TW200700903A - Photosensitive composition and black matrix - Google Patents

Photosensitive composition and black matrix

Info

Publication number
TW200700903A
TW200700903A TW095117923A TW95117923A TW200700903A TW 200700903 A TW200700903 A TW 200700903A TW 095117923 A TW095117923 A TW 095117923A TW 95117923 A TW95117923 A TW 95117923A TW 200700903 A TW200700903 A TW 200700903A
Authority
TW
Taiwan
Prior art keywords
photosensitive composition
pattern
black matrix
leaving
matrix pattern
Prior art date
Application number
TW095117923A
Other languages
Chinese (zh)
Other versions
TWI304154B (en
Inventor
Masaru Shida
Mitsuru Kondo
Kiyoshi Uchikawa
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200700903A publication Critical patent/TW200700903A/en
Application granted granted Critical
Publication of TWI304154B publication Critical patent/TWI304154B/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

A method for readily forming a black matrix pattern is provided which is excellent in its high linearity, with no pattern detachment and leaving no residues. The photosensitive composition used in forming the above-described matrix pattern includes a photopolymerization initiator comprising of a compound represented by the formula (I) and a heterocyclic compound containing a nitrogen atom with a mercapto group attached thereto. By including these compounds, the photosensitivity of the photosensitive composition is increased, and the developing margin of the pattern is enlarged. Thereby, even when the photosensitive composition includes a light-shading material, a matrix pattern with an excellent linearity, with no pattern detachment and leaving no residue can be readily formed.
TW095117923A 2005-06-22 2006-05-19 Photosensitive composition and black matrix TWI304154B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005181616 2005-06-22
JP2005205187A JP4627227B2 (en) 2005-06-22 2005-07-14 Photosensitive composition and black matrix

Publications (2)

Publication Number Publication Date
TW200700903A true TW200700903A (en) 2007-01-01
TWI304154B TWI304154B (en) 2008-12-11

Family

ID=37792870

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095117923A TWI304154B (en) 2005-06-22 2006-05-19 Photosensitive composition and black matrix

Country Status (4)

Country Link
JP (1) JP4627227B2 (en)
KR (1) KR100818226B1 (en)
CN (1) CN1928713B (en)
TW (1) TWI304154B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8530537B2 (en) 2010-09-29 2013-09-10 Cheil Industries Inc. Black photosensitive resin composition and light blocking layer using the same
TWI427410B (en) * 2007-05-29 2014-02-21 Asahi Glass Co Ltd Photosensitive composition, separator, black matrix

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008059670A1 (en) * 2006-11-15 2008-05-22 Taiyo Ink Mfg. Co., Ltd. Photocurable/thermosetting resin composition, cured object, and printed wiring board
WO2008059935A1 (en) * 2006-11-15 2008-05-22 Taiyo Ink Mfg. Co., Ltd. Photocurable/thermosetting resin composition, cured product and printed wiring board
JP5003200B2 (en) * 2007-02-26 2012-08-15 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
JP4985767B2 (en) * 2007-05-11 2012-07-25 日立化成工業株式会社 Photosensitive resin composition, photosensitive element, resist pattern forming method and printed wiring board manufacturing method
WO2008140017A1 (en) * 2007-05-11 2008-11-20 Hitachi Chemical Company, Ltd. Photosensitive resin composition, photosensitive element, method of forming resist pattern, and process for producing printed wiring board
CN101349865B (en) * 2007-07-17 2012-10-03 富士胶片株式会社 Photosensitive compositions, curable compositions, color filters, and method for manufacturing the same
JP2009237294A (en) * 2008-03-27 2009-10-15 The Inctec Inc Photosensitive resin composition for forming black matrix
JP5192876B2 (en) * 2008-03-28 2013-05-08 富士フイルム株式会社 Photosensitive resin composition, light-shielding color filter, method for producing the same, and solid-state imaging device
JP5173528B2 (en) * 2008-03-28 2013-04-03 富士フイルム株式会社 Photosensitive resin composition, light-shielding color filter, method for producing the same, and solid-state imaging device
JP5528677B2 (en) 2008-03-31 2014-06-25 富士フイルム株式会社 Polymerizable composition, light-shielding color filter for solid-state image sensor, solid-state image sensor, and method for producing light-shielding color filter for solid-state image sensor
JP5189395B2 (en) * 2008-03-31 2013-04-24 富士フイルム株式会社 Photosensitive resin composition, light-shielding color filter, method for producing the same, and solid-state imaging device
JP5268415B2 (en) * 2008-04-28 2013-08-21 富士フイルム株式会社 Polymerizable composition, light-shielding color filter for solid-state image sensor using the same, and solid-state image sensor
JP5546801B2 (en) * 2008-06-10 2014-07-09 富士フイルム株式会社 Photosensitive resin composition for ultraviolet light laser exposure, pattern forming method, color filter produced using the method, method for producing color filter, and liquid crystal display device
JP5340198B2 (en) * 2009-02-26 2013-11-13 富士フイルム株式会社 Dispersion composition
JP5657267B2 (en) * 2009-04-16 2015-01-21 富士フイルム株式会社 Polymerizable composition for color filter, color filter, and solid-state imaging device
TWI519899B (en) * 2009-07-07 2016-02-01 富士軟片股份有限公司 Colored composition for light-shielding film, light-shielding pattern, method for forming the same, solid-state image sensing device, and method for producing the same
KR101068622B1 (en) * 2009-12-22 2011-09-28 주식회사 엘지화학 The high lightshielding blackmatrix composition having improved adhesion properties
JP6375236B2 (en) * 2014-02-04 2018-08-15 新日鉄住金化学株式会社 Photosensitive composition for light shielding film and cured product thereof

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0755925B2 (en) 1986-02-28 1995-06-14 旭化成工業株式会社 Novel oxime ester compound and synthetic method thereof
JPS62286961A (en) 1986-06-05 1987-12-12 Asahi Chem Ind Co Ltd Novel oxime ester compound and production thereof
NL1016815C2 (en) * 1999-12-15 2002-05-14 Ciba Sc Holding Ag Oximester photo initiators.
ATE446322T1 (en) * 2001-06-11 2009-11-15 Basf Se OXIM ESTER PHOTOINITIATORS WITH COMBINED STRUCTURE
JP2004240241A (en) * 2003-02-07 2004-08-26 Jsr Corp Photosensitive resin composition, spacer for display panel and display panel
JP4442292B2 (en) * 2003-06-10 2010-03-31 三菱化学株式会社 Photopolymerizable composition, color filter and liquid crystal display device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI427410B (en) * 2007-05-29 2014-02-21 Asahi Glass Co Ltd Photosensitive composition, separator, black matrix
US8530537B2 (en) 2010-09-29 2013-09-10 Cheil Industries Inc. Black photosensitive resin composition and light blocking layer using the same

Also Published As

Publication number Publication date
CN1928713B (en) 2010-12-29
JP4627227B2 (en) 2011-02-09
JP2007033467A (en) 2007-02-08
KR100818226B1 (en) 2008-04-01
CN1928713A (en) 2007-03-14
KR20060134809A (en) 2006-12-28
TWI304154B (en) 2008-12-11

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