氰酸醋)之反應產物。特別佳係季 戊四醇四丙烯酸酯、二季戊四醇六丙烯酸酯、二季戊四醇 五丙烯酸酯及三(2-丙烯醯基氧乙基)-異氰脲酸酯。 ·、^τ— 於渡色阻劑組成物中,可光聚合組成物内所含之單體 總量較佳係5至80重量%,特別是1〇至70重量%,其 係以組成物之總固體含量(即,無溶劑之所有組份之量) 為基準計。•,? Τ— (Please read the notes on the back before filling this page) 593357 A7 B7 V. Description of the invention (65 (Please read the notes on the back before filling this page) Fumarate, Triallyl Triphenyl Hexaformate, lauryl (meth) acrylic acid, (fluorenyl) acrylamide and xylene bis (meth) acrylamide. Furthermore, compounds with a hydroxyl group (such as 2-hydroxyl Ethyl (meth) propionic acid, 2-hydroxypropyl (meth) acrylate, and polyethylene glycol mono (meth) propionic acid) and diisocyanates (such as hexamethylidene diisocyanate, The reaction products of toluene diisocyanate and xylene diisocyanate). Particularly preferred are pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate and tris (2-propenyloxyethyl) -isocyanate. Urea. In the color resist composition, the total amount of monomers contained in the photopolymerizable composition is preferably 5 to 80% by weight, especially 10 to 70% by weight. Based on the total solids content of the composition (ie, the amount of all components without solvents) Is the benchmark.

作為用於濾色阻劑組成物之黏著劑,其可溶於鹼水溶 液且不溶於水,例如,於分子内具有一或更多之酸基及一 或更多之可聚合不飽和鍵之可聚合化合物之同聚物,或其 一或更多種之共聚物’及一或更多之具有一或更多之可與 此4化合物共聚合之不飽和鍵之可聚合化合物之共聚物可 被使用。此荨化合物可藉由使一或更多種之於分子内具一 或更多之酸基及一或更多之可聚合不飽和鍵之低分子量化 合物與一或更多之具有一或更多之可與此等化合物共聚合 之不飽和鍵且不含酸基之可聚合化合物共聚合而獲得。酸 基之例子係-COOH基、-S03H基、-S02NHC0-基、酚醛 經基、-S02NH-基及-CO-NH-CO-基。其間,具有-COOH 基之南分子化合物係特別佳。As an adhesive for a color filter composition, it is soluble in an aqueous alkali solution and insoluble in water, for example, it may have one or more acid groups and one or more polymerizable unsaturated bonds in the molecule. Homopolymers of polymerized compounds, or one or more copolymers thereof 'and one or more copolymers of polymerizable compounds having one or more unsaturated bonds copolymerizable with this compound may be use. This compound can be obtained by making one or more low molecular weight compounds having one or more acid groups and one or more polymerizable unsaturated bonds in the molecule and one or more having one or more It can be obtained by copolymerizing an unsaturated bond and an acid group-free polymerizable compound copolymerized with these compounds. Examples of the acid group are -COOH group, -S03H group, -S02NHC0- group, novolac group, -S02NH- group and -CO-NH-CO- group. Among them, the South molecular compound having a -COOH group is particularly preferable.

593357 A7 ____ B7_ 五、發明説明(66 ) 較佳地,濾色阻劑組成物中之有機聚合物黏著劑包含 鹼可溶共聚物,其包含作為可加成聚合單體單元之至少一 不飽和有機酸化合物,諸如,丙烯酸、甲基丙烯酸等。較 佳係使用作為聚合物黏著劑之進一步共單體之不飽和有機 酸酯化合物,諸如,曱基丙烯酸酯、乙基(曱基)丙烯酸酯、 苯甲基(甲基)丙烯酸酯、苯乙烯等,以平衡諸如鹼可溶性、 黏著剛性、耐化學性等之性質。有機聚合物黏著劑可為無 規共聚物或嵌段共聚物,例如,US 5368976所述者。 於分子内具有一或更多之酸基及一或更多之可聚合不 飽和鍵之可聚合化合物之例子包含下列化合物: 丙烯酸、甲基丙烯酸、衣康酸、丁稀酸、馬來酸、乙 烯基苯甲酸及肉桂酸係於分子内具有一或更多之-COOH 基及一或更多之可聚合不飽和鍵之可聚合化合物之例子。 乙烯基苯磺酸及2-(甲基)丙烯醯胺-2-甲基丙烷磺酸係具 有一或更多之-S03H基及一或更多之可聚合不飽和鍵之可 聚合化合物之例子。N-甲基磺醯基(甲基)丙烯醯胺、N-乙 基磺醯基(甲基)丙烯醯胺、N-苯基磺醯基(甲基)丙烯醯胺 及N-(對-曱基苯基磺醯基)(曱基)丙烯醯胺係具有一或更 多之-S02NHC0-基及一或更多之可聚合不飽和鍵之可聚合 化合物之例子。 分子内具有一或更多之羧基及一或更多之可聚合不飽 和鍵之可聚合化合物之例子包含羥基苯基(曱基)丙烯醯 胺、二羥基苯基(曱基)丙烯醯胺、羥基苯基-羰基氧乙基(曱 基)丙烯酸酯、羥基苯基氧乙基(曱基)丙烯酸酯、羥基苯 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 69 (請先閲讀背面之注意事項再填寫本頁) .、可| 593357 A7 B7 五、發明説明(67 ) 基硫代乙基(曱基)丙烯酸酯、二羥基苯基羰基氧乙基(曱 基)丙烯酸酯、二羥基苯基氧乙基(甲基)丙烯酸酯,及二 羥基-苯基硫代乙基(曱基)丙烯酸酯。 分子内具有一或更多之-S02NH-基及一或更多之可聚 合不飽和鍵之可聚合化合物之例子包含以化學式(a)或(b) 表示之化合物·· CH2=CHA1-Y1-A2-S02-NH-A3 (a) CH2=CHA4-Y2-A5-NH-S02-A6 (b) 其中Y!及Y2每一者表示-COO-、_CONA7•或單鍵;Ai及 八4母一者表不Η或CH3 ; A2及A5每一者表示選擇性具有 取代基之q-Cu伸烷基,伸環烷基,伸芳基,或伸芳烷 基,或C2-C12伸烷基,其内係被插入醚基及硫醚基,伸 環烷基,伸芳基,或伸芳烷基;A3及A6每一者表示Η、 選擇性具取代基之q-Cu烷基,環烷基,芳基,芳烷基; 且A7表示Η,選擇性具取代基之crC12烷基,環烷基, 芳基或芳烧基。 具有一或更多之-CO-NH-CO-基及一或更多之可聚合 不飽和鍵之可聚合化合物包含馬來醯亞胺及N-丙烯醯基-丙烯醯胺。此等可聚合化合物變成包含-CO-NH-CO-基之 高分子化合物,其中環與主鏈係藉由聚合反應一起形成。 再者,每一者具有-CO-NH-CO-基之甲基丙烯酸衍生物及 丙烯酸衍生物亦可被使用。此等甲基丙烯酸衍生物及丙烯 酸衍生物包含,例如,甲基丙烯醯胺衍生物,諸如,N-乙醯基甲基丙烯醯胺、N-丙醯基甲基丙烯醯胺、N-丁醯 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 70 (請先閱讀背面之法意事項再填寫本頁)593357 A7 ____ B7_ V. Description of the Invention (66) Preferably, the organic polymer adhesive in the color filter composition contains an alkali-soluble copolymer, which contains at least one unsaturated polymerizable polymerizable monomer unit. Organic acid compounds such as acrylic acid, methacrylic acid, and the like. It is preferable to use unsaturated organic acid ester compounds such as fluorenyl acrylate, ethyl (fluorenyl) acrylate, benzyl (meth) acrylate, styrene as a further co-monomer of the polymer adhesive. Etc. to balance properties such as alkali solubility, adhesive rigidity, chemical resistance, etc. The organic polymer adhesive may be a random copolymer or a block copolymer, for example, as described in US 5368976. Examples of polymerizable compounds having one or more acid groups and one or more polymerizable unsaturated bonds in the molecule include the following compounds: acrylic acid, methacrylic acid, itaconic acid, succinic acid, maleic acid, Vinylbenzoic acid and cinnamic acid are examples of polymerizable compounds having one or more -COOH groups and one or more polymerizable unsaturated bonds in the molecule. Examples of vinylbenzenesulfonic acid and 2- (meth) acrylamido-2-methylpropanesulfonic acid polymerizable compounds having one or more -S03H groups and one or more polymerizable unsaturated bonds . N-methylsulfonyl (meth) acrylamide, N-ethylsulfonyl (meth) acrylamide, N-phenylsulfonyl (meth) acrylamide, and N- (p- An example of a fluorenylphenylsulfonyl) (fluorenyl) acrylamide is a polymerizable compound having one or more -S02NHC0- groups and one or more polymerizable unsaturated bonds. Examples of polymerizable compounds having one or more carboxyl groups and one or more polymerizable unsaturated bonds in the molecule include hydroxyphenyl (fluorenyl) acrylamide, dihydroxyphenyl (fluorenyl) acrylamine, Hydroxyphenyl-carbonyloxyethyl (fluorenyl) acrylate, hydroxyphenyloxyethyl (fluorenyl) acrylate, hydroxybenzene Paper size applies to Chinese National Standard (CNS) A4 specification (210X297 mm) 69 (Please (Please read the notes on the back before filling this page). 、 可 | 593357 A7 B7 V. Description of the invention (67) thiothioethyl (fluorenyl) acrylate, dihydroxyphenylcarbonyloxyethyl (fluorenyl) acrylic acid Esters, dihydroxyphenyloxyethyl (meth) acrylates, and dihydroxy-phenylthioethyl (fluorenyl) acrylates. Examples of polymerizable compounds having one or more -S02NH- groups and one or more polymerizable unsaturated bonds in the molecule include compounds represented by the chemical formula (a) or (b). CH2 = CHA1-Y1- A2-S02-NH-A3 (a) CH2 = CHA4-Y2-A5-NH-S02-A6 (b) where Y! And Y2 each represent -COO-, _CONA7 • or a single bond; Ai and eight 4 mother One represents 表 or CH3; each of A2 and A5 represents a q-Cu alkylene, cycloalkylene, alkylene, or alkylene, or C2-C12 alkylene which optionally has a substituent. In which, ether and thioether groups, cycloalkyl, arylene, or aralkyl are inserted; each of A3 and A6 represents Η, optionally a q-Cu alkyl group having a substituent, a ring Alkyl, aryl, aralkyl; and A7 represents fluorene, optionally substituted crC12 alkyl, cycloalkyl, aryl, or arylalkyl. Polymerizable compounds having one or more -CO-NH-CO- groups and one or more polymerizable unsaturated bonds include maleimide and N-propenyl-propenylamine. These polymerizable compounds become polymer compounds containing -CO-NH-CO- groups in which a ring and a main chain system are formed together by a polymerization reaction. Furthermore, methacrylic acid derivatives and acrylic acid derivatives each having a -CO-NH-CO- group can also be used. These methacrylic acid derivatives and acrylic acid derivatives include, for example, methacrylamide derivatives such as N-ethylmethylmethacrylamide, N-propylmethylmethacrylamine, N-butyl纸张 This paper size applies to China National Standard (CNS) A4 (210X297 mm) 70 (Please read the legal notices on the back before filling in this page)

-、tr— ---— 87_____ 593357 A7 五、發明説明(68 ) 基曱基丙烯醯胺、N-戊醯基甲基丙烯醯胺、沁癸醯基曱 基丙烯醯胺、N-十二烷醯基曱基丙烯醯胺、N—苯曱醯基 甲基丙烯醯胺、N-(對-甲基苯甲醯基)甲基丙烯醯胺、N_(對 -氯苯甲醯基)甲基丙烯醯胺、N_(萘基_羰基)甲基丙烯醯 胺、N-(苯基乙醯基)-甲基丙烯醯胺及‘甲基丙烯醯基胺 基欧酿亞胺’及具有與此等相同取代基之丙烯醯胺衍生 物。此等可聚合化合物聚合成於側鏈具-C〇-NH-C〇—基之 化合物。 具有一或更多之可聚合不飽和鍵且不含酸基之可聚合 化合物之例子包含具有可聚合不飽和鍵之化合物,選自(甲 基)丙烯酸酯、(曱基)丙烯醯胺、丙烯化合物、乙烯基醚、 乙烯基酯及丁烯酸酯,且特別地係包含(甲基)丙烯酸酯, 諸如,烷基(甲基)丙烯酸酯或被取代之烷基(甲基)丙烯酸 酯(例如,甲基(甲基)丙烯酸酯、乙基(甲基)丙烯酸酯、丙 基(甲基)丙烯酸酯、異丙基(曱基)丙烯酸酯、丁基(甲基) 丙烯酸酯、戊基(甲基)丙烯酸酯、己基(甲基)丙烯酸酯、 環己基(甲基)丙烯酸酯、乙基己基(甲基)丙烯酸酯、辛基(甲 基)丙烯酸酯、第三辛基(甲基)丙烯酸酯、氯-乙基(甲基) 丙烯酸酯、烯丙基(甲基)丙烯酸酯、2·羥基-乙基(曱基)丙 烯酸酯、2-羥基丙基(曱基)丙烯酸酯、4-羥基丁基(甲基) 丙烯酸酯、2,2-二曱基-3-羥基-丙基(甲基)丙烯酸酯、5-羥 基戊基(甲基)丙烯酸酯、三甲基醇丙烷單(甲基)丙烯酸酯、 季戊四醇單(甲基)丙烯酸酯、苯甲基(曱基)丙烯酸酯、甲 氧基-苯甲基(甲基)丙烯酸酯、氯苯甲基(曱基)丙烯酸酯、 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) .?τ_ 71 593357 A7 — __ B7_ 五、發明説明(69 ) 咬喃基(甲基)丙烯酸酯、四氫呋喃基(曱基)丙烯酸酯、戊 氧基乙基(曱基)丙烯酸酯及芳基(曱基)丙烯酸酯(例如,苯 基(甲基)丙烯酸酯、曱苯基(甲基)丙烯酸酯及萘基(曱基) 丙烯酸酯);(甲基)丙烯醯胺,諸如,(甲基)丙烯基_醯胺、 N-烧基(曱基)丙婦酿胺(此烧基包含,例如,甲基、乙基、 丙基、丁基、第二丁基、庚基、辛基、乙基己基、環己基、 經基乙基及苯甲基)、N-芳基(甲基)丙稀醯胺(此芳基包含, 例如,苯基、甲苯基、硝基苯基、萘基及羥基苯基)、n,N-二烷基(甲基)丙烯醯胺(此烷基包含,例如,甲基、乙基、 丁基、異丁基、乙基己基及環己基)、N,N-二芳基(曱基) 丙烯醯胺(此芳基包含,例如,苯基)、N-甲基-N-苯基(曱 基)丙烯醯胺、N-羥基乙基-N-曱基(甲基)丙烯醯胺、N-2-乙醯基醯胺乙基乙醯基(甲基)丙烯醯胺、N-(苯基磺醯 基)(甲基)丙烯醯胺及N_(對-甲基苯基_磺醯基)(甲基)丙 烯醯胺,及N-(對-甲基苯基-磺醯基)(甲基)丙烯醯胺; 烯丙基化合物,諸如,烯丙基酯(例如,烯丙基乙酸酯、 烯丙基己酸酯、烯丙基辛酸酯、烯丙基月桂酸酯、辛丙基 棕搁酸酯、烯丙基硬脂酸酯、烯丙基苯甲酸酯、烯丙基乙 醯乙酸酯及烯丙基乳酸酯),及烯丙基氧乙醇; 乙稀基醚,諸如,烧基乙稀基醚(此烧基包含,例如,己 基、辛基、癸基、乙基己基、甲氧基乙基、乙氧基乙基、 氣乙基、1-甲基-2,2-二曱基丙基、2-乙基丁基、羥基乙基、 羥基乙氧基乙基、二曱基胺基乙基、二乙基胺基乙基、丁 基胺基乙基、苯甲基及四氫呋喃基),及乙烯基芳基醚(此 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 72 (請先閲讀背面之注意事項再填寫本頁)-、 Tr— ---— 87_____ 593357 A7 V. Description of the invention (68) methacrylamide, N-pentylmethylmethacrylamine, decdecylmethylacrylamide, N-dodecyl Alkyl fluorenyl acrylamide, N-phenyl fluorenyl methacrylamide, N- (p-methylbenzyl) methacrylamide, N_ (p-chlorobenzyl) methyl Methacrylamide, N_ (naphthyl_carbonyl) methacrylamide, N- (phenylethylfluorenyl) -methacrylamide and 'methacrylmethylaminoimine' and have Acrylamide derivatives of these same substituents. These polymerizable compounds are polymerized into compounds having -C0-NH-C0- groups in the side chain. Examples of the polymerizable compound having one or more polymerizable unsaturated bonds and not containing an acid group include compounds having a polymerizable unsaturated bond selected from (meth) acrylates, (fluorenyl) acrylamide, propylene Compounds, vinyl ethers, vinyl esters, and butyrates, and in particular include (meth) acrylates, such as alkyl (meth) acrylates or substituted alkyl (meth) acrylates ( For example, meth (meth) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, isopropyl (fluorenyl) acrylate, butyl (meth) acrylate, pentyl (Meth) acrylate, hexyl (meth) acrylate, cyclohexyl (meth) acrylate, ethylhexyl (meth) acrylate, octyl (meth) acrylate, third octyl (meth) ) Acrylate, chloro-ethyl (meth) acrylate, allyl (meth) acrylate, 2 · hydroxy-ethyl (fluorenyl) acrylate, 2-hydroxypropyl (fluorenyl) acrylate, 4-hydroxybutyl (meth) acrylate, 2,2-di Fluorenyl-3-hydroxy-propyl (meth) acrylate, 5-hydroxypentyl (meth) acrylate, trimethylolpropane mono (meth) acrylate, pentaerythritol mono (meth) acrylate, Benzyl (fluorenyl) acrylate, methoxy-benzyl (meth) acrylate, chlorobenzyl (fluorenyl) acrylate, this paper size applies to China National Standard (CNS) A4 specifications (210X297) (%) (Please read the notes on the back before filling this page).? Τ 71 71 593357 A7 — __ B7_ V. Description of the invention (69) oleyl (meth) acrylate, tetrahydrofuryl (fluorenyl) acrylate, Amyloxyethyl (fluorenyl) acrylate and aryl (fluorenyl) acrylate (eg, phenyl (meth) acrylate, fluorenyl (meth) acrylate and naphthyl (fluorenyl) acrylate ); (Meth) acrylamide, such as (meth) acryl-amidine, N-alkyl (fluorenyl) propanamine (this alkyl group contains, for example, methyl, ethyl, propyl , Butyl, second butyl, heptyl, octyl, ethylhexyl, cyclohexyl, triethyl and (Methyl), N-aryl (meth) propylamine (this aryl group includes, for example, phenyl, tolyl, nitrophenyl, naphthyl, and hydroxyphenyl), n, N-dialkyl (Meth) acrylamide (this alkyl group includes, for example, methyl, ethyl, butyl, isobutyl, ethylhexyl, and cyclohexyl), N, N-diaryl (fluorenyl) acrylamide (This aryl group includes, for example, phenyl), N-methyl-N-phenyl (fluorenyl) acrylamide, N-hydroxyethyl-N-fluorenyl (meth) acrylamide, N-2 -Ethylamidinoethylethylethyl (meth) acrylamide, N- (phenylsulfonyl) (meth) acrylamide and N_ (p-methylphenyl_sulfonyl) ( Methacrylamide, and N- (p-methylphenyl-sulfonyl) (meth) acrylamide; allyl compounds, such as allyl esters (eg, allyl acetate , Allylhexanoate, allyl caprylate, allyl laurate, capryl palmitate, allyl stearate, allyl benzoate, allyl acetoacetate Esters and allyl lactates), and allyloxyethanol; ethylene ethers, such as Alkylene ether (this alkyl group contains, for example, hexyl, octyl, decyl, ethylhexyl, methoxyethyl, ethoxyethyl, ethyl, 1-methyl-2, 2-Dimethylaminopropyl, 2-ethylbutyl, hydroxyethyl, hydroxyethoxyethyl, dimethylaminoethyl, diethylaminoethyl, butylaminoethyl, benzene Methyl and tetrahydrofuryl), and vinyl aryl ether (this paper size applies to China National Standard (CNS) A4 specification (210X297 mm) 72 (Please read the precautions on the back before filling this page)

593357 A7 £7_ 五、發明説明(7〇 ) 芳基包含,例如,苯基、曱苯基、氯苯基、2,4-二氣-苯 基、萘基及蒽基); (請先閲讀背面之注意事項再填寫本頁) 乙稀基醋,諸如,乙稀基丁酸醋、乙烯基異丁酸酯、乙稀 基三甲基乙酸酯、乙烯基二乙基-乙酸酯、乙烯基硼酸酯、 乙烯基己酸酯、乙烯基氣-乙酸酯、乙烯基二氯乙酸酯、 乙烯基甲氧基乙酸酯、乙烯基丁氧基乙酸酯、乙烯基苯基 乙酸酯、乙烯基乙醯乙酸酯、乙烯基乳酸酯、乙烯基-b-苯基丁酸酯、乙烯基氣己基羧酸酯、乙烯基苯甲酸酯、乙 烯基水楊酸酯、乙烯基氯苯曱酸酯、乙烯基四氣笨甲酸酯, 及乙烯基萘酸酯。 苯乙浠,諸如,苯乙稀、烧基苯乙稀(例如’曱基苯乙婦、 二甲基苯乙烯、三甲基苯乙烯、乙基苯乙烯、二乙基苯乙 烯、異丙基苯乙烯、丁基苯乙烯、己基苯乙烯、環己基苯 乙烯、癸基苯乙烯、苯甲基苯乙烯、氯甲基苯乙烯、三氟 -甲基苯乙烯、乙氧基甲基苯乙烯,及乙醯氧基甲基苯乙 烯)、烷氧基苯乙烯(例如,甲氧基苯乙烯、4_甲氧基曱 基苯乙烯,及二甲氧基苯乙烯),及齒基苯乙烯(例如,氣 苯乙烯、二氯苯乙烯、三氯苯乙烯、四氯苯乙烯、五氣苯 乙烯、溴苯乙烯、二溴苯乙烯、碘苯乙烯、氟苯乙烯、三 氟苯乙烯、2-溴-4-三氟甲基苯乙烯,及4-氟-3-三氟甲基 苯乙烯); 丁烯酸酯,諸如,烷基丁烯酸酯(例如,丁基丁烯酸酯、 己基丁烯酸酯,及甘醇單丁烯酸酯); 二烧基衣康酸酯(例如’二甲基衣康酸醋、二乙基衣康酸 本紙張尺度適用中國國家標準(°^) A4規格(210x297公爱) 73 593357 A7 _B7_ 五、發明説明(71 ) 酯,及二丁基衣康酸酯); 二烷基馬來酸酯或福馬酸酯(例如,二曱基馬來酸酯及二 丁基福馬酸酯);及 (甲基)丙烯腈。 亦可使用羥基苯乙烯之同-或共·聚物,或酚醛清漆型 酚樹脂,例如,聚(羥基苯乙烯)及聚(羥基苯乙烯-共-乙烯 基環己醇)、酚醛清漆樹脂、甲酚酚醛清漆樹脂,及鹵化 酚酚醛清漆樹脂。更特別地,其包含,例如,甲基丙烯酸 共聚物、丙烯酸共聚物、衣康酸共聚物、丁烯酸共聚物、 馬來酸酐共聚物,例如,以苯乙烯作為共單體,及馬來酸 共聚物,及部份酯化之馬來酸共聚物,每一者係描述於, 例如,JP 59-44615-B4(“JP-B4”一辭於此被使用時係指被 審查之日本專利公告案)、JP 54-34327-B4、JP-58-12577-B4,及 JP 54-25957-B4,JP 59-53836-A、JP 59-71048-A、 JP 60-159743-A、JP 60-258539-A、JP 1-152449-A、JP 2_ 199403-A及JP 2-199404-A,且共聚物可進一步與胺反應, 例如,US 5650263中所揭示,進一步地,於側鏈上具有 羧基之纖維素衍生物可被使用,且特別佳係苯甲基(曱基) 丙烯酸酯及(曱基)丙烯酸之共聚物及苯甲基(甲基)丙烯酸 醋、(甲基)丙烯酸及其它單體之共聚物,例如,於US 4139391、JP 59-44615-B4、JP 60-159743-A 及 JP 60-258539-A中所述者。 有關於上述有機黏著劑聚合物中之具有羧酸基者,其 可使某些或全部之羧酸基與縮水甘油基(甲基)丙烯酸酯或 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁)593357 A7 £ 7_ V. Description of the invention (70) Aryl includes, for example, phenyl, fluorenyl, chlorophenyl, 2,4-digas-phenyl, naphthyl, and anthracenyl; (Please read first Note on the back, please fill in this page again) Ethyl vinegar, such as ethylene butyrate, vinyl isobutyrate, ethylene trimethyl acetate, vinyl diethyl-acetate, Vinyl borate, vinyl hexanoate, vinyl gas-acetate, vinyl dichloroacetate, vinylmethoxyacetate, vinylbutoxyacetate, vinylphenyl Acetate, vinyl acetoacetate, vinyl lactate, vinyl-b-phenyl butyrate, vinyl gas hexyl carboxylate, vinyl benzoate, vinyl salicylate , Vinyl chlorobenzoate, vinyl tetrabenzate, and vinyl naphthalate. Stilbene, such as stilbene, stilbene (eg, stilbene, dimethylstyrene, trimethylstyrene, ethylstyrene, diethylstyrene, isopropyl Styrene, butylstyrene, hexylstyrene, cyclohexylstyrene, decylstyrene, benzylstyrene, chloromethylstyrene, trifluoro-methylstyrene, ethoxymethylstyrene, And ethoxymethylstyrene), alkoxystyrene (for example, methoxystyrene, 4-methoxyfluorenylstyrene, and dimethoxystyrene), and dentylstyrene ( For example, aerostyrene, dichlorostyrene, trichlorostyrene, tetrachlorostyrene, pentafluorostyrene, bromostyrene, dibromostyrene, iodostyrene, fluorostyrene, trifluorostyrene, 2- Bromo-4-trifluoromethylstyrene, and 4-fluoro-3-trifluoromethylstyrene); butenoates, such as alkyl butenoates (eg, butyl butenoates, hexyl) Butenoates, and glycol monobutenoates); Di-based itaconate (such as' dimethyl itaconic acid vinegar, diethyl itaconic acid) This paper is suitable for this paper National standard (° ^) A4 specification (210x297 public love) 73 593357 A7 _B7_ V. Description of the invention (71) Ester, and dibutyl itaconic acid ester); Dialkyl maleate or fumarate (for example , Difluorenyl maleate and dibutyl fumarate); and (meth) acrylonitrile. Homo- or co-polymers of hydroxystyrene, or novolac-type phenol resins, such as poly (hydroxystyrene) and poly (hydroxystyrene-co-vinylcyclohexanol), novolac resin, Cresol novolac resin, and halogenated phenol novolac resin. More specifically, it includes, for example, a methacrylic acid copolymer, an acrylic acid copolymer, an itaconic acid copolymer, a butenoic acid copolymer, a maleic anhydride copolymer, for example, styrene as a comonomer, and maleic Acid copolymers, and partially esterified maleic acid copolymers, each of which is described in, for example, JP 59-44615-B4 ("JP-B4" as used herein refers to the Japan under review Patent Bulletin), JP 54-34327-B4, JP-58-12577-B4, and JP 54-25957-B4, JP 59-53836-A, JP 59-71048-A, JP 60-159743-A, JP 60-258539-A, JP 1-152449-A, JP 2_ 199403-A, and JP 2-199404-A, and the copolymer can be further reacted with an amine, for example, as disclosed in US 5650263, further on the side chain A cellulose derivative having a carboxyl group can be used, and particularly preferably a copolymer of benzyl (fluorenyl) acrylate and (fluorenyl) acrylic acid and benzyl (meth) acrylic acid vinegar, (meth) acrylic acid, and Copolymers of other monomers, for example, as described in US 4139391, JP 59-44615-B4, JP 60-159743-A, and JP 60-258539-A. Regarding those having carboxylic acid groups in the above-mentioned organic adhesive polymer, it can make some or all of the carboxylic acid groups and glycidyl (meth) acrylates or the paper size applicable to China National Standard (CNS) A4 specifications (210X297 mm) (Please read the notes on the back before filling this page)

