TW200625002A - Photosensitive resin composition for color filter - Google Patents
Photosensitive resin composition for color filterInfo
- Publication number
- TW200625002A TW200625002A TW094100840A TW94100840A TW200625002A TW 200625002 A TW200625002 A TW 200625002A TW 094100840 A TW094100840 A TW 094100840A TW 94100840 A TW94100840 A TW 94100840A TW 200625002 A TW200625002 A TW 200625002A
- Authority
- TW
- Taiwan
- Prior art keywords
- color filter
- alkali soluble
- resin composition
- soluble resin
- photo initiator
- Prior art date
Links
Landscapes
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
Abstract
This invention provides a photosensitive resin composition for color filter, which uses high dye content, has good exposure photosensitivity and exhibits good color and contrast, no undercut and no residue after exposed. The abovementioned photosensitive resin composition for a color filter comprises an alkali soluble resin (A), a vinyl unsaturated group containing compound (B), a photo initiator (C), a dye (D) and a solvent (E), in which the alkali soluble resin (A) contains at least one kind of alkali soluble resin (A1) without vinyl unsaturated group containing group and at least one kind of vinyl unsaturated group containing group alkali soluble resin (A2) and the photo initiator (C) at least contains bis-imidazole containing photo initiator (C1) and a photo initiator (C2) with a formula (c2-1). In the formula (c2-1), Z1- represents Ra-, Rb-S- or Rc-O-, in which Ra, Rb and Rc represent hydrogen atom, alkyl group, aryl group, and Z2 represents hydrogen atom, C1-C4 alkyl group or halogen.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW094100840A TW200625002A (en) | 2005-01-12 | 2005-01-12 | Photosensitive resin composition for color filter |
JP2005200087A JP4184365B2 (en) | 2005-01-12 | 2005-07-08 | Photosensitive resin composition for color filter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW094100840A TW200625002A (en) | 2005-01-12 | 2005-01-12 | Photosensitive resin composition for color filter |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200625002A true TW200625002A (en) | 2006-07-16 |
TWI300515B TWI300515B (en) | 2008-09-01 |
Family
ID=36801519
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094100840A TW200625002A (en) | 2005-01-12 | 2005-01-12 | Photosensitive resin composition for color filter |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4184365B2 (en) |
TW (1) | TW200625002A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI447485B (en) * | 2010-09-06 | 2014-08-01 | Chi Mei Corp | Liquid crystal display device |
TWI459137B (en) * | 2012-05-10 | 2014-11-01 | Chi Mei Corp | Photosensitive resin composition for color filters and uses thereof |
TWI467328B (en) * | 2007-10-23 | 2015-01-01 | Jsr Corp | Radiation-sensitive composition for blue color filter, color filter and liquid crystal display device |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4954650B2 (en) * | 2006-09-14 | 2012-06-20 | 太陽ホールディングス株式会社 | Photosensitive paste composition and fired product pattern formed using the same |
JP2009237294A (en) * | 2008-03-27 | 2009-10-15 | The Inctec Inc | Photosensitive resin composition for forming black matrix |
JP2010015062A (en) * | 2008-07-04 | 2010-01-21 | Fujifilm Corp | Colored photosensitive resin composition, color filter and method for manufacturing color filter |
JP2010015063A (en) * | 2008-07-04 | 2010-01-21 | Fujifilm Corp | Colored photosensitive resin composition, color filter and method for manufacturing color filter |
JP2011141550A (en) * | 2011-01-26 | 2011-07-21 | Jsr Corp | Radiation sensitive composition for forming colored layer, color filter, and liquid crystal display |
JP2014167492A (en) * | 2011-06-21 | 2014-09-11 | Asahi Glass Co Ltd | Negative photosensitive composition, partition wall, black matrix, color filter and liquid crystal display element |
TW201525611A (en) * | 2013-12-20 | 2015-07-01 | Chi Mei Corp | Alkali-soluble resin component and photo-sensitive resin composition |
KR101910734B1 (en) * | 2017-03-28 | 2018-10-22 | 동우 화인켐 주식회사 | Colored photo sensitive resin composition, a color filter comprising the same, and a display devide comprising the color filter |
TWI766941B (en) * | 2017-03-31 | 2022-06-11 | 南韓商東友精細化工有限公司 | Blue photosensitive resin composition and color filter and image display device manufactured using the same |
JP7464494B2 (en) * | 2020-10-02 | 2024-04-09 | 東京応化工業株式会社 | Black photosensitive resin composition, method for producing patterned cured product, patterned cured product, and black matrix |
CN116041235B (en) * | 2023-01-10 | 2024-05-14 | 阜阳欣奕华材料科技有限公司 | Thiol-modified fluorene resin oligomer, method for producing same, photosensitive resin composition, color filter, and image display device |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002088136A (en) * | 2000-09-12 | 2002-03-27 | Nagase Kasei Kogyo Kk | Photopolymerizable unsaturated resin and photosensitive resin composition containing the resin |
KR100801457B1 (en) * | 2001-06-11 | 2008-02-11 | 시바 스페셜티 케미칼스 홀딩 인크. | Oxime ester photoinitiators having a combined structure |
JP2003307611A (en) * | 2002-04-17 | 2003-10-31 | Fujifilm Arch Co Ltd | Color filter and method for manufacturing the same |
JP2004020917A (en) * | 2002-06-17 | 2004-01-22 | Fuji Photo Film Co Ltd | Colored photosensitive resin composition, transfer material using the same, color filter, photomask and image forming method |
JP3938375B2 (en) * | 2003-03-12 | 2007-06-27 | 三菱化学株式会社 | Photosensitive coloring composition, color filter, and liquid crystal display device |
JP4290483B2 (en) * | 2003-06-05 | 2009-07-08 | 新日鐵化学株式会社 | Photosensitive resin composition for black resist and light-shielding film formed using the same |
JP4448381B2 (en) * | 2004-05-26 | 2010-04-07 | 東京応化工業株式会社 | Photosensitive composition |
JP2006126397A (en) * | 2004-10-28 | 2006-05-18 | Jsr Corp | Photosensitive resin composition, spacer for display panel, and display panel |
JP2006195425A (en) * | 2004-12-15 | 2006-07-27 | Jsr Corp | Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel |
JP4818712B2 (en) * | 2004-12-28 | 2011-11-16 | 大日本印刷株式会社 | Black resin composition for display element, and member for display element |
-
2005
- 2005-01-12 TW TW094100840A patent/TW200625002A/en unknown
- 2005-07-08 JP JP2005200087A patent/JP4184365B2/en active Active
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI467328B (en) * | 2007-10-23 | 2015-01-01 | Jsr Corp | Radiation-sensitive composition for blue color filter, color filter and liquid crystal display device |
TWI447485B (en) * | 2010-09-06 | 2014-08-01 | Chi Mei Corp | Liquid crystal display device |
TWI459137B (en) * | 2012-05-10 | 2014-11-01 | Chi Mei Corp | Photosensitive resin composition for color filters and uses thereof |
US9164196B2 (en) | 2012-05-10 | 2015-10-20 | Chi Mei Corporation | Photosensitive resin composition for a color filter and uses thereof |
Also Published As
Publication number | Publication date |
---|---|
TWI300515B (en) | 2008-09-01 |
JP2006195410A (en) | 2006-07-27 |
JP4184365B2 (en) | 2008-11-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW200625002A (en) | Photosensitive resin composition for color filter | |
EP1947515A3 (en) | Electrophotographic photosensitive member, and electrophotgraphic apparatus and process cartridge which make use of the same | |
HK1101677A1 (en) | A staining composition for staining an ophthalmic membrane | |
TW200710578A (en) | Antireflective hardmask composition and methods for using same | |
TW200833790A (en) | Curable polyorganosiloxane composition | |
TW200420641A (en) | Resin compositions | |
RU2012151372A (en) | ELECTROPHOTOGRAPHIC LIGHT SENSITIVE ELEMENT, TECHNOLOGICAL CARTRIDGE AND ELECTROPHOTOGRAPHIC DEVICE | |
DK2032589T3 (en) | Solvent system for preparation of N-alkylthiophosphoric triamide solutions, composition containing N-alkylthiophosphoric triamide, and use thereof | |
CN101374880B (en) | Molding method for lithography techniques | |
KR970028827A (en) | Radiation-sensitive composition for color filters | |
EP2413194A3 (en) | Pattern forming method | |
TW200702915A (en) | Photosensitive resin composition for volume phase hologram recording and optical information recording medium using the same | |
MX2009009394A (en) | Heat-sensitive coating compositions based on resorcinyl triazine derivatives. | |
WO2009040661A3 (en) | Thick film resists | |
JP2003186234A5 (en) | ||
TW200801810A (en) | Resist composition for immersion lithography, and method for forming resist pattern | |
EP2145880A4 (en) | Novel epoxy compound, alkali-developable resin composition, and alkali-developable photosensitive resin composition | |
NO20085274L (en) | Painting Composition | |
WO2008117803A1 (en) | Pigment dispersion composition, photocurable composition, color filter, and method for producing color filter | |
TW200628976A (en) | Photosensitive composition for forming shading film and black matrix formed from photosensitive composition | |
TW200739265A (en) | Positive photoresist composition and method of forming photoresist pattern using the same | |
TW200619846A (en) | Photosensitive resin composition and photosensitive film made with the same | |
TW200710568A (en) | Photosensitive resin composition for forming light shielding pattern of plasma display | |
WO2009049273A3 (en) | Organic photosensitive optoelectronic devices containing tetra-azaporphyrins | |
JP2004271629A5 (en) |