TW200720840A - Photosensitive composition - Google Patents

Photosensitive composition

Info

Publication number
TW200720840A
TW200720840A TW095130722A TW95130722A TW200720840A TW 200720840 A TW200720840 A TW 200720840A TW 095130722 A TW095130722 A TW 095130722A TW 95130722 A TW95130722 A TW 95130722A TW 200720840 A TW200720840 A TW 200720840A
Authority
TW
Taiwan
Prior art keywords
photosensitive composition
general formula
benzoyl
sublimate
peel
Prior art date
Application number
TW095130722A
Other languages
Chinese (zh)
Other versions
TWI334514B (en
Inventor
Masaru Shida
Mitsuru Kondo
Kiyoshi Uchikawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200720840A publication Critical patent/TW200720840A/en
Application granted granted Critical
Publication of TWI334514B publication Critical patent/TWI334514B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Indole Compounds (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

The invention provides a photosensitive composition capable of forming a black matrix pattern having good linearity, less liable to peel and ensuring less residue. An oxime compound having a fluorene skeleton and benzoyl represented by a general formula (1) is used as a photopolymerization initiator in the photosensitive composition. When the benzoyl moiety in the general formula (1) is made a bulky group, generation of a sublimate can be suppressed during heating after development.
TW095130722A 2005-09-06 2006-08-21 Photosensitive composition TW200720840A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005257401A JP4633582B2 (en) 2005-09-06 2005-09-06 Photosensitive composition

Publications (2)

Publication Number Publication Date
TW200720840A true TW200720840A (en) 2007-06-01
TWI334514B TWI334514B (en) 2010-12-11

Family

ID=37858721

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095130722A TW200720840A (en) 2005-09-06 2006-08-21 Photosensitive composition

Country Status (4)

Country Link
JP (1) JP4633582B2 (en)
KR (1) KR100805863B1 (en)
CN (1) CN1928716B (en)
TW (1) TW200720840A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8822109B2 (en) 2007-09-28 2014-09-02 Fujifilm Corporation Colored curable composition, color filter, and solid image pickup element

