JP2005258398A - Method of manufacturing plasma display panel and transfer film - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing PDP by which components of PDP excellent in pattern profile (such as a dielectric layer, barrier ribs, electrodes, a resistive element, a phosphor, color filters and a black matrix) can be suitably formed with excellent workability, and to provide a transfer film. <P>SOLUTION: A panel material with an inorganic pattern is formed by a method comprising the steps of forming an inorganic-powder-containing resin layer on a substrate; forming a resist film containing a specified photoinitiator on the inorganic-powder-containing resin layer; forming a latent image of a resist pattern by exposing the resist film; eliciting the resist pattern by developing the resist film; forming a pattern of the inorganic-powder-containing resin layer corresponding to the resist pattern by etching the inorganic-powder-containing resin layer; and firing the formed pattern. <P>COPYRIGHT: (C)2005,JPO&NCIPI

Description

  The present invention relates to a method for producing a plasma display panel and a transfer film suitably used for the production method.

  In recent years, a plasma display has attracted attention as a flat fluorescent display. FIG. 1 is a schematic view showing a cross-sectional shape of an AC type plasma display panel (hereinafter also referred to as “PDP”). In the figure, reference numerals 1 and 2 denote glass substrates arranged opposite to each other, 3 denotes a partition, and cells are defined by the glass substrate 1, the glass substrate 2, and the partition 3. 4 is a transparent electrode fixed to the glass substrate 1, 5 is a bus electrode formed on the transparent electrode 4 for the purpose of reducing the resistance of the transparent electrode 4, 6 is an address electrode fixed to the glass substrate 2, and 7 is Fluorescent material held in the cell, 8 is a dielectric layer formed on the surface of the glass substrate 1 so as to cover the transparent electrode 4 and the bus electrode 5, and 9 is on the surface of the glass substrate 2 so as to cover the address electrode 6. The formed dielectric layer 10 is a protective film made of, for example, magnesium oxide. In the color PDP, a color filter (red / green / blue) or a black matrix may be provided between the glass substrate and the dielectric layer in order to obtain a high contrast image.

  As a method for producing such PDP partition walls, electrodes, phosphors, color filters, black stripes (matrix), etc., a photosensitive inorganic powder-containing resin layer is formed on a substrate, and a photomask is provided on this film. A photolithographic method or the like is preferably used in which a pattern is left on the substrate by developing after being irradiated with ultraviolet rays, and the pattern is baked. In the photolithographic method, the exposure and development steps are performed once. When forming a pattern having a film thickness of 10 to 100 μm, the sensitivity in the depth direction of the inorganic powder-containing resin layer is insufficient, and a high-definition pattern with sharp edges is not necessarily obtained.

  As means for solving the above-mentioned problems, the present inventors formed a laminate of a photosensitive resist composition layer and an inorganic powder-containing resin layer on a substrate, and a photosensitive resist composition constituting the laminated film. The physical layer is exposed to form a latent image of the resist pattern, the photosensitive resist composition layer is developed to reveal the resist pattern, and the inorganic powder-containing resin layer is etched to support the resist pattern. The manufacturing method of PDP characterized by including the process of forming the pattern of the inorganic powder containing resin layer to form, and baking the said pattern and forming an inorganic pattern is proposed.

JP 9-155961 A JP-A-11-162339

However, in the above-described photosensitive resist composition, the intensity of the photo-curing radiation in the coating film attenuates with respect to the depth direction, and therefore, as it approaches the bottom of the photosensitive resist composition in the coating film. A phenomenon of becoming smaller occurs, and the curing reaction is not easily achieved. In this case, the bottom portion is removed by the development process in the manufacturing process of each component in the PDP, and the obtained resist pattern has a so-called undercut. In an extreme case, in the development process, There is a problem that the photosensitive resist layer flows away. As a result, the patterning becomes non-uniform and the yield of the panel becomes extremely poor.
Further, when the amount of the photoinitiator is increased in order to ensure sensitivity, there is a problem that the flammability of the resist layer in the baking process is lowered and the pattern shape is liable to be deteriorated.

The present invention has been made based on the above situation.
The first object of the present invention is to suitably use PDP components (for example, dielectric layers, barrier ribs, electrodes, resistors, phosphors, color filters, and black matrices) having excellent workability and excellent pattern shapes. An object of the present invention is to provide a method of manufacturing a PDP that can be formed.
The second object of the present invention is to provide a transfer film that can form a PDP component excellent in workability and pattern shape.
Further objects of the present invention will become apparent from the following description.

  The method for producing the PDP of the present invention comprises forming an inorganic powder-containing resin layer on a substrate, and selecting from the compounds represented by the following formula (1) and the following formula (2) on the inorganic powder-containing resin layer. A resist film containing at least one kind (hereinafter also referred to as “compound (I)”), exposing the resist film to form a latent image of the resist pattern, and developing the resist film By revealing the resist pattern, etching the inorganic powder-containing resin layer to form a pattern of the inorganic powder-containing resin layer corresponding to the resist pattern, and baking the pattern, the inorganic pattern is formed. A panel material is formed.

In [Equation (1) and (2), R ¹ and ^{R 2} are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, alicyclic hydrocarbon group having 3 to 20 carbon atoms (provided that An alkyl group having 1 to 6 carbon atoms, an alkoxyl group having 1 to 6 carbon atoms, a phenyl group and a halogen atom, which may be substituted, and a phenyl group (however, an alkyl having 1 to 6 carbon atoms) Group, an alkoxyl group having 1 to 6 carbon atoms, a phenyl group, and a halogen atom may be substituted.), An oxygen-containing heterocyclic group having 4 to 20 carbon atoms, and a group having 4 to 20 carbon atoms A nitrogen-containing heterocyclic group or a sulfur-containing heterocyclic group having 4 to 20 carbon atoms (except when R ¹ and R ² are both hydrogen atoms), and R ³ is a hydrogen atom or 1 carbon atom an 12 alkyl radical, R , ^{R 5} and ^{R 6} are each independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. ]

  In the method for producing a PDP of the present invention, the effect is more preferably exhibited by previously forming a laminated film of a resist film and an inorganic powder-containing resin layer on a support film.

  The transfer film of the present invention is characterized by having a laminated film of a resist film containing compound (I) and an inorganic powder-containing resin layer containing an inorganic powder and a binder resin on a support film. .

  According to the conductive paste composition and the electrode-forming transfer film of the present invention, it is possible to form an electrode pattern that is excellent in workability and has an excellent pattern shape and good adhesion. The conductive paste composition and the electrode-forming transfer film of the present invention can be suitably used for forming an electrode pattern for a plasma display panel.