74 593357 A7 _B7_ 五、發明説明(72 ) 環氧(甲基)丙烯酸酯反應,以獲得用以改良光敏性、塗覆 物膜強度、塗覆物溶劑及化學之抗性及對基材之黏著性之 可光聚合有機黏著劑聚合物。例子係揭示於JP 50-34443-B4 及 JP 50-34444-B4、US 5153095、T. Kudo 等人之 J· Appl· Phys·,第 37 冊(1998),第 3594-3603 頁、US 5677385 及 US 5650233 〇 黏著劑之重量平均分子量較佳係500至1,000,000, 例如,3,000 至 1,000,000,更佳係 5,000 至 400,000。 此等化合物可單獨或以二或更多種之混合物使用。光 敏性樹脂組成物内之黏著劑含量較佳係10至95重量%, 更佳係15至90重量%,其係以全部固體物料為基準計。 再者,於濾色器中,每一顏色之總固體組份可含有離 子性雜質清除劑,例如,具環氧基之有機化合物。總固體 組份内之離子性雜質清除劑之濃度一般係0.1重量%至10 重量%之範圍。濾色器之例子,特別是有關於上述之色料 及離子性雜質清除劑之結合,係示於EP 320264。需瞭解 於EP 320264中所述濾色器組成物内之依據本發明之光引 發劑,即,化學式I、II及III之化合物可取代三嗪引發 劑化合物。 依據本發明之組成物可另外包含藉由酸活化之交聯劑 (例如,JP 10 221843-A所述)及藉由熱或藉由光化輻射產 生酸且活化交聯作用之化合物。依據本發明之組成物亦可 包含潛色料,其於含有光敏性圖案或塗覆物之潛色料熱處 理期間轉化成極佳分散之色料。熱處理可於曝光後或含潛 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) .訂- 75 593357 A7 _____B7_ 五、發明説明(73 ) 色料可以光形成影像之層顯影後施行。此潛色料係可溶性 色料先質,其可藉由,例如,US 5879855所述之化學、 熱、光解或輻射誘發方法轉化成不可溶之色料。此潛色料 之轉化可藉由添加於光化曝光時產生酸之化合物或藉由添 加酸性化合物至組成物而促進。因此,濾色阻劑亦可被製 備,其包含於依據本發明之組成物中之潛色料。 濾色阻劑之例子、此等阻劑之組成物及處理條件係示 於 T· Kudo 等人之 Jpn. J· Appl. Phys·第 37 冊(1998)3594Τ· Kudo 等人之 J. Photopolym. Sci. Technol·第 9 冊(1996) 109; Κ· Kobayashi 之 Solid State Technol. 1992,第 S15-S18 頁;US 5368976 ; US 5800952 ; US 5882843 ; US 5879855 ; US 5866298 ; US 5863678 ; JP 06-230212-A ; EP 320264 ; JP 09-269410-A ; JP 10-221843-A ; JP 01-090516-A ; JP 10-171119-A ; US 5821016 ; US 5847015 ; US 5882843 ; US 5719008 ; EP 881541 或 EP 902327。本發明之光引發 劑可用於渡色阻劑,例如,如上所例示者,或可部份或完 全取代於此阻劑内之已知光引發劑。熟習此項技藝者能瞭 解本發明新穎光引發劑之使用不限於如上所述之濾色阻劑 例子之特殊黏著劑樹脂、交聯劑及組成物,亦可結合與染 料或色料或潛色料混合之任何可基聚合之組成物而使用以 形成光敏性濾色墨水或濾色阻劑。 因此,本發明標的亦係一種藉由提供紅、綠及藍色 元素及選擇性之黑色基質而製得之濾色器,所有皆包含位 於透明基材上之光敏性樹脂及色料,且於基材表面上或濾 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) (請先閲讀背面之注意事項再填寫本頁) 7 76 - 593357 A7 I—-------—_ B7 —__ 五、發明説明(74 ) 色層表面上提供透明電極,其中該光敏性樹脂包含如上所 述之多官能性丙烯酸酯單體、有機聚合物黏著劑及化學式 I、II或ΠΙ之光聚合引發劑。單體及黏著劑組份與適當色 料係如上所述。於濾色器之製備中,透明電極層可被塗敷 於透明基材表面上,或可於紅、綠及藍色像素及黑色基質 之表面上提供。透明基材係,例如,玻璃基材,其可另外 於其表面上具有電極層。較佳係於不同顏色之顏色區域間 塗敷黑色基質,以提供濾色器對比。 除使用光敏性組成物形成黑色基質及藉由形成圖案方 式之曝光(即,經由適當遮罩)使黑色光敏性組成物形成圖 案以於透明基質上形成分隔紅、綠及藍色區域之黑色圖案 外,其另外可使用無機黑色基質。此無機黑色基質可自藉 由適當形成影像方法(例如,使用藉由餘刻阻劑之照相石 版術形成圖案,蝕刻未受蝕刻阻劑保護區域内之無機層, 然後移除剩餘钱刻阻劑)於透明基質上沈積(即,噴賤)金 屬(即,鉻)膜而形成。 已有數種不同方法知道如何及於濾色器製備方法中之 那一步驟施用此黑色基質。其可於形成如上所述之紅、綠 及藍(RGB)濾色器前直接塗敷於透明基材上,或其亦可於 RGB濾色器於基材上形成後塗敷。 於用於液晶顯示器之濾色器之不同具體例,依據us 5626796,黑色基質亦可被塗敷於相對於載負RGB濾色元 素之基材之基材上,其等係以液晶層分隔。 若透明電極層於塗敷RGB濾色元素及選擇性之黑色 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) :77 - 一— (請先閲讀背面之注意事項再填寫本頁) .裝· 、一-T— :線丨 593357 A7 __ B7 五、發明説明(75 ) 基質後被沈積,作為保護層之額外防護膜可於沈積電極層 前塗敷於滤色層上,例如,US 5650263所述。 為形成濾色器之防護層,光敏性樹脂或熱固性樹脂組 成物被使用。本發明之光敏性組成物亦可被用以形成此防 護層,因為此組成物之固化膜於平直度、硬度、耐化學性 及耐熱性、透明度(特別是於可見光區域)、對基材之黏著 性及於其上形成透明透性膜(例如,IT〇膜)之適當性係優 異的。於保護層之製備,已要求保護層之非必要部份(例 如,用以切割基材之標記線上及立體影像感應器之結合墊 上)需自基材移除,如JP57-42009-A、JP1-130103-A及 JP1-134306-A所述。關於此事,係難以使用上述熱固性 樹脂以極佳精確性選擇性地形成保護層。但是,光敏性組 成物能藉由照相石版術輕易移除保護層之非必需部份。 對熟習此項技藝者顯而易知的是本發明之光敏性組成 物可被用以產生紅、綠及藍色像素及黑色基質,用於製備 濾色器,而無論上述加工處理上之差異,可被塗敷之額外 層及;慮色器设计上之差異。使用依據本發明之組成物形成 彩色元素不應受不同設計及此等濾色器之製備方法所限 本發明之光敏性組成物可適用於形成濾色器,但不限 於此應用。其亦可用於記錄性材料、阻劑材料、保護層、 介電層、顯示器應用及顯示器元素、塗料及印刷墨水。 依據本發明之光敏性組成物亦適於製備液晶顯示器 (更特別係反射型液晶顯示器,包含具有作為開關元件之 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐) 78 (請先閲讀背面之注意事項再填寫本頁) ★- 59335774 593357 A7 _B7_ V. Description of the invention (72) Epoxy (meth) acrylate reaction to obtain photosensitivity, coating film strength, coating solvent and chemical resistance, and adhesion to substrate Photopolymerizable organic adhesive polymer. Examples are disclosed in JP 50-34443-B4 and JP 50-34444-B4, US 5153095, T. Kudo et al. J. Appl. Phys., Volume 37 (1998), pages 3594-3603, US 5677385 and The weight average molecular weight of the US 5650233 0 adhesive is preferably 500 to 1,000,000, for example, 3,000 to 1,000,000, and more preferably 5,000 to 400,000. These compounds may be used alone or as a mixture of two or more. The content of the adhesive in the photosensitive resin composition is preferably 10 to 95% by weight, more preferably 15 to 90% by weight, and it is based on all solid materials. Furthermore, in the color filter, the total solid component of each color may contain an ionic impurity scavenger, such as an organic compound having an epoxy group. The concentration of the ionic impurity scavenger in the total solid component is generally in the range of 0.1% to 10% by weight. Examples of color filters, particularly the combination of the aforementioned colorants and ionic impurity scavengers, are shown in EP 320264. It is to be understood that the photoinitiator according to the present invention in the color filter composition described in EP 320264, that is, the compounds of Chemical Formulas I, II, and III may replace the triazine initiator compound. The composition according to the present invention may further include a cross-linking agent activated by an acid (for example, described in JP 10 221843-A) and a compound which generates an acid by heat or by actinic radiation and activates a cross-linking effect. The composition according to the present invention may also contain a latent colorant, which is converted into an excellently dispersed colorant during the heat treatment of the latent colorant containing the photosensitive pattern or coating. The heat treatment can be applied after exposure or latent paper size to the Chinese National Standard (CNS) A4 specification (210X297 mm) (please read the precautions on the back before filling this page). Order-75 593357 A7 _____B7_ V. Description of the invention ( 73) The colorant can be applied after the image-forming layer is developed. This latent colorant is a soluble colorant precursor which can be converted into an insoluble colorant by, for example, a chemical, thermal, photolytic or radiation-induced method as described in US 5879855. The conversion of the latent colorant can be promoted by adding a compound that generates an acid during actinic exposure or by adding an acidic compound to the composition. Therefore, a color filter can also be prepared, which is a latent colorant contained in the composition according to the present invention. Examples of color filter inhibitors, their composition and processing conditions are shown in T. Kudo et al. Jpn. J. Appl. Phys. Volume 37 (1998) 3594T. Kudo et al. J. Photopolym. Sci. Technol. Volume 9 (1996) 109; K. Kobayashi's Solid State Technol. 1992, pages S15-S18; US 5368976; US 5800952; US 5882843; US 5879855; US 5866298; US 5863678; JP 06-230212 -A; EP 320264; JP 09-269410-A; JP 10-221843-A; JP 01-090516-A; JP 10-171119-A; US 5821016; US 5847015; US 5882843; US 5719008; EP 881541 or EP 902327. The photoinitiator of the present invention can be used in a color-blocking agent, for example, as exemplified above, or a known photoinitiator that can be partially or completely replaced in the resist. Those skilled in the art can understand that the use of the novel photoinitiator of the present invention is not limited to the special adhesive resins, cross-linking agents and compositions of the color filter examples described above, but can also be combined with dyes or colorants or latent colors. Any polymerizable composition is used to form a photosensitive color filter ink or a color filter. Therefore, the subject of the present invention is also a color filter made by providing red, green, and blue elements and a selective black matrix, all of which include a photosensitive resin and a colorant on a transparent substrate, and On the surface of the substrate or the size of the filter paper, the Chinese National Standard (CNS) A4 specification (210X297 mm) is applicable (please read the precautions on the back before filling this page) 7 76-593357 A7 I —------- —_ B7 —__ 5. Description of the invention (74) A transparent electrode is provided on the surface of the color layer, wherein the photosensitive resin contains the polyfunctional acrylate monomer as described above, an organic polymer adhesive and chemical formula I, II or ΠΙ. Photopolymerization initiator. The monomer and adhesive components and suitable pigments are as described above. In the preparation of a color filter, a transparent electrode layer may be coated on the surface of a transparent substrate, or may be provided on the surface of red, green, and blue pixels and a black matrix. The transparent substrate is, for example, a glass substrate, which may additionally have an electrode layer on its surface. A black matrix is preferably applied between the color areas of different colors to provide a color filter contrast. In addition to using a photosensitive composition to form a black matrix and patterning the black photosensitive composition by patterning exposure (ie, through appropriate masking) to form a black pattern that separates red, green, and blue areas on a transparent substrate In addition, it can additionally use an inorganic black matrix. This inorganic black matrix can be patterned by appropriate imaging methods (for example, using photolithography with a residual resist to etch an inorganic layer in an area not protected by the resist, and then remove the remaining resist. ) Formed by depositing (ie, spraying) a metal (ie, chromium) film on a transparent substrate. Several different methods are known how and how to apply this black matrix at one step in the color filter preparation method. It can be applied directly on a transparent substrate before forming the red, green and blue (RGB) color filters as described above, or it can also be applied after the RGB color filters are formed on the substrate. In different specific examples of color filters for liquid crystal displays, according to us 5626796, a black matrix can also be coated on a substrate opposite to a substrate carrying RGB color filter elements, which are separated by a liquid crystal layer. If the transparent electrode layer is coated with RGB color filter elements and selective black, the paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm): 77-I-(Please read the precautions on the back before filling this page ). Equipment, one-T—: line 丨 593357 A7 __ B7 V. Description of the invention (75) After the substrate is deposited, an additional protective film as a protective layer can be applied to the color filter layer before the electrode layer is deposited, for example No. 5,650,263. To form a protective layer for a color filter, a photosensitive resin or a thermosetting resin composition is used. The photosensitive composition of the present invention can also be used to form the protective layer, because the cured film of the composition has flatness, hardness, chemical resistance and heat resistance, transparency (especially in the visible light region), and the substrate. The adhesiveness and the suitability for forming a transparent transparent film (for example, an IT0 film) thereon are excellent. In the preparation of the protective layer, non-essential parts of the protective layer (for example, marking lines for cutting the substrate and the bonding pad of the stereo image sensor) must be removed from the substrate, such as JP57-42009-A, JP1 -130103-A and JP1-134306-A. In this connection, it is difficult to selectively form a protective layer with excellent accuracy using the above-mentioned thermosetting resin. However, the photosensitive composition can easily remove unnecessary portions of the protective layer by photolithography. It is obvious to those skilled in the art that the photosensitive composition of the present invention can be used to generate red, green, and blue pixels and a black matrix for preparing a color filter, regardless of the above-mentioned processing differences. , Can be coated with additional layers and; take into account differences in color device design. The use of the composition according to the present invention to form a color element should not be limited by different designs and the methods of preparing these color filters. The photosensitive composition of the present invention can be used to form a color filter, but is not limited to this application. It can also be used in recording materials, resist materials, protective layers, dielectric layers, display applications and display elements, coatings and printing inks. The photosensitive composition according to the present invention is also suitable for preparing a liquid crystal display (more specifically, a reflective liquid crystal display, which includes a paper sheet having a switching element that is a Chinese standard (CNS) A4 specification (210X297 mm) 78 (please (Read the notes on the back and fill in this page) ★-593357

發明説明 薄膜電晶體(TFT)之活性基質型顯示器及無開關元件之鈍 性基質型)之層間之絕緣層或介電層。 (請先閲讀背面之注意事項再填寫本頁) •、tr— —線丨 近年來,液晶顯示器藉由其小厚度及輕重量已被廣泛 用於,例如,口袋型電視機及通訊終端裝置。無需使用背 面光之反射型液晶顯示器係特別需要,因其特別薄且重量 輕,且其可顯著降低動力消耗。但是,即使背面光自現今 使用之透射型彩色液晶顯示器且光反射板被添加至顯示器 之下較面,其會因使用光之效率低而造成問題,且其不可 能具有實用之亮度。作為此問題之解決方式,已建議各種 不同反射型液晶顯示器以促進使用光線之效率。例如,某 反射型液晶顯示器被設計成包含具反射作用之像素電極。 此反射型液晶顯示器包含絕緣基材及與此絕緣基材隔開之 相對基材。基材間之間隔以液晶填充。閘電極於絕緣基材 上形成’且間電極及絕緣基材皆以閘絕膜覆蓋。然後,半 導體層於閘電極上之閘絕緣膜上形成。源電極及漏電極亦 於與半導體層接觸之閘絕緣膜上形成。源電極、漏電極、 半導體層及閘電極彼此合作藉此構成作為開關元件之底閘 型式TFT。層間絕緣膜被形成,其係覆蓋源電極、漏電極、 半導體層及閘絕緣膜。接觸孔於漏電極上之層間絕緣膜各 處形成。由鋁製得之像素電極於層間絕緣膜上及接觸孔之 内側壁上形成。TFT之漏電極最後經由層間絕緣膜與像素 電極接觸。層間絕緣膜一般被設計成具有粗糙化表面,藉 此像素電極可作為反射板,其使光線擴散以獲得更廣之觀 看角度(可見角度)。藉由像素電極作為光反射板,反射型 本紙張尺度i用中國國家標準(CNS) A4規格(210χ297公爱) 593357 A7 B7 五、發明説明(77 ) (請先閱讀背面之注意事項再填寫本頁) 液晶顯示器顯著地促進使用光線之效率。於上述反射型液 晶顯示器中,藉由照相石版術,層間絕緣膜被設計成具有 凸部及凹部。為形成及控制表面粗糙之微米級細微形狀之 凸部及凹部及形成接觸孔,使用正及負光阻劑之照相石版 術方法被使用。對於此等阻劑,依據本發明之組成物係特 別適合。 .、訂· 豢, 依據本發明之光敏性組成物可進一步被用於製備分隔 件’其係控制液晶顯示板内之液晶部份之元件間隙。因為 經由液晶顯示器内之液晶層透射或反應之光線之性質係依 元件間隙而定,像素陣列上之厚度正確性及均一性對於液 晶顯示器單元之性能係重要參數。於液晶元件中,元件内 之基材間之間隔藉由稀疏地分佈約數微米直徑之玻璃或聚 合物球作為基材間之分隔件而維持固定。分隔件因而被保 持於基材間以使基材間之距離保持固定值。此距離係藉由 分隔件直徑決定。此等分隔件確保基材間之最小間隔,即, 其避免基材間之距離減少。但是,其不能避免基材彼此被 分隔開’即’基材間之距離增加。另外,此使用分隔球材 之方法具有分隔球材直徑均一性及面板上之分隔球材均勻 分散困難及不均一位向與亮度及/或光學孔徑(其係依像素 陣列區域上之分隔件位置而定)減少等問題。具有大影像 顯示區域之液晶顯示器最近吸引更大之注意力。但是,液 晶單元區域增加一般產生構成此單元之基材變形。液晶之 層結構易由於基材變形而被破壞。因此,即使分隔件被用 以使基材間之間隔保持固定。具有大影像顯示區域之液晶 593357DISCLOSURE OF THE INVENTION An interlayer insulating layer or a dielectric layer of a thin film transistor (TFT) active matrix type display and a non-switching element passive matrix type). (Please read the precautions on the back before filling out this page.) • tr—line 丨 In recent years, liquid crystal displays have been widely used, for example, pocket TVs and communication terminal devices due to their small thickness and light weight. Reflective liquid crystal displays that do not require the use of back light are particularly needed because they are extremely thin and lightweight, and they can significantly reduce power consumption. However, even if the back light is from a transmissive color liquid crystal display used today and a light reflecting plate is added below the display, it will cause problems due to the low efficiency of using light, and it may not have practical brightness. As a solution to this problem, various reflective liquid crystal displays have been proposed to promote the efficiency of using light. For example, a reflective liquid crystal display is designed to include reflective pixel electrodes. The reflective liquid crystal display includes an insulating substrate and an opposite substrate spaced from the insulating substrate. The space between the substrates is filled with liquid crystal. The gate electrode is formed on the insulating substrate, and the intermediate electrode and the insulating substrate are covered with a gate insulating film. Then, a semiconductor layer is formed on the gate insulating film on the gate electrode. The source electrode and the drain electrode are also formed on the gate insulating film which is in contact with the semiconductor layer. The source electrode, the drain electrode, the semiconductor layer, and the gate electrode cooperate with each other to form a bottom-gate type TFT as a switching element. An interlayer insulating film is formed to cover the source electrode, the drain electrode, the semiconductor layer, and the gate insulating film. Contact holes are formed in the interlayer insulating film on the drain electrode. Pixel electrodes made of aluminum are formed on the interlayer insulating film and on the inner side walls of the contact holes. The drain electrode of the TFT is finally in contact with the pixel electrode via an interlayer insulating film. The interlayer insulating film is generally designed to have a roughened surface, whereby the pixel electrode can be used as a reflecting plate, which diffuses light to obtain a wider viewing angle (visible angle). The pixel electrode is used as a light reflecting plate. The reflective paper size is in accordance with Chinese National Standard (CNS) A4 specification (210x297 public love) 593357 A7 B7 5. Invention description (77) (Please read the precautions on the back before filling in this Page) LCD monitors significantly promote the efficiency of using light. In the above-mentioned reflective liquid crystal display, the interlayer insulating film is designed to have convex portions and concave portions by photolithography. In order to form and control the micrometer-scale fine-shaped protrusions and recesses with a rough surface and to form contact holes, a photolithography method using positive and negative photoresists is used. For these resists, the composition according to the present invention is particularly suitable. ..., order, the photosensitive composition according to the present invention can be further used for preparing a separator ', which controls the element gap of the liquid crystal portion in the liquid crystal display panel. Because the nature of the light transmitted or reflected through the liquid crystal layer in the liquid crystal display depends on the element gap, the thickness accuracy and uniformity on the pixel array are important parameters for the performance of the liquid crystal display unit. In a liquid crystal device, the space between the substrates in the device is maintained fixed by sparsely distributing glass or polymer spheres with a diameter of a few micrometers as a spacer between the substrates. The separator is thus held between the substrates so that the distance between the substrates is maintained at a fixed value. This distance is determined by the diameter of the divider. These spacers ensure a minimum separation between the substrates, that is, they avoid a reduction in the distance between the substrates. However, it cannot be avoided that the substrates are separated from each other, that is, the distance between the substrates is increased. In addition, this method of using separation balls has the uniformity of the diameter of the separation balls, the difficulty of uneven dispersion of the separation balls on the panel, the uneven orientation, and the brightness and / or optical aperture (which depends on the position of the spacers on the pixel array area). Depending on) reduction and other issues. LCD monitors with large image display areas have recently attracted greater attention. However, an increase in the area of a liquid crystal cell generally results in deformation of a substrate constituting the cell. The layer structure of the liquid crystal is easily destroyed by deformation of the substrate. Therefore, even if the separator is used to keep the interval between the substrates fixed. LCD with large image display area 593357

(請先閲讀背面之注意事項再填寫本頁) 、可| 顯示器因顯示器遭受干擾而難以實施。不使用上述分隔球 材分散方法,於元件間隙内形成管柱作為分隔件之方法被 提出。於此方法,樹脂管柱於像素陣列區域與對兆電極間 之區域内形成作為分隔件,以形成指定之元件間隙。具照 相石版術之黏著性質之光敏性材料係慣用於,例如,濾色 器之製備方法。以分隔件之位置、數量及高度可自由控制 而言,相較於使用間隔球材之傳統方法,此方法係較有利。 於彩色液晶顯示面板,此等分隔件係於濾色元素之黑色基 質下之非影像區域内形成。因此,使用光敏性組成物形成 之分隔件不會減少亮度及光學孔徑。用以製造用於濾色器 之具分隔件之保護層之光敏性組成物係揭示於JP 2〇〇〇-81701-A,且分隔件材料之乾膜型式光阻劑亦揭示於Jp 11-174459-A及JP 11-174464-A。如於此等文獻中所述, 光敏性組成物、液體及乾膜光阻劑係至少包含鹼或酸性之 可溶性黏著劑聚合物、可游離基聚合之單體及游離基引發 劑。於某些情況,可熱交聯組份(諸如,環氧化物及羧酸) 可另外被包含。使用光敏性組成物形成分隔件之步驟係如 下所述:光敏性組成物被塗敷於基材(例如,濾色面板)且 於基材預先烘烤後,經由遮罩曝光。然後,基材以顯影劑 顯影且形成圖案以形成所欲分隔件。當組成物含有某些熱 固性組份時,一般而言,後烘烤被進行以使組成物熱固化。 依據本發明之可光固化組成物因其高敏感性之故係適於製 造液晶顯示器(如上所述)之分隔件。 依據本發明之光敏性組成物亦適於製造用於液晶顯示 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 81 593357 A7 ___B7_ 五、發明説明(79 ) 器面板、影像感應器等之顯微鏡片陣列。顯微鏡片係顯微 鏡之純性光學組件,其係配置於諸如檢測器、顯示器及發 光裝置(發光二極體、橫向及垂直之腔室雷射)之活性光電 子裝置上,以改良其光學輸入及輸出之品質。應用區域廣 泛且涵盖諸如電#、資訊科技、視聽服務、太陽能電池、 檢測器、固態光源及光學互連之區域。現今光學系統使用 各種不同技術以獲得顯微鏡片及顯微光學裝置間之有效率 偶合。顯微鏡片陣列被用於使照射光線集中於非發光顯示 裝置(諸如’液晶顯示裝置)之像素區域上,以增加顯示器 亮度,用以集中入射光線或作為於用於,例如,傳真機等 之線影像感應1§之光電轉化區域上形成影像之裝置以改良 此等裝置之敏感度’及用以於用於液晶印表機或發光二極 體(LED)印表機之光敏性裝置上形成被印製之影像。 最普遍之應用係用以改良固態影像感應裝置(諸如, 電荷偶合裝置(CCD))之光檢測器陣列之效率。於檢測器 陣列,每一檢測器元素或像素之儘可能多之光線之收集係 需要的。若顯微鏡片被置放於每一像素頂部上,鏡片收集 入射光線且使其集中於小於鏡片尺寸之活性區域上。依據 習知技藝,顯微鏡片陣列可藉由各種不同方法製造; (1)一種獲得凸透鏡片之方法,其中平面結構之鏡片圖案 係藉由傳統照相石版印刷技術等纟會於熱塑性樹脂上,然後 熱塑性樹脂被加熱至高於樹脂軟化點之溫度以使其具流動 性,藉此於圖案端緣造成壓陷(所謂,,流回,,)(參見,例如,(Please read the precautions on the back before filling out this page) , 可 | The display is difficult to implement due to interference from the display. Instead of using the above-mentioned separation ball dispersion method, a method of forming a pipe string as a separator in the element gap is proposed. In this method, a resin column is formed as a spacer in a region between a pixel array region and a counter electrode to form a designated element gap. Photosensitive materials with the adhesive properties of photolithography are commonly used, for example, in the preparation of color filters. In terms of the free control of the position, number and height of the partitions, this method is more advantageous than the traditional method using spacer balls. In a color liquid crystal display panel, these spacers are formed in a non-image area under a black matrix of a color filter element. Therefore, a separator formed using a photosensitive composition does not reduce brightness and optical aperture. A photosensitive composition for manufacturing a protective layer with a separator for a color filter is disclosed in JP 2000-81701-A, and a dry film type photoresist of the separator material is also disclosed in Jp 11- 174459-A and JP 11-174464-A. As described in these documents, the photosensitive composition, liquid and dry film photoresist include at least an alkali or acidic soluble adhesive polymer, a radical polymerizable monomer, and a radical initiator. In some cases, thermally crosslinkable components such as epoxides and carboxylic acids may be additionally included. The steps for forming the separator using the photosensitive composition are as follows: The photosensitive composition is applied to a substrate (for example, a color filter panel), and after the substrate is pre-baked, it is exposed through a mask. The substrate is then developed with a developer and patterned to form a desired separator. When the composition contains certain thermosetting components, in general, post-baking is performed to thermally cure the composition. The photocurable composition according to the present invention is suitable as a separator for manufacturing a liquid crystal display (as described above) because of its high sensitivity. The photosensitive composition according to the present invention is also suitable for the manufacture of liquid crystal displays. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 81 593357 A7 ___B7_ V. Description of the invention (79) Panel and image sensor Wait for the microscope sheet array. Microscope sheets are pure optical components of microscopes, which are arranged on active optoelectronic devices such as detectors, displays, and light-emitting devices (light-emitting diodes, lateral and vertical cavity lasers) to improve their optical input and output Quality. Application areas are broad and cover areas such as electricity, information technology, audiovisual services, solar cells, detectors, solid-state light sources, and optical interconnects. Today's optical systems use a variety of different techniques to achieve efficient coupling between microscope lenses and micro-optical devices. Microscope sheet arrays are used to focus the irradiated light on the pixel area of a non-luminous display device such as a 'liquid crystal display device' to increase the brightness of the display, to focus incident light, or as a line for, for example, a fax machine, Image sensing 1§ The device for forming an image on the photoelectric conversion area to improve the sensitivity of these devices' and to form a blanket on a photosensitive device for a liquid crystal printer or a light emitting diode (LED) printer Printed image. The most common application is to improve the efficiency of photodetector arrays of solid-state image sensing devices such as charge coupled devices (CCDs). In a detector array, the collection of as much light as possible for each detector element or pixel is required. If a microscope sheet is placed on top of each pixel, the lens collects incident light and focuses it on an active area smaller than the size of the lens. According to conventional techniques, the microscope sheet array can be manufactured by various methods. (1) A method for obtaining a convex lens sheet, in which the lens pattern of a planar structure is etched on a thermoplastic resin by conventional photolithography techniques, and then thermoplastic The resin is heated to a temperature above the softening point of the resin to make it fluid, thereby causing indentation at the end of the pattern (so-called, flowing back,,) (see, for example,

JP 60-38989-A、JP 60-165623-A、JP 01-67003-A 及 JP 82 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593357 A7 B7 五、發明説明(80 ) 2000-39503-A)。於此方法中,所用之熱塑性樹脂係光敏 性,鏡片圖案可藉由使此樹脂曝光而獲得。 (2) 藉由使用模具或壓模形成塑膠或玻璃材料之方法。作 為鏡片材料,光可固化之樹脂及熱固性樹脂可被用於此方 法(參見,例如,WO99/38035)。 (3) 以下述現象為基礎形成凸透鏡之方法:當藉由使用校 準器以所欲圖案使光敏性樹脂曝光時,未反應單體自未曝 光區域移向曝光區域,造成曝光區域膨脹(參見,例如, 曰本應用物理協會顯微鏡研究小組期刊,光學研討會,第 5冊,編號2,第118-123頁(1987)及第6冊,編號2,第 87_92 頁(1988)) 〇 於支撐基材之上表面上,光敏性樹脂層被形成。其後,藉 由使用個別遮罩,光敏性樹脂層之上表面以汞燈等之光線 照射,如此光敏性樹脂層被曝光。因此,光敏性樹脂層之 被曝光部份膨脹成凸透鏡形狀,以形成具數個微鏡片之集 光層。 (4) 獲得凸透鏡之方法,其中光敏性樹脂藉由近曝光技術 曝光,其中光罩未與樹脂接觸,以於圖案端緣造成模糊, 如此,光化學反應產物之量係依圖案端緣之模糊度而分佈 (參見,例如,JP 61-153602-A)。 (5) 產生鏡片效果之方法,其中光敏性樹脂以特殊強度分 佈之光曝光,以形成依光線強度而定之折射率分佈圖案(參 見,例如,JP 60-72927-A 及 JP 60-166946-A)。 依據本發明之光敏性組成物可以任一上述方法使用以使用 83 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593357 A7 B7 五、發明説明(81 ) 光可固化樹脂組成物形成顯微鏡片。 特別種類之技術係集中於在如光阻劑之熱塑性樹脂内 形成顯微鏡片。一例子係公開於Popovic等人之SPIE 898 參考資料第23-25頁(1988)。此技術(稱為迴流技術)包含 之步驟係於如光阻劑之光敏性樹脂内藉由,例如,照相石 版術於熱塑性樹脂内界定鏡片之跡印,及其後使此材料加 熱至高於其迴流溫度。表面張力使光阻劑島狀物拉伸成球 狀帽狀物,其具有與迴流前之原始島狀物相等之體積。此 帽狀物係平凸透鏡。此技術之優點係於發光或光檢測光電 子裝置頂部上直接集成之簡單性、可複製性及可能性。於 某些情況,防護層於具圖案之鏡片單元上形成,此鏡片於 迴流前係具有矩形形狀以避免樹脂島狀物於中間產生模糊 而未於迴流步驟迴流成球形帽狀物。此防護層係作為永久 性保護層。塗覆層亦係由光敏性組成物製得。顯微鏡片陣 列亦可藉由使用,例如,EP0932256A2所述之模具或壓 模而製得。製備平面顯微鏡片陣列之方法係如下所述:脫 模劑被塗覆於壓模之成形表面上,其上係密集地排列凸部 份,且具有高折射率之光可固化合成樹脂材料被固定於壓 模之成形表面上。其次,基本之玻璃板被推置於合成樹脂 材料上,藉此使合成樹脂材料展開,且合成樹脂材料藉由 以紫外線輻射照射或藉由加熱而固化,且被成形以形成凸 顯微鏡片。其後壓模被剝離。然後,具有低折射率之光可 固化合成樹脂材料被另外塗覆於凸顯微鏡片上以作為黏著 層,且被製成覆蓋玻璃板之玻璃基材被推置於合成樹脂材 84 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593357 A7 ______B7_ 五、發明説明(82 ) 料上,藉此使其展開。然後,合成樹脂材料被固化,且最 後平面狀之顯微鏡片陣列被形成。如US 5969867所揭示, 使用模具之相似方法被應用於三棱鏡片之製造,其被作為 彩色液晶顯示器面板之背面光單元之一部份以促進亮度。 於一側上形成二稜鏡列之三稜鏡片被置放於背面光之發光 表面。為製備三稜鏡片,活性之能量射線可固化之組成物 以鏡片模具(其係以金屬、玻璃或樹脂製成)鑄製並展開, 且形成三稜鏡列等之鏡片形狀,其後,透明基材片被置於 其上,且自活性能量射線發射源之活性能量射線經由此片 材照射而固化。然後,製得之鏡片片材自鏡片模具脫離以 獲得鏡片片材。用以形成鏡片片段之活性能量射線可固化 組成物需具有各種不同性質,包含對透明基材之黏著性, 及適當之光學特性。至少具有習知技藝之某些光阻劑之鏡 片對於某些應用係非所欲的,因為光學光譜之藍端之光學 透光性差。因為依據本發明之光可固化組成物具有低的變 化性質(於加熱及光化學時),因此其適於製備如上所述之 顯微鏡片陣列。 新穎之輻射敏感性組成物亦適於用於電漿顯示器面板 (PDP)製備方法之照相石版術步驟,特別是障壁肋(barrier rib)、磷層及電極之影像形成方法。PDP係一種藉由氣體 排放而發光而顯示影像及資訊之平面顯示器。藉由面板建 構及操作方法,已知二種型式,即,Dc(直流電流)型及 AC(交流電流)型。舉例而言,DC型式之彩色pDp之原則 被簡要地解釋。於DC型彩色PDP,介於二透明基材(一 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 85 (請先閱讀背面之注意事項再填寫本頁)JP 60-38989-A, JP 60-165623-A, JP 01-67003-A, and JP 82 (Please read the precautions on the back before filling out this page) This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 (Mm) 593357 A7 B7 V. Description of the invention (80) 2000-39503-A). In this method, the thermoplastic resin used is photosensitive and the lens pattern can be obtained by exposing this resin. (2) A method of forming a plastic or glass material by using a mold or a compression mold. As lens materials, photocurable resins and thermosetting resins can be used in this method (see, for example, WO99 / 38035). (3) A method of forming a convex lens based on the following phenomenon: When a photosensitive resin is exposed in a desired pattern by using a calibrator, unreacted monomers move from the unexposed area to the exposed area, causing the exposed area to expand (see, For example, the Journal of the Microscopy Research Group of the Applied Physics Society, Optics Seminar, Volume 5, No. 2, pp. 118-123 (1987) and Volume 6, No. 2, pp. 87-92 (1988)). On the upper surface of the material, a photosensitive resin layer is formed. Thereafter, by using an individual mask, the upper surface of the photosensitive resin layer is irradiated with light such as a mercury lamp, and the photosensitive resin layer is thus exposed. Therefore, the exposed portion of the photosensitive resin layer is expanded into a convex lens shape to form a light-collecting layer having a plurality of microlenses. (4) A method for obtaining a convex lens, in which a photosensitive resin is exposed by a near-exposure technique, in which a photomask is not in contact with the resin to cause a blur at the edge of the pattern. Thus, the amount of the photochemical reaction product is determined by the blur at the edge of the pattern. Degrees (see, for example, JP 61-153602-A). (5) A method for producing a lens effect, in which a photosensitive resin is exposed to light with a special intensity distribution to form a refractive index distribution pattern depending on the intensity of light (see, for example, JP 60-72927-A and JP 60-166946-A ). The photosensitive composition according to the present invention can be used in any of the above methods to use 83 (please read the precautions on the back before filling this page) This paper size is applicable to China National Standard (CNS) A4 (210X297 mm) 593357 A7 B7 V. Description of the invention (81) The photocurable resin composition forms a microscope sheet. A special kind of technology focuses on forming a microscope sheet in a thermoplastic resin such as a photoresist. An example is disclosed in SPIE 898 References, Popovic et al., Pp. 23-25 (1988). This technique (called reflow technique) involves steps in a photosensitive resin, such as a photoresist, by, for example, photolithography to define the traces of a lens in a thermoplastic resin, and thereafter heating the material above it Reflux temperature. The surface tension causes the photoresist island to stretch into a spherical cap, which has the same volume as the original island before reflow. This cap is a plano-convex lens. The advantages of this technology are the simplicity, reproducibility, and possibility of direct integration on top of the light-emitting or light-detecting photovoltaic device. In some cases, a protective layer is formed on a patterned lens unit. The lens has a rectangular shape before reflow to avoid blurring of resin islands in the middle, and does not reflow into a spherical cap in the reflow step. This protective layer acts as a permanent protective layer. The coating layer is also made of a photosensitive composition. Microscope arrays can also be made by using, for example, the molds or dies described in EP0932256A2. The method of preparing a flat microscope sheet array is as follows: a mold release agent is coated on the forming surface of the stamper, and convex portions are densely arranged thereon, and a light-curable synthetic resin material having a high refractive index is fixed On the forming surface of the stamper. Second, a basic glass plate is pushed onto a synthetic resin material, thereby spreading the synthetic resin material, and the synthetic resin material is cured by irradiation with ultraviolet radiation or by heating, and is formed to form a convex microscope sheet. Thereafter, the stamper was peeled. Then, a light-curable synthetic resin material having a low refractive index is additionally coated on a convex microscope sheet as an adhesive layer, and a glass substrate made of a cover glass plate is pushed onto the synthetic resin material 84 (please read the back first) Please pay attention to this page and fill in this page again) This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) 593357 A7 ______B7_ V. Description of the invention (82) It is used to expand it. Then, the synthetic resin material is cured, and a final planar microscope sheet array is formed. As disclosed in US 5969867, a similar method using a mold is applied to the manufacture of a prism sheet, which is used as a part of a back light unit of a color liquid crystal display panel to promote brightness. Three cymbals forming two rows on one side are placed on the light-emitting surface of the back light. In order to prepare a three-lens tablet, the active energy ray-curable composition is cast and unfolded in a lens mold (which is made of metal, glass, or resin), and formed into a lens shape such as a three-lens row. Thereafter, it is transparent A substrate sheet is placed thereon, and an active energy ray from an active energy ray emitting source is irradiated through the sheet to be cured. Then, the obtained lens sheet was released from the lens mold to obtain a lens sheet. The active energy ray-curable composition used to form the lens segment needs to have various properties, including adhesion to a transparent substrate, and appropriate optical characteristics. Mirrors with at least certain photoresist techniques are undesired for some applications because the blue end of the optical spectrum has poor optical transmission. Since the photo-curable composition according to the present invention has low changeable properties (under heating and photochemistry), it is suitable for preparing the microscope sheet array as described above. The novel radiation-sensitive composition is also suitable for use in photolithography steps of plasma display panel (PDP) preparation methods, especially image formation methods for barrier ribs, phosphor layers, and electrodes. The PDP is a flat display that emits light and emits light to display images and information. By the panel construction and operation method, two types are known, namely, a Dc (direct current) type and an AC (alternating current) type. For example, the principle of the color pDp of the DC type is briefly explained. For DC-type color PDP, between two transparent substrates (one paper size applies Chinese National Standard (CNS) A4 specifications (210X297 mm) 85 (Please read the precautions on the back before filling this page)