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4855312B2 (en) * 2007-03-27 2012-01-18 東京応化工業株式会社 Photosensitive composition
WO2008140017A1 (en) * 2007-05-11 2008-11-20 Hitachi Chemical Company, Ltd. Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board
KR20090100262A (en) 2008-03-18 2009-09-23 후지필름 가부시키가이샤 Photosensitive resin composition, light-shielding color filter, method of producing the same and solid-state image sensor
US8872099B2 (en) 2008-03-18 2014-10-28 Fujifilm Corporation Solid-state image sensor including a light-shielding color filter formed from a photosensitive resin composition, photosensitive resin composition and method of producing a light-shielding color filter
JP5528712B2 (en) * 2008-03-18 2014-06-25 富士フイルム株式会社 Photosensitive resin composition, light-shielding color filter for solid-state image sensor, method for producing the same, and solid-state image sensor
KR101420453B1 (en) * 2008-06-09 2014-07-16 도오꾜오까고오교 가부시끼가이샤 Photosensitive resin composition, photosensitive resin laminate, and method for pattern forming
JP5546801B2 (en) * 2008-06-10 2014-07-09 富士フイルム株式会社 Photosensitive resin composition for ultraviolet light laser exposure, pattern forming method, color filter produced using the method, method for producing color filter, and liquid crystal display device
JP5336274B2 (en) * 2008-07-09 2013-11-06 東京応化工業株式会社 Colored photosensitive resin composition and oxime photopolymerization initiator
JP5507938B2 (en) * 2008-10-01 2014-05-28 東京応化工業株式会社 Photosensitive resin composition for color filter, color filter, and liquid crystal display
JP5669386B2 (en) * 2009-01-15 2015-02-12 富士フイルム株式会社 NOVEL COMPOUND, POLYMERIZABLE COMPOSITION, COLOR FILTER, PROCESS FOR PRODUCING THE SAME, SOLID-STATE IMAGING ELEMENT, AND lithographic printing plate precursor
JP2010256891A (en) * 2009-04-01 2010-11-11 Toyo Ink Mfg Co Ltd Photosensitive coloring composition and color filter
JP2011170334A (en) * 2010-01-20 2011-09-01 Fujifilm Corp Black curable composition for wafer-level lens, and wafer-level lens
JP4914972B2 (en) * 2010-06-04 2012-04-11 ダイトーケミックス株式会社 Oxime ester compound, method for producing oxime ester compound, photopolymerization initiator, and photosensitive composition
CN102020727B (en) * 2010-11-23 2013-01-23 常州强力先端电子材料有限公司 Pyrazole oxime ester photoinitiator with high photosensibility, preparation method and application thereof
JP6026757B2 (en) * 2012-03-12 2016-11-16 東京応化工業株式会社 Photosensitive resin composition, color filter, display device, photopolymerization initiator, and compound
JP6208119B2 (en) * 2012-03-22 2017-10-04 株式会社Adeka Novel compound and photosensitive resin composition
CN102924366A (en) * 2012-10-23 2013-02-13 中国科学院长春应用化学研究所 Carbazole ketone intermediate containing multi-functional group structure and preparation method for carbazole ketone intermediate
TWI516871B (en) * 2013-10-25 2016-01-11 臺灣永光化學工業股份有限公司 Negative-type photoresist composition for thick film and use thereof
JP6410540B2 (en) * 2014-09-25 2018-10-24 東京応化工業株式会社 Photosensitive resin composition
JP6424052B2 (en) * 2014-09-25 2018-11-14 東京応化工業株式会社 Photosensitive resin composition
JP2016210820A (en) 2015-04-28 2016-12-15 東京応化工業株式会社 Polymerizable composition, photosensitive composition, and cured product of said photosensitive composition
JP5973639B2 (en) * 2015-09-30 2016-08-23 東京応化工業株式会社 Colored photosensitive resin composition, method for forming color filter, and method for manufacturing display device
CN107793502B (en) * 2016-09-07 2020-12-08 常州强力电子新材料股份有限公司 Oxime ester photoinitiator, preparation method thereof, photocuring composition and application thereof
KR20180099105A (en) * 2017-02-28 2018-09-05 동우 화인켐 주식회사 Oxime ester compound and a photocurable composition comprising the same

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11109623A (en) 1997-09-30 1999-04-23 Hitachi Chem Co Ltd Photosensitive solution for forming color image, production of color filter using same and color filter
CN100528838C (en) * 2001-06-11 2009-08-19 西巴特殊化学品控股有限公司 Oxime ester photoinitiators having composite structures
AU2003294034A1 (en) * 2002-12-03 2004-06-23 Ciba Specialty Chemicals Holding Inc. Oxime ester photoinitiators with heteroaromatic groups
JP4437651B2 (en) * 2003-08-28 2010-03-24 新日鐵化学株式会社 Photosensitive resin composition and color filter using the same
JP4315010B2 (en) * 2004-02-13 2009-08-19 Ｊｓｒ株式会社 Radiation-sensitive resin composition, display panel spacer and display panel
KR100897224B1 (en) * 2004-02-23 2009-05-14 미쓰비시 가가꾸 가부시키가이샤 Oxime ester compound, photopolymerizable composition and color filter utilizing the same
JP4492238B2 (en) 2004-07-26 2010-06-30 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display panel
JP4493487B2 (en) * 2004-12-03 2010-06-30 凸版印刷株式会社 Photosensitive coloring composition and color filter using the same
JP2006195425A (en) * 2004-12-15 2006-07-27 Jsr Corp Radiation sensitive composition for forming colored layer, color filter and color liquid crystal display panel

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8822109B2 (en) 2007-09-28 2014-09-02 Fujifilm Corporation Colored curable composition, color filter, and solid image pickup element
TWI476512B (en) * 2007-09-28 2015-03-11 Fujifilm Corp Colored curable composition, colored region of color filter, color filter and producing method of color filter, and solid image pickup element

Also Published As

Publication number Publication date
KR100805863B1 (en) 2008-02-21
JP2007072034A (en) 2007-03-22
JP4633582B2 (en) 2011-02-16
CN1928716A (en) 2007-03-14
KR20070027445A (en) 2007-03-09
CN1928716B (en) 2011-05-25
TWI334514B (en) 2010-12-11

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