Hereinafter, the present invention will be described in detail.
In the production method of the present invention, [1] an inorganic powder-containing resin layer forming step, [2] a resist film forming step, [3] a resist film exposing step, [4] a resist film developing step, [5 A panel material having an inorganic pattern is formed by an etching process of an inorganic powder-containing resin layer and [6] a baking process of an inorganic powder-containing resin layer pattern. Here, the panel material having an inorganic pattern is not particularly limited as long as it is a component of a plasma display panel, and examples thereof include a partition, an electrode, a dielectric, a resistor, a phosphor, a color filter, and a black matrix. .

<Inorganic powder-containing resin layer forming step>
In the production method of the present invention, the inorganic powder-containing resin layer is coated with the inorganic powder-containing resin composition by various methods such as screen printing, roll coating, spin coating, and cast coating. However, it is preferable to use a transfer film and transfer the inorganic powder-containing resin layer constituting the transfer film to the surface of the substrate.
The transfer film has a support film and an inorganic powder-containing resin layer formed on the support film, and a protective film layer is provided on the surface of the inorganic powder-containing resin layer. May be. The specific configuration of the transfer film will be described later.

An example of the transfer process is as follows. After peeling off the protective film layer of the transfer film used as necessary, the transfer film is overlaid on the surface of the glass substrate so that the surface of the resin layer containing the inorganic powder is in contact with it, and this transfer film is heated. After thermocompression bonding with a roller or the like, the support film is peeled off from the inorganic powder-containing resin layer. As a result, the inorganic powder-containing resin layer is transferred and adhered to the surface of the glass substrate. Here, as the transfer conditions, for example, the surface temperature of the heating roller is 80 to 140 ° C., the roll pressure by the heating roller is 1 to 5 kg / cm ² , and the moving speed of the heating roller is 0.1 to 10.0 m / min. Can show. Further, the glass substrate may be preheated, and the preheat temperature can be set to 40 to 100 ° C., for example.

<Resist film formation process>
In this step, a resist film is formed on the surface of the formed inorganic powder-containing resin layer. The resist constituting the resist film may be either a positive resist or a negative resist, and the specific composition thereof will be described later.
The resist film can be formed by applying a resist by various methods such as a screen printing method, a roll coating method, a spin coating method, and a casting coating method, and then drying the coating film.
Moreover, you may form by transferring the resist film formed on the support film to the surface of an inorganic powder containing resin layer. According to such a forming method, it is possible to improve the process (high efficiency) in the resist film forming process, and to achieve uniform film thickness of the formed inorganic powder pattern.
The thickness of the resist film is usually 0.1 to 40 μm, preferably 0.5 to 20 μm.

<Resist film exposure process>
In this process, a resist pattern latent image is formed by selectively irradiating (exposing) ultraviolet rays or the like to the surface of the resist film formed on the inorganic powder-containing resin layer through an exposure mask. To do.
Here, the radiation irradiation apparatus is not particularly limited, such as an ultraviolet irradiation apparatus used in the photolithography method, an exposure apparatus used in manufacturing semiconductors and liquid crystal display devices.

<Development process of resist film>
In this step, the exposed resist film is developed to reveal a resist pattern (latent image).
Here, as development processing conditions, depending on the type of resist film, etc., the type / composition / concentration of developer, development time, development temperature, development method (for example, dipping method, rocking method, shower method, spray method, Paddle method), developing device and the like can be selected as appropriate.
By this development process, a resist pattern (pattern corresponding to an exposure mask) composed of a resist remaining portion and a resist removal portion is formed.
This resist pattern acts as an etching mask in the next process (etching process), and the constituent material of the resist remaining portion (photocured resist) is more resistant to the etching solution than the constituent material of the inorganic powder-containing resin layer. A low dissolution rate is required.

<Etching process of inorganic powder-containing resin layer>
In this step, the inorganic powder-containing resin layer is etched to form an inorganic powder-containing resin layer pattern corresponding to the resist pattern.
That is, in the inorganic powder-containing resin layer, a portion corresponding to the resist removal portion of the resist pattern is dissolved in the etching solution and selectively removed. When the etching process is further continued, the glass substrate surface is exposed at a portion corresponding to the resist removal portion in the inorganic powder-containing resin layer. Thereby, the inorganic powder containing resin layer pattern comprised from a material layer residual part and a material layer removal part is formed.
Here, as the etching treatment conditions, depending on the type of the inorganic powder-containing resin layer, etc., the type / composition / concentration of the etchant, the treatment time, the treatment temperature, the treatment method (for example, immersion method, rocking method, shower method) , Spray method, paddle method), processing apparatus, and the like can be appropriately selected.
In addition, by selecting the type of the resist film and the inorganic powder-containing resin layer so that the same solution as the developing solution used in the developing step can be used as the etching solution, the developing step and the etching step are performed. It becomes possible to carry out continuously, and it is possible to improve the manufacturing efficiency by simplifying the process.
Here, the resist residual portion constituting the resist pattern is gradually dissolved during the etching process, and is completely removed at the stage where the inorganic powder-containing resin layer pattern is formed (at the end of the etching process). Preferably there is.
Note that even if part or all of the remaining resist portion remains after the etching process, the remaining resist portion is removed in the next baking step.

<Baking step of inorganic powder-containing resin layer pattern>
In this step, the inorganic powder-containing resin layer pattern is baked to form partition walls, electrodes, resistors, phosphors, color filters, black matrices, or the like. As a result, the organic substance in the remaining part of the material layer is burned off to form an inorganic layer such as a glass layer, a metal layer, and a phosphor layer, and a partition, electrode, resistor, phosphor, and color filter are formed on the surface of the glass substrate. Alternatively, a panel material in which a pattern such as a black matrix is formed can be obtained.
Here, the temperature of the baking treatment needs to be a temperature at which the organic substance in the remaining portion of the material layer is burned off, and is usually set to 400 to 600 ° C. The firing time is usually 10 to 90 minutes.

<Preferred embodiment>
In the production method of the present invention, it is preferable to transfer and form a laminate composed of a plurality of inorganic powder-containing resin layers having different solubility in the etching solution on the substrate. By etching such a laminated body, anisotropy in the depth direction with respect to etching occurs, so that a material layer residual portion having a rectangular shape or a preferable cross-sectional shape close to a rectangle can be formed.
In addition, the lamination | stacking number of an inorganic powder containing resin layer shall be 10 or less normally, Preferably it shall be 2-5.
Here, as a method of forming a laminate comprising n layers of inorganic powder-containing resin layers on a substrate, (1) the inorganic powder-containing resin layer (one layer) formed on the support film is transferred n times. (2) The method of (2) above from the viewpoint of simplification of the transfer process, although (2) the method of batch transfer of a laminate comprising an inorganic powder-containing resin layer of n layers may be used. Is preferred.