593357 A7 ____B7_ 五、發明説明(83 ) 般係玻璃板)間之空間係藉由置於透明基材間之格狀障壁 肋分成數個微小單元。於個別單元中,排放氣體(諸如, He或Xe)被密封。每一單元之後壁上係磷層,其於藉由 排放氣體排放而產生之紫外線激發時發出三種主要顏色之 可見光。於二基材之内表面上,電極係越過相關單元彼此 相對地被置放。一般,陰極係由透明電導性材料(諸如, NESA玻璃)膜形成。當電壓被施用於前壁及後壁上形成 之此等電極間時,密封於此等單元内之排放氣體誘發電漿 排放,且藉由紫外線輻射,引起紅、藍及綠色之螢光元 素發光且使顯示器產生影像。於全彩顯示系統中,上述之 紅、藍及綠三種主要顏色之個別之三螢光元素結合形成一 像素。DC型PDP内之單元係藉由晶格之組份障壁肋分割, 而於AC型PDP中係藉由彼此平行地排列於基材面上之 障壁肋分割。於任一情況中,此等單元係藉由障壁肋分割。 此等障壁肋係用以將發光限定於固定區域内以排除錯誤排 放或相鄰排放單元間之串擾,且確保理想顯示。 依據本發明之組成物亦發現應用於單色或多色之影像 記錄或影像複製(影印、複製)之一或更多層材料之製造。 再者’此材料係適於彩色驗證系統。於此技術中,含有微 囊劑之組成物可被施用,且對於影像製造,輻射固化後可 施以熱處理。此等系統及技術及其應用係,例如,揭示於 US 5376459 。 光固化作用對於印刷品係非常重要,因為墨水乾燥時 間係圖像產品生產速率之重要因素,且需於頃刻等級。紫 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公复) 86 (請先閲讀背面之注意事項再填寫本頁) -訂· …線丨 593357 A7 __-____B7_ 五、發明説明(84 ) 外線可固化之墨水對於網版印刷及膠版印刷係特別重要。 如上已述及者,此新穎混合物亦高度適於製備印刷 板。此應用使用,例如,可溶性線性聚醯胺或苯乙烯/丁 二烯及/或苯乙烯/異戊間二烯橡膠、聚丙烯酸酯或含羧基 之聚甲基丙烯酸甲酯、聚乙烯基醇或胺基曱酸酯丙烯酸酯 與可光聚合單體,例如,丙烯醯胺及/或甲基丙烯醯胺, 或丙烯酸酯及/或甲基丙烯酸酯,及光引發劑之混合物。 此等系統之膜及板材(濕或乾)係曝置於被印刷原始物之負 片(或正片)上,且未被固化部份其後係使用適當溶劑或水 溶液洗掉。光固化被使用之另一領域係金屬塗覆物,例如, 於金屬板及管件、罐頭或瓶蓋之塗覆情況,及聚合物塗覆 物之光固化,例如,以PVC為主之地板或牆覆蓋物。紙 張塗覆物之光固化之例子係標籤、唱片套及書套之無色塗 漆。 亦感興趣係使用此新穎光引發劑固化自複合組成物製 得之成型物件。此複合化合物係由自行支撐基質材料(例 如,玻璃纖維織物,或另外係植物纖維)組成[cf. K.-P. Mieck, T. Reussmann 於 Kunststoffe 85(1995),366-370],其係以 此光固化組成物浸潰。當使用此新穎化合物製備時,包含 複合化合物之成型零件達成高度之機械安定性及抗性。此 新穎化合物亦可作為,例如,EP 7086所述之模製、浸潰 及塗覆組成物中之光固化劑。此組成物之例子係凝膠塗覆 樹脂(其接受有關於固化活性及抗黃化之嚴格要求),及纖 維強化模製物(例如,光擴散板,其係平面狀或具有縱長 本紙張尺度適用中國國家標準(CNS) A4規格(210 X 297公釐) 87 (請先閲讀背面之注意事項再填寫本頁)593357 A7 ____B7_ V. Description of the invention (83) General glass plate) The space between grids is divided into several small units by grid-like barrier ribs placed between transparent substrates. In individual units, the exhaust gas (such as He or Xe) is sealed. A phosphor layer is formed on the rear wall of each unit, which emits visible light of three main colors when excited by ultraviolet rays generated by exhaust gas emission. On the inner surface of the two substrates, the electrode systems are placed opposite each other across the relevant unit. Generally, the cathode is formed of a film of a transparent conductive material such as NESA glass. When voltage is applied between these electrodes formed on the front and rear walls, the discharge gas sealed in these units induces plasma discharge, and causes ultraviolet, red, blue and green fluorescent elements to emit light. And make the display produce an image. In a full-color display system, the individual three fluorescent elements of the three main colors of red, blue, and green described above are combined to form a pixel. The cells in the DC-type PDP are divided by the barrier ribs of the component of the crystal lattice, and in the AC-type PDP are divided by the barrier ribs arranged parallel to each other on the substrate surface. In either case, these units are divided by barrier ribs. These barrier ribs are used to confine light emission to a fixed area to eliminate erroneous emissions or crosstalk between adjacent emission units and ensure ideal display. The composition according to the present invention has also been found to be applied to the manufacture of one or more layers of single- or multi-color image recording or image reproduction (photocopying, reproduction). Furthermore, this material is suitable for a color verification system. In this technique, a composition containing microcapsules can be applied, and for image manufacturing, heat treatment can be applied after radiation curing. Such systems and technologies and their applications are disclosed, for example, in US 5376459. Light curing is very important for print systems, because the drying time of the ink is an important factor in the production rate of the image product, and it needs to be instant grade. The size of the purple paper is applicable to the Chinese National Standard (CNS) A4 specification (210X297 public copy) 86 (Please read the precautions on the back before filling in this page)-Order ·… line 丨 593357 A7 __-____ B7_ V. Description of the invention (84) Outside-curable inks are especially important for screen and offset printing systems. As already mentioned above, this novel mixture is also highly suitable for preparing printing plates. This application uses, for example, soluble linear polyamides or styrene / butadiene and / or styrene / isoprene rubber, polyacrylates or carboxyl-containing polymethylmethacrylates, polyvinyl alcohol or A mixture of an amino acrylate and a photopolymerizable monomer, such as acrylamide and / or methacrylamide, or an acrylate and / or methacrylate, and a photoinitiator. The films and plates (wet or dry) of these systems are exposed to the negative (or positive) of the original being printed, and the uncured parts are subsequently washed off with a suitable solvent or aqueous solution. Another area where photocuring is used is metal coatings, such as coatings on metal plates and pipe fittings, cans or bottle caps, and photocuring of polymer coatings, such as PVC-based flooring or Wall covering. Examples of light curing of paper coatings are colorless painting of labels, record covers and book covers. Also of interest are shaped articles made from the composite composition using this novel photoinitiator. This compound is composed of a self-supporting matrix material (for example, glass fiber fabric, or another type of plant fiber) [cf. K.-P. Mieck, T. Reussmann in Kunststoffe 85 (1995), 366-370]. This photocurable composition was impregnated. When prepared using this novel compound, molded parts containing composite compounds achieve a high degree of mechanical stability and resistance. This novel compound can also be used, for example, as a photocuring agent in molding, impregnating and coating compositions as described in EP 7086. Examples of this composition are gel-coated resins (which accept stringent requirements regarding curing activity and yellowing resistance), and fiber-reinforced moldings (e.g., light-diffusion panels, which are flat or have long papers) Dimensions are applicable to China National Standard (CNS) A4 (210 X 297 mm) 87 (Please read the precautions on the back before filling this page)

593357 A7 _B7_ 五、發明説明(85 ) (請先閲讀背面之注意事項再填寫本頁) 或交叉之皺紋。製備此等模製物之技術(諸如,手工鋪層、 噴灑鋪層、離心鑄製或長絲繞捲)係描述於,例如,P.H. Selden 之’’Glasfaserverstarkte Kunststoffe”,第 610 頁, Springer Verlag Berlin-Heidelberg-New York 1967 〇 可藉由 此等技術製得之物件之例子係船、具雙側玻璃維強化塑膠 塗覆物之纖維板或硬紙板、管件、容器等。模製、浸潰及 塗覆之組成物之進一步例子係含有玻璃纖維(GRP)之模製 物(諸如,皺紋狀片材及紙層合物)之UP樹脂凝膠塗覆物。 紙層合物可以尿素樹脂或蜜胺樹脂為主。於製造此層合物 之前,凝膠塗覆物於撐體(例如,膜)上製造。此新穎之可 光固化組成物亦可被用於鑄製樹脂或包埋物件,例如,電 子組件等。 依據本發明之組成物及化合物可被用於製備全息照相 器、導波器、光學開關,其中係利用被照射及未被照射區 域間折射率差異而顯影。 使用可光固化組成物於顯影技術及資訊載體之光學製 備亦係重要。於此等應用,如上已述者,被塗敷至撐體之 層(濕或乾)係,例如,經由光罩以紫外線或可見光影像式 地照射,且此層之未被曝光區域藉由以顯影劑處理而移 除。將光可固化層塗敷至金屬亦可藉由電沈積完成。被曝 光區域係經由交聯聚合,且因而係不可溶且保留於撐體 上。適當上色產生可見影像。若撐體係金屬化層,此金屬 於曝光及顯影後可蝕刻掉未被曝光區域或藉由電鍍強度。 以此方式可產生電子電路及光阻劑。當用於形成影像之材 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593357 A7 B7 五、發明説明(86 (請先閲讀背面之注意事項再填寫本頁) 料時’新穎之光引發劑於產生所謂之印出影像提供優異性 能,籍此色彩變化由照射而被誘發。為形成此印出影像, 不同染料及/或其白色形式被使用,且此等印出影像系统 之例子可於,例如,WO 96/41240、EP 7〇6Q91、Ep 511403 EP 511403、US 3579339 及 US 4622286 中發現。 此新穎光引發劑亦適於用以形成藉由一順序集結方法 製造&lt;多層層狀電路板之介電層之光可形式圖案之組成 物。 、^τ— 如上所述,本發明提供用於製造被著色及未被著色之 塗料及漆、粉末塗覆物、印刷墨水、印刷板、黏著劑、齒 科組成物、凝膠塗覆物、電子產品之光阻劑,如,電鍍阻 劑,蝕刻阻劑,液體及乾燥膜,焊料阻劑,用以製備用於 各種顯示器應用之濾色劑或用以產生電漿顯示面板(例 如,障壁肋、磷層、電極)、電致發光顯示器及LCD(例如, 層間絕緣層、分隔件、顯微鏡片陣列)之製備方法中之結 構之阻劑之組成物,作為封裝電組件及電子組件之組成 物,用以製造磁性記錄材料、微機械零件、導波器、光學 開關、電鍍遮罩、:蝕刻遮罩、彩色驗證系統、玻璃纖維^ 線塗覆物、網版印刷之印花模版,用於藉由立體石版印刷 技術製備三維物件,及作為影像記錄材料,特別是用於全 息照相記錄,微電子電路,脫色材料,用於影像記錄材料 之脫色材料,用於使用微囊劑之影像記錄材料。 用於照相資rfU己錄|§之基材包含,例如,聚合物膜、 纖維素乙酸酯或聚合物塗覆之紙;用於膠版印刷形成之基593357 A7 _B7_ V. Description of the invention (85) (Please read the precautions on the back before filling this page) or cross wrinkles. Techniques for preparing such moldings (such as hand layup, spray layup, centrifugal casting, or filament winding) are described, for example, in `` Glasfaserverstarkte Kunststoffe '' by PH Selden, page 610, Springer Verlag Berlin -Heidelberg-New York 1967 〇 Examples of objects that can be made by such technologies are ships, fiberboard or cardboard with double-sided glass-reinforced plastic coatings, pipes, containers, etc. Molding, impregnation, and coating Further examples of the composition are UP resin gel coatings containing glass fiber (GRP) moldings such as wrinkled sheets and paper laminates. The paper laminates may be urea resin or melamine resin. Mainly. Before manufacturing this laminate, a gel coat is made on a support (for example, a film). This novel photocurable composition can also be used for casting resins or embedded objects, for example, Electronic components, etc. The compositions and compounds according to the present invention can be used to prepare holograms, wave guides, and optical switches, where development is performed by using the difference in refractive index between the illuminated and unirradiated areas. Photocuring compositions are also important in the development of optical technology and in the optical preparation of information carriers. For these applications, as described above, the layer (wet or dry) applied to the support is, for example, UV or Visible light is imagewise irradiated, and the unexposed areas of this layer are removed by treatment with a developer. The application of a photo-curable layer to a metal can also be accomplished by electrodeposition. The exposed areas are polymerized by crosslinking, And therefore it is insoluble and remains on the support. Appropriate coloring produces a visible image. If the metallization layer of the support system, this metal can etch away unexposed areas after exposure and development or by plating strength. In this way can be Generate electronic circuits and photoresist. When used as the material for forming the image, the paper size applies the Chinese National Standard (CNS) A4 specification (210X297mm) 593357 A7 B7 V. Description of the invention (86 (Please read the precautions on the back before (Fill in this page) It is expected that the novel photoinitiator provides excellent performance in producing so-called printed images, whereby color changes are induced by irradiation. To form this printed image, different dyes and / Its white form is used, and examples of such print-out imaging systems can be found in, for example, WO 96/41240, EP 706Q91, Ep 511403 EP 511403, US 3579339 and US 4622286. This novel photoinitiator is also suitable A composition for forming a light formable pattern of a dielectric layer of a multilayer multilayer circuit board manufactured by a sequential build-up method. As described above, the present invention provides a method for manufacturing colored and non-colored substrates. Colored paints and varnishes, powder coatings, printing inks, printing plates, adhesives, dental compositions, gel coatings, photoresists for electronic products, such as plating resists, etching resists, liquids and Dry film, solder resist, used to prepare color filters for various display applications or to produce plasma display panels (eg, barrier ribs, phosphor layers, electrodes), electroluminescent displays, and LCDs (eg, interlayer insulation Layer, separator, microscope sheet array) in the preparation method of the structure of the composition of the resist, as a component of the package of electrical components and electronic components, used to manufacture magnetic recording materials, micromechanical parts, wave guides, Optical switches, electroplated masks: etching masks, color verification systems, glass fiber coatings, screen printing printing stencils, used to prepare three-dimensional objects by stereolithography, and as image recording materials, especially It is a decoloring material used for holographic recording, microelectronic circuits, decoloring materials, image recording materials, and image recording materials using microcapsules. Substrates for photographic materials rfU | § include, for example, polymer films, cellulose acetate or polymer-coated paper; substrates for offset printing

本紙張尺度適用中關家標準(_ M規格(21GX297公着T 593357 五、發明説明(87 材係特別處理之鋁,用於製造印刷電路之基材係以銅電鍍 之層合物,且用於製造積體電路之基材係,例如,矽晶圓。 用於照相材料及膠版印刷形式之光敏層之層厚度一般係約 〇.5/zm至10/zm,而對於印刷電路其係〇丨以茁至約1〇〇 &quot;m。於基材塗覆後,溶劑被移除,其一般係藉由乾燥為 之,而使光阻劑塗覆物留於基材上。 基材之塗覆可藉由對基材塗敷液體組成物、溶液或懸 浮液而完成。溶劑及濃度之選擇主要係依組成物型式及塗 覆技術而疋。溶劑需為惰性,即,需不與組份進行化學反 應且需旎於塗覆後於乾燥期間再次被移除。適當溶劑之例 子係酮、醚及酯,諸如,甲基乙基酮、異丁基甲基酮、環 戊酮、環己酮、N-甲基吡咯烷酮、二噁烷、四氫呋喃、2· 曱氧基乙醇、2-乙氧基乙醇、甲氧基丙醇、二甲 氧基乙烧、乙酸乙酯、乙酸正丁酯、乙基3-乙氧基丙酸 酯、2_甲氧基丙基乙酸酯、甲基甲氧基丙酸酯、孓庚酮、 2-戊酮及乳酸乙酯。溶液係藉由巳知塗覆技術均勻地塗敷 至基材,例如,藉由旋轉塗覆、浸潰塗覆、刮刀塗覆、簾 幕塗覆、粉刷、喷灑(特別是藉由靜電噴灑)及逆輥塗覆, 亦可藉由電泳沈積。亦可將此光敏層塗敷至暫時性之可撓 性撐體,然後藉由經層合作用轉移此層而塗覆至最後基材 (例如,以銅電鍍之電路板或玻璃基材)。塗敷量(塗覆物 厚度)及基材(層基材)性質係依所欲應用領域而定。塗覆 厚度範圍一般包含約0_1 # m至多於loo# m之值,例如, 0.1 /z m 至 lcm,較佳係 0.5// m 至 1000# m。 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 90 (請先閲讀背面之注意事項再填寫本頁)This paper size applies to the Zhongguanjia standard (_ M specification (21GX297 public T 593357) V. Description of the invention (87 Material is specially treated aluminum, and the substrate used to make printed circuits is a copper electroplated laminate. The substrate for manufacturing integrated circuits is, for example, silicon wafers. The layer thickness of photosensitive layers used in photographic materials and offset printing is generally about 0.5 / zm to 10 / zm, and for printed circuits it is.丨 From 茁 to about 100 &quot; m. After the substrate is coated, the solvent is removed, which is generally made by drying to leave the photoresist coating on the substrate. Coating can be completed by applying a liquid composition, solution or suspension to the substrate. The choice of solvent and concentration is mainly based on the type of composition and coating technology. The solvent must be inert, that is, it must not be combined with the group. Parts are chemically reacted and need to be removed again during drying after coating. Examples of suitable solvents are ketones, ethers and esters such as methyl ethyl ketone, isobutyl methyl ketone, cyclopentanone, cyclohexanone , N-methylpyrrolidone, dioxane, tetrahydrofuran, 2 · methoxyethanol, 2-ethyl Ethyl alcohol, methoxypropanol, dimethoxyethane, ethyl acetate, n-butyl acetate, ethyl 3-ethoxypropionate, 2-methoxypropyl acetate, methyl methyl Oxypropionate, xenopentanone, 2-pentanone, and ethyl lactate. The solution is uniformly applied to the substrate by known coating techniques, for example, by spin coating, dip coating, doctor blade coating Coating, curtain coating, painting, spraying (especially by electrostatic spraying), and reverse roll coating, or by electrophoretic deposition. This photosensitive layer can also be applied to a temporary flexible support, It is then applied to the final substrate (for example, a copper-plated circuit board or glass substrate) by transferring this layer through lamination. The amount of coating (coating thickness) and the nature of the substrate (layer substrate) It depends on the field of application. The coating thickness range generally includes the value of about 0_1 # m to more than loo # m, for example, 0.1 / zm to lcm, preferably 0.5 // m to 1000 # m. Paper Size Applicable to China National Standard (CNS) A4 specification (210X297 mm) 90 (Please read the precautions on the back before filling this page)

、可I 593357 A7 _B7_五、發明説明(88 ) 於基材塗覆後,溶劑被移除(一般係藉由乾燥為之)以 使光阻劑之基本上乾燥之光阻劑膜留於基材上。 新穎組成物之光敏性一般係於約150 nm至600nm擴 展,例如,190-600 nm(紫外光-可見光區域)。適當輻射係 存在於,例如,日光或來自人造光源之光線。因此,大量 之非常不同型式之光源被使用。點光源及陣列(“燈毯”)係 適合。例子係燈弧燈、氙弧燈、低-、中-、高-及超高-壓 之汞燈,可具金屬鹵化物摻雜物(金屬-鹵素燈),微波激 光之金屬蒸氣燈、激元燈、超光化螢光管、螢光燈、氬白 熾燈、電子閃光燈、照相巨光燈、發光二極體(LED)、電 子束及X-射線。燈與依據本發明被曝光之基材間之距離 可依所欲應用及燈之型式及輸出而改變,且可為,例如, 2公分至150公分。雷射光源(例如,激元雷射,諸如, 用於157 nm曝光之F2激元雷射,用於248nm曝光之KrT 激元雷射及用於193nm曝光之ArF激元雷射)亦適合。可 見光區域之雷射亦被使用。 “影像式”曝光一辭包含經由包含預定圖案之光罩(例 如,幻燈片、鉻遮罩、印花模板遮罩或線網)曝光,或藉 由雷射或束曝光,其例如於被塗覆基材表面上以電腦控制 而移除,且以此方式產生影像。用於此目的之適當紫外線 雷射曝光系統係,例如,WEtecandOrbotech(DP· 100™DIRECT IMAGING SYSTEM)提供。電腦控制之照射 亦可藉由電子束達成。亦可使用以液晶製成之遮罩,其可 藉由一個個像素定址以產生數位影像,例如,A. Bertsch, (請先閲讀背面之注意事項再填寫本頁) 裝_ 、^τ— …線丨 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐) 91 593357 A7 B7 五、發明説明(89 ) (請先閲讀背面之注意事項再填寫本頁) J.Y. Jezequel,J.C. Andre於光化學及光生物學期刊;化學 1997, 107,第 275-281 頁及 Κ· P. Nicolay於膠版印刷術 1997, 6,第34-37頁描述。於此材料之影像式曝光之後及顯影之 前,有利地係使熱處理進行短時間。顯影後,熱後烘烤可 被施行以使組成物硬化且移除所有溶劑痕跡。使用溫度一 般係50-250°C,較佳係80-220°C ;熱處理時間一般係0.25 與60分鐘之間。 可光固化組成物可另外被用於製造印刷板或光阻劑之 方法,例如,DE 4013358所述。於此一方法中,於影像 式照射之前、同時或其後,此組成物係於無遮罩下以至少 400 nm波長之可見光曝光短時間。 於曝光及熱處理(若被實施)後,光敏性塗覆物之未被 曝光區域係以本身已知方式以顯影劑移除。 如已述及者,此新穎組成物可藉由鹼水溶液或有機溶 劑顯影。特別適合之水性鹼顯影劑溶液係四烷基氫氧化銨 或驗金屬之碎酸鹽、礙酸鹽、氫氧化物及碳酸鹽之水溶液。 小量之濕化劑及/或有機溶劑若要的話亦可被添加至此等 溶液。可以小量添加至顯影劑液體之典型有機溶劑之例子 係環己酮、2-乙氧基乙醇、甲苯、丙酮或此等溶劑之混合 物。依基材而定,溶劑(例如,有機溶劑)亦可作為顯影劑, 或如上所述,水性鹼與此等溶劑之混合物亦可使用。用於 溶劑顯影之特別有用之溶劑包含甲醇、乙醇、2-丙醇、1-丙醇、丁醇、二丙酮醇、乙二醇單曱基醚、乙二醇單乙基 醚、乙二醇單正丁基醚、二乙二醇二甲基醚、丙二醇單甲 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 92 593357 A7 _______B7_ 五、發明説明(90 ) 基醚乙酸酯、乙基-3-乙氧基丙酸酯、甲基甲氧基丙酸 酯、正丁基乙酸酯、苯甲基醇、丙酮、甲基乙基酮、環戊 酮、環己酮、2-庚_、2-戊酮、ε _己内酯、γ — 丁内酯、 二甲基甲醯胺、二甲基乙醯胺、六甲基磷醯胺、乙基乳酸 酯、甲基乳酸酯、ε-己内醯胺及Ν-甲基吡咯烷酮。選擇 性地,水可被添加至此等溶劑,最高達其仍獲得澄清溶液 且光敏性組成物之未被曝光區域之充分可溶性被保持之 量。 因此,本發明亦提供一種含有乙烯不飽和雙鍵之化合 物(即,含有至少一乙烯不飽和雙鍵之單體、寡聚物或聚 合物化合物’其包含添加至此等化合物之至少一如上所述 之化學式I、II或III之光引發劑)之光聚合反應及以電磁 輻射(特別是150至600 nm(特別是190-600 nm)波長之光 線)、電子束或以X-射線照射形成之組成物之方法。 本發明進一步提供一種被塗覆之基材,其於至少一表 面上塗覆如上所述之組成物,且係描述^—種浮凸影像之照 相製造方法,其中被塗覆之基材接受影像式曝光,然後未 被曝光部份以顯影劑移除。影像式曝光可藉由經由遮罩照 射或藉由如上所述之雷射或電子束而產生。於此前後文中 特別有利的是如上所述之雷射光束曝光。 本發明組成物具有良好熱安定性及低揮發性,且亦適 於在空氣(氧)存在中之光聚合反應。再者,於光聚合反應 後於組成物内僅造成低黃化。 下列範例係更詳細例示說明本發明。除非其它陳述 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) '- (請先閲讀背面之注意事項再填寫本頁)可可 593357 A7 _B7_ V. Description of the invention (88) After the substrate is coated, the solvent is removed (usually by drying) to leave the photoresist film which is basically dry. On the substrate. The photosensitivity of the novel composition generally extends from about 150 nm to 600 nm, for example, 190-600 nm (ultraviolet-visible region). Appropriate radiation is present, for example, in sunlight or light from artificial light sources. Therefore, a large number of very different types of light sources are used. Point light sources and arrays ("light blankets") are suitable. Examples are lamp arc lamps, xenon arc lamps, low-, medium-, high- and ultra-high-pressure mercury lamps, which can have metal halide dopants (metal-halogen lamps), microwave laser metal vapor lamps, lasers Element lamps, ultra-optical fluorescent tubes, fluorescent lamps, argon incandescent lamps, electronic flashes, photographic giant lamps, light emitting diodes (LEDs), electron beams and X-rays. The distance between the lamp and the substrate being exposed according to the present invention may vary depending on the desired application and the type and output of the lamp, and may be, for example, 2 cm to 150 cm. Laser sources (for example, excimer lasers, such as F2 excimer lasers for 157 nm exposure, KrT excimer lasers for 248 nm exposure, and ArF excimer lasers for 193 nm exposure) are also suitable. Lasers in visible light areas are also used. The term "imaging" exposure includes exposure through a mask containing a predetermined pattern (eg, a slide, a chrome mask, a stencil mask, or a wire mesh), or by laser or beam exposure, such as when applied The substrate surface is removed by computer control and an image is generated in this way. A suitable ultraviolet laser exposure system for this purpose is, for example, provided by WEtecandOrbotech (DP · 100 ™ DIRECT IMAGING SYSTEM). Computer controlled irradiation can also be achieved by electron beams. A mask made of liquid crystal can also be used, which can be digitally addressed by pixel addressing, for example, A. Bertsch, (please read the precautions on the back before filling this page). _ 、 ^ Τ—… Line 丨 This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) 91 593357 A7 B7 V. Description of invention (89) (Please read the precautions on the back before filling this page) JY Jezequel, JC Andre Yu Guang Journal of Chemistry and Photobiology; Chemistry 1997, 107, pp. 275-281 and K. P. Nicolay, described in Offset Printing 1997, 6, pp. 34-37. After the imagewise exposure of this material and before the development, the heat treatment is advantageously performed for a short time. After development, thermal post-baking can be performed to harden the composition and remove all traces of the solvent. The use temperature is generally 50-250 ° C, preferably 80-220 ° C; the heat treatment time is generally between 0.25 and 60 minutes. The photocurable composition can additionally be used in a method for manufacturing a printing plate or a photoresist, for example, as described in DE 4013358. In this method, the composition is exposed to visible light at a wavelength of at least 400 nm for a short time before, at the same time as, or after the image-type irradiation. After exposure and heat treatment (if implemented), the unexposed areas of the photosensitive coating are removed with a developer in a manner known per se. As already mentioned, this novel composition can be developed with an aqueous alkaline solution or an organic solvent. Particularly suitable aqueous alkaline developer solutions are aqueous solutions of tetraalkylammonium hydroxide or metal salt, salt, hydroxide, and carbonate. Small amounts of wetting agents and / or organic solvents can also be added to these solutions if desired. Examples of typical organic solvents that can be added to the developer liquid in small amounts are cyclohexanone, 2-ethoxyethanol, toluene, acetone, or a mixture of these solvents. Depending on the substrate, a solvent (eg, an organic solvent) can also be used as a developer, or as described above, a mixture of an aqueous alkali and these solvents can also be used. Particularly useful solvents for solvent development include methanol, ethanol, 2-propanol, 1-propanol, butanol, diacetone alcohol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol Mono-n-butyl ether, diethylene glycol dimethyl ether, and propylene glycol monomethyl ester The paper size applies to the Chinese National Standard (CNS) A4 (210X297 mm) 92 593357 A7 _______B7_ V. Description of the invention (90) Ester, ethyl-3-ethoxypropionate, methylmethoxypropionate, n-butyl acetate, benzyl alcohol, acetone, methyl ethyl ketone, cyclopentanone, cyclohexanone , 2-heptyl-, 2-pentanone, ε-caprolactone, γ-butyrolactone, dimethylformamide, dimethylacetamide, hexamethylphosphonium, ethyl lactate, Methyl lactate, ε-caprolactam and N-methylpyrrolidone. Optionally, water can be added to these solvents up to an amount where it still obtains a clear solution and sufficient solubility of the unexposed areas of the photosensitive composition is maintained. Accordingly, the present invention also provides a compound containing an ethylenically unsaturated double bond (ie, a monomer, oligomer, or polymer compound containing at least one ethylenically unsaturated double bond, which includes at least one Photoinitiator of chemical formula I, II or III) and photopolymerization with electromagnetic radiation (especially light with a wavelength of 150 to 600 nm (especially 190-600 nm)), electron beam or X-ray irradiation Composition method. The present invention further provides a coated substrate, which is coated on at least one surface with the composition as described above, and is a method for producing a relief image, wherein the coated substrate receives an image type After exposure, the unexposed portion is removed with a developer. Image-wise exposure can be produced by irradiation through a mask or by laser or electron beam as described above. Particularly advantageous in this context are laser beam exposures as described above. The composition of the invention has good thermal stability and low volatility, and is also suitable for photopolymerization in the presence of air (oxygen). Furthermore, only low yellowing is caused in the composition after photopolymerization. The following examples illustrate the invention in more detail. Unless otherwise stated, this paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) '-(Please read the precautions on the back before filling this page)

593357 A7 -— B7_ 五、發明綱(91^ ' &quot; — &quot;~— 外,份數及百分率係如描述内容之其餘部份及申請專利範 圍中般以重量計。若具有多於3個碳原子之烧基被述及且 未指出特殊異構物時,於每一情況中係意指正異構物。 範例1 : H6-苯甲醯基·9_乙基,辛小綱砖〇-乙酸 酯之合成 於化學式(I)中,Ar 正-C7H15 H6-苯甲醯基‘9-乙基-9·Η·-叶唑-3_基)-辛-1-酮 於40亳升CHfl2内之7.83克(40.1亳莫耳)N-乙基咔 唑,添加5.91克(42.0亳莫耳)之苯甲醯基氣化物及5.88 克(44.1亳莫耳)Alcl3。於室溫攪拌4小時後,6 89克(42 3 毫莫耳)之辛醯基氯化物及5.92克(44.4毫莫耳)之A1C13 被添加。此反應混合物於室溫攪拌4 5小時。然後,此反 應混合物被倒入冰水内。產物以CH2C12萃取。此CH2C12 層以水、飽和NaHC03水溶液且以鹽水清洗,其後於無水 MgS〇4乾燥。於矽石凝膠上藉由管柱色譜分析術以cH2Cl2· 己烧(1:1)作為洗提液純化,產生12.7克之白色固體 (74.2%)。結構藉由 ijj-NMR 光譜(CDC13)確認。6 [ppm]:0.89 (t,3H),1.20-1.57 (m,11H),1.79 (t,2H),3.09 (t,2H),4.45 (q, 2H),7·54 (m,3H),7.61 (dd,2H),7.85 (dd,2H),8.09 (d,1H), 8.19 (d,1H),8.64 (d,1H),8.74 (d,1H)。 本紙張尺度適用中國國家標準(⑽)A4規格(210X297公釐) -94 -593357 A7 -— B7_ V. Outline of Invention (91 ^ '&quot; — &quot; ~ — In addition, parts and percentages are by weight as in the rest of the description and in the scope of the patent application. If there are more than 3 When a carbon atom is mentioned and a specific isomer is not indicated, it is meant in each case as an n-isomer. Example 1: H6-benzylidene 9-ethyl, Xin Xiaogang brick 0-B Synthesis of the acid ester in the formula (I), Ar n-C7H15 H6-benzylidene'9-ethyl-9 · Η · -frazol-3_yl) -oct-1-one in 40 liters of CHfl2 7.83 g (40.1 亳 mol) of N-ethylcarbazole, 5.91 g (42.0 亳 mol) of benzamidine gaseous and 5.88 g (44.1 亳 mol) of Alcl3 were added. After stirring for 4 hours at room temperature, 6 89 g (42 3 mmol) of octyl chloride and 5.92 g (44.4 mmol) of A1C13 were added. The reaction mixture was stirred at room temperature for 4 5 hours. The reaction mixture was then poured into ice water. The product was extracted with CH2C12. This CH2C12 layer was washed with water, saturated NaHC03 aqueous solution and brine, and then dried over anhydrous MgS04. Purification on silica gel by column chromatography using cH2Cl2 · hexane (1: 1) as eluent yielded 12.7 g of a white solid (74.2%). The structure was confirmed by ijj-NMR spectrum (CDC13). 6 [ppm]: 0.89 (t, 3H), 1.20-1.57 (m, 11H), 1.79 (t, 2H), 3.09 (t, 2H), 4.45 (q, 2H), 7.54 (m, 3H) , 7.61 (dd, 2H), 7.85 (dd, 2H), 8.09 (d, 1H), 8.19 (d, 1H), 8.64 (d, 1H), 8.74 (d, 1H). This paper size applies to Chinese National Standard (⑽) A4 (210X297 mm) -94-

----- (請先閲讀背面之注意事項再填寫本頁) .訂— 593357 五、發明説明(92 )----- (Please read the notes on the back before filling this page). Order — 593357 V. Description of the invention (92)

Ul 1-(6-苯甲醯基-9-乙基-9·Η·-咔唑-3-基)_辛_卜綱將 於溶於5毫升水内之羥基氫化銨(〇·39克;5·57毫莫 耳)及乙酸鈉(0.54克,6.57愛莫耳)添加於Μ毫升乙醇内 之1-(6-苯甲醯基-9-乙基-9·Η·-咔唑-3-基)_辛_丨_酮(2 14 克;5·03莫耳)。迴流7小時後,札〇被添加至反應混合 物,形成之白色固體被濾出,以水清洗且溶於四氫呋喃 (THF)。於無水MgS〇4上乾燥此THF溶液後,於減壓下 濃縮產生2.16克之淡黃色固體(97%)。結構藉由1h_nmr 光譜(CDC13)確認。(5 [ppm]:0.85 (t,3H),1.20-1.70 (m,13H), 2.90 (tt,2H),4.40 (g,2H),7·51 (m,3H),7·61 (t,2H),7·84 (m,2Η),8·65 (dd,1Η),8.32 (d,1Η),8·63 (d,1Η)。此固體 無需進一步純化地被用於下一反應。Ul 1- (6-benzylidene-9-ethyl-9 · Η · -carbazol-3-yl) _octyl_bugang will be ammonium hydroxyhydride (0.39 g) dissolved in 5 ml of water 5 · 57 mmol) and sodium acetate (0.54 g, 6.57 Emole) 1- (6-benzylidene-9-ethyl-9 · -9 · -carbazole- 3-yl) _octyl_one_one (2 14 g; 5.03 mole). After refluxing for 7 hours, Zeo was added to the reaction mixture, and the white solid formed was filtered off, washed with water and dissolved in tetrahydrofuran (THF). After drying this THF solution over anhydrous MgS04, it was concentrated under reduced pressure to give 2.16 g of a pale yellow solid (97%). The structure was confirmed by 1h_nmr spectrum (CDC13). (5 [ppm]: 0.85 (t, 3H), 1.20-1.70 (m, 13H), 2.90 (tt, 2H), 4.40 (g, 2H), 7.51 (m, 3H), 7.61 (t , 2H), 7.84 (m, 2Η), 8.65 (dd, 1Η), 8.32 (d, 1Η), 8.63 (d, 1Η). This solid was used in the next reaction without further purification. .

