TW200628976A - Photosensitive composition for forming shading film and black matrix formed from photosensitive composition - Google Patents

Photosensitive composition for forming shading film and black matrix formed from photosensitive composition

Info

Publication number
TW200628976A
TW200628976A TW094136347A TW94136347A TW200628976A TW 200628976 A TW200628976 A TW 200628976A TW 094136347 A TW094136347 A TW 094136347A TW 94136347 A TW94136347 A TW 94136347A TW 200628976 A TW200628976 A TW 200628976A
Authority
TW
Taiwan
Prior art keywords
photosensitive composition
black matrix
shading film
matrix formed
forming shading
Prior art date
Application number
TW094136347A
Other languages
Chinese (zh)
Other versions
TWI309338B (en
Inventor
Kenji Maruyama
Masaru Shida
Kiyoshi Uchikawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200628976A publication Critical patent/TW200628976A/en
Application granted granted Critical
Publication of TWI309338B publication Critical patent/TWI309338B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

A photosensitive composition for forming shading film includes (a) a carbon black as a shading pigment, (b) a photo polymerization compound, and (c) a photo polymerization initiator, wherein the carbon black whose primary particle size is 20 to 60 nm, and preferably 30 to 45 nm.
TW094136347A 2004-11-04 2005-10-18 Photosensitive composition for forming shading film and black matrix formed from photosensitive composition TWI309338B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004319992A JP2006133338A (en) 2004-11-04 2004-11-04 Photosensitive composition for forming light shielding film and black matrix formed of the photosensitive composition for forming light shielding film

Publications (2)

Publication Number Publication Date
TW200628976A true TW200628976A (en) 2006-08-16
TWI309338B TWI309338B (en) 2009-05-01

Family

ID=36726964

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094136347A TWI309338B (en) 2004-11-04 2005-10-18 Photosensitive composition for forming shading film and black matrix formed from photosensitive composition

Country Status (4)

Country Link
JP (1) JP2006133338A (en)
KR (2) KR100775804B1 (en)
CN (1) CN1770013A (en)
TW (1) TWI309338B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI781550B (en) * 2020-03-18 2022-10-21 南韓商三星Ｓｄｉ股份有限公司 Photosensitive resin composition, photosensitive resin layer using the same and display device

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100895352B1 (en) * 2006-11-15 2009-04-29 다이요 잉키 세이조 가부시키가이샤 Black paste composition, method for black matrix pattern formation using the same, and its black matrix pattern
JP5577659B2 (en) * 2008-09-18 2014-08-27 東レ株式会社 Photosensitive black resin composition, resin black matrix substrate, color filter substrate, and liquid crystal display device
WO2010038978A2 (en) * 2008-09-30 2010-04-08 Kolon Industries, Inc. Photopolymer resin composition
KR101148548B1 (en) * 2008-09-30 2012-05-21 코오롱인더스트리 주식회사 Photopolymerizable resin composition
KR101368539B1 (en) * 2009-06-26 2014-02-27 코오롱인더스트리 주식회사 Photopolymerizable resin composition
KR101979012B1 (en) * 2012-12-04 2019-05-16 엘지디스플레이 주식회사 Photosensitive Composition for Patterning Black Matrix and Process for forming Patterns of Black Matrix Using the Composition
TWI519608B (en) * 2013-12-27 2016-02-01 財團法人工業技術研究院 Hybrid carbon black, coating composition and shielding material employing the same
KR20150115514A (en) * 2014-04-04 2015-10-14 동우 화인켐 주식회사 Black-colored photosensitive resin composition and black matrix prepared by using the same
CN110041876B (en) * 2019-04-01 2021-09-21 矽时代材料科技股份有限公司 Ultraviolet curing adhesive, preparation method and application

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW425484B (en) * 1995-04-28 2001-03-11 Toray Industries A resin black matrix for liquid crystal display device
KR100396070B1 (en) * 2001-03-24 2003-08-27 (주)펨텍 Composition of black toner for organic black matrix and preparation method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI781550B (en) * 2020-03-18 2022-10-21 南韓商三星Ｓｄｉ股份有限公司 Photosensitive resin composition, photosensitive resin layer using the same and display device

Also Published As

Publication number Publication date
KR100775804B1 (en) 2007-11-12
JP2006133338A (en) 2006-05-25
CN1770013A (en) 2006-05-10
KR20070067669A (en) 2007-06-28
TWI309338B (en) 2009-05-01
KR20060052351A (en) 2006-05-19

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