<Other methods for forming inorganic powder pattern>
The formation method of the inorganic powder pattern in the present invention is not limited to the method described above.
Here, as another method for forming the inorganic powder pattern, a formation method by the following steps (1) to (3) may be mentioned.
(1) After forming a resist film on a support film, an inorganic powder-containing resin layer is laminated on the resist film. Here, when forming the resist film and the inorganic powder-containing resin layer, a roll coater or the like can be used, thereby forming a laminated film having excellent film thickness uniformity on the support film. Can do.
(2) The laminated film of the resist film and the inorganic powder-containing resin layer formed on the support film is transferred onto the substrate. Here, the transfer conditions may be the same as those in the “transfer process of the inorganic powder-containing resin layer”.
(3) Perform the same operations as the “resist film exposure process”, “resist film development process”, “inorganic powder-containing resin layer etching process” and “inorganic powder-containing resin layer pattern baking process”. .
According to the above method, since the inorganic powder-containing resin layer and the resist film are collectively transferred onto the substrate, it is possible to further improve manufacturing efficiency by simplifying the process.

Below, the material used for each said process, various conditions, etc. are demonstrated.
<Board>
As the substrate material, for example, a plate-like member made of an insulating material such as glass, silicon, polycarbonate, polyester, aromatic amide, polyamideimide, polyimide or the like. For the surface of the plate-like member, chemical treatment with a silane coupling agent or the like, if necessary, plasma treatment; thin film formation treatment by an ion plating method, a sputtering method, a gas phase reaction method, a vacuum deposition method, etc. Such an appropriate pretreatment may be performed.

<Transfer film>
The transfer film used in the production method of the present invention comprises a support film and an inorganic powder-containing resin layer formed on the support film, and a protective film layer is formed on the surface of the inorganic powder-containing resin layer. It may be provided.
In addition, as the transfer film used in the production method of the present invention, the transfer film of the present invention having a laminated film of a resist film described later and an inorganic powder-containing resin layer on a support film is particularly preferably used. Hereinafter, the components of the transfer film of the present invention will be described in detail.

(1) Support film:
The support film constituting the transfer film is preferably a resin film having heat resistance and solvent resistance and flexibility. When the support film has flexibility, the paste-like composition can be applied by a roll coater, and the inorganic powder-containing resin layer can be stored and supplied in a state of being wound in a roll. Examples of the resin forming the support film include polyethylene terephthalate, polyester, polyethylene, polypropylene, polystyrene, polyimide, polyvinyl alcohol, polyvinyl chloride, polyfluoroethylene, and other fluorine-containing resins, nylon, and cellulose. The thickness of the support film is, for example, 20 to 100 μm.

(2) Resin layer containing inorganic powder:
The inorganic powder-containing resin layer constituting the transfer film is a paste-like inorganic powder-containing resin composition containing inorganic powder, a binder resin and a solvent as essential components (for example, a partition wall forming composition, an electrode forming material). A composition, a composition for forming a dielectric, a composition for forming a resistor, a composition for forming a phosphor, a composition for forming a color filter, and a composition for forming a black matrix) on the support film, It can be formed by drying to remove part or all of the solvent.

(3) Inorganic powder-containing resin composition The inorganic powder-containing resin composition used for producing the transfer film comprises (a) an inorganic powder, (b) a binder, and (c) a solvent. It is a paste-like composition.

(A) Inorganic powder The inorganic powder used in the inorganic powder-containing resin composition of the present invention varies depending on the type of forming material.
For example, examples of the inorganic powder used for the partition wall forming material and the dielectric forming material include glass powder, preferably glass powder having a softening point of 400 to 600 ° C.
Examples of the inorganic powder used for the electrode forming material include Ag, Au, Al, Ni, Ag—Pd alloy, Cu, and Cr.
Examples of the inorganic powder used for the resistor forming material include RuO ₂ .
Inorganic powders used for phosphor forming materials are Y ₂ O ₃ : Eu ³⁺ , Y ₂ SiO ₅ : Eu ³⁺ , Y ₃ Al ₅ O ₁₂ : Eu ³⁺ , YVO ₄ : Eu ³⁺ , ( Y, Gd) BO ₃ : Eu ³⁺ , Zn ₃ (PO ₄ ) ₂ : Mn and other red phosphors; Zn ₂ SiO ₄ : Mn, BaAl ₁₂ O ₁₉ : Mn, BaMgAl ₁₄ O ₂₃ : Mn, LaPO ₄ : (Ce, Tb), Y ₃ (Al, Ga) ₅ O ₁₂ : Green phosphor such as Tb; Y ₂ SiO ₅ : Ce, BaMgAl ₁₀ O ₁₇ : Eu ²⁺ , BaMgAl ₁₄ O ₂₃ : Eu ²⁺ , (Ca, Sr, Ba) ₁₀ (PO ₄ ) ₆ Cl ₂ : Eu ²⁺ , (Zn, Cd) S: Ag, and the like.
Inorganic powders used for color filter forming materials include red pigments such as Fe ₂ O ₃ , Pb ₃ O ₄ , CdS, CdSe, PbCrO ₄ , PbSO ₄ , Fe (NO ₃ ) ₃ ; Cr ₂ O ₃ , Green pigments such as TiO ₂ -CoO-NiO-ZnO, CoO-CrO-TiO ₂ -Al ₂ O ₃ , Co ₃ (PO4) ₂ , CoO-ZnO; 2 (Al ₂ Na ₂ Si ₃ O ₁₀ ) ・ Na ₂ S ₄ ) In addition to blue pigments such as CoO-Al ₂ O ₃ , PbCrO ₄ -PbSO ₄ , PbCrO ₄ , PbCrO ₄ -PbO, CdS, TiO ₂ -NiO-Sb ₂ Mention may be made of yellow pigments such as O ₃ ; orange pigments such as Pb (Cr—Mo—S) O ₄ ; purple pigments such as Co ₃ (PO ₄ ) ₂ .
Examples of the inorganic powder used for the black matrix forming material include Mn, Fe, Cr and the like.