Li 1-(6-本甲醯基-9-乙基-9·Η·-叶嗤-3-基)-辛-1-輞將〇_乙 酸S旨 1-(6-苯曱醯基-9-乙基-9·Η·-咔唑-3-基)-辛-1- _脖 (2.09克;4.75毫莫耳)被容於25毫升之第三丁基甲基醚。 於此溶液,氣化乙醯(0.53克,4.75毫莫耳)被添加,然後 1亳升之三乙基胺於l〇°C時滴入。於室溫攪拌2.5小時後, 反應混合物被倒入水,且產物以乙酸乙酯萃取。有機層以 飽和NaHC〇3水溶液清洗,然後以鹽水清洗,其後於硫酸 鎖上乾燥。濃縮後,於矽石凝膠上藉由管柱色譜分析術以 CI^Cl2-己烷(2:1)作為洗提液純化,產生〇67克之微棕色 UO (m,13H),2.28 (s,3H),2·96 (t,2H),4.43 (q,2H), 7·43-7·65 (m,5H),7.84 (dd,2H),7.93 (dd,1H),8.08 (dd, 張尺度家標準(⑽M規格^^97公爱)--7-95~:-- 593357 A7-R7 五、發明説明(93 )1H),8.44 (dd,1H),8.62 (s,1H)。範例2-13範例2-13之化合物係依據範例1所述方法且自相對 應之醛或酮製得。化合物及iH-NMR數據係如第1及2 表所示。 第1表 範例 ΑΓι Ri r2 狀態/熔點[°c] !H-NMR δ rppm] 2 9 ch3 正-C7H15 85-86 '~-- 0.88 (t, 3H), 1.20-1.65 (m, 10H), 2.27 (s, 3H), 2.83 (t, 2H), 7.34 (d, 2H), 7.48 (m, 4H), 7.59 (m, 1H), 7.72 (m, 4H), 7.78 (dd, 2H) 3 20σ ch3 H 141-142 2.22 (s, 3H), 5.19 (s, 2H), 7.01 (d, 2H), 7.26 (d, 2H), 7.41 (d, 1H), 7.41 (d, 2H), 7.53 (d, 4H), 7.69 (d, 4H), 7.79 (d, 2H), 8.30 (s, 1H) 4 9 . 紙 jac、 苯基 正-C7H15 64-66 0.85 (t, 3H), 1.20-1.80 (m, 8H), 2.92 (t, 2H), 7.43 (d, 2H), 7.44-7.56 (m, 6H), 7.61 (td, 1H), 7.65 (td, 1H), 7.81 (m, 4H), 8.12 (m,4H) 5 Q 。 ch3 H 62-70 2.22 (s, 3H), 5.19 (s, 2H), 7.02 (m, 4H), 7.17 (m, 6H), 7.31 (m, 4H), 7.52 (d, 2H), 7.70 (m, 4H), 7.80 (d, 2H), 8.30 (s, 1H) 6 9 Λ) ch3 H 160 2.23 (s, 3H), 5.21 (s, 2H), 7.04 (d, 2H), 7.41 (t, 1H), 7.45 (t, 2H), 7.56 (d, 2H), 7.66 (d, 2H), 7.71 (m, 4H), 7.87 (d, 2H), 7.90 (d, 2H), 8.31 (s, 1H) (請先閱讀背面之注意事項再填寫本頁)Li 1- (6-benzylidene-9-ethyl-9 · Η · -phyllyl-3-yl) -octane-1-methylacetate S-acetate 1- (6-phenylfluorenyl- 9-Ethyl-9.fluorenyl-carbazol-3-yl) -octane-1-_neck (2.09 g; 4.75 mmol) was contained in 25 ml of tert-butyl methyl ether. To this solution, vaporized acetamidine (0.53 g, 4.75 mmol) was added, and then 1 liter of triethylamine was added dropwise at 10 ° C. After stirring at room temperature for 2.5 hours, the reaction mixture was poured into water, and the product was extracted with ethyl acetate. The organic layer was washed with a saturated aqueous solution of NaHC03, then washed with brine, and then dried with sulfuric acid. After concentration, it was purified on a silica gel by column chromatography using CI ^ Cl2-hexane (2: 1) as the eluent, yielding 67 g of slightly brown UO (m, 13H), 2.28 (s , 3H), 2.96 (t, 2H), 4.43 (q, 2H), 7.43-7.65 (m, 5H), 7.84 (dd, 2H), 7.93 (dd, 1H), 8.08 (dd , Zhang Zhijia Standard (⑽M specifications ^^ 97 public love)-7-95 ~:-593357 A7-R7 V. Description of the invention (93) 1H), 8.44 (dd, 1H), 8.62 (s, 1H) . Examples 2-13 The compounds of Examples 2-13 were prepared according to the method described in Example 1 and from the corresponding aldehydes or ketones. The compounds and iH-NMR data are shown in Tables 1 and 2. Table 1 Example ΑΓι Ri r2 State / Melting point [° c]! H-NMR δ rppm] 2 9 ch3 Positive-C7H15 85-86 '~-0.88 (t, 3H), 1.20-1.65 (m, 10H), 2.27 (s, 3H), 2.83 (t, 2H), 7.34 (d, 2H), 7.48 (m, 4H), 7.59 (m, 1H), 7.72 (m, 4H), 7.78 (dd, 2H) 3 20σ ch3 H 141-142 2.22 (s, 3H), 5.19 (s, 2H), 7.01 (d, 2H), 7.26 (d, 2H), 7.41 (d, 1H), 7.41 (d, 2H), 7.53 (d , 4H), 7.69 (d, 4H), 7.79 (d, 2H), 8.30 (s, 1H) 4 9. Paper jac, phenyl n-C7H15 64-66 0.85 (t, 3H), 1.20-1.80 (m , 8H), 2.92 (t, 2H), 7.43 (d, 2H), 7.44-7.56 (m, 6H), 7.61 (td, 1H), 7.65 (td, 1H), 7.81 (m, 4H), 8.12 ( m, 4H) 5 Q. ch3 H 62-70 2.22 (s, 3H), 5.19 (s, 2H), 7.02 (m, 4H), 7.17 (m, 6H), 7.31 (m, 4H), 7.52 (d, 2H), 7.70 (m , 4H), 7.80 (d, 2H), 8.30 (s, 1H) 6 9 Λ) ch3 H 160 2.23 (s, 3H), 5.21 (s, 2H), 7.04 (d, 2H), 7.41 (t, 1H ), 7.45 (t, 2H), 7.56 (d, 2H), 7.66 (d, 2H), 7.71 (m, 4H), 7.87 (d, 2H), 7.90 (d, 2H), 8.31 (s, 1H) (Please read the notes on the back before filling this page)

、可I 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 96 593357 A7B7 五、發明説明(94 ) 7 ch3 H 67-69 1.24 (t, 6H), 2.31 (s, 3H), 3.45 (q, 4H), 5.35 (d, 2H), 6.66 (d, 2H), 7.30 -8.00 (m, 13H), 9.04 (d, 1H), 9.22 (s, 1H) 8 0 σ ch3 H 139 2.23 (s, 3H), 5.47 (s, 2H), 7.00 (d, 2H), 7.58-7.72 (m, 4H), 7.88-8.08 (m, 4H), 8.29 (s, 1H), 8.53 (s, 1H) 9 9 °W〇 ,衡 H3C&quot;0 ch3 H 139-146 2.22 (s, 3H), 2.40 (tt, 2H), 3.92 (s, 3H), 4.29 (m, 4H), 6.91 (, 3H), 7.13 (dd, 1H), 7.39 (d, 1H), 7.48 (m, 3H), 7.60 (td, 1H), 7.86 (dd, 2H), 8.08 (s, 1H), 8.28 (s, 1H) 10 f n-C3H7 ch3 正-C3H7 104-108 1.01 (t, 6H), 1.60 (qt, 2H), 1.78 (qt, 2H), 2.27 (s, 3H), 2.83 (t, 2H), 2.95 (t, 2H), 7.32 (d, 2H), 7.40-7.50 (m, 6H), 7.72 (m, 6H), 7.91 (d, 2H) 11 ch3 ch3 H 176-177 2.32 (s, 3H), 3.50 (s, 3H), 4.14 (s, 3H), 6.87 (d, 1H), 6.98 (d, 2H)? 7.45 (dd, 1H)? 7.51 (t, 1H), 7.80 (m, 4H), 8.03 (dd, 6H), 8.45 (s, 1H) 12 ^Kxy1 c2h5 苯基 正-C7H15 48-56 0.86 (t, 3H), 1.22-1.65 (m, 11H), 2.29 (s, 3H), 2.85 (t, 2H), 4.45 (q, 2H), 7.52 (m, 4H), 7.63 (t, 1H), 7.86 (dd, 2H), 8.09 (dd, 1H), 8.30 (dd, 1H), 8.66 (d, 1H), 8.86 (d, 1H) (請先閲讀背面之注意事項再填寫本頁) -、可| ;夢_ 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 97 593357 A7B7 五、發明説明(95 ) 13 9 . c2h5 ch3 正-c7h15 液體 0.86 (t, 3H), 1.22-1.70 (m, 11H), 2.24 (s, 3H), 2.85 (t, 2H), 4.45 (q, 2H), 7.52 (m, 4H), 7.63 (t, 1H), 7.86 (dd, 2H), 8.09 (dd, 1H), 8.30 (dd, 1H), 8.66 (d, 1H)? 8.86 (d, 1H) 14 〇pxxsja ch3 正-C7H15 液體 0.87 (t, 3H), 1.24-1.39 (m, 8H), 1.56 (tt, 2H), 2.26 (s, 3H), 2.83 (t, 2), 7.27 (dd, 2H), 7.46-7.58 (m, 6H), 7.72 (dd5 2H), 7.76 (dd, 2H), 7.92 (dd, 2H), 8.00 (dd, 1H)? 8.06 (dd, 1H) 15 0FXXsXX ch3 正-c7h15 143-145 1.00 (t, 3H), 1.60 (qt, 2H), 2.25 (s, 3H), 2.80 (t, 2H), 7.24 (dd, 2H), 7.34 (dd, 1H), 7.40 (m, 3H), 7.46 (dd, 2H), 7.54 (m, 2H), 7.65-7.75 (m, 6H) 16 ο Φ h 9〇η2 0 ch3 H 118-121 2.23 (s, 3H), 4.41 (s, 4H), 7.00 (m, 4H), 7.27 (dd, 2H), 7.40 (m, 3H), 7.52 (dd, 2H), 7.66 (dd, 2H), 7.70 (dd, 2H), 7.80 (dd, 2H), 8.31 (d, 1H) 17 jO V〇 〇9Wn2i&lt;r ch3 H 液體 2.21 (s, 3H), 5.17 (s, 2H), 5.21 (s, 2H), 6.91 (m, 4H), 7.21 (dd, 2H), 7.37 (m, 3H), 7.50 (m, 6H), 7.72 (m, 6H), 8.32 (s, 1H) 18 ο Φ Vv 9 ch〇-o-ch2 0 ch3 H 97-99 2.06 (s, 3H), 2.32 (tt, 2H), 4.22 (t, 2H), 4.26 (t, 2H), 6.94 (dd, 2H), 7.00 (dd, 4H), 7.22 (dd, 6H),7.36 (m, 3H),7.49 (dt, 2H), 7.62 (dd, 2H), 7.76 (dd, 2H), 7.81 (dd, 2H), 9.86 (s, 1H) (請先閲讀背面之注意事項再填寫本頁) .訂— 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 98 593357 A7 B7 五、發明説明(96 19 § Φ 0 ch3 H 102-111 1.68 (tt, 2H), 1.86 (tt, 4H), 2.20 (s? 3H), 4.03 (m? 4H), 6.90 (dd, 4H), 7.24 (d, 2H), 7.37 (m, 3H), 7.48 (dd, 2H), 7.64 (dd, 4H), 7.76 (dd, 2H), 8.26 (dd, 2H) 20 Ο Λ 0 ch3 H 121-124 2.00 (tt, 4H), 2.21 (s, 3H), 4.09 (d, 4H), 6.86 (m, 4H), 7.22 (dd, 2H), 7.39 (m, 3H), 7.50 (dd, 2H), 7.62 (m, 4H), 7.77 (dd, 2H), 8.28 (s, 1H) 21 φ ch3 H 97 2.20 (s, 3H), 5.20 (s, 3H), 7.00 (dd, 2H), 7.24 (dd, 4H), 7.42-7.90 (m, 26H), 8.32 (s, 1H) 22 Ο Λ, 0 ch3 C2H5 118-121 2.27 (s, 3H), 2.27 (s, 3H), 5.22 (s, 2H), 7.02 (dd, 2H), 7.25 (m, 4H), 7.40 (m, 3H)? 7.52 (dt, 4H), 7.69 (dd, 2H), 7.79 (dd, 2H), 8.12 (dd, 2H) 23 Ο X h_r$ ίί-〇-^ 0 ch3 ch3 133-138 1.12 (t, 13H), 2.90 (q, 2H), 5.20 (s, 2H), 7.00 (dd, 2H), 7.23 (dd, 2H), 7.40 (m, 3H), 7.52 (dt, 4H), 7.68 (dd, 2H), 7.78 (dd, 2H), 7.96 (dd, 2H) 24 [Q」 L ο 」 2 ch3 苯基 81-86 2.20 (s, 3H), 7.15-7.63 (m, 19H), 7.76-7.86 (m, 8H) 25 ρ 0 ^Cp C2H5 ch3 正-c3h7 52 1.05 (t, 3H), 1.50 (t, 3H), 1.85 (qt, 2H), 3.10 (t, 2H), 4.40 (q, 2H), 7.46-7.56 (m, 4H), 7.63 (dd, 2H), 7.85 (dd, 2H), 8.10 (dd, 1H), 8.20 (dd, 1H), 8.64 (d, 1H), 8.74 (d, 1H) (請先閲讀背面之注意事項再填寫本頁) 訂— 靜_ 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593357, 可 I This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 96 593357 A7B7 V. Description of the invention (94) 7 ch3 H 67-69 1.24 (t, 6H), 2.31 (s, 3H), 3.45 (q, 4H), 5.35 (d, 2H), 6.66 (d, 2H), 7.30 -8.00 (m, 13H), 9.04 (d, 1H), 9.22 (s, 1H) 8 0 σ ch3 H 139 2.23 (s, 3H), 5.47 (s, 2H), 7.00 (d, 2H), 7.58-7.72 (m, 4H), 7.88-8.08 (m, 4H), 8.29 (s, 1H), 8.53 (s, 1H ) 9 9 ° W〇, H3C &quot; 0 ch3 H 139-146 2.22 (s, 3H), 2.40 (tt, 2H), 3.92 (s, 3H), 4.29 (m, 4H), 6.91 (, 3H), 7.13 (dd, 1H), 7.39 (d, 1H), 7.48 (m, 3H), 7.60 (td, 1H), 7.86 (dd, 2H), 8.08 (s, 1H), 8.28 (s, 1H) 10 f n-C3H7 ch3 positive-C3H7 104-108 1.01 (t, 6H), 1.60 (qt, 2H), 1.78 (qt, 2H), 2.27 (s, 3H), 2.83 (t, 2H), 2.95 (t, 2H ), 7.32 (d, 2H), 7.40-7.50 (m, 6H), 7.72 (m, 6H), 7.91 (d, 2H) 11 ch3 ch3 H 176-177 2.32 (s, 3H), 3.50 (s, 3H ), 4.14 (s, 3H), 6.87 (d, 1H), 6.98 (d, 2H)? 7.45 (dd, 1H)? 7.51 (t, 1H), 7.80 (m, 4H), 8.03 (dd, 6H) , 8.45 (s, 1H) 12 ^ Kxy1 c2h5 phenyl n-C7H15 48-56 0.86 (t, 3H), 1.22-1.65 (m, 11H), 2.29 (s, 3H), 2.85 (t, 2H), 4.45 (q, 2H), 7.52 (m, 4H), 7.63 (t, 1H), 7.86 (dd, 2H), 8.09 ( dd, 1H), 8.30 (dd, 1H), 8.66 (d, 1H), 8.86 (d, 1H) (Please read the notes on the back before filling out this page)-、 可 |; 梦 _ This paper size is applicable to China National Standard (CNS) A4 Specification (210X297 mm) 97 593357 A7B7 V. Description of Invention (95) 13 9. C2h5 ch3 Positive-c7h15 Liquid 0.86 (t, 3H), 1.22-1.70 (m, 11H), 2.24 (s , 3H), 2.85 (t, 2H), 4.45 (q, 2H), 7.52 (m, 4H), 7.63 (t, 1H), 7.86 (dd, 2H), 8.09 (dd, 1H), 8.30 (dd, 1H), 8.66 (d, 1H)? 8.86 (d, 1H) 14 〇pxxsja ch3 positive-C7H15 liquid 0.87 (t, 3H), 1.24-1.39 (m, 8H), 1.56 (tt, 2H), 2.26 (s , 3H), 2.83 (t, 2), 7.27 (dd, 2H), 7.46-7.58 (m, 6H), 7.72 (dd5 2H), 7.76 (dd, 2H), 7.92 (dd, 2H), 8.00 (dd , 1H)? 8.06 (dd, 1H) 15 0FXXsXX ch3 positive-c7h15 143-145 1.00 (t, 3H), 1.60 (qt, 2H), 2.25 (s, 3H), 2.80 (t, 2H), 7.24 (dd , 2H), 7.34 (dd, 1H), 7.40 (m, 3H), 7.46 (dd, 2H), 7.54 (m, 2H), 7.65-7.75 (m, 6H) 16 ο Φ h 9〇η2 0 ch3 H 118-121 2.23 (s, 3H), 4.41 ( s, 4H), 7.00 (m, 4H), 7.27 (dd, 2H), 7.40 (m, 3H), 7.52 (dd, 2H), 7.66 (dd, 2H), 7.70 (dd, 2H), 7.80 (dd , 2H), 8.31 (d, 1H) 17 jO V〇09Wn2i &lt; ch3 H liquid 2.21 (s, 3H), 5.17 (s, 2H), 5.21 (s, 2H), 6.91 (m, 4H), 7.21 (dd, 2H), 7.37 (m, 3H), 7.50 (m, 6H), 7.72 (m, 6H), 8.32 (s, 1H) 18 ο Φ Vv 9 ch〇-o-ch2 0 ch3 H 97-99 2.06 (s, 3H), 2.32 (tt, 2H), 4.22 (t, 2H), 4.26 (t, 2H), 6.94 (dd, 2H), 7.00 (dd, 4H), 7.22 (dd, 6H), 7.36 (m, 3H), 7.49 (dt, 2H), 7.62 (dd, 2H), 7.76 (dd, 2H), 7.81 (dd, 2H), 9.86 (s, 1H) (Please read the notes on the back before filling This page). Ordering — This paper size is in accordance with Chinese National Standard (CNS) A4 (210X297 mm) 98 593357 A7 B7 V. Description of the invention (96 19 § Φ 0 ch3 H 102-111 1.68 (tt, 2H), 1.86 (tt, 4H), 2.20 (s? 3H), 4.03 (m? 4H), 6.90 (dd, 4H), 7.24 (d, 2H), 7.37 (m, 3H), 7.48 (dd, 2H), 7.64 ( dd, 4H), 7.76 (dd, 2H), 8.26 (dd, 2H) 20 Ο Λ 0 ch3 H 121-124 2.00 (tt, 4H), 2.21 (s, 3H), 4.09 (d, 4H), 6.86 ( m, 4H), 7.22 (dd, 2H), 7.39 (m, 3H), 7.50 ( dd, 2H), 7.62 (m, 4H), 7.77 (dd, 2H), 8.28 (s, 1H) 21 φ ch3 H 97 2.20 (s, 3H), 5.20 (s, 3H), 7.00 (dd, 2H) , 7.24 (dd, 4H), 7.42-7.90 (m, 26H), 8.32 (s, 1H) 22 Ο Λ, 0 ch3 C2H5 118-121 2.27 (s, 3H), 2.27 (s, 3H), 5.22 (s , 2H), 7.02 (dd, 2H), 7.25 (m, 4H), 7.40 (m, 3H)? 7.52 (dt, 4H), 7.69 (dd, 2H), 7.79 (dd, 2H), 8.12 (dd, 2H) 23 Ο X h_r $ ίί-〇- ^ 0 ch3 ch3 133-138 1.12 (t, 13H), 2.90 (q, 2H), 5.20 (s, 2H), 7.00 (dd, 2H), 7.23 (dd, 2H), 7.40 (m, 3H), 7.52 (dt, 4H), 7.68 (dd, 2H), 7.78 (dd, 2H), 7.96 (dd, 2H) 24 (Q '' L ο '' 2 ch3 phenyl 81- 86 2.20 (s, 3H), 7.15-7.63 (m, 19H), 7.76-7.86 (m, 8H) 25 ρ 0 ^ Cp C2H5 ch3 positive-c3h7 52 1.05 (t, 3H), 1.50 (t, 3H), 1.85 (qt, 2H), 3.10 (t, 2H), 4.40 (q, 2H), 7.46-7.56 (m, 4H), 7.63 (dd, 2H), 7.85 (dd, 2H), 8.10 (dd, 1H) , 8.20 (dd, 1H), 8.64 (d, 1H), 8.74 (d, 1H) (Please read the notes on the back before filling out this page) Order — Static _ This paper size applies to China National Standard (CNS) A4 specifications (210X297 mm) 593357

7 7 A B 五、發明説明(97 ) 26 p Ό^ρ c2h5 ch3 ch3 126 1.47 (t, 3H), 2.27 (s, 3H), 2.49 (s, 3H), 4.42 (q, 2H), 7.48 (m, 4H), 7.52 (td, 1H), 7.83 (dd, 2H), 7.98 (dd, 1H), 8.08 (dd, 1H), 8.44 (d, 1H), 8.58 (d, 1H) 27 p 。如 c2h5 ch3 c2h5 162-163 1.26 (t, 3H), 1.50 (t, 3H), 2.30 (s, 3H), 3.00 (qt, 2H), 4.44 (q, 2H), 7.50 (m, 4H), 7.61 (td, 1H), 7.85 (dd, 2H), 7.96 (dd, 1H), 8.09 (dd? 1H), 8.45 (d, 1H), 8.62 (d, 1H) 28 CH3 Μ X ch3 y 05 N c2h5 ch3 ch3 150-152 1.48 (t, 3H), 2.14 (s, 6H), 2.29 (s, 3H), 2.38 (s, 3H), 2.51 (s, 3H), 4.42 (q, 2H), 6.95 (s, 2H), 7.44 (m , 2H), 7.94 (dd, 1H), 8.10 (m, 1H), 8.44 (d, 1H), 8.50 (m, 1H) 29 0 c2h5 ch3 ch3 110-113 1.45 (t? 3H), 2.30 (s, 3H), 2.38 (s, 3H)? 2.50 (s, 3H), 4.40 (q, 2H), 7.25-7.50 (m, 6H), 7.90 (dd, 1H), 8.10 (dd, 1H), 8.40 (d, 1H), 8.50 (d, 1H) 30 p 。却 ch3 ch3 136-138 0.98 (t, 3H), 1.40 (t, 3H), 1.90 (tt, 2H), 2.30 (s, 3H), 2.50 (s, 3H), 4.30 (t, 2H), 7.50 (m, 4H), 7.62 (td, 1H), 7.85 (dd, 2H), 7.98 (dd? 1H), 8.08 (dd, 1H) (請先閲讀背面之注意事項再填寫本頁) •、可|7 7 AB V. Description of the invention (97) 26 p Ό ^ ρ c2h5 ch3 ch3 126 1.47 (t, 3H), 2.27 (s, 3H), 2.49 (s, 3H), 4.42 (q, 2H), 7.48 (m , 4H), 7.52 (td, 1H), 7.83 (dd, 2H), 7.98 (dd, 1H), 8.08 (dd, 1H), 8.44 (d, 1H), 8.58 (d, 1H) 27 p. Such as c2h5 ch3 c2h5 162-163 1.26 (t, 3H), 1.50 (t, 3H), 2.30 (s, 3H), 3.00 (qt, 2H), 4.44 (q, 2H), 7.50 (m, 4H), 7.61 (td, 1H), 7.85 (dd, 2H), 7.96 (dd, 1H), 8.09 (dd? 1H), 8.45 (d, 1H), 8.62 (d, 1H) 28 CH3 Μ X ch3 y 05 N c2h5 ch3 ch3 150-152 1.48 (t, 3H), 2.14 (s, 6H), 2.29 (s, 3H), 2.38 (s, 3H), 2.51 (s, 3H), 4.42 (q, 2H), 6.95 (s, 2H), 7.44 (m, 2H), 7.94 (dd, 1H), 8.10 (m, 1H), 8.44 (d, 1H), 8.50 (m, 1H) 29 0 c2h5 ch3 ch3 110-113 1.45 (t? 3H ), 2.30 (s, 3H), 2.38 (s, 3H)? 2.50 (s, 3H), 4.40 (q, 2H), 7.25-7.50 (m, 6H), 7.90 (dd, 1H), 8.10 (dd, 1H), 8.40 (d, 1H), 8.50 (d, 1H) 30 p. Ch3 ch3 136-138 0.98 (t, 3H), 1.40 (t, 3H), 1.90 (tt, 2H), 2.30 (s, 3H), 2.50 (s, 3H), 4.30 (t, 2H), 7.50 ( m, 4H), 7.62 (td, 1H), 7.85 (dd, 2H), 7.98 (dd? 1H), 8.08 (dd, 1H) (Please read the precautions on the back before filling this page) • 、 may |

本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 100 593357 A7B7 五、發明説明(98 )This paper size applies to Chinese National Standard (CNS) A4 specification (210X297 mm) 100 593357 A7B7 V. Description of invention (98)

(請先閲讀背面之注意事項再填寫本頁) R1~C—(j) (j&gt;—C—^ 第2表(Please read the notes on the back before filling this page) R1 ~ C— (j) (j &gt; —C— ^ Table 2

