TW200625002A - Photosensitive resin composition for color filter - Google Patents

Photosensitive resin composition for color filter

Info

Publication number
TW200625002A
TW200625002A TW094100840A TW94100840A TW200625002A TW 200625002 A TW200625002 A TW 200625002A TW 094100840 A TW094100840 A TW 094100840A TW 94100840 A TW94100840 A TW 94100840A TW 200625002 A TW200625002 A TW 200625002A
Authority
TW
Taiwan
Prior art keywords
color filter
alkali soluble
resin composition
soluble resin
photo initiator
Prior art date
Application number
TW094100840A
Other languages
Chinese (zh)
Other versions
TWI300515B (en
Inventor
Bo-Xuan Lin
Original Assignee
Chi Mei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chi Mei Corp filed Critical Chi Mei Corp
Priority to TW094100840A priority Critical patent/TW200625002A/en
Priority to JP2005200087A priority patent/JP4184365B2/en
Publication of TW200625002A publication Critical patent/TW200625002A/en
Application granted granted Critical
Publication of TWI300515B publication Critical patent/TWI300515B/zh

Links

Landscapes

  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)

Abstract

This invention provides a photosensitive resin composition for color filter, which uses high dye content, has good exposure photosensitivity and exhibits good color and contrast, no undercut and no residue after exposed. The abovementioned photosensitive resin composition for a color filter comprises an alkali soluble resin (A), a vinyl unsaturated group containing compound (B), a photo initiator (C), a dye (D) and a solvent (E), in which the alkali soluble resin (A) contains at least one kind of alkali soluble resin (A1) without vinyl unsaturated group containing group and at least one kind of vinyl unsaturated group containing group alkali soluble resin (A2) and the photo initiator (C) at least contains bis-imidazole containing photo initiator (C1) and a photo initiator (C2) with a formula (c2-1). In the formula (c2-1), Z1- represents Ra-, Rb-S- or Rc-O-, in which Ra, Rb and Rc represent hydrogen atom, alkyl group, aryl group, and Z2 represents hydrogen atom, C1-C4 alkyl group or halogen.
TW094100840A 2005-01-12 2005-01-12 Photosensitive resin composition for color filter TW200625002A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW094100840A TW200625002A (en) 2005-01-12 2005-01-12 Photosensitive resin composition for color filter
JP2005200087A JP4184365B2 (en) 2005-01-12 2005-07-08 Photosensitive resin composition for color filter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW094100840A TW200625002A (en) 2005-01-12 2005-01-12 Photosensitive resin composition for color filter

Publications (2)

Publication Number Publication Date
TW200625002A true TW200625002A (en) 2006-07-16
TWI300515B TWI300515B (en) 2008-09-01

Family

ID=36801519

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094100840A TW200625002A (en) 2005-01-12 2005-01-12 Photosensitive resin composition for color filter

Country Status (2)

Country Link
JP (1) JP4184365B2 (en)
TW (1) TW200625002A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI447485B (en) * 2010-09-06 2014-08-01 Chi Mei Corp Liquid crystal display device
TWI459137B (en) * 2012-05-10 2014-11-01 Chi Mei Corp Photosensitive resin composition for color filters and uses thereof
TWI467328B (en) * 2007-10-23 2015-01-01 Jsr Corp Radiation-sensitive composition for blue color filter, color filter and liquid crystal display device

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4954650B2 (en) * 2006-09-14 2012-06-20 太陽ホールディングス株式会社 Photosensitive paste composition and fired product pattern formed using the same
JP2009237294A (en) * 2008-03-27 2009-10-15 The Inctec Inc Photosensitive resin composition for forming black matrix
JP2010015062A (en) * 2008-07-04 2010-01-21 Fujifilm Corp Colored photosensitive resin composition, color filter and method for manufacturing color filter
JP2010015063A (en) * 2008-07-04 2010-01-21 Fujifilm Corp Colored photosensitive resin composition, color filter and method for manufacturing color filter
JP2011141550A (en) * 2011-01-26 2011-07-21 Jsr Corp Radiation sensitive composition for forming colored layer, color filter, and liquid crystal display
JP2014167492A (en) * 2011-06-21 2014-09-11 Asahi Glass Co Ltd Negative photosensitive composition, partition wall, black matrix, color filter and liquid crystal display element
TW201525611A (en) * 2013-12-20 2015-07-01 Chi Mei Corp Alkali-soluble resin component and photo-sensitive resin composition
KR101910734B1 (en) * 2017-03-28 2018-10-22 동우 화인켐 주식회사 Colored photo sensitive resin composition, a color filter comprising the same, and a display devide comprising the color filter
TWI766941B (en) * 2017-03-31 2022-06-11 南韓商東友精細化工有限公司 Blue photosensitive resin composition and color filter and image display device manufactured using the same
JP7464494B2 (en) * 2020-10-02 2024-04-09 東京応化工業株式会社 Black photosensitive resin composition, method for producing patterned cured product, patterned cured product, and black matrix
CN116041235B (en) * 2023-01-10 2024-05-14 阜阳欣奕华材料科技有限公司 Thiol-modified fluorene resin oligomer, method for producing same, photosensitive resin composition, color filter, and image display device

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002088136A (en) * 2000-09-12 2002-03-27 Nagase Kasei Kogyo Kk Photopolymerizable unsaturated resin and photosensitive resin composition containing the resin
KR100801457B1 (en) * 2001-06-11 2008-02-11 시바 스페셜티 케미칼스 홀딩 인크. Oxime ester photoinitiators having a combined structure
JP2003307611A (en) * 2002-04-17 2003-10-31 Fujifilm Arch Co Ltd Color filter and method for manufacturing the same
JP2004020917A (en) * 2002-06-17 2004-01-22 Fuji Photo Film Co Ltd Colored photosensitive resin composition, transfer material using the same, color filter, photomask and image forming method
JP3938375B2 (en) * 2003-03-12 2007-06-27 三菱化学株式会社 Photosensitive coloring composition, color filter, and liquid crystal display device
JP4290483B2 (en) * 2003-06-05 2009-07-08 新日鐵化学株式会社 Photosensitive resin composition for black resist and light-shielding film formed using the same
JP4448381B2 (en) * 2004-05-26 2010-04-07 東京応化工業株式会社 Photosensitive composition
JP2006126397A (en) * 2004-10-28 2006-05-18 Jsr Corp Photosensitive resin composition, spacer for display panel, and display panel
JP2006195425A (en) * 2004-12-15 2006-07-27 Jsr Corp Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel
JP4818712B2 (en) * 2004-12-28 2011-11-16 大日本印刷株式会社 Black resin composition for display element, and member for display element

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI467328B (en) * 2007-10-23 2015-01-01 Jsr Corp Radiation-sensitive composition for blue color filter, color filter and liquid crystal display device
TWI447485B (en) * 2010-09-06 2014-08-01 Chi Mei Corp Liquid crystal display device
TWI459137B (en) * 2012-05-10 2014-11-01 Chi Mei Corp Photosensitive resin composition for color filters and uses thereof
US9164196B2 (en) 2012-05-10 2015-10-20 Chi Mei Corporation Photosensitive resin composition for a color filter and uses thereof

Also Published As

Publication number Publication date
TWI300515B (en) 2008-09-01
JP2006195410A (en) 2006-07-27
JP4184365B2 (en) 2008-11-19

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