(B) Binder Resin As the binder resin used in the inorganic powder-containing resin composition of the present invention, various resins can be used, but the alkali-soluble resin is contained in a proportion of 30 to 100% by weight. It is particularly preferable to use a binder resin.
Here, “alkali-soluble” refers to the property of being dissolved in an alkaline etching solution described later and having solubility to such an extent that the intended etching process is performed.
Specific examples of such alkali-soluble resins include (meth) acrylic resins, hydroxystyrene resins, novolac resins, and polyester resins.
Among such alkali-soluble resins, particularly preferred are the following copolymer of monomer (a) and monomer (b), or monomer (a), monomer (b) and monomer (c): Mention may be made of copolymers.

Monomer (I):
Carboxyl group-containing monomers such as acrylic acid, methacrylic acid, maleic acid, fumaric acid, crotonic acid, itaconic acid, citraconic acid, mesaconic acid, cinnamic acid; (meth) acrylic acid 2-hydroxyethyl, (meth) acrylic acid Hydroxyl-containing monomers such as 2-hydroxypropyl and 3-hydroxypropyl (meth) acrylate; alkali-soluble typified by phenolic hydroxyl-containing monomers such as o-hydroxystyrene, m-hydroxystyrene and p-hydroxystyrene Functional group-containing monomers.
Monomer (b):
Other than monomers (A) such as methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, benzyl (meth) acrylate, glycidyl (meth) acrylate, dicyclopentanyl (meth) acrylate (Meth) acrylic acid esters; aromatic vinyl monomers such as styrene and α-methylstyrene; monomers copolymerizable with monomer (a) typified by conjugated dienes such as butadiene and isoprene.
Monomer (C):
A macro having a polymerizable unsaturated group such as a (meth) acryloyl group at one end of a polymer chain such as polystyrene, poly (meth) acrylate methyl, poly (meth) ethyl acrylate, poly (meth) acrylate benzyl, etc. Macromonomer represented by monomer etc .:

  The content ratio of the binder resin in the inorganic powder-containing resin composition is usually 1 to 50 parts by weight, preferably 1 to 40 parts by weight with respect to 100 parts by weight of the inorganic powder.

(C) Solvent The solvent constituting the inorganic powder-containing resin composition is contained in order to impart appropriate fluidity or plasticity and good film-forming properties to the inorganic powder-containing resin composition.
The solvent constituting the inorganic powder-containing resin composition is not particularly limited. For example, ethers, esters, ether esters, ketones, ketone esters, amides, amide esters, lactams, Examples include lactones, sulfoxides, sulfones, hydrocarbons, and halogenated hydrocarbons.
Specific examples of such solvents include tetrahydrofuran, anisole, dioxane, ethylene glycol monoalkyl ethers, diethylene glycol dialkyl ethers, propylene glycol monoalkyl ethers, propylene glycol dialkyl ethers, acetate esters, hydroxyacetate esters, alkoxyacetic acid. Esters, propionic acid esters, hydroxypropionic acid esters, alkoxypropionic acid esters, lactic acid esters, ethylene glycol monoalkyl ether acetates, propylene glycol monoalkyl ether acetates, alkoxyacetic acid esters, cyclic ketones, Acyclic ketones, acetoacetic esters, pyruvates, N, N-dialkylformamides, N, N- Examples include alkylacetamides, N-alkylpyrrolidones, γ-lactones, dialkylsulfoxides, dialkylsulfones, terpineol, N-methyl-2-pyrrolidone, etc., and these may be used alone or in combination of two or more. Can be used.
The content ratio of the solvent in the inorganic powder-containing resin composition can be appropriately selected within a range in which good film forming properties (fluidity or plasticity) can be obtained.

  Inorganic powder-containing resin compositions include, as optional components, plasticizers, development accelerators, adhesion assistants, antihalation agents, storage stabilizers, antifoaming agents, antioxidants, ultraviolet absorbers, fillers, low melting glass And various other additives may be contained.

(4) Resist film (resist composition)
The resist composition used for the transfer film of the present invention contains compound (I) as a photopolymerization initiator, and is usually (A) a binder polymer, (B) a polyfunctional monomer, and (C) a compound ( A photopolymerization initiator containing I) is contained.
In the manufacturing method of the present invention, a resist film may be formed on the inorganic powder-containing resin layer transferred onto the substrate. By subjecting the resist film to exposure processing and development processing, a resist pattern is formed on the inorganic powder-containing resin layer.
The resist film used in the present invention is characterized in that it contains the compound (I).

(A) Binder polymer The binder polymer (A) used in the resist composition must be an alkali-soluble resin in the case of an alkali development type, and has an ethylene unsaturated property having at least one carboxyl group in the molecule. A monomer composition comprising a carboxyl group-containing monomer (A-1) and a copolymerizable monomer (A-2) copolymerizable with the carboxyl group-containing monomer (A-1) It is preferable that it is a carboxyl group-containing copolymer obtained by polymerizing.

  Specific examples of the carboxyl group-containing monomer (A-1) include (i) unsaturated monocarboxylic acids such as acrylic acid, methacrylic acid, and crotonic acid, (b) itaconic acid, maleic acid, fumaric acid and the like. Saturated dicarboxylic acids, and (c) other unsaturated carboxylic acids. These can be used alone or in combination of two or more.

The copolymer containing the structural unit derived from the above carboxyl group-containing monomer (A-1) has alkali solubility, and particularly by using the monomer (A-1) at the above ratio. The resulting copolymer has excellent solubility in an alkali developer. Therefore, a photosensitive resist composition using this as a component (A) is capable of producing an undissolved product in an alkali developer. It becomes essentially less, and background stains and film residues at portions other than the resist pattern forming portion of the substrate are less likely to occur in the development process.
In addition, the resist pattern obtained when this copolymer is used as the component (A) does not excessively dissolve in an alkali developer and has excellent adhesion to the inorganic powder paste layer, so that it is inorganic. It is difficult to fall off from the powder paste layer.

  Specific examples of the copolymerizable monomer (A-2) include (a) aromatic vinyl compounds such as styrene, α-methylstyrene, vinyltoluene, (b) methyl acrylate, methyl methacrylate, ethyl acrylate, and ethyl. Unsaturated carboxylic acid alkyl esters such as methacrylate, butyl acrylate, butyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, benzyl acrylate and benzyl methacrylate, (c) Unsaturated carboxylic acid aminoalkyl esters such as aminoethyl acrylate (D) Unsaturated carboxylic acid glycidyl esters such as glycidyl acrylate and glycidyl methacrylate, (e) carboxylic acid vinyl esters such as vinyl acetate and vinyl propionate, (f) acrylic Vinyl cyanide compounds such as nitrile, methacrylonitrile and α-chloroacrylonitrile, (to) aliphatic conjugated dienes such as 1,3-butadiene and isoprene, (h) polystyrene having acryloyl group or methacryloyl group at each end , Macromonomers such as polymethyl acrylate, polymethyl methacrylate, polybutyl acrylate, polybutyl methacrylate, and polysilicone. These can be used alone or in combination of two or more.