Rj—C—Ar^Cr-Rj* 範例 Ail R1 R2 R2, 狀態/熔點[°C] 'H-NMR, δ [ppm] 34 sjaaxx? ch3 正-C3H7 正-C3H7 82-94 1.00 (t, 3H), 1.62 (qt, 2H), 2.27 (s, 6H), 2.83 (t, 4H), 7.33 (d, 4H), 7.47 (d, 4H), 7.70 (d, 4H)? 7.72 (d, 4H) 於範例35-36中,下列敏感劑被使用: S-1 4’-雙(二乙基胺基)-苯醯苯(EAB) S-2 2-異丙基噻噸酮及4-異丙基噻噸酮之混合物 (R™QUANTACURE ITX) 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 593357 A7 _B7_ 五、發明説明(99 ) 範例35 : (請先閲讀背面之注意事項再填寫本頁) 用於敏感性測試之可光固化組成物係藉由混合下列組 份而製得: 200.0份重量之丙烯酸酯化之丙烯基共聚物 (RTMACA200M,由 Daicel Industries,Ltd· 提供,固體含量係50重量%) 15.0份重量之二季戊四醇六丙烯酸酯((DPHA), 由 UCBChemicals 提供。 100.0份重量之丙酮 於此混合物,0.5%(以固體含量為基準計)之敏感劑及 0.5%或2.0%(以固體含量為基準計)之欲被測試之引發劑 被添加並攪拌。所有操作係於黃光下進行。組成物被塗敷 於紹板。溶劑於80°C之對流爐内加熱15分鐘而移除。乾 燥膜之厚度係25//m。於此塗覆物上塗敷乙酸酯膜,其上 係置放具21級之不同光學密度(Stouffer階梯式光楔)之標 準化測試負片。樣品被覆蓋第二紫外線透明膜,且藉由真 空按壓至金屬板上。曝光係使用60公分距離之金屬鹵化 物燈(0RC,SMX 3000型)於第一測試系列進行40秒,於 第二系列進行80秒,且於第三系列進行160秒。曝光後, 覆蓋膜及遮罩被移除,且被曝光之膜於30°C且藉由喷灑 型式之顯影器(Walter Lemmen,T21型)以1%碳酸納水溶 液顯影180秒。所用引發劑系統之敏感性係藉由指示顯影 後保留(即,聚合)之最高階段數而定其特性。階段數愈高, 被測試系統愈具敏感性。結果係收集於第3表。 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 102 593357 A7B7 五、發明説明(100 ) 第3表 光引發劑 範例 光引發劑 濃度 敏感劑 曝光下列時間後再生之階段數 40秒 80秒 160秒 2 2.0% - 13 15 17 3 2.0% - 12 15 16 3 2.0% S-2 13 15 17 4 2.0% - 12 14 16 5 0.5% - 11 13 15 1 2.0% - 14 17 19 8 2.0% S-2 12 15 16 9 0.5% - 13 16 17 14 2.0% - 14 17 18 10 2.0% - 14 16 18 11 2.0% - 12 14 16 12 0.5% - 11 13 15 13 0.5% - 15 18 20 18 2.0% - 8 1 13 16 2.0% - 11 13 15 17 2.0% - 8 10 12 19 2.0% - 6 8 10 14 2.0% - 13 15 17 21 2.0% - 7 10 12 20 2.0% - 5 8 9 24 2.0% - 9 12 14 22 2.0% - 10 13 14 25 2.0% - 14 16 17 23 2.0% - 11 13 14 15 2.0% - 11 14 15 26 2.0% - 13 16 17 27 2.0% - 13 15 17 28 2.0% - 13 16 17 29 2.0% - 13 16 17 30 2.0% - 13 16 17 31 2.0% - 10 13 14 (請先閲讀背面之注意事項再填寫本頁)Rj—C—Ar ^ Cr-Rj * Example Ail R1 R2 R2, state / melting point [° C] 'H-NMR, δ [ppm] 34 sjaaxx? Ch3 positive-C3H7 positive-C3H7 82-94 1.00 (t, 3H ), 1.62 (qt, 2H), 2.27 (s, 6H), 2.83 (t, 4H), 7.33 (d, 4H), 7.47 (d, 4H), 7.70 (d, 4H)? 7.72 (d, 4H) In Examples 35-36, the following sensitizers were used: S-1 4'-bis (diethylamino) -phenylacetophenone (EAB) S-2 2-isopropylthioxanthone and 4-isopropyl Mixture of thioxanthone (R ™ QUANTACURE ITX) This paper size is applicable to Chinese National Standard (CNS) A4 (210X297 mm) 593357 A7 _B7_ V. Description of Invention (99) Example 35: (Please read the precautions on the back (Fill in this page again.) The photocurable composition used for the sensitivity test was prepared by mixing the following components: 200.0 parts by weight of an acrylated propylene-based copolymer (RTMACA200M, provided by Daicel Industries, Ltd., Solid content is 50% by weight) 15.0 parts by weight of dipentaerythritol hexaacrylate ((DPHA), provided by UCB Chemicals. 100.0 parts by weight of acetone in this mixture, 0.5% (based on solid content) sensitizer and 0.5% Or 2.0% ( Based on the solid content), the initiator to be tested is added and stirred. All operations are performed under yellow light. The composition is coated on a shao board. The solvent is heated in a convection oven at 80 ° C for 15 minutes. Remove. The thickness of the dried film is 25 // m. An acetate film is coated on this coating, and a standardized test negative film with 21 different optical densities (Stouffer step wedge) is placed thereon. Sample It is covered with a second ultraviolet transparent film and pressed on a metal plate by vacuum. The exposure is performed using a metal halide lamp (0RC, SMX 3000) at a distance of 60 cm for 40 seconds in the first test series and in the second series. 80 seconds, and 160 seconds in the third series. After exposure, the cover film and mask are removed, and the exposed film is at 30 ° C by a spray type developer (Walter Lemmen, T21 type) to A 1% sodium carbonate aqueous solution is developed for 180 seconds. The sensitivity of the initiator system used is determined by indicating the highest number of stages that are retained (ie, polymerized) after development. The higher the number of stages, the more sensitive the system being tested. The results are collected in Table 3. Zhang scale applies Chinese National Standard (CNS) A4 specification (210X297 mm) 102 593357 A7B7 V. Description of the invention (100) Table 3 Photoinitiator example Photoinitiator concentration sensitizer Exposure to the following period of regeneration after 40 seconds 80 160 seconds 2 2.0%-13 15 17 3 2.0%-12 15 16 3 2.0% S-2 13 15 17 4 2.0%-12 14 16 5 0.5%-11 13 15 1 2.0%-14 17 19 8 2.0% S-2 12 15 16 9 0.5%-13 16 17 14 2.0%-14 17 18 10 2.0%-14 16 18 11 2.0%-12 14 16 12 0.5%-11 13 15 13 0.5%-15 18 20 18 2.0 %-8 1 13 16 2.0%-11 13 15 17 2.0%-8 10 12 19 2.0%-6 8 10 14 2.0%-13 15 17 21 2.0%-7 10 12 20 2.0%-5 8 9 24 2.0% -9 12 14 22 2.0%-10 13 14 25 2.0%-14 16 17 23 2.0%-11 13 14 15 2.0%-11 14 15 26 2.0%-13 16 17 27 2.0%-13 15 17 28 2.0%- 13 16 17 29 2.0%-13 16 17 30 2.0%-13 16 17 31 2.0%-10 13 14 (Please read the notes on the back before filling this page)

、可I 範例36 : 聚(曱基丙烯酸笨曱酯-共-曱基丙烯酸)之製備 24克之甲基丙烯酸苯甲酯、6克之曱基丙烯酸及0.525 克之重氮雙異丁腈(AIBN)被溶於90毫升之丙二醇1-單甲 基醚2-乙酸酯(PGMEA)。形成之反應混合物被置入80°C 之預熱油浴内。於80°C之氮氣下攪拌5小時,形成之黏 稠溶液被冷卻至室溫且於未進一步純化下被使用。固體含 量係約25%。 敏感性測試 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 103 593357 A7 _ B7 _ 五、發明説明(101 ) 用於敏感性測試之可光固化組成物係藉由混合下列組 份而製得: (請先閲讀背面之注意事項再填寫本頁) 200.0份重量之曱基丙烯酸苯甲酯及甲基丙烯酸之共聚物 (曱基丙烯酸苯甲酯:甲基丙烯酸=80:20之 重量比),25%之丙二醇1-單曱基醚2-乙酸 酯(PGMEA)溶液,如上所述般製得 50.0份重量之二季戊四醇六丙烯酸酯(DPHA),由UCB Chemicals 提供) 2.0份重量之欲被測試之光引發劑, 150.0份重量之PGMEA,及選擇性之 1.2份重量之敏感劑 所有操作係於黃色光下進行。此組成物係使用具線繞 捲棒之電塗敷器塗敷於鋁板。溶劑於l〇〇°C之對流爐内加 熱2分鐘而移除。乾燥膜之厚度係2//m。具21級之不同 光學密度(Stouffer階梯式光楔)之標準化測試負膜被置 放,且於此膜與阻劑間具有約100 // m之空氣間隙。曝光 作用係使用具15cm距離之250W超過壓汞燈(USHI0, USH-250BY)進行。於測試負膜上藉由光學動力計(0RC紫 外光測量(UV Light Measure) UV-M02 型,具 UV-35 檢測 器)測量之總曝光量係1000mJ/cm2。曝光後,被曝光之膜 於30°〇:且藉由噴灑型式之顯影器(界&amp;以1*1^11111^11,丁21型) 以1%碳酸鈉水溶液顯影100秒。所用引發劑系統之敏感 性係藉由指示顯影後保留(即,聚合)之最高階段數而定其 特性。階段數愈高,被測試系統愈具敏感性。結果係列 本紙張尺度適用中國國家標準(CNS) A4規格(210X297公釐) 104 593357 A7 B7 五、發明説明(102 ) 示於第4表。 第4表 光引發劑之範例 於1000mJ/cm2曝光後再生之階段數 無敏感劑 S-l(EAB) S-2(ITX) 2 17 - - 3 14 15 15 4 14 - - 5 15 - - 1 20 - - 7 15 - - 9 14 - - 14 18 - - 10 18 - - 12 16 - - 18 - 13 13 16 13 14 14 17 - - 12 14 18 - 19 21 16 - - 20 - - 12 24 18 - - 22 15 - 16 25 20 - - 23 15 - - 15 18 - - 26 20 - - 27 19 - - 28 19 - - 29 20 - - 30 19 - - 31 17 - - (請先閲讀背面之注意事項再填寫本頁) 、^τ— 本紙張尺度適用中國國家標準(CNS) Α4規格(210X297公釐) 105Ke I Example 36: Preparation of poly (benzyl methacrylate-co-fluorenyl acrylic acid) 24 g of benzyl methacrylate, 6 g of fluorenyl acrylic acid and 0.525 g of diazobisisobutyronitrile (AIBN) Dissolved in 90 ml of propylene glycol 1-monomethyl ether 2-acetate (PGMEA). The resulting reaction mixture was placed in a pre-heated oil bath at 80 ° C. After stirring at 80 ° C under nitrogen for 5 hours, the resulting viscous solution was cooled to room temperature and used without further purification. The solids content is about 25%. Sensitivity test The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 103 593357 A7 _ B7 _ V. Description of the invention (101) The photocurable composition used for the sensitivity test is made by mixing the following groups Made from: (Please read the precautions on the back before filling out this page) 200.0 parts by weight of a copolymer of benzyl methacrylate and methacrylic acid (benzyl methacrylate: methacrylic acid = 80:20 Weight ratio), 25% propylene glycol 1-monofluorenyl ether 2-acetate (PGMEA) solution, 50.0 parts by weight of dipentaerythritol hexaacrylate (DPHA) was prepared as described above, provided by UCB Chemicals) 2.0 Parts by weight of the photoinitiator to be tested, 150.0 parts by weight of PGMEA, and optionally 1.2 parts by weight of the sensitizer. All operations were performed under yellow light. This composition was applied to an aluminum plate using an electric applicator having a wire-wound rod. The solvent was removed by heating in a convection oven at 100 ° C for 2 minutes. The thickness of the dry film is 2 // m. A standardized test negative film with 21 different optical densities (Stouffer step wedge) was placed with an air gap of about 100 // m between this film and the resist. The exposure was performed using a 250W over-pressure mercury lamp (USHI0, USH-250BY) with a distance of 15cm. The total exposure measured on the test negative film by an optical power meter (0RC UV Light Measure) UV-M02 with UV-35 detector is 1000mJ / cm2. After exposure, the exposed film was developed at 30 °: and developed by a spray type developer (Boundary &amp; 1 * 1 ^ 11111 ^ 11, Ding 21 type) with a 1% sodium carbonate aqueous solution for 100 seconds. The sensitivity of the initiator system used is determined by indicating the highest number of stages that are retained (i.e., polymerized) after development. The higher the number of stages, the more sensitive the system being tested. Result series This paper size is in accordance with Chinese National Standard (CNS) A4 specification (210X297 mm) 104 593357 A7 B7 5. The description of the invention (102) is shown in Table 4. Table 4 Example of photoinitiator No. of sensitizer Sl (EAB) S-2 (ITX) after regeneration at 1000mJ / cm2 without exposure 2 17--3 14 15 15 4 14--5 15--1 20- -7 15--9 14--14 18--10 18--12 16--18-13 13 16 13 14 14 17--12 14 18-19 21 16--20--12 24 18--22 15-16 25 20--23 15--15 18--26 20--27 19--28 19--29 20--30 19--31 17--(Please read the notes on the back before filling out this Page), ^ τ— This paper size applies to China National Standard (CNS) Α4 specification (210X297 mm) 105

Claims (1)

593357 A8 B8 C8 D8 六、申請專利範圍 第91112531號專利申請案申請專利範圍修正本92年12月15曰 1 · 一種作為光引發劑之化學式I、π及ΠΙ之化合物,593357 A8 B8 C8 D8 VI. Application for Patent Scope No. 91112531 Patent Application Amendment for Patent Scope Revised December 15, 1992 1 · A compound of chemical formula I, π and ΠI as a photoinitiator 其中 經濟部智慧財產局員工消費合作社印製 Ri係氫、Cs-Cs環烷基或烷基,其係未被取代或 以一或更多之鹵素、苯基及/或CN取代;或Ri係C2-C5 烯基;或Ri係苯基,其係未被取代或以一或更多之Cl_c6 烷基、鹵素、CN、0R3、SR4及/或NR5R6取代;或R! 係C!-Cs烧氧基、苯甲基氧;或苯氧基,其係未被取代 或以一或更多之(^-(:6烷基及/或鹵素取代; R2及R2’彼此個別係氫;未被取代之烧基或以一 或更多之鹵素、OR3、苯基及/或以〇r3、SR4及/或NR5R6 取代之苯基取代之烷基;或R2及r2,係(:3-(:8環 烷基;或係C^-Cm烷基,其係以一或更多-〇-間斷及/或 選擇性以一或更多之鹵素、〇r3、苯基及/或以〇r3、Sr4 及/或NR〗R6取代之苯基取代;或r2及r2’係苯基,其係 未被取代或以一或更多之烷基、苯基、鹵素、〇r3、 SR4及/或NR#6取代;或r2及r2,係c2-C2G烷醯基或苯 甲醯基,其係未被取代或以一或更多之C^-C^烷基、苯 基、0R3、SR4 及/或 NR5R6 取代;R2 及 R2,係 C2-C12 烷 氧基¥厌基’其選擇性地以一或更多之-0-間斷及/或選擇 -106 - .n n n I» n 1 n ϋ ϋ n I (請先閱ts背面之注意事項再填寫本頁) 裝 . 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公发) 593357 六 經濟部智慧財產局員工消費合作社印製 A8 B8 C8 D8 申請專利範圍 性以一或更多之羥基取代;或r2及r2,係苯氧基羰基, 其係未被取代或以Ci-Cs烷基、鹵素、苯基、or3、sr4 及/或 NR5R6 取代;或 r2 及 r2,係 CN、-CONR5R6、n〇2、 CVC4鹵烷基、s⑼m-Cl_c6烷基;s(0)m-苯基,其選擇 性地以CrC12烷基或SOrCi-Q烷基取代;或係so2o-苯基’其選擇性地以q-Cu烷基取代;或係二苯基膦醯 基或'一- (Ci_C4烧氧基)-鱗酿基;或r2及R2’係如下之基Among them, the Intellectual Property Bureau of the Ministry of Economic Affairs's Consumer Cooperative printed Ri-based hydrogen, Cs-Cs cycloalkyl or alkyl, which are unsubstituted or substituted with one or more halogen, phenyl and / or CN; or Ri-based C2-C5 alkenyl; or Ri is phenyl, which is unsubstituted or substituted with one or more Cl_c6 alkyl, halogen, CN, OR3, SR4, and / or NR5R6; or R! Is C! -Cs Oxygen, benzyloxy; or phenoxy, which is unsubstituted or substituted with one or more (^-(: 6 alkyl and / or halogen; R2 and R2 'are each hydrogen independently; not A substituted alkyl group or an alkyl group substituted with one or more halogen, OR3, phenyl, and / or phenyl substituted with 0, 3, SR4, and / or NR5R6; or R2 and r2, are (: 3- (: 8 cycloalkyl; or C ^ -Cm alkyl, which is interrupted by one or more -0- and / or optionally by one or more halogens, 0r3, phenyl, and / or 0r3, Sr4 and / or NR] R6 substituted phenyl substitution; or r2 and r2 'are phenyl, which are unsubstituted or substituted with one or more alkyl, phenyl, halogen, Or3, SR4 and / or NR # 6substituted; or r2 and r2, which are c2-C2G alkylfluorenyl or benzamidine, which are not Or substituted with one or more C ^ -C ^ alkyl, phenyl, OR3, SR4, and / or NR5R6; R2 and R2, are C2-C12 alkoxy \ naphthyl 'which are optionally substituted with one or More -0-intermittent and / or select -106-.nnn I »n 1 n ϋ ϋ n I (Please read the precautions on the back of ts before filling out this page) Packing. This paper size applies to Chinese national standards (CNS ) A4 specification (210 X 297) 593357 Printed by the Consumer Property Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A8 B8 C8 D8 The scope of patent application is substituted by one or more hydroxyl groups; or r2 and r2, are phenoxycarbonyl groups, It is unsubstituted or substituted with Ci-Cs alkyl, halogen, phenyl, or3, sr4 and / or NR5R6; or r2 and r2, CN, -CONR5R6, no2, CVC4 haloalkyl, s⑼m-Cl_c6 Alkyl; s (0) m-phenyl, which is optionally substituted with CrC12 alkyl or SOrCi-Q alkyl; or is so2o-phenyl 'which is optionally substituted with q-Cu alkyl; or two Phenylphosphinofluorenyl or 'mono- (Ci_C4alkyloxy) -scalyyl; or r2 and R2' are the following groups Aq係苯基、萘基、苯甲醯基或萘醯基,每一者係以鹵 素、烷基、C3_C8環烷基、苯甲基及/或苯氧基羰 基取代1至7次;或其每一者係以苯基或以藉由一或更 多之OR3、SR*及/或NRSR6取代之苯基取代;或其每一 者係以C^-Cu烷氧基羰基(其選擇性地係一或更多之_〇-間斷及/或選擇性地以一或更多之羥基取代)取代;或其 每一者係以 0R3、SR4、SOR4、S02R4 及/或 NR5R6 取代, 其中取代基0R3、SRd NR5R6選擇性地經由r3、r4、 R5及/或R6與苯基或萘基環上之進一步取代基形成t或 6-元環;或其每一者係以如下之基取代Aq is phenyl, naphthyl, benzamyl, or naphthyl, each of which is substituted 1 to 7 times with halogen, alkyl, C3-C8 cycloalkyl, benzyl, and / or phenoxycarbonyl; or Each is substituted with phenyl or phenyl substituted with one or more OR3, SR * and / or NRSR6; or each of them is substituted with C ^ -Cualkoxycarbonyl (which optionally Is one or more _〇- intermittently and / or optionally substituted with one or more hydroxyl groups); or each of them is substituted with OR3, SR4, SOR4, S02R4, and / or NR5R6, wherein the substituents 0R3, SRd NR5R6 optionally form a t or 6-membered ring via r3, r4, R5 and / or R6 with further substituents on the phenyl or naphthyl ring; or each of them is substituted with the following 107 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公发) (請先閱ts背面之注意事項再填寫本頁)107 This paper size applies to China National Standard (CNS) A4 (210 X 297) (please read the precautions on the back of ts before filling this page) 593357 A8 B8 C8 D8 申請專利範圍 但 若R2非(A)、(B)或(C)基,則An係苯基、萘基、苯甲醯 基或萘醯基,其每一者係以至少一 -(CO)R7、(D)、(E)或 (F)基取代; Ah係伸苯基、伸萘基、伸苯基二羰基或伸萘基二幾基, 每一者係以鹵素、q-Cu烷基、C^Cs環烷基、苯甲基、 0R3、sr4、s〇R4、so2r4 及/或 nr5r6取代 1 至 4 次; 或每一者係以-(CO)R7、(D)、(E)或(F)基取代; 但 若R2或R2,非(A)、(B)或(C)基且Ah係伸苯基、伸萘基、 伸笨基二幾基或伸萘基二羰基,則Ar2係以_(c〇)r7、 (D) 、(E)或(F)基之至少一者取代; 若R2非氫或(A)、(B)或(C)基,每一者係以-(c〇)R7、(E〇、 (E) 或(F)基之至少一者取代, (請先閱tt背面之注意事項再填寫本頁) 丨裝 訂. Ar2另外係 或 每 經濟部智慧財產局員工消費合作社印剔取593357 A8 B8 C8 D8 But if R2 is not (A), (B) or (C) group, then An is phenyl, naphthyl, benzamyl or naphthyl, each of which is at least Mono- (CO) R7, (D), (E), or (F) group substitution; Ah is phenylene, naphthyl, phenylene dicarbonyl, or naphthyl dialkyl, each of which is halogen , Q-Cu alkyl, C ^ Cs cycloalkyl, benzyl, 0R3, sr4, so4, so2r4, and / or nr5r6 substituted 1 to 4 times; or each is-(CO) R7, ( D), (E) or (F) group substitution; but if R2 or R2, is not (A), (B) or (C) group and Ah is phenylene, naphthyl, diphenylyl or Arnaphthyldicarbonyl, then Ar2 is substituted with at least one of (C) r7, (D), (E) or (F) groups; if R2 is not hydrogen or (A), (B) or (C ), Each of which is replaced by at least one of-(c〇) R7, (E〇, (E) or (F) radical, (please read the precautions on the back of tt before filling this page) 丨 binding. Ar2 is additionally selected by the Consumer Property Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 或 一者係未被取代或以鹵素、燒基、苯甲基、〇r3、 SR4及/或NR#6取代1至4次;或每一者係以_(c〇)R7、 (D)、(E)或(F)基取代; 若112係(八)、(B)或(C)基, Ar2另外係 108 本紙張尺度適用宁國國家標準(CNS)A4規格(210 x 297公发) 593357 8888 ABCD 申請專利範圍Or one is unsubstituted or substituted 1 to 4 times with halogen, alkyl, benzyl, 0r3, SR4, and / or NR # 6; or each is _ (c〇) R7, (D) , (E) or (F) group substitution; if the 112 series is (eight), (B) or (C) group, Ar2 is another 108. ) 593357 8888 ABCD patent application scope nJCCf . ’母一者係未被取代或以鹵 素、C1-C12烧基、本曱基、OR3、SR4及/或NR5R6取代1 至4次,或每一者係以-(CO)R7、(D)、(E)或(F)基取代; 或Ar2係 .nJCCf. 'One of the parent is unsubstituted or substituted 1 to 4 times with halogen, C1-C12 alkyl, benzyl, OR3, SR4 and / or NR5R6, or each is-(CO) R7, ( D), (E) or (F) group substitution; or Ar2 series. CHg-M^CHiCHg-M ^ CHi 經濟部智慧財產局員工消費合作社印制取 每一者係未被取代或以鹵素烷基、苯甲基、 SR4及/或NR5R6取代1至6次;其中取代基〇r3、 或NR#6選擇性地經由I、Re Rs及/或&amp;與苯基或秦 基環之碳原子之一形成5-或6-元環;或每一者係^ -(CO)R7、(D)、(E)或(F)基取代; Ars係苯基、萘基或香豆素基,每一者係以_素、 烷基、c^-c:8環烷基、苯甲基及/或苯氧基羰基取代i至 7次;或每一者係以苯基或以藉由一或更多之〇r3、 及/或NRSR6取代之苯基取代;或每一者係以 109 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公发) 593357 A8 B8 C8 D8 申請專利範圍 氧基羰基(其選擇性地以一或更多之間斷及/或選擇 性以一或更多之羥基取代)取代;或每一者係以or3、 SR4、SOR4、S02R4 及/或 NR5R6 取代; 厘〖係Ci-C^o伸烷基,其選擇性地以一或更多之-Ο-間斷 及/或選擇性以一或更多之鹵素、OR3、苯基或以OR3、 SR4及/或NR5R6取代之苯基取代;或Mi係伸苯基或伸 萘基,每一者係未被取代或以一或更多之烷基、 苯基、_素、OR3、SR4及/或NR5R6取代;或Mi係如下 之基 —MrCHrCPrinted by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, each of which is unsubstituted or substituted 1 to 6 times with haloalkyl, benzyl, SR4 and / or NR5R6; among which the substituent 〇3 or NR # 6 is selected Form a 5- or 6-membered ring with one of the carbon atoms of the phenyl or pentenyl ring via I, Re Rs and / or &amp; or each of them is-(CO) R7, (D), ( E) or (F) group substitution; Ars is phenyl, naphthyl or coumarin group, each of which is _ prime, alkyl, c ^ -c: 8 cycloalkyl, benzyl and / or benzene Oxycarbonyl is substituted i to 7 times; or each is substituted with phenyl or phenyl substituted with one or more 0r3, and / or NRSR6; or each is applied at 109 paper sizes Chinese National Standard (CNS) A4 specification (210 X 297 issued) 593357 A8 B8 C8 D8 Patent application scope oxycarbonyl (selectively with one or more breaks and / or optionally with one or more hydroxyl groups Substitution) substitution; or each is substituted with or3, SR4, SOR4, S02R4, and / or NR5R6; and is a Ci-C ^ o alkylene, which is optionally substituted by one or more -0- discontinuities and And / or optionally with one or more More halogen, OR3, phenyl or phenyl substituted with OR3, SR4 and / or NR5R6; or Mi is phenyl or naphthyl, each of which is unsubstituted or substituted with one or more alkyl groups , Phenyl, phenylene, OR3, SR4, and / or NR5R6; or Mi is as follows—MrCHrC (Η), (請先閱讀背面之注音?事項再填寫本頁) ·«丨 -裝 經濟部智慧財產局員工消費合作社印製 其選擇性以_素、cvc12烷基、苯甲基、or3、sr4、sor4、 S02R4及/或NR5R6取代1至4次;其中取代基〇r3、Sr4 或NR5R6選擇性地經由R3、R4、R5及/或R6與其它苯基 環之碳原子之一形成5·或6-元環; 但 若Ar!係苯基、萘基、苯甲醯基或萘醯基,每一者係未 以-(CO)-R7、(D)、(E)或(F)基取代,則吣係(〇)或(H)基, 其選擇性地以鹵素、CVCu烷基、苯甲基、0R3、Sr4、 SOR4、S02R4及/或NR5R6取代1至4次;其中取代基 OR3、SR4或NR5R6選擇性地經由R3、R4、r5及/或R6 與其它苯基環之碳原子之一形成5 -或6-元環; M2係直接鍵、Ci-Cn伸烷基或伸環己基;或熥2係Cl-Cl0 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公发〉 訂. L. 110 593357 A8 B8 C8 D8 六、申請專利範圍 伸院基或Ci-Cio伸烧基-X- ’其每一者係選擇性地以一 或更多之-0-間斷及/或選擇性以一或更多之鹵素、〇r3、 苯基或以OR3、SR4及/或NR5R6取代之笨基取代;或 Μ?係伸苯基或伸萘基或伸苯基,每一者係未被取代 或以一或更多之CVC6烷基、苯基、鹵素、〇r3、Sr4及 /或 NR5R6 取代;或 M2 係 Cl-ClG 伸烷基_c(0)_x-、Ci_Ci() 伸烷基-X-C(O)-、伸苯基-C(0)-X-4 CVCio伸烷基-伸苯 -X-, M3及M3’彼此個別為直接鍵、C^-Cio伸烷基或伸環己 基;或M3及M3’係CkCw伸烷基或Ci-Cio伸烷基-X-, 其每一者係選擇性地以一或更多之-0-間斷及/或選擇性 以一或更多之齒素、or3、苯基或以〇r3、sr4及/或nr5r6 取代之苯基取代;或m3及m3’係伸苯基、伸萘基或伸苯 基-X_,每一者係未被取代或以一或更多之Cl-c6烷基、 苯基、_素、or3、sr4及/或nr5r6取代;或m3及m3, 係 CVCn 伸烷基-c(0)-x-、Ci-Cw 伸烷基-X-C(O)-、伸 苯基-c(o)-x-、cvc1()伸烷基-伸苯基-X-或伸苯基-C(0)-伸苯基; 經濟部智慧財產局員工消費合作社印製 但 若Αι*ι係秦基、茶酿基或2-R3O-苯基’其每一者係未以 (CO)R7、(D)、(E)或(F)基取代,貝|J M3 及 M3,非 CVC10 伸烷基-X-、伸苯基-X-或 CrCK伸烷基-伸笨基-X-; M4及M4’彼此個別為直接鍵、-〇-、-S-、-NR5’-或-C0-; 或M4及M4’係-Y^CVCh)伸烷基)-Y’-,其選擇性地以一 111 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公g ) 593357 A8 B8 C8 D8 申請專利範圍 或更多之-〇-間斷及/或選擇性以一或更多之鹵素、〇r3、 苯基或以0R3、SR4及/或NR5R6取代之苯基取代;或 M4及M4’係-Y-伸苯基-Y’-或-Y-伸萘基-Y’-,其每一者係 未被取代或以一或更多之Ci-C6烧基、苯基、鹵素、〇r3、 SR4及/或NR5R6取代;或m4及M4’係-YJCVC#伸烧 基)-0-伸苯基-0-(CkC4伸烷基)-Y’-或-YJCVQ伸烷 基)-0-伸秦基_0-(Ci_C4伸烧基)-Y’_ ;或M4及M4’係 -X-Ci-Ci〇伸烧基-X-C(O)-’其選擇性地以一或更多之-〇_(Η), (Please read the note on the back? Matters before filling out this page) · «丨-Installed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs to print its optional sr4, sor4, S02R4 and / or NR5R6 are substituted 1 to 4 times; wherein the substituents 0r3, Sr4 or NR5R6 are optionally formed via R3, R4, R5 and / or R6 with one of the other phenyl ring carbon atoms. Or 6-membered ring; however, if Ar! Is phenyl, naphthyl, benzamyl, or naphthyl, each is not-(CO) -R7, (D), (E), or (F) Group substitution, then the (吣) or (H) group is optionally substituted 1 to 4 times with halogen, CVCu alkyl, benzyl, OR3, Sr4, SOR4, S02R4, and / or NR5R6; wherein the substituents are OR3, SR4, or NR5R6 optionally forms a 5- or 6-membered ring with one of the other phenyl ring carbon atoms via R3, R4, r5, and / or R6; M2 is a direct bond, Ci-Cn alkylene or Cyclohexyl; or 熥 2 series Cl-Cl0 This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 issued). L. 110 593357 A8 B8 C8 D8 VI. Application scope of patent extended to the base or Ci- Cio Extender-X- Each of them is optionally substituted with one or more -0-breaks and / or optionally with one or more halogens, or3, phenyl, or a benzyl substituted with OR3, SR4, and / or NR5R6 ; Or M? Is phenylene or naphthyl or phenylene, each of which is unsubstituted or substituted with one or more CVC6 alkyl, phenyl, halogen, O3, Sr4, and / or NR5R6; Or M2 Cl-ClG alkylene_c (0) _x-, Ci_Ci () alkylene-XC (O)-, phenylene-C (0) -X-4 CVCio alkylene-phenylene- X-, M3 and M3 'are each a direct bond, C ^ -Cio alkylene or cyclohexyl; or M3 and M3' are CkCw alkylene or Ci-Cio alkylene-X-, each of which Is optionally substituted with one or more -0-breaks and / or optionally with one or more odontins, or3, phenyl or phenyl substituted with 0r3, sr4 and / or nr5r6; or m3 And m3 'is phenylene, naphthyl or phenylene-X_, each of which is unsubstituted or substituted with one or more Cl-c6 alkyl, phenyl, phenylene, or3, sr4, and / or nr5r6 substitution; or m3 and m3, are CVCn alkylene-c (0) -x-, Ci-Cw alkylene-XC (O)-, phenylene-c (o) -x-, cvc1 () Alkylene-benzene -X- or phenylene-C (0) -phenylene; printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, but if Ai * ι is Qinji, tea brewing or 2-R3O-phenyl 'each One is not substituted with (CO) R7, (D), (E) or (F) groups, J M3 and M3, non-CVC10 alkylene-X-, phenylene-X- or CrCK butane -Mendyl-X-; M4 and M4 'are each a direct bond, -0-, -S-, -NR5'- or -C0-; or M4 and M4' are -Y ^ CVCh) alkylene ) -Y'-, which selectively applies the Chinese National Standard (CNS) A4 specification (210 X 297 g) on a 111 paper scale-593357 A8 B8 C8 D8-0-intermittent and / Or optionally substituted with one or more halogen, or3, phenyl or phenyl substituted with OR3, SR4 and / or NR5R6; or M4 and M4 'are -Y-phenylene-Y'- or -Y -Naphthyl-Y'-, each of which is unsubstituted or substituted with one or more Ci-C6 alkyl, phenyl, halogen, 0r3, SR4 and / or NR5R6; or m4 and M4 ' -YJCVC # Dendroyl) -0-Dendphenyl-0- (CkC4Dendyl) -Y'- or -YJCVQ Dendyl) -0-Dendinyl_0- (Ci_C4Dendyl)- Y'_; or M4 and M4’-based -X-Ci-Ci〇 alkynyl-X-C (O)-'which is optionally selected from one or more -〇_ (請先閱讀背面之注意事^:填寫本頁) 裝 經濟部智慧財產局員工消費合作社印製 間斷;或M4及M4’係 一 一 基,其選擇性 地以 iS 素、Ci-Cu 烷基、苯曱基、〇r3、SR4、sor4、so2r4 及/或NR#6取代1至4次;其中取代基〇r3、sr4或 NRsR6選擇性地經由R3、R4、1^5及/或r6基與其它苯基 環之碳原子之一或附接至此基之苯基或萘基者形成5-或 6-元環; M4”係直接鍵、-0-、-s-、-NR5,-或-C0-;或 M4” 係 -Y^Ci-Cio伸烧基)-Y’_,其選擇性地以一或更多之間 斷及/或選擇性以一或更多之鹵素、〇R3、苯基或以〇R3、 SR*及/或NR^6取代之苯基取代;或m4,,係·γ-伸苯基 -Υ’-或-Υ-伸萘基-Υ、,其每一者係未被取代或以一或更 多之CKC6烷基、苯基、鹵素、〇R3、Sr4及/或nr5r6 取代;或M4”係-X-q-Cw伸烷基-X-C(O)-,其選擇性地 以一或更多之-0-間斷; 112 訂. 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 593357 Α8 Β8 C8 D8 t、申請專利範圍 X及X’彼此個別為-ο-、-s-或-NR5-; Y及Y’彼此個別為直接鍵、-ο-、-s-或-NR5-; R3係氫、CVC20烷基或苯基-CVC3烷基;或R3係CVCs 烷基,其係以-OH、-SH、-CN、C3-C6烯氧基、 -OCH2CH2CN、-OCi^CHKCCOCKCVC^ 烷基)、-〇(CO)-(cvc4 烷基)、-0(C0)-苯基、-(CO)OH 及/或-(CCOCKCVQ 烷基)取代;或R3係c2-c12烷基,其係以一或更多之-ο-間斷;或 R3 係-(CH2CH20)n+1H、-(CI^CI^COJCOHCi-Cs 烷基)、CVC8烷醯基、c2-c12烯基、c3-c6烯醯基、c3-c8 環烧基;或R3係苯甲酿基,其係未被取代或以一或更多 之cvc6烷基、鹵素、-OH及/或cvc4烷氧基取代;或 R3係苯基或萘基,每一者係未被取代或以鹵素、-0H、 CVCu烷基、CkCu烷氧基、苯氧基、CkCu烷基硫烷 基、苯基硫烷基、-NCCi-Cu烷基)2及/或二苯基胺基取代; η 係 1-20 ; R4係氫、CkCm烷基、c2-c12烯基、c3-c8環烷基、苯基 -CVC3烷基;或R4係CVCs烷基,其係以_OH、_SH、-CN、 C3-C6 烯氧基、-OCH2CH2CN、-OCHKHdCCOCKCVQ 烷基)、-0((:0)-((^-(:4 烷基)、-O(CO)-苯基、-(CO)OH 或-(CCOOCCVC^烷基)取代;或R4係c2-c12烷基,其係 以一或更多之-0-或-S-間斷;或R4係(CH2CH20)n+1H、 -(CHzCP^OWCOHCVCs 烷基)、CVQ 烷醯基、c2-c12 烯基、C3-C6烯醯基;或R4係苯曱醯基,其係未被取代 或以一或更多之CVC6烷基、鹵素、-OH、CVC4烷氧基 -113 - (請先閒讀背面之注意事項再填寫本頁) 裝 經濟部智慧財產局員工消費合作社印製 593357 六 _ 經濟部智慧財產局員工消費合作社印製(Please read the note on the back ^: Fill in this page first) Install the consumer's cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs to print discontinuities; or M4 and M4 'are one-based groups, which are optionally based on iS elements, Ci-Cu alkyl groups , Phenylfluorenyl, or3, SR4, sor4, so2r4, and / or NR # 6 are substituted 1 to 4 times; wherein the substituents orr3, sr4, or NRsR6 are optionally via R3, R4, 1 ^ 5, and / or r6 Forms a 5- or 6-membered ring with one of the carbon atoms of another phenyl ring or a phenyl or naphthyl group attached to this group; M4 "is a direct bond, -0-, -s-, -NR5, -or -C0-; or M4 "is -Y ^ Ci-Cio), -Y'_, which is optionally interrupted with one or more and / or selectively with one or more halogen, 〇3, Phenyl or phenyl substituted with OR3, SR *, and / or NR ^ 6; or m4, which is · γ-phenylene-fluorene'- or -fluorene-naphthyl-fluorene, each of which Which is unsubstituted or substituted with one or more CKC6 alkyl, phenyl, halogen, OR3, Sr4, and / or nr5r6; or M4 "is -Xq-Cwalkylene-XC (O)-, which Select one or more -0-intermittent; 112 orders. This paper size applies Chinese National Standard (CNS) A4 regulations (210 X 297 mm) 593357 Α8 Β8 C8 D8 t, the scope of patent application X and X 'are -ο-, -s- or -NR5-, respectively; Y and Y' are direct bonds, -ο-, -s- or -NR5-; R3 is hydrogen, CVC20 alkyl or phenyl-CVC3 alkyl; or R3 is CVCs alkyl, which is -OH, -SH, -CN, C3-C6 alkenyloxy,- OCH2CH2CN, -OCi ^ CHKCCOCKCVC ^ alkyl), -〇 (CO)-(cvc4 alkyl), -0 (C0) -phenyl,-(CO) OH, and / or-(CCOCKCVQ alkyl) substitution; or R3 Is c2-c12 alkyl, which is interrupted by one or more of -ο-; or R3 is-(CH2CH20) n + 1H,-(CI ^ CI ^ COJCOHCi-Cs alkyl), CVC8 alkyl, c2 -c12 alkenyl, c3-c6 alkenyl, c3-c8 cycloalkenyl; or R3 benzyl, which is unsubstituted or substituted with one or more cvc6 alkyl, halogen, -OH, and / or cvc4 alkoxy substituted; or R3 is phenyl or naphthyl, each of which is unsubstituted or halogen, -0H, CVCu alkyl, CkCu alkoxy, phenoxy, CkCu alkylsulfanyl, benzene Sulfanyl, -NCCi-Cualkyl) 2 and / or diphenylamino; η is 1-20; R4 is hydrogen, CkCm alkyl, c2-c12 alkenyl, c3-c8 cycloalkyl, benzene -CVC3 alkyl; or R4 is CVCs alkyl, which is _OH, _SH, -CN, C3-C6 alkenyloxy, -OCH2CH2CN, -OCHKHdCCOCKCVQ alkyl), -0 ((: 0)-((^ -(: 4 alkyl), -O (CO) -phenyl,-(CO) OH, or-(CCOOCCVC ^ alkyl) substitution; or R4 is c2-c12 alkyl, which is substituted by one or more of- 0- or -S-discontinued; or R4 series (CH2CH20) n + 1H,-(CHzCP ^ OWCOHCVCs alkyl), CVQ alkyl group, c2-c12 alkenyl group, C3-C6 alkenyl group; or R4 series phenylfluorene Fluorenyl, which is unsubstituted or substituted with one or more CVC6 alkyl, halogen, -OH, CVC4 alkoxy-113-(Please read the precautions on the back before filling this page) Bureau employee consumer cooperative printed 593357 VI_ Printed by employee property cooperative of the Ministry of Economic Affairs Intellectual Property Bureau Α8 Β8 C8 D8 申請專利範圍 或C^C4烷基硫烷基取代;或r4係苯基或萘基,每一者 係未被取代或以鹵素、Ci-Cu烷基、Ci-Cu烷氧基、苯 基-Ci-C:3烷氧基、苯氧基、c!-c12烷基硫烷基、苯基硫 烧基、-N(Ci-C12烧基)2、二苯基胺基、-(00)0((^-08烧 基)、-(CCO-Ci-Cs:^棊或(CC^NCCi-Cs 烧基)2 取代; R5及R6彼此個別係氫、CVC20烷基、C2-C4羥基烷基、 c2-c1G烷氧基烷基、c2-c5烯基、C3-C8環烷基、苯基-C「C3 烷基、CVCs烷醯基、C3_C12-烯醯基、苯甲醯基;或r5 及r6係苯基或萘基,其每一者係未被取代或以Ci-Ci2 烧基、本甲酿基或C1-C12烧氧基取代;或r5及r6 一起 係CVC6伸烷基,其選擇性地以-0-或-NR3-間斷及/或選 擇性地以羥基、Crq烷氧基、C2-C4烷醯基氧或苯甲醯 基氧取代; R5係氫、C1-C20烧基、C2-C4經基烧基、C2-C1G烧氧基 烷基、C2-C5烯基、C3-C8環烷基、苯基-Ci-Cs烷基、CVCs 烷醯基、烯醯基、苯甲醯基;或r5,係苯基或萘 基,其每一者係未被取代或以c!-c12烷基或CrCu烷氧 基取代,或R5’係 9 基;R7係氫、C1-C20燒 基;Ci-Cs烷基,其係以鹵素、苯基、-OH、-SH、-CN、 c3-c6 η ^ -OCH2CH2CN &gt; -0CH2CH2(C0)0(C1.C4 烷基)、-CKCOXCi-C^ 烷基)、-0(C0)-苯基、-(C0)0H 或-(CCOCKCVC^烷基)取代;或尺7係c2-c12烷基,其係 114 本紙張尺度適用中國國家標準(CNS)A4規格(210·χ 297公釐) (請先閱讀背面之注意事項再填寫本頁)Α8 B8 C8 D8 Patent application scope or C ^ C4 alkylsulfanyl substitution; or r4 is phenyl or naphthyl, each of which is unsubstituted or substituted with halogen, Ci-Cu alkyl, Ci-Cu alkoxy , Phenyl-Ci-C: 3 alkoxy, phenoxy, c! -C12 alkylsulfanyl, phenylsulfanyl, -N (Ci-C12 alkyl), diphenylamino, -(00) 0 ((^-08alkyl),-(CCO-Ci-Cs: ^ 棊 or (CC ^ NCCi-Csalkyl) 2); R5 and R6 are each independently hydrogen, CVC20 alkyl, C2 -C4 hydroxyalkyl, c2-c1G alkoxyalkyl, c2-c5 alkenyl, C3-C8 cycloalkyl, phenyl-C3 alkyl, CVCs alkylfluorenyl, C3_C12-alkenyl, benzyl Fluorenyl; or r5 and r6 are phenyl or naphthyl, each of which is unsubstituted or substituted with Ci-Ci2 alkyl, methylamino or C1-C12 alkyl; or r5 and r6 together are CVC6 Alkylene, which is optionally substituted with -0- or -NR3- and / or optionally substituted with hydroxyl, Crq alkoxy, C2-C4 alkylfluorenyloxy or benzamyloxy; R5 is hydrogen, C1-C20 alkyl, C2-C4 alkyl, C2-C1G alkyloxy, C2-C5 alkenyl, C3-C8 cycloalkyl, phenyl-Ci-Cs alkyl, CVCs alkyl, Alkenyl Benzamidine; or r5, phenyl or naphthyl, each of which is unsubstituted or substituted with c! -C12 alkyl or CrCu alkoxy, or R5 'is 9-based; R7 is hydrogen, C1 -C20 alkyl; Ci-Cs alkyl, which is halogen, phenyl, -OH, -SH, -CN, c3-c6 η ^ -OCH2CH2CN &gt; -0CH2CH2 (C0) 0 (C1.C4 alkyl) , -CKCOXCi-C ^ alkyl), -0 (C0) -phenyl,-(C0) 0H or-(CCOCKCVC ^ alkyl) substitution; or C7-C12 alkyl, which is a 114-paper standard Applicable to China National Standard (CNS) A4 (210 · χ 297 mm) (Please read the precautions on the back before filling this page) 593357 A8 B8 C8 — D8 、申請專利範圍 以一或更多之-0-間斷;或R7係-(CH2CH2〇)n+1H、 -(CI^CI^OMCOHCkCs 烷基)、c2-c12 烯基或 c3-c8 環 規基,或R7係苯基、聯苯基或萘基,其每一者選擇性地 以一或更多之Ci-C6烷基、鹵素、CN、0R3、SR4、S0R4、 so2R4或nr5r6取^代,其中取代基or3、sr4或NR5R6 選擇性地經由r3、r4、r5及/或尺6基與苯基、聯苯基或 萘基環之碳原子之一形成5-或6-元環; R8、R9、R8,及R9,彼此個別係氫、CVCu烷基,其選擇 性以一或更多之鹵素、苯基、CN、-OH、-SH、CVC4烷 氧基、-(CO)OH 或-(CCOCKCVC^ 烷基)取代;或 R8、R9、 R,及R9’係苯基,其選擇性以一或更多之烷基、 鹵素、CN、or3、sr4 或 nr5r6 取代;或 r8、r9、r8, 及 R9,係鹵素、CN、0R3、SR4、S0R4、S02R4 或 NR5R6 ; 其中取代基0R3、SR4或NR5R6選擇性地經由R3、R4、 R5及/或R6基與Ar!之苯基、萘基、苯甲醯基或萘醯基 之碳原子之一或取代基R7者或M3之伸萘基或伸苯基之 碳原子之一形成5-或6·元環;或R8及R9或R8,及r9. 一起係 請 先 Μ 背 面 之 注 意 孝I 項I 填| $裝 頁 it i L 經濟部智慧財產局員工消費合作社印製 ^10 ^11 ^12 ^13-c=c一c=c 或 ^14 ^15 0II C=C一C一〇— 基; R10、Ru、Rl2及Rl3彼此個別係氫、Ci-C12烧基,其選 擇性地以一或更多之鹵素、苯基、CN、-OH、-SH、CVC4 烷氧基、-(C0)0H或-(CCOCHCVC^烷基)取代;或R10、 115 本紙張尺度適用中國國家標準(CNS)A4規格(210 χ 297公发) 經濟部智慧財產局員工消費合作社印製 593357 A8 B8 C8 D8 六、申請專利範圍 Rll、Rl2及Rl3係苯基,其選擇性地以一或更多之CrC6 烧基、鹵素、CN、0R3、SR4或NR5R6取代;或Rio、 Ru、R12 及 R13 係鹵素、CN、OR3、SR4 或 NR5R6 取代; 及 及R15彼此個別係氫、烷基,其選擇性地以一 或更多之鹵素、苯基、CN、_〇H、-SH、CVQ烷氧基、 -(CO)OH或-((:〇)〇((:1-0:4烷基)取代;或1114及尺15係苯 基,選擇性地以一或更多之Ci-C^烷基、鹵素、cn、or3、 sr4或nr5r6取代; 但 (i) 若Aq係苯基,其係以(E)基取代且未額外以(D)或(F) 基取代且R2係氫,則M4非直接建、S或NR5 ; (ii) 若Aq係萘基,其係以(e)基取代且未額外以(d)或(F) 基取代,則M4非直接建、S、0或nr5 ; (iii) 若Μ4係0且R2係氫,則Ar!非以(E)基取代且未額 外以(D)或(F)基取代且於鄰位同時以〇r3取代或以 SR4、NR5R6、苯基、_(c〇)R7或S02R7取代之苯基; (iv) 若An係苯基,其係以-(c〇)r7取代且未額外以(D) 或(F)基取代,則R2非氫; (v) 若Aq係苯基,其係以-(C〇)r7取代且未額外以(D)或 (F)基取代且&amp;非氫,則心非苯基或c广Cii烷基; (vi) 若Ar!係萘基,其係以_(C〇)R7取代且未額外以(D) 或(F)基取代,則汉7非苯基或Ci_Cii烷基; 2. —種可光聚合之組成物,包含: -116 - 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公发) (請先Mti背面之注意事項再填寫本頁)593357 A8 B8 C8 — D8, with one or more -0-interruptions applied for patents; or R7- (CH2CH2〇) n + 1H,-(CI ^ CI ^ OMCOHCkCs alkyl), c2-c12 alkenyl or c3-c8 ring gauge, or R7-based phenyl, biphenyl, or naphthyl, each of which is optionally one or more Ci-C6 alkyl, halogen, CN, OR3, SR4, SOR4, so2R4 Or nr5r6, wherein the substituents or3, sr4, or NR5R6 optionally form 5- or 6 via r3, r4, r5, and / or hexafluoro and one of the carbon atoms of the phenyl, biphenyl, or naphthyl ring -Membered ring; R8, R9, R8, and R9, each of which is hydrogen, CVCu alkyl, and its selectivity is one or more of halogen, phenyl, CN, -OH, -SH, CVC4 alkoxy,- (CO) OH or-(CCOCKCVC ^ alkyl) substitution; or R8, R9, R, and R9'-based phenyl, optionally substituted with one or more alkyl, halogen, CN, or3, sr4, or nr5r6 ; Or r8, r9, r8, and R9, which are halogen, CN, OR3, SR4, S0R4, S02R4, or NR5R6; wherein the substituents OR3, SR4, or NR5R6 are selectively connected to Ar via the R3, R4, R5, and / or R6 groups Carbon atom of phenyl, naphthyl, benzamyl or naphthyl One or a substituent R7 or one of the carbon atoms of naphthyl or phenyl of M3 forms a 5- or 6-membered ring; or R8 and R9 or R8, and r9. Please note on the back of the I Fill in item I | $ Pagination page it i L Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs ^ 10 ^ 11 ^ 12 ^ 13-c = c 一 c = c or ^ 14 ^ 15 0II C = C 一 C 一 〇— R10, Ru, R12, and Rl3 are each independently hydrogen, Ci-C12 alkyl, which are optionally selected from one or more halogen, phenyl, CN, -OH, -SH, CVC4 alkoxy,-( C0) 0H or-(CCOCHCVC ^ alkyl) substitution; or R10, 115 This paper size is applicable to China National Standard (CNS) A4 specifications (210 χ 297 issued) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs Consumer Cooperatives 593357 A8 B8 C8 D8 VI. Patent application scope Rll, Rl2 and Rl3 are phenyl, which are optionally substituted with one or more CrC6 alkyl, halogen, CN, OR3, SR4 or NR5R6; or Rio, Ru, R12 and R13 are halogen , CN, OR3, SR4 or NR5R6; and R15 are each independently hydrogen or alkyl, which is optionally substituted with one or more halogen, phenyl, CN, —OH, —SH, CVQ Oxy,-(CO) OH or-((: 〇) 〇 ((: 1-0: 4 alkyl); or 1114 and 15 'phenyl, optionally with one or more Ci-C ^ Alkyl, halogen, cn, or3, sr4 or nr5r6; but (i) if Aq is phenyl, it is substituted with (E) and not additionally substituted with (D) or (F) and R2 is hydrogen , M4 is not directly built, S or NR5; (ii) If Aq is naphthyl, which is substituted with (e) and is not additionally substituted with (d) or (F), then M4 is not directly built, S, 0 or nr5; (iii) if M4 is 0 and R2 is hydrogen, then Ar! Is not substituted with (E) group and is not additionally substituted with (D) or (F) group and at the same time, it is substituted with 0r3 or with SR4, NR5R6, phenyl, _ (c〇) R7 or S02R7 substituted phenyl; (iv) if An is phenyl, it is substituted with-(c〇) r7 without additional (D) or (F) R2 is not hydrogen; (v) if Aq is phenyl, which is substituted with-(C〇) r7 and is not additionally substituted with (D) or (F) and &amp; non-hydrogen, then non-benzene (Vi) if Ar! Is naphthyl, which is substituted with — (C〇) R7 and is not additionally substituted with (D) or (F), then Han 7 is not phenyl or Ci_Cii Alkyl The polymeric composition comprising: -116-- This paper scale applicable Chinese National Standard (CNS) A4 size (210 X 297 male hair) (Please Note Mti then fill out the back of this page) /、、申請專利範圍 (a) 至少一乙烯不飽和可光聚合化合物,及 (b) 作為光引發劑之至少一如申請專利範圍第1項之化學 式Ϊ、Π及ΙΠ之化合物, 其中’該組成物除該光引發劑(b)外,包含至少一進 一步之光引發劑(C)及/或其它添加劑(d),且 其中’該組成物係包含以該組成物為基準計,〇 〇5 至25重量%之該光引發劑,或該光引發劑(…及。 3·種使含有乙烯不飽和雙鍵之化合物光聚合之方法,其 包§使如申請專利範圍第2項之組成物以150至600 nm範圍之電磁輻射或以電子束或以χ_射線照射。 經濟部智慧財產局員工消費合作社印製 4·如申清專利範圍第2項之組成物,其係用於被著色及未 被著色之塗料及漆、粉末塗覆物、印刷墨水、印刷板、 黏著劑、齒科組成物、凝膠塗覆物、電子產品之光阻劑, 如,電鍍阻劑,蝕刻阻劑,液體及乾燥膜,焊料阻劑, 用以製備用於各種顯示器應用之濾色器或用以產生電漿 顯示面板、電致發光顯示器及LCD之製備方法中之結構 之阻劑,作為封裝電組件及電子組件之組成才勿,用以製 造磁性記錄材料、微機械零件、導波器、光學開關、電 鍍遮罩、蝕刻遮罩、彩色驗證系統、玻璃纖維纜線塗覆 物、網版印刷之印花模版,用於藉由立體石版印刷技術 製備三維物彳,及作為影像記錄材料,特別是用於全拿 照相記錄,微電子電路,脫色材料,詩影像記錄材= 之脫色材料,用於使用微囊劑之影像記錄材料,用於紫 外線及可見光雷射直接影像“之光阻材料,用於形成 --—----- 一 - 117 - 本紙張尺度適用中國國家標準(CNS)A4規格⑵Q 公ϋ—- 經濟部智慧財產局員工消費合作社印製 ΙΓ~Τ~~ --~~----- /、、申請專利範圍 印刷電路板之順序集結層内之介電層之光阻材料。 5·如申請專利範圍第2項之組成物,其係塗覆於-被塗覆 基材之至少-表面上,藉以形成該被塗覆基材。 6·如申請專利_第1項之作為光引發劑之化學式卜„ 及ΠΙ之化合物,其係包括於一含有多官能性丙婦酸酷單 體及有機聚合物黏著劑的光敏性樹脂中,其中_濾光器 係藉由於透明基材上提供紅、綠及藍色像素及黑色基 質,所有皆包含該光敏性樹脂及色料,且於該基材表面 上或該濾色器層表面上提供透明電極而製備。 118 本紙張尺度適用中國國家標準(CNS)A4規格(21〇χ 297公釐)/ 、 Applicable patent scope (a) at least one ethylenically unsaturated photopolymerizable compound, and (b) at least one of the compounds of chemical formulae Π, Π, and ΙΠ as photoinitiator as in item 1 of the patent application scope, where In addition to the photoinitiator (b), the composition includes at least one further photoinitiator (C) and / or other additives (d), and 'the composition system includes the composition as a basis, 〇〇〇 5 to 25% by weight of the photoinitiator, or the photoinitiator (... and. 3. A method for photopolymerizing a compound containing an ethylenically unsaturated double bond, which includes a composition such as the second item in the scope of patent application The object is irradiated with electromagnetic radiation in the range of 150 to 600 nm or with an electron beam or with x-rays. Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. Tinted and untinted paints and lacquers, powder coatings, printing inks, printing plates, adhesives, dental compositions, gel coatings, photoresists for electronic products, such as plating resists, etching resists Agent, liquid and dry film, solder resist Resistors used to prepare color filters for various display applications or structures used in the production methods of plasma display panels, electroluminescence displays, and LCDs are used as components for packaging electrical and electronic components. To manufacture magnetic recording materials, micromechanical parts, wave guides, optical switches, plating masks, etching masks, color verification systems, fiberglass cable coatings, and screen printing printing stencils for use in stereolithography Printing technology to prepare three-dimensional objects, and as image recording materials, especially for all-photographic recording, microelectronic circuits, decoloring materials, poem image recording materials = decoloring materials, used for microencapsulated image recording materials, Photoresist material for direct imaging of ultraviolet and visible light lasers, used to form ------------117-This paper size is applicable to China National Standard (CNS) A4 specifications ⑵Q ϋ--the intellectual property of the Ministry of Economic Affairs Printed by the Consumer Cooperatives of the Bureau ΙΓ ~ Τ ~~-~~ ----- / 、、 Patent application scope of the printed circuit board in order to build up the photoresist material of the dielectric layer in the layer. 5 · If applied The composition of the second item of the invention is coated on at least the surface of the coated substrate to form the coated substrate. 6. As the photoinitiator of the application of the patent _ item 1 The compounds of the formulae Π and ΠI are included in a photosensitive resin containing a polyfunctional acetic acid monomer and an organic polymer adhesive. Among them, the filter is provided by a transparent substrate with red, The green and blue pixels and the black matrix all include the photosensitive resin and colorant, and are prepared by providing a transparent electrode on the surface of the substrate or the surface of the color filter layer. 118 This paper size is applicable to Chinese national standards ( CNS) A4 (21〇χ 297 mm)
TW091112531A 2001-06-11 2002-06-10 Oxime ester photoinitiators having a combined structure TW593357B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP01810559 2001-06-11