  Preferable specific examples of the binder polymer (A) obtained by copolymerizing the carboxyl group-containing monomer (A-1) and the copolymerizable monomer (A-2) include methacrylic acid / benzyl methacrylate / Examples thereof include a styrene copolymer, a methacrylic acid / methyl methacrylate / styrene copolymer, a methacrylic acid / benzyl methacrylate / polystyrene macromonomer copolymer, and a methacrylic acid / methyl methacrylate / polystyrene macromonomer copolymer.

  The copolymerization ratio of the carboxyl group-containing monomer (A-1) in the binder polymer (A) is preferably 5 to 50% by weight, particularly preferably 10 to 40% by weight, based on the total amount of the monomers. When the copolymerization ratio of the carboxyl group-containing monomer (A-1) is less than 5% by weight, the resulting resist composition tends to be less soluble in an alkaline developer. On the other hand, when the copolymerization ratio of the carboxyl group-containing monomer (A-1) exceeds 50% by weight, the resist pattern tends to fall off from the inorganic powder paste layer during development.

Such a binder polymer (A) has a polystyrene-equivalent weight average molecular weight (hereinafter simply referred to as “weight average molecular weight”) measured by gel permeation chromatography (GPC, carrier: tetrahydrofuran) of 3000 to 300,000. It is preferable that it is 5000-200000.
By using a binder polymer having such a molecular weight, a highly developable resist composition can be obtained, whereby a resist pattern having sharp pattern edges can be formed, and a color filter having a uniform pattern Can be formed.

(B) Multifunctional monomer As the polyfunctional monomer (B), polyfunctional (meth) acrylate is preferably used. Preferable specific examples include two or more functionalities such as polypropylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, trisacryloyloxyethyl phosphate, pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, etc. And polyfunctional acrylates, and oligomers thereof.
Among these, polypropylene glycol diacrylate, trimethylolpropane triacrylate, dipentaerythritol pentaacrylate, and pentaerythritol triacrylate have high resist pattern strength, and hardly cause scumming or film residue at portions other than the pattern forming portion. Particularly preferred in terms.

The molecular weight of the polyfunctional (meth) acrylate is preferably 100 to 2,000.
The proportion of the polyfunctional monomer (B) used is usually 5 to 500 parts by weight, preferably 20 to 300 parts by weight, with respect to 100 parts by weight of the binder polymer (A). When this ratio is less than 5 parts by weight, the resist pattern strength tends to be insufficient. On the other hand, when this ratio exceeds 500 parts by weight, there is a tendency that the alkali resolution is deteriorated, or background contamination other than the resist pattern forming part, film residue, etc. are generated.

(C) Photopolymerization initiator The photopolymerization initiator in the present invention contains compound (I) as an essential component. By using the compound (I), it is possible to obtain a resist film having a high sensitivity and a good curing depth, and thus has an effect that the shape of the resulting pattern is good. Moreover, since the content of the whole photopolymerization initiator can be reduced, a resist film excellent in combustibility and developability can be obtained.

In the above formula (1) and the above formula (2) showing the compound (I), R ¹ and R ² are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, or an alicyclic ring having 3 to 20 carbon atoms. A hydrocarbon group (however, it may be substituted with at least one selected from an alkyl group having 1 to 6 carbon atoms, an alkoxyl group having 1 to 6 carbon atoms, a phenyl group and a halogen atom), a phenyl group (however, And may be substituted with at least one selected from an alkyl group having 1 to 6 carbon atoms, an alkoxyl group having 1 to 6 carbon atoms, a phenyl group, and a halogen atom.), An oxygen-containing heterocyclic group having 4 to 20 carbon atoms , A nitrogen-containing heterocycle-containing group having 4 to 20 carbon atoms or a sulfur-containing heterocycle-containing group having 4 to 20 carbon atoms (except when R ¹ and R ² are both hydrogen atoms).
Examples of the alicyclic hydrocarbon group having 3 to 20 carbon atoms include a cycloalkyl group, a bicycloalkyl group, a tricycloalkyl group, a spiroalkyl group, a ter-cycloalkyl group, a terpene skeleton-containing group, and an adamantyl skeleton-containing group. It is done. Examples of the nitrogen-containing heterocycle-containing group having 4 to 20 carbon atoms, the oxygen-containing heterocycle-containing group having 4 to 20 carbon atoms, and the sulfur-containing heterocycle-containing group having 4 to 20 carbon atoms include, for example, thiolanyl group and azepinyl group. , Dihydroazepinyl group, dioxolanyl group, triazinyl group, oxathanyl group, thiazolyl group, oxadiazinyl group, dioxaindanyl group, dihyanaphthalenyl group, furanyl group, thiophenyl group, pyrrolyl group, isoxazolyl group, isoxazolyl group, thiazolyl Group, isothiazolyl group, pyrazolyl group, furazanyl group, pyranyl group, pyridinyl group, pyridazinyl group, pyrimidyl group, pyrazinyl group, pyrrolinyl group, morpholinyl group, piperazinyl group, quinuclidinyl group, indolyl group, isoindolyl group, benzofuranyl group, benzo Thiophenyl group, India Zinyl, chromenyl, quinolinyl, isoquinolinyl, purinyl, quinazolinyl, cinnolinyl, phthalazinyl, pteridinyl, carbazolyl, acridinyl, phenanthridinyl, thioxanthenyl, phenazinyl, phenothiazinyl, phenoxy Examples include a sathiinyl group, a phenoxazinyl group, and thiantenyl.

Specific examples of such compound (I) include 1- [9-ethyl-6-benzoyl-9.H.-carbazol-3-yl] -nonane-1,2-nonane-2-oxime-O-benzoate. 1- [9-ethyl-6-benzoyl-9.H.-carbazol-3-yl] -nonane-1,2-nonane-2-oxime-O-acetate, 1- [9-ethyl-6-benzoyl -9.H.-Carbazol-3-yl] -pentane-1,2-pentane-2-oxime-O-acetate, 1- [9-ethyl-6-benzoyl-9.H.-carbazol-3-yl ] -Octane-1-one oxime-O-acetate, 1- [9-ethyl-6- (2-methylbenzoyl) -9.H.-carbazol-3-yl] -ethane-1-one oxime-O-benzoate 1- [9-ethyl-6- (2-methylbenzo) Yl) -9.H.-carbazol-3-yl] -ethane-1-one oxime-O-acetate, 1- [9-ethyl-6- (1,3,5-trimethylbenzoyl) -9.H.- Carbazol-3-yl] -ethane-1-one oxime-O-benzoate, 1- [9-butyl-6- (2-ethylbenzoyl) -9.H.-carbazol-3-yl] -ethane-1- Onoxime-O-benzoate can be mentioned. Two or more of these may be used at the same time.
Of these, 1- [9-ethyl-6- (2-methylbenzoyl) -9.H.-carbazol-3-yl] -ethane-1-one oxime-O-acetate is particularly preferable. The compound is a compound represented by the above formula (1), wherein R ¹ is a methyl group, R ² is a methyl group, R ³ is an ethyl group, R ⁴ is a methyl group, and R ⁵ and R ⁶ are hydrogen atoms. .
As a content rate of compound (I), it is 0.01-200 mass parts normally with respect to 100 mass parts of polyfunctional monomers, Preferably, it is 1-120 mass parts.

  A photopolymerization initiator other than the compound (I) may be used in combination with the resist composition. Specific examples of other photopolymerization initiators include benzyl, benzoin, benzophenone, camphorquinone, 2-hydroxy-2-methyl-1-phenylpropan-1-one, 1-hydroxycyclohexyl phenyl ketone, 2,2-dimethoxy. 2-phenylacetophenone, 2-methyl- [4 ′-(methylthio) phenyl] -2-morpholino-1-propanone, 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butane-1 Carbonyl compounds such as -one; Azo compounds or azide compounds such as azoisobutyronitrile and 4-azidobenzaldehyde; Organic sulfur compounds such as mercaptan disulfide; Benzoyl peroxide, di-tert-butyl peroxide, tert-butyl hydroper Oxides Organic peroxides such as hydrogen peroxide and paraffin hydroperoxide; 1,3-bis (trichloromethyl) -5- (2′-chlorophenyl) -1,3,5-triazine, 2- [2- (2- Furanyl) ethylenyl] -4,6-bis (trichloromethyl) -1,3,5-triazine and the like; 2,2′-bis (2-chlorophenyl) 4,5,4 ′, 5′-tetraphenyl Examples thereof include imidazole dimers such as 1,2'-biimidazole. These can be used alone or in combination of two or more. The content rate of other photoinitiators shall be 80 mass% or less with respect to the photopolymerization initiator whole quantity.

(D) Solvent The resist composition used in the present invention usually contains a solvent in order to impart appropriate fluidity or plasticity and good film forming properties to the photosensitive resist composition.
The solvent contained in the resist composition is not particularly limited, and examples thereof include ethers, esters, ether esters, ketones, ketone esters, amides, amide esters, lactams, and lactones. Sulfoxides, sulfones, hydrocarbons, halogenated hydrocarbons, and the like.
Specific examples of such solvents include tetrahydrofuran, anisole, dioxane, ethylene glycol monoalkyl ethers, diethylene glycol dialkyl ethers, propylene glycol monoalkyl ethers, propylene glycol dialkyl ethers, acetate esters, hydroxyacetate esters, alkoxyacetic acid. Esters, propionic acid esters, hydroxypropionic acid esters, alkoxypropionic acid esters, lactic acid esters, ethylene glycol monoalkyl ether acetates, propylene glycol monoalkyl ether acetates, alkoxyacetic acid esters, cyclic ketones, Acyclic ketones, acetoacetic esters, pyruvates, N, N-dialkylformamides, N, N- Examples include alkylacetamides, N-alkylpyrrolidones, γ-lactones, dialkylsulfoxides, dialkylsulfones, terpineol, N-methyl-2-pyrrolidone, etc., and these may be used alone or in combination of two or more. Can be used.
The content ratio of the solvent in the resist composition can be appropriately selected within a range where good film formability (fluidity or plasticity) is obtained.

  The resist composition used in the present invention includes, as optional components, a development accelerator, an adhesion assistant, an antihalation agent, a storage stabilizer, an antifoaming agent, an antioxidant, an ultraviolet absorber, a filler, a phosphor, a pigment, Various additives such as dyes may be contained.

(5) Transfer Film Production Method In the transfer film of the present invention, a resist composition is applied onto a support film to form a resist film, and an inorganic powder-containing resin composition is applied onto the resist film. An inorganic powder-containing resin layer is formed. In addition, the transfer film of the present invention is formed by forming an inorganic powder-containing resin layer on a support film, forming a resist film on a protective film, and laminating the surface of the inorganic powder-containing resin layer and the resist film surface for pressure bonding. It can form suitably also by the method to do. In addition, the transfer film which apply | coated the inorganic powder containing resin composition on the support film, and formed the inorganic powder containing resin layer can also be used for the manufacturing method of this invention.
As a method of applying the resist composition and the inorganic powder-containing resin composition, it is possible to efficiently form a coating film having a large film thickness (for example, 10 μm or more) excellent in film thickness uniformity. Specifically, a coating method using a roll coater, a coating method using a doctor blade, a coating method using a curtain coater, a coating method using a wire coater, and the like can be mentioned as preferable examples.
In addition, it is preferable that the mold release process is performed to the surface of the support film. Thereby, peeling operation of a support film can be easily performed in the transfer process mentioned later.

  The drying condition of the coating film is, for example, about 50 to 150 ° C. for about 0.5 to 30 minutes, and the remaining ratio of the solvent after drying (content ratio in the inorganic powder-containing resin layer) is usually 2% by weight. It is assumed to be within.

The thickness of the inorganic powder-containing resin layer formed on the support film as described above varies depending on the content of the inorganic powder, the type and size of the member, and is, for example, 10 to 100 μm.
Examples of the protective film that may be provided on the surface of the inorganic powder-containing resin layer include a polyethylene film and a polyvinyl alcohol film. Moreover, when providing a protective film, it is preferable that a support film is a thing with a smaller peeling force (it is easy to peel) with a support film and a protective film.

<Mask for exposure>
Although the exposure pattern of the exposure mask M used in the resist film exposure process varies depending on the material, it is generally a stripe having a width of 10 to 500 μm.

<Developer>
In the present invention, an alkaline developer is used for the resist film development step.
As an active ingredient of the alkaline developer, for example, lithium hydroxide, sodium hydroxide, potassium hydroxide, sodium hydrogen phosphate, diammonium hydrogen phosphate, dipotassium hydrogen phosphate, disodium hydrogen phosphate, ammonium dihydrogen phosphate , Inorganic such as potassium dihydrogen phosphate, sodium dihydrogen phosphate, lithium silicate, sodium silicate, potassium silicate, lithium carbonate, sodium carbonate, potassium carbonate, lithium borate, sodium borate, potassium borate, ammonia Alkaline compounds: tetramethylammonium hydroxide, trimethylhydroxyethylammonium hydroxide, monomethylamine, dimethylamine, trimethylamine, monoethylamine, diethylamine, triethylamine, monoisopropylamine, diisopropyl Triethanolamine, and organic alkaline compounds such as ethanol amine.
The alkaline developer used in the resist film development step can be adjusted by dissolving one or more of the alkaline compounds in water. Here, the concentration of the alkaline compound in the alkaline developer is usually 0.001 to 10% by weight, preferably 0.01 to 5% by weight. In addition, after the development process with an alkali developer is performed, a washing process is usually performed.

<Etching solution>
The etching solution used in the etching process of the inorganic powder-containing resin layer is preferably an alkaline solution. Thereby, the alkali-soluble resin contained in the inorganic powder-containing resin layer can be easily dissolved and removed.
Since the inorganic powder contained in the inorganic powder-containing resin layer is uniformly dispersed by the alkali-soluble resin, the inorganic powder is dissolved by washing the alkali-soluble resin as a binder with an alkaline solution and washing. Are also removed at the same time.
Here, examples of the alkaline solution used as the etching solution include a solution having the same composition as the developer.
When the etching solution is the same solution as the alkaline developer used in the development process, the development process and the etching process can be performed continuously, and the manufacturing efficiency can be improved by simplifying the process. It is preferable because improvement can be achieved.
In addition, after the etching process with an alkaline solution is performed, a washing process is usually performed.

Moreover, the organic solvent which can melt | dissolve the binder of an inorganic powder containing resin layer can also be used as etching liquid. Examples of the organic solvent include the solvents exemplified as those constituting the inorganic powder-containing resin composition.
In addition, after the etching process with an organic solvent is performed, the rinse process with a poor solvent is performed as needed.

Examples of the present invention will be described below, but the present invention is not limited to these examples. In the following, “part” means “part by mass”.
Moreover, Mw is the weight average molecular weight of polystyrene conversion measured by the Tosoh Corporation gel permeation chromatography (GPC) (brand name HLC-802A).

<Example 1>
(1) Preparation of resin composition containing inorganic powder:
100 parts of Ag powder having a specific surface area of 1.8 m ² / g as conductive powder, Bi ₂ O ₃ —B ₂ O ₃ —SiO ₂ glass frit having an average particle size of 3 μm as glass frit (indefinite shape, softening point) 520 ° C.) 10 parts, as binder resin, 2-ethylhexyl methacrylate / 3-hydroxypropyl methacrylate / methacrylic acid / mono (2-methacryloyloxyethyl) succinate = 60/20/20/20 (mass%) After kneading 20 parts of a copolymer (Mw = 50,000), 1 part of oleic acid as a dispersant, 10 parts of di-2-ethylhexyl azelate as a plasticizer, and 100 parts of propylene glycol monomethyl ether as a solvent in a bead mill. Prepare conductive paste composition by filtering with stainless mesh (400 mesh, 38μm diameter) It was.

(2) Preparation of resist composition:
Benzyl methacrylate / methacrylic acid = 75/25 (wt%) copolymer (Mw = 30,000) 60 parts as binder polymer, polypropylene glycol diacrylate 40 parts as multifunctional monomer, photopolymerization initiator 1- [9-ethyl-6- (2-methylbenzoyl) -9.H.-carbazol-3-yl] -ethane-1-one oxime-O-acetate 10 parts and 100 parts of propylene glycol monomethyl ether acetate as a solvent Then, an alkali development type radiation sensitive resist composition (hereinafter referred to as “resist composition”) was prepared by filtering with a cartridge filter (2 μm diameter).

(3) Preparation of transfer film:
By the operations (a) to (c) below, a transfer film for forming an electrode of the present invention was produced, in which a laminated film formed by laminating a resist film and an inorganic powder-containing resin layer in this order was formed on a support film. .
(A) The resist composition prepared in (2) was applied onto a support film (I) made of a PET film with a film thickness of 38 μm using a blade coater, and the coating film was dried at 100 ° C. for 3 minutes to remove the solvent. Then, a resist film having a thickness of 8 μm was formed on the support film.
(B) The inorganic powder-containing resin composition prepared in (1) was applied on a support film (II) made of a PET film having a thickness of 38 μm using a blade coater, and the coating film was dried at 100 ° C. for 5 minutes. Then, the solvent was removed, and an inorganic powder-containing resin layer having a thickness of 30 μm was formed on the support film.
(C) The transfer film was overlaid so that the surfaces of the resist film produced in (a) and (b) and the inorganic powder-containing resin layer were brought into contact with each other, and thermocompression bonded with a heating roller. Here, as pressure bonding conditions, the surface temperature of the heating roller was 90 ° C., the roll pressure was 2.5 kg / cm, and the moving speed of the heating roller was 0.5 m / min. Thereby, a transfer film in which a laminated film having a resist film and an inorganic powder-containing resin layer was formed between support films was produced.

(4) Transfer process of laminated film:
The transfer film was superposed on the surface of the glass substrate so that the surface of the inorganic powder-containing resin layer of the transfer film prepared in (3) was in contact, and this transfer film was thermocompression bonded to a heating roller. Here, as pressure bonding conditions, the surface temperature of the heating roller was 90 ° C., the roll pressure was 2.5 kg / cm, and the moving speed of the heating roller was 0.5 m / min. As a result, the transfer film was transferred to and closely adhered to the surface of the glass substrate.

(5) Exposure process / development process of resist film:
With respect to the resist film in the laminated film formed on the glass substrate in the above (4), an ultrahigh pressure mercury lamp is passed from the support film through an exposure mask (100 μm wide stripe pattern and 5 cm square pattern). , I-line (ultraviolet light having a wavelength of 365 nm) was irradiated at 400 mJ / cm ² . After irradiation, the support film on the resist film is peeled off, and then the resist film is developed by a shower method using a 0.3% by mass sodium carbonate aqueous solution (30 ° C.) as a developing solution for the exposed resist film. Processing was carried out for 120 seconds.
Thereby, the uncured resist that was not irradiated with ultraviolet rays was removed to form a resist pattern. The resist pattern had a uniform pattern shape and a good shape with excellent pattern edge linearity.

(6) Etching process of inorganic powder-containing resin layer:
The inorganic powder-containing resin layer was etched for 60 seconds by the shower method using a 0.3% by mass sodium carbonate aqueous solution (30 ° C.) as an etching solution, following the above steps.
Next, washing with ultrapure water and a drying treatment were performed. Thereby, an inorganic powder-containing resin layer pattern was formed.

(7) Pattern firing step:
The glass substrate on which the pattern of the inorganic powder-containing resin layer was formed was baked at 580 ° C. for 30 minutes in an air atmosphere in a baking furnace. As a result, an electrode pattern having a thickness of 8 μm was formed on the surface of the glass substrate. The obtained electrode pattern had no cracks or chips and was excellent in shape. Moreover, the cellophane adhesive tape prescribed | regulated to JISZ1522 was applied on the obtained electrode pattern, and adhesiveness evaluation by the tape method according to JISK5400 was performed. As a result, no peeling was observed in the electrode pattern, indicating good adhesion. The evaluation results are shown in Table 1.

<Examples 2 and 3>
In Example 1, 1- [9-ethyl-6- (2-methylbenzoyl) -9.H.-carbazol-3-yl] -ethane-1-one oxime-O-acetate was changed to the parts shown in Table 1. A transfer film and an electrode pattern were formed and evaluated in the same manner as in Example 1 except that. The evaluation results are also shown in Table 1.

<Comparative example>
In Example 1, the same procedure as in Example 1 was performed except that 2-benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one was used as the photopolymerization initiator in the number of parts shown in Table 1. Then, formation of a transfer film and formation / evaluation of an electrode pattern were performed. The evaluation results are also shown in Table 1.

現像後のレジスト形状：○は良好、×は不良（エッジの直線性なし、寸法違いなど）
焼成後パターン形状：○は亀裂、欠けなし、×は亀裂または欠けあり
密着性評価：○は剥離なし、×は剥離あり

Resist shape after development: ○ is good, x is bad (no edge linearity, dimensional difference, etc.)
Pattern shape after firing: ○ indicates no crack or chipping, × indicates crack or chipping Adhesion evaluation: ○ indicates no peeling, × indicates peeling

It is a schematic diagram which shows the cross-sectional shape of an alternating current type plasma display panel.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Glass substrate 2 Glass substrate 3 Partition 4 Transparent electrode 5 Bus electrode 6 Address electrode 7 Fluorescent substance 8 Dielectric layer 9 Dielectric layer 10 Protective layer

Claims (4)

An inorganic powder-containing resin layer is formed on a substrate, and a resist film containing at least one selected from compounds represented by the following formula (1) and the following formula (2) is formed on the inorganic powder-containing resin layer. Forming and exposing the resist film to form a latent image of the resist pattern; developing the resist film to reveal the resist pattern; etching the inorganic powder-containing resin layer to form a resist pattern; A method for producing a plasma display panel, wherein a panel material having an inorganic pattern is formed by a method including a step of forming a pattern of a corresponding inorganic powder-containing resin layer and baking the pattern.

In [Equation (1) and (2), R ¹ and ^{R 2} are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, alicyclic hydrocarbon group having 3 to 20 carbon atoms (provided that An alkyl group having 1 to 6 carbon atoms, an alkoxyl group having 1 to 6 carbon atoms, a phenyl group and a halogen atom, which may be substituted, and a phenyl group (however, an alkyl having 1 to 6 carbon atoms) Group, an alkoxyl group having 1 to 6 carbon atoms, a phenyl group, and a halogen atom may be substituted.), An oxygen-containing heterocyclic group having 4 to 20 carbon atoms, and a group having 4 to 20 carbon atoms A nitrogen-containing heterocyclic group or a sulfur-containing heterocyclic group having 4 to 20 carbon atoms (except when R ¹ and R ² are both hydrogen atoms), and R ³ is a hydrogen atom or 1 carbon atom an 12 alkyl radical, R , ^{R 5} and ^{R 6} are each independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. ] A laminated film of a resist film containing at least one selected from the compounds represented by the following formula (1) and the following formula (2) and an inorganic powder-containing resin layer is formed on a support film, and the laminated film is The resist film constituting the laminated film is transferred onto the substrate and exposed to light to form a latent image of the resist pattern. The resist film is developed to reveal the resist pattern, and the inorganic powder-containing resin layer is formed. A plasma display panel characterized by forming a panel material having an inorganic pattern by a method including a step of etching to form a pattern of an inorganic powder-containing resin layer corresponding to a resist pattern and baking the pattern. Manufacturing method.

In [Equation (1) and (2), R ¹ and ^{R 2} are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, alicyclic hydrocarbon group having 3 to 20 carbon atoms (provided that An alkyl group having 1 to 6 carbon atoms, an alkoxyl group having 1 to 6 carbon atoms, a phenyl group and a halogen atom, which may be substituted, and a phenyl group (however, an alkyl having 1 to 6 carbon atoms) Group, an alkoxyl group having 1 to 6 carbon atoms, a phenyl group, and a halogen atom may be substituted.), An oxygen-containing heterocyclic group having 4 to 20 carbon atoms, and a group having 4 to 20 carbon atoms A nitrogen-containing heterocyclic group or a sulfur-containing heterocyclic group having 4 to 20 carbon atoms (except when R ¹ and R ² are both hydrogen atoms), and R ³ is a hydrogen atom or 1 carbon atom an 12 alkyl radical, R , ^{R 5} and ^{R 6} are each independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. ] The method of manufacturing a plasma display panel according to claim 1 or 2, wherein the material obtained is at least one selected from partition walls, electrodes, phosphors, color filters, and black stripes (matrix). On the support film, a resist film containing at least one selected from the compounds represented by the following formula (1) and the following formula (2), an inorganic powder-containing resin layer containing an inorganic powder and a binder resin, A transfer film comprising: a laminated film.

In [Equation (1) and (2), R ¹ and ^{R 2} are each independently a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, alicyclic hydrocarbon group having 3 to 20 carbon atoms (provided that An alkyl group having 1 to 6 carbon atoms, an alkoxyl group having 1 to 6 carbon atoms, a phenyl group and a halogen atom, which may be substituted, and a phenyl group (however, an alkyl having 1 to 6 carbon atoms) Group, an alkoxyl group having 1 to 6 carbon atoms, a phenyl group, and a halogen atom may be substituted.), An oxygen-containing heterocyclic group having 4 to 20 carbon atoms, and a group having 4 to 20 carbon atoms A nitrogen-containing heterocyclic group or a sulfur-containing heterocyclic group having 4 to 20 carbon atoms (except when R ¹ and R ² are both hydrogen atoms), and R ³ is a hydrogen atom or 1 carbon atom an 12 alkyl radical, R , ^{R 5} and ^{R 6} are each independently a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. ]

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