Publications (1)

Publication Number Publication Date
TW593357B true TW593357B (en) 2004-06-21

Family

ID=8183958

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091112531A TW593357B (en) 2001-06-11 2002-06-10 Oxime ester photoinitiators having a combined structure

Country Status (10)

Country Link
US (1) US7189489B2 (en)
EP (1) EP1395615B1 (en)
JP (2) JP3860170B2 (en)
KR (1) KR100801457B1 (en)
CN (1) CN100528838C (en)
AT (1) ATE446322T1 (en)
CA (1) CA2446722A1 (en)
DE (1) DE60234095D1 (en)
TW (1) TW593357B (en)
WO (1) WO2002100903A1 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI406840B (en) * 2006-02-24 2013-09-01 Fujifilm Corp Oxime derivative, photopolymerizable composition, color filter, and process for producing the same
TWI668210B (en) * 2013-11-28 2019-08-11 塔可馬科技股份有限公司 Photoinitiator and photosensitive composition including the same

Families Citing this family (486)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4233853B2 (en) * 2002-11-25 2009-03-04 株式会社メニコン Marking method for ophthalmic lens
MXPA05008118A (en) * 2003-02-19 2005-09-30 Ciba Sc Holding Ag Halogenated oxime derivatives and the use thereof as latent acids.
EP1692101B1 (en) * 2003-03-31 2011-07-06 Council of Scientific and Industrial Research Mercapto-phenyl-naphthyl-methane derivatives and preparation thereof
JP3754065B2 (en) * 2003-06-10 2006-03-08 三菱化学株式会社 Photopolymerizable composition and color filter using the same
JP4437651B2 (en) 2003-08-28 2010-03-24 新日鐵化学株式会社 Photosensitive resin composition and color filter using the same
JP4565824B2 (en) * 2003-09-24 2010-10-20 株式会社Adeka Dimer oxime ester compound and photopolymerization initiator containing the compound as an active ingredient
JP4484482B2 (en) * 2003-09-25 2010-06-16 東洋インキ製造株式会社 Photosensitive coloring composition and color filter
TWI344976B (en) * 2003-10-27 2011-07-11 Sumitomo Chemical Co Stained sensitization resin
JP4489566B2 (en) * 2003-11-27 2010-06-23 太陽インキ製造株式会社 Curable resin composition, cured product thereof, and printed wiring board
TW200519535A (en) * 2003-11-27 2005-06-16 Taiyo Ink Mfg Co Ltd Hardenable resin composition, hardened body thereof, and printed circuit board
JP2005202252A (en) * 2004-01-16 2005-07-28 Dainippon Printing Co Ltd Photosensitive coloring composition for solid-state imaging device color filter, solid-state imaging device color filter, solid-state imaging device and manufacturing method of solid-state imaging device color filter
TWI285297B (en) * 2004-02-09 2007-08-11 Chi Mei Corp Light-sensitive resin composition for black matrix
JP2005258398A (en) * 2004-02-12 2005-09-22 Jsr Corp Method of manufacturing plasma display panel and transfer film
JP4639770B2 (en) * 2004-02-20 2011-02-23 Jsr株式会社 Inorganic powder-containing resin composition, transfer film, and method for producing plasma display panel
JP4830310B2 (en) * 2004-02-23 2011-12-07 三菱化学株式会社 Oxime ester-based compound, photopolymerizable composition, and color filter using the same
JP2005300994A (en) * 2004-04-13 2005-10-27 Jsr Corp Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel
DE602005002656T2 (en) * 2004-04-19 2008-07-17 Ciba Specialty Chemicals Holding Inc. Patent Departement NEW PHOTOINITIATORS
JP4448381B2 (en) * 2004-05-26 2010-04-07 東京応化工業株式会社 Photosensitive composition
CA2574054A1 (en) * 2004-07-20 2006-01-26 Ciba Specialty Chemicals Holding Inc. Oxime derivatives and the use therof as latent acids
JP4419736B2 (en) 2004-07-20 2010-02-24 Jsr株式会社 Photosensitive resin composition, display panel spacer and display panel
JP4492238B2 (en) * 2004-07-26 2010-06-30 Jsr株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display panel
JP4766235B2 (en) * 2004-08-12 2011-09-07 Jsr株式会社 Radiation sensitive resin composition and spacer for liquid crystal display element
KR20130040260A (en) * 2004-08-18 2013-04-23 시바 홀딩 인크 Oxime ester photoinitiators
US7696257B2 (en) * 2004-08-20 2010-04-13 Adeka Corporation Oxime ester compound and photopolymerization initiator containing such compound
TWI385485B (en) * 2004-11-17 2013-02-11 Jsr Corp A photosensitive resin composition, a display panel spacer, and a display panel
JP4493487B2 (en) * 2004-12-03 2010-06-30 凸版印刷株式会社 Photosensitive coloring composition and color filter using the same
JP3798008B2 (en) * 2004-12-03 2006-07-19 旭電化工業株式会社 Oxime ester compound and photopolymerization initiator containing the compound
KR101134297B1 (en) * 2004-12-09 2012-04-13 코오롱인더스트리 주식회사 Photosensitive resin composition
JP2006195425A (en) * 2004-12-15 2006-07-27 Jsr Corp Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel
TW200625002A (en) * 2005-01-12 2006-07-16 Chi Mei Corp Photosensitive resin composition for color filter
JP4526964B2 (en) * 2005-01-27 2010-08-18 旭化成イーマテリアルズ株式会社 Photopolymerizable resin laminate, glass substrate with black matrix using the same, and method for producing color filter
US7294657B2 (en) * 2005-03-07 2007-11-13 General Electric Company Curable acrylate compositions, methods of making the compositions and articles made therefrom
TWI347499B (en) * 2005-05-12 2011-08-21 Tokyo Ohka Kogyo Co Ltd A method for increasing optical stability of three-dimensional micro moldings
JP4627227B2 (en) * 2005-06-22 2011-02-09 東京応化工業株式会社 Photosensitive composition and black matrix
CN101223478B (en) 2005-07-13 2011-10-12 太阳控股株式会社 Black paste composition, method of forming black matrix pattern by using the same, and the black matrix pattern formed
KR100989744B1 (en) * 2005-07-13 2010-10-26 다이요 잉키 세이조 가부시키가이샤 Silver paste composition, method for electrically conductive pattern formation using the same, and its electrically conductive pattern
JP4631594B2 (en) * 2005-08-16 2011-02-16 Jsr株式会社 Photosensitive resin composition, display panel spacer and display panel
JP4633582B2 (en) * 2005-09-06 2011-02-16 東京応化工業株式会社 Photosensitive composition
KR100787341B1 (en) * 2005-09-06 2007-12-18 다이요 잉키 세이조 가부시키가이샤 A resin composition, cured material therefrom, and printing wiring boards using the same
JP4650211B2 (en) * 2005-10-31 2011-03-16 東洋インキ製造株式会社 Photopolymerizable composition
JP4650212B2 (en) * 2005-10-31 2011-03-16 東洋インキ製造株式会社 Photopolymerizable composition
KR100763744B1 (en) 2005-11-07 2007-10-04 주식회사 엘지화학 Triazine based photoactive compound comprising oxime ester
KR100814232B1 (en) * 2005-12-01 2008-03-17 주식회사 엘지화학 Colored photosensitive composition comprising triazine based photoactive compound comprising oxime ester
EP2172455B1 (en) 2005-12-01 2011-01-19 Basf Se Oxime ester photoinitiators
US7896650B2 (en) * 2005-12-20 2011-03-01 3M Innovative Properties Company Dental compositions including radiation-to-heat converters, and the use thereof
DE602006012366D1 (en) * 2005-12-20 2010-04-01 Basf Se Oximester-photoinitiatoren
US8026296B2 (en) * 2005-12-20 2011-09-27 3M Innovative Properties Company Dental compositions including a thermally labile component, and the use thereof
JP4874659B2 (en) * 2006-01-24 2012-02-15 富士フイルム株式会社 Aniline compound, method for producing the same, and photosensitive composition
JP4882396B2 (en) 2006-01-31 2012-02-22 Jsr株式会社 Radiation-sensitive composition for forming colored layer, color filter, and liquid crystal display device
US8293436B2 (en) 2006-02-24 2012-10-23 Fujifilm Corporation Oxime derivative, photopolymerizable composition, color filter, and process for producing the same
JP4584164B2 (en) * 2006-03-08 2010-11-17 富士フイルム株式会社 Photosensitive composition, photosensitive film, permanent pattern forming method, and printed circuit board
JP4835835B2 (en) * 2006-03-13 2011-12-14 Jsr株式会社 Side chain unsaturated polymer, radiation sensitive resin composition, and spacer for liquid crystal display device
JP5171005B2 (en) 2006-03-17 2013-03-27 富士フイルム株式会社 Polymer compound, method for producing the same, and pigment dispersant
US20080220372A1 (en) * 2006-03-23 2008-09-11 Chun-Hsien Lee Photosensitive resin composition for black matrix
JP4827088B2 (en) * 2006-04-13 2011-11-30 太陽ホールディングス株式会社 Alkali development type solder resist, cured product thereof, and printed wiring board obtained using the same
WO2007119651A1 (en) * 2006-04-13 2007-10-25 Taiyo Ink Mfg. Co., Ltd. Alkaline development-type solder resist, cured product of the same, and print circuit board produced using the same
TWI403840B (en) 2006-04-26 2013-08-01 Fujifilm Corp Dye-containing negative curable composition, color filter and method for producing the same
KR101320894B1 (en) * 2006-07-05 2013-10-24 삼성디스플레이 주식회사 Photoresist composition and method of manufacturing color filter substrate using the same
KR100781690B1 (en) * 2006-08-24 2007-12-03 한국화학연구원 Photoinitiators having multi-oxime ester functional groups
TW200844652A (en) * 2006-11-15 2008-11-16 Taiyo Ink Mfg Co Ltd Process for forming solder resist film and photosensitive composition
TW200846823A (en) * 2006-11-15 2008-12-01 Taiyo Ink Mfg Co Ltd Photosensitive composition
US7838197B2 (en) * 2006-11-15 2010-11-23 Taiyo Ink Mfg. Co., Ltd. Photosensitive composition
WO2008078678A1 (en) 2006-12-27 2008-07-03 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the compound
EP2128132B1 (en) * 2006-12-27 2014-01-15 Adeka Corporation Oxime ester compound and photopolymerization initiator containing the same
JP4885014B2 (en) * 2007-02-28 2012-02-29 株式会社リコー Image carrier, image forming method using the same, image forming apparatus and process cartridge
JP5030638B2 (en) 2007-03-29 2012-09-19 富士フイルム株式会社 Color filter and manufacturing method thereof
EP1975702B1 (en) 2007-03-29 2013-07-24 FUJIFILM Corporation Colored photocurable composition for solid state image pick-up device, color filter and method for production thereof, and solid state image pick-up device
JP4663679B2 (en) * 2007-05-08 2011-04-06 太陽ホールディングス株式会社 Photocurable resin composition, dry film, cured product, and printed wiring board
ATE526321T1 (en) 2007-05-09 2011-10-15 Adeka Corp NEW EPOXY COMPOUND, ALKALINE DEVELOPABLE RESIN COMPOSITION AND ALKALINE DEVELOPABLE LIGHT SENSITIVE RESIN COMPOSITION
WO2008138732A1 (en) 2007-05-11 2008-11-20 Basf Se Oxime ester photoinitiators
EP2144894B1 (en) * 2007-05-11 2011-01-26 Basf Se Oxime ester photoinitiators
JP5535063B2 (en) * 2007-05-11 2014-07-02 ビーエーエスエフ ソシエタス・ヨーロピア Oxime ester photoinitiator
JP5213375B2 (en) 2007-07-13 2013-06-19 富士フイルム株式会社 Pigment dispersion, curable composition, color filter using the same, and solid-state imaging device
CN102617445B (en) * 2007-07-17 2015-02-18 富士胶片株式会社 Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
KR101007440B1 (en) 2007-07-18 2011-01-12 주식회사 엘지화학 Dendritic photoactive compound comprising oxime ester and method for preparing the same
KR20100028020A (en) 2007-08-01 2010-03-11 가부시키가이샤 아데카 ALKALI-DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION AND β-DIKETONE COMPOUND
JP2009040762A (en) * 2007-08-09 2009-02-26 Ciba Holding Inc Oxime ester photo-initiator
JP4890388B2 (en) * 2007-08-22 2012-03-07 富士フイルム株式会社 Colored photosensitive composition, color filter and method for producing the same
JP5496482B2 (en) * 2007-08-27 2014-05-21 富士フイルム株式会社 Novel compound, photopolymerizable composition, photopolymerizable composition for color filter, color filter and method for producing the same, solid-state imaging device, and lithographic printing plate precursor
JP5448416B2 (en) * 2007-10-31 2014-03-19 富士フイルム株式会社 Colored curable composition, color filter, method for producing the same, and solid-state imaging device
US8449635B2 (en) * 2007-12-06 2013-05-28 Saint-Gobain Abrasives, Inc. Abrasive articles and methods for making same
JPWO2009081483A1 (en) * 2007-12-25 2011-05-06 株式会社Adeka Oxime ester compound and photopolymerization initiator containing the compound
US20110121435A1 (en) * 2008-01-16 2011-05-26 Kazuyuki Mitsukura Photosensitive adhesive composition, filmy adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer, semiconductor device, and process for producing semiconductor device
JP5371449B2 (en) 2008-01-31 2013-12-18 富士フイルム株式会社 Resin, pigment dispersion, colored curable composition, color filter using the same, and method for producing the same
WO2009104468A1 (en) 2008-02-22 2009-08-27 株式会社Adeka Liquid crystal composition containing polymerizable compound, and liquid crystal display element comprising the liquid crystal composition
JP5334624B2 (en) 2008-03-17 2013-11-06 富士フイルム株式会社 Colored curable composition, color filter, and method for producing color filter
JP5305704B2 (en) 2008-03-24 2013-10-02 富士フイルム株式会社 Novel compound, photopolymerizable composition, photopolymerizable composition for color filter, color filter and method for producing the same, solid-state imaging device, and lithographic printing plate precursor
JP2009258705A (en) 2008-03-25 2009-11-05 Fujifilm Corp Original plate of lithographic printing plate
JP5535444B2 (en) 2008-03-28 2014-07-02 富士フイルム株式会社 Green curable composition for solid-state image sensor, color filter for solid-state image sensor, and method for producing the same
JP5173528B2 (en) 2008-03-28 2013-04-03 富士フイルム株式会社 Photosensitive resin composition, light-shielding color filter, method for producing the same, and solid-state imaging device
JP5137662B2 (en) 2008-03-31 2013-02-06 富士フイルム株式会社 Curable composition, color filter and method for producing the same, and solid-state imaging device
JP5528677B2 (en) 2008-03-31 2014-06-25 富士フイルム株式会社 Polymerizable composition, light-shielding color filter for solid-state image sensor, solid-state image sensor, and method for producing light-shielding color filter for solid-state image sensor
WO2009122868A1 (en) 2008-04-01 2009-10-08 株式会社Adeka Trifunctional (meth)acrylate compound and polymerizable composition containing the compound
KR101441998B1 (en) 2008-04-25 2014-09-18 후지필름 가부시키가이샤 Polymerizable composition, light shielding color filter, black curable composition, light shielding color filter for solid-state imaging device, method of manufacturing the same, and solid-state imaging device
WO2009131189A1 (en) 2008-04-25 2009-10-29 三菱化学株式会社 Ketoxime ester compound and use thereof
WO2009145073A1 (en) 2008-05-30 2009-12-03 アドバンスト・ソフトマテリアルズ株式会社 Polyrotaxane, aqueous polyrotaxane dispersion composition, crosslinked body of polyrotaxane and polymer and method for producing the same
CN102112438B (en) * 2008-06-06 2014-07-23 巴斯夫欧洲公司 Oxime ester photoinitiators
ATE541865T1 (en) * 2008-06-06 2012-02-15 Basf Se PHOTO INITIATOR MIXTURES
JP5171506B2 (en) 2008-06-30 2013-03-27 富士フイルム株式会社 NOVEL COMPOUND, POLYMERIZABLE COMPOSITION, COLOR FILTER, PROCESS FOR PRODUCING THE SAME, SOLID-STATE IMAGING ELEMENT, AND lithographic printing plate
WO2010002129A2 (en) * 2008-07-01 2010-01-07 주식회사 엘지화학 Photosensitive resin composition containing a plurality of photoinitiators, and transparent thin film layer and liquid crystal display using the same
KR101121038B1 (en) * 2008-07-01 2012-03-15 주식회사 엘지화학 Photoresist resin composition containing a number of photo-initiators, transparent thin film layer and liquid crystal display using the same
TW201009498A (en) * 2008-07-07 2010-03-01 Fujifilm Corp Colored photosensitive resin composition, method of forming pattern using ultraviolet laser, method of producing color filter using the pattern forming method, color filter, and display device
JP2010044273A (en) 2008-08-14 2010-02-25 Fujifilm Corp Color filter and production method thereof, and solid-state image sensor using the same
JP5274151B2 (en) 2008-08-21 2013-08-28 富士フイルム株式会社 Photosensitive resin composition, color filter, method for producing the same, and solid-state imaging device
JP5284735B2 (en) 2008-09-18 2013-09-11 株式会社Adeka Polymerizable optically active imide compound and polymerizable composition containing the compound
JP5079653B2 (en) 2008-09-29 2012-11-21 富士フイルム株式会社 Colored curable composition, color filter, method for producing the same, and solid-state imaging device
JP5171514B2 (en) 2008-09-29 2013-03-27 富士フイルム株式会社 Colored curable composition, color filter, and method for producing color filter
JP5127651B2 (en) 2008-09-30 2013-01-23 富士フイルム株式会社 Colored curable composition, color filter, method for producing the same, and solid-state imaging device
JP5340102B2 (en) 2008-10-03 2013-11-13 富士フイルム株式会社 Dispersion composition, polymerizable composition, light-shielding color filter, solid-state imaging device, liquid crystal display device, wafer level lens, and imaging unit
EP2342237B1 (en) * 2008-11-03 2014-04-23 Basf Se Photoinitiator mixtures
KR101082489B1 (en) * 2008-11-05 2011-11-11 주식회사 엘지화학 Photo-iniciative polymerizer comprising oxime ester with unsaturated double bonds and photosensative resin composition having the same
JP5344892B2 (en) 2008-11-27 2013-11-20 富士フイルム株式会社 Ink jet ink composition and ink jet recording method
JP5669386B2 (en) 2009-01-15 2015-02-12 富士フイルム株式会社 NOVEL COMPOUND, POLYMERIZABLE COMPOSITION, COLOR FILTER, PROCESS FOR PRODUCING THE SAME, SOLID-STATE IMAGING ELEMENT, AND lithographic printing plate precursor
JP5371824B2 (en) 2009-02-19 2013-12-18 富士フイルム株式会社 Method for producing dispersion composition, method for producing photosensitive resin composition for light-shielding color filter, method for producing light-shielding color filter
JP5340198B2 (en) 2009-02-26 2013-11-13 富士フイルム株式会社 Dispersion composition
CN101508744B (en) * 2009-03-11 2011-04-06 常州强力电子新材料有限公司 Carbazole oxime ester lightlike initiating agent
US8004078B1 (en) * 2009-03-17 2011-08-23 Amkor Technology, Inc. Adhesive composition for semiconductor device
JP5383288B2 (en) * 2009-03-31 2014-01-08 富士フイルム株式会社 Photosensitive composition, photosensitive resin transfer film, resin pattern, method for producing resin pattern, substrate for liquid crystal display device and liquid crystal display device
US8754533B2 (en) 2009-04-14 2014-06-17 Monolithic 3D Inc. Monolithic three-dimensional semiconductor device and structure
US9711407B2 (en) 2009-04-14 2017-07-18 Monolithic 3D Inc. Method of manufacturing a three dimensional integrated circuit by transfer of a mono-crystalline layer
US8405420B2 (en) 2009-04-14 2013-03-26 Monolithic 3D Inc. System comprising a semiconductor device and structure
US8362482B2 (en) 2009-04-14 2013-01-29 Monolithic 3D Inc. Semiconductor device and structure
US8669778B1 (en) 2009-04-14 2014-03-11 Monolithic 3D Inc. Method for design and manufacturing of a 3D semiconductor device
US8258810B2 (en) 2010-09-30 2012-09-04 Monolithic 3D Inc. 3D semiconductor device
US8378715B2 (en) 2009-04-14 2013-02-19 Monolithic 3D Inc. Method to construct systems
US20110031997A1 (en) * 2009-04-14 2011-02-10 NuPGA Corporation Method for fabrication of a semiconductor device and structure
US8384426B2 (en) 2009-04-14 2013-02-26 Monolithic 3D Inc. Semiconductor device and structure
US8373439B2 (en) 2009-04-14 2013-02-12 Monolithic 3D Inc. 3D semiconductor device
US8395191B2 (en) 2009-10-12 2013-03-12 Monolithic 3D Inc. Semiconductor device and structure
US8362800B2 (en) 2010-10-13 2013-01-29 Monolithic 3D Inc. 3D semiconductor device including field repairable logics
US9577642B2 (en) 2009-04-14 2017-02-21 Monolithic 3D Inc. Method to form a 3D semiconductor device
US8058137B1 (en) 2009-04-14 2011-11-15 Monolithic 3D Inc. Method for fabrication of a semiconductor device and structure
US9509313B2 (en) 2009-04-14 2016-11-29 Monolithic 3D Inc. 3D semiconductor device
US7986042B2 (en) 2009-04-14 2011-07-26 Monolithic 3D Inc. Method for fabrication of a semiconductor device and structure
US8427200B2 (en) 2009-04-14 2013-04-23 Monolithic 3D Inc. 3D semiconductor device
JP5657267B2 (en) 2009-04-16 2015-01-21 富士フイルム株式会社 Polymerizable composition for color filter, color filter, and solid-state imaging device
JP5317809B2 (en) * 2009-04-20 2013-10-16 富士フイルム株式会社 Colored curable composition, colored pattern forming method, color filter, and liquid crystal display device
KR101146182B1 (en) * 2009-05-11 2012-05-24 주식회사 이그잭스 Photo sensitive resin composition used as spacer structure in liquid crystal display panel
CN102459171B (en) * 2009-06-17 2014-07-09 东洋油墨Sc控股株式会社 Oxime ester compound, radical polymerization initiator, polymerizable composition, negative resist and image pattern
JP4999891B2 (en) * 2009-07-13 2012-08-15 東洋インキScホールディングス株式会社 Photosensitive coloring composition and color filter
JP4833324B2 (en) * 2009-08-03 2011-12-07 新日鐵化学株式会社 Photosensitive resin composition and color filter using the same
JP5535814B2 (en) 2009-09-14 2014-07-02 富士フイルム株式会社 Photopolymerizable composition, color filter, and method for producing the same, solid-state imaging device, liquid crystal display device, planographic printing plate precursor, and novel compound
JP5501175B2 (en) 2009-09-28 2014-05-21 富士フイルム株式会社 Dispersion composition and method for producing the same, photosensitive resin composition for light-shielding color filter and method for producing the same, light-shielding color filter and method for producing the same, and solid-state imaging device
US8742476B1 (en) 2012-11-27 2014-06-03 Monolithic 3D Inc. Semiconductor device and structure
US10366970B2 (en) 2009-10-12 2019-07-30 Monolithic 3D Inc. 3D semiconductor device and structure
US10354995B2 (en) 2009-10-12 2019-07-16 Monolithic 3D Inc. Semiconductor memory device and structure
US8450804B2 (en) 2011-03-06 2013-05-28 Monolithic 3D Inc. Semiconductor device and structure for heat removal
US8581349B1 (en) 2011-05-02 2013-11-12 Monolithic 3D Inc. 3D memory semiconductor device and structure
US9099424B1 (en) 2012-08-10 2015-08-04 Monolithic 3D Inc. Semiconductor system, device and structure with heat removal
US12027518B1 (en) 2009-10-12 2024-07-02 Monolithic 3D Inc. 3D semiconductor devices and structures with metal layers
US8536023B2 (en) 2010-11-22 2013-09-17 Monolithic 3D Inc. Method of manufacturing a semiconductor device and structure
US11374118B2 (en) 2009-10-12 2022-06-28 Monolithic 3D Inc. Method to form a 3D integrated circuit
US10388863B2 (en) 2009-10-12 2019-08-20 Monolithic 3D Inc. 3D memory device and structure
US8148728B2 (en) 2009-10-12 2012-04-03 Monolithic 3D, Inc. Method for fabrication of a semiconductor device and structure
US10157909B2 (en) 2009-10-12 2018-12-18 Monolithic 3D Inc. 3D semiconductor device and structure
US11018133B2 (en) 2009-10-12 2021-05-25 Monolithic 3D Inc. 3D integrated circuit
US10043781B2 (en) 2009-10-12 2018-08-07 Monolithic 3D Inc. 3D semiconductor device and structure
US8476145B2 (en) 2010-10-13 2013-07-02 Monolithic 3D Inc. Method of fabricating a semiconductor device and structure
US10910364B2 (en) 2009-10-12 2021-02-02 Monolitaic 3D Inc. 3D semiconductor device
US11984445B2 (en) 2009-10-12 2024-05-14 Monolithic 3D Inc. 3D semiconductor devices and structures with metal layers
EP2502973A4 (en) 2009-11-18 2014-07-23 Adeka Corp Liquid crystal composition comprising polymerizable compound, and liquid crystal display element using said liquid crystal composition
JP5701576B2 (en) 2009-11-20 2015-04-15 富士フイルム株式会社 Dispersion composition, photosensitive resin composition, and solid-state imaging device
JP4818458B2 (en) * 2009-11-27 2011-11-16 株式会社Adeka Oxime ester compound and photopolymerization initiator containing the compound
JP2010102346A (en) * 2009-12-04 2010-05-06 Toyo Ink Mfg Co Ltd Photosensitive colored composition and color filter
JP5162565B2 (en) * 2009-12-04 2013-03-13 東洋インキScホールディングス株式会社 Photosensitive coloring composition and color filter
CN102640055B (en) * 2009-12-07 2015-02-25 爱克发印艺公司 UV-LED curable compositions and inks
WO2011069947A1 (en) 2009-12-07 2011-06-16 Agfa-Gevaert Photoinitiators for uv-led curable compositions and inks
JP2012003225A (en) 2010-01-27 2012-01-05 Fujifilm Corp Polymerizable composition for solder resist and method for forming solder resist pattern
JP2011158655A (en) 2010-01-29 2011-08-18 Fujifilm Corp Polymerizable composition, color filter, method of producing the color filter, and solid-state imaging element
JP5640722B2 (en) * 2010-02-05 2014-12-17 Jsr株式会社 Novel compound and radiation-sensitive composition containing the same
US8373230B1 (en) 2010-10-13 2013-02-12 Monolithic 3D Inc. Method for fabrication of a semiconductor device and structure
US8541819B1 (en) 2010-12-09 2013-09-24 Monolithic 3D Inc. Semiconductor device and structure
US8492886B2 (en) 2010-02-16 2013-07-23 Monolithic 3D Inc 3D integrated circuit with logic
US9099526B2 (en) 2010-02-16 2015-08-04 Monolithic 3D Inc. Integrated circuit device and structure
US8298875B1 (en) 2011-03-06 2012-10-30 Monolithic 3D Inc. Method for fabrication of a semiconductor device and structure
US8461035B1 (en) 2010-09-30 2013-06-11 Monolithic 3D Inc. Method for fabrication of a semiconductor device and structure
US8026521B1 (en) 2010-10-11 2011-09-27 Monolithic 3D Inc. Semiconductor device and structure
KR20110098638A (en) 2010-02-26 2011-09-01 후지필름 가부시키가이샤 Colored curable composition, color filter and method of producing color filter, solid-state image sensor and liquid crystal display device
JP5533184B2 (en) * 2010-04-20 2014-06-25 Jsr株式会社 Novel compound, radiation-sensitive composition, cured film and method for forming the same
JP5638285B2 (en) 2010-05-31 2014-12-10 富士フイルム株式会社 Polymerizable composition, cured film, color filter, method for producing color filter, and solid-state imaging device
TWI491676B (en) 2010-06-01 2015-07-11 Fujifilm Corp Pigment dispersion composition, red colored composition, colored curable composition, color filter for a solid state imaging device and method for producing the same, and solid state imaging device
JP5622564B2 (en) 2010-06-30 2014-11-12 富士フイルム株式会社 Photosensitive composition, pattern forming material, and photosensitive film using the same, pattern forming method, pattern film, low refractive index film, optical device, and solid-state imaging device
JP5306291B2 (en) * 2010-07-12 2013-10-02 富士フイルム株式会社 Cyan color filter and solid-state image sensor using the same
JP5544239B2 (en) 2010-07-29 2014-07-09 富士フイルム株式会社 Polymerizable composition
US9953925B2 (en) 2011-06-28 2018-04-24 Monolithic 3D Inc. Semiconductor system and device
US9219005B2 (en) 2011-06-28 2015-12-22 Monolithic 3D Inc. Semiconductor system and device
US10217667B2 (en) 2011-06-28 2019-02-26 Monolithic 3D Inc. 3D semiconductor device, fabrication method and system
US8642416B2 (en) 2010-07-30 2014-02-04 Monolithic 3D Inc. Method of forming three dimensional integrated circuit devices using layer transfer technique
US8901613B2 (en) 2011-03-06 2014-12-02 Monolithic 3D Inc. Semiconductor device and structure for heat removal
JP2012058728A (en) * 2010-08-10 2012-03-22 Sumitomo Chemical Co Ltd Photosensitive resin composition
WO2012036477A2 (en) * 2010-09-16 2012-03-22 주식회사 엘지화학 Light-sensitive resin composition, a dry film solder resist and a circuit substrate
CN103153952B (en) * 2010-10-05 2016-07-13 巴斯夫欧洲公司 The oxime ester derivative of benzo carbazole compound and in photopolymerisable compositions as the purposes of photoinitiator
US9051397B2 (en) 2010-10-05 2015-06-09 Basf Se Oxime ester
US8273610B2 (en) 2010-11-18 2012-09-25 Monolithic 3D Inc. Method of constructing a semiconductor device and structure
US10497713B2 (en) 2010-11-18 2019-12-03 Monolithic 3D Inc. 3D semiconductor memory device and structure
US11482440B2 (en) 2010-12-16 2022-10-25 Monolithic 3D Inc. 3D semiconductor device and structure with a built-in test circuit for repairing faulty circuits
US8163581B1 (en) 2010-10-13 2012-04-24 Monolith IC 3D Semiconductor and optoelectronic devices
US11469271B2 (en) 2010-10-11 2022-10-11 Monolithic 3D Inc. Method to produce 3D semiconductor devices and structures with memory
US11315980B1 (en) 2010-10-11 2022-04-26 Monolithic 3D Inc. 3D semiconductor device and structure with transistors
US11600667B1 (en) 2010-10-11 2023-03-07 Monolithic 3D Inc. Method to produce 3D semiconductor devices and structures with memory
US11257867B1 (en) 2010-10-11 2022-02-22 Monolithic 3D Inc. 3D semiconductor device and structure with oxide bonds
US11158674B2 (en) 2010-10-11 2021-10-26 Monolithic 3D Inc. Method to produce a 3D semiconductor device and structure
US10896931B1 (en) 2010-10-11 2021-01-19 Monolithic 3D Inc. 3D semiconductor device and structure
US10290682B2 (en) 2010-10-11 2019-05-14 Monolithic 3D Inc. 3D IC semiconductor device and structure with stacked memory
US8114757B1 (en) 2010-10-11 2012-02-14 Monolithic 3D Inc. Semiconductor device and structure
US11227897B2 (en) 2010-10-11 2022-01-18 Monolithic 3D Inc. Method for producing a 3D semiconductor memory device and structure
US11024673B1 (en) 2010-10-11 2021-06-01 Monolithic 3D Inc. 3D semiconductor device and structure
US11018191B1 (en) 2010-10-11 2021-05-25 Monolithic 3D Inc. 3D semiconductor device and structure
US11404466B2 (en) 2010-10-13 2022-08-02 Monolithic 3D Inc. Multilevel semiconductor device and structure with image sensors
US8379458B1 (en) 2010-10-13 2013-02-19 Monolithic 3D Inc. Semiconductor device and structure
US8283215B2 (en) 2010-10-13 2012-10-09 Monolithic 3D Inc. Semiconductor and optoelectronic devices
US10943934B2 (en) 2010-10-13 2021-03-09 Monolithic 3D Inc. Multilevel semiconductor device and structure
US11437368B2 (en) 2010-10-13 2022-09-06 Monolithic 3D Inc. Multilevel semiconductor device and structure with oxide bonding
US11063071B1 (en) 2010-10-13 2021-07-13 Monolithic 3D Inc. Multilevel semiconductor device and structure with waveguides
US11929372B2 (en) 2010-10-13 2024-03-12 Monolithic 3D Inc. Multilevel semiconductor device and structure with image sensors and wafer bonding
US11855100B2 (en) 2010-10-13 2023-12-26 Monolithic 3D Inc. Multilevel semiconductor device and structure with oxide bonding
US11327227B2 (en) 2010-10-13 2022-05-10 Monolithic 3D Inc. Multilevel semiconductor device and structure with electromagnetic modulators
US10978501B1 (en) 2010-10-13 2021-04-13 Monolithic 3D Inc. Multilevel semiconductor device and structure with waveguides
US11164898B2 (en) 2010-10-13 2021-11-02 Monolithic 3D Inc. Multilevel semiconductor device and structure
US11694922B2 (en) 2010-10-13 2023-07-04 Monolithic 3D Inc. Multilevel semiconductor device and structure with oxide bonding
US11605663B2 (en) 2010-10-13 2023-03-14 Monolithic 3D Inc. Multilevel semiconductor device and structure with image sensors and wafer bonding
US10998374B1 (en) 2010-10-13 2021-05-04 Monolithic 3D Inc. Multilevel semiconductor device and structure
US11043523B1 (en) 2010-10-13 2021-06-22 Monolithic 3D Inc. Multilevel semiconductor device and structure with image sensors
US11984438B2 (en) 2010-10-13 2024-05-14 Monolithic 3D Inc. Multilevel semiconductor device and structure with oxide bonding
US10679977B2 (en) 2010-10-13 2020-06-09 Monolithic 3D Inc. 3D microdisplay device and structure
US11869915B2 (en) 2010-10-13 2024-01-09 Monolithic 3D Inc. Multilevel semiconductor device and structure with image sensors and wafer bonding
US9197804B1 (en) 2011-10-14 2015-11-24 Monolithic 3D Inc. Semiconductor and optoelectronic devices
US11163112B2 (en) 2010-10-13 2021-11-02 Monolithic 3D Inc. Multilevel semiconductor device and structure with electromagnetic modulators
US11855114B2 (en) 2010-10-13 2023-12-26 Monolithic 3D Inc. Multilevel semiconductor device and structure with image sensors and wafer bonding
US11133344B2 (en) 2010-10-13 2021-09-28 Monolithic 3D Inc. Multilevel semiconductor device and structure with image sensors
US10833108B2 (en) 2010-10-13 2020-11-10 Monolithic 3D Inc. 3D microdisplay device and structure
US11211279B2 (en) 2010-11-18 2021-12-28 Monolithic 3D Inc. Method for processing a 3D integrated circuit and structure
US11901210B2 (en) 2010-11-18 2024-02-13 Monolithic 3D Inc. 3D semiconductor device and structure with memory
US11443971B2 (en) 2010-11-18 2022-09-13 Monolithic 3D Inc. 3D semiconductor device and structure with memory
US11615977B2 (en) 2010-11-18 2023-03-28 Monolithic 3D Inc. 3D semiconductor memory device and structure
US11784082B2 (en) 2010-11-18 2023-10-10 Monolithic 3D Inc. 3D semiconductor device and structure with bonding
US11164770B1 (en) 2010-11-18 2021-11-02 Monolithic 3D Inc. Method for producing a 3D semiconductor memory device and structure
US11735462B2 (en) 2010-11-18 2023-08-22 Monolithic 3D Inc. 3D semiconductor device and structure with single-crystal layers
US11854857B1 (en) 2010-11-18 2023-12-26 Monolithic 3D Inc. Methods for producing a 3D semiconductor device and structure with memory cells and multiple metal layers
US11569117B2 (en) 2010-11-18 2023-01-31 Monolithic 3D Inc. 3D semiconductor device and structure with single-crystal layers
US11482439B2 (en) 2010-11-18 2022-10-25 Monolithic 3D Inc. Methods for producing a 3D semiconductor memory device comprising charge trap junction-less transistors
US11923230B1 (en) 2010-11-18 2024-03-05 Monolithic 3D Inc. 3D semiconductor device and structure with bonding
US11094576B1 (en) 2010-11-18 2021-08-17 Monolithic 3D Inc. Methods for producing a 3D semiconductor memory device and structure
US11862503B2 (en) 2010-11-18 2024-01-02 Monolithic 3D Inc. Method for producing a 3D semiconductor device and structure with memory cells and multiple metal layers
US11521888B2 (en) 2010-11-18 2022-12-06 Monolithic 3D Inc. 3D semiconductor device and structure with high-k metal gate transistors
US11107721B2 (en) 2010-11-18 2021-08-31 Monolithic 3D Inc. 3D semiconductor device and structure with NAND logic
US11482438B2 (en) 2010-11-18 2022-10-25 Monolithic 3D Inc. Methods for producing a 3D semiconductor memory device and structure
US11031275B2 (en) 2010-11-18 2021-06-08 Monolithic 3D Inc. 3D semiconductor device and structure with memory
US11355381B2 (en) 2010-11-18 2022-06-07 Monolithic 3D Inc. 3D semiconductor memory device and structure
US11355380B2 (en) 2010-11-18 2022-06-07 Monolithic 3D Inc. Methods for producing 3D semiconductor memory device and structure utilizing alignment marks
US11004719B1 (en) 2010-11-18 2021-05-11 Monolithic 3D Inc. Methods for producing a 3D semiconductor memory device and structure
US11508605B2 (en) 2010-11-18 2022-11-22 Monolithic 3D Inc. 3D semiconductor memory device and structure
US11804396B2 (en) 2010-11-18 2023-10-31 Monolithic 3D Inc. Methods for producing a 3D semiconductor device and structure with memory cells and multiple metal layers
US11610802B2 (en) 2010-11-18 2023-03-21 Monolithic 3D Inc. Method for producing a 3D semiconductor device and structure with single crystal transistors and metal gate electrodes
US11121021B2 (en) 2010-11-18 2021-09-14 Monolithic 3D Inc. 3D semiconductor device and structure
US11018042B1 (en) 2010-11-18 2021-05-25 Monolithic 3D Inc. 3D semiconductor memory device and structure
US11495484B2 (en) 2010-11-18 2022-11-08 Monolithic 3D Inc. 3D semiconductor devices and structures with at least two single-crystal layers
CN102020727B (en) * 2010-11-23 2013-01-23 常州强力先端电子材料有限公司 Pyrazole oxime ester photoinitiator with high photosensibility, preparation method and application thereof
JP5121912B2 (en) * 2010-11-24 2013-01-16 富士フイルム株式会社 Colored photosensitive resin composition, pattern forming method, color filter manufacturing method, color filter, and display device including the same
KR101830206B1 (en) 2010-12-28 2018-02-20 후지필름 가부시키가이샤 Titanium black dispersion composition for forming light blocking film and method of producing the same, black radiation-sensitive composition, black cured film, solid-state imaging element, and method of producing black cured film
US8632858B2 (en) * 2011-02-14 2014-01-21 Eastman Kodak Company Methods of photocuring and imaging
US8816211B2 (en) * 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
US8975670B2 (en) 2011-03-06 2015-03-10 Monolithic 3D Inc. Semiconductor device and structure for heat removal
CN102681343A (en) * 2011-03-08 2012-09-19 住友化学株式会社 Colored photosensitive resin composition
CN103842338B (en) 2011-05-25 2017-06-30 美洲染料资源公司 Compound with oxime ester base and/or acyl group
US10388568B2 (en) 2011-06-28 2019-08-20 Monolithic 3D Inc. 3D semiconductor device and system
KR101339916B1 (en) 2011-06-30 2013-12-10 타코마테크놀러지 주식회사 Oximino dithiocarbonate compounds and photosensitive composition comprising the same
US8820923B2 (en) 2011-08-05 2014-09-02 Nitto Denko Corporation Optical element for correcting color blindness
JP5821401B2 (en) * 2011-08-19 2015-11-24 大日本印刷株式会社 Photosensitive resin composition for optical imprint, cured product, resist substrate, and method for manufacturing semiconductor device
TWI548701B (en) 2011-09-14 2016-09-11 富士軟片股份有限公司 Colored radiation-sensitive composition for color filter, colored film, pattern forming method, color filter and method of producing the same, and solid-state image sensor
US8687399B2 (en) 2011-10-02 2014-04-01 Monolithic 3D Inc. Semiconductor device and structure
US9029173B2 (en) 2011-10-18 2015-05-12 Monolithic 3D Inc. Method for fabrication of a semiconductor device and structure
CN103998427A (en) * 2011-12-07 2014-08-20 巴斯夫欧洲公司 Oxime ester photoinitiators
JP5922013B2 (en) 2011-12-28 2016-05-24 富士フイルム株式会社 Optical member set and solid-state imaging device using the same
JP5976523B2 (en) 2011-12-28 2016-08-23 富士フイルム株式会社 Optical member set and solid-state imaging device using the same
KR101406317B1 (en) * 2012-01-12 2014-06-13 타코마테크놀러지 주식회사 High sensitive Oximester photo compounds and photosensitive composition comprising the same
US9000557B2 (en) 2012-03-17 2015-04-07 Zvi Or-Bach Semiconductor device and structure
JP5934664B2 (en) 2012-03-19 2016-06-15 富士フイルム株式会社 Colored radiation-sensitive composition, colored cured film, color filter, colored pattern forming method, color filter manufacturing method, solid-state imaging device, and image display device
JP5775479B2 (en) 2012-03-21 2015-09-09 富士フイルム株式会社 Colored radiation-sensitive composition, colored cured film, color filter, pattern forming method, color filter manufacturing method, solid-state imaging device, and image display device
CN103044581B (en) * 2012-04-05 2014-10-29 常州强力电子新材料股份有限公司 Macromolecular photoinitiator as well as preparation method and application thereof
US11616004B1 (en) 2012-04-09 2023-03-28 Monolithic 3D Inc. 3D semiconductor device and structure with metal layers and a connective path
US11088050B2 (en) 2012-04-09 2021-08-10 Monolithic 3D Inc. 3D semiconductor device with isolation layers
US11594473B2 (en) 2012-04-09 2023-02-28 Monolithic 3D Inc. 3D semiconductor device and structure with metal layers and a connective path
US11694944B1 (en) 2012-04-09 2023-07-04 Monolithic 3D Inc. 3D semiconductor device and structure with metal layers and a connective path
US11410912B2 (en) 2012-04-09 2022-08-09 Monolithic 3D Inc. 3D semiconductor device with vias and isolation layers
US11476181B1 (en) 2012-04-09 2022-10-18 Monolithic 3D Inc. 3D semiconductor device and structure with metal layers
US11164811B2 (en) 2012-04-09 2021-11-02 Monolithic 3D Inc. 3D semiconductor device with isolation layers and oxide-to-oxide bonding
US8557632B1 (en) 2012-04-09 2013-10-15 Monolithic 3D Inc. Method for fabrication of a semiconductor device and structure
US11881443B2 (en) 2012-04-09 2024-01-23 Monolithic 3D Inc. 3D semiconductor device and structure with metal layers and a connective path
US11735501B1 (en) 2012-04-09 2023-08-22 Monolithic 3D Inc. 3D semiconductor device and structure with metal layers and a connective path
US10600888B2 (en) 2012-04-09 2020-03-24 Monolithic 3D Inc. 3D semiconductor device
EP3354641B1 (en) 2012-05-09 2019-07-17 Basf Se Oxime ester photoinitiators
JP5950682B2 (en) * 2012-05-09 2016-07-13 株式会社日本化学工業所 Oxime-based photopolymerization initiator and method of using the same
KR101799632B1 (en) 2012-06-04 2017-11-20 로레알 Fast curing cosmetic compositions for tack free surface photocuring of radically polymerizable resins with uv-led
KR102130430B1 (en) 2012-08-08 2020-07-07 아사히 가세이 이-매터리얼즈 가부시키가이샤 Photosensitive film laminate, flexible printed wiring board, and method for manufacturing same
JP5909468B2 (en) 2012-08-31 2016-04-26 富士フイルム株式会社 Dispersion composition, curable composition using the same, transparent film, microlens, and solid-state imaging device
JP5894943B2 (en) 2012-08-31 2016-03-30 富士フイルム株式会社 Dispersion composition, curable composition using the same, transparent film, microlens, method for producing microlens, and solid-state imaging device
JP5934682B2 (en) 2012-08-31 2016-06-15 富士フイルム株式会社 Curable composition for forming microlenses or undercoat film for color filter, transparent film, microlens, solid-state imaging device, and method for producing curable composition
EP2913323B1 (en) * 2012-09-28 2018-09-12 Tokyo Ohka Kogyo Co., Ltd. Fluorene-type compound, photopolymerization initiator comprising said fluorene-type compound, and photosensitive composition containing said photopolymerization initiator
US8686428B1 (en) 2012-11-16 2014-04-01 Monolithic 3D Inc. Semiconductor device and structure
US8574929B1 (en) 2012-11-16 2013-11-05 Monolithic 3D Inc. Method to form a 3D semiconductor device and structure
EP2927716A4 (en) 2012-11-30 2015-12-30 Fujifilm Corp Curable resin composition, and image-sensor-chip production method and image sensor chip using same
CN104823083A (en) 2012-11-30 2015-08-05 富士胶片株式会社 Curable resin composition, and image-sensor-chip production method and image sensor chip using same
US11967583B2 (en) 2012-12-22 2024-04-23 Monolithic 3D Inc. 3D semiconductor device and structure with metal layers
US11784169B2 (en) 2012-12-22 2023-10-10 Monolithic 3D Inc. 3D semiconductor device and structure with metal layers
US11063024B1 (en) 2012-12-22 2021-07-13 Monlithic 3D Inc. Method to form a 3D semiconductor device and structure
US11961827B1 (en) 2012-12-22 2024-04-16 Monolithic 3D Inc. 3D semiconductor device and structure with metal layers
US11217565B2 (en) 2012-12-22 2022-01-04 Monolithic 3D Inc. Method to form a 3D semiconductor device and structure
US8674470B1 (en) 2012-12-22 2014-03-18 Monolithic 3D Inc. Semiconductor device and structure
US11916045B2 (en) 2012-12-22 2024-02-27 Monolithic 3D Inc. 3D semiconductor device and structure with metal layers
US11018116B2 (en) 2012-12-22 2021-05-25 Monolithic 3D Inc. Method to form a 3D semiconductor device and structure
US11309292B2 (en) 2012-12-22 2022-04-19 Monolithic 3D Inc. 3D semiconductor device and structure with metal layers
KR101609634B1 (en) 2012-12-26 2016-04-06 제일모직 주식회사 Photosensitive resin composition and light blocking layer using the same
JP6170673B2 (en) 2012-12-27 2017-07-26 富士フイルム株式会社 Composition for color filter, infrared transmission filter, method for producing the same, and infrared sensor
KR20150086524A (en) 2012-12-28 2015-07-28 후지필름 가부시키가이샤 Curable resin composition, infrared cut-off filter, and solid-state imaging element using same
EP2940090A4 (en) 2012-12-28 2016-01-06 Fujifilm Corp Curable resin composition for forming infrared-reflecting film, infrared-reflecting film and manufacturing method therefor, infrared cut-off filter, and solid-state imaging element using same
US11430668B2 (en) 2012-12-29 2022-08-30 Monolithic 3D Inc. 3D semiconductor device and structure with bonding
US11087995B1 (en) 2012-12-29 2021-08-10 Monolithic 3D Inc. 3D semiconductor device and structure
US10892169B2 (en) 2012-12-29 2021-01-12 Monolithic 3D Inc. 3D semiconductor device and structure
US9385058B1 (en) 2012-12-29 2016-07-05 Monolithic 3D Inc. Semiconductor device and structure
US10903089B1 (en) 2012-12-29 2021-01-26 Monolithic 3D Inc. 3D semiconductor device and structure
US10115663B2 (en) 2012-12-29 2018-10-30 Monolithic 3D Inc. 3D semiconductor device and structure
US10651054B2 (en) 2012-12-29 2020-05-12 Monolithic 3D Inc. 3D semiconductor device and structure
US11004694B1 (en) 2012-12-29 2021-05-11 Monolithic 3D Inc. 3D semiconductor device and structure
US9871034B1 (en) 2012-12-29 2018-01-16 Monolithic 3D Inc. Semiconductor device and structure
US10600657B2 (en) 2012-12-29 2020-03-24 Monolithic 3D Inc 3D semiconductor device and structure
US11177140B2 (en) 2012-12-29 2021-11-16 Monolithic 3D Inc. 3D semiconductor device and structure
US11430667B2 (en) 2012-12-29 2022-08-30 Monolithic 3D Inc. 3D semiconductor device and structure with bonding
US8931930B2 (en) 2013-01-29 2015-01-13 Nitto Denko Corporation Optical element for correcting color blindness
US11935949B1 (en) 2013-03-11 2024-03-19 Monolithic 3D Inc. 3D semiconductor device and structure with metal layers and memory cells
US11869965B2 (en) 2013-03-11 2024-01-09 Monolithic 3D Inc. 3D semiconductor device and structure with metal layers and memory cells
US10325651B2 (en) 2013-03-11 2019-06-18 Monolithic 3D Inc. 3D semiconductor device with stacked memory
US8902663B1 (en) 2013-03-11 2014-12-02 Monolithic 3D Inc. Method of maintaining a memory state
US11923374B2 (en) 2013-03-12 2024-03-05 Monolithic 3D Inc. 3D semiconductor device and structure with metal layers
US8994404B1 (en) 2013-03-12 2015-03-31 Monolithic 3D Inc. Semiconductor device and structure
US11398569B2 (en) 2013-03-12 2022-07-26 Monolithic 3D Inc. 3D semiconductor device and structure
US11088130B2 (en) 2014-01-28 2021-08-10 Monolithic 3D Inc. 3D semiconductor device and structure
US10840239B2 (en) 2014-08-26 2020-11-17 Monolithic 3D Inc. 3D semiconductor device and structure
US10224279B2 (en) 2013-03-15 2019-03-05 Monolithic 3D Inc. Semiconductor device and structure
US9117749B1 (en) 2013-03-15 2015-08-25 Monolithic 3D Inc. Semiconductor device and structure
JP6097128B2 (en) 2013-04-12 2017-03-15 富士フイルム株式会社 Far infrared light shielding layer forming composition
US11030371B2 (en) 2013-04-15 2021-06-08 Monolithic 3D Inc. Automation for monolithic 3D devices
US11720736B2 (en) 2013-04-15 2023-08-08 Monolithic 3D Inc. Automation methods for 3D integrated circuits and devices
US11574109B1 (en) 2013-04-15 2023-02-07 Monolithic 3D Inc Automation methods for 3D integrated circuits and devices
US11270055B1 (en) 2013-04-15 2022-03-08 Monolithic 3D Inc. Automation for monolithic 3D devices
US11487928B2 (en) 2013-04-15 2022-11-01 Monolithic 3D Inc. Automation for monolithic 3D devices
US11341309B1 (en) 2013-04-15 2022-05-24 Monolithic 3D Inc. Automation for monolithic 3D devices
US9021414B1 (en) 2013-04-15 2015-04-28 Monolithic 3D Inc. Automation for monolithic 3D devices
KR101414547B1 (en) * 2013-07-08 2014-07-03 타코마테크놀러지 주식회사 Photoinitiator compounds
CN105358527B (en) 2013-07-08 2018-09-25 巴斯夫欧洲公司 Oxime ester photoinitiator
JP2015038979A (en) * 2013-07-18 2015-02-26 富士フイルム株式会社 Image sensor and method for manufacturing the same
JP6162084B2 (en) 2013-09-06 2017-07-12 富士フイルム株式会社 Colored composition, cured film, color filter, method for producing color filter, solid-state imaging device, image display device, polymer, xanthene dye
US9957258B2 (en) 2013-09-10 2018-05-01 Basf Se Oxime ester photoinitiators
WO2015064958A1 (en) * 2013-11-04 2015-05-07 한국화학연구원 Novel oxime ester biphenyl compound, photo initiator and photosensitive resin composition containing same
KR101478292B1 (en) * 2013-11-05 2015-01-05 한국화학연구원 Novel biphenyl β-oxime ester compounds, photoinitiator and photoresist composition containing the same
KR101457172B1 (en) * 2013-11-28 2014-10-31 타코마테크놀러지 주식회사 Photoininiator and photosensitive composition including the same
KR101435652B1 (en) 2014-01-17 2014-08-28 주식회사 삼양사 NOVEL FLUORENYL β-OXIME ESTER COMPOUNDS, PHOTOPOLYMERIZATION INITIATOR AND PHOTORESIST COMPOSITION CONTAINING THE SAME
US11031394B1 (en) 2014-01-28 2021-06-08 Monolithic 3D Inc. 3D semiconductor device and structure
US10297586B2 (en) 2015-03-09 2019-05-21 Monolithic 3D Inc. Methods for processing a 3D semiconductor device
US11107808B1 (en) 2014-01-28 2021-08-31 Monolithic 3D Inc. 3D semiconductor device and structure
CN103833872B (en) * 2014-03-18 2016-04-06 常州强力先端电子材料有限公司 A kind of two oxime ester lightlike initiating agent and its preparation method and application
CN103819583B (en) 2014-03-18 2016-05-18 常州强力电子新材料股份有限公司 A kind of containing two oxime ester lightlike initiating agents of nitro and its preparation method and application
CN104910053B (en) * 2014-06-09 2017-09-12 北京英力科技发展有限公司 Asymmetric two oxime ester compound and its manufacture method and application
CN104076606B (en) * 2014-07-15 2019-12-03 常州强力电子新材料股份有限公司 A kind of photosensitive composite and its application containing oxime ester lightlike initiating agent
WO2016013587A1 (en) * 2014-07-24 2016-01-28 日立化成株式会社 Photosensitive resin composition, photosensitive film, pattern substrate, photosensitive conductive film, and conductive pattern substrate
JP6169545B2 (en) 2014-09-09 2017-07-26 富士フイルム株式会社 Polymerizable composition, ink composition for ink jet recording, ink jet recording method, and recorded matter
JP6169548B2 (en) 2014-09-26 2017-07-26 富士フイルム株式会社 Polymerizable composition, ink composition for ink jet recording, ink jet recording method, and recorded matter
JP6086888B2 (en) 2014-09-26 2017-03-01 富士フイルム株式会社 Ink composition for ink jet recording, ink jet recording method, and recorded matter
KR101824429B1 (en) 2015-01-26 2018-02-06 주식회사 삼양사 Novel di-oxime ester compounds and photopolymerization initiator and photoresist composition containing the same
CN104672354A (en) * 2015-02-04 2015-06-03 天津墨森科技有限公司 Dioxime ether photoinitiator as well as preparation method and application thereof
KR101828927B1 (en) 2015-02-06 2018-02-14 주식회사 삼양사 Novel oxime ester compounds, photopolymerization initiator and photoresist composition containing the same
KR101824443B1 (en) 2015-04-09 2018-02-05 주식회사 삼양사 Novel fluorenyl oxime ester compounds, photopolymerization initiator and photoresist composition containing the same
US10825779B2 (en) 2015-04-19 2020-11-03 Monolithic 3D Inc. 3D semiconductor device and structure
US11011507B1 (en) 2015-04-19 2021-05-18 Monolithic 3D Inc. 3D semiconductor device and structure
US11056468B1 (en) 2015-04-19 2021-07-06 Monolithic 3D Inc. 3D semiconductor device and structure
US10381328B2 (en) 2015-04-19 2019-08-13 Monolithic 3D Inc. Semiconductor device and structure
CN104817653B (en) * 2015-04-22 2016-08-24 江南大学 A kind of coumarin oxime ester lightlike initiating agent and preparation method thereof
CN106278967B (en) * 2015-06-03 2020-08-07 江苏和成新材料有限公司 Acyl oxime ester compound for UV curing material and synthetic method and application thereof
KR101777845B1 (en) 2015-06-08 2017-09-12 주식회사 삼양사 Novel fluoranthene oxime ester derivates, photopolymerization initiator and photoresist composition containing the same
KR102613079B1 (en) * 2015-07-17 2023-12-12 타코마테크놀러지 주식회사 Oxime ester compound and photosensitive resin composition containing the compound
KR101744197B1 (en) 2015-07-31 2017-06-09 (주)켐이 Fluorene derivatives, photopolymerization initiator and photoresist composition containing the same
KR101796993B1 (en) 2015-08-24 2017-11-13 (주)켐이 Fluorene derivatives, photopolymerization initiator and photoresist composition containing the same
US11956952B2 (en) 2015-08-23 2024-04-09 Monolithic 3D Inc. Semiconductor memory device and structure
CN107614485A (en) * 2015-08-24 2018-01-19 株式会社艾迪科 Oxime ester compound and the polymerization initiator containing the compound
US11937422B2 (en) 2015-11-07 2024-03-19 Monolithic 3D Inc. Semiconductor memory device and structure
DE112016004265T5 (en) 2015-09-21 2018-06-07 Monolithic 3D Inc. 3D SEMICONDUCTOR DEVICE AND STRUCTURE
US11978731B2 (en) 2015-09-21 2024-05-07 Monolithic 3D Inc. Method to produce a multi-level semiconductor memory device and structure
US11114427B2 (en) 2015-11-07 2021-09-07 Monolithic 3D Inc. 3D semiconductor processor and memory device and structure
US10522225B1 (en) 2015-10-02 2019-12-31 Monolithic 3D Inc. Semiconductor device with non-volatile memory
US12016181B2 (en) 2015-10-24 2024-06-18 Monolithic 3D Inc. 3D semiconductor device and structure with logic and memory
US11114464B2 (en) 2015-10-24 2021-09-07 Monolithic 3D Inc. 3D semiconductor device and structure
US11296115B1 (en) 2015-10-24 2022-04-05 Monolithic 3D Inc. 3D semiconductor device and structure
US10847540B2 (en) 2015-10-24 2020-11-24 Monolithic 3D Inc. 3D semiconductor memory device and structure
US10418369B2 (en) 2015-10-24 2019-09-17 Monolithic 3D Inc. Multi-level semiconductor memory device and structure
US11991884B1 (en) 2015-10-24 2024-05-21 Monolithic 3D Inc. 3D semiconductor device and structure with logic and memory
KR102509606B1 (en) 2015-10-30 2023-03-14 주식회사 삼양사 Novel quinolinyl beta oxime ester derivative compound, photopolymerization initiator, and photoresist composition containing the same
CN105199018B (en) * 2015-11-06 2017-03-22 常州久日化学有限公司 Oxime ester photoinitiator as well as preparation and application thereof
TWI634135B (en) 2015-12-25 2018-09-01 日商富士軟片股份有限公司 Resin, composition, cured film, method for producing cured film, and semiconductor element
JP6688087B2 (en) * 2016-01-15 2020-04-28 株式会社Adeka Compound, composition and photopolymerization initiator
KR102134138B1 (en) 2016-03-14 2020-07-15 후지필름 가부시키가이샤 Composition, film, cured film, optical sensor and method for manufacturing film
WO2017183428A1 (en) 2016-04-21 2017-10-26 富士フイルム株式会社 Mirror with image display function and half mirror
KR101892086B1 (en) 2016-05-19 2018-08-27 주식회사 삼양사 Oxime ester derivative compounds, photopolymerization initiator, and photosensitive composition containing the same
TWI830588B (en) 2016-08-01 2024-01-21 日商富士軟片股份有限公司 Photosensitive resin composition, cured film, laminated body, manufacturing method of cured film, laminated body manufacturing method, and semiconductor element
KR20180014982A (en) * 2016-08-02 2018-02-12 동우 화인켐 주식회사 Carbazole Derivatives and Photocurable Composition Comprising the Same
TW201821280A (en) 2016-09-30 2018-06-16 日商富士軟片股份有限公司 Laminate and manufacturing method for semiconductor element
US11869591B2 (en) 2016-10-10 2024-01-09 Monolithic 3D Inc. 3D memory devices and structures with control circuits
US11251149B2 (en) 2016-10-10 2022-02-15 Monolithic 3D Inc. 3D memory device and structure
US11329059B1 (en) 2016-10-10 2022-05-10 Monolithic 3D Inc. 3D memory devices and structures with thinned single crystal substrates
US11812620B2 (en) 2016-10-10 2023-11-07 Monolithic 3D Inc. 3D DRAM memory devices and structures with control circuits
US11711928B2 (en) 2016-10-10 2023-07-25 Monolithic 3D Inc. 3D memory devices and structures with control circuits
US11930648B1 (en) 2016-10-10 2024-03-12 Monolithic 3D Inc. 3D memory devices and structures with metal layers
WO2018084076A1 (en) 2016-11-04 2018-05-11 富士フイルム株式会社 Windshield glass, head-up display system, and half-mirror film
KR101991838B1 (en) 2016-12-28 2019-06-24 주식회사 삼양사 Novel 1,3-benzodiazole beta-oxime ester compound and composition comprising the same
KR20180090135A (en) 2017-02-02 2018-08-10 주식회사 삼양사 Oxime ester biphenyl compounds, photopolymerization initiator, and photosensitive composition containing the same
CN110121668B (en) 2017-02-09 2022-03-04 富士胶片株式会社 Half mirror, method for manufacturing half mirror, and mirror with image display function
EP3617787B1 (en) 2017-04-28 2022-06-29 FUJIFILM Corporation Image display function-equipped anti-glare mirror
JP6808829B2 (en) 2017-05-31 2021-01-06 富士フイルム株式会社 Photosensitive resin compositions, polymer precursors, cured films, laminates, cured film manufacturing methods and semiconductor devices
JP6944549B2 (en) * 2017-06-22 2021-10-06 エルケム・シリコーンズ・フランス・エスアエスELKEM SILICONES France SAS Its use in free radical photoinitiators and silicone compositions
CN109305951A (en) * 2017-07-26 2019-02-05 湖北固润科技股份有限公司 Cumarin oxime ester compound and its preparation and application
CN107599661B (en) * 2017-08-30 2019-04-12 华中科技大学 A kind of image recording material directly printed, preparation method
EP4312066A3 (en) 2017-09-07 2024-04-17 FUJIFILM Corporation One-way mirror film for displaying projected images, laminated glass for displaying projected images, and image display system
JP6946443B2 (en) 2017-09-15 2021-10-06 富士フイルム株式会社 Compositions, films, laminates, infrared transmission filters, solid-state image sensors and infrared sensors
JP7163673B2 (en) * 2017-10-02 2022-11-01 東洋インキScホールディングス株式会社 Photosensitive coloring composition for color filter and color filter
CN109666088A (en) * 2017-10-16 2019-04-23 北京英力科技发展有限公司 A kind of diketone oxime ester compound and its manufacturing method and application
KR101991903B1 (en) 2017-12-07 2019-10-01 주식회사 삼양사 Carbazole oxime ester derivative compounds and, photopolymerization initiator and photosensitive composition containing the same
WO2019163969A1 (en) 2018-02-23 2019-08-29 富士フイルム株式会社 Method for manufacturing laminated glass for displaying image, laminated glass for displaying image, and image display system
KR102453516B1 (en) 2018-03-13 2022-10-12 후지필름 가부시키가이샤 The manufacturing method of a cured film, the manufacturing method of a solid-state image sensor
KR102335614B1 (en) * 2018-03-21 2021-12-03 동우 화인켐 주식회사 Colored photosensitive resin composition, color filter and image display device using the same
JP7342870B2 (en) 2018-08-09 2023-09-12 三菱ケミカル株式会社 Composition for hologram recording medium and hologram recording medium
KR20200024024A (en) 2018-08-27 2020-03-06 동우 화인켐 주식회사 Pyrene Derivatives and Photocurable Composition Comprising the Same
CN112601912A (en) 2018-09-07 2021-04-02 富士胶片株式会社 Vehicle headlamp unit, headlamp shading film, and method for manufacturing headlamp shading film
WO2020059509A1 (en) 2018-09-20 2020-03-26 富士フイルム株式会社 Curable composition, cured film, infrared transmission filter, laminate, solid-state imaging element, sensor, and pattern formation method
KR102571972B1 (en) 2018-09-28 2023-08-29 후지필름 가부시키가이샤 Photosensitive resin composition, cured film, laminate, method for producing cured film, and semiconductor device
WO2020080355A1 (en) 2018-10-17 2020-04-23 富士フイルム株式会社 Projection image display member, windshield glass, and head-up display system
EP3893054A4 (en) 2018-12-05 2022-01-05 FUJIFILM Corporation Pattern forming method, photosensitive resin composition, cured film, laminate, and device
SG11202105559WA (en) 2018-12-05 2021-06-29 Fujifilm Corp Photosensitive resin composition, pattern forming method, cured film, laminate, and device
JP7299920B2 (en) 2018-12-10 2023-06-28 富士フイルム株式会社 Projected image display materials, windshield glass and head-up display systems
KR102125820B1 (en) 2018-12-24 2020-06-23 (주)경인양행 Photopolymerization initiator comprising oxime compounds and photocurable electroductive ink composition having the same
KR102228630B1 (en) 2018-12-28 2021-03-16 주식회사 삼양사 Carbazole multi β-oxime ester derivative compounds and, photopolymerization initiator and photoresist composition containing the same
US20220121113A1 (en) 2019-01-23 2022-04-21 Basf Se Oxime ester photoinitiators having a special aroyl chromophore
JP6677330B2 (en) * 2019-02-21 2020-04-08 三菱ケミカル株式会社 Carbazole compounds
EP3936924A4 (en) 2019-03-06 2022-05-04 FUJIFILM Corporation Laminated film for displaying projection image, laminated glass for displaying projection image, and image display system
EP3940018A4 (en) 2019-03-15 2022-05-18 FUJIFILM Corporation Curable resin composition, cured film, layered body, cured film production method, semiconductor device, and polymer precursor
KR102603923B1 (en) 2019-03-29 2023-11-20 후지필름 가부시키가이샤 Photosensitive resin composition, cured film, inductor, antenna
US11018156B2 (en) 2019-04-08 2021-05-25 Monolithic 3D Inc. 3D memory semiconductor devices and structures
US10892016B1 (en) 2019-04-08 2021-01-12 Monolithic 3D Inc. 3D memory semiconductor devices and structures
US11296106B2 (en) 2019-04-08 2022-04-05 Monolithic 3D Inc. 3D memory semiconductor devices and structures
US11158652B1 (en) 2019-04-08 2021-10-26 Monolithic 3D Inc. 3D memory semiconductor devices and structures
US11763864B2 (en) 2019-04-08 2023-09-19 Monolithic 3D Inc. 3D memory semiconductor devices and structures with bit-line pillars
JP2020200272A (en) * 2019-06-11 2020-12-17 株式会社Adeka Carbamoyl oxime compound, and polymerization initiator and polymerizable composition containing the compound
DE112020002202T5 (en) 2019-06-21 2022-01-20 IGM (Anqing) High Technology Development Co., Ltd. Novel diaroylcarbazole compound and use of the same as a sensitizer
CN112111028A (en) 2019-06-21 2020-12-22 江苏英力科技发展有限公司 Photoinitiator composition containing acylcarbazole derivative and carbazolyl oxime ester and application of photoinitiator composition in photocuring composition
JPWO2020262270A1 (en) 2019-06-27 2020-12-30
WO2021039205A1 (en) 2019-08-29 2021-03-04 富士フイルム株式会社 Composition, film, near-infrared cut-off filter, pattern formation method, laminate, solid-state imaging element, infrared sensor, image display device, camera module and compound
KR20220035458A (en) 2019-08-30 2022-03-22 후지필름 가부시키가이샤 Composition, film, optical filter and manufacturing method thereof, solid-state imaging device, infrared sensor, and sensor module
TW202112837A (en) 2019-09-26 2021-04-01 日商富士軟片股份有限公司 Heat-conducting layer production method, laminate production method, and semiconductor device production method
JP7313457B2 (en) 2019-09-27 2023-07-24 富士フイルム株式会社 Head-up display projector
TW202128839A (en) 2019-11-21 2021-08-01 日商富士軟片股份有限公司 Pattern forming method, photocurable resin composition, layered body manufacturing method, and electronic device manufacturing method
EP4083142A4 (en) 2019-12-25 2023-02-08 FUJIFILM Corporation Resin composition, cured product, uv absorber, uv cut filter, lens, protective material, compound, and method for synthesizing compound
CN115210219A (en) 2020-03-04 2022-10-18 巴斯夫欧洲公司 Oxime ester photoinitiators
CN115315646A (en) 2020-03-30 2022-11-08 富士胶片株式会社 Reflective film, windshield and head-up display system
WO2021199748A1 (en) 2020-03-30 2021-10-07 富士フイルム株式会社 Composition, film, and optical sensor
KR20220161262A (en) 2020-03-30 2022-12-06 가부시키가이샤 아데카 Radical polymerization initiator, composition, cured product and method for producing cured product
EP4163262A4 (en) 2020-06-03 2023-12-13 FUJIFILM Corporation Reflective film, laminated glass production method, and laminated glass
JP7428810B2 (en) 2020-08-21 2024-02-06 富士フイルム株式会社 Polymerizable composition, polymer, ultraviolet shielding material, laminate, compound, ultraviolet absorber, and method for producing the compound
WO2022059706A1 (en) 2020-09-18 2022-03-24 富士フイルム株式会社 Composition, magnetic-particle-containing film, and electronic component
JPWO2022065183A1 (en) 2020-09-24 2022-03-31
JP7477628B2 (en) 2020-09-28 2024-05-01 富士フイルム株式会社 Manufacturing method of laminate, manufacturing method of antenna-in-package, and laminate
WO2022123946A1 (en) 2020-12-09 2022-06-16 富士フイルム株式会社 Reflection film, windshield glass, and head-up display system
EP4266094A1 (en) 2020-12-16 2023-10-25 FUJIFILM Corporation Composition, membrane, optical filter, solid image pickup element, image display apparatus, and infrared ray sensor
EP4266093A1 (en) 2020-12-17 2023-10-25 FUJIFILM Corporation Composition, film, optical filter, solid-state imaging element, image display device, and infrared sensor
KR20230121723A (en) 2020-12-17 2023-08-21 가부시키가이샤 아데카 compounds and compositions
KR102547857B1 (en) 2020-12-31 2023-06-28 (주)켐이 Penothiazine compound, photopolymerization initiator containing the same, and composition for electronic materials containing the same
EP4310556A1 (en) 2021-03-19 2024-01-24 FUJIFILM Corporation Film and photosensor
TW202248755A (en) 2021-03-22 2022-12-16 日商富士軟片股份有限公司 Negative photosensitive resin composition, cured product, laminate, method for producing cured product, and semiconductor device
EP4317294A1 (en) 2021-03-22 2024-02-07 FUJIFILM Corporation Composition, magnetic particle-containing cured product, magnetic particle-introduced substrate, and electronic material
EP4318057A1 (en) 2021-03-29 2024-02-07 FUJIFILM Corporation Black photosensitive composition, manufacturing method of black photosensitive composition, cured film, color filter, light-shielding film, optical element, solid-state image capturing element, and headlight unit
KR20240021145A (en) * 2021-06-15 2024-02-16 미츠비시 가스 가가쿠 가부시키가이샤 Resin compositions, resin sheets, multilayer printed wiring boards, and semiconductor devices
EP4375750A1 (en) 2021-07-20 2024-05-29 Adeka Corporation Film-forming material for semiconductor, member-forming material for semiconductor, process member-forming material for semiconductor, underlayer film-forming material, underlayer film, and semiconductor device
JP7259141B1 (en) 2021-08-31 2023-04-17 富士フイルム株式会社 Method for producing cured product, method for producing laminate, method for producing semiconductor device, and treatment liquid
JPWO2023054142A1 (en) 2021-09-29 2023-04-06
CN117897645A (en) 2021-09-30 2024-04-16 富士胶片株式会社 Head-up display system and conveyor
WO2023054565A1 (en) 2021-09-30 2023-04-06 富士フイルム株式会社 Method for producing magnetic particle-containing composition, magnetic particle-containing composition, magnetic particle-containing cured product, magnetic particle-introduced substrate, and electronic material
CN118302708A (en) 2021-11-05 2024-07-05 富士胶片株式会社 Virtual image display device, head-up display system, and transport machine
WO2023120037A1 (en) 2021-12-23 2023-06-29 富士フイルム株式会社 Joined body production method, joined body, laminate production method, laminate, device production method, device, and composition for forming polyimide-containing precursor part
CN118184557A (en) * 2024-05-17 2024-06-14 上海交通大学 Oxime ester photoinitiator based on chalcone and preparation method and application thereof

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1180846A (en) 1967-08-08 1970-02-11 Agfa Gevaert Nv Photopolymerisation of Ethylenically Unsaturated Organic Compounds
FR2393345A1 (en) 1977-06-01 1978-12-29 Agfa Gevaert Nv MANUFACTURE OF MODIFIED ELEMENTS IN THE FORM OF IMAGES
GB2029423A (en) 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US4590145A (en) 1985-06-28 1986-05-20 Daicel Chemical Industries, Ltd. Photopolymerization initiator comprised of thioxanthones and oxime esters
US5019482A (en) 1987-08-12 1991-05-28 Asahi Kasei Kogyo Kabushiki Kaisha Polymer/oxime ester/coumarin compound photosensitive composition
KR0147207B1 (en) 1993-07-28 1998-08-17 단노 다께시 Photoinitiator compositions and photosensitive materials using the same
JPH07278214A (en) 1994-02-15 1995-10-24 Hitachi Chem Co Ltd Photopolymerization initiator, photosensitive composition, photosensitive material, and production of pattern
JPH0990627A (en) * 1995-09-27 1997-04-04 Toray Ind Inc Photosensitive polyimido precursor composition
US20010037037A1 (en) * 1995-10-31 2001-11-01 Kurt Dietliker Oximesulfonic acid esters and the use thereof as latent sulfonic acids
JP3672126B2 (en) 1996-03-18 2005-07-13 富士写真フイルム株式会社 Photopolymerizable composition
US6770420B2 (en) * 1996-09-02 2004-08-03 Ciba Specialty Chemicals Corporation Alkylsulfonyloximes for high-resolution i-line photoresists of high sensitivity
MY121423A (en) * 1998-06-26 2006-01-28 Ciba Sc Holding Ag Photopolymerizable thermosetting resin compositions
SG77689A1 (en) 1998-06-26 2001-01-16 Ciba Sc Holding Ag New o-acyloxime photoinitiators
WO2000052530A1 (en) * 1999-03-03 2000-09-08 Ciba Specialty Chemicals Holding Inc. Oxime derivatives and the use thereof as photoinitiators
NL1014545C2 (en) * 1999-03-31 2002-02-26 Ciba Sc Holding Ag Oxim derivatives and their use as latent acids.
SG97168A1 (en) 1999-12-15 2003-07-18 Ciba Sc Holding Ag Photosensitive resin composition
NL1016815C2 (en) 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester photo initiators.
TWI272451B (en) * 2000-09-25 2007-02-01 Ciba Sc Holding Ag Chemically amplified photoresist composition, process for preparation of a photoresist, and use of said chemically amplified photoresist composition
JP4408220B2 (en) * 2001-06-01 2010-02-03 チバ ホールディング インコーポレーテッド Substituted oxime derivatives and their use as latent acids
JP4337481B2 (en) * 2002-09-17 2009-09-30 東レ株式会社 Negative photosensitive resin precursor composition, electronic component using the same, and display device
CN1241562C (en) * 2004-08-05 2006-02-15 陕西师范大学 Application of forsythin in the process for preparing adiposis treating oral medicine and healthy food

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI406840B (en) * 2006-02-24 2013-09-01 Fujifilm Corp Oxime derivative, photopolymerizable composition, color filter, and process for producing the same
TWI668210B (en) * 2013-11-28 2019-08-11 塔可馬科技股份有限公司 Photoinitiator and photosensitive composition including the same

Also Published As

Publication number Publication date
JP2006342166A (en) 2006-12-21
JP3860170B2 (en) 2006-12-20
WO2002100903A1 (en) 2002-12-19
EP1395615A1 (en) 2004-03-10
CN1514845A (en) 2004-07-21
CN100528838C (en) 2009-08-19
US20040170924A1 (en) 2004-09-02
KR20040007700A (en) 2004-01-24
DE60234095D1 (en) 2009-12-03
CA2446722A1 (en) 2002-12-19
JP2004534797A (en) 2004-11-18
EP1395615B1 (en) 2009-10-21
US7189489B2 (en) 2007-03-13
ATE446322T1 (en) 2009-11-15
KR100801457B1 (en) 2008-02-11

Similar Documents

Publication Publication Date Title
TW593357B (en) Oxime ester photoinitiators having a combined structure
US10488756B2 (en) Oxime ester photoinitiators
KR101526618B1 (en) Oxime ester photoinitiators
TWI415838B (en) Oxime ester photoinitiators
US9365515B2 (en) Oxime ester photoinitiators
KR101604873B1 (en) Oxime ester photoinitiators
TWI326682B (en) Oxime ester photoinitiators with heteroaromatic groups
TWI386393B (en) Oxime ester photoinitiators
KR101831912B1 (en) Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions
KR101526619B1 (en) Oxime ester photoinitiators
TWI626238B (en) Oxime ester photoinitiators
JP5289649B2 (en) Oxime ester photoinitiator
TWI466853B (en) Oxime ester photoinitiators
TW200918503A (en) Oxime ester photoinitiators
GB2357293A (en) Photosensitive resin composition
TW201004906A (en) Photoinitiator mixtures
TWI843798B (en) Oxime ester photoinitiators having a special aroyl chromophore
TW499411B (en) Oxime ester photoinitiators